JPH10104407A - Light amount adjustment filter and method and apparatus for manufacturing the same - Google Patents

Abstract

(57) [Summary] [PROBLEMS] To reduce the manufacturing time and improve the accuracy of the light amount distribution of a light amount adjusting filter used when exposing a phosphor or the like of a CRT. SOLUTION: A condensed beam spot obtained by condensing light from a light source 1 is spirally or concentrically scanned by a rotating table 8 and a scanning means 4, so that the wavelength of the light source 1 is substantially equal to the surface of a transparent glass substrate. By exposing the dry plate 7 coated with a photoreceptor that is exposed to light, and controlling the density of a line flux to be exposed, a light amount adjusting filter having an arbitrary highly accurate transmitted light amount distribution can be manufactured in a short time.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a light amount adjusting filter used for adjusting a light amount distribution on an exposure table for exposing a phosphor or the like of a CRT, and a method and an apparatus for manufacturing the same.

[0002]

2. Description of the Related Art A conventional light amount adjusting filter is, for example, shown in FIG.
By using an exposure machine as shown in FIG. 1 and forming a pattern in which the line width of the metal film is changed as shown in FIG. 4 on a glass substrate or the like, a device having an arbitrary transmittance is manufactured.

A detailed description will be given with reference to FIGS. FIG. 3 shows an exposure machine usually called a pattern generator, and a light source 21 composed of a mercury lamp or a xenon lamp.
Thus, the variable aperture 22 is irradiated, and the light is projected on the dry plate 24 by the reduction lens 23. The variable aperture 22 is configured so that the aperture size can be varied by an aperture movement motor 25 controlled by a computer. And dry plate 2 depending on the aperture size
The XY stage 26 is moved by a computer-controlled XY stage motor 27 by changing the line width exposed to 4, and an arbitrary pattern having an arbitrary line width can be drawn on the dry plate 24. Z stage 28 is Z
It is driven by the slide motor 29 and used for focusing.

FIG. 4 schematically shows an example of a light amount adjusting filter 30 produced using such an exposure machine. In FIG. 4, reference numeral 31 denotes a substantially transparent glass substrate, on which a metal film 3 deposited after exposure as shown by oblique lines.
2 are formed. The portion where the metal film 32 is deposited has low light transmittance, and the other portions are almost transparent and have high light transmittance.

[0005] The ordinary light amount adjustment filter 30
It is a rectangle having a size of about 0 mm, the line width is about 3 to 300 μm, and the line pitch is about 300 to 1000 μm. The light amount adjustment filter 30 is moved by a minute amount (for example, 0.1
mm) Non-uniformity of the light amount distribution can be eliminated by using the device while reciprocating.

[0006]

However, in the above-described conventional manufacturing method, it takes about 2 hours to expose the light amount adjusting filter 30 having a side of 200 mm even if the line pitch is 1000 μm. It takes about 5 hours. Therefore, there is a problem in that it is practically impossible to reduce the line pitch for high-precision light quantity control because the manufacturing time is too long.

SUMMARY OF THE INVENTION In view of the above-mentioned problems, an object of the present invention is to provide a light quantity adjusting filter capable of achieving high precision of light quantity control and shortening of a manufacturing time, and a method and a device for manufacturing the same.

[0008]

The light quantity adjusting filter of the present invention comprises a substantially transparent substrate and a spiral or concentric low transmittance material formed on the substrate. The amount of transmitted light is changed by the density of the formed pattern. By rotating the substrate at a high speed and forming a pattern at a fine pitch, high-precision light control can be performed and production can be performed in a short time. It was done. The light amount adjustment filter is installed between a CRT or the like to be exposed and the light source for exposure, and has a function of evenly adjusting the distribution of the exposure light amount by reciprocating a small amount in the optical axis direction.

In the method of manufacturing a light amount adjusting filter according to the present invention, a converging beam spot is scanned spirally or concentrically on a dry plate formed by applying a photosensitive material onto a substantially transparent substrate to condense light. An arbitrary pattern is exposed by controlling on / off of the light amount of the beam spot, and the transmitted light amount is changed depending on the density of the pattern. For example, as a preferable example, the condensed beam spot is condensed to 0.5 to 1 μm, and the substrate is controlled to rotate at a constant linear speed of 1.2 to 2.4 m / sec to scan the line width. 1-2 μm,
A pattern having a line pitch of 2 to 4 μm is formed. in this case,
A substrate having a side of 200 mm can be exposed in 1-2 hours.

Further, the apparatus for manufacturing a light amount adjusting filter according to the present invention comprises a light source, an objective lens for converging light emitted from the light source, a scanning means for moving a beam spot condensed by the objective lens, and a substantially transparent light source. A rotating table for rotating a dry plate formed by applying a photosensitive material on a substrate, and a means for controlling the light source to be turned on and off, so that the amount of transmitted light is changed by changing the density of the exposure pattern by controlling the light source to be turned on and off. It was done.

[0011]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, an embodiment of a light amount adjusting filter according to the present invention and a method and an apparatus for manufacturing the same will be described with reference to FIGS.

In FIG. 1 showing a device for manufacturing a light amount adjusting filter, reference numeral 1 denotes a light source, for example, a He-Ne laser, A
It is composed of an r laser, a mercury lamp, a condenser lens and the like. Reference numeral 2 denotes an optical switch, which includes an EO modulator, an AO modulator, and the like.

Reference numeral 3 denotes a beam expander. Reference numeral 4 denotes a scanning means, which has a linear guide such as an air slider, and is preferably a uniaxial stage driven by a motor and a ball screw or a linear motor. 5 is a reflection mirror, and 6 is an objective lens. Reference numeral 7 denotes a dry plate on which a photosensitive member sensitive to the wavelength of the light source is applied on the surface of a substantially transparent glass substrate. 8
Is a rotary table on which the dry plate 7 is installed and rotated. The scanning means 4 and the rotary table 8 are speed-controlled so that the beam spot condensed by the objective lens 6 scans on the dry plate 7 at a constant linear velocity. .

In the above configuration, substantially parallel light emitted from the light source 1 is spread by the beam expander 3 via the optical switch 2. The diameter of the light beam is determined by the numerical aperture of the objective lens 6 necessary to obtain a beam spot diameter focused on the substrate 7. For example, the wavelength is 0.63 μm
When the focal length of the objective lens 6 is 2 mm, the light beam diameter of 3.6 mm is required to obtain a focused beam spot diameter of 0.6 μm.

A dry plate 7 fixed by air suction or mechanically on a rotary table 8 is rotated to expose the condensed beam spot at a constant linear velocity. By controlling on / off of the light amount by the optical switch 2 in synchronization with the scanning of the condensed beam spot on the dry plate 7, the density of the helical or concentric pattern flux can be arbitrarily changed. It is needless to say that a concentric pattern can be exposed by rotating the scanning means 4 stepwise after the rotation table 8 makes one rotation, and a spiral pattern can be exposed by rotating and moving the rotation table 8 and the scanning means 4 simultaneously.

After the dry plate 7 is exposed as described above, it is developed to obtain a light quantity adjusting filter 10 having a density difference due to a density difference of a pattern flux. By measuring the relationship between the density and the density of the ray bundle in advance, the light amount adjustment filter 10 having an arbitrary density pattern can be manufactured.

The light source 1 can be composed of a semiconductor laser and a collimator lens. In this case, since the on / off control can be performed directly by the laser drive current, the optical switch 2 can be used.
Is unnecessary. Furthermore, if the light source 1 emits a sufficiently large light beam with respect to the light beam required for the objective lens 6, the beam expander 3 is not necessary.

FIG. 2 schematically shows an example of the light quantity adjusting filter 10 manufactured by the above-mentioned manufacturing apparatus. The light amount adjustment filter 10 is a substantially transparent substrate 1 such as a glass plate.
A material 12 having a low transmittance such as a metal film or carbon formed by exposing and developing a photosensitive material with a light source 1 is disposed on the surface of the photosensitive material 1. The light amount adjustment filter 10 is an example in which scanning exposure is performed concentrically, and the density of the inner peripheral portion is set to be lower because the density of the line flux is lower in the inner peripheral portion than in the outer peripheral portion. The line flux to be exposed may be intermittent, and the pattern is determined according to a required density distribution.

The light amount adjusting filter 10 is used when exposing a phosphor or the like of a CRT, but is desirably installed near an object whose light amount needs to be adjusted. The reason for this is that, as the distance increases, the pitch of light unevenness due to diffraction becomes larger and cannot be ignored. In addition, even when the light source is installed close to the device, light unevenness at a minute pitch occurs.
It is desirable to use it while reciprocating in the direction by 0.1 to 1 mm.

[0020]

According to the light amount adjusting filter of the present invention, as is apparent from the above description, a substantially transparent substrate and a spiral or concentric intermittent low-transmittance material formed on the substrate. Since the amount of transmitted light is changed depending on the density of a pattern formed of a material having a low transmittance, high-precision light control can be realized by forming a pattern with a fine pitch, and The substrate can be manufactured in a short time by rotating the substrate at a high speed to form a pattern.

According to the method of manufacturing the light amount adjusting filter of the present invention, the condensed beam spot is spirally or concentrically scanned on a dry plate formed by applying a photosensitive material onto a substantially transparent substrate, Since an arbitrary pattern is exposed by controlling the amount of light of the focused beam spot on and off, the amount of transmitted light is changed depending on the density of the pattern.
The light amount adjustment filter can be efficiently manufactured using a dry plate.

According to the apparatus for manufacturing a light amount adjusting filter of the present invention, a light source, an objective lens for converging light emitted from the light source, a scanning means for moving a beam spot condensed by the objective lens, A rotary table for rotating the dry plate coated with the material, and a means for controlling the light source to be turned on and off, and the amount of transmitted light is changed by changing the density of the exposure pattern by controlling the light source to be turned on and off. The method can be performed with a manufacturing apparatus having a simple configuration.

[Brief description of the drawings]

FIG. 1 is a schematic configuration diagram of an apparatus for manufacturing a light amount adjustment filter according to an embodiment of the present invention.

FIG. 2 is a schematic diagram of a light amount adjustment filter of the embodiment.

FIG. 3 is a schematic configuration diagram of a conventional apparatus for manufacturing a light amount adjustment filter.

FIG. 4 is a schematic view of a conventional light amount adjustment filter.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Light source 4 Scanning means 7 Dry plate 8 Rotary table 10 Light amount adjustment filter 11 Substrate 12 Substance with low transmittance

Claims (3)

[Claims] 1. A light-transmitting light amount is changed by the density of a pattern formed of a substantially transparent substrate and a spiral or concentric low-transmittance material formed on the substrate and formed of a low-transmittance material. A light amount adjustment filter, characterized in that: 2. A method in which a condensed beam spot is spirally or concentrically scanned on a dry plate formed by applying a photosensitive material onto a substantially transparent substrate, and on / off control of the amount of the condensed beam spot is performed. A method for manufacturing a light quantity adjusting filter, comprising exposing an arbitrary pattern by using the method, and changing the amount of transmitted light according to the density of the pattern. 3. A light source, an objective lens for converging light emitted from the light source, a scanning means for moving a beam spot condensed by the objective lens, and a dry plate formed by applying a photosensitive material on a substantially transparent substrate Manufacturing a light quantity adjusting filter, comprising: a rotating table for rotating the light source; and a means for controlling the light source to be turned on and off, wherein the transmitted light quantity is changed by the density of the exposure pattern by the light source on / off control. apparatus.