JPH10186673A - Exposure equipment - Google Patents

Abstract

PROBLEM TO BE SOLVED: To reduce the cost by providing two enlarging optical systems for enlarging luminous fluxes in two areas. SOLUTION: Among the upper half and lower half of the luminous flux emitted from the opening part 7 of a lamp house 1, the luminous fluxes only in the rectangular, or elliptic area near an optical axis 8 are separately made incident on the incident parts 9a and 10a of 1st and 2nd rod lenses 9 and 10. The respective luminous fluxes 9a and 10a are converted to luminous fluxes free from uneven light quantity in the rod lens main bodies 9b and 10b, then, the luminous fluxes emitted from emitting parts 9c and 10c are enlarged by the enlarging optical systems 12 and 13 so as to cover all over the rectangular substrate 21 and so as to become the luminous fluxes with uniform illuminance. A 1st original plate 23 is irradiated with the enlarged luminous flux in the 1st area through reflection mirrors 14 and 15, then, the upper surface of a metallic plate 24 is exposed. Besides, a 2nd original plate 25 is irradiated with the enlarged luminous flux in the 2nd area through reflection mirrors 16 and 17, then, the rear side surface of the metallic plate 24 is exposed, by such a constitution, the same pattern is exposed on both surfaces of the metallic plate 24 by one light source.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to an exposure apparatus,
Particularly, the present invention relates to an exposure apparatus that irradiates a plurality of exposure surfaces with a light beam.

[0002]

2. Description of the Related Art Conventionally, there has been known an exposure apparatus in which a mask is arranged on each of a front surface and a back surface of a substrate, a light beam is irradiated on the mask, and a pattern formed on the mask is simultaneously exposed on the front surface and the back surface of the substrate. I have. An exposure apparatus for simultaneously exposing both surfaces of a substrate includes a light source for a front surface and a light source for a back surface.

In general, an exposure apparatus uses, as irradiation light, a region of a light beam emitted from a light source, the region including the optical axis center of the light beam. For example, when the substrate has a rectangular shape, a region including the optical axis of the light beam is used to irradiate the entire region of the substrate and the mask with the light beam. This is because the illuminated area of the light beam is a circle, and the area near the diameter of the circle has the longest area.

[0004]

SUMMARY OF THE INVENTION In a conventional exposure apparatus,
When the substrate or the mask has a rectangular shape, of the light flux from the light source, only an elongated area including the optical axis is used, and all other areas are discarded, so that the light flux cannot be used effectively.
In addition, the light source has a lifetime, and the amount of light decreases due to aging, and how the aging occurs differs depending on the light source. However, in order to make the luminous flux irradiated on each exposure surface have substantially the same characteristics, in a conventional exposure apparatus, even if one light source is still usable, both light sources must be replaced at the same time after a predetermined time. Therefore, there is a problem that the cost is increased.

Another object of the present invention is to provide an exposure apparatus which can reduce the cost as compared with the prior art and can effectively use the light beam from the light source.

[0006]

According to the first aspect of the present invention, a first area (9a) and a second area (9a) are separated from a light beam emitted from a light source (1). Extraction means (9, 10) for extracting the area (10a), a first magnifying optical system (9) for expanding the luminous flux of the first area extracted by the extraction means, and extraction by the extraction means. A second magnifying optical system (10) for magnifying the light beam in the second region.

More specifically, the extracting means selects a rectangular or elliptical region near the optical axis with the optical axis as the center of symmetry in a plane orthogonal to the optical axis of the light beam. As the extraction means, for example, a rod lens, a stop having two openings near the light emitting portion of the light source, a reflection mirror for dividing the light beam in a plane including the optical axis of the light beam, and the like can be considered. The rod lens is formed by forming a transparent material such as glass or quartz into a rectangular parallelepiped shape.

Although this exposure apparatus is most suitable for a rectangular substrate, it can be used for a square substrate. According to the invention as set forth in claim 2, the extracting means is composed of two rod lenses having a rectangular incident part and a rectangular exit part, and the two rod lenses are the two rod lenses. The rod lenses are arranged so that the long sides of the rectangular portions of the respective incident portions are in contact with each other.

According to the third aspect of the present invention, the extracting means includes a roof mirror, which is disposed at a converging point where the light beam emitted from the light source converges and splits the light beam; And an optical member that receives the split light beam and converts the light beam into uniform brightness. The optical member may be, for example, a rod lens or a fly eye.

[0010]

DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. In each drawing, FIG. 1 is a view showing an exposure apparatus showing a first embodiment, and FIG.
FIG. 3 is a diagram showing a relationship between a rod lens and a light beam, and FIG. 3 is a diagram showing a substrate according to the first embodiment.

First, the configuration of the exposure apparatus will be described with reference to FIG. The exposure apparatus includes a lamp house 1 and an optical system 11, and a substrate 21 whose side surface is held by a holding unit (not shown).
The front and back surfaces are exposed. The lamp house 1 includes a housing 5 including a light emitting unit 4, an elliptical mirror 3, and a reflection mirror 6.
And a power supply 2 for supplying power to the light emitting unit 4. The reflection mirror 6 is a cold mirror, and the cold mirror is provided with a cooling device for cooling the heat of the light emitting unit. An opening 7 is formed in the housing 5.
The light from the light emitting unit 4 is emitted through the elliptical mirror 3 and the reflecting mirror 6 via

The optical system 11 includes a first rod lens 9 into which a first region (upper portion of the optical axis 8) of the light beam emitted from the lamp house 1 is incident, and an optical beam emitted from the lamp house 1. Of the light flux, a second rod lens 10 on which the second region (the lower part of the optical axis 8) is incident, and a first magnification for expanding the light flux emitted from the first rod lens 9 to a predetermined size. It has an optical system 12 and a second magnifying optical system 13 for expanding a light beam emitted from the second rod lens 11 to a predetermined size. First and second magnifying optical systems 12,
Reference numeral 13 enlarges the luminous flux in the first and second regions until the size (dimension) required for exposure is reached. Therefore, the magnification optical system and the light emitting unit are determined in consideration of the amount of light and the size of the light to be exposed on the substrate. The details of the first and second rod lenses will be described later.

Further, the optical system 11 includes a reflecting mirror 15 as a deflecting optical system for deflecting the light flux of the first area enlarged by the first magnifying optical system 12 above the substrate 21, and a reflecting mirror 15. A reflecting mirror 14 for irradiating the upper surface of the substrate 21 with the obtained light beam, a reflecting mirror 16 as a deflecting optical system for deflecting the light beam in the second region enlarged by the second magnifying optical system 13 below the substrate 21. And a reflection mirror 17 for irradiating the light flux reflected by the reflection mirror 16 to the lower surface of the substrate 21. The first irradiating means is a reflecting mirror 1
The second irradiation means is composed of a combination of reflection mirrors 16 and 17. However, depending on the arrangement of the optical system, the first irradiating means and the second irradiating means may be constituted by one reflecting mirror or a plurality of reflecting mirrors.

Next, the first rod lens 9 and the second rod lens 10 will be described. The first rod lens 9 and the second red lens 10 are extraction means for extracting the first region and the second region, respectively, of the light beam emitted from the lamp house 1 and have the same shape and shape. Has functions. Therefore, only the first rod lens 9 will be described here. The first rod lens 9 is a lens having the same cross-sectional shape from the incident part 9a to the emission part 9b,
Its cross section is rectangular. The light beam incident from the incident portion 9a travels while repeating total reflection on the wall surface inside the rod lens body 9b. Therefore, the light beam emitted from the emission section 9b is in a plane orthogonal to the optical axis of the light beam.
Light amount unevenness in which the light amount is partially uneven is eliminated.

The first and second rod lenses 9 and 10 are arranged near the opening 7 of the housing 5 of the lamp house 1. Each of the rod lenses 9 and 10 has an incident portion 9a and 10a
Are arranged so that the interval between the emission portions 9c and 10c is wider than the interval between. That is, the optical axes of the first rod lens 9 and the second rod lens 10 are arranged at a predetermined angle with respect to the optical axis 8 of the light beam emitted from the lamp unit 5. The optical axis of the rod lenses 9 and 10 is the optical axis 8 of the light beam.
Each rod lens 9, 10
The optical axis is a focal point (imaging position) 4a of the light emitted from the light emitting unit 4.
It is desirable to pass through. With such an arrangement, the luminous flux can be used effectively and the loss can be minimized.

The relationship between the first and second rod lenses 9 and 10 and the luminous flux emitted from the lamp house 1 will be described with reference to FIG. As shown in FIG. 2, the light beam emitted from the lamp house 1 has a circular region 20. Using this circular area 20, the entire area of an elongated (rectangular) substrate 21 described later is irradiated with a light beam. That is, in this case, it is necessary to extract a region near the optical axis 8 of the light beam and secure a light beam region for irradiating the elongated substrate 21. Here, the long side of the incident part 9a of the first rod lens and the long side of the incident part 10a of the second rod lens are arranged so as to be in contact with each other. By contacting the long sides of the two rod lenses, a square light beam region can be extracted from the light beams emitted from the lamp house 1. That is, since a square area can be extracted from the circular light beam area,
A circular light beam can be used effectively.

More preferably, the optical axis 8 is located between the long side of the incident part 9a and the long side of the incident part 10a. Thus, the rod lenses 9 and 10 are symmetrically positioned with respect to the optical axis 8.
Is provided, a light flux area having the same illuminance in the light flux 20 area can be used. Further, in the region of the light beam 20, the vicinity of the optical axis 8 is brighter than the peripheral portion, and the light amount in this portion can be used effectively.

FIG. 3 shows the substrate 21. FIG. 3A shows the substrate 2
1 is a plan view, and FIG. 3B is a front view of the substrate 21. The substrate 21 includes a metal plate 24 having a first exposed surface (upper surface) 22 and a second exposed surface (lower surface) 26 coated with a resist film, and a first plate provided in contact with the upper surface of the metal plate 24.
, And a second master 25 provided in contact with the lower surface of the metal plate 24. The first original 2
The third and second masters 25 may be arranged at a minute distance (about 50 μm) from each surface of the substrate.

The first original plate 23 and the second original plate 25 include:
For example, a lead frame pattern is formed. The pattern of the first original 23 and the pattern of the second original 24 are the same. Next, the operation of the first embodiment configured as described above will be described. The light beam emitted from the opening 7 of the lamp house 1 has an optical axis 8
Only the nearby rectangular or elliptical region is incident on the incident portion 9a of the first rod lens 9, and of the lower half thereof, only the rectangular or elliptical region near the optical axis 8 is the second region. The light is incident on the incident part 10a of the rod lens 10.

The light beam incident on each of the rod lenses 9 and 10 is converted into a light beam having a uniform light amount in the rod lens bodies 9b and 10b, and is emitted from the emission units 9c and 10c.
The luminous fluxes emitted from the emission units 9c and 10c are expanded by the magnifying optical systems 12 and 13 into luminous fluxes in a state where uniform illuminance is maintained while covering all regions of the rectangular substrate 21.
The luminous flux of the first area expanded by the expansion optical system 12 is the first area.
The first original plate 23 is irradiated via the reflection mirrors 14 and 15 as irradiation means, and the upper surface of the metal plate 24 is exposed. The luminous flux in the second area enlarged by the magnifying optical system 13 is irradiated on a second original plate 25 via reflection mirrors 16 and 17 as second irradiation means, and the lower surface of the metal plate 24 is exposed. Therefore, the same pattern can be exposed on both surfaces of the metal plate 24 with one light source.

FIG. 4 shows an exposure apparatus according to the second embodiment, and FIG. 5 shows a substrate exposed by the exposure apparatus according to the second embodiment. The exposure apparatus according to the second embodiment includes a lamp house 1, first and second rod lenses 9 and 10, and first and second rod lenses 9 and 10.
Since the second magnifying optical systems 12 and 13 have the same configuration as the exposure apparatus of the first embodiment, they are denoted by the same reference numerals and description thereof will be omitted. In the second embodiment, the area of the metal plate for irradiating the light beam is twice as large as that of the metal plate of the first embodiment, and the first irradiation unit and the second irradiation unit for irradiating the metal plate with the light beam Are different. The first irradiating means includes a reflecting mirror 30 as a deflecting optical system for deflecting the light flux in the first area enlarged by the first magnifying optical system 12 below the substrate 24, and a light flux reflected by the reflecting mirror 30 Mirror 31 that irradiates an exposure surface of a substrate 34 described later with a reflection mirror 32 as a deflecting optical system that deflects the light flux of the second area enlarged by the second magnifying optical system 13 below the substrate 34. , Reflection mirror 3
And a reflection mirror 33 for irradiating the light beam reflected by 2 to an exposure surface of a substrate 34 described later.

In this embodiment, the reflection mirror 31 and the reflection mirror 33 are arranged so as to be shifted in the direction perpendicular to the plane of the drawing. That is, the reflection mirror 33 is located on the back side, and the reflection mirror 31 is located on the front side. The substrate 34 is shown in FIG.
FIG. 5A shows a plan view of the substrate 34, and FIG.
4 shows a front view of FIG. The substrate 34 includes a metal plate 35 having a plurality of resist films applied to a first exposure surface 38 and a second exposure surface 39, respectively, and a first original plate 36 provided in contact with the first exposure surface 38. And a second original plate 37 provided in contact with the second exposure surface 39. The first exposure surface 38 and the second exposure surface 39 are on the same surface of the metal plate 35. Note that the first original plate 36 and the second original plate 37 may be arranged at a minute interval (about 50 μm) with respect to each exposure surface of the substrate.

The first original plate 36 and the second original plate 37 include:
As in the first embodiment, a lead frame pattern is formed. Next, the second thus configured
The operation of the embodiment will be described. In the light beam emitted from the opening 7 of the lamp house 1, only the rectangular or elliptical region near the optical axis 8 in the upper half is incident on the incident portion 9a of the first rod lens 9, and Of the lower half, only a rectangular or elliptical area near the optical axis 8 is incident on the incident portion 10a of the second rod lens 10.

The light beam incident on each of the rod lenses 9 and 10 is converted into a light beam having a uniform light amount in the rod lens bodies 9b and 10b, and is emitted from the emission units 9c and 10c.
The light beam emitted from the emission unit 9c is expanded by the expansion optical system 12 into a light beam that covers the first exposure surface 38 of the rectangular substrate 34. Further, the light beam emitted from the emission unit 10c is expanded by the expansion optical system 13 into a light beam that covers the second exposure surface 39 of the rectangular substrate 34. The luminous flux in the first area enlarged by the magnifying optical system 12 passes through reflection mirrors 30 and 31 as first irradiating means, and the first original 3
6 and the pattern is exposed on the first exposure surface 38 of the metal plate 35. The luminous flux in the second area enlarged by the magnifying optical system 13 is applied to a second original plate 37 via reflection mirrors 32 and 33 as second irradiation means, and the second plate 37 of the metal plate 35 When the pattern is exposed on a metal plate that is twice or more the size of the original plate, two original plates are prepared and the two original plates are arranged side by side on the same surface of the metal plate. First from the light flux 20,
The second light flux area is extracted using a rod lens,
One light beam area can be irradiated to one metal plate.
That is, even for a metal plate having an area larger than the luminous flux that is larger than the illuminating field of the luminous flux and can be expanded while maintaining a certain illuminance,
Exposure can be performed with one light source and in one process.

In the first and second embodiments, the first rod lens extracts the upper half area with the optical axis interposed therebetween, and the second rod lens extracts the lower half area with the optical axis interposed therebetween. However, the first rod rod lens is arranged so as to extract the right half area with the optical axis interposed therebetween, and the second rod lens is arranged so as to extract the left half area with the optical axis interposed therebetween. Is also good. According to each embodiment of the present invention, one light source can be used for two metal plates.
Since two exposure surfaces can be exposed, the light emitting portion having a fixed life, the power to be supplied to the light emitting portion, and the cooling for removing the thermal effect of the heat generated by the light emitting portion on the lamp house (particularly, the cold mirror 6). The running cost of water, air, etc. for the device can be reduced. Since only one lamp house and one power supply are required, the space for the lamp house and the power supply can be halved.

Also, since light from the same light source is used,
The quality of the luminous flux irradiated on the substrate (the aging of the light amount, the wavelength characteristic, etc.) is the same. In each of the above embodiments, the relationship between the exposed surface of the substrate and the original plate may be a contact type that is in close contact with the exposed surface or a proximity type that is tens of microns away from the exposed surface.

In each embodiment, a prism 41 is provided on the entrance surface of the entrance 9a of the first rod lens 9, as shown in FIG. Alternatively, the prism 42 may be disposed on the incident surface of the incident portion 10a of the second rod lens 10. Each of the prisms 41 and 42 is arranged so as to refract the light flux from the light source unit 5 outward. Further, as shown in FIG. 7, the incident part 9a of the first rod lens 9 is formed obliquely with respect to the optical axis of the rod lens, and the incident part 10a of the second rod lens 10 is formed with the light of the rod lens. It may be formed obliquely to the axis. Incident part 9
a, 10a are obliquely formed rod lenses 9, 10
Is a light source unit 5 similar to the configuration in which the prism is arranged.
Are refracted outward from each other.

Further, in each of the embodiments, the rod lens is used as the extracting means. However, a roof mirror is arranged at the converging point 4a where the light emitted from the light emitting section is condensed, and the circular light beam is converted into a semicircular light beam. Divided into Then, a rectangular or elliptical light beam area may be extracted by using a rod lens or a fly eye to obtain a uniform light beam.

[0029]

According to the first aspect of the present invention, since two light beams for exposing the substrate can be extracted from one light source, the cost can be reduced. Further, since two light beams are extracted from the light beam of one light source, two light beams having the same light characteristics can be obtained even if the light source changes over time. Further, since two regions are extracted from the light beam of one light source, the light beam can be used effectively.

According to the second aspect of the present invention, since the light beam can be efficiently taken into the rod lens, the light beam can be used effectively. In addition, by making the light beam incident on the rod lens, the light beam becomes a light beam having uniform brightness, so that the irradiation energy on the exposure surface can be increased.

[Brief description of the drawings]

FIG. 1 is a diagram showing an entire first embodiment of the present invention.

FIG. 2 is a view as viewed in the direction of arrows AA in the first embodiment.

FIG. 3 is a diagram illustrating a configuration of a substrate according to the first embodiment.

FIG. 4 is a diagram showing an entire second embodiment of the present invention.

FIG. 5 is a diagram illustrating a configuration of a substrate according to a second embodiment.

FIG. 6 is a diagram illustrating another example of the rod lens according to the first and second embodiments.

FIG. 7 is a diagram illustrating another example of the rod lens according to the first and second embodiments.

[Explanation of the message]

 DESCRIPTION OF SYMBOLS 1 Lamp house 9, 10 Rod lens 11 Optical system 12, 13 Magnifying optical system 14, 15 First irradiation means 16, 17 Second irradiation means 21, 34 Substrate

 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Kunio Uchiyama 3-30-4 Tsuruyacho, Kanagawa-ku, Yokohama-shi, Kanagawa Prefecture Inside Nikon Engineering Co., Ltd. (72) Eiichi Katayama 3- Tsuruyacho, Kanagawa-ku, Yokohama-shi, Kanagawa Prefecture 30-4 Inside Nikon Engineering Co., Ltd. (72) Inventor Makoto Uehara 4-15-21 Mejiro, Toshima-ku, Tokyo Inside Mejiro Precision Co., Ltd.

Claims (3)

[Claims] 1. An extracting means for extracting a first area and a second area from a light beam emitted from a light source, and a first enlargement for expanding the light flux of the first area extracted by the extracting means. An exposure apparatus comprising: an optical system; and a second magnifying optical system that magnifies a light beam in the second region extracted by the extraction unit. 2. The extraction means is composed of two rod lenses having a rectangular incident part and a rectangular emitting part, and the two rod lenses are respectively incident on the two rod lenses. The exposure apparatus according to claim 1, wherein the exposure unit is disposed so as to contact long sides of the rectangular shape of the unit. 3. A roof mirror, which is disposed at a light-converging point where the light beam emitted from the light source converges and splits the light beam, receives the light beam split by the roof mirror, and uniformly receives the light beam split by the roof mirror. 2. The exposure apparatus according to claim 1, further comprising: an optical member that converts the brightness into a high level.