JPH10121178A - Aluminum alloy clad plate for high-capacity magnetic disk substrate excellent in zincate treatment and undercoat treatment and its manufacturing method - Google Patents

Aluminum alloy clad plate for high-capacity magnetic disk substrate excellent in zincate treatment and undercoat treatment and its manufacturing method

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Publication number
JPH10121178A
JPH10121178A JP27615496A JP27615496A JPH10121178A JP H10121178 A JPH10121178 A JP H10121178A JP 27615496 A JP27615496 A JP 27615496A JP 27615496 A JP27615496 A JP 27615496A JP H10121178 A JPH10121178 A JP H10121178A
Authority
JP
Japan
Prior art keywords
aluminum alloy
magnetic disk
less
clad plate
core material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27615496A
Other languages
Japanese (ja)
Inventor
Kenichi Ogura
健一 小倉
Yoichiro Totsugi
洋一郎 戸次
Yoshinari Kubo
嘉成 久保
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Electric Co Ltd
Original Assignee
Furukawa Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd filed Critical Furukawa Electric Co Ltd
Priority to JP27615496A priority Critical patent/JPH10121178A/en
Publication of JPH10121178A publication Critical patent/JPH10121178A/en
Pending legal-status Critical Current

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Abstract

(57)【要約】 【課題】 ジンケート処理と下地めっきが良好になさ
れ、磁性体が平滑にめっきされる、安価な、高容量磁気
ディスク基板用アルミニウム合金クラッド板を提供す
る。 【解決手段】 Mg 2.0〜6.0wt%、Cu0.01〜0.05wt% 、Zn
0.05〜2.0wt%を含み、Mn0.05wt%未満、Cr 0.05wt%未満
の少なくとも1種を含み、不純物としてSi、Feを各々
0.05wt%以下含み、その他の不可避不純物元素を各々 0.
02wt%以下含み、残部がAlからなる皮材が、少なくともZ
nを3.0wt%未満含み、残部がAlと不可避不純物からなる
芯材の片面または両面にクラッドされているジンケート
処理性と下地処理性に優れた高容量磁気ディスク基板用
アルミニウム合金クラッド板。
PROBLEM TO BE SOLVED: To provide an inexpensive aluminum alloy clad plate for a high-capacity magnetic disk substrate in which zincate treatment and undercoating are performed well and a magnetic material is plated smoothly. SOLUTION: Mg 2.0 to 6.0 wt%, Cu 0.01 to 0.05 wt%, Zn
0.05 to 2.0 wt%, Mn less than 0.05 wt%, Cr at least one containing less than 0.05 wt%, Si and Fe as impurities respectively
0.05 wt% or less, and each other unavoidable impurity element
The skin material containing not more than 02 wt% and the balance of Al is at least Z
Aluminum alloy clad plate for high-capacity magnetic disk substrates excellent in zincate treatment and undercoating, containing less than 3.0 wt% of n and the remainder being clad on one or both sides of a core material composed of Al and unavoidable impurities.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、ジンケート処理と
下地めっきが良好になされ、磁性体が平滑にめっきされ
る、安価な、高容量化が可能な磁気ディスク基板用アル
ミニウム合金クラッド板およびその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an inexpensive and high capacity aluminum alloy clad plate for a magnetic disk substrate, which has a good zincate treatment and a good undercoating, and a smooth plating of a magnetic material. About the method.

【0002】[0002]

【従来の技術】近年、磁気ディスクには、マルチメディ
ア等のニーズから大容量化および高密度化が求められて
おり、磁気ディスクの1ビット当たりの磁気領域は益々
微細化され、また磁気ヘッドと磁気ディスクとの間隔も
狭まる傾向にある。このような状況の中で磁気ディスク
には平滑な磁性体皮膜の形成が要求されている。そし
て、このような磁気ディスクに用いられる基板には次の
特性が要求されている。非熱処理型(非析出硬化型)
の軽合金からなり、各種の加工および使用時の高速回転
に耐える十分な強度を有すること、研磨によりマイク
ロピット等のない良好な鏡面が得られること、下地め
っき後の表面が平滑でマイクロピット等の欠陥が生じな
いこと、下地めっき層の密着性が良いこと。
2. Description of the Related Art In recent years, a magnetic disk has been required to have a large capacity and a high density due to needs of multimedia and the like, and a magnetic area per bit of the magnetic disk has been further miniaturized. The distance from the magnetic disk also tends to decrease. Under such circumstances, the formation of a smooth magnetic film on the magnetic disk is required. The substrate used for such a magnetic disk is required to have the following characteristics. Non heat treatment type (non precipitation hardening type)
It has sufficient strength to withstand high-speed rotation during various processing and use, obtains a good mirror surface without micro pits by polishing, and has a smooth surface after under plating and No defects occur and the adhesion of the underlying plating layer is good.

【0003】従来、磁気ディスク用基板には、マイクロ
ピット等の原因になるFeやSi等の不純物元素を規定した
JIS-A-5086合金が用いられている。そして、この基板
は、半連続鋳造法で得た鋳塊(スラブ)を熱間圧延し、
次いで焼鈍を交えながら冷間圧延し、圧延材を円板状に
打抜き、この円板状体に、前処理として切削、研削、研
磨、脱脂、エッチング、ジンケート処理を施し、次いで
下地処理としてNi-P等の硬質非磁性金属の無電解めっき
とポリッシングを施した後、 Co-Ni-P合金等の磁性体を
スパッタリングして製造されている。
Conventionally, a magnetic disk substrate is provided with impurity elements such as Fe and Si which cause micropits or the like.
JIS-A-5086 alloy is used. And this substrate is hot rolled ingot (slab) obtained by semi-continuous casting method,
Next, cold rolling is performed while annealing is performed, and the rolled material is punched into a disc shape. This disc shape is subjected to cutting, grinding, polishing, degreasing, etching, zincate treatment as a pretreatment, and then Ni- as a base treatment. It is manufactured by subjecting a hard non-magnetic metal such as P to electroless plating and polishing, and then sputtering a magnetic material such as a Co-Ni-P alloy.

【0004】しかし、前記JIS-A-5086合金製基板は無電
解めっき後の表面の平滑性が十分でない。即ち、切削、
研削、研磨、ジンケート処理等の前処理の際に、金属間
化合物が突出して残存したり金属間化合物が脱落したり
して、下地めっき後のディスクの極表層にノジュール
(半球状の突起)やマイクロピットが発生する。前記ノ
ジュールは磁気ヘッドと衝突してヘッドクラッシュの原
因になり、マイクロピットは電気的エラーの原因にな
る。このため、磁気ディスクの表面品質の向上には、ア
ルミニウム合金基板中の金属間化合物の個数や大きさを
低減する対策が講じられてきたが、必ずしも十分な効果
が得られていない。他にも種々の対策が講じられている
が、いずれも処理工程が複雑で、製造コストが高いもの
である。なお、ノジュールの発生原因には、 Al-Fe系金
属間化合物等が表層に突出し、この突出部がめっきされ
てノジュールになる場合や、小さな凹部にジンケートが
凸状に優先成長し、この凸部がめっきされてノジュール
になる場合等がある。
However, the JIS-A-5086 alloy substrate has insufficient surface smoothness after electroless plating. That is, cutting,
During pretreatment such as grinding, polishing, and zincate treatment, the intermetallic compound protrudes and remains or the intermetallic compound falls off, causing nodules (hemispherical protrusions) or Micro pits occur. The nodules collide with the magnetic head and cause a head crash, and the micro pits cause an electrical error. Therefore, to improve the surface quality of the magnetic disk, measures have been taken to reduce the number and size of the intermetallic compounds in the aluminum alloy substrate, but a sufficient effect has not always been obtained. Various other measures have been taken, but all have complicated processing steps and high manufacturing costs. The nodules may be caused by an Al-Fe intermetallic compound or the like protruding into the surface layer and this protruding portion being plated to form a nodule, or zincate growing preferentially in a small concave portion in a convex shape. May be plated to form nodules.

【0005】このようなことから、本発明者等は、合金
元素の種類とその添加量を制御して欠陥の少ない下地め
っき層(無電解Ni-P合金めっき層)が得られる磁気ディ
スク基板用アルミニウム合金板を提案した(特開平2-97
639 号公報)。この磁気ディスク基板用アルミニウム合
金板は既に実用化され、高い評価を得ている。しかし、
この材料は高純度の地金を使用するために高価であり、
また強度も十分でない。
[0005] From the above, the present inventors have proposed a method for controlling a type of alloy element and the amount of addition thereof to obtain a base plating layer (electroless Ni-P alloy plating layer) with few defects to obtain a magnetic disk substrate. Proposed aluminum alloy plate (Japanese Unexamined Patent Publication No. 2-97
No. 639). This aluminum alloy plate for a magnetic disk substrate has already been put to practical use and has been highly evaluated. But,
This material is expensive due to the use of high purity bullion,
Also, the strength is not enough.

【0006】また、最近、高強度化を目的として、芯材
に時効硬化型アルミニウム合金のAl-Mg-Zn系合金 (7000
系合金) を使用し、この芯材にめっき性が良好な Al-Mg
系合金 (5000系合金) をクラッドしたものが開発されて
いる(特開平5-9633号公報および特開平 5-43970号公
報)。しかし、このクラッド板は、芯材にZnを多量(通
常4wt%以上) に含む7000系合金を使用しているため、芯
材と皮材の電位差が大きく、ジンケート処理前のエッチ
ング工程で芯材が優先的に溶解し皮材との間に段差が生
じることがある。段差が大きくなると、磁気ディスクを
シャフトに装填する際に段差部分が引掛かり皮材が剥離
することがある。また芯材と皮材の組成を適正に組合わ
せないと圧延圧接で十分な接合強度が得られない場合が
ある。
Recently, for the purpose of increasing the strength, an Al-Mg-Zn alloy (7000) of an age hardening type aluminum alloy has been used as a core material.
Al-Mg with good plating properties
An alloy clad with a base alloy (5000 series alloy) has been developed (JP-A-5-9633 and JP-A-5-43970). However, since this clad plate uses a 7000 series alloy containing a large amount of Zn (normally 4 wt% or more) as the core material, the potential difference between the core material and the skin material is large, and the core material is used in the etching process before zincate treatment. May be preferentially dissolved and a step may occur with the skin material. When the step is large, the step may be caught when the magnetic disk is loaded on the shaft, and the skin material may peel off. Further, if the compositions of the core material and the skin material are not properly combined, sufficient bonding strength may not be obtained by rolling welding.

【0007】[0007]

【発明が解決しようとする課題】本発明者等は、マトリ
ックスと金属間化合物(Al-Fe系金属間化合物やMg2Si 金
属間化合物) との間の自然電位差を小さくし、マイクロ
ピットやノジュールの発生を抑えた高容量磁気ディスク
基板用アルミニウム合金とその製造方法については先に
特許出願をした(特願平8-258607号) 。これに対し、本
発明は、ジンケート処理と下地めっきが良好になされ、
磁性体が平滑にめっきされる、安価な、高容量磁気ディ
スク基板用アルミニウム合金クラッド板およびその製造
方法の提供を目的とする。
DISCLOSURE OF THE INVENTION The present inventors have reduced the natural potential difference between a matrix and an intermetallic compound (Al-Fe intermetallic compound or Mg 2 Si intermetallic compound) to reduce micropits and nodules. A patent application was previously filed for a high-capacity aluminum alloy for a high-capacity magnetic disk substrate in which the occurrence of cracks was suppressed (Japanese Patent Application No. 8-258607). On the other hand, in the present invention, zincate treatment and base plating are performed favorably,
It is an object of the present invention to provide an inexpensive aluminum alloy clad plate for a high-capacity magnetic disk substrate on which a magnetic material is plated smoothly and a method for manufacturing the same.

【0008】前述のように、磁気ディスクは年々大容量
化、高密度化の傾向にあり、近年では2GB/枚以上の
記憶容量が要求されている。この高容量化の方法には、
磁気ヘッドの浮上高さ(グライドハイト)を低くするこ
とが考えられている。しかし、現用の基板では、前述の
ように、下地めっき後の表裏面にノジュールやマイクロ
ピットが生じることがある。このノジュールやマイクロ
ピットの影響はグライドハイトが低くなる程大きくな
る。さらに、下地めっき後のポリッシング工程では、端
部のダレ防止と経済性の点から、ポリッシング量を減ら
す傾向にある。その結果、ポリッシング後も、ノジュー
ルやマイクロピットが残存する事態が起き始めている。
このようなことから、ノジュールやマイクロピットの低
減は磁気ディスクの高容量化に向けて解決すべき重要課
題の1つになっている。
As described above, the capacity of magnetic disks has been increasing year by year, and the density has been increasing. In recent years, a storage capacity of 2 GB / sheet or more has been required. This high capacity method includes:
It has been considered to reduce the flying height (glide height) of the magnetic head. However, as described above, nodules and micro pits may be formed on the front and back surfaces of the working substrate as described above. The effect of the nodules and micro pits increases as the glide height decreases. Further, in the polishing step after the base plating, the amount of polishing tends to be reduced from the viewpoint of preventing sagging of the end portion and economy. As a result, a situation in which nodules and micropits remain even after polishing has started to occur.
For this reason, reduction of nodules and micropits is one of the important issues to be solved for increasing the capacity of a magnetic disk.

【0009】ノジュールやマイクロピットの低減には、
SiやFeなどの不純物元素の少ない高純度地金を使用する
方法が考えられる。例えば、純度 99.9wt%程度のアルミ
ニウム地金に代えて99.99wt%純度のアルミニウム地金を
用いる方法だが、99.99wt%純度のアルミニウム地金は 9
9.9wt%純度のものに較べて格段に高価で、またその量も
限られるという問題がある。
In order to reduce nodules and micro pits,
A method using a high-purity metal with few impurity elements such as Si and Fe can be considered. For example, a method of using 99.99 wt% pure aluminum in place of 99.9 wt% pure aluminum, but 99.99 wt% pure aluminum
There is a problem that it is much more expensive than that of 9.9 wt% purity, and its amount is limited.

【0010】本発明者等は、前記課題について種々検討
を行い、磁性体が平滑にめっきされるには、前処理のジ
ンケート皮膜が薄く、均一に、緻密に形成され、その上
に下地めっきが良好になされる必要があり、そのために
はノジュールやマイクロピットがなく、結晶粒が微細な
素材の提供が不可欠なことを確認した。そしてこのよう
なジンケート処理性と下地処理性に優れた素材は、高純
度地金を用い、添加元素の種類と量を選択することによ
り製造可能なことを見出した。また素材にクラッド板を
用い、高純度地金は磁性体を形成する皮材にのみ使用す
ることにより大幅なコストアップを避けることにした。
The present inventors have conducted various studies on the above-mentioned problems, and found that the zincate coating of the pretreatment is thin, uniform, and densely formed, and the underlying plating is formed thereon in order for the magnetic material to be plated smoothly. It was confirmed that it was necessary to provide a material that had no nodules or micropits and had fine crystal grains. It has been found that such a material excellent in zincate treatment and undercoat treatment can be produced by using a high-purity ingot and selecting the type and amount of the additive element. Also, by using a clad plate as the material and using high-purity metal only for the skin material forming the magnetic material, it was decided to avoid a significant increase in cost.

【0011】[0011]

【課題を解決するための手段】請求項1記載の発明は、
Mg 2.0〜6.0wt%、Cu0.01〜0.05wt% 、Zn0.05〜2.0wt%を
含み、Mn 0.05wt%未満、Cr 0.05wt%未満の少なくとも1
種を含み、不純物としてSi、Feを各々 0.05wt%以下含
み、その他の不可避不純物元素を各々 0.02wt%以下含
み、残部がAlからなる皮材が、少なくともZnを3.0wt%未
満含み、残部がAlと不可避不純物からなる芯材の片面ま
たは両面にクラッドされていることを特徴とするジンケ
ート処理性と下地処理性に優れた高容量磁気ディスク基
板用アルミニウム合金クラッド板である。
According to the first aspect of the present invention,
Mg 2.0-6.0 wt%, Cu0.01-0.05wt%, Zn0.05-2.0wt%, at least one of Mn less than 0.05wt%, Cr less than 0.05wt%
Seeds, each containing 0.05 wt% or less of Si and Fe as impurities, each containing 0.02 wt% or less of other unavoidable impurity elements, and a skin material made up of Al with a balance of less than 3.0 wt% Zn and a balance of An aluminum alloy clad plate for a high-capacity magnetic disk substrate excellent in zincate treatment and undercoating, characterized in that it is clad on one or both sides of a core material composed of Al and unavoidable impurities.

【0012】請求項2記載の発明は、請求項1に記載す
る芯材と皮材の組成を式F=Si+Fe+2Cu +2Mn +3Mg
+0.5Zn(式中Si,Fe,Cu,Mn,Mg,Zn は各々のwt%)にそれぞ
れ代入して得られる芯材のF値 (Fb)と皮材のF値 (F
s)との比 [Fb/Fs]が 0.6以上であることを特徴とする
ジンケート処理性と下地処理性に優れた高容量磁気ディ
スク基板用アルミニウム合金クラッド板である。
According to a second aspect of the present invention, the composition of the core material and the skin material according to the first aspect is represented by the formula F = Si + Fe + 2Cu + 2Mn + 3Mg
+ 0.5Zn (where Si, Fe, Cu, Mn, Mg, and Zn are each wt%) and the F value (Fb) of the core material and the F value (F
An aluminum alloy clad plate for a high-capacity magnetic disk substrate, which is excellent in zincate processability and underlayer processability, wherein the ratio [Fb / Fs] to s) is 0.6 or more.

【0013】請求項3記載の発明は、アルミニウム合金
芯材の片面または両面に皮材をクラッドした複合素材
に、熱間圧延、冷間圧延、最終焼鈍を施す高容量磁気デ
ィスク基板用アルミニウム合金クラッド板の製造方法に
おいて、熱間圧延後の冷却、冷間圧延途中の中間焼鈍後
の冷却、および最終焼鈍後の冷却を、それぞれ 240〜15
0 ℃間で30〜600 ℃/hr の速度で行い、冷間圧延を、 2
0%以上の圧延率で3回以上、全圧延率 60%以上の条件で
行うことを特徴とする請求項3記載の高容量磁気ディス
ク基板用アルミニウム合金クラッド板の製造方法であ
る。
According to a third aspect of the present invention, there is provided an aluminum alloy clad for a high-capacity magnetic disk substrate, comprising subjecting a composite material obtained by cladding a skin material on one or both surfaces of an aluminum alloy core material to hot rolling, cold rolling and final annealing. In the sheet manufacturing method, cooling after hot rolling, cooling after intermediate annealing during cold rolling, and cooling after final annealing are each 240 to 15 times.
0 ° C at a rate of 30-600 ° C / hr.
4. The method for producing an aluminum alloy clad plate for a high-capacity magnetic disk substrate according to claim 3, wherein the rolling is performed three times or more at a rolling rate of 0% or more and at a total rolling rate of 60% or more.

【0014】[0014]

【発明の実施の形態】本発明にて用いる皮材は、Mg、C
u、Znを含有し、さらにMn、Crのうちの1種または2種
を含有し、不可避不純物元素を所定値以下に規定したア
ルミニウム合金材である。前記合金元素のうち、Mgは主
として切削性および研削性を改善して皮材の表面品質を
向上させる。その含有量を 2.0〜6.0wt%に規定した理由
は、2.0wt%未満ではその効果が十分に得られず、6.0wt%
を超えると Al-Mg系金属間化合物が生成するとともに、
溶解鋳造時の高温酸化によって MgO等の非金属介在物が
多量に生成し、マイクロピットなどの発生原因になるた
めである。Mgの含有量は、切削性並びに研削性、および
製造の容易さの兼合いから 2.0〜5.0wt%が特に望まし
い。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The skin material used in the present invention is Mg, C
An aluminum alloy material containing u and Zn, and further containing one or two of Mn and Cr, and having an unavoidable impurity element regulated to a predetermined value or less. Among the alloying elements, Mg mainly improves the machinability and grindability to improve the surface quality of the skin material. The reason for defining the content to be 2.0 to 6.0 wt% is that if the content is less than 2.0 wt%, the effect cannot be sufficiently obtained, and
If it exceeds, an Al-Mg based intermetallic compound is generated,
Non-metallic inclusions such as MgO are generated in large quantities by high-temperature oxidation during melting and casting, which may cause micro-pits and the like. The content of Mg is particularly preferably 2.0 to 5.0% by weight in view of the balance between machinability and grindability and ease of production.

【0015】CuとZnはジンケート処理時のAl溶解量を減
少させ、またジンケート皮膜を均一に、薄く、緻密に付
着させる。その結果、無電解めっき(下地めっき)層の
密着性が向上する。Cuの含有量を0.01〜0.05wt% に規定
した理由は、 0.01wt%未満ではその効果が十分に得られ
ず、 0.05wt%を超えると材料自体の耐食性が低下するた
めである。耐食性が低下するとジンケート皮膜が不均一
となり、下地めっき層の密着性や下地めっき層表面の平
滑性が低下する。Znの含有量を0.05〜2.0wt%に規定した
理由は、 0.05wt%未満ではその効果が十分に得られず、
2.0wt%を超えると、加工性および耐食性が低下するため
である。
Cu and Zn reduce the amount of Al dissolved during the zincate treatment, and make the zincate film adhere uniformly, thinly and densely. As a result, the adhesion of the electroless plating (base plating) layer is improved. The reason why the content of Cu is specified to be 0.01 to 0.05 wt% is that if the content is less than 0.01 wt%, the effect is not sufficiently obtained, and if the content exceeds 0.05 wt%, the corrosion resistance of the material itself is reduced. When the corrosion resistance decreases, the zincate film becomes non-uniform, and the adhesion of the undercoat layer and the smoothness of the undercoat layer surface decrease. The reason for limiting the Zn content to 0.05 to 2.0 wt% is that if the content is less than 0.05 wt%, the effect cannot be sufficiently obtained.
If the content exceeds 2.0% by weight, workability and corrosion resistance are reduced.

【0016】MnまたはCrは鋳造時に微細な金属間化合物
を生成するが、一部はマトリックスに固溶して強度向上
に寄与する。また切削性と研削性を高め、さらに再結晶
組織を微細にして、下地めっき層の密着性を向上させ
る。MnまたはCrの含有量を各々0.05wt% 未満に規定した
理由は、 0.05wt%を超えると鋳造時に過剰分が晶出する
と同時に粗大な金属間化合物が生成し、エッチング時、
ジンケート処理時、切削や研削加工時に金属間化合物が
脱落してマイクロピットなどの発生原因になるためであ
る。MnまたはCrは単独でも効果があるが、共存させると
その効果は更に大きくなる。なお、Mnは Al-Fe系化合物
と結合してAl-Fe-Mn系化合物を生成するため、Mnの上限
は 0.03wt%とするのが望ましい。Mn程ではないがCrにも
同様の傾向が認められるのでその上限は 0.04wt%とする
のが望ましい。
Mn or Cr forms a fine intermetallic compound at the time of casting, but partly forms a solid solution in a matrix and contributes to improvement in strength. In addition, it enhances the machinability and grindability, further refines the recrystallized structure, and improves the adhesion of the base plating layer. The reason that the content of each of Mn and Cr is specified to be less than 0.05 wt% is that if it exceeds 0.05 wt%, an excessive amount is crystallized at the time of casting, and at the same time a coarse intermetallic compound is generated.
This is because the intermetallic compounds fall off during zincate treatment, cutting or grinding, and cause micropits and the like. Although Mn or Cr is effective even when used alone, its effect is further enhanced when coexisting. Since Mn combines with an Al-Fe compound to form an Al-Fe-Mn compound, the upper limit of Mn is preferably set to 0.03 wt%. Although not as much as Mn, the same tendency is observed for Cr, so the upper limit is preferably set to 0.04 wt%.

【0017】不可避不純物元素のうち、Si、Fe、Tiはア
ルミニウム中には殆ど固溶せず、金属間化合物として存
在する。Si、Fe、Tiなどの上限を規定した理由は、これ
らの量が多いと Al-Fe系や Mg2Si等の粗大な金属間化合
物が多数生成して、マイクロピットなどの発生原因にな
るためである。また他の不可避不純物元素(例えばNi、
B 等)は、各々が 0.02wt%以下であれば、本発明で得ら
れる合金板の特性を阻害するようなことはない。
Of the unavoidable impurity elements, Si, Fe, and Ti hardly form a solid solution in aluminum, but exist as intermetallic compounds. The reason for specifying the upper limit of Si, Fe, Ti, etc. is that if these amounts are large, a large number of coarse intermetallic compounds such as Al-Fe system and Mg 2 Si are generated, which may cause micro-pits and the like. It is. Also, other unavoidable impurity elements (for example, Ni,
B etc.) do not impair the properties of the alloy sheet obtained by the present invention if each is 0.02 wt% or less.

【0018】本発明において、芯材中のZnは芯材の電位
を卑にする。Znの含有量が多過ぎるとエッチング工程で
芯材が優先的に溶解して皮材との境界に段差が生じた
り、極端な場合は皮材が剥離したりする。従ってその含
有量は3.0wt%未満に規定する。
In the present invention, Zn in the core material makes the potential of the core material low. If the content of Zn is too large, the core material is preferentially dissolved in the etching step, causing a step at the boundary with the skin material, or in extreme cases, the skin material peels off. Therefore, its content is specified to be less than 3.0 wt%.

【0019】本発明において、皮材と芯材をクラッドす
るには種々の方法が適用できるが、特に、ブレージング
シートの製造に使用されている圧延圧接法は生産性に富
み好適である。この圧延圧接法は、芯材と皮材の合わせ
材に、熱間圧延、冷間圧延、最終焼鈍を施して行われ
る。本発明のクラッド板は、芯材のZn含有量を3.0wt%未
満とし、且つ、式、F=Si+Fe+ 2Cu+ 2Mn+ 3Mg+0.
5Zn(式中Si,Fe,Cu,Mn,Mg,Zn は各々のwt%)で表される芯
材のF値 (Fb)と皮材のF値 (Fs)との比 [Fb/Fs]が
0.6以上になるようにすれば、圧延圧接法などでの接合
がより良好になされる。比 [Fb/Fs]が 0.6を下回る
と、つまり皮材の合金濃度が高まり芯材との間で変形抵
抗に差がでてくると熱間圧延時に芯材が優先的に圧延さ
れて皮材が十分に圧延されなくなり接合強度が低下する
ようになる。前記式に基づくFb とFs の関係は多くの
実験を行って明らかにしたものである。
In the present invention, various methods can be applied to clad the skin material and the core material. In particular, the rolling pressure welding method used for the production of the brazing sheet has high productivity and is suitable. This rolling pressure welding method is performed by subjecting a combined material of a core material and a skin material to hot rolling, cold rolling, and final annealing. In the clad plate of the present invention, the Zn content of the core material is less than 3.0 wt%, and the formula: F = Si + Fe + 2Cu + 2Mn + 3Mg + 0.
Ratio of F value (Fb) of core material and F value (Fs) of skin material expressed as 5Zn (where Si, Fe, Cu, Mn, Mg, and Zn are each wt%) [Fb / Fs] But
When it is set to 0.6 or more, the joining by the rolling pressure welding method or the like is more preferably performed. When the ratio [Fb / Fs] is less than 0.6, that is, when the alloy concentration of the skin material increases and a difference occurs in the deformation resistance between the core material and the core material, the core material is preferentially rolled during hot rolling and the skin material is rolled. Is not sufficiently rolled, and the bonding strength is reduced. The relationship between Fb and Fs based on the above equation has been clarified through many experiments.

【0020】本発明のアルミニウム合金板は、芯材に皮
材をクラッドしたものなので、地金純度を上げてマイク
ロピットやノジュール等の欠陥を低減させる場合、高純
度地金は、表面欠陥が問題となる皮材にのみ用いれば良
く、芯材には前記組成を満足する範囲で安価な低純度地
金を用いることができる。従って高純度地金を用いるこ
とによるコストアップを低く抑えることができる。
Since the aluminum alloy plate of the present invention is obtained by cladding a core material with a skin material, when increasing the purity of the metal to reduce defects such as micropits and nodules, high purity metal has a problem of surface defects. The core material may be an inexpensive low-purity metal as long as the above composition is satisfied. Therefore, the cost increase due to the use of the high-purity metal can be suppressed low.

【0021】前記圧延圧接法での皮材の片面当たりのク
ラッド率{ [皮材の厚さ/(芯材の厚さ+皮材の厚さ)]×
100%}は 30%以下であることが望ましい。クラッド率が
30%を超えると、圧接時に芯材と皮材の界面に発生する
剪断力が弱まり、十分な接合強度が得られなくなる。
Clad ratio per side of skin material in the above-mentioned rolling pressure welding method {[Thickness of skin material / (thickness of core material + thickness of skin material)] ×
100%} is preferably 30% or less. Cladding rate
If it exceeds 30%, the shearing force generated at the interface between the core material and the skin material at the time of pressure welding is weakened, and sufficient bonding strength cannot be obtained.

【0022】本発明において、皮材に含まれる金属間化
合物は、アルカリエッチングやジンケート処理時、アル
ミニウム合金基板の切削および研削加工時に脱落してマ
イクロピット等の表面欠陥の原因になる。この欠陥は、
研削加工や無電解めっきにより縮小する。しかし10μm
を超える金属間化合物は、最終的に有害欠陥として残る
ことが多い。従ってその径は10μm以下とすることが望
ましい。
In the present invention, the intermetallic compound contained in the skin material falls off during alkali etching or zincate treatment, or during cutting and grinding of an aluminum alloy substrate, causing surface defects such as micropits. This flaw,
Reduced by grinding or electroless plating. But 10μm
The intermetallic compound exceeding the amount often ultimately remains as a harmful defect. Therefore, it is desirable that the diameter be 10 μm or less.

【0023】本発明では、前記熱間圧延後、冷間加工途
中で行う中間焼鈍後、最終焼鈍後の各冷却過程で 240〜
150 ℃までの温度領域における冷却は、冷却速度30〜60
0 ℃/hr で行う。前記温度領域は、 240℃を超える温度
では Mg2Siは析出せず、 150℃未満の温度では析出速度
が遅いこと等の理由に基づいて規定した。また冷却速度
は、30℃/hr 未満では Mg2Siの析出量が多くなり、 600
℃/hr を超えると熱ひずみが発生し素板の平坦度が低下
するため規定した。前記冷却工程では、任意の冷却方法
が適用できるが、特に強制空冷、ミストクエンチ噴射、
水槽内通過等の方法は簡便で望ましい。ここで芯材と皮
材の合わせ材の熱間圧延は圧延が可能な温度まで加熱す
れば良い。しかし、熱間圧延の可否や圧延材の結晶粒の
粗大化および溶融などの問題を考慮すると熱間圧延温度
は 350〜550 ℃の範囲が望ましい。
In the present invention, after the hot rolling, the intermediate annealing performed during the cold working, and the cooling process after the final annealing, 240 to
Cooling in the temperature range up to 150 ° C is performed at a cooling rate of 30-60
Perform at 0 ° C / hr. The temperature range is defined based on the reason that Mg 2 Si does not precipitate at a temperature exceeding 240 ° C. and the deposition rate is slow at a temperature lower than 150 ° C. When the cooling rate is lower than 30 ° C / hr, the amount of Mg 2 Si
If the temperature exceeds ℃ / hr, thermal strain occurs and the flatness of the raw material is reduced, so it is specified. In the cooling step, any cooling method can be applied, in particular, forced air cooling, mist quench injection,
A method such as passing through a water tank is simple and desirable. Here, the hot rolling of the combined material of the core material and the skin material may be performed by heating to a temperature at which rolling is possible. However, the hot rolling temperature is preferably in the range of 350 to 550 ° C. in consideration of the possibility of hot rolling and the problems of coarsening and melting of crystal grains of the rolled material.

【0024】本発明では、冷間圧延での1回の圧延率を
20%以上とし、この冷間圧延を3回以上施し、且つ全圧
下率を 60%以上とすることにより、 Al-Fe系金属間化合
物が十分に粉砕され、下地めっき処理後のマイクロピッ
トやノジュールの発生を抑制できる。
In the present invention, the rolling reduction in one cold rolling is
20% or more, this cold rolling is performed 3 times or more, and the total rolling reduction is 60% or more, the Al-Fe intermetallic compound is sufficiently pulverized, and the micro pits and nodules after the base plating treatment Can be suppressed.

【0025】前記の冷却条件と冷間圧延条件を満足する
ことで、 Mg2Siおよび Al-Fe系金属間化合物の生成を大
幅に低減できる。
By satisfying the above cooling conditions and cold rolling conditions, the production of Mg 2 Si and Al—Fe intermetallic compounds can be greatly reduced.

【0026】本発明のアルミニウム合金板を圧延圧接法
で製造するにあたり、皮材は半連続鋳造法で得た鋳塊を
均質化処理したのち、熱間圧延して所定寸法の板材とす
る。この時の均質化処理や熱間圧延の温度条件は、皮材
の組成に応じて最適に選定する。但し、この温度が高す
ぎると鋳塊の結晶粒が粗大化したり、極端な場合は溶融
したりする。一方、温度が低すぎると熱間圧延時の変形
抵抗が大きくなり、圧延機の能力を超えた時は圧延でき
なくなる。これらを加味して均質化処理温度又は熱間圧
延の開始温度は 350〜550 ℃が望ましい。また、熱間圧
延後の素板を硝酸や苛性ソーダ等で素洗いすると、熱間
加工で生成した酸化層が除去され、後の芯材との圧接が
良好になされる。
In producing the aluminum alloy sheet of the present invention by the rolling pressure welding method, the skin material is obtained by homogenizing an ingot obtained by a semi-continuous casting method and then hot rolling to a sheet material having a predetermined size. The temperature conditions for the homogenization and hot rolling at this time are optimally selected according to the composition of the skin material. However, if the temperature is too high, the crystal grains of the ingot become coarse, and in extreme cases, they melt. On the other hand, if the temperature is too low, the deformation resistance at the time of hot rolling increases, and if the temperature exceeds the capacity of the rolling mill, rolling cannot be performed. Taking these factors into consideration, the homogenization treatment temperature or the hot rolling start temperature is desirably 350 to 550 ° C. Further, when the raw sheet after hot rolling is washed with nitric acid, caustic soda, or the like, an oxide layer generated by hot working is removed, and the pressure contact with the core material afterwards is performed well.

【0027】一方、芯材には、例えば、半連続鋳造法で
得た鋳塊を均質化処理して組織を均一化したものを用い
る。均質化処理後面削して酸化皮膜を除去しておくと、
皮材との圧接が良好になされる。均質化処理の温度範囲
は前記皮材の場合と同様に 350〜550 ℃が望ましい。
On the other hand, as the core material, for example, a material obtained by homogenizing an ingot obtained by a semi-continuous casting method and having a uniform structure is used. If the oxide film is removed by grinding after homogenization,
Good pressure contact with the skin material. The temperature range of the homogenization treatment is desirably 350 to 550 ° C. as in the case of the skin material.

【0028】[0028]

【実施例】以下に本発明を実施例により詳細に説明す
る。 (実施例1)表1、2、3に示す組成の皮材及び芯材を
用いて作製した片面合わせ材を 500℃に再熱後、厚さ2.
30mmに熱間圧延し、次いで0.82mmに冷間圧延した。次に
この冷間圧延材を所定の寸法に切断し、これを素洗いし
てクラッド率約10% のクラッド板を製造した。
The present invention will be described below in detail with reference to examples. (Example 1) A single-sided mating material prepared using a skin material and a core material having the compositions shown in Tables 1, 2 and 3 was reheated to 500 ° C, and the thickness was 2.
It was hot rolled to 30 mm and then cold rolled to 0.82 mm. Next, the cold-rolled material was cut into a predetermined size, and washed to prepare a clad plate having a clad ratio of about 10%.

【0029】なお、前記皮材と芯材の製造方法、合わせ
材の熱間圧延、冷間圧延、素洗い条件の詳細を下記に示
す。 皮材の製造方法:常法にて鋳造した厚さ30mmの鋳塊を
両面 5mmづつ切削して厚さ20mmにし、これを均質化処理
(450℃×2hr + 520℃×2hr)後、厚さ 5mmの板材に熱間
圧延し(圧延開始温度 470℃、終了温度 230℃、冷却速
度50℃/hr)、この板材を所定の寸法に切断して、素洗い
〔湯洗→3%硝酸デスマット(1分) →5%苛性ソーダ(5分)
→3%硝酸デスマット(1分) →湯洗〕する。 芯材の製造方法:常法にて鋳造した厚さ60mmの鋳塊を
均質化処理(450℃×2hr + 520℃×2hr)後、両面10mmづ
つ切削して厚さ40mmにする。 合わせ材の熱間圧延:圧延開始温度 470℃、 コイル巻上
げ温度 260℃、冷却速度50℃/hr 、板厚2.30mm。 合わせ材の冷間圧延:1パス目 1.60mm(圧下率30%)、
2パス目1.12mm(圧下率30%)、 3パス目0.82mm(圧下率
27%)、トータル圧下率64% 。 合わせ材の素洗い:皮材の素洗いと同じ。
The details of the method for producing the skin material and the core material, and the conditions for hot rolling, cold rolling and unwashing of the combined material are shown below. Production method of leather material: A 30mm thick ingot cast by the usual method is cut into 5mm on both sides to make 20mm thick and homogenized.
(450 ° C x 2hr + 520 ° C x 2hr), then hot-rolled to a 5mm thick sheet (rolling start temperature 470 ° C, end temperature 230 ° C, cooling rate 50 ° C / hr) Cut and unwash (wash with hot water → 3% nitric acid desmut (1 minute) → 5% caustic soda (5 minutes)
→ 3% nitric acid desmut (1 minute) → hot water washing. Manufacturing method of core material: A 60 mm thick ingot cast by a conventional method is homogenized (450 ° C. × 2 hours + 520 ° C. × 2 hours) and then cut into 10 mm on both sides to a thickness of 40 mm. Hot rolling of laminated material: Rolling start temperature 470 ° C, coil winding temperature 260 ° C, cooling rate 50 ° C / hr, sheet thickness 2.30mm. Cold rolling of laminated material: 1.60 mm in the first pass (30% reduction),
1.12mm at second pass (30% rolling reduction), 0.82mm at third pass (rolling reduction)
27%), total reduction 64%. Unwashing of laminated material: Same as unwashing of skin material.

【0030】前記クラッド板から外径96mm、内径24mmの
ドーナツ板を打抜き、これを 340℃で4時間焼鈍した
後、50℃/hr の冷却速度で冷却し、更にグラインディン
グ加工を行った。その後、下記手順により表面処理と無
電解めっきを行った。即ち、アセトンで脱脂→5%NaOH水
溶液(40℃)に30秒間浸漬してエッチング→30%HNO3
溶液(室温)で30秒間デスマット→アーブ302ZN(商品
名、奥野製薬)を用いてダブルジンケート処理→ナイク
ラッド719(商品名、奥野製薬) を用いてNi-Pを17μm厚
さに無電解めっき→羽布により仕上げ研磨(研磨量4μ
m)。
A donut plate having an outer diameter of 96 mm and an inner diameter of 24 mm was punched from the clad plate, annealed at 340 ° C. for 4 hours, cooled at a cooling rate of 50 ° C./hr, and further subjected to grinding. Thereafter, surface treatment and electroless plating were performed according to the following procedure. That is, degreasing with acetone → immersing in a 5% NaOH aqueous solution (40 ° C) for 30 seconds and etching → desmutting with a 30% HNO 3 aqueous solution (room temperature) for 30 seconds → double zincate treatment using ARB 302ZN (trade name, Okuno Pharmaceutical) → Electroless plating of Ni-P to a thickness of 17μm using Niclad 719 (trade name, Okuno Pharmaceutical Co., Ltd.)
m).

【0031】エッチング後のドーナツ板の端部の段差
の有無、無電解めっき皮膜の密着性、同皮膜の研磨
後の表面粗度、同皮膜の表面品質、同皮膜の耐食性
について調べた。結果を表3、4に示す。表3、4には
クラッドの可否も併記した。については、端部を目視
観察して、段差がないものとあるものを評価した。に
ついては、無電解めっき材から 50mm2のサンプルを切出
し、これを 400℃に30分間加熱後、直ちに水冷してめっ
き皮膜の剥離または膨れの有無を調べた。について
は、万能表面粗さ計SE−3H(小坂研究所製)によ
り、JIS-B-0601に規定されている中心線粗さRa(μ
m)を4点測定し、その平均値を表示した。表面粗さは
Raの平均値が 0.5μm以下を合格とし、0.5 μmを超
えるものを不合格とした。については、表面を顕微鏡
観察して、深さが3μmを超えるピット又はノジュール
をがないものは○、あるものは×で表示した。につい
ては、無電解めっき材を1規定の塩酸溶液(室温)中に
24時間浸漬後のめっき皮膜の性状を観察して行った。皮
膜に剥離や膨れのないものを○、少数あるものを△、多
数あるものを×で表示した。
[0031] The presence or absence of a step at the end of the donut plate after etching, the adhesion of the electroless plating film, the surface roughness after polishing of the film, the surface quality of the film, and the corrosion resistance of the film were examined. The results are shown in Tables 3 and 4. Tables 3 and 4 also show the possibility of cladding. With regard to, those having no step were evaluated by visually observing the end portions. For, a sample of 50 mm 2 was cut out from the electroless plated material, heated at 400 ° C. for 30 minutes, immediately cooled with water, and examined for peeling or blistering of the plating film. Is measured by a universal surface roughness meter SE-3H (manufactured by Kosaka Laboratories) using a center line roughness Ra (μ) specified in JIS-B-0601.
m) was measured at four points, and the average value was displayed. The surface roughness was determined to be acceptable when the average value of Ra was 0.5 μm or less, and was rejected when the average value exceeded 0.5 μm. Regarding, the surface was observed with a microscope, and those having no pits or nodules having a depth exceeding 3 μm were indicated by ○, and those having certain pits or nodules were indicated by ×. About electroless plating material in 1N hydrochloric acid solution (room temperature)
This was performed by observing the properties of the plating film after immersion for 24 hours. The film without peeling or swelling was indicated by ○, the one with a small number was indicated by △, and the one with a large number was indicated by ×.

【0032】[0032]

【表1】 [Table 1]

【0033】[0033]

【表2】 [Table 2]

【0034】[0034]

【表3】 [Table 3]

【0035】表1〜3より明らかなように、本発明例品
(No.1〜14) は、いずれも、良好な特性を示した。これ
に対し、比較例品の No.15は皮材にCuが含まれていない
ため、 No.16は皮材のZn量が少ないため、ともに下地
(無電解)めっき層の密着性が低下した。No.17 皮材の
Zn量が多いため下地めっき層の密着性が著しく低下し、
また表面粗度と耐食性が低下した。No.18 は皮材にMnと
Crが全く含まれていないため下地めっき層の密着性が低
下した。No.19,20は皮材に不純物元素のSiまたはFeが多
いため下地めっき層表面に欠陥が生じた。No.21 は皮材
のMgが少ないためドーナツ板の端部に段差が生じ、また
下地めっき層の表面粗度が低下した。No.22 は皮材のMg
が多いため、No.23 は皮材にTiが多いため、ともに下地
めっき層表面に欠陥が生じた。No.24,28は比 [Fb/Fs]
が 0.6未満のため芯材と皮材が十分に接合されなかっ
た。No.25,26,27,29はいずれも芯材のZn量が多ためドー
ナツ板の端部に段差が生じた。しかも No.25は皮材のCu
とMn量が多く、 No.26は皮材のCu量が多く、 No.27は皮
材のCu量が多い上、皮材にMnとCrが含まれないため、い
ずれも下地めっき層の密着性が著しく低下し、また表面
粗度も低下した。No.29 は皮材のCuが多いため密着性が
低下し、また表面粗度もやや低下した。
As is clear from Tables 1 to 3, the products of the present invention
(Nos. 1 to 14) all showed good characteristics. In contrast, No. 15 of the comparative example product did not contain Cu in the skin material, and No. 16 had low adhesion of the base (electroless) plating layer in both cases because the Zn content of the skin material was small. . No.17
Due to the large amount of Zn, the adhesion of the underlying plating layer is significantly reduced,
In addition, the surface roughness and corrosion resistance decreased. No.18 is Mn in the skin material
Since no Cr was contained, the adhesion of the underlying plating layer was reduced. In Nos. 19 and 20, defects were generated on the surface of the base plating layer due to the large amount of impurity element Si or Fe in the skin material. In No. 21, since the skin material contained less Mg, a step was formed at the end of the donut plate, and the surface roughness of the base plating layer was reduced. No.22 is Mg of leather material
No. 23 had a large amount of Ti in the skin material, and both had defects on the underlying plating layer surface. No.24 and 28 are ratios [Fb / Fs]
Was less than 0.6, the core material and the skin material were not sufficiently bonded. Nos. 25, 26, 27 and 29 all had a large amount of Zn in the core material, so that a step occurred at the end of the donut plate. And No. 25 is Cu of leather material
No.26 has a large amount of Cu in the skin material, No.27 has a large amount of Cu in the skin material, and the skin material does not contain Mn and Cr. The properties were significantly reduced, and the surface roughness was also reduced. In No. 29, the adhesion was reduced due to the large amount of Cu in the skin material, and the surface roughness was also slightly reduced.

【0036】(実施例2)表1に示す本発明合金の合金
No.1と比較材の合金No.15 の皮材及び芯材を用いて合わ
せ材を作製し、この合わせ材を 500℃に再熱後、圧延開
始温度 470℃で種々の厚さに熱間圧延し、次いで0.82mm
に冷間圧延した。次にこの冷間圧延材を所定の寸法に切
断して、素洗いしてクラッド板を製造した。熱間圧延で
のコイル巻上げ温度、冷却速度、板厚、冷間圧延での圧
延率、中間焼鈍条件は種々に変化させた。前記素洗いは
実施例1と同じ方法により行った。また芯材と皮材の製
造も実施例1と同じ方法により行った。次いで、前記ク
ラッド板から外径96mm、内径24mmのドーナツ板を打抜
き、これを 340℃で4時間焼鈍した後、20℃/hr の冷却
速度で冷却し、更にグラインディング加工を行った。そ
の後、実施例1と同じ手順により表面処理と無電解めっ
きを行ったものについて、下記の品質評価を行った。 グラインディング加工したドーナツ板の評価 Mg2Si:走査式電子顕微鏡(SEM)にて3mm2の視野で
の個数を計測した。 5μmを超えるものが20個/mm2以下
が合格レベルである。Al-Fe系金属間化合物:SEMに
て3mm2の視野での個数を計測した。 5μmを超えるもの
が10個/mm2以下が合格レベルである。
Example 2 Alloys of the alloys of the present invention shown in Table 1
A laminated material was prepared using the skin material and core material of No. 1 and the alloy No. 15 of the comparative material, and after reheating this laminated material to 500 ° C, hot rolling was started at 470 ° C to various thicknesses. Rolling, then 0.82mm
Was cold rolled. Next, the cold-rolled material was cut into a predetermined size and washed with a light to produce a clad plate. The coil winding temperature, cooling rate, plate thickness, cold rolling reduction ratio, and intermediate annealing conditions in hot rolling were variously changed. The unwashing was performed in the same manner as in Example 1. The production of the core material and the skin material was performed in the same manner as in Example 1. Next, a donut plate having an outer diameter of 96 mm and an inner diameter of 24 mm was punched from the clad plate, annealed at 340 ° C for 4 hours, cooled at a cooling rate of 20 ° C / hr, and further subjected to grinding. After that, the following quality evaluation was performed on those subjected to surface treatment and electroless plating according to the same procedure as in Example 1. Evaluation of the donut plate after the grinding process Mg 2 Si: The number in a field of view of 3 mm 2 was measured with a scanning electron microscope (SEM). Those exceeding 5 μm are 20 / mm 2 or less as acceptable levels. Al-Fe-based intermetallic compound: The number in a visual field of 3 mm 2 was measured by SEM. Those exceeding 5 μm are 10 / mm 2 or less as acceptable levels.

【0037】下地めっき後のドーナツ板の評価 マイクロピット:光学顕微鏡にて3mm2の視野での個数を
計測した。 5個未満の場合A、 5個以上15個未満の場合
B、15個以上25個未満の場合C、25個以上の場合Dと表
示した。ノジュール:光学顕微鏡にて3mm2の視野での個
数を計測した。10μmを超えるものが 5個未満の場合
A、 5個以上15個未満の場合B、15個以上25個未満の場
合C、25個以上の場合Dと表示した。
Evaluation of donut plate after base plating Micro pits: The number in a visual field of 3 mm 2 was measured with an optical microscope. When the number is less than 5, A is indicated, when 5 or more is less than 15, B is indicated, when 15 or more is less than 25, C is indicated, and when 25 or more is indicated, D. Nodule: The number in a visual field of 3 mm 2 was counted with an optical microscope. The case where the number exceeding 10 μm is less than 5 is indicated as A, the case where the number is 5 or more and less than 15 is B, the case where the number is 15 or more and less than 25, and the case where the number is 25 or more.

【0038】エッチング後のドーナツ板の評価 端面での段差の有無を調べた。段差が無く健全な端面の
場合は○、段差が生じた場合は×と表示した。最後にマ
イクロピット、ノジュール、端面性状を総合的に見てA
〜Eの5段階評価を行った。A、B、Cは合格レベル、
×は不合格、製造不可は━で表示した。結果を、製造条
件を併記して表4に示す。
Evaluation of Donut Plate After Etching The presence or absence of a step at the end face was examined. In the case of a healthy end face without a step, it was indicated by ○, and in the case of a step, × was indicated. Finally, the micro pits, nodules, and the properties of the end face are comprehensively evaluated.
To E were evaluated in five steps. A, B, C are acceptable levels,
X indicates rejection, and production failure indicates ━. The results are shown in Table 4 together with the production conditions.

【0039】[0039]

【表4】 [Table 4]

【0040】表4より明らかなように、本発明例品(試
料No.30 〜34)はいずれもマイクロピットやノジュール
が少なく、端面の性状が良好で、総合的に見て全て合格
レベルにあった。なお、試料No.34 は熱間圧延後と最終
焼鈍後の冷却速度が遅くまた合計圧延率が低かったた
め、他より大サイズのマイクロピットやノジュールが増
加した。 他方、試料No.35 〜38は合金組成が本発明の
範囲を外れているため、製造条件によっては Mg2Siや A
l-Fe系などの5μm以上の化合物の少ないものもある
が、いずれも大サイズのマイクロピットまたはノジュー
ルが多数発生して、総合的に見て全てが不合格となっ
た。
As is clear from Table 4, all of the products of the present invention (samples Nos. 30 to 34) had few micropits and nodules, and had good end face properties. Was. In sample No. 34, the cooling rates after hot rolling and after final annealing were slow and the total rolling ratio was low, so that micropits and nodules having a larger size than the others increased. On the other hand, in Samples Nos. 35 to 38, since the alloy composition is out of the range of the present invention, Mg 2 Si or A
Some of the compounds, such as l-Fe-based compounds, had a small content of 5 μm or more, but all of them generated many large-sized micropits or nodules, and all were rejected as a whole.

【0041】[0041]

【発明の効果】以上に述べたように、本発明のクラッド
板は、エッチング後の端面に段差が生じず、下地めっき
層の皮材との密着性、表面平滑性、耐食性、表面品質に
優れているため、磁気ディスクの高容量化、高密度化が
可能である。また芯材には低純度地金が使用できるので
安価であり、工業上顕著な効果を奏する。
As described above, the clad plate of the present invention has no step on the end face after etching, and is excellent in the adhesion of the base plating layer to the skin material, surface smoothness, corrosion resistance, and surface quality. Therefore, it is possible to increase the capacity and density of the magnetic disk. In addition, since a low-purity metal can be used as the core material, it is inexpensive and has a remarkable industrial effect.

フロントページの続き (51)Int.Cl.6 識別記号 FI G11B 5/84 G11B 5/84 Z // C22F 1/00 627 C22F 1/00 627 661 661D 685 685Z 686 686A 692 692A 694 694A G11B 5/62 G11B 5/62 Continuation of the front page (51) Int.Cl. 6 identification code FI G11B 5/84 G11B 5/84 Z // C22F 1/00 627 C22F 1/00 627 661 661D 685 685Z 686 686A 692 692A 694 694A G11B 5/62 G11B 5/62

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 Mg 2.0〜6.0wt%、Cu0.01〜0.05wt% 、Zn
0.05〜2.0wt%を含み、Mn 0.05wt%未満、Cr 0.05wt%未満
の少なくとも1種を含み、不純物としてSi、Feを各々
0.05wt%以下含み、その他の不可避不純物元素を各々 0.
02wt%以下含み、残部がAlからなる皮材が、少なくともZ
nを3.0wt%未満含み、残部がAlと不可避不純物からなる
芯材の片面または両面にクラッドされていることを特徴
とするジンケート処理性と下地処理性に優れた高容量磁
気ディスク基板用アルミニウム合金クラッド板。
1. Mg 2.0-6.0 wt%, Cu 0.01-0.05 wt%, Zn
0.05 to 2.0 wt%, Mn less than 0.05 wt%, Cr at least one containing less than 0.05 wt%, each of Si and Fe as impurities
0.05 wt% or less, and each other unavoidable impurity element
The skin material containing not more than 02 wt% and the balance of Al is at least Z
Aluminum alloy for high-capacity magnetic disk substrates with excellent zincate and undercoating properties, characterized in that n is less than 3.0 wt% and the remainder is clad on one or both sides of a core material consisting of Al and unavoidable impurities Clad plate.
【請求項2】 請求項1に記載する芯材と皮材の組成を
式F=Si+Fe+2Cu+2Mn +3Mg +0.5Zn(式中Si,Fe,Cu,
Mn,Mg,Zn は各々のwt%)にそれぞれ代入して得られる芯
材のF値 (Fb)と皮材のF値 (Fs)との比 [Fb/Fs]が
0.6以上であることを特徴とするジンケート処理性と下
地処理性に優れた高容量磁気ディスク基板用アルミニウ
ム合金クラッド板。
2. The composition of the core material and the skin material according to claim 1 is represented by the formula F = Si + Fe + 2Cu + 2Mn + 3Mg + 0.5Zn (where Si, Fe, Cu,
Mn, Mg, and Zn are each substituted by wt%). The ratio [Fb / Fs] of the F value (Fb) of the core material and the F value (Fs) of the skin material obtained by substituting into each wt% is
An aluminum alloy clad plate for high-capacity magnetic disk substrates that is excellent in zincate treatment and undercoat treatment, characterized by being 0.6 or more.
【請求項3】 アルミニウム合金芯材の片面または両面
に皮材をクラッドした複合素材に、熱間圧延、冷間圧
延、最終焼鈍を施す高容量磁気ディスク基板用アルミニ
ウム合金クラッド板の製造方法において、熱間圧延後の
冷却、冷間圧延途中の中間焼鈍後の冷却、および最終焼
鈍後の冷却を、それぞれ 240〜150 ℃間で30〜600 ℃/h
r の速度で行い、冷間圧延を、 20%以上の圧延率で3回
以上、全圧延率 60%以上の条件で行うことを特徴とする
請求項3記載の高容量磁気ディスク基板用アルミニウム
合金クラッド板の製造方法。
3. A method for producing an aluminum alloy clad plate for a high-capacity magnetic disk substrate, comprising subjecting a composite material in which a cladding material is clad on one or both sides of an aluminum alloy core material to hot rolling, cold rolling and final annealing. Cooling after hot rolling, cooling after intermediate annealing during cold rolling, and cooling after final annealing are performed at 240 to 150 ° C and 30 to 600 ° C / h, respectively.
4. The aluminum alloy for a high-capacity magnetic disk substrate according to claim 3, wherein the cold rolling is performed at a rolling rate of 20% or more at least three times, and the total rolling rate is 60% or more. Manufacturing method of clad plate.
JP27615496A 1996-10-18 1996-10-18 Aluminum alloy clad plate for high-capacity magnetic disk substrate excellent in zincate treatment and undercoat treatment and its manufacturing method Pending JPH10121178A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27615496A JPH10121178A (en) 1996-10-18 1996-10-18 Aluminum alloy clad plate for high-capacity magnetic disk substrate excellent in zincate treatment and undercoat treatment and its manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27615496A JPH10121178A (en) 1996-10-18 1996-10-18 Aluminum alloy clad plate for high-capacity magnetic disk substrate excellent in zincate treatment and undercoat treatment and its manufacturing method

Publications (1)

Publication Number Publication Date
JPH10121178A true JPH10121178A (en) 1998-05-12

Family

ID=17565514

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JPH10121178A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008001946A (en) * 2006-06-22 2008-01-10 Kobe Steel Ltd Method of manufacturing aluminum alloy substrate for magnetic disk and aluminum alloy substrate for magnetic disk manufactured by this manufacturing method
WO2009062866A1 (en) * 2007-11-15 2009-05-22 Aleris Aluminum Koblenz Gmbh Al-mg-zn wrought alloy product and method of its manufacture
JP2010168602A (en) * 2009-01-20 2010-08-05 Kobe Steel Ltd Aluminum alloy substrate for magnetic disk, and method for manufacturing the same
WO2020184038A1 (en) * 2019-03-14 2020-09-17 株式会社神戸製鋼所 Aluminum alloy blank for magnetic disk and aluminum alloy substrate for magnetic disk
JP2020153011A (en) * 2019-03-14 2020-09-24 株式会社神戸製鋼所 Aluminum alloy blanks for magnetic disks and aluminum alloy substrates for magnetic disks

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008001946A (en) * 2006-06-22 2008-01-10 Kobe Steel Ltd Method of manufacturing aluminum alloy substrate for magnetic disk and aluminum alloy substrate for magnetic disk manufactured by this manufacturing method
WO2009062866A1 (en) * 2007-11-15 2009-05-22 Aleris Aluminum Koblenz Gmbh Al-mg-zn wrought alloy product and method of its manufacture
US9039848B2 (en) 2007-11-15 2015-05-26 Aleris Aluminum Koblenz Gmbh Al—Mg—Zn wrought alloy product and method of its manufacture
JP2010168602A (en) * 2009-01-20 2010-08-05 Kobe Steel Ltd Aluminum alloy substrate for magnetic disk, and method for manufacturing the same
WO2020184038A1 (en) * 2019-03-14 2020-09-17 株式会社神戸製鋼所 Aluminum alloy blank for magnetic disk and aluminum alloy substrate for magnetic disk
JP2020153011A (en) * 2019-03-14 2020-09-24 株式会社神戸製鋼所 Aluminum alloy blanks for magnetic disks and aluminum alloy substrates for magnetic disks
CN113614264A (en) * 2019-03-14 2021-11-05 株式会社神户制钢所 Aluminum alloy blank for magnetic disk and aluminum alloy substrate for magnetic disk

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