JPH10270194A - Charged particle accelerator - Google Patents
Charged particle acceleratorInfo
- Publication number
- JPH10270194A JPH10270194A JP9067756A JP6775697A JPH10270194A JP H10270194 A JPH10270194 A JP H10270194A JP 9067756 A JP9067756 A JP 9067756A JP 6775697 A JP6775697 A JP 6775697A JP H10270194 A JPH10270194 A JP H10270194A
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- JP
- Japan
- Prior art keywords
- voltage
- charged particle
- acceleration
- ground potential
- irradiation apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Particle Accelerators (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
(57)【要約】
【課題】荷電粒子加速装置の加速電圧を高速にかつ高精
度に変化させる。
【解決手段】荷電粒子源と加速電極間に加速電源を配置
すると共に、加速電極と接地電位間に電圧可変可能な電
圧印加手段を備えた。
【効果】荷電粒子加速装置の加速電圧の変化の際の追従
性,高安定性を実現できる。
(57) [Summary] To change the acceleration voltage of a charged particle accelerator at high speed and with high accuracy. An accelerating power source is arranged between a charged particle source and an accelerating electrode, and a voltage applying means capable of changing a voltage between the accelerating electrode and a ground potential is provided. [Effect] The tracking performance and the high stability when the acceleration voltage of the charged particle accelerator is changed can be realized.
Description
【0001】[0001]
【発明の属する技術分野】本発明は荷電粒子加速装置或
いはこの加速装置を備えた荷電粒子照射装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a charged particle accelerator or a charged particle irradiation device provided with the accelerator.
【0002】[0002]
【従来の技術】従来の荷電粒子加速装置について、図1
の電子線加速装置を例にとり説明する。2. Description of the Related Art FIG. 1 shows a conventional charged particle accelerator.
The electron beam accelerator of the present invention will be described as an example.
【0003】電子源1は加熱電源5により加熱され、電
子を発生する。該電子はバイアス電源6から電極2に印
加した電圧により収束される。電子源1と電極4には加
速電源7により加速電圧が印加されている。該加速電圧
により該電子は加速される。電子源1,電極2および電
極4は真空絶縁容器3に包まれ、該真空絶縁容器3の内
側は真空排気されている(例えば特開平3−141543 号,
特開昭61−200699号記載の如く)。An electron source 1 is heated by a heating power supply 5 to generate electrons. The electrons are converged by the voltage applied to the electrode 2 from the bias power supply 6. An acceleration voltage is applied to the electron source 1 and the electrode 4 by an acceleration power supply 7. The electrons are accelerated by the accelerating voltage. The electron source 1, the electrode 2, and the electrode 4 are wrapped in a vacuum insulating container 3, and the inside of the vacuum insulating container 3 is evacuated (for example, Japanese Patent Application Laid-Open No. 3-141543,
As described in JP-A-61-200699).
【0004】[0004]
【発明が解決しようとする課題】加速電圧は加速電源7
により電子源1と電極4に印加されている。1段加速装
置の場合、電極4は接地電位である。この加速電源7は
高い安定度を要するが、加速電源7が内蔵する素子の時
定数の影響により、電圧を変化させる際の応答性が悪
く、特に高い加速電圧を発生する電源ほどこの弊害は顕
著であった。The acceleration voltage is controlled by an acceleration power supply 7.
To the electron source 1 and the electrode 4. In the case of a one-stage accelerator, the electrode 4 is at the ground potential. The acceleration power supply 7 requires a high degree of stability, but the response when changing the voltage is poor due to the influence of the time constant of the element incorporated in the acceleration power supply 7, and this problem is more remarkable as the power supply generates a higher acceleration voltage. Met.
【0005】本発明は、以上のような問題点を解決し得
る荷電粒子加速装置の提供を目的とする。An object of the present invention is to provide a charged particle accelerator capable of solving the above problems.
【0006】[0006]
【課題を解決するための手段】本発明では上記目的を達
成するために、荷電粒子源と、該荷電粒子源から発生し
た荷電粒子を加速するための加速電極を備えた荷電粒子
照射装置において、前記荷電粒子源と前記加速電極間に
加速電源を配置すると共に、前記加速電極と接地電位間
に電圧可変可能な電圧印加手段を備えている。According to the present invention, there is provided a charged particle irradiation apparatus comprising a charged particle source and an accelerating electrode for accelerating charged particles generated from the charged particle source. An accelerating power source is arranged between the charged particle source and the accelerating electrode, and a voltage applying means capable of changing a voltage between the accelerating electrode and a ground potential is provided.
【0007】この構成によれば少なくとも荷電粒子源,
加速電極及び加速電源からなる閉回路中で電圧を変化さ
せなくとも、所望の加速電圧を得ることが可能になる。
また加速電極を接地電位から浮かせ接地電位との間に電
圧可変可能な電圧印加手段を備えることによって、加速
電圧の内、その変動分を含む狭い電圧範囲を電圧印加手
段でまかなえば良いので、電圧変化の際の追従性が向上
する。According to this configuration, at least the charged particle source,
A desired acceleration voltage can be obtained without changing the voltage in a closed circuit including the acceleration electrode and the acceleration power supply.
In addition, by providing a voltage applying unit that floats the accelerating electrode from the ground potential and can vary the voltage between the accelerating voltage and the ground potential, a narrow voltage range including the variation of the accelerating voltage can be covered by the voltage applying unit. The ability to follow changes is improved.
【0008】[0008]
【発明の実施の形態】本発明の実施の態様について、そ
の1例を図2の1段加速タイプの電子線加速装置で説明
する。DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described with reference to a one-stage acceleration type electron beam accelerator shown in FIG.
【0009】電子源1は加熱電源5により加熱され、電
子を発生する。この電子はバイアス電源6から第一電極
2に印加した電圧により収束される。この電子源1と第
二電極4の間には、加速電源7により加速電圧が印加さ
れている。加速電圧により電子は加速される。The electron source 1 is heated by a heating power supply 5 to generate electrons. These electrons are converged by the voltage applied to the first electrode 2 from the bias power supply 6. An acceleration voltage is applied between the electron source 1 and the second electrode 4 by an acceleration power supply 7. The electrons are accelerated by the accelerating voltage.
【0010】電子源1,第一電極2および第二電極4は
真空絶縁容器3に包まれ、真空絶縁容器3の内側は真空
排気されている(真空排気のための手段は図示せず)。The electron source 1, the first electrode 2 and the second electrode 4 are wrapped in a vacuum insulating container 3, and the inside of the vacuum insulating container 3 is evacuated (a means for evacuating is not shown).
【0011】この第二電極4および真空絶縁容器3は接
地電位8から絶縁手段9により絶縁されている。また加
速電源7は第二電極4の電位を基準に電子源1に加速電
圧を供給している。The second electrode 4 and the vacuum insulating container 3 are insulated from the ground potential 8 by insulating means 9. The acceleration power supply 7 supplies an acceleration voltage to the electron source 1 based on the potential of the second electrode 4.
【0012】本発明の実施の態様では、接地電位8から
絶縁手段9で絶縁された加速電子線発生部と接地電位8
との間に電圧印加手段10を備えている。これにより電
子源1に印加される加速電圧は加速電源7の出力電圧と
該電圧印加手段10により出力された電圧の加算値とな
る。この電圧印加手段10はその印加電圧を可変できる
可変電源である。In the embodiment of the present invention, the accelerating electron beam generating section insulated from the ground potential 8 by the insulating means 9 is connected to the ground potential 8.
And a voltage applying means 10 between them. As a result, the acceleration voltage applied to the electron source 1 is the sum of the output voltage of the acceleration power supply 7 and the voltage output by the voltage application means 10. The voltage applying means 10 is a variable power supply capable of changing the applied voltage.
【0013】以上のような構成により、加速電源7の設
定電圧を変化させることなく任意の加速電圧を得ること
が可能になる。つまり電子源1,加速電極である第二電
極4,加速電源7を含む閉回路内の加速電圧リップルや
加速電圧を安定に保ったまま、接地電位に対する電子源
1の加速電圧が電圧印加手段10により所望の加速電圧
に設定可能となる。With the above configuration, an arbitrary acceleration voltage can be obtained without changing the set voltage of the acceleration power supply 7. That is, while the acceleration voltage ripple and the acceleration voltage in the closed circuit including the electron source 1, the second electrode 4 as the acceleration electrode, and the acceleration power source 7 are kept stable, the acceleration voltage of the electron source 1 with respect to the ground potential is applied to the voltage application means 10 Thus, a desired acceleration voltage can be set.
【0014】一般的に、このような荷電粒子源を備えた
荷電粒子線照射装置では、極めて精度の高い加速電圧を
要求される。例えば走査型電子顕微鏡(SEM)の場
合、加速エネルギーの変動によって得られるデータが異
なり、所望の検出結果を得られないというような弊害が
生ずるからである。Generally, a charged particle beam irradiation apparatus provided with such a charged particle source requires an extremely high accelerating voltage. This is because, for example, in the case of a scanning electron microscope (SEM), the obtained data is different due to the fluctuation of the acceleration energy, which causes a problem that a desired detection result cannot be obtained.
【0015】仮に上記閉回路内に電圧の変位手段を含む
とすると、閉回路内は加速電源7に代表される高安定度
の高電圧発生電源で構成されているため、閉回路の時定
数が大きく電圧を可変しようとしても、所望の加速電圧
を精度良く得ることができなくなる。If it is assumed that the closed circuit includes voltage displacement means, the closed circuit is constituted by a high-stability high-voltage generating power supply represented by the acceleration power supply 7, so that the time constant of the closed circuit is reduced. Even if the voltage is largely varied, a desired acceleration voltage cannot be obtained with high accuracy.
【0016】この実施の態様では、荷電粒子の発生・加
速を行う部分を接地電位より浮かせ、その間に加速電圧
の変位手段を設けることによって、上記閉回路を安定に
保った状態で加速電圧を変化させることが可能になる。In this embodiment, the portion for generating and accelerating charged particles is floated above the ground potential, and an accelerating voltage displacing means is provided between the portions to change the accelerating voltage while maintaining the closed circuit in a stable state. It becomes possible to do.
【0017】更にこの実施の態様では加速電圧の固定値
分を加速電源7で発生し、変動分を電圧印加手段10で
発生させることができる。これによって電圧変位の追従
性を良くすることが可能になる。Further, in this embodiment, a fixed value of the acceleration voltage can be generated by the acceleration power supply 7 and a fluctuation can be generated by the voltage applying means 10. This makes it possible to improve the followability of the voltage displacement.
【0018】一般的に、加速電源7内には、直流高電圧
を得るためコッククロフトウエリントン回路(CW回
路)を使用している。コッククロフトウエリントン回路
(CW回路)は数十Khzで交流電圧を印加し直流電圧
に整流昇圧するため、個有のリップル電圧がありこれを
小さくするためフィルター用の高抵抗、コンデンサが必
要になる。また加速電圧を安定化するため高抵抗の検出
抵抗等により閉回路の時定数が大きくなり閉回路の応答
を悪くしている。Generally, a cockcroft Wellington circuit (CW circuit) is used in the acceleration power supply 7 to obtain a high DC voltage. A Cockcroft Wellington circuit (CW circuit) applies an AC voltage at several tens of Khz and rectifies and boosts it to a DC voltage, and therefore has a unique ripple voltage. To reduce this ripple voltage, a high-resistance filter and a capacitor are required. Further, in order to stabilize the acceleration voltage, the time constant of the closed circuit is increased due to a high-resistance detection resistor or the like, thereby deteriorating the response of the closed circuit.
【0019】これら素子が持つ時定数が小さい程、電圧
変位の際の追従性が良いと言えるが、高安定度を一方で
は必要とされる。本発明では上記閉回路全体を別電源で
駆動することにより、対応電圧が小さい、時定数の小さ
な電源を形成することができる。例えば加速電源7の出
力電圧を100kV,安定度2ppm とすると許容電圧変
動は0.2V となる。これを電圧印加手段10の最大印
加電圧を1kVとすると同じ許容電圧変動を得るための
安定度は200ppm となり2桁安定度として楽になり、
同様に電圧変動(リップル電圧)を小さくするため使用
するフィルタ容量を小さく出来る。It can be said that the smaller the time constants of these elements are, the better the follow-up property at the time of voltage displacement is, but high stability is required on the other hand. In the present invention, by driving the entire closed circuit with a separate power supply, a power supply with a small corresponding voltage and a small time constant can be formed. For example, when the output voltage of the acceleration power supply 7 is 100 kV and the stability is 2 ppm, the allowable voltage fluctuation is 0.2 V. If the maximum applied voltage of the voltage applying means 10 is set to 1 kV, the stability for obtaining the same allowable voltage fluctuation is 200 ppm, which is a two-digit stability.
Similarly, the filter capacity to be used can be reduced to reduce the voltage fluctuation (ripple voltage).
【0020】即ち電圧変位のための電源は、その対応電
圧が小さい方が安定度から楽になるとともに電圧が変化
した際の追従性が良いことがわかる。That is, it can be seen that the smaller the corresponding voltage of the power supply for the voltage displacement becomes, the easier the stability becomes and the better the followability when the voltage changes.
【0021】本発明の実施の態様で開示する構成によれ
ば、加速電圧の大半或いは固定分を加速電源7で印加
し、変位分を含む電圧(小電圧)を電圧印加手段10で
印加するという、良い追従性を得るのに好適な電源設定
を行うことが可能になる。According to the configuration disclosed in the embodiment of the present invention, most or a fixed portion of the acceleration voltage is applied by the acceleration power supply 7, and a voltage (small voltage) including the displacement is applied by the voltage application means 10. It is possible to set a power supply suitable for obtaining good follow-up performance.
【0022】以上本発明の実施の態様によれば、加速電
圧の安定性とともに電圧変化の際、優れた追従性を得る
ことが可能になる。As described above, according to the embodiment of the present invention, it is possible to obtain not only the stability of the acceleration voltage but also excellent followability when the voltage changes.
【0023】尚、この実施の態様では、熱電子放出型の
電子源を採用しているが、これに限らず例えば電界放出
型電子銃による電子源であっても良い。In this embodiment, a thermionic emission type electron source is employed, but the invention is not limited to this. For example, an electron source using a field emission type electron gun may be used.
【0024】次に本発明の他の実施の態様について、図
3を用いて説明する。先に説明した図2の構成に電圧印
加手段10の印加電圧の振幅と周波数を任意に変化させ
る手段11を設けた。Next, another embodiment of the present invention will be described with reference to FIG. A means 11 for arbitrarily changing the amplitude and frequency of the applied voltage of the voltage applying means 10 is provided in the configuration of FIG. 2 described above.
【0025】これにより振幅と周波数はそれぞれ独立に
任意の値に設定可能となる。振幅と周波数を任意に変化
させる手段11によって、電圧印加手段10の出力電圧
を高速に高精度で可変させることが可能になり、電子源
1の加速電圧を高速に且つ高精度に変化させることがで
きる。Thus, the amplitude and the frequency can be independently set to arbitrary values. The means 11 for arbitrarily changing the amplitude and frequency makes it possible to change the output voltage of the voltage applying means 10 at high speed and with high accuracy, and to change the acceleration voltage of the electron source 1 at high speed and with high accuracy. it can.
【0026】インターフェース手段12により振幅に対
応した振幅信号と周波数に対応した同期信号とを外部へ
出力でき外部装置を加速電圧の該振幅と該周波数に同期
して動作するよう構成した。逆に外部信号により振幅と
周波数を駆動可能とし、外部装置からの外部信号に同期
して電圧印加手段10を動作することも可能になる。こ
れにより、例えば電子顕微鏡像の撮像手段の像取込に同
期させる事により電子顕微鏡の軸合せ等に利用できる。The interface means 12 can output an amplitude signal corresponding to the amplitude and a synchronization signal corresponding to the frequency to the outside, so that the external device operates in synchronization with the acceleration voltage at the amplitude and the frequency. Conversely, the amplitude and frequency can be driven by an external signal, and the voltage applying means 10 can be operated in synchronization with an external signal from an external device. Thus, for example, by synchronizing with the image capturing of the electron microscope image by the imaging means, it can be used for the alignment of the electron microscope and the like.
【0027】また本発明の更に他の実施の態様を図4で
説明する。これは図3の構成に電子線加速装置と接地電
位8の間に電気的にON/OFFする手段13を設け、
電圧印加手段10を使用する場合、ON/OFFする手
段13をONにし、電圧印加手段10を使用しない場
合、ON/OFFする手段13をOFFするように構成
した。Still another embodiment of the present invention will be described with reference to FIG. This means is provided with means 13 for electrically turning on / off between the electron beam accelerator and the ground potential 8 in the configuration of FIG.
When the voltage applying unit 10 is used, the ON / OFF unit 13 is turned ON, and when the voltage applying unit 10 is not used, the ON / OFF unit 13 is turned OFF.
【0028】図3の構成に電子線加速装置と接地電位8
の間に過電圧の印加を防止するため放電管14または放
電管14の同等品を設けた。このような構成により、電
子線加速装置における異常放電による電圧印加手段10
に過電圧がかかることを防止する。An electron beam accelerator and a ground potential 8 are added to the configuration of FIG.
The discharge tube 14 or an equivalent of the discharge tube 14 is provided to prevent application of an overvoltage during the discharge. With such a configuration, the voltage applying means 10 due to abnormal discharge in the electron beam accelerator is provided.
To prevent overvoltage.
【0029】更に本発明の他の実施の態様を図5を用い
て説明する。図5に開示の構成は図4で開示した構成に
加え、接地電位より高い電位を有する構成要素を包囲す
る導電カバー15を設けた。導電カバー15は、荷電粒
子加速装置の各構成要素と絶縁手段9を包囲する側が絶
縁部材で形成されている。この絶縁部材は電圧印加手段
10で印加する電圧に対し、充分な耐電圧機能を有す
る。Another embodiment of the present invention will be described with reference to FIG. In the configuration disclosed in FIG. 5, in addition to the configuration disclosed in FIG. 4, a conductive cover 15 surrounding components having a potential higher than the ground potential is provided. The conductive cover 15 is formed of an insulating member on the side surrounding the components of the charged particle accelerator and the insulating means 9. This insulating member has a sufficient withstand voltage function with respect to the voltage applied by the voltage applying means 10.
【0030】以上の構成により、接地電位8に接続さ
れ、高電圧が印加されている部分に対し、安全を確保す
ることが可能になる。With the above configuration, it is possible to ensure safety for a portion connected to the ground potential 8 and to which a high voltage is applied.
【0031】以上、本発明の実施の態様について1段加
速タイプの熱電子線加速装置を例に説明したが、多段加
速タイプの熱電子線加速装置は勿論のこと、1段或いは
多段加速タイプの電界放出型電子線加速装置についても
適用できることは言うまでもない。Although the embodiments of the present invention have been described with reference to the single-stage acceleration type of thermionic beam accelerator, the multi-stage acceleration type of thermionic beam accelerator as well as the single-stage or multi-stage acceleration type of the electron beam accelerator are described. It goes without saying that the present invention can be applied to a field emission type electron beam accelerator.
【0032】[0032]
【発明の効果】本発明によれば、荷電粒子線加速装置、
或いは荷電粒子線照射装置の加速電圧を高精度に維持し
つつ、高い追従性と高い精度をもって可変することが可
能になる。According to the present invention, a charged particle beam accelerator,
Alternatively, the acceleration voltage of the charged particle beam irradiation device can be varied with high followability and high accuracy while maintaining high accuracy.
【図面の簡単な説明】[Brief description of the drawings]
【図1】従来の荷電粒子加速装置の説明図。FIG. 1 is an explanatory view of a conventional charged particle accelerator.
【図2】本発明の荷電粒子加速装置の1例を示す図。FIG. 2 is a diagram showing an example of a charged particle accelerator according to the present invention.
【図3】本発明の荷電粒子加速装置に振幅を任意に変化
させる手段を備えた例を示す図。FIG. 3 is a diagram showing an example in which the charged particle accelerator of the present invention is provided with means for arbitrarily changing the amplitude.
【図4】本発明の荷電粒子加速装置に放電管を備えた例
を示す図。FIG. 4 is a diagram showing an example in which a discharge tube is provided in the charged particle accelerator of the present invention.
【図5】本発明の荷電粒子線加速装置に導電カバーを備
えた図。FIG. 5 is a view showing the charged particle beam accelerator according to the present invention provided with a conductive cover.
1…電子源、2…第一電極、3…真空絶縁容器、4…第
二電極、5…加熱電源、6…バイアス電源、7…加速電
源、8…接地電位、9…絶縁手段、10…電圧印加手
段、11…振幅と周波数を任意に変化させる手段、12
…インターフェース、13…電気的にON/OFFする
手段、14…放電管、15…導電カバー。DESCRIPTION OF SYMBOLS 1 ... Electron source, 2 ... 1st electrode, 3 ... Vacuum insulation container, 4 ... Second electrode, 5 ... Heating power supply, 6 ... Bias power supply, 7 ... Acceleration power supply, 8 ... Ground potential, 9 ... Insulation means, 10 ... Voltage applying means, 11 means for arbitrarily changing amplitude and frequency, 12
... Interface, 13 ... Means for turning ON / OFF electrically, 14 ... Discharge tube, 15 ... Conductive cover.
フロントページの続き (72)発明者 志水 隆一 大阪府箕面市如意谷3の1の22 (72)発明者 生田 孝 大阪府茨木市下中条町1の1光栄ハイツ 307Continued on the front page (72) Inventor Ryuichi Shimizu 3 1-22, Nyoinya, Minoh-shi, Osaka (72) Inventor Takashi Ikuta 1-1-1 Koei Heights, Shimonakajo-cho, Ibaraki-shi, Osaka 307
Claims (8)
荷電粒子を加速するための加速電極を備えた荷電粒子照
射装置において、 前記荷電粒子源と前記加速電極間に加速電源を配置する
と共に、前記加速電極と接地電位間に電圧可変可能な電
圧印加手段を備えたことを特徴とする荷電粒子照射装
置。1. A charged particle irradiation apparatus comprising a charged particle source and an acceleration electrode for accelerating charged particles generated from the charged particle source, wherein an acceleration power source is arranged between the charged particle source and the acceleration electrode. And a voltage applying means capable of changing a voltage between the acceleration electrode and a ground potential.
加電圧の振幅及び/又は周波数を任意に変化する手段を
有することを特徴とする荷電粒子照射装置。2. A charged particle irradiation apparatus according to claim 1, further comprising means for arbitrarily changing the amplitude and / or frequency of the voltage applied by said voltage applying means.
加電圧の振幅及び/又は周波数を任意に変化する手段
は、外部からの振幅信号情報と同期信号情報に基づいて
電圧を制御する手段を備えてなることを特徴とする荷電
粒子照射装置。3. The apparatus according to claim 2, wherein the means for arbitrarily changing the amplitude and / or frequency of the voltage applied by the voltage applying means includes means for controlling the voltage based on amplitude signal information and synchronization signal information from outside. A charged particle irradiation apparatus, comprising: a charged particle irradiation apparatus;
加電圧の振幅及び/又は周波数を任意に変化する手段
は、前記加速電極と接地電位間に印加される電圧の振幅
及び/又は周波数に対応した同期信号及び/又は振幅信
号を出力する手段を備えたことを特徴とする荷電粒子照
射装置。4. The apparatus according to claim 2, wherein the means for arbitrarily changing the amplitude and / or frequency of the voltage applied by the voltage applying means includes changing the amplitude and / or frequency of the voltage applied between the acceleration electrode and a ground potential. A charged particle irradiation apparatus comprising means for outputting a corresponding synchronization signal and / or amplitude signal.
地電位間を導通するためのスイッチが備えられてなるこ
とを特徴とする荷電粒子照射装置。5. The charged particle irradiation apparatus according to claim 1, further comprising a switch for conducting between the acceleration electrode and the ground potential.
地電位間に放電管或いはその同等品を備えてなることを
特徴とする荷電粒子照射装置。6. A charged particle irradiation apparatus according to claim 1, further comprising a discharge tube or an equivalent thereof between said acceleration electrode and said ground potential.
照射装置を構成する各構成要素と、前記接地電位間に
は、導電カバーが配置され、該導電カバーの前記各構成
要素側には絶縁部材が形成されると共に、該導電カバー
には前記接地電位が接続されることを特徴とする荷電粒
子照射装置。7. A conductive cover according to claim 1, further comprising: a conductive cover disposed between each of the constituent elements of the charged particle beam irradiation apparatus and the ground potential. A charged particle irradiation apparatus, wherein an insulating member is formed and the ground potential is connected to the conductive cover.
荷電粒子を加速するための加速電極を備えた荷電粒子加
速装置において、 前記荷電粒子源と前記加速電極間に加速電源を配置する
と共に、前記加速電極と接地電位間に電圧可変可能な電
圧印加手段を備えたことを特徴とする荷電粒子加速装
置。8. A charged particle accelerator comprising a charged particle source and an acceleration electrode for accelerating charged particles generated from the charged particle source, wherein an acceleration power source is arranged between the charged particle source and the acceleration electrode. And a voltage applying means capable of changing the voltage between the acceleration electrode and a ground potential.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP06775697A JP3451879B2 (en) | 1997-03-21 | 1997-03-21 | Charged particle accelerator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP06775697A JP3451879B2 (en) | 1997-03-21 | 1997-03-21 | Charged particle accelerator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10270194A true JPH10270194A (en) | 1998-10-09 |
| JP3451879B2 JP3451879B2 (en) | 2003-09-29 |
Family
ID=13354111
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP06775697A Expired - Fee Related JP3451879B2 (en) | 1997-03-21 | 1997-03-21 | Charged particle accelerator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3451879B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011192456A (en) * | 2010-03-12 | 2011-09-29 | Horon:Kk | Charged particle beam device |
| JP2017204342A (en) * | 2016-05-09 | 2017-11-16 | 松定プレシジョン株式会社 | Insulation structure, charged particle gun, and charged particle beam application device |
| WO2025211612A1 (en) * | 2024-04-04 | 2025-10-09 | 재단법인 멀티스케일 에너지시스템 연구단 | Method for manufacturing high-conductivity conductive thin film |
-
1997
- 1997-03-21 JP JP06775697A patent/JP3451879B2/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011192456A (en) * | 2010-03-12 | 2011-09-29 | Horon:Kk | Charged particle beam device |
| JP2017204342A (en) * | 2016-05-09 | 2017-11-16 | 松定プレシジョン株式会社 | Insulation structure, charged particle gun, and charged particle beam application device |
| WO2025211612A1 (en) * | 2024-04-04 | 2025-10-09 | 재단법인 멀티스케일 에너지시스템 연구단 | Method for manufacturing high-conductivity conductive thin film |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3451879B2 (en) | 2003-09-29 |
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