JPH09509697A - プラチナ濃縮ケイ素変性耐蝕性アルミニウム被覆 - Google Patents
プラチナ濃縮ケイ素変性耐蝕性アルミニウム被覆Info
- Publication number
- JPH09509697A JPH09509697A JP7522439A JP52243995A JPH09509697A JP H09509697 A JPH09509697 A JP H09509697A JP 7522439 A JP7522439 A JP 7522439A JP 52243995 A JP52243995 A JP 52243995A JP H09509697 A JPH09509697 A JP H09509697A
- Authority
- JP
- Japan
- Prior art keywords
- platinum
- silicon
- aluminum
- coating
- slurry
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 title claims abstract description 227
- 238000000576 coating method Methods 0.000 title claims abstract description 125
- 229910052697 platinum Inorganic materials 0.000 title claims abstract description 114
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 89
- 239000010703 silicon Substances 0.000 title claims abstract description 85
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims abstract description 76
- 229910052782 aluminium Inorganic materials 0.000 title claims abstract description 73
- 238000005260 corrosion Methods 0.000 title claims abstract description 72
- 230000007797 corrosion Effects 0.000 title claims abstract description 72
- 239000011248 coating agent Substances 0.000 title claims description 103
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims description 94
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 85
- 238000000034 method Methods 0.000 claims abstract description 64
- 239000000758 substrate Substances 0.000 claims abstract description 50
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 45
- 239000000956 alloy Substances 0.000 claims abstract description 45
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 40
- 230000008021 deposition Effects 0.000 claims abstract description 4
- 239000002002 slurry Substances 0.000 claims description 93
- 229910000951 Aluminide Inorganic materials 0.000 claims description 63
- 239000000843 powder Substances 0.000 claims description 42
- 229910052751 metal Inorganic materials 0.000 claims description 37
- 239000011651 chromium Substances 0.000 claims description 36
- 239000002184 metal Substances 0.000 claims description 35
- 239000010410 layer Substances 0.000 claims description 34
- 229910052804 chromium Inorganic materials 0.000 claims description 32
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 30
- 238000009792 diffusion process Methods 0.000 claims description 30
- 239000012071 phase Substances 0.000 claims description 26
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 claims description 22
- 229910000907 nickel aluminide Inorganic materials 0.000 claims description 21
- 229910021332 silicide Inorganic materials 0.000 claims description 18
- 229910000601 superalloy Inorganic materials 0.000 claims description 18
- 238000010438 heat treatment Methods 0.000 claims description 17
- 239000011230 binding agent Substances 0.000 claims description 15
- 239000011863 silicon-based powder Substances 0.000 claims description 15
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 claims description 13
- 238000009826 distribution Methods 0.000 claims description 13
- 239000012298 atmosphere Substances 0.000 claims description 12
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims description 12
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 8
- 239000002344 surface layer Substances 0.000 claims description 8
- 238000000151 deposition Methods 0.000 claims description 7
- 230000005496 eutectics Effects 0.000 claims description 7
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical compound [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 claims description 6
- 239000002245 particle Substances 0.000 claims description 6
- 238000002844 melting Methods 0.000 claims description 4
- 230000008018 melting Effects 0.000 claims description 4
- 229910001260 Pt alloy Inorganic materials 0.000 claims description 3
- 238000001962 electrophoresis Methods 0.000 claims description 3
- 239000007791 liquid phase Substances 0.000 claims description 3
- 238000005240 physical vapour deposition Methods 0.000 claims description 3
- 239000000725 suspension Substances 0.000 claims description 3
- 239000006185 dispersion Substances 0.000 claims description 2
- 238000001652 electrophoretic deposition Methods 0.000 claims description 2
- 239000006023 eutectic alloy Substances 0.000 claims description 2
- 150000002500 ions Chemical class 0.000 claims description 2
- 238000007751 thermal spraying Methods 0.000 claims description 2
- 238000007740 vapor deposition Methods 0.000 claims description 2
- 230000002708 enhancing effect Effects 0.000 claims 2
- 230000003647 oxidation Effects 0.000 abstract description 15
- 238000007254 oxidation reaction Methods 0.000 abstract description 15
- 239000000203 mixture Substances 0.000 description 19
- 229910000990 Ni alloy Inorganic materials 0.000 description 18
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 16
- 238000012360 testing method Methods 0.000 description 13
- 239000010936 titanium Substances 0.000 description 9
- 230000001681 protective effect Effects 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 7
- 239000011253 protective coating Substances 0.000 description 7
- 239000000523 sample Substances 0.000 description 7
- 229910052719 titanium Inorganic materials 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 229910000599 Cr alloy Inorganic materials 0.000 description 6
- 229910019142 PO4 Inorganic materials 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 239000000788 chromium alloy Substances 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 229910052750 molybdenum Inorganic materials 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 6
- 239000010452 phosphate Substances 0.000 description 6
- -1 silicide compound Chemical class 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 229910000531 Co alloy Inorganic materials 0.000 description 5
- 229910017052 cobalt Inorganic materials 0.000 description 5
- 239000010941 cobalt Substances 0.000 description 5
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 5
- 238000001723 curing Methods 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000000155 melt Substances 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 229910052715 tantalum Inorganic materials 0.000 description 5
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 4
- 230000002378 acidificating effect Effects 0.000 description 4
- 238000000635 electron micrograph Methods 0.000 description 4
- 230000006872 improvement Effects 0.000 description 4
- 239000004615 ingredient Substances 0.000 description 4
- 229910000765 intermetallic Inorganic materials 0.000 description 4
- 239000011733 molybdenum Substances 0.000 description 4
- 239000011241 protective layer Substances 0.000 description 4
- 239000003870 refractory metal Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 241000894007 species Species 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- 229910052721 tungsten Inorganic materials 0.000 description 4
- 241001676573 Minium Species 0.000 description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 3
- 239000012190 activator Substances 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910052796 boron Inorganic materials 0.000 description 3
- 229910021357 chromium silicide Inorganic materials 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 230000035515 penetration Effects 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 238000007581 slurry coating method Methods 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 238000005728 strengthening Methods 0.000 description 3
- 239000011593 sulfur Substances 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- 229910002515 CoAl Inorganic materials 0.000 description 2
- 241000182341 Cubitermes group Species 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000001680 brushing effect Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000003245 coal Substances 0.000 description 2
- 239000000567 combustion gas Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 229910052735 hafnium Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 230000009545 invasion Effects 0.000 description 2
- 238000009533 lab test Methods 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 238000005088 metallography Methods 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- 239000011819 refractory material Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- 229910001247 waspaloy Inorganic materials 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 241001136792 Alle Species 0.000 description 1
- 229920003319 Araldite® Polymers 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- 241000464648 Coronavirus group 2b Species 0.000 description 1
- 241001378070 Coronavirus group 2c Species 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 229910000929 Ru alloy Inorganic materials 0.000 description 1
- 229910000676 Si alloy Inorganic materials 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 240000008042 Zea mays Species 0.000 description 1
- 235000005824 Zea mays ssp. parviglumis Nutrition 0.000 description 1
- 235000002017 Zea mays subsp mays Nutrition 0.000 description 1
- FQNKXXHWTIMQJM-UHFFFAOYSA-N [Si].[Pt].[Ni] Chemical class [Si].[Pt].[Ni] FQNKXXHWTIMQJM-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- GIGQFSYNIXPBCE-UHFFFAOYSA-N alumane;platinum Chemical compound [AlH3].[Pt] GIGQFSYNIXPBCE-UHFFFAOYSA-N 0.000 description 1
- QQHSIRTYSFLSRM-UHFFFAOYSA-N alumanylidynechromium Chemical compound [Al].[Cr] QQHSIRTYSFLSRM-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 230000003190 augmentative effect Effects 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- UHZZMRAGKVHANO-UHFFFAOYSA-M chlormequat chloride Chemical compound [Cl-].C[N+](C)(C)CCCl UHZZMRAGKVHANO-UHFFFAOYSA-M 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical class [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 235000005822 corn Nutrition 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
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- 238000007598 dipping method Methods 0.000 description 1
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- 239000002659 electrodeposit Substances 0.000 description 1
- 238000004453 electron probe microanalysis Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 229910017053 inorganic salt Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 239000003350 kerosene Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 229910052976 metal sulfide Inorganic materials 0.000 description 1
- 238000004452 microanalysis Methods 0.000 description 1
- MEFBJEMVZONFCJ-UHFFFAOYSA-N molybdate Chemical compound [O-][Mo]([O-])(=O)=O MEFBJEMVZONFCJ-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 150000003057 platinum Chemical class 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 230000002000 scavenging effect Effects 0.000 description 1
- 229910021484 silicon-nickel alloy Inorganic materials 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000005486 sulfidation Methods 0.000 description 1
- 238000005987 sulfurization reaction Methods 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000005382 thermal cycling Methods 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- PBYZMCDFOULPGH-UHFFFAOYSA-N tungstate Chemical compound [O-][W]([O-])(=O)=O PBYZMCDFOULPGH-UHFFFAOYSA-N 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
- C23C10/18—Solid state diffusion of only metal elements or silicon into metallic material surfaces using liquids, e.g. salt baths, liquid suspensions
- C23C10/26—Solid state diffusion of only metal elements or silicon into metallic material surfaces using liquids, e.g. salt baths, liquid suspensions more than one element being diffused
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12458—All metal or with adjacent metals having composition, density, or hardness gradient
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12736—Al-base component
- Y10T428/1275—Next to Group VIII or IB metal-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12944—Ni-base component
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- Organic Chemistry (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
- Physical Vapour Deposition (AREA)
- Turbine Rotor Nozzle Sealing (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.ニッケル基合金基体の表面の腐蝕抵抗を増強する方法において、 (A)表面上に白金の層を付着させ、次いで白金被覆表面を加熱して白金を基体中 に拡散させることによって白金で基体の表面を濃縮し、 (B)次いで白金濃縮した基体中に、アルミニウム及びケイ素を溶融状態で同時に 拡散させ、 かくしてニッケル基合金基体上に白金濃縮ケイ素変性腐蝕抵抗アルミナイド被覆 を形成することを特徴とする方法。 2.白金を電気分解付着によって表面上に付着させる請求の範囲第1項記載の 方法。 3.白金を、金属白金又は白金合金粉末又はそれらの組合せを含有するスラリ ーの拡散熱処理によって表面上に付着させる請求の範囲第1項記載の方法。 4.白金を、スラリーからの一時的液体相付着によって表面上に付着させる請 求の範囲第1項記載の方法。 5.白金を、低融点白金濃縮合金粉末の電気泳動付着によって表面上に付着さ せる請求の範囲第1項の方法。 6.白金の付着層が、約1〜15μmの厚さである請求の範囲第2項記載の方 法。 7.白金の付着層が、約3〜7μmの厚さである請求の範囲第6項記載の方法 。 8.白金の付着層が、約3〜5μmの厚さである請求の範囲第7項記載の方法 。 9.白金の付着層が、約1〜2μmの厚さである請求の 範囲第6項記載の方法。 10.白金を、少なくとも約20分間、少なくとも約1000℃の温度に加熱す ることによって基体中に拡散させる請求の範囲第1項記載の方法。 11.バインダー及び元素状アルミニウム及びケイ素粉末、アルミニウム−ケイ 素共融合金粉末、又はそれらの組合せを含有するスラリーからアルミニウム及び ケイ素を、白金濃縮面上に同時に付着させ、ケイ素の量がケイ素及びアルミニウ ムの合計重量の約2〜40%である請求の範囲第1項記載の方法。 12.ケイ素の前記量が、約3〜25%である請求の範囲第11項記載の方法。 13.ケイ素の前記量が、約5〜20%である請求の範囲第12項記載の方法。 14.ケイ素の前記量が、約10〜15%である請求の範囲第13項記載の方法 。 15.約15〜約25mg/cm2のスラリーを、基体の表面に適用する請求の 範囲第11項記載の方法。 16.形成されたアルミナイド被覆が、約50〜約60μmの厚さである請求の 範囲第11項記載の方法。 17.スラリーが、アルミニウム−ケイ素共融粉末を含有する請求の範囲第11 項記載の方法。 18.前記共融粉末が、ケイ素約11.8重量%である請求の範囲第17項記載 の方法。 19.形成されたアルミナイド粉末が、約30〜約40μmの厚さである請求の 範囲第18項記載の方法。 20.スラリーが、スラリー中の金属粉末構成成分の合計重量を基準にした重量 百分率で、0〜約20%のクロムを、元素状金属粉末の形で更に含有する請求の 範囲第11項記載の方法。 21.電気泳動に好適なビヒクル中のケイ素及びアルミニウム元素状粒子の懸濁 液から電気泳動法によって、白金濃縮表面上にアルミニウム及びケイ素を付着さ せる請求の範囲第1項記載の方法。 22.白金濃縮表面上に、直接ケイ素及びアルミニウムの元素状粒子を熱スプレ ーすることによって前記表面上にアルミニウム及びケイ素を付着させる請求の範 囲第1項記載の方法。 23.物理的蒸着又はイオン蒸着によって白金濃縮表面上にアルミニウム又はケ イ素を付着させる請求の範囲第1項記載の方法。 24.アルミニウム及びケイ素を、非反応性雰囲気中で約660℃より上の温度 に加熱することによって表面中に導入する請求の範囲第1項記載の方法。 25.前記温度が、約870℃より上である請求の範囲第24項記載の方法。 26.前記温度が、約1050℃以上である請求の範囲第25項記載の方法。 27.白金濃縮表面を有するニッケル基合金基体の表面の腐蝕抵抗を増強する方 法において、白金濃縮表面上に元素状アルミニウム及びケイ素を付着させ、次い で非反応性雰囲気中で表面を加熱してアルミニウム及びケイ素を基体中 に拡散させることによって基体中にアルミニウム及びケイ素を導入することを特 徴とする方法。 28.バインダー及び元素状アルミニウム及びケイ素粉末、アルミニウム−ケイ 素共融合金粉末又はそれらの組合せを含有するスラリーから、白金濃縮表面上に アルミニウム及びケイ素を同時に付着させ、ケイ素の量がケイ素及びアルミニウ ムの合計重量の約2〜40%である請求の範囲第27項記載の方法。 29.ケイ素の前記量が、約3〜25%である請求の範囲第27項記載の方法。 30.約15〜約25mg/cm2のスラリーを、基体の表面に適用する請求の 範囲第27項記載の方法。 31.形成されたアルミナイド被覆が、約50〜約60μmの厚さである請求の 範囲第27項記載の方法。 32.スラリーが、アルミニウム−ケイ素共融粉末を含有する請求の範囲第27 項記載の方法。 33.前記共融粉末が、ケイ素約11.8重量%である請求の範囲第32項記載 の方法。 34.形成されたアルミナイド被覆が、約30〜約40μmの厚さである請求の 範囲第33項記載の方法。 35.スラリーが、スラリー中の金属粉末構成成分の合計重量を基準にした重量 百分率で、0〜約20%のクロムを、元素状金属粉末の形で更に含有する請求の 範囲第27項記載の方法。 36.アルミニウム及びケイ素を、非反応性雰囲気中で約660℃より上の温度 に加熱することによって表面中に導 入する請求の範囲第28項記載の方法。 37.前記温度が、約870℃より上である請求の範囲第36項記載の方法。 38.前記温度が、約1050℃以上である請求の範囲第37項記載の方法。 39.耐火物含有ニッケル基スーパーアロイ基体上の白金濃縮ケイ素変性アルミ ナイド被覆において、被覆が、少なくとも三つの区別しうる層の形でニッケルア ルミナイドの連続体を含有し、前記層が、表面層全体に白金アルミナイド及び耐 火ケイ化物相の分散分布を含む表面層、耐火ケイ化物相及び表面層と比較したと き白金アルミナイド相を相対的に含有しない分散分布を有する、前記表面層の下 の第二層、及び表面層と比較したとき白金アルミナイド及び耐火ケイ化物相を相 対的に含有しない、前記第二層の下の第三層を含有し、被覆が熱腐蝕条件に対し て改良された抵抗を有することを特徴とする被覆。 40.被覆が、約30〜60μmの厚さである請求の範囲第39項記載の被覆。 41.被覆が、約50〜60μmの厚さである請求の範囲第40項記載の被覆。 42.請求の範囲第39項、第40項又は第41項記載の白金濃縮ケイ素変性被 覆で被覆された耐火物含有ニッケル基スーパーアロイ部品であり、前記被覆部品 が熱腐蝕条件に対する改良された抵抗を有することを特徴とする部品。 43.耐火物含有耐熱性ニッケルスーパーアロイ基体のための拡散熱処理した白 金濃縮ケイ素変性アルミナイド被覆 であり、被覆が、連続するニッケルのアルミナイド相を含み、かつ下記複数の帯 域を深さ方向で有する被覆: 白金アルミナイド及び耐火ケイ化物相の分散分布を含む表面帯域; 表面帯域と比較したとき白金アルミナイド相を相対的に含まず、耐火ケイ化物 相の分散分布を有する第二帯域; 表面帯域と比較したとき白金アルミナイド及び耐火ケイ化物相を相対的に含ま ぬ第三帯域; 前記被覆基体は熱腐蝕条件に対して改良された抵抗を有する。
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/202,352 US5650235A (en) | 1994-02-28 | 1994-02-28 | Platinum enriched, silicon-modified corrosion resistant aluminide coating |
| US08/202,352 | 1994-02-28 | ||
| PCT/US1995/002226 WO1995023243A2 (en) | 1994-02-28 | 1995-02-27 | Platinum enriched, silicon-modified corrosion resistant aluminide coating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH09509697A true JPH09509697A (ja) | 1997-09-30 |
| JP3642529B2 JP3642529B2 (ja) | 2005-04-27 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP52243995A Expired - Fee Related JP3642529B2 (ja) | 1994-02-28 | 1995-02-27 | プラチナ濃縮ケイ素変性耐蝕性アルミニウム被覆 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US5650235A (ja) |
| EP (1) | EP0748394B1 (ja) |
| JP (1) | JP3642529B2 (ja) |
| CA (1) | CA2184181C (ja) |
| DE (1) | DE69522440T2 (ja) |
| WO (1) | WO1995023243A2 (ja) |
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- 1994-02-28 US US08/202,352 patent/US5650235A/en not_active Expired - Lifetime
-
1995
- 1995-02-27 DE DE69522440T patent/DE69522440T2/de not_active Expired - Lifetime
- 1995-02-27 CA CA002184181A patent/CA2184181C/en not_active Expired - Lifetime
- 1995-02-27 WO PCT/US1995/002226 patent/WO1995023243A2/en not_active Ceased
- 1995-02-27 JP JP52243995A patent/JP3642529B2/ja not_active Expired - Fee Related
- 1995-02-27 EP EP95916911A patent/EP0748394B1/en not_active Expired - Lifetime
-
1997
- 1997-02-19 US US08/802,661 patent/US5922409A/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001003184A (ja) * | 1999-05-03 | 2001-01-09 | General Electric Co <Ge> | 基体からアルミニドコーティングを除去する方法 |
| JP2001115250A (ja) * | 1999-08-23 | 2001-04-24 | General Electric Co <Ge> | 基材に皮膜を施工する方法 |
| JP2007262447A (ja) * | 2006-03-27 | 2007-10-11 | Mitsubishi Heavy Ind Ltd | 耐酸化膜及びその形成方法、遮熱コーティング、耐熱部材、及びガスタービン |
Also Published As
| Publication number | Publication date |
|---|---|
| WO1995023243A3 (en) | 1995-09-21 |
| DE69522440D1 (de) | 2001-10-04 |
| DE69522440T2 (de) | 2002-07-11 |
| EP0748394B1 (en) | 2001-08-29 |
| CA2184181A1 (en) | 1995-08-31 |
| EP0748394A1 (en) | 1996-12-18 |
| JP3642529B2 (ja) | 2005-04-27 |
| US5650235A (en) | 1997-07-22 |
| WO1995023243A2 (en) | 1995-08-31 |
| CA2184181C (en) | 2007-12-11 |
| US5922409A (en) | 1999-07-13 |
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