JPH101778A - Zinc displacement treatment solution and zinc displacement treatment method - Google Patents

Zinc displacement treatment solution and zinc displacement treatment method

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Publication number
JPH101778A
JPH101778A JP17189696A JP17189696A JPH101778A JP H101778 A JPH101778 A JP H101778A JP 17189696 A JP17189696 A JP 17189696A JP 17189696 A JP17189696 A JP 17189696A JP H101778 A JPH101778 A JP H101778A
Authority
JP
Japan
Prior art keywords
zinc
mol
film
plating
substituted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17189696A
Other languages
Japanese (ja)
Other versions
JP3114623B2 (en
Inventor
Hideyuki Takami
秀幸 高見
Masahiro Notsu
雅浩 能津
Yuki Adachi
由紀 安達
Mika Fukutani
美加 福谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
C Uyemura & Co Ltd
Original Assignee
C Uyemura & Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by C Uyemura & Co Ltd filed Critical C Uyemura & Co Ltd
Priority to JP08171896A priority Critical patent/JP3114623B2/en
Publication of JPH101778A publication Critical patent/JPH101778A/en
Priority to US09/184,078 priority patent/US6162343A/en
Application granted granted Critical
Publication of JP3114623B2 publication Critical patent/JP3114623B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

(57)【要約】 【解決手段】 亜鉛化合物と水酸化アルカリとを含む亜
鉛置換処理液にアミン類の1種又は2種以上を配合して
なることを特徴とする亜鉛置換処理液。 【効果】 本発明の亜鉛置換処理液を用いることで、そ
の後の無電解Ni−P皮膜のめっきむらをなくし、研磨
処理した後の皮膜表面は従来よりも非常に平滑であり、
ハードディスクの高密度化に寄与することができる。
(57) Abstract: A zinc-substituted treatment liquid characterized by mixing one or more amines with a zinc-substituted treatment liquid containing a zinc compound and an alkali hydroxide. [Effect] By using the zinc substitution treatment liquid of the present invention, plating unevenness of the subsequent electroless Ni-P film is eliminated, and the surface of the film after the polishing treatment is much smoother than before.
This can contribute to a higher density hard disk.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、特にハードディス
ク用アルミニウム又はアルミニウム合金基板上への無電
解ニッケルめっきの前処理に好適に用いられる亜鉛置換
処理液及び該亜鉛置換処理液を用いた亜鉛置換処理方法
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a zinc substitution treatment liquid which is suitably used particularly for pretreatment of electroless nickel plating on an aluminum or aluminum alloy substrate for a hard disk, and a zinc substitution treatment using the zinc substitution treatment liquid. About the method.

【0002】[0002]

【従来の技術及び発明が解決しようとする課題】従来よ
り、ハードディスクの製造においては、アルミニウム又
はアルミニウム合金からなる基板の表面に次亜リン酸又
はその塩を還元剤とする無電解ニッケル−リン合金めっ
き皮膜(以下、無電解Ni−P皮膜という)を形成する
ことが行われているが、この場合、Ni−P皮膜を形成
する前に上記基板に亜鉛置換処理を施して基板表面に亜
鉛置換皮膜を形成する必要がある。
2. Description of the Related Art Conventionally, in the production of a hard disk, an electroless nickel-phosphorous alloy using hypophosphorous acid or a salt thereof as a reducing agent is formed on the surface of a substrate made of aluminum or an aluminum alloy. A plating film (hereinafter, referred to as an electroless Ni-P film) is formed. In this case, the substrate is subjected to zinc substitution before the Ni-P film is formed, and the surface of the substrate is substituted with zinc. It is necessary to form a film.

【0003】この亜鉛置換処理液としては、従来、亜鉛
化合物と水酸化アルカリを主成分としたものを用いてい
るが、従来のこの種の亜鉛置換処理液を用いて亜鉛置換
処理を施すと、亜鉛置換皮膜の厚い部分と薄い部分が生
じ、むら状の模様(以下、亜鉛置換むらという)として
現れる。この亜鉛置換処理後の無電解Ni−P皮膜に
は、亜鉛置換むらと同形状の模様が現れ(以下、めっき
むらという)、その部分はノジュールの集合体となって
いる。その部分はその後の研磨工程を経ても微小な突起
(20〜50nm)として残る場合があり、ハードディ
スクの高密度化につれてかかる微小突起が問題となりつ
つある。
[0003] Conventionally, a zinc-substituted treatment solution containing a zinc compound and an alkali hydroxide as main components has been used. However, when a zinc-substitution treatment is performed using such a conventional zinc-substitution treatment solution, A thick portion and a thin portion of the zinc-substituted film are generated, and appear as an uneven pattern (hereinafter, referred to as zinc-substituted unevenness). In the electroless Ni-P film after the zinc substitution treatment, a pattern having the same shape as the zinc substitution irregularity appears (hereinafter, referred to as plating irregularity), and the portion is an aggregate of nodules. Such portions may remain as fine projections (20 to 50 nm) even after the subsequent polishing step, and such fine projections are becoming a problem as the density of the hard disk increases.

【0004】従って、アルミニウム又はアルミニウム合
金基板上に無電解Ni−P皮膜を形成した場合に発生す
るめっきむらを防止すること、即ち、めっきむらの原因
となる亜鉛置換むらを防止することが要望されていた。
[0004] Therefore, it is desired to prevent plating unevenness that occurs when an electroless Ni-P film is formed on an aluminum or aluminum alloy substrate, that is, to prevent zinc substitution unevenness that causes plating unevenness. I was

【0005】本発明は上記事情に鑑みなされたもので、
上記したような亜鉛置換むら乃至はめっきむらが生じ難
い亜鉛置換処理液及び亜鉛置換処理方法を提供すること
を目的とする。
[0005] The present invention has been made in view of the above circumstances,
It is an object of the present invention to provide a zinc substitution treatment liquid and a zinc substitution treatment method which are unlikely to cause the above-described zinc substitution unevenness or plating unevenness.

【0006】[0006]

【課題を解決するための手段及び発明の実施の形態】本
発明者らは、上記目的を達成するため鋭意検討を行った
結果、亜鉛化合物と水酸化アルカリとを主成分とする亜
鉛置換処理液に対し、エチレンジアミン、トリエタノー
ルアミン等のアミン類を配合することにより、亜鉛置換
むらの発生が顕著に抑制され、その上に無電解Ni−P
めっきを施した場合、めっきむらのない均一な皮膜が形
成されることを知見し、本発明をなすに至った。
Means for Solving the Problems and Embodiments of the Invention The present inventors have made intensive studies to achieve the above object, and as a result, have found that a zinc-substituted treatment solution containing a zinc compound and an alkali hydroxide as main components. On the other hand, by adding amines such as ethylenediamine and triethanolamine, the occurrence of uneven zinc substitution is significantly suppressed, and furthermore, electroless Ni-P
The present inventors have found that when plating is performed, a uniform film without plating unevenness is formed, and the present invention has been accomplished.

【0007】従って、本発明は、亜鉛化合物と水酸化ア
ルカリを含む亜鉛置換処理液中にアミン類の1種又は2
種以上を配合してなる亜鉛置換処理液、及びこの亜鉛置
換処理液にアルミニウム又はアルミニウム合金基板を浸
漬して亜鉛置換皮膜を形成することを特徴とする亜鉛置
換処理方法を提供する。
[0007] Accordingly, the present invention provides a method for treating a zinc-substituted solution containing a zinc compound and an alkali hydroxide, wherein one or two of amines are contained.
Kind Code: A1 Provided are a zinc substitution treatment solution containing at least one or more species, and a zinc substitution treatment method characterized by immersing an aluminum or aluminum alloy substrate in the zinc substitution treatment solution to form a zinc substitution film.

【0008】以下、本発明につき更に詳しく説明する
と、本発明の亜鉛置換処理液は、亜鉛化合物及び水酸化
アルカリを含有する。
Hereinafter, the present invention will be described in more detail. The zinc-substituted treating solution of the present invention contains a zinc compound and an alkali hydroxide.

【0009】ここで、亜鉛化合物しては、酸化亜鉛、硝
酸亜鉛、塩化亜鉛、硫酸亜鉛、酢酸亜鉛等が挙げられ、
これらの1種又は2種以上が用いられる。その含有量は
亜鉛として0.02〜0.6モル/L、特に0.05〜
0.4モル/Lとすることが好ましい。
Here, examples of the zinc compound include zinc oxide, zinc nitrate, zinc chloride, zinc sulfate, zinc acetate, and the like.
One or two or more of these are used. Its content is 0.02-0.6 mol / L as zinc, particularly 0.05-0.6 mol / L.
It is preferably 0.4 mol / L.

【0010】また、水酸化アルカリとしては水酸化ナト
リウム、水酸化カリウム等が挙げられるが、水酸化ナト
リウムが好ましく、その配合量は1〜8モル/Lが好ま
しく、更に好ましくは2〜5モル/Lである。
Examples of the alkali hydroxide include sodium hydroxide and potassium hydroxide. Of these, sodium hydroxide is preferable, and the compounding amount is preferably 1 to 8 mol / L, more preferably 2 to 5 mol / L. L.

【0011】本発明の亜鉛置換処理液には、更にアミン
類の1種又は2種以上を添加するもので、これにより亜
鉛置換むらが抑制され、むらのない均一な無電解Ni−
P皮膜を形成させることができる。
The zinc-substituted solution of the present invention further comprises one or more amines, whereby the zinc-substitute unevenness is suppressed, and the uniform and uniform electroless Ni-
A P film can be formed.

【0012】この場合、アミン類としては、エチレンジ
アミン、ジアミノプロパン、ジアミノブタン、N,N,
N,N−テトラメチルジアミノメタン、ジメチルエチレ
ンジアミン、ジエチレントリアミン、3,3−イミノビ
スプロピルアミン、トリエチレンテトラミン、N,N−
ビス(3−アミノプロピル)エチレンジアミン、モノエ
タノールアミン、ジエタノールアミン、トリエタノール
アミン、N−メチルヒドロキシアミン、N,N−ジエチ
ルヒドロキシアミン、3−アミノ−1−プロパノール、
N−メチルエタノールアミン等が挙げられ、これらの1
種を単独で又は2種以上を併用することができるが、こ
れらの中でエチレンジアミン、トリエタノールアミンが
好ましい。
In this case, the amines include ethylenediamine, diaminopropane, diaminobutane, N, N,
N, N-tetramethyldiaminomethane, dimethylethylenediamine, diethylenetriamine, 3,3-iminobispropylamine, triethylenetetramine, N, N-
Bis (3-aminopropyl) ethylenediamine, monoethanolamine, diethanolamine, triethanolamine, N-methylhydroxyamine, N, N-diethylhydroxyamine, 3-amino-1-propanol,
N-methylethanolamine and the like.
Species can be used alone or in combination of two or more. Among them, ethylenediamine and triethanolamine are preferable.

【0013】その配合量は0.007〜0.7モル/
L、特に0.02〜0.4モル/Lとすることが好まし
く、配合量が0.007モル/Lより少ないと無電解N
i−P皮膜にめっきむらが残り、0.7モル/Lより多
くなると基板表面全体が白くなる場合が生じる。
The compounding amount is 0.007 to 0.7 mol /
L, particularly preferably 0.02 to 0.4 mol / L, and if the amount is less than 0.007 mol / L, electroless N
Uneven plating remains on the i-P film, and if it exceeds 0.7 mol / L, the entire substrate surface may become white.

【0014】本発明の亜鉛置換処理液には、必要に応
じ、可溶性の鉄、ニッケル、銅塩の1種又は2種以上を
0.001〜0.3モル/L、酒石酸ナトリウム、ロッ
セル塩等の錯化剤を0.003〜0.3モル/L配合す
ることができる。
The zinc-substituted solution of the present invention may contain, if necessary, one or more of soluble iron, nickel and copper salts in an amount of 0.001 to 0.3 mol / L, sodium tartrate, rossel salt and the like. Of the complexing agent of 0.003 to 0.3 mol / L.

【0015】本発明に係る亜鉛置換処理液には、更にピ
ロカテコール、ヒドロキノン等の適宜な成分を加えるこ
とができ、これにより更に均一性、光沢性に優れた無電
解Ni−P皮膜を形成させることができる。
An appropriate component such as pyrocatechol or hydroquinone can be further added to the zinc-substituted treatment liquid according to the present invention, thereby forming an electroless Ni-P film having more excellent uniformity and gloss. be able to.

【0016】本発明の亜鉛置換処理液を用いて、亜鉛置
換を行う場合の条件は特に制限されないが、10〜40
℃の温度で行うことが好ましく、10℃より低いとその
後の無電解Ni−P皮膜との密着力が低下し、40℃よ
り高いとアルミニウム又はアルミニウム合金基板の表面
が荒れるおそれがある。
The conditions for performing the zinc substitution using the zinc substitution treatment solution of the present invention are not particularly limited, but may be from 10 to 40.
It is preferable to carry out at a temperature of 10 ° C., and if it is lower than 10 ° C., the adhesion to the subsequent electroless Ni—P film is reduced, and if it is higher than 40 ° C., the surface of the aluminum or aluminum alloy substrate may be roughened.

【0017】なお、亜鉛置換処理は必要に応じて2回以
上処理することができ、特に、ハードディスクの製造に
おいては、亜鉛置換処理を2回以上施すことが好まし
い。この場合も従来の方法に従って操作を繰り返すこと
ができ、亜鉛置換後、水洗、硝酸水溶液中への浸漬を行
い、再び亜鉛置換を行うようにすればよい。
Incidentally, the zinc substitution treatment can be carried out twice or more as necessary. In particular, in the production of a hard disk, it is preferable to carry out the zinc substitution treatment two or more times. In this case, the operation can be repeated in accordance with the conventional method. After zinc replacement, washing with water and immersion in an aqueous nitric acid solution may be performed, and zinc replacement may be performed again.

【0018】本発明の亜鉛置換処理液によって亜鉛置換
された基板は、各種めっき方法によってその上にめっき
皮膜を形成することができ、この場合、電気めっき、無
電解めっきのいずれの方法でもよいが、特にその上に無
電解Ni−Pめっき皮膜を形成し、ハードディスクを製
造する場合に好適である。なお、この無電解Ni−Pめ
っき液としては公知の組成のものを使用でき、公知の条
件でめっきを行うことができる。
The zinc-substituted substrate of the present invention can be subjected to various plating methods to form a plating film thereon. In this case, either of electroplating and electroless plating may be used. It is particularly suitable when a hard disk is manufactured by forming an electroless Ni-P plating film thereon. The electroless Ni-P plating solution may have a known composition, and plating may be performed under known conditions.

【0019】[0019]

【実施例】以下、実施例と比較例を示し、本発明を具体
的に説明するが、本発明は下記の実施例に制限されるも
のではない。
EXAMPLES The present invention will be described below in detail with reference to examples and comparative examples, but the present invention is not limited to the following examples.

【0020】下記組成の亜鉛置換処理液(実施例1,
2、比較例)を用い、アルミニウム基板を常法に従って
脱脂、エッチングし、30%硝酸水溶液に25℃、30
秒間浸漬後、亜鉛置換処理を行い、更に30%硝酸水溶
液に25℃、60秒間浸漬し、再度亜鉛置換処理を行
い、その後、無電解Ni−Pめっきを施して厚さ15μ
mの無電解Ni−Pめっき皮膜を形成した。
A zinc substitution treatment solution having the following composition (Example 1,
2, Comparative Example), the aluminum substrate was degreased and etched according to a conventional method, and was immersed in a 30% nitric acid aqueous solution at 25 ° C. and 30 ° C.
After immersion for 2 seconds, a zinc substitution treatment is performed, and further immersion in a 30% nitric acid aqueous solution at 25 ° C. for 60 seconds, zinc substitution treatment is performed again, and then electroless Ni—P plating is performed to a thickness of 15 μm.
m of electroless Ni-P plating film was formed.

【0021】この場合、1次及び2次の亜鉛置換処理の
条件はいずれも25℃、30秒間とした。 〔実施例1〕 水酸化ナトリウム 3.0 モル/L 酸化亜鉛 0.25モル/L ロッセル塩 0.25モル/L 塩化第二鉄 0.01モル/L 硝酸ナトリウム 0.01モル/L エチレンジアミン 0.20モル/L ピロカテコール 0.10モル/L
In this case, the conditions for the primary and secondary zinc substitution treatments were both 25 ° C. and 30 seconds. [Example 1] Sodium hydroxide 3.0 mol / L Zinc oxide 0.25 mol / L Rossel salt 0.25 mol / L Ferric chloride 0.01 mol / L Sodium nitrate 0.01 mol / L Ethylenediamine 0 .20 mol / L pyrocatechol 0.10 mol / L

【0022】〔実施例2〕 水酸化ナトリウム 4.0 モル/L 酸化亜鉛 0.30モル/L ロッセル塩 0.50モル/L 塩化第二鉄 0.02モル/L 硝酸ナトリウム 0.01モル/L トリエタノールアミン 0.10モル/L ヒドロキノン 0.10モル/LExample 2 Sodium hydroxide 4.0 mol / L Zinc oxide 0.30 mol / L Rossel salt 0.50 mol / L Ferric chloride 0.02 mol / L Sodium nitrate 0.01 mol / L L Triethanolamine 0.10 mol / L Hydroquinone 0.10 mol / L

【0023】〔比較例〕 水酸化ナトリウム 3.0 モル/L 酸化亜鉛 0.25モル/L ロッセル塩 0.25モル/L 塩化第二鉄 0.01モル/L 硝酸ナトリウム 0.01モル/LCOMPARATIVE EXAMPLE Sodium hydroxide 3.0 mol / L Zinc oxide 0.25 mol / L Rossel salt 0.25 mol / L Ferric chloride 0.01 mol / L Sodium nitrate 0.01 mol / L

【0024】無電解Ni−Pめっき組成及びめっき条件 硫酸ニッケル 0.1 モル/L りんご酸ナトリウム 0.2 モル/L 酢酸ナトリウム 0.2 モル/L 次亜リン酸ナトリウム 0.2 モル/L 硝酸鉛 1.0ppm pH 4.7 めっき温度 90℃ Electroless Ni-P plating composition and plating conditions Nickel sulfate 0.1 mol / L Sodium malate 0.2 mol / L Sodium acetate 0.2 mol / L Sodium hypophosphite 0.2 mol / L Nitric acid Lead 1.0ppm pH 4.7 Plating temperature 90 ℃

【0025】次に、得られた無電解Ni−Pめっき皮膜
の外観を評価し、めっきむらの有無を調べた。その結
果、実施例1,2の亜鉛置換処理液を用いた場合にめっ
きむらは認められなかったが、比較例の亜鉛置換処理液
を用いた場合はめっきむらが生じ、従って亜鉛置換処理
液中にエチレンジアミン、トリエタノールアミン等のア
ミン類の添加によって、無電解Ni−P皮膜のめっきむ
らをなくし、均一な表面が得られることが認められた。めっきむら 実施例1 なし 実施例2 なし 比較例 あり
Next, the appearance of the obtained electroless Ni-P plating film was evaluated, and the presence or absence of uneven plating was examined. As a result, no plating unevenness was observed when the zinc-substituted solutions of Examples 1 and 2 were used. However, when the zinc-substituted solution of the comparative example was used, plating unevenness occurred. It was confirmed that the addition of amines such as ethylenediamine, triethanolamine and the like eliminated uneven plating of the electroless Ni-P film and provided a uniform surface. Plating unevenness Example 1 None Example 2 None Comparative example Available

【0026】[0026]

【発明の効果】本発明の亜鉛置換処理液を用いること
で、その後の無電解Ni−P皮膜のめっきむらをなく
し、研磨処理した後の皮膜表面は従来よりも非常に平滑
であり、ハードディスクの高密度化に寄与することがで
きる。
By using the zinc-substituted solution of the present invention, the subsequent plating unevenness of the electroless Ni-P film is eliminated, and the surface of the film after the polishing treatment is much smoother than before, and the It can contribute to high density.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 福谷 美加 大阪府枚方市出口1丁目5番1号 上村工 業株式会社中央研究所内 ────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Mika Fukutani 1-5-1, Hirakata-shi, Osaka Pref.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 亜鉛化合物と水酸化アルカリとを含む亜
鉛置換処理液にアミン類の1種又は2種以上を配合して
なることを特徴とする亜鉛置換処理液。
1. A zinc-substituted solution comprising a zinc-substituted solution containing a zinc compound and an alkali hydroxide mixed with one or more amines.
【請求項2】 アルミニウム又はアルミニウム合金基板
を請求項1記載の亜鉛置換処理液中に浸漬し、該基板表
面に亜鉛置換皮膜を形成することを特徴とする亜鉛置換
処理方法。
2. A zinc substitution treatment method comprising immersing an aluminum or aluminum alloy substrate in the zinc substitution treatment liquid according to claim 1 to form a zinc substitution film on the substrate surface.
JP08171896A 1996-06-11 1996-06-11 Method of manufacturing electroless nickel-phosphorus alloy plating film-formed substrate for hard disk Expired - Fee Related JP3114623B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP08171896A JP3114623B2 (en) 1996-06-11 1996-06-11 Method of manufacturing electroless nickel-phosphorus alloy plating film-formed substrate for hard disk
US09/184,078 US6162343A (en) 1996-06-11 1998-11-02 Method of preparing hard disc including treatment with amine-containing zincate solution

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP08171896A JP3114623B2 (en) 1996-06-11 1996-06-11 Method of manufacturing electroless nickel-phosphorus alloy plating film-formed substrate for hard disk

Publications (2)

Publication Number Publication Date
JPH101778A true JPH101778A (en) 1998-01-06
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