JPH10283840A - Copper conductor paste for aluminum nitride board, and aluminum nitride board - Google Patents
Copper conductor paste for aluminum nitride board, and aluminum nitride boardInfo
- Publication number
- JPH10283840A JPH10283840A JP9836797A JP9836797A JPH10283840A JP H10283840 A JPH10283840 A JP H10283840A JP 9836797 A JP9836797 A JP 9836797A JP 9836797 A JP9836797 A JP 9836797A JP H10283840 A JPH10283840 A JP H10283840A
- Authority
- JP
- Japan
- Prior art keywords
- copper
- aluminum nitride
- resin
- binder resin
- powder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 102
- 239000004020 conductor Substances 0.000 title claims abstract description 55
- 229910052802 copper Inorganic materials 0.000 title claims abstract description 40
- 239000010949 copper Substances 0.000 title claims abstract description 40
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 title claims abstract description 38
- 239000011347 resin Substances 0.000 claims abstract description 59
- 229920005989 resin Polymers 0.000 claims abstract description 59
- 239000002245 particle Substances 0.000 claims abstract description 39
- 239000011230 binding agent Substances 0.000 claims abstract description 35
- 239000011521 glass Substances 0.000 claims abstract description 24
- 239000000843 powder Substances 0.000 claims abstract description 20
- 239000003960 organic solvent Substances 0.000 claims abstract description 14
- 239000005751 Copper oxide Substances 0.000 claims abstract description 11
- 229910000431 copper oxide Inorganic materials 0.000 claims abstract description 11
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000000203 mixture Substances 0.000 claims abstract description 10
- 238000005245 sintering Methods 0.000 claims abstract description 5
- 239000000758 substrate Substances 0.000 claims description 55
- 238000005979 thermal decomposition reaction Methods 0.000 claims description 20
- 239000010419 fine particle Substances 0.000 claims description 12
- 239000004925 Acrylic resin Substances 0.000 claims description 9
- 229920000178 Acrylic resin Polymers 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 9
- 239000005011 phenolic resin Substances 0.000 claims description 9
- 238000000354 decomposition reaction Methods 0.000 claims description 6
- 238000000197 pyrolysis Methods 0.000 claims 1
- 239000000853 adhesive Substances 0.000 description 10
- 230000001070 adhesive effect Effects 0.000 description 10
- 238000010304 firing Methods 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 238000007639 printing Methods 0.000 description 6
- 229910052709 silver Inorganic materials 0.000 description 6
- 239000004332 silver Substances 0.000 description 6
- RBNWAMSGVWEHFP-UHFFFAOYSA-N trans-p-Menthane-1,8-diol Chemical compound CC(C)(O)C1CCC(C)(O)CC1 RBNWAMSGVWEHFP-UHFFFAOYSA-N 0.000 description 5
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 238000005056 compaction Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- -1 polyoxymethylene Polymers 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 238000001354 calcination Methods 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- HJOVHMDZYOCNQW-UHFFFAOYSA-N isophorone Chemical compound CC1=CC(=O)CC(C)(C)C1 HJOVHMDZYOCNQW-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 230000035939 shock Effects 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 1
- RUMACXVDVNRZJZ-UHFFFAOYSA-N 2-methylpropyl 2-methylprop-2-enoate Chemical compound CC(C)COC(=O)C(C)=C RUMACXVDVNRZJZ-UHFFFAOYSA-N 0.000 description 1
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 1
- 229910001111 Fine metal Inorganic materials 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 229920000571 Nylon 11 Polymers 0.000 description 1
- 229920002292 Nylon 6 Polymers 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229940100630 metacresol Drugs 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- URLKBWYHVLBVBO-UHFFFAOYSA-N p-dimethylbenzene Natural products CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920003254 poly(benzobisthiazole) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
- H05K1/092—Dispersed materials, e.g. conductive pastes or inks
Landscapes
- Parts Printed On Printed Circuit Boards (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
- Conductive Materials (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は窒化アルミ基板用銅
導体ペースト及び窒化アルミ基板に係り、詳しくは窒化
アルミ基板と焼成膜との接着力を向上させた窒化アルミ
基板用の銅導体ペースト及び窒化アルミ基板に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a copper conductor paste for an aluminum nitride substrate and an aluminum nitride substrate, and more particularly to a copper conductor paste and a nitride for an aluminum nitride substrate having improved adhesion between the aluminum nitride substrate and a fired film. Related to aluminum substrate.
【0002】[0002]
【従来の技術】今日、セラミックス基板上に回路を印刷
したり、また基板に設けた貫通穴であるスルーホールに
導体を穴埋めするために、導体ペーストが用いられてい
る。この導体ペーストとしては、銀とパラジウムを主成
分とするAg−Pd系ペーストを始め、銀系ペースト、
金系ペースト、銀と白金を主成分とするAg−Pt系ペ
ースト、銅系ペーストがある。2. Description of the Related Art Today, a conductor paste is used for printing a circuit on a ceramic substrate or filling a conductor in a through hole provided in the substrate. Examples of the conductor paste include an Ag-Pd paste containing silver and palladium as main components, a silver paste,
There are a gold-based paste, an Ag-Pt-based paste containing silver and platinum as main components, and a copper-based paste.
【0003】このうち、Ag−Pd系ペーストは配線用
途として代表的なものであるが、いくつかの不具合点も
備えている。例えば、ペーストを基板上の配線に使用し
た場合、空気中の水分などを介して銀がイオン化し、こ
のイオン化した銀が隣の導体路へ移行して回路をショー
トさせるマイグレーションと呼ばれる現象が発生してい
た。このため、導体路間の距離を狭くできなかった。ま
た、導体路上に他の部品を搭載したり接続するためのハ
ンダ付け部分では、銀がハンダに浸食されやすく、耐ハ
ンダ性が劣っていた。[0003] Among them, the Ag-Pd-based paste is typical for use in wiring, but has some disadvantages. For example, when the paste is used for wiring on a substrate, silver is ionized through moisture in the air and the like, and a phenomenon called migration occurs in which the ionized silver moves to an adjacent conductor path to short circuit. I was For this reason, the distance between the conductor paths could not be reduced. Further, in a soldered portion for mounting or connecting other components on the conductor path, silver was easily eroded by the solder, and solder resistance was poor.
【0004】また、上記ペーストを基板へ接着する場合
には、本来ミクロンサイズの金属微粒子は、セラミック
ス基板と反応接着することができないために、ペースト
内に約4〜10重量%のガラスフリットを配合し、印刷
後基板にあるガラスフリットが焼成後に基板と金属膜と
を接着する役割を与えていた。しかし、その反面ガラス
フリットが焼成後の金属膜内にも多量に残存するため、
金属膜の電気抵抗値が高くなり、またガラス層で金属膜
と基板とを接着しているため、熱膨張差による歪みが出
やすくなって、熱衝撃性が弱くなると言った問題が発生
した。When the paste is bonded to a substrate, micron-sized metal fine particles cannot be bonded to a ceramic substrate by reaction. Therefore, about 4 to 10% by weight of glass frit is added to the paste. However, the glass frit on the substrate after printing has given a role of bonding the substrate and the metal film after firing. However, on the other hand, a large amount of glass frit remains in the fired metal film,
Since the electrical resistance of the metal film is increased, and the metal film and the substrate are adhered to each other with the glass layer, distortion due to a difference in thermal expansion is likely to occur, and the thermal shock resistance is weakened.
【0005】このような不具合点を一部解消したペース
トとして銅系ペーストが知られている。このペースト
は、例えば特開昭60−70746号公報に記載されて
いるように、銅、ガラスフィリット、そしてタングステ
ン、モリブデン、レニウム等の非銅系物質を有機溶媒中
に分散させたものであり、また特公平3−50365号
公報に記載されているように、銅酸化物を被覆した金属
銅粒子、銅酸化物粒子、ガラス等のガラス粉体を有機溶
媒中に分散させたものが知られている。[0005] A copper-based paste is known as a paste partially resolving such disadvantages. This paste is obtained by dispersing a non-copper-based material such as copper, glass fill, and tungsten, molybdenum, and rhenium in an organic solvent, as described in, for example, JP-A-60-70746. Also, as described in Japanese Patent Publication No. 3-50365, a copper oxide-coated metal copper particle, a copper oxide particle, and a glass powder such as glass dispersed in an organic solvent are known. ing.
【0006】[0006]
【発明が解決しようとする課題】上記銅系ペーストもこ
の中に含まれる4〜10重量%のガラスフリットが基板
と導体との接着の役割を果している。上記ペーストの焼
結膜とアルミナのような酸素を含む基板との接着は良好
であっても、窒化アルミのような酸素を含まない基板に
は全く接着しないのが現状であった。In the above-mentioned copper-based paste, the glass frit of 4 to 10% by weight contained therein plays a role of adhesion between the substrate and the conductor. At present, the sintered film of the paste and the substrate containing oxygen such as alumina have good adhesion but do not adhere to a substrate containing no oxygen such as aluminum nitride at all.
【0007】本発明は、このような問題点を改善するも
のであり、窒化アルミ基板にも充分に接着する銅導体ペ
ースト及びこれを用いた窒化アルミ基板を提供すること
を目的とする。An object of the present invention is to improve such a problem, and an object of the present invention is to provide a copper conductor paste which sufficiently adheres to an aluminum nitride substrate and an aluminum nitride substrate using the same.
【0008】[0008]
【課題を解決するための手段】即ち、本願の請求項1記
載の発明では、平均粒子径1〜500nmの範囲にある
銅、銅酸化物、もしくはこれらの混合物からなる微粒子
に、平均粒子径0.5〜10μmの範囲にあるベース銅
粉を主にしこれに上記平均粒子径が小さい補助銅粉を少
なくとも1種類以上添加した混合銅粉と、バインダー樹
脂、ガラス粉末そして有機溶剤を添加した銅導体ペース
トであり、上記バインダー樹脂として少なくとも熱分解
温度250〜350°Cの樹脂を含む樹脂であり、また
上記ガラス粉末が上記微粒子や混合銅粉の焼結温度より
低くてかつバインダー樹脂の分解温度より高い軟化点を
有する窒化アルミ基板用銅導体ペーストにある。That is, according to the first aspect of the present invention, fine particles made of copper, copper oxide, or a mixture thereof having an average particle size of 1 to 500 nm are added to a fine particle having an average particle size of 0 to 500 nm. A mixed copper powder obtained by adding at least one kind of auxiliary copper powder having a small average particle diameter to a base copper powder mainly in a range of 0.5 to 10 μm, and a copper conductor to which a binder resin, glass powder and an organic solvent are added. A paste containing at least a resin having a thermal decomposition temperature of 250 to 350 ° C. as the binder resin, wherein the glass powder is lower than the sintering temperature of the fine particles or the mixed copper powder and lower than the decomposition temperature of the binder resin. It is a copper conductor paste for aluminum nitride substrates having a high softening point.
【0009】即ち、本発明では、樹脂分がガラス粉末の
軟化点以下の比較的低温で分解することで銅粉と窒化ア
ルミが反応してできる反応層(CuAlO2 もしくはC
uAl2 O4 )の生成に必要な酸素を銅粉と窒化アルミ
界面に供給できることにより、窒化アルミ基板と焼成膜
との接着力が向上する。That is, in the present invention, the reaction layer (CuAlO 2 or C 2 O) formed by the reaction between copper powder and aluminum nitride by the resin component decomposing at a relatively low temperature below the softening point of the glass powder.
By supplying oxygen necessary for producing uAl 2 O 4 ) to the interface between the copper powder and the aluminum nitride, the adhesive strength between the aluminum nitride substrate and the fired film is improved.
【0010】本願の請求項2記載の発明では、バインダ
ー樹脂として、熱分解温度250〜350°Cの樹脂と
熱分解温度450〜550°Cの樹脂を使用し、しかも
熱分解温度の低い樹脂を多く使用した窒化アルミ基板用
銅導体ペーストにあり、請求項1記載の発明の効果に加
え、少量の高温分解バインダー樹脂を添加することによ
り焼成昇温時のレベリング性を向上させて焼成膜の平滑
性を向上させることができる。In the invention of claim 2 of the present application, a resin having a thermal decomposition temperature of 250 to 350 ° C. and a resin having a thermal decomposition temperature of 450 to 550 ° C. are used as the binder resin, and a resin having a low thermal decomposition temperature is used. It is a copper conductor paste for aluminum nitride substrates that has been frequently used. In addition to the effects of the invention described in claim 1, by adding a small amount of a high-temperature decomposition binder resin, the leveling property at the time of raising the firing temperature is improved, and the fired film is smoothed. Performance can be improved.
【0011】本願の請求項3記載の発明では、バインダ
ー樹脂として、アクリル樹脂とこれより熱分解温度の高
いフェノール樹脂を使用す窒化アルミ基板用銅導体ペー
ストにあり、これらの樹脂がそれぞれの温度で、しかも
焼成する窒素雰囲気炉中で分解する。According to the invention of claim 3 of the present application, there is provided a copper conductor paste for an aluminum nitride substrate using an acrylic resin and a phenol resin having a higher thermal decomposition temperature as a binder resin, and these resins are used at respective temperatures. Moreover, it is decomposed in a nitrogen atmosphere furnace for firing.
【0012】本願の請求項4記載の発明では、バインダ
ー樹脂中、アクリル樹脂とフェノール樹脂の重量比を9
0:10〜99:1の範囲にある窒化アルミ基板用銅導
体ペーストにあり、高温分解バインダー樹脂が多い場合
には酸素の供給が少なく、反応層の生成が充分にできな
い。In the present invention, the weight ratio of the acrylic resin and the phenol resin in the binder resin is 9
In the copper conductor paste for aluminum nitride substrate in the range of 0:10 to 99: 1, when the amount of the high-temperature decomposition binder resin is large, the supply of oxygen is small and the reaction layer cannot be sufficiently formed.
【0013】本願の請求項5記載の発明では、ガラス粉
末が軟化点の異なる少なくとも2種以上のものを使用す
る窒化アルミ基板用銅導体ペーストにあり、焼成時のバ
インダー樹脂が分解した後、ガラス粉末が軟化してレベ
リングし、焼成後の膜の平滑性を向上させるとともに膜
に緻密性を向上できる。In the invention according to claim 5 of the present application, the glass powder is in a copper conductor paste for an aluminum nitride substrate using at least two kinds of powders having different softening points. The powder is softened and leveled, so that the smoothness of the fired film can be improved and the denseness of the film can be improved.
【0014】本願の請求項6記載の発明では、バインダ
ー樹脂と有機溶剤からなる有機分が2〜16重量%の範
囲にあり、2重量%未満では印刷がかすれたりして回路
が書けず、また16重量%を越えると、印刷後、ペース
トがたれたり、隣とつながったりしてしまう。In the invention according to claim 6 of the present application, the organic content of the binder resin and the organic solvent is in the range of 2 to 16% by weight, and if it is less than 2% by weight, the print is blurred and the circuit cannot be written. If the content exceeds 16% by weight, the paste will drip after printing or will be connected to the next one.
【0015】本願の請求項7記載の発明では、平均粒子
径1〜100nmの範囲にある銅、銅酸化物、もしくは
これらの混合物に、平均粒子径0.5〜10μmの範囲
にあるベース銅粉を主にしこれに上記平均粒子径が小さ
い補助銅粉を少なくとも1種類以上添加した混合銅粉
と、少なくとも熱分解温度250〜350°Cの樹脂を
含むバインダー樹脂、上記微粒子や混合銅粉の焼結温度
より低くてかつバインダー樹脂の分解温度より高い軟化
点を有するガラス粉末、そして有機溶剤を添加してなる
銅導体ペーストを窒化アルミ基板に印刷し、焼成した窒
化アルミ基板にあり、耐熱衝撃性に優れ、印刷法および
エッチング法により回路形成することが可能な基板であ
る。In the invention according to claim 7 of the present invention, copper, copper oxide or a mixture thereof having an average particle diameter of 1 to 100 nm is added to a base copper powder having an average particle diameter of 0.5 to 10 μm. A mixed copper powder obtained by adding at least one kind of auxiliary copper powder having a small average particle diameter to the above, a binder resin containing a resin having a thermal decomposition temperature of at least 250 to 350 ° C., and baking of the fine particles and the mixed copper powder. A glass powder having a softening point lower than the sintering temperature and higher than the decomposition temperature of the binder resin, and a copper conductor paste obtained by adding an organic solvent is printed on an aluminum nitride substrate and fired. It is a substrate that can form circuits by printing and etching.
【0016】本願の請求項8記載の発明では、バインダ
ー樹脂と有機溶剤からなる有機分が2〜16重量%の範
囲にある。In the invention according to claim 8 of the present application, the organic content of the binder resin and the organic solvent is in the range of 2 to 16% by weight.
【0017】本願の請求項9記載の発明では、バインダ
ー樹脂中、アクリル樹脂とフェノール樹脂の重量比を9
0:10〜99:1の範囲にある窒化アルミ基板にあ
る。According to the ninth aspect of the present invention, the weight ratio of the acrylic resin and the phenol resin in the binder resin is 9
It is on an aluminum nitride substrate in the range of 0:10 to 99: 1.
【0018】[0018]
【発明の実施の形態】本発明における導体ペースト及び
本発明の基板に印刷する導体ペーストの第1の成分とな
る銅、銅酸化物、もしくはこれらの混合物からなる微粒
子は、例えば沈殿法と呼ばれる方法、即ち金属塩溶液か
ら還元剤を用いて直接金属微粒子を沈殿析出させる方法
である。ホルマリン、ヒドラジン、次亜リン酸ソーダ、
水素化ホウ素塩などの還元剤を、金属イオンを含む水溶
液に適当な条件のもとで添加することにより、金属微粒
子を得ることができる。また、上記微粒子は耐酸化性、
分散性等の改善のため、有機脂肪酸やカップリング剤に
より表面処理が行われる。上記微粒子の平均粒子径は1
〜100nmの範囲であり、好ましくは40〜60nm
である。BEST MODE FOR CARRYING OUT THE INVENTION Fine particles composed of copper, copper oxide, or a mixture thereof, which are the first component of the conductive paste of the present invention and the conductive paste to be printed on the substrate of the present invention, are obtained, for example, by a method called precipitation method. That is, this is a method of directly precipitating and depositing metal fine particles from a metal salt solution using a reducing agent. Formalin, hydrazine, sodium hypophosphite,
Fine metal particles can be obtained by adding a reducing agent such as a borohydride salt to an aqueous solution containing metal ions under appropriate conditions. The fine particles are resistant to oxidation,
In order to improve dispersibility and the like, a surface treatment is performed with an organic fatty acid or a coupling agent. The average particle diameter of the fine particles is 1
100100 nm, preferably 40-60 nm.
It is.
【0019】本発明の導体ペーストの第2の成分である
混合銅粉は、平均粒子径0.5〜5μmの範囲にある銅
粉をベースにし、これより平均粒子径の範囲が小さい補
助銅粉を少なくとも1〜3種類以上添加したものであ
る。具体的な混合銅粉は、平均粒子径2〜5μmの範囲
にある最も平均粒子径が大きいベース銅粉と、平均粒子
径1〜2μmの範囲で次に平均粒子径が大きい第1の補
助銅粉と、そして平均粒子径0.5〜1μmの範囲で最
も平均粒子径が小さい第2の補助銅粉の三段階の粒子径
範囲から構成されている場合や、平均粒子径0.5〜1
μmの範囲にあるベース銅粉と、平均粒子径0.1〜
0.5μmの範囲にある補助銅粉の二段階の粒子径範囲
から構成されている。The mixed copper powder as the second component of the conductor paste of the present invention is based on copper powder having an average particle diameter in the range of 0.5 to 5 μm, and auxiliary copper powder having an average particle diameter smaller than this. At least 1 to 3 or more are added. Specific mixed copper powder is a base copper powder having the largest average particle diameter in the range of average particle diameter of 2 to 5 μm, and a first auxiliary copper having the next largest average particle diameter in the range of average particle diameter of 1 to 2 μm. Powder and the second auxiliary copper powder having the smallest average particle diameter in the range of 0.5 to 1 μm in the three-stage particle diameter range, or the average particle diameter of 0.5 to 1 μm.
base copper powder in the range of μm and an average particle diameter of 0.1 to
The auxiliary copper powder has a two-stage particle size range of 0.5 μm.
【0020】上記混合銅粉を三段階の粒子径範囲から構
成した場合では、混合銅粉中、ベース銅粉が80〜98
重量%に対して第1の補助銅粉が1〜19重量%、第2
の補助銅粉が1〜19重量%になっている。特に、補助
銅粉については、これに限定されることなく、これらの
平均粒子径の範囲以下の第3の補助銅粉を使用してもよ
い。When the mixed copper powder is composed of three stages of particle size ranges, the base copper powder in the mixed copper powder is 80 to 98%.
1 to 19% by weight of the first auxiliary copper powder with respect to
Is 1 to 19% by weight. In particular, the auxiliary copper powder is not limited to this, and a third auxiliary copper powder having a range of the average particle diameter or less may be used.
【0021】上記補助銅粉の各銅粉は、比較的球形に近
いものが望ましい。これは各銅粉が空隙を少なくして配
列するためである。平均粒子径の異った銅粉を使用する
と、平均粒子径の小さな補助銅粉が平均粒子径の最も大
きなベース銅粉が配列したときに生じる隙間や空隙を充
填するため、焼成後の導体は内部欠陥が少なく、焼き締
まりも良好になる効果がある。It is desirable that each copper powder of the auxiliary copper powder be relatively spherical. This is because the copper powders are arranged with a reduced number of voids. When using copper powder with different average particle diameter, auxiliary copper powder with small average particle diameter fills gaps and voids generated when base copper powder with the largest average particle diameter is arranged, so the conductor after firing is There is an effect that the number of internal defects is small and the compaction becomes good.
【0022】ベース銅粉の平均粒子径が5μmを超える
と、酸化の影響を受けにくく焼成条件設定が広くなる
が、低い温度では充分に焼結せず焼き締まり不足が生じ
て導体と基板との接着力が低下する。また、インクロー
ル工程で銅粉がつぶれてしまって銅箔状となり、スクリ
ーン印刷時にメッシュずまりが発生することがある。一
方、ベース銅粉の平均粒子径が0.5μm未満では、混
合銅粉の総粒子面積が大きくなり過ぎて、酸化の影響が
大きくなり、電気抵抗値が高くなる。また、カサ密度が
大きいため焼き締まり性が悪くなる。When the average particle size of the base copper powder exceeds 5 μm, the influence of oxidation is less likely to be exerted, and the setting of firing conditions is widened. Adhesive strength decreases. Further, the copper powder may be crushed in the ink roll process to form a copper foil, which may cause mesh displacement during screen printing. On the other hand, when the average particle diameter of the base copper powder is less than 0.5 μm, the total particle area of the mixed copper powder becomes too large, and the influence of oxidation increases, and the electric resistance value increases. In addition, since the bulk density is high, the compaction property deteriorates.
【0023】ベース銅粉の添加量が98重量%を超える
と、低い温度では充分に焼結せずに焼き締まり不足が生
じて導体と基板、またスルーホールとの接着力が低下
し、一方80重量%未満では混合銅粉の総粒子面積が大
きくなり過ぎることになり、前述と同様の不具合が起こ
る。尚、補助銅粉はベース銅粉が配列したときに生じる
間隙や空隙を充填するために添加するものであり、その
平均粒子径と添加量はベース銅粉のそれらに大きく影響
を受ける。If the amount of the base copper powder exceeds 98% by weight, it does not sinter sufficiently at a low temperature, resulting in insufficient compaction, resulting in a decrease in the adhesive strength between the conductor and the substrate or through hole. When the content is less than the weight percentage, the total particle area of the mixed copper powder becomes too large, and the same problem as described above occurs. The auxiliary copper powder is added to fill gaps and voids generated when the base copper powder is arranged, and the average particle size and the amount added are greatly affected by those of the base copper powder.
【0024】本発明の導体ペーストの第3の成分である
バインダー樹脂は、少なくとも熱分解温度250〜35
0°Cの樹脂を含む樹脂であり、具体的には熱分解温度
250〜350°Cの樹脂と熱分解温度450〜550
°Cの樹脂の組み合わせが、銅粉の酸化を長時間押える
とともにバインダー樹脂を残らず熱分解して焼成した導
体の電気抵抗値を減少させるうえで好ましい。The binder resin as the third component of the conductor paste of the present invention has a thermal decomposition temperature of at least 250 to 35.
It is a resin containing a resin at 0 ° C., specifically, a resin having a thermal decomposition temperature of 250 to 350 ° C. and a thermal decomposition temperature of 450 to 550.
A combination of resins at a temperature of ° C. is preferable in that the oxidation of the copper powder is suppressed for a long time and the electrical resistance of the fired conductor is reduced by thermal decomposition without leaving any binder resin.
【0025】熱分解温度250〜350°Cの樹脂とし
ては、イソブチルメタクリレート、n−ブチルメタクリ
レート、メチルメタクリレート、エチルメタクリレー
ト、n−ブチル/イソブチルメタクリレート共重合体等
のアクリル樹脂、ニトロセルロース、ポリオキシメチレ
ンがある。Examples of the resin having a thermal decomposition temperature of 250 to 350 ° C. include acrylic resins such as isobutyl methacrylate, n-butyl methacrylate, methyl methacrylate, ethyl methacrylate, n-butyl / isobutyl methacrylate copolymer, nitrocellulose, and polyoxymethylene. There is.
【0026】熱分解温度450〜550°Cの樹脂とし
ては、テルペンフェノール共重合体等のフェノール樹
脂、酢酸セルロース、ナイロン6、ナイロン6.6、ナ
イロン11等のポリアミド類がある。Examples of the resin having a thermal decomposition temperature of 450 to 550 ° C. include phenol resins such as terpene phenol copolymer and polyamides such as cellulose acetate, nylon 6, nylon 6.6 and nylon 11.
【0027】熱分解温度250〜350°Cの樹脂と熱
分解温度450〜550°Cの樹脂の重量比は90:1
0〜99:1であり、90:10未満になると、熱分解
温度の高い樹脂の占める割合が多くなって、これが焼成
時に熱分解しないで残存し、反応層が生成せず、また導
体の電気抵抗値を高める結果になる。一方、99:1を
越えると、熱分解温度の低い樹脂の占める割合が多くな
って、短時間にバインダー樹脂が熱分解して銅粉を包囲
する樹脂が少なくなり、反応層の生成に必要な酸素量以
上の酸素が膜に供給され、銅膜が酸化して導体の電気抵
抗値を高めることになる。The weight ratio of the resin having a thermal decomposition temperature of 250 to 350 ° C. to the resin having a thermal decomposition temperature of 450 to 550 ° C. is 90: 1.
When the ratio is 0 to 99: 1 and less than 90:10, the proportion of the resin having a high thermal decomposition temperature occupies a large portion, which remains without being thermally decomposed at the time of calcination, a reaction layer is not formed, and the electric conductivity of the conductor is not increased. The result is to increase the resistance. On the other hand, if the ratio exceeds 99: 1, the proportion of the resin having a low thermal decomposition temperature occupies a large amount, the binder resin is thermally decomposed in a short time, and the amount of the resin surrounding the copper powder is reduced. Oxygen in excess of the oxygen amount is supplied to the film, and the copper film is oxidized to increase the electrical resistance of the conductor.
【0028】この中で最も好ましいバインダー樹脂の組
み合わせとしては、アクリル樹脂とフェノール樹脂であ
る。The most preferable combination of the binder resin is an acrylic resin and a phenol resin.
【0029】上記バインダー樹脂を溶かす有機溶剤とし
ては、カルビトール、カルビトールアセテート、ターピ
ノール、メタクレゾール、ジメチルイミダゾリジノン、
ジメチルホルムアミド、ターピノール、ジアセトンアル
コール、トリエチレングリコール、パラキシレン、乳酸
エチル、イソホロン等の高沸点の有機溶剤であり、2種
類以上混合してもよい。Examples of the organic solvent for dissolving the binder resin include carbitol, carbitol acetate, terpinol, metacresol, dimethylimidazolidinone,
It is a high boiling organic solvent such as dimethylformamide, terpinol, diacetone alcohol, triethylene glycol, paraxylene, ethyl lactate, and isophorone, and may be used in combination of two or more.
【0030】本発明に添加される第4の成分であるガラ
ス粉末は、導体のひび割れを改善したり、焼き締めを改
善する補助的な役割を担持させるために添加してもよ
い。このガラス粉末は、鉛を含有しておらず、平均粒子
径1〜10μmの範囲で軟化点200〜700°Cを有
しており、その添加量は全ての銅粉と超微粒子化した銅
酸化物、銅、もしくはこれらの混合物の合計量100重
量部に対して0.1〜2.0重量部が好ましい。2.0
重量部を超えると、ガラス粉末が焼成後の導体内に残存
するため、導体の電気抵抗値が上昇する傾向があり、ま
た導体と基板との界面にガラス層を形成し、熱膨張によ
る歪みをおこしやすく、熱衝撃性が弱くなる。一方、
0.1未満では、導体のひび割れや焼き締めの改善が期
待できない。The glass powder, which is the fourth component added to the present invention, may be added in order to improve the crack of the conductor or to carry an auxiliary role of improving the hardening. This glass powder does not contain lead, has a softening point of 200 to 700 ° C. in an average particle diameter of 1 to 10 μm, and is added in the amount of all copper powder and ultrafine copper oxide. 0.1 to 2.0 parts by weight with respect to 100 parts by weight of the total amount of the substance, copper, or a mixture thereof. 2.0
If the amount exceeds the weight part, since the glass powder remains in the conductor after firing, the electric resistance value of the conductor tends to increase, and a glass layer is formed at the interface between the conductor and the substrate, and distortion due to thermal expansion is reduced. It is easy to cause and the thermal shock resistance is weak. on the other hand,
If it is less than 0.1, improvement in cracking and baking of the conductor cannot be expected.
【0031】そして、本発明の導体ペーストは、バイン
ダー樹脂と有機溶剤からなる有機分が2〜16重量%の
範囲にある。有機分が2重量%未満の場合には、導体ペ
ーストの粘度が高くなり、スルーホールに充填されにく
くなり、また有機分が14重量%を超えると、スルーホ
ールに充填されたペーストが焼成により収縮するため、
穴埋め性が悪くなる。The conductive paste of the present invention has an organic content of 2 to 16% by weight consisting of a binder resin and an organic solvent. When the organic content is less than 2% by weight, the viscosity of the conductive paste becomes high and it becomes difficult to fill the through-hole. When the organic content exceeds 14% by weight, the paste filled in the through-hole shrinks by firing. To do
Poor fillability.
【0032】また、含有している全ての銅粉と微粒の銅
酸化物、銅、もしくはこれらの混合物が84〜98重量
%の範囲にある。98重量%を超えると、ペーストが高
粘度となり焼き締まり不足が生じて導体と基板、またス
ルーホールとの接着力が低下し、一方84重量%未満で
はスルーホールに充填されたペーストが焼成により収縮
するために、前述と同様の不具合が起こる。The content of all the copper powder and fine copper oxide, copper, or a mixture thereof is in the range of 84 to 98% by weight. If the content exceeds 98% by weight, the paste becomes highly viscous and insufficient tightening occurs, resulting in a decrease in the adhesive force between the conductor and the substrate or the through-hole. On the other hand, when the content is less than 84% by weight, the paste filled in the through-hole shrinks by firing. Therefore, the same problem as described above occurs.
【0033】このようにして得られた導体ペーストは、
アルミナ、窒化アルミ、炭化珪素、窒化珪素、サイアロ
ン、チタン酸バリウム、PBZT等のセラミックス基板
にスクリーン印刷等の方法で塗布される。スクリーン印
刷の手順は、水平に置かれたスクリーン(例えば、ステ
ンレス平織物、300メッシュ)の下に、数ミリメート
ルの間隔をもたせて印刷基板を設置する。このスクリー
ンの上に導体ペーストをのせた後、スキージーを用いて
スクリーン全面に広げる。この時には、スクリーンと印
刷基板とは間隔を有している。続いて、スクリーンが印
刷基板に接触する程度にスキージーでスクリーンを押さ
え付けて移動させ、印刷をする。以後これを繰り返す。The conductor paste thus obtained is
It is applied to a ceramic substrate such as alumina, aluminum nitride, silicon carbide, silicon nitride, sialon, barium titanate, and PBZT by a method such as screen printing. In the screen printing procedure, a printed circuit board is placed under a horizontally placed screen (for example, stainless steel plain fabric, 300 mesh) at an interval of several millimeters. After the conductive paste is placed on the screen, it is spread over the entire screen using a squeegee. At this time, the screen and the printed circuit board have an interval. Subsequently, printing is performed by pressing and moving the screen with a squeegee to such an extent that the screen contacts the print substrate. Thereafter, this is repeated.
【0034】これを従来のように予備焼成することなく
直接、基板をベルト炉に入れ、窒素中、600〜100
0°Cの温度で5〜20分間(ピーク保持時間)焼成
し、銅粉を焼結させるとともに基板と反応接着させる。The substrate is directly placed in a belt furnace without pre-baking as in the prior art, and is placed in a nitrogen furnace at 600 to 100
It is baked at a temperature of 0 ° C. for 5 to 20 minutes (peak holding time) to sinter the copper powder and make it adhere to the substrate by reaction.
【0035】[0035]
【実施例】次に、本発明を具体的な実施例により更に詳
細に説明する。 実施例1〜3、比較例1〜2 (導体ペーストの作製)粒径40nmのCuもしくはC
u2 O、混合銅粉、そしてガラス粉を表1に示すように
混合した。混合銅粉としてベース銅粉と2種類の補助銅
粉からなる3種と、バインダー樹脂としてアクリル樹脂
をターピノールとカルビトールアセテートで溶かしたも
の、フェノール樹脂をターピノールとカルビトールアセ
テートで溶かしたものをそれぞれ用意した。尚、バイン
ダー樹脂は樹脂30重量%、ターピノール35重量%、
カルビトールアセテート35重量%からなる。上記これ
らを所定量混合し、更にインクロールにて均一に混合す
ることによって茶色の導体ペーストを作製した。Next, the present invention will be described in more detail with reference to specific examples. Examples 1-3, Comparative Examples 1-2 (Preparation of Conductive Paste) Cu or C having a particle size of 40 nm
u 2 O, mixed copper powder, and glass powder were mixed as shown in Table 1. Three kinds consisting of base copper powder and two kinds of auxiliary copper powder as mixed copper powder, and one in which acrylic resin was dissolved in terpinol and carbitol acetate as binder resin, and one in which phenol resin was dissolved in terpinol and carbitol acetate, respectively Prepared. The binder resin was 30% by weight of the resin, 35% by weight of terpinol,
Consists of 35% by weight carbitol acetate. A predetermined amount of the above was mixed and further uniformly mixed with an ink roll to produce a brown conductive paste.
【0036】(導体の作製)導体ペーストをステンレス
300のスクリーンを用いて窒化アルミ基板上に膜厚1
5μmで2×2mmに印刷した。上記基板を直接ベルト
炉に入れ、窒素中で酸素濃度0〜10ppm、900°
Cの焼成温度でピーク保持時間10分間焼成して基板を
作製した。(Preparation of Conductor) Conductor paste was applied to an aluminum nitride substrate with a film thickness of 1 using a stainless steel 300 screen.
Printing was performed at 5 μm to 2 × 2 mm. Place the above substrate directly in a belt furnace, oxygen concentration 0 to 10 ppm in nitrogen, 900 °
The substrate was baked at a calcination temperature of C for a peak holding time of 10 minutes to produce a substrate.
【0037】(評価方法)焼成後の導体の接着力および
電気抵抗値の測定方法は、以下の通りである。この評価
方法によって得られた結果を表1に示す。(Evaluation Method) The method of measuring the adhesive strength and electric resistance of the conductor after firing is as follows. Table 1 shows the results obtained by this evaluation method.
【0038】1.焼成後の導体膜の接着力(L型ピール
強度) L型に曲げた直径0.8mmのスズメッキ銅線を2mm
×2mmの大きさに焼成した導体の表面にハンダ付して
固定し、垂直に折り曲げた銅線の付着力をバネ計りで計
測し基板と導体間の接着力を求めた。1. Adhesive strength of conductor film after firing (L-type peel strength) Tin-plated copper wire with a diameter of 0.8 mm bent into an L-type is 2 mm
The adhesive strength between the substrate and the conductor was determined by measuring the adhesion of the copper wire, which was fixed to the surface of the conductor baked to a size of × 2 mm by soldering, and bent vertically using a spring meter.
【0039】2.導体の電気抵抗値 窒化アルミ基板上の厚さ10μm、直径15mmの導体
を用いて、四探針法により電気抵抗値を測定した。2. Electrical Resistance of Conductor Using a conductor having a thickness of 10 μm and a diameter of 15 mm on an aluminum nitride substrate, the electrical resistance was measured by a four-point probe method.
【0040】[0040]
【表1】 [Table 1]
【0041】この結果によると、実施例では、窒化アル
ミ基板と導体の接着力も高く、また導体の抵抗値も小さ
いことが判る。しかし、比較例では窒化アルミ基板と導
体の接着力は実質的にない。According to the results, it can be seen that in the example, the adhesive strength between the aluminum nitride substrate and the conductor is high, and the resistance value of the conductor is small. However, in the comparative example, there is substantially no adhesive force between the aluminum nitride substrate and the conductor.
【0042】[0042]
【発明の効果】以上のように、本願の各請求項記載の窒
化アルミ基板用銅導体ペースト及び窒化アルミ基板で
は、窒化アルミ基板と焼成膜との接着力が向上し、更に
焼成膜の抵抗値も小さい効果がある。As described above, according to the copper conductor paste for aluminum nitride substrate and the aluminum nitride substrate described in the claims of the present application, the adhesive strength between the aluminum nitride substrate and the fired film is improved, and the resistance value of the fired film is further improved. Also has a small effect.
Claims (9)
銅、銅酸化物、もしくはこれらの混合物からなる微粒子
に、平均粒子径0.5〜10μmの範囲にあるベース銅
粉を主にしこれに上記平均粒子径が小さい補助銅粉を少
なくとも1種類以上添加した混合銅粉と、バインダー樹
脂、ガラス粉末そして有機溶剤を添加した銅導体ペース
トであり、上記バインダー樹脂として少なくとも熱分解
温度250〜350°Cの樹脂を含む樹脂であり、また
上記ガラス粉末が上記微粒子や混合銅粉の焼結温度より
低くてかつバインダー樹脂の分解温度より高い軟化点を
有することを特徴とする窒化アルミ基板用銅導体ペース
ト。1. Fine particles comprising copper, copper oxide or a mixture thereof having an average particle diameter of 1 to 500 nm, and a base copper powder having an average particle diameter of 0.5 to 10 μm. A mixed copper powder to which at least one kind of auxiliary copper powder having a small average particle diameter is added, and a copper conductor paste to which a binder resin, a glass powder and an organic solvent are added, wherein the binder resin has a thermal decomposition temperature of at least 250 to 350 ° C. A copper conductor for an aluminum nitride substrate, wherein the glass powder has a softening point lower than the sintering temperature of the fine particles or mixed copper powder and higher than the decomposition temperature of the binder resin. paste.
0〜350°Cの樹脂と熱分解温度450〜550°C
の樹脂を使用し、しかも熱分解温度の低い樹脂を多く使
用する請求項1記載の窒化アルミ基板用銅導体ペース
ト。2. A binder resin having a thermal decomposition temperature of 25.
0-350 ° C resin and pyrolysis temperature 450-550 ° C
2. The copper conductor paste for an aluminum nitride substrate according to claim 1, wherein said resin is used and said resin has a low thermal decomposition temperature.
これより熱分解温度の高いフェノール樹脂を使用する請
求項2記載の窒化アルミ基板用銅導体ペースト。3. The copper conductor paste for an aluminum nitride substrate according to claim 2, wherein an acrylic resin and a phenol resin having a higher thermal decomposition temperature are used as the binder resin.
ノール樹脂の重量比を90:10〜99:1の範囲にあ
る請求項3記載の窒化アルミ基板用銅導体ペースト。4. The copper conductor paste for an aluminum nitride substrate according to claim 3, wherein the weight ratio of the acrylic resin and the phenol resin in the binder resin is in the range of 90:10 to 99: 1.
2種以上のものを使用する請求項1記載の窒化アルミ基
板用銅導体ペースト。5. The copper conductor paste for an aluminum nitride substrate according to claim 1, wherein at least two kinds of glass powders having different softening points are used.
分が2〜16重量%の範囲にある請求項1、2、3、4
または5記載の窒化アルミ基板用銅導体ペースト。6. The method according to claim 1, wherein the organic content of the binder resin and the organic solvent is in the range of 2 to 16% by weight.
Or the copper conductor paste for an aluminum nitride substrate according to 5.
銅、銅酸化物、もしくはこれらの混合物に、平均粒子径
0.5〜10μmの範囲にあるベース銅粉を主にしこれ
に上記平均粒子径が小さい補助銅粉を少なくとも1種類
以上添加した混合銅粉と、少なくとも熱分解温度250
〜350°Cの樹脂を含むバインダー樹脂、上記微粒子
や混合銅粉の焼結温度より低くてかつバインダー樹脂の
分解温度より高い軟化点を有するガラス粉末、そして有
機溶剤を添加してなる銅導体ペーストを窒化アルミ基板
に印刷し、焼成したことを特徴とする窒化アルミ基板。7. Copper or copper oxide having an average particle diameter in the range of 1 to 100 nm or a mixture thereof and a base copper powder having an average particle diameter in the range of 0.5 to 10 μm. A mixed copper powder to which at least one kind of auxiliary copper powder having a small diameter is added;
Binder resin containing a resin at a temperature of up to 350 ° C., glass powder having a softening point lower than the sintering temperature of the fine particles and mixed copper powder and higher than the decomposition temperature of the binder resin, and a copper conductor paste obtained by adding an organic solvent Printed on an aluminum nitride substrate and fired.
分が2〜16重量%の範囲にある請求項7記載の窒化ア
ルミ基板。8. The aluminum nitride substrate according to claim 7, wherein the organic content of the binder resin and the organic solvent is in the range of 2 to 16% by weight.
ノール樹脂の重量比を90:10〜99:1の範囲にあ
る請求項7記載の窒化アルミ基板。9. The aluminum nitride substrate according to claim 7, wherein the weight ratio of the acrylic resin and the phenol resin in the binder resin is in the range of 90:10 to 99: 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP09836797A JP3756283B2 (en) | 1997-03-31 | 1997-03-31 | Copper conductor paste for aluminum nitride substrate and aluminum nitride substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP09836797A JP3756283B2 (en) | 1997-03-31 | 1997-03-31 | Copper conductor paste for aluminum nitride substrate and aluminum nitride substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10283840A true JPH10283840A (en) | 1998-10-23 |
| JP3756283B2 JP3756283B2 (en) | 2006-03-15 |
Family
ID=14217919
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP09836797A Expired - Fee Related JP3756283B2 (en) | 1997-03-31 | 1997-03-31 | Copper conductor paste for aluminum nitride substrate and aluminum nitride substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3756283B2 (en) |
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| WO2012060262A1 (en) * | 2010-11-04 | 2012-05-10 | 株式会社日立製作所 | Sinter bonding agent, method for producing same, and bonding method using same |
| JP2016195126A (en) * | 2011-08-05 | 2016-11-17 | 積水化学工業株式会社 | Bonding composition, bonded structure, and method of manufacturing bonded structure |
| US20140363681A1 (en) * | 2013-06-07 | 2014-12-11 | Heraeus Precious Metals North America Conshohocken, Llc | Thick print copper pastes for aluminum nitride substrates |
| US9799421B2 (en) | 2013-06-07 | 2017-10-24 | Heraeus Precious Metals North America Conshohocken Llc | Thick print copper pastes for aluminum nitride substrates |
| WO2017159611A1 (en) * | 2016-03-15 | 2017-09-21 | 石原ケミカル株式会社 | Fine copper particle dispersion liquid, electroconductive film formation method, and circuit board |
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| CN113196471A (en) * | 2019-01-10 | 2021-07-30 | 材料概念有限公司 | Electronic component and method for manufacturing the same |
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| CN119462193A (en) * | 2024-10-09 | 2025-02-18 | 江苏富乐华半导体科技股份有限公司 | A method for solving poor insulation between DCB copper islands |
| CN119462193B (en) * | 2024-10-09 | 2025-06-13 | 江苏富乐华半导体科技股份有限公司 | A method for solving poor insulation between DCB copper islands |
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