JPH1018024A - Coated hard member - Google Patents
Coated hard memberInfo
- Publication number
- JPH1018024A JPH1018024A JP17609896A JP17609896A JPH1018024A JP H1018024 A JPH1018024 A JP H1018024A JP 17609896 A JP17609896 A JP 17609896A JP 17609896 A JP17609896 A JP 17609896A JP H1018024 A JPH1018024 A JP H1018024A
- Authority
- JP
- Japan
- Prior art keywords
- layer coating
- coating
- film
- intermediate layer
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000576 coating method Methods 0.000 claims abstract description 62
- 239000011248 coating agent Substances 0.000 claims abstract description 60
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 20
- 229910052735 hafnium Inorganic materials 0.000 claims abstract description 13
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 13
- 229910052720 vanadium Inorganic materials 0.000 claims abstract description 13
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 12
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 12
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 11
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 10
- 239000010410 layer Substances 0.000 description 41
- 239000010936 titanium Substances 0.000 description 21
- 229910052719 titanium Inorganic materials 0.000 description 14
- 230000003647 oxidation Effects 0.000 description 9
- 238000007254 oxidation reaction Methods 0.000 description 9
- 239000000843 powder Substances 0.000 description 9
- 150000004767 nitrides Chemical class 0.000 description 8
- 230000007423 decrease Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 5
- 238000005299 abrasion Methods 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 229910052726 zirconium Inorganic materials 0.000 description 4
- 229910000997 High-speed steel Inorganic materials 0.000 description 3
- 239000011195 cermet Substances 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 238000007733 ion plating Methods 0.000 description 3
- 150000001247 metal acetylides Chemical class 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910002056 binary alloy Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000010730 cutting oil Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- -1 nitride compound Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229910002058 ternary alloy Inorganic materials 0.000 description 1
Landscapes
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、耐摩耗性、耐欠損
性に優れた切削工具、耐摩工具として用いられる被覆硬
質部材に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cutting tool having excellent wear resistance and chipping resistance, and a coated hard member used as a wear-resistant tool.
【0002】[0002]
【従来の技術】従来、切削工具ないし耐摩工具の耐摩耗
性、耐欠損性を改善するために物理蒸着法(以下、PV
D法と称する。)、ないし化学蒸着法(以下、CVD法
と称する。)により、炭化タングステン基超硬合金、炭
窒化チタン基サーメット、および高速度鋼等の基体にT
iN、Ti(C,N)、CrN等の周期律表IVa,Va,VIa
族の炭化物、窒化物、炭窒化物の硬質層被膜を基体上に
被覆した被覆工具が多く用いられている。特にPVD法
で作製されたものは成膜温度が500℃と低いために被
膜と母材との反応が殆どなく、母材強度を活かすことが
できる。そのためミリング用スローアウエイチップ、エ
ンドミル等に多く用いられている。2. Description of the Related Art Conventionally, in order to improve the wear resistance and chipping resistance of cutting tools or wear-resistant tools, physical vapor deposition (hereinafter, referred to as PV) has been proposed.
This is referred to as Method D. ) Or a chemical vapor deposition method (hereinafter referred to as a CVD method) on substrates such as tungsten carbide-based cemented carbide, titanium carbonitride-based cermet, and high-speed steel.
Periodic tables IVa, Va, VIa such as iN, Ti (C, N), CrN
Coating tools in which a hard layer coating of a group III carbide, nitride, or carbonitride is coated on a substrate are often used. In particular, since the film formed by the PVD method has a low film forming temperature of 500 ° C., there is almost no reaction between the film and the base material, and the base material strength can be utilized. Therefore, it is often used for milling throw-away tips, end mills and the like.
【0003】しかしながら、最近では切削速度の高速度
化や高硬度材の切削が必要となっていることから、前記
Ti系の炭化物、窒化物、炭窒化物では耐酸化性が劣る
ため刃先が高温になる切削条件では被膜の劣下が激し
く、被膜からの粒子の脱落、ヒートクラック、チッピン
グ等が発生して切削寿命が短くなるという問題があっ
た。そこで、当初は抵抗の温度依存性などを生かした温
度センサーなどのデバイス用に開発された(Ti,A
l)N膜が着目されるようになった。この被膜は高温で
の耐酸化性が前記硬質層被膜よりも優れており刃先が高
温になる高速切削領域でも優れた性能を発揮し、さらに
ビッカース硬度も2300〜3000と高く耐摩耗性に
も優れている。そのため、切削工具への検討も多く行わ
れるようになっている。However, recently, it has become necessary to increase the cutting speed and to cut hard materials, so that the Ti-based carbides, nitrides, and carbonitrides have poor oxidation resistance, so that the cutting edge has a high temperature. Under such cutting conditions, the coating deteriorates drastically, and there is a problem that particles fall off the coating, heat cracks, chipping, etc. occur, and the cutting life is shortened. Therefore, it was initially developed for devices such as temperature sensors that take advantage of the temperature dependence of resistance (Ti, A
l) Attention has been paid to the N film. This coating has better oxidation resistance at high temperatures than the hard layer coating, and exhibits excellent performance even in high-speed cutting areas where the cutting edge is hot, and has a high Vickers hardness of 2300-3000 and excellent wear resistance. ing. For this reason, many studies have been made on cutting tools.
【0004】基体と硬質層被膜との間に中間層被膜を形
成したり積層方向にある特定元素の添加量を増加もしく
は減少させることにより添加量を傾斜させて、基体との
馴染みを良くすることにより、基体と硬質層被膜との密
着性を高めたり内部応力を低減することができることが
知られている。例えば特開平6−32223号公報に
は、基体と元素周期律表IVa,IIIb族元素およびNからな
る窒化化合物の被膜の間に両者の構成元素からなる混合
層を形成したことを特徴とした膜被着物について記載さ
れている。また特開平6−17228号公報には、基体
表面にTiとAl,Hf,Zrのうち1元素から選ばれ
る2元系の窒化物を形成し、さらに表面に向かうにつれ
炭素量を増やしていき被膜表面が前記2元系の炭窒化物
を形成することを特徴とした傾斜硬質被覆超硬合金につ
いて記載されている。[0004] By forming an intermediate layer coating between the substrate and the hard layer coating or increasing or decreasing the addition amount of a specific element in the laminating direction, the addition amount is inclined to improve the familiarity with the substrate. Thus, it is known that the adhesion between the substrate and the hard layer coating can be increased and the internal stress can be reduced. For example, Japanese Patent Application Laid-Open No. Hei 6-32223 discloses a film characterized in that a mixed layer composed of both constituent elements is formed between a substrate and a film of a nitride compound composed of an element from Group IVa or IIIb of the periodic table and N. An adherend is described. Japanese Patent Application Laid-Open No. 6-17228 discloses a coating film in which a binary nitride selected from Ti and Al, Hf, and Zr is formed on the surface of a substrate and the amount of carbon is further increased toward the surface. A graded hard-coated cemented carbide characterized in that the surface forms the binary carbonitride is described.
【0005】[0005]
【発明が解決しようとする課題】しかしながら、前記硬
質層被膜として(Ti,Al)N膜を基体上に形成した
場合、従来の上記の各種の方法を用いても基体との馴染
みが悪いため基体との密着性が低く、さらに内部応力も
高いという問題があった。本発明は、前記問題点を解決
したものであり、表面硬質層被膜の(Ti,Al)N
膜,さらには(Ti,Al)C膜,(Ti,Al)CN
膜との密着性に優れ、基体との密着性にも優れた中間層
被膜を形成することにより、耐摩耗性、耐欠損性に優れ
た被覆硬質部材を提供することを目的とする。However, when the (Ti, Al) N film is formed on the substrate as the hard layer coating, the substrate is not well-adapted to the substrate even if the above-mentioned conventional various methods are used. And the internal stress is high. The present invention has solved the above-mentioned problems and has a method of forming a (Ti, Al) N
Film, furthermore, (Ti, Al) C film, (Ti, Al) CN
An object of the present invention is to provide a coated hard member having excellent wear resistance and chipping resistance by forming an intermediate layer coating having excellent adhesion to a film and excellent adhesion to a substrate.
【0006】[0006]
【課題を解決するための手段】本発明者は、前記目標を
達成するために基体と硬質層被膜である(Ti,Al)
N膜との密着性を高めるための方法をいろいろと検討し
た結果、基体の表面にTi、Zrを含む3元系ないし4
元系の炭化物、窒化物、炭窒化物からなる中間層被膜を
形成することによって基体と中間層被膜、中間層被膜と
硬質層被膜との密着性が高くなり耐摩耗性が向上すると
いう知見を得た。さらに前記中間層被膜は、(Ti,A
l)C,(Ti,Al)CN硬質層被膜との密着性にも
優れていることを見い出した。すなわち、本発明はPV
DまたはCVD法によって、基体の表面に(TiaMbZ
rc)CxN1-xで表した場合、MがHf、V、Nb、T
a、Cr、Mo、W及びAlからなる群から選ばれた少
なくとも1種の元素であり、それぞれのモル比率が、
0.3≦a≦0.8,0.2≦b≦0.7,0.01≦
c≦0.4,0≦X≦1からなる厚さ0.1〜3.0μ
mの炭化物、窒化物または炭窒化物からなる中間層被膜
を介して、(TiaMb)CxN1-xで表した場合、MがH
f、V、Nb、Ta、Cr、Mo、W及びAlからなる
群から選ばれた少なくとも1種の元素であり、それぞれ
のモル比率が、0.3≦a≦0.8,0.2≦b≦0.
7,0≦X≦1からなる炭化物、窒化物または炭窒化物
からなる被膜を硬質層被膜として0.1〜10μmの厚
さで形成することを特徴とする被覆硬質部材である。さ
らに、前記中間層被膜が基体の表面側から前記硬質層被
膜に向かいZr添加量を漸次減少させた被覆硬質部材で
ある。In order to achieve the above-mentioned object, the present inventor has proposed a substrate and a hard layer coating (Ti, Al).
As a result of studying various methods for improving the adhesion to the N film, it has been found that a ternary system containing Ti and Zr on
By forming an intermediate layer coating composed of elementary carbides, nitrides, and carbonitrides, it was found that the adhesion between the substrate and the intermediate layer coating and between the intermediate layer coating and the hard layer coating was increased, and the wear resistance was improved. Obtained. Further, the intermediate layer coating is composed of (Ti, A
1) It was found that the adhesiveness to the C, (Ti, Al) CN hard layer coating was excellent. That is, the present invention relates to PV
The D or CVD on the surface of the substrate (Ti a M b Z
r c ) When represented by C x N 1 -x , M is Hf, V, Nb, T
a, Cr, Mo, at least one element selected from the group consisting of W and Al, and the molar ratio of each is
0.3 ≦ a ≦ 0.8, 0.2 ≦ b ≦ 0.7, 0.01 ≦
Thickness of 0.1 to 3.0 μ, where c ≦ 0.4 and 0 ≦ X ≦ 1
m carbides, via an intermediate layer coating of a nitride or a carbonitride, when expressed in (Ti a M b) C x N 1-x, M is H
f, V, Nb, Ta, Cr, Mo, W and at least one element selected from the group consisting of Al, and their molar ratios are 0.3 ≦ a ≦ 0.8, 0.2 ≦ b ≦ 0.
A coated hard member characterized in that a coating made of carbide, nitride or carbonitride of 7,0 ≦ X ≦ 1 is formed as a hard layer coating with a thickness of 0.1 to 10 μm. Further, the intermediate layer coating is a coated hard member in which the amount of Zr added is gradually reduced from the surface side of the substrate to the hard layer coating.
【0007】本願発明の硬質被膜は、特にZrを含んだ
中間層被膜を有しているので、炭化タングステン基超硬
合金、炭窒化チタン基サーメット、および高速度鋼等の
基体との密着性に優れており、内部応力の発生も少な
い。さらに表面部はZrを含んでいないので耐酸化性に
優れた硬質層被膜を形成することが出来る。さらに基体
側よりZr添加量を硬質層被膜に向かって漸次減少させ
た中間層被膜を有する場合には、Zrの添加量が穏やか
に減少するので、中間層被膜と硬質層被膜の間の密着性
がさらに優れており、また内部応力の発生もさらに少な
い。Since the hard coating of the present invention has an intermediate layer coating containing Zr in particular, it has good adhesion to substrates such as tungsten carbide-based cemented carbide, titanium carbonitride-based cermet, and high-speed steel. Excellent and low generation of internal stress. Further, since the surface portion does not contain Zr, a hard layer coating excellent in oxidation resistance can be formed. Furthermore, when the intermediate layer coating in which the Zr addition amount is gradually reduced from the substrate side toward the hard layer coating is provided, the adhesion between the intermediate layer coating and the hard layer coating is reduced because the Zr addition amount decreases gently. Are further excellent, and the generation of internal stress is further reduced.
【0008】中間層被膜の組成は(TiaMbZrc)Cx
N1-xで表した場合、MがHf、V、Nb、Ta、C
r、Mo、W及びAlからなる群から選ばれた少なくと
も1種の元素であり、それぞれの比率がモル比率で、
0.3≦a≦0.8,0.2≦b≦0.7,0.01≦
c≦0.4,0≦X≦1からなる膜とする。Tiのモル
比率の限定理由は0.3未満では下地膜として十分な密
着性が得られないからであり、0.8を越えると靱性が
低下して膜が脆くなるからである。またHf、V、N
b、Ta、Cr、Mo、W及びAlからなる群から選ば
れた少なくとも1種の元素であるMのモル比率の限定理
由は0.2未満では靱性が低下して膜が脆くなるからで
あり、0.7を越えると耐酸化性が低下するからであ
る。Zr添加量の範囲を0.01〜0.4としたのは、
0.4を超えると被膜自体が脆くなったり耐酸化性が著
しく低下するからであり、0.01より少ないと密着性
が低下するからである。また中間層被膜の厚さを0.1
〜3.0μmと限定したのは、0.1μm未満では膜が
薄すぎて所望の密着性が得られず、3.0μmを超える
と被膜自体が脆くなるからである。[0008] The composition of the intermediate layer coating (Ti a M b Zr c) C x
When represented by N 1-x , M is Hf, V, Nb, Ta, C
at least one element selected from the group consisting of r, Mo, W, and Al, each of which is a molar ratio,
0.3 ≦ a ≦ 0.8, 0.2 ≦ b ≦ 0.7, 0.01 ≦
The film is made of c ≦ 0.4 and 0 ≦ X ≦ 1. The reason for limiting the molar ratio of Ti is that if it is less than 0.3, sufficient adhesion as a base film cannot be obtained, and if it exceeds 0.8, the toughness decreases and the film becomes brittle. Hf, V, N
The reason for limiting the molar ratio of M, which is at least one element selected from the group consisting of b, Ta, Cr, Mo, W, and Al, is that if it is less than 0.2, the toughness decreases and the film becomes brittle. , 0.7, the oxidation resistance decreases. The range of the Zr addition amount was set to 0.01 to 0.4 because:
If it exceeds 0.4, the coating itself becomes brittle or the oxidation resistance is remarkably reduced, and if it is less than 0.01, the adhesion is reduced. In addition, the thickness of the intermediate layer coating is 0.1
The reason for limiting the thickness to 3.0 μm is that if the thickness is less than 0.1 μm, the film is too thin to obtain a desired adhesion, and if the thickness exceeds 3.0 μm, the coating itself becomes brittle.
【0009】さらに硬質層被膜が(TiaMb)CxN1-x
で表した場合、MがHf、V、Nb、Ta、Cr、M
o、W及びAlからなる群から選ばれた少なくとも1種
の元素であり、それぞれのモル比率で、0.3≦a≦
0.8,0.2≦b≦0.7,0≦X≦1からなる膜と
する。Tiのモル比率の限定理由は0.3未満では硬度
が低く磨耗が進み易いからであり、0.8を越えると耐
酸化性が低下して切削寿命が短くなるからである。また
Hf、V、Nb、Ta、Cr、Mo、W及びAlからな
る群から選ばれた少なくとも1種の元素であるMのモル
比率の限定理由は0.2未満では靱性が低下して膜が脆
くなるからであり、0.7を越えると耐酸化性が低下す
るからである。また表面層の厚さを0.1〜10μmと
限定したのは、0.1μm未満では膜が薄すぎて所望の
耐酸化性、耐摩耗性が得られず、10μmを超えると密
着性が低下したり、残留応力が大きくなりすぎて膜が剥
離し易くなるからである。[0009] Further, the hard layer film is made of (Ti a M b ) C x N 1-x
Where M is Hf, V, Nb, Ta, Cr, M
o, at least one element selected from the group consisting of W and Al, and in each molar ratio, 0.3 ≦ a ≦
The film is made of 0.8, 0.2 ≦ b ≦ 0.7, and 0 ≦ X ≦ 1. The reason for limiting the molar ratio of Ti is that if it is less than 0.3, the hardness is low and abrasion easily proceeds, and if it exceeds 0.8, the oxidation resistance is reduced and the cutting life is shortened. Further, the reason for limiting the molar ratio of M, which is at least one element selected from the group consisting of Hf, V, Nb, Ta, Cr, Mo, W, and Al, is less than 0.2, the toughness is reduced, and the film becomes thin. This is because it becomes brittle, and if it exceeds 0.7, the oxidation resistance decreases. Further, the thickness of the surface layer is limited to 0.1 to 10 μm. If the thickness is less than 0.1 μm, the film is too thin to obtain desired oxidation resistance and abrasion resistance, and if it exceeds 10 μm, the adhesion decreases. Or the residual stress becomes too large and the film is easily peeled off.
【0010】また本発明の被膜のC,N混合比の異なる
被膜を重ねて多層構造としたり、C,N比を連続的に変
化させ傾斜組成被膜とすることも耐摩耗性を得るのに有
効であり本発明の技術範囲に含まれる。さらにまた本発
明は被膜を形成する基体を限定するものではなく、WC
超硬合金やサーメット、ハイス、或いは耐摩合金等用途
に応じて適宜選択すれば良い。It is also effective to obtain abrasion resistance by coating the coating of the present invention with different C / N mixing ratios to form a multilayer structure, or by continuously changing the C / N ratio to form a gradient composition coating. And is included in the technical scope of the present invention. Furthermore, the present invention does not limit the substrate on which the film is formed.
What is necessary is just to select suitably according to a use, such as a cemented carbide, a cermet, a high speed steel, or a wear-resistant alloy.
【0011】[0011]
【発明の実施の形態】以下、実施例に基づき本発明を詳
細に説明する。 (実施例1)84WC−3TiC−1TiN−3TaC
−9vol%Coの組成になるように市販の2.5μm
のWC粉末1.5μmのTiC粉末、同TiN粉末、
1.2μmのTaC粉末およびCo粉末をボールミルに
て96時間混合し乾燥、造粒の後スローアウエイチップ
形状にプレスし、焼結後所定の工具形状に加工し、超硬
工具を得た。この超硬工具上に各種Tiと、Hf、V、
Nb、Ta、Cr、Mo、W及びAlからなる群から選
ばれる金属との2元系ないし3元系の合金ターゲット、
及びZrの合金ターゲットを用意して、アークイオンプ
レーティング法により表1に示す各種被膜を作成した。
最初に、TiとZrを含む3元系ないし4元系の中間層
被膜を0.5μm作成した。次に、2元系ターゲットの
電流値は一定にし、Zrターゲットの電流値を徐々に下
げていくことによりZr添加量を硬質層被膜に向かい漸
次減少させた中間層被膜を2.0μm作成し、最後にZ
rターゲットの電流値を零にして2元系ないし3元系の
硬質層被膜を0.5μm作成した。表1に各試験片のス
クラッチ試験機による臨界荷重値の評価結果を示す。さ
らに表2にZrを含む中間層被膜を形成しない従来の場
合の同様のスクラッチ試験機による評価結果を示す。DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail based on embodiments. (Example 1) 84WC-3TiC-1TiN-3TaC
2.5 μm commercially available so as to have a composition of -9 vol% Co
WC powder 1.5 μm TiC powder, TiN powder,
A 1.2 μm TaC powder and a Co powder were mixed in a ball mill for 96 hours, dried, granulated, pressed into a throw-away chip shape, sintered, and processed into a predetermined tool shape to obtain a cemented carbide tool. Various Ti, Hf, V,
A binary or ternary alloy target with a metal selected from the group consisting of Nb, Ta, Cr, Mo, W and Al;
And an alloy target of Zr were prepared, and various coatings shown in Table 1 were prepared by an arc ion plating method.
First, a ternary or quaternary intermediate layer film containing Ti and Zr was formed to a thickness of 0.5 μm. Next, the current value of the binary target was kept constant, and the current value of the Zr target was gradually lowered to produce an intermediate layer film 2.0 μm in which the Zr addition amount was gradually decreased toward the hard layer film. Finally Z
The current value of the r target was set to zero to form a binary or ternary hard layer coating of 0.5 μm. Table 1 shows the evaluation results of the critical load value of each test piece by a scratch tester. Further, Table 2 shows the results of evaluation by a similar scratch tester in the conventional case where no intermediate layer film containing Zr was formed.
【0012】[0012]
【表1】 [Table 1]
【0013】[0013]
【表2】 [Table 2]
【0014】表1、表2より、どの被膜も中間層被膜に
Zrを添加した3元系ないし4元系の膜を形成している
ため、従来例である2元系ないし3元系の単層膜よりも
臨界荷重値が大きくなり密着性が向上していることがわ
かる。From Tables 1 and 2, all of the coatings are formed as ternary or quaternary films in which Zr is added to the intermediate layer coating, so that the conventional binary or ternary single films are formed. It can be seen that the critical load value is larger than that of the layer film and the adhesion is improved.
【0015】(実施例2)84WC−3TiC−1Ti
N−3TaC−9vol%Coの組成になるように市販
の2.5μmのWC粉末1.5μmのTiC粉末、同T
iN粉末、1.2μmのTaC粉末およびCo粉末をボ
ールミルにて96時間混合し乾燥、造粒の後スローアウ
エイチップ形状にプレスし、焼結後所定の工具形状に加
工した。この超硬工具上にアークイオンプレーティング
法により各種合金ターゲットを用意し表3、表4に示す
ような被膜を3.0μm形成した。前記と同様に被膜の
構成はそれぞれ中間層被膜:0.5μm、Zr添加量を
硬質層被膜に向かい漸次減少させた中間層被膜:2.0
μm、硬質層被膜:0.5μmとなっている。(Example 2) 84WC-3TiC-1Ti
A commercially available 2.5 μm WC powder 1.5 μm TiC powder having a composition of N-3TaC-9 vol% Co
The iN powder, the 1.2 μm TaC powder, and the Co powder were mixed in a ball mill for 96 hours, dried, granulated, pressed into a throw-away chip shape, sintered, and worked into a predetermined tool shape. Various alloy targets were prepared on the cemented carbide tool by the arc ion plating method, and a coating as shown in Tables 3 and 4 was formed to 3.0 μm. In the same manner as described above, the composition of the coating was 0.5 μm for the intermediate coating, and 2.0 for the intermediate coating in which the amount of Zr was gradually decreased toward the hard coating.
μm, hard layer coating: 0.5 μm.
【0016】[0016]
【表3】 [Table 3]
【0017】[0017]
【表4】 [Table 4]
【0018】そしてこれらの被覆超硬工具を下記切削条
件によりフライス切削を行い、最大摩耗量が0.2mm
に達するまでの切削長を求めた結果を合わせて表3、4
に示す。 被削材 SKD61(HB:190〜220) 切削速度 250m/min 送り 0.2mm/刃 切り込み 2.0mm 切削油 なし また従来材として各2元系の単層被膜をアークイオンプ
レーティング法により同一形状の超硬工具上に作製し、
評価した結果を表5に示す。さらに中間層被膜のZr添
加量を本発明の範囲外とした比較例を表6に示す。Then, these coated carbide tools were milled under the following cutting conditions, and the maximum wear amount was 0.2 mm.
Tables 3 and 4 together show the results obtained for the cutting lengths up to
Shown in Work material SKD61 (HB: 190-220) Cutting speed 250m / min Feed 0.2mm / tooth Cutting depth 2.0mm Cutting oil None In addition, as a conventional material, each binary single-layer coating has the same shape by arc ion plating. Fabricated on a carbide tool
Table 5 shows the results of the evaluation. Further, Table 6 shows a comparative example in which the Zr addition amount of the intermediate layer coating was out of the range of the present invention.
【0019】[0019]
【表5】 [Table 5]
【0020】[0020]
【表6】 [Table 6]
【0021】表3、4、5からわかるように、中間層被
膜にZrを添加した3元系ないし4元系の膜を形成する
ことによって最大摩耗量が0.2mmに達するまでの切
削長も従来材よりも延び、耐摩耗性が向上することがわ
かる。また表6より比較例のように中間層被膜のZr添
加量が0.4を超えると、前記切削長が短くなり耐摩耗
性も低下することから、添加量は0.01〜0.4が良
いことがわかる。As can be seen from Tables 3, 4 and 5, by forming a ternary or quaternary film in which Zr is added to the intermediate layer coating, the cutting length until the maximum wear amount reaches 0.2 mm is also obtained. It can be seen that it is longer than the conventional material and the wear resistance is improved. Also, as shown in Table 6, when the Zr addition amount of the intermediate layer coating exceeds 0.4 as in the comparative example, the cutting length is shortened and the wear resistance is reduced. It turns out to be good.
【0022】[0022]
【発明の効果】本発明の被覆硬質合金は基体の表面にT
i、ZrとHf、V、Nb、Ta、Cr、Mo、W及び
Alからなる群から選ばれた少なくとも1種の元素を含
む窒化物、炭化物、炭窒化物を中間層被膜とし、硬質層
被膜にTiとHf、V、Nb、Ta、Cr、Mo、W及
びAlからなる群から選ばれた少なくとも1種の元素か
らなる窒化物、炭化物、炭窒化物の膜を形成することに
より、基体との密着性を向上させ、耐酸化性、耐摩耗性
に優れ格段に長い寿命が得られるものである。The coated hard alloy of the present invention has a T
i, Zr and nitride, carbide and carbonitride containing at least one element selected from the group consisting of Hf, V, Nb, Ta, Cr, Mo, W and Al as an intermediate layer coating, and a hard layer coating Forming a nitride, carbide, and carbonitride film made of at least one element selected from the group consisting of Ti and Hf, V, Nb, Ta, Cr, Mo, W, and Al The adhesiveness is improved, the oxidation resistance and abrasion resistance are excellent, and a remarkably long life can be obtained.
Claims (2)
1-xで表した場合、MがHf、V、Nb、Ta、Cr、
Mo、W及びAlからなる群から選ばれた少なくとも1
種の元素であり、それぞれのモル比率が、0.3≦a≦
0.8,0.2≦b≦0.7,0.01≦c≦0.4,
0≦X≦1からなる厚さ0.1〜3.0μmの中間層被
膜を介して、(TiaMb)CxN1-xで表した場合、Mが
Hf、V、Nb、Ta、Cr、Mo、W及びAlからな
る群から選ばれた少なくとも1種の元素であり、それぞ
れのモル比率が、0.3≦a≦0.8,0.2≦b≦
0.7,0≦X≦1からなる被膜を硬質層被膜として
0.1〜10μmの厚さで形成することを特徴とする被
覆硬質部材。To 1. A substrate surface (Ti a M b Zr c) C x N
When represented by 1-x , M is Hf, V, Nb, Ta, Cr,
At least one selected from the group consisting of Mo, W and Al
Species, and the molar ratio of each is 0.3 ≦ a ≦
0.8, 0.2 ≦ b ≦ 0.7, 0.01 ≦ c ≦ 0.4,
0 through the intermediate layer coating of a thickness of 0.1~3.0μm consisting ≦ X ≦ 1, (Ti a M b) C x when expressed in N 1-x, M is Hf, V, Nb, Ta , Cr, Mo, W and Al are at least one element selected from the group consisting of 0.3 ≦ a ≦ 0.8, 0.2 ≦ b ≦
A coated hard member characterized in that a coating consisting of 0.7,0 ≦ X ≦ 1 is formed as a hard layer coating with a thickness of 0.1 to 10 μm.
硬質層被膜に向かいZr添加量を漸次減少させたことを
特徴とする請求項1に記載の被覆硬質部材。2. The coated hard member according to claim 1, wherein the Zr addition amount of the intermediate layer coating is gradually reduced from the surface side of the substrate toward the hard layer coating.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17609896A JPH1018024A (en) | 1996-07-05 | 1996-07-05 | Coated hard member |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17609896A JPH1018024A (en) | 1996-07-05 | 1996-07-05 | Coated hard member |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH1018024A true JPH1018024A (en) | 1998-01-20 |
Family
ID=16007669
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17609896A Pending JPH1018024A (en) | 1996-07-05 | 1996-07-05 | Coated hard member |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH1018024A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0999290A1 (en) * | 1998-10-27 | 2000-05-10 | Shinko Kobelco Tool Co., Ltd. | Wear-resistant coated member |
| US7211138B2 (en) | 2003-02-07 | 2007-05-01 | Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) | Hard film, method of forming the same and target for hard film formation |
| EP1992713A2 (en) | 2004-09-30 | 2008-11-19 | Kabushiki Kaisha Kobe Seiko Sho | Hard coating excellent in wear resistance and in oxidation resistance and target for forming the same |
| US7510608B2 (en) | 2006-01-20 | 2009-03-31 | Kobe Steel Ltd. | Hard coating film |
-
1996
- 1996-07-05 JP JP17609896A patent/JPH1018024A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0999290A1 (en) * | 1998-10-27 | 2000-05-10 | Shinko Kobelco Tool Co., Ltd. | Wear-resistant coated member |
| US6296928B1 (en) | 1998-10-27 | 2001-10-02 | Mmc Kobelco Tool Co., Ltd. | Hard coating coated member having excellent wear resistance |
| US7211138B2 (en) | 2003-02-07 | 2007-05-01 | Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) | Hard film, method of forming the same and target for hard film formation |
| EP1992713A2 (en) | 2004-09-30 | 2008-11-19 | Kabushiki Kaisha Kobe Seiko Sho | Hard coating excellent in wear resistance and in oxidation resistance and target for forming the same |
| US7521131B2 (en) | 2004-09-30 | 2009-04-21 | Kobe Steel, Ltd. | Hard coating excellent in wear resistance and in oxidation resistance and target for forming the same |
| US7601440B2 (en) | 2004-09-30 | 2009-10-13 | Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) | Hard coating excellent in wear resistance and in oxidation resistance and target for forming the same |
| US7510608B2 (en) | 2006-01-20 | 2009-03-31 | Kobe Steel Ltd. | Hard coating film |
| US7592061B1 (en) | 2006-01-20 | 2009-09-22 | Kobe Steel, Ltd. | Hard coating film |
| DE102006047414B4 (en) * | 2006-01-20 | 2012-11-29 | Kabushiki Kaisha Kobe Seiko Sho | Hard coating and process for its production |
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