JPH0961622A - Production of black matrix for color filter - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method for forming a light shielding layer having a high optical density with a thin film by executing stages for forming. a specific resin layer and positive type photosensitive resin layer on the surface of a light transparent base material, then removing the resin layer of exposed parts by exposure and development and packing a light shielding layer compsn. into the removed parts after peeling the residual resin layer, etc. SOLUTION: The resin layer 102 consisting potentially a resin which is insoluble in a solvent for this photosensitive resin and is soluble in a developer for the positive type photosensitive resin is formed on the surface of the light transparent base material 101. A positive type photosensitive resin layer 103 is then formed thereon and the positive type photosensitive resin layer 103 of the exposed parts is removed together with the resin layer 102 thereunder by exposure and development. After the remaining positive type photosensitive resin layer 103 is peeled, the light shielding layer compsn. 105 contg. a material for shielding visible light and contg. a resin insoluble in a solvent for dissolving the resin layer as a binder component is packed into at least the removed parts; thereafter, the remaining resin layer 102 is removed by the solvent dissolving the resin layer 102. As a result, the formation of the light shielding film 105 which is the thin film and has the high optical density is made possible.

Description

Detailed Description of the Invention

[0001]

TECHNICAL FIELD The present invention relates to a method for producing a black matrix for a color filter used in a color liquid crystal display device.

[0002]

2. Description of the Related Art Liquid crystal displays (hereinafter abbreviated as LCDs).
Utilizing features such as thinness, small size, and low power consumption, is currently used for display units such as watches, calculators, TVs, and personal computers. In recent years, color LCDs have been developed and OA / AV
It has begun to be used in many applications such as navigation systems and viewfinders, mainly in equipment, and the market is expected to expand rapidly in the future.

As shown in FIG. 2, a color filter for displaying an LCD in color is R (red) G (green) on a substrate 2 such as a glass plate on which a BM (black matrix) 1 having a grid pattern is formed. ) B (blue) color pixels 3 (about 100 × 100 × 2 μm) are sequentially formed, and a transparent overcoat layer (OC) 4 is formed thereon. 5 is a polarizing plate and 6 is an ITO electrode.

[0004] In the color LCD, the color filter 7 has an LC
D, the display screen can be colored by transmitting backlight light through a color filter. 8 is an alignment film, 9 is a liquid crystal, 10 is a seal material, 11 is a top coat layer, 12 is an ITO electrode, 13 is a substrate such as a glass plate, 14
Is a polarizing plate.

At present, color filters are mainly manufactured using a dyeing method. However, in this method, a step of forming a pixel by applying a transparent photosensitive resin on a glass substrate, drying, exposing, and developing, dyeing with a dye, and then forming a color mixing prevention layer is required to be repeated three times. Therefore, the number of steps is large and the cost is high. Further, since a dye is used as a coloring agent, there is a disadvantage that reliability (weather resistance and heat resistance), which is an important issue of a color filter, is inferior.
Therefore, some color filters using a pigment as a coloring agent have been proposed, among which are an electrodeposition method, a printing method, and a photolithography method (photolithography method).

However, the electrodeposition method requires the formation of an electrode pattern. (1) The degree of freedom of the pattern is small.
(2) The cost is high, and the printing method has problems such as (1) it is difficult to align a large substrate and the resolution is low, so it is difficult to cope with miniaturization, and (2) the flatness of the pattern is poor. The photolithography method is considered to be the mainstream. For photolithography, liquid resists and films are contemplated. In the liquid resist, color pixels are formed by applying a varnish in which a pigment is dispersed in a photosensitive resin on a glass substrate with a spinner, drying, exposing, and developing. On the other hand, the film is a varnish formed into a film like the photosensitive film for printed boards, and after being laminated on a substrate, color pixels are formed by exposure and development.

[0007]

Since the photosensitive resist material containing a black material cannot increase the concentration of the black material, there is a limit in thinning the film. On the other hand, in the case of the lift-off method using a positive type resist, it is not necessary to impart photosensitivity to the light shielding layer, so that the black material can be highly concentrated, but the light shielding layer is applied on the patterned positive type resist layer. Therefore, the material of the light shielding layer is limited to those which do not attack the resist pattern. The present invention provides a method for producing a thin film and high optical density black matrix (light shielding layer).

[0008]

The first invention of the present application is that it is insoluble in the solvent of the positive type photosensitive resin and soluble in the developing solution of the positive type photosensitive resin on the surface of the light transmissive substrate. After forming a resin layer containing a resin as a main component, and then forming a positive type photosensitive resin layer on this, the positive type photosensitive resin layer in the exposed portion is removed together with the resin layer thereunder by exposure and development. After that, the remaining positive photosensitive resin layer is peeled off, and then at least the light-shielding layer composition containing a material that shields visible light and containing a resin insoluble in a solvent that dissolves the resin layer as a binding component is removed. The method is a method for producing a black matrix for a color filter, characterized in that the remaining resin layer is removed by a solvent that dissolves the resin layer.

In a second invention of the present application, a resin layer containing a resin insoluble in a solvent of a positive photosensitive resin and a developing solution as a main component is formed on the surface of a light-transmitting substrate, and then a positive type resin is formed on the resin layer. After forming the photosensitive resin layer, the positive photosensitive resin layer in the exposed portion is removed by exposure and development, and the resin layer in the removed portion is removed with a liquid that does not attack the positive photosensitive resin layer,
Thereafter, the remaining positive photosensitive resin layer is peeled off, and then at least the light-shielding layer composition containing a material that blocks visible light and containing a resin insoluble in the liquid that dissolves the resin layer as a binding component The method for producing a black matrix for a color filter is characterized in that the remaining resin layer is removed with a liquid that dissolves the resin layer.

[0009]

BEST MODE FOR CARRYING OUT THE INVENTION By using the process of the present invention, it is possible to increase the concentration of a black material and it is excellent in light shielding property.
The light-shielding layer can be formed even if a material that corrodes the resist pattern is used. An example of the process of the present invention will be described with reference to FIG. After the resin 102 and the positive resist 103 are applied to the glass substrate 101, the glass substrate 101 is exposed through a mask 104 (FIG. 1A). The positive resist and resin in the exposed area are removed by development and etching (Fig. 1b). The positive resist in the non-exposed area is stripped (FIG. 1c), and the BM material 105 is applied (FIG. 1d). Only the resin 102 is dissolved and removed to form the black matrix 106.

[0010]

[Example] Carbon black REAGA manufactured by CABOT
L-250R (trade name) 12.8 g, styrene-maleic anhydride half ester acrylate 3.2 g,
84 g of diglyme was dispersed in a planetary mill for 2 hours to obtain a dispersion paste. A washed and dried glass substrate was spin-coated with an IPA solution of alcohol-soluble polyamide M-1276 (trade name) manufactured by Nippon Rilsan Co., Ltd.
In-dried to obtain a resin layer of 0.8 μm. On top of this, positive resist PMERP-6005C-3 made by Tokyo Ohka Co., Ltd.
(Trade name) was spin-coated and dried at 90 ° C. for 10 minutes to form a resist layer having a thickness of 1.5 μm. Ultraviolet light (60 mJ) from a high-pressure mercury lamp through a mask with a light-shielding pattern
Was exposed to light, immersed in a 0.5% aqueous NaOH solution for 60 seconds, rinsed with pure water, and developed. Then 90 seconds to IPA
The resin layer was etched by immersion in ec. Next, after exposing the entire surface, the resist layer was peeled off with a 2% NaOH aqueous solution to obtain a resin pattern. The dispersion paste is spin-coated so as to sufficiently fill the recesses of the resin pattern,
After drying at 10 ° C for 10 minutes, only the resin pattern was dissolved with IPA. As a result, a good light-shielding layer pattern was obtained, and its optical density was 2.5. Finally, the obtained light-shielding layer pattern was heat-treated at 200 ° C. for 30 minutes to be completely cured. As a result, a good light-shielding layer pattern was obtained, and its optical density was 2.5.

[0011]

According to the present invention, it is possible to produce a black matrix (light-shielding layer) with a thin film and high optical density.

[Brief description of drawings]

1A to 1C are cross-sectional views illustrating an example of steps of the present invention.

FIG. 2 is a sectional view of a liquid crystal display.

[Explanation of symbols]

 101. Glass substrate 102. Resin 103. Positive resist 103 104. Mask 105. BM material 106. Black matrix 1. 1. BM (black matrix) Glass substrate 3. Color pixels 4. 4. Overcoat layer (OC) Polarizing plate 6. ITO electrode 7. Color filter 8. Alignment film 9. Liquid crystal 10. Seal material 11. Top coat layer 12. ITO electrode 13. Glass substrate 14. Polarizer

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Tsutomu Sato 14 Goi Minami Coast, Ichihara City, Chiba Hitachi Chemical Co., Ltd. Goi Factory

Claims (2)

[Claims] 1. A resin layer containing, as a main component, a resin which is insoluble in a solvent of a positive photosensitive resin and soluble in a developer of the positive photosensitive resin, is formed on a surface of a light-transmissive substrate, Then, after forming a positive photosensitive resin layer on this, the positive photosensitive resin layer in the exposed area is removed together with the resin layer thereunder by exposure and development, and the remaining positive photosensitive resin layer is then peeled off. Then, a light-shielding layer composition containing a material that shields visible light and containing a resin insoluble in a solvent that dissolves the resin layer as a binding component is filled in at least the removal portion, and then a solvent that dissolves the resin layer. A method for producing a black matrix for a color filter, which comprises removing the resin layer remaining in step 1. 2. A resin layer containing a solvent of a positive photosensitive resin and a resin insoluble in a developing solution as a main component is formed on the surface of a light-transmissive substrate, and then a positive photosensitive resin layer is formed thereon. After that, the positive photosensitive resin layer in the exposed area is removed by exposure and development, and the resin layer in the removed area is removed with a liquid that does not attack the positive photosensitive resin layer. After peeling off the resin layer, at least the removal part is filled with a light-shielding layer composition containing a material that blocks visible light and containing a resin insoluble in the liquid that dissolves the resin layer as a binding component, and then the resin layer A method for producing a black matrix for a color filter, characterized in that the remaining resin layer is removed with a liquid that dissolves.