JPH10293260A - Multi-beam scanner - Google Patents

Multi-beam scanner

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Publication number
JPH10293260A
JPH10293260A JP9100454A JP10045497A JPH10293260A JP H10293260 A JPH10293260 A JP H10293260A JP 9100454 A JP9100454 A JP 9100454A JP 10045497 A JP10045497 A JP 10045497A JP H10293260 A JPH10293260 A JP H10293260A
Authority
JP
Japan
Prior art keywords
scanning
light
scanning lines
optical
deflected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9100454A
Other languages
Japanese (ja)
Other versions
JP3527385B2 (en
Inventor
Masakane Aoki
真金 青木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP10045497A priority Critical patent/JP3527385B2/en
Priority to US08/916,959 priority patent/US6069723A/en
Priority to KR1019970041279A priority patent/KR100283194B1/en
Publication of JPH10293260A publication Critical patent/JPH10293260A/en
Priority to US09/552,730 priority patent/US6266174B1/en
Application granted granted Critical
Publication of JP3527385B2 publication Critical patent/JP3527385B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

(57)【要約】 【課題】光スポットのスポット径変動を伴うこと無く、
ピッチ偏差を有効に軽減したマルチビーム走査装置を実
現する。 【解決手段】複数の光源からの複数の光束を共通の光偏
向器30で偏向させ、複数の偏向光束を共通の走査結像
光学系41により被走査面500上に、副走査方向に互
いに分離した複数の光スポットとして集光させ、複数走
査線を同時に走査するマルチビーム走査装置において、
複数の光スポットの同時の走査による複数の走査線S1
〜S4の曲がりが同じ向きとなるようにした。
(57) [Summary] [Problem] Without changing the spot diameter of a light spot,
A multi-beam scanning device in which pitch deviation is effectively reduced is realized. A plurality of light beams from a plurality of light sources are deflected by a common light deflector, and the plurality of deflected light beams are separated from each other on a surface to be scanned by a common scanning image forming optical system in a sub-scanning direction. In a multi-beam scanning apparatus that collects light beams as a plurality of light spots and simultaneously scans a plurality of scanning lines,
Multiple scanning lines S1 by simultaneous scanning of multiple light spots
The bends in steps S4 to S4 have the same direction.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明はマルチビーム走査
装置に関する。
The present invention relates to a multi-beam scanning device.

【0002】[0002]

【従来の技術】光プリンタ等の画像形成装置に関連して
従来から広く知られた光走査装置は、単一の光束による
走査で画像の書込みを行なうシングルビーム方式である
が、近来、書込み速度の向上を目して、複数光束により
一度に複数の走査線を走査する「マルチビーム走査装
置」の実現が意図されている。
2. Description of the Related Art An optical scanning device, which has been widely known in relation to an image forming apparatus such as an optical printer, is a single beam type in which an image is written by scanning with a single light beam. With the aim of improving the image quality, it is intended to realize a “multi-beam scanning device” that scans a plurality of scanning lines at a time with a plurality of light beams.

【0003】シングルビーム走査方式では、光源から放
射された光束は、その主光線が光学系の光軸に合致する
ようにして光偏向器に導かれ、光偏向器で偏向された光
束の主光線は、fθレンズ等の走査結像光学系の光軸を
含む面内で偏向する。このようなシングルビーム走査方
式では、光スポットの移動軌跡である走査線には「曲が
り」は殆ど生じない。
In the single beam scanning system, a light beam emitted from a light source is guided to an optical deflector such that its principal ray coincides with the optical axis of the optical system, and the principal ray of the light beam deflected by the optical deflector is used. Is deflected in a plane including the optical axis of a scanning imaging optical system such as an fθ lens. In such a single-beam scanning method, “bending” hardly occurs on a scanning line that is a movement locus of a light spot.

【0004】しかるにマルチビーム走査装置では、光源
からの複数光束の一部は、光源から被走査面に到る光路
が、光学系の光軸に対して副走査対応方向(光源から被
走査面に到る光路を直線的に展開した仮想的な光路上で
副走査方向に平行的に対応する方向、上記仮想的な光路
上で主走査方向に平行的に対応する方向を主走査対応方
向という)へずれ、このように光軸に対してずれた光束
による光スポットが走査する走査線は直線にならず、僅
かながら湾曲する。
However, in the multi-beam scanning device, a part of a plurality of light beams from the light source is transmitted from the light source to the surface to be scanned in a sub-scanning direction (from the light source to the surface to be scanned) with respect to the optical axis of the optical system. (A direction parallel to the sub-scanning direction on a virtual optical path obtained by linearly developing an incoming optical path, and a direction parallel to the main scanning direction on the virtual optical path is referred to as a main scanning corresponding direction.) The scanning line scanned by the light spot of the light beam shifted from the optical axis in this manner is not straight but slightly curved.

【0005】図2(a),(b)は、4つの光源からの光束
により4つの光スポットを得、4本の走査線を同時に走
査する場合が例示されている。S1〜S4がそれぞれ走
査線を示す。破線で示す線Aは、「偏向光束の主光線
が、走査結像光学系の光軸を含み主走査対応方向に平行
な面内で偏向して走査を行なった場合の理想的な走査線
(シングルビーム走査方式の場合の走査線に相当し、曲
がりがない)」を示し、これを基準線A0と称する。
FIGS. 2A and 2B illustrate a case where four light spots are obtained by light beams from four light sources and four scanning lines are simultaneously scanned. S1 to S4 indicate scanning lines, respectively. A line A indicated by a broken line indicates “an ideal scanning line when the scanning is performed while the principal ray of the deflected light beam is deflected in a plane including the optical axis of the scanning imaging optical system and parallel to the main scanning corresponding direction. This corresponds to a scanning line in the case of the single beam scanning method and has no bending), and is referred to as a reference line A0.

【0006】図2(a)に示す例では、走査線S1,S2
はそれぞれ基準線A0に対し、副走査方向(図の上下方
向)において走査線S3,S4と対称的である。走査線
S1,S2は図の上方へ向かって「単純に凸」に湾曲し
ており、走査線S3,S4は、図の下方に向かって「単
純に凸」に湾曲している。図2(a)は「4つの光スポッ
トによる同時の走査」が、相続いて2回行なわれたとき
の走査線の状態を示している。これら2回の走査のう
ち、先に行なわれたのが走査B1で、後に行なわれたの
が走査B2である。従って、光書込みは、走査B1,B
2のような走査が交互に繰り返されることにより行なわ
れる。
In the example shown in FIG. 2A, scanning lines S1 and S2
Are symmetric with respect to the reference line A0 in the sub-scanning direction (vertical direction in the figure) with respect to the scanning lines S3 and S4. The scanning lines S1 and S2 are curved “simplely convex” upward in the figure, and the scanning lines S3 and S4 are curved “simplely convex” downward in the figure. FIG. 2A shows the state of the scanning lines when “simultaneous scanning by four light spots” is performed twice successively. Of these two scans, the scan B1 is performed first, and the scan B2 is performed later. Therefore, the optical writing is performed by scanning B1, B
Scanning such as 2 is performed alternately.

【0007】すると、走査線S1〜S4の湾曲のため、
図に「イ」で示す部分では、走査B1における走査線S
4と、走査B2における走査線S1との間隔(走査線の
ピッチ)が狭くなり、「ロ」で示す部分では、走査線S
2とS3とのピッチが広くなる。換言すれば、走査によ
り書き込まれる記録画像の、主走査方向中央部近傍の画
像密度が副走査方向に周期的に変動し、記録画像の像質
低下の原因になる。
Then, due to the curvature of the scanning lines S1 to S4,
In the portion indicated by “A” in FIG.
4 and the scanning line S1 in the scanning B2 (the pitch of the scanning lines) becomes narrower.
The pitch between 2 and S3 becomes wider. In other words, the image density of the recorded image written by scanning in the vicinity of the central portion in the main scanning direction periodically fluctuates in the sub-scanning direction, causing deterioration in the image quality of the recorded image.

【0008】図2(b)には、4つの光スポットS1〜S
4による同時の走査C1とこれに続く走査C2が描かれ
ている。走査線S1とS4、走査線S2とS3は、それ
ぞれ基準線A0に対して副走査方向に対称的である。走
査線S1,S2には、主走査方向(図の左右方向)にお
いて「なだらかな山」が2つあり、中央部に「緩やかな
谷」があるような湾曲であり、湾曲の程度は走査線S1
のほうが走査線S2より大きい。走査線S3,S4は、
主走査方向において「緩やかな谷」が2つあり、中央部
に「なだらかな山」があるような湾曲であり、湾曲の程
度は走査線S4のほうが走査線S3より大きい。
FIG. 2B shows four light spots S1 to S
4, a simultaneous scan C1 and a subsequent scan C2 are depicted. The scanning lines S1 and S4 and the scanning lines S2 and S3 are respectively symmetrical in the sub-scanning direction with respect to the reference line A0. The scanning lines S1 and S2 are curved such that there are two “gentle peaks” in the main scanning direction (the left-right direction in the drawing) and “gentle valleys” at the center, and the degree of curvature is the scanning line. S1
Is larger than the scanning line S2. The scanning lines S3 and S4 are
In the main scanning direction, the curve has two “gentle valleys” and a “gentle peak” in the center, and the degree of curvature is greater in the scanning line S4 than in the scanning line S3.

【0009】この場合は、走査C1における走査線S4
と、走査C2における走査線S1の「湾曲の向き」が逆
になるため、「ハ」で示す部分では走査線間のピッチが
大きく、「ニ」で示す部分ではピッチが小さくなる。従
って、記録画像における画像密度が「連続する2走査C
1,C2の境界部」で主走査方向に変動して画質を低下
させる原因となる。
In this case, the scan line S4 in the scan C1
Since the “curvature direction” of the scanning line S1 in the scanning C2 is reversed, the pitch between the scanning lines is large in the portion indicated by “C”, and the pitch is small in the portion indicated by “D”. Therefore, if the image density in the recorded image is “continuous two scans C
1 and C2 at the boundary "in the main scanning direction, which causes deterioration in image quality.

【0010】このように、マルチビーム走査装置におい
て、走査線の湾曲に起因して生じる走査線間のピッチの
変動を「ピッチ偏差」とよぶ。ピッチ偏差は上記のよう
に、記録画像の像質を低下させる原因となる。
[0010] As described above, in the multi-beam scanning apparatus, the fluctuation of the pitch between the scanning lines caused by the curvature of the scanning lines is called "pitch deviation". As described above, the pitch deviation causes the image quality of a recorded image to deteriorate.

【0011】上記の如き「ピッチ偏差」を軽減させる方
法として、特開平7−199109号公報記載の方法の
ように、走査結像光学系により「像面湾曲を意図的に発
生させる」方法が知られている。この方法ではピッチ偏
差自体は軽減されるものの、像面湾曲を意図的に発生さ
せたことに伴い、被走査面上における光スポットのスポ
ット径が像高とともに大きく変動し、特に像高の大きい
ところでスポット径が大きくなりやすく、やはり、記録
画像の像質を低下させる原因になる。
As a method of reducing the "pitch deviation" as described above, there is known a method of "intentionally generating a field curvature" by a scanning image forming optical system as disclosed in Japanese Patent Application Laid-Open No. 7-199109. Have been. Although the pitch deviation itself is reduced by this method, the spot diameter of the light spot on the surface to be scanned fluctuates greatly with the image height due to the intentional generation of the field curvature, and particularly in a place where the image height is large. The spot diameter tends to be large, which again causes the image quality of the recorded image to deteriorate.

【0012】[0012]

【発明が解決しようとする課題】この発明は、光スポッ
トのスポット径の大きな変動を伴うこと無く、ピッチ偏
差を有効に軽減できるマルチビーム走査装置の実現を課
題とする。
SUMMARY OF THE INVENTION It is an object of the present invention to realize a multi-beam scanning apparatus capable of effectively reducing a pitch deviation without a large change in the spot diameter of a light spot.

【0013】[0013]

【課題を解決するための手段】この発明のマルチビーム
走査装置は「複数の光源からの複数の光束を共通の光偏
向器で偏向させ、複数の偏向光束を共通の走査結像光学
系により、被走査面上に、副走査方向に互いに分離した
複数の光スポットとして集光させ、複数走査線を同時に
走査するマルチビーム走査装置」であって、走査結像光
学系が反射型結像素子を有する。「反射型結像素子」
は、結像機能を持ち、共通の光偏向器により偏向された
複数の偏向光束は、上記反射型結像素子に入射して反射
される。反射型結像素子は、反射光束の光路が入射光束
の光路と重ならず、且つ、複数の光スポットの同時の走
査による複数の走査線の曲がりが、同じ向きとなるよう
に配備態位を定められる(請求項1)。
According to the multi-beam scanning apparatus of the present invention, "a plurality of light beams from a plurality of light sources are deflected by a common optical deflector, and a plurality of deflected light beams are scanned by a common scanning image forming optical system. A multi-beam scanning device that converges as a plurality of light spots separated from each other in the sub-scanning direction on the surface to be scanned and simultaneously scans a plurality of scanning lines, wherein the scanning imaging optical system includes a reflection type imaging element. Have. `` Reflective imaging element ''
Has an image forming function, and a plurality of deflected light beams deflected by a common optical deflector are incident on the reflection type imaging element and reflected. The reflective imaging element is arranged so that the optical path of the reflected light beam does not overlap with the optical path of the incident light beam, and the bending of a plurality of scanning lines due to simultaneous scanning of a plurality of light spots has the same direction. It is determined (claim 1).

【0014】「複数の走査線の曲がりが同じ向きとな
る」とは、例えば、図2(a)の走査線S1とS2や、図
2(b)の走査線S1とS2のように、「各光スポットの
像高が同じ部分では、走査線が同じ向きに曲がってい
る」ことを意味する。この意味からすると、例えば図2
(a)の走査線S2とS3とは、走査線の曲がりが互いに
逆向きである。即ち、図2(a)の例では、4本の走査線
S1〜S4のうち、走査線S1,S2の曲がりが同じ向
きであり、走査線S3,S4の曲がりが同じ向きである
が、走査線S1,S2における曲がりの向きと、走査線
S3,S4における曲がりの向きは互いに逆である。
"A plurality of scanning lines bend in the same direction" means, for example, "scanning lines S1 and S2 in FIG. 2A and scanning lines S1 and S2 in FIG. 2B." In the portion where the image height of each light spot is the same, the scanning line is bent in the same direction. " In this sense, for example, FIG.
The scanning lines S2 and S3 in (a) have the scanning lines bent in opposite directions. That is, in the example of FIG. 2A, among the four scanning lines S1 to S4, the curvatures of the scanning lines S1 and S2 are the same, and the curvatures of the scanning lines S3 and S4 are the same. The directions of the bends in the lines S1 and S2 are opposite to the directions of the bends in the scanning lines S3 and S4.

【0015】この発明においては、同時に走査される走
査線の本数がn(>1)本であるとすれば、これらn本
の走査線の曲がりが「全て同じ向きになる」ようにす
る。
In the present invention, assuming that the number of scanning lines scanned simultaneously is n (> 1), the curvatures of these n scanning lines are set to "all have the same direction".

【0016】図2に即して説明したように、走査線のピ
ッチ偏差は「隣接する走査線における曲がりの向きが逆
になる」ことにより発生するから、この発明におけるよ
うに「一度に走査されるn本の走査線の曲がりの向きを
揃える」ことにより、走査線のピッチ偏差を有効に軽減
させることができる。
As described with reference to FIG. 2, since the pitch deviation of the scanning line is caused by "the direction of the bend in the adjacent scanning line is reversed", as described in the present invention, the "scanning at one time" is performed. By aligning the bending directions of the n scanning lines, the pitch deviation of the scanning lines can be effectively reduced.

【0017】また、この発明においては、走査線のピッ
チ偏差を軽減させるのに、意図的に像面湾曲を発生させ
ることがないから、光スポットのスポット径が像高によ
り大きく変動することもない。
Further, in the present invention, since the curvature of field is not intentionally generated in order to reduce the pitch deviation of the scanning line, the spot diameter of the light spot does not greatly vary with the image height. .

【0018】反射型結像素子の「配備態位」は上記のご
とく、反射光束の光路が入射光束の光路と重ならず、且
つ、複数の光スポットの同時の走査による複数の走査線
の曲がりが同じ向きとなるように定められるが、このよ
うな配備態位は、反射型結像素子を主走査対応方向に平
行な軸の回りに回転させて、反射面を入射光束の入射方
向に対して副走査対応方向や主走査対応方向に傾けたり
(所謂「ティルト」)、反射型結像素子を副走査対応方向
へ平行移動させたり(所謂「シフト」)することであり、
このように反射型結像素子をティルトやシフトを持たせ
て配備することにより同時に、複数の走査線の曲がりを
「同じ向き」に揃え、且つ、ティルト量やシフト量を調
整することによって、走査線間のピッチ偏差を有効に軽
減することができる。
As described above, the "deployment position" of the reflection type imaging element is such that the light path of the reflected light beam does not overlap with the light path of the incident light beam, and that a plurality of scanning lines are bent by simultaneous scanning of a plurality of light spots. Are arranged in the same direction, but such an arrangement is such that the reflection type imaging element is rotated around an axis parallel to the main scanning corresponding direction, and the reflection surface is rotated with respect to the incident direction of the incident light beam. To tilt in the sub-scanning direction or the main scanning direction.
(So-called "tilt"), or to translate the reflective imaging element in the sub-scanning corresponding direction (so-called "shift").
By arranging the reflection type imaging element with tilt and shift in this manner, the scanning of the plurality of scanning lines is simultaneously adjusted in the “same direction”, and the tilt and shift are adjusted. Pitch deviation between lines can be effectively reduced.

【0019】上記請求項1記載のマルチビーム走査装置
においては「反射型結像素子と被走査面との間に、少な
くとも副走査対応方向にパワーを持つ光学素子を有す
る」ことができる(請求項2)。「少なくとも副走査対
応方向にパワーを持つ光学素子」は、例えば、副走査対
応方向にパワーを有するシリンダレンズ、あるいはトロ
イダルレンズやその変形(樽型の面を持つ変形トロイダ
ルレンズ等)である。
In the multi-beam scanning device according to the first aspect, it is possible to have “an optical element having power at least in the sub-scanning corresponding direction between the reflection type imaging element and the surface to be scanned”. 2). The “optical element having power at least in the sub-scanning corresponding direction” is, for example, a cylinder lens having power in the sub-scanning corresponding direction, or a toroidal lens or a deformation thereof (a deformed toroidal lens having a barrel-shaped surface).

【0020】上記請求項1または2記載のマルチビーム
走査装置において、走査結像光学系により被走査面上に
集光された複数の光スポットは、互いに隣接する走査線
を同時に走査するようにすることができる。
In the multi-beam scanning device according to the first or second aspect, the plurality of light spots condensed on the surface to be scanned by the scanning image forming optical system scan the adjacent scanning lines simultaneously. be able to.

【0021】[0021]

【発明の実施の形態】図1(a)は請求項1記載の発明の
実施の1形態を示している。図1(a)に示すように、光
源部100から放射された4本の光束は共通のカップリ
ングレンズ200により平行光束化され、シリンダレン
ズ250によりそれぞれ副走査対応方向に集束され、共
通の光偏向器であるポリゴンミラー30の偏向反射面近
傍に主走査対応方向に長い線像として結像され、ポリゴ
ンミラー30により同時に偏向され、「走査結像光学
系」をなす結像機能を持つ反射型結像素子である凹面鏡
41(主走査を等速化する機能を有するので、以下、f
θミラー41と呼ぶ)に反射され、fθミラー41の作
用により被走査面に周面を合致させた光導電性の感光体
500上に「副走査方向に互いに分離した4つの光スポ
ット」として集光し、4本の走査線S1,S2,S3,
S4を同時に走査する。
FIG. 1A shows a first embodiment of the present invention. As shown in FIG. 1A, the four light beams emitted from the light source unit 100 are converted into parallel light beams by a common coupling lens 200, and are focused in the sub-scanning corresponding direction by a cylinder lens 250, respectively. A reflection type having an image forming function of forming a long line image in the main scanning corresponding direction near the deflecting reflection surface of the polygon mirror 30 serving as a deflector and being simultaneously deflected by the polygon mirror 30 to form a “scanning image forming optical system”. The concave mirror 41 serving as an imaging element (has a function of making the main scanning speed uniform, so that f
(referred to as the θ mirror 41) and collected as “four light spots separated from each other in the sub-scanning direction” on the photoconductive photoreceptor 500 whose peripheral surface matches the surface to be scanned by the action of the fθ mirror 41. Illuminate the four scanning lines S1, S2, S3
Scan S4 simultaneously.

【0022】図1(b)は、ポリゴンミラー30から感光
体500に到る光路状態を、主走査対応方向から見た状
態を示している。この図に示すように、反射型結像素子
であるfθミラー41は、反射光束CFの光路が入射光
束BFの光路と重ならないように、副走査対応方向のテ
ィルト角:βやシフト量:ΔZを与えられており、この
配備態位により、4本の走査線S1〜S4の曲がりを同
じ向きに揃え、ピッチ偏差を有効に軽減させている。
FIG. 1B shows the state of the optical path from the polygon mirror 30 to the photosensitive member 500 as viewed from the main scanning corresponding direction. As shown in this figure, the fθ mirror 41, which is a reflection-type imaging element, adjusts the tilt angle: β and the shift amount: ΔZ in the sub-scanning corresponding direction so that the optical path of the reflected light beam CF does not overlap the optical path of the incident light beam BF. With this arrangement, the curvatures of the four scanning lines S1 to S4 are aligned in the same direction, and the pitch deviation is effectively reduced.

【0023】図3は請求項1,2記載の発明の実施の1
形態を示す図である。図3(a)に示すように、光源部1
00から放射された4本の光束は共通のカップリングレ
ンズ200により平行光束化され、シリンダレンズ25
0により副走査対応方向に集光され、共通の光偏向器で
あるポリゴンミラー30の偏向反射面近傍の位置に主走
査対応方向に長い線像として結像し、ポリゴンミラー3
0により同時に偏向されてfθミラー42に入射する。
fθミラー42に反射された各光束は、長尺トロイダル
レンズ45(請求項2記載の発明における「少なくとも
副走査対応方向にパワーを持つ光学素子」)を介して、
感光体500上に集光する。集光作用はfθミラー42
と長尺トロイダルレンズ45により行なわれる。集光さ
れた4光束は感光体500上に「副走査方向に互いに分
離した4つの光スポット」を形成し、4本の走査線S
1,S2,S3,S4を同時に走査する。
FIG. 3 shows a first embodiment of the present invention.
It is a figure showing a form. As shown in FIG.
The four light beams radiated from the light source 00 are converted into parallel light beams by the common coupling lens 200,
0, the light is condensed in the sub-scanning corresponding direction, forms an image as a long linear image in the main scanning corresponding direction at a position near the deflecting reflection surface of the polygon mirror 30 which is a common optical deflector, and
The light is simultaneously deflected by 0 and enters the fθ mirror 42.
Each of the light beams reflected by the fθ mirror 42 passes through a long toroidal lens 45 (“at least an optical element having power in the sub-scanning corresponding direction” in the invention described in claim 2).
The light is focused on the photoconductor 500. The condensing action is the fθ mirror 42
And a long toroidal lens 45. The condensed four light beams form “four light spots separated from each other in the sub-scanning direction” on the photoconductor 500, and the four scanning lines S
1, S2, S3, and S4 are simultaneously scanned.

【0024】図1(b)に倣って図3(b)に示すように、
fθミラー42は、反射光束CF’の光路が入射光束B
F’の光路と重ならないように、副走査対応方向のティ
ルト角:βやシフト量:ΔZを与えられており、この配
備態位により、4本の走査線S1〜S4の曲がりを同じ
向きに揃え、ピッチ偏差を有効に軽減させている。
As shown in FIG. 3 (b) following FIG. 1 (b),
fθ mirror 42 is such that the optical path of reflected light beam CF ′ is incident light beam B
A tilt angle: β and a shift amount: ΔZ in the sub-scanning corresponding direction are given so as not to overlap with the optical path of F ′. With this arrangement, the bending of the four scanning lines S1 to S4 is changed in the same direction. Alignment and pitch deviation are effectively reduced.

【0025】図1に示した実施の形態では、走査線S1
〜S4の曲がりは図3(c−1)に示すように「副走査方
向の一方に凸の単純な湾曲」であるが、図3(a)に示す
実施の形態では、長尺トロイダルレンズ45の作用によ
り、走査線S1〜S4の曲がりの形態は図3(c−2)に
示す如く「主走査中央部が谷状」になり、湾曲量も、
(c−1)の湾曲量:W1から(c−2)の湾曲量:W2に減
少する。
In the embodiment shown in FIG. 1, the scanning line S1
3C is "a simple curve that is convex in one of the sub-scanning directions" as shown in FIG. 3C, but in the embodiment shown in FIG. 3A, the long toroidal lens 45 is used. As a result, the scanning lines S1 to S4 bend in a “valley shape in the center of the main scanning” as shown in FIG.
bending amount of (c-1): bending amount from W 1 (c-2): it is reduced to W 2.

【0026】図1、図3の実施の形態において、カップ
リングレンズ200の作用をコリメート作用に換え、光
源部100からの4光束をそれぞれ「弱い発散性の光
束」や「弱い集束性の光束」にすることもできる。
In the embodiment shown in FIGS. 1 and 3, the function of the coupling lens 200 is changed to a collimating function, and the four light beams from the light source unit 100 are respectively referred to as "weakly divergent light beams" and "weakly convergent light beams". You can also

【0027】図1,図3に即して説明した上記実施の形
態で、同時に走査される走査線S1〜S4は「記録画像
において互いに隣接する走査線」となっている。しか
し、マルチビームにより同時に走査される複数の走査線
は、記録画像上において必ずしも隣接しなくてもよい。
例えば、図1や図3において、走査線S1とS2の間、
走査線S2とS3の間、走査線S3とS4の間は、記録
画像を形成する走査線ピッチの整数倍となっていてもよ
い。しかし、走査線間の間隔が開きすぎると、各偏光光
束に対する反射型結像素子の結像作用がかなり異なるも
のとなり、各走査線の曲がりの向きは揃っても、曲がり
の程度が走査線ごとに異なる状況に成り、このようにな
ると、走査線間のピッチ偏差が大きくなるので、上記整
数倍における整数としては10以下程度の小さい値が適
当である。
In the embodiment described with reference to FIGS. 1 and 3, the scanning lines S1 to S4 which are simultaneously scanned are "scanning lines adjacent to each other in a recorded image". However, a plurality of scanning lines that are simultaneously scanned by the multi-beam need not necessarily be adjacent on the recorded image.
For example, in FIGS. 1 and 3, between the scanning lines S1 and S2,
The interval between the scanning lines S2 and S3 and the interval between the scanning lines S3 and S4 may be an integral multiple of the scanning line pitch for forming a recording image. However, if the intervals between the scanning lines are too wide, the imaging effect of the reflection type imaging element on each polarized light beam is considerably different, and even if the scanning lines have the same bending direction, the degree of bending is different for each scanning line. In this case, the pitch deviation between the scanning lines becomes large. Therefore, a small value of about 10 or less is appropriate as an integer in the integral multiple.

【0028】[0028]

【実施例】以下、図3に即して説明した実施の形態に類
する具体的な実施例を2例説明する。図4は、以下に説
明する「実施例に関する光学配置」を説明するための図
である。繁雑を避けるため、混同の虞れがないと思われ
るものに就いては図3におけると同一の符号を用いた。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, two specific examples similar to the embodiment described with reference to FIG. 3 will be described. FIG. 4 is a diagram for explaining the “optical arrangement according to the embodiment” described below. In order to avoid complication, the same reference numerals as those in FIG. 3 are used for those which do not seem to be confused.

【0029】図4は、光源部100から被走査面500
(感光体の周面)に至る光路を直線的に展開し、これを
fθミラー42による反射位置で折り返した状態を示
す。実際の光学系配置は図3(a)に示す如くである。図
3の実施の形態では、光源部100として4つの光源を
有するものを説明したが、以下に説明する実施例1では
光源(発光部)が3個であり、実施例2では光源は2個
である。以下の説明において「長さの次元を持つ量」の
単位は、特にことわらない限り「mm」である。
FIG. 4 is a diagram showing a state in which the light source section 100 scans the surface 500 to be scanned.
The optical path leading to the (peripheral surface of the photoreceptor) is linearly developed, and this is folded at the reflection position of the fθ mirror 42. The actual arrangement of the optical system is as shown in FIG. In the embodiment of FIG. 3, the light source unit 100 having four light sources has been described. However, in the first embodiment described below, three light sources (light emitting units) are provided, and in the second embodiment, two light sources are provided. It is. In the following description, the unit of “amount having a dimension of length” is “mm” unless otherwise specified.

【0030】図4において、カップリングレンズ200
は、光源側面が曲率半径:rcp1=∞の平面で、アパー
チュア側の面が曲率半径:rcp2=−10.2987の
球面、肉厚:dcp=3、材質の屈折率ncp=1.712
205で、焦点距離:fcp=14.46の「平凸レン
ズ」であり、光源部100からの光束を平行光束に近い
弱い発散性の光束にする。
In FIG. 4, a coupling lens 200 is shown.
The light source side is a radius of curvature in the plane of r cp1 = ∞, the surface of the aperture-side curvature radius sphere of r cp2 = -10.2987, thickness: d cp = 3, the refractive index of the material n cp = 1 .712
At 205, a “plano-convex lens” with a focal length: f cp = 14.46 turns the light beam from the light source unit 100 into a weak divergent light beam close to a parallel light beam.

【0031】シリンダレンズ250は、アパーチュア側
の面が曲率半径:rcy1=29.5のシリンドリカル
面、ポリゴンミラー側の面が曲率半径:rcp2=∞の平
面で、肉厚:dcy=3、材質の屈折率:ncy=1.51
1176の「平凸レンズ」である。光源100からシリ
ンダレンズ250に至る部分は光源側光学系ユニットA
1としてユニット化されている。
In the cylinder lens 250, the surface on the aperture side is a cylindrical surface with a radius of curvature: r cy1 = 29.5, the surface on the polygon mirror side is a plane with a radius of curvature: r cp2 = ∞, and the thickness is d cy = 3. , Material refractive index: n cy = 1.51
1176 is a “plano-convex lens”. The part from the light source 100 to the cylinder lens 250 is a light source side optical system unit A
It is unitized as 1.

【0032】fθミラー42の鏡面は、光軸方向にX
軸、光軸直交方向にY軸を取るとき、Rを近軸曲率半
径、K,A,B,C,D,..を定数として、 X=Y2/[R+R√{1−(1+Ki)(Y/R)2}]+A
・Y4+B・Y6+C・Y8+D・Y10+... なる式で表される「非円弧形状」を、対称軸の回りに回
転して得られる共軸非球面であって、上記非円弧形状
は、 R=−405.046,K=−1.46661, A= 3.12269×10~10,B=−9.1975
6×10~15, C=−1.14431×10~18,D=−1.3909
5×10~23 により特定される。
The mirror surface of the fθ mirror 42 is X in the optical axis direction.
When taking the Y axis in the direction orthogonal to the axis and the optical axis, R is the paraxial radius of curvature, K, A, B, C, D,. . X = Y 2 / [R + R√ {1- (1 + K i ) (Y / R) 2 }] + A
.Y 4 + B · Y 6 + C · Y 8 + D · Y 10 +. . . Is a coaxial aspherical surface obtained by rotating the “non-circular shape” represented by the following formula around the axis of symmetry, and the non-circular shape is as follows: R = −405.046, K = −1.46661 , A = 3.12269 × 10 ~ 10 , B = -9.1975
6 × 10 to 15 , C = −1.14331 × 10 to 18 , D = −1.3909
It is specified by 5 × 10 to 23 .

【0033】長尺トロイダルレンズ45は、fθミラー
42側の面が「樽型トロイダル面」で、被走査面側の面
が「ノーマルトロイダル面」である。「樽型トロイダル
面」は、「光軸と長手方向(光軸に直交する長手方向)
を含む平面内の形状」が、光軸方向にx軸、長手方向に
y軸を取るとき、rM1を上記平面内における近軸曲率半
径、k,a,b,c,d,..を定数として、 x=y2/[rM1+rM1√{1−(1+k)(Y/rM1)2}]
+a・y4+b・y6+c・y8+d・y10+... なる式で表される「非円弧形状」で、この非円弧形状
を、光軸上でこの非円弧形状からfθミラー側に
「rS1」だけ離れ「上記長手方向に平行な軸」の回りに
回転して得られる形状である。
The long toroidal lens 45 has a “barrel-shaped toroidal surface” on the fθ mirror 42 side and a “normal toroidal surface” on the surface to be scanned. The “barrel toroidal surface” is defined as “the optical axis and the longitudinal direction (the longitudinal direction perpendicular to the optical axis).
When the shape in the plane including “x” takes the x-axis in the optical axis direction and the y-axis in the longitudinal direction, r M1 is the paraxial radius of curvature in the plane, k, a, b, c, d,. . X = y 2 / [r M1 + r M1 √ {1- (1 + k) (Y / r M1 ) 2 }]
+ A · y 4 + by · y 6 + c · y 8 + d · y 10 +. . . In the “non-arc shape” represented by the following formula, the non-arc shape is separated from the non-arc shape on the optical axis by “r S1 ” toward the fθ mirror side around the “axis parallel to the longitudinal direction”. This is the shape obtained by rotation.

【0034】「ノーマルトロイダル面」は、光軸と上記
長手方向とを含む面内の曲率半径が「rM2」で、光軸を
含み長手方向に直交する面内の曲率半径が「rS2」であ
るトロイダル面である。
The "normal toroidal surface" has a radius of curvature "r M2 " in a plane including the optical axis and the longitudinal direction, and has a radius of curvature "r S2 " in a plane including the optical axis and orthogonal to the longitudinal direction. Is a toroidal surface.

【0035】長尺トロイダルレンズ45に関する上記各
量および、肉厚:dTR、材質の屈折率:nTRは以下の如
くである。
The elongated toroidal lens 45 each quantity and a wall thickness: d TR, the material of the refractive index: n TR is as follows.

【0036】 rM1= 692.522,k=−1.7171 , a=−8.45792×10~10,b= 1.09879×10~14, c= 1.47422×10~18,d= 2.92312×10~23S1=69.2, rM2=667.087,rS2=30.8,dTR=3.254, nTR=1.5721 。[0036] r M1 = 692.522, k = -1.7171 , a = -8.45792 × 10 ~ 10, b = 1.09879 × 10 ~ 14, c = 1.47422 × 10 ~ 18, d = 2.92312 × 10 to 23 r S1 = 69.2, r M2 = 667.087, r S2 = 30.8, d TR = 3.254, n TR = 1.5721.

【0037】図4に示す間隔:d1〜d5、L0,L、f
θミラー42の主走査対応方向のティルト角:α41、副
走査対応方向のシフト量:Z41、長尺トロイダルレンズ
45の副走査対応方向のシフト量:Z45およびティルト
角:α45,β45は以下の値である。 d1=12.569,d2=14.46,d3=20,d4
=57.8,d5=122.27,L0=124.17
9,L=105.53、α41=0.2度、Z41=14,
45=7.6,α45=0.05度,β45=1.28度。
Intervals shown in FIG. 4: d 1 to d 5 , L 0 , L, f
The tilt angle of the θ mirror 42 in the main scanning corresponding direction: α 41 , the shift amount in the sub scanning corresponding direction: Z 41 , the long toroidal lens 45 shift amount in the sub scanning corresponding direction: Z 45, and the tilt angles: α 45 , β 45 is the following value. d 1 = 12.569, d 2 = 14.46, d 3 = 20, d 4
= 57.8, d 5 = 122.27, L 0 = 124.17
9, L = 105.53, α 41 = 0.2 degrees, Z 41 = 14,
Z 45 = 7.6, α 45 = 0.05 degrees, β 45 = 1.28 degrees.

【0038】図4に示す「実施例1」において、光源部
100は、発光波長:780nmの3つの光源LD1,
LD2,LD3を、副走査対応方向に間隔:P0=14
μmで配列したモノリシックな半導体レーザアレイであ
り、真中の光源LD2の発光部はカップリングレンズ2
00の光軸上に位置する。
In the first embodiment shown in FIG. 4, the light source unit 100 includes three light sources LD1 and LD1 having an emission wavelength of 780 nm.
An interval between LD2 and LD3 in the sub-scanning corresponding direction: P 0 = 14
A monolithic semiconductor laser array arranged in μm, and the light emitting part of the light source LD2 in the middle is a coupling lens 2
It is located on the optical axis of 00.

【0039】このとき、同時に走査される3本の走査
線:S1〜S3を、相続く2回の走査にD1,D2就
き、図5に示す。図のように、3本の走査線は「同じ像
高で同じ向き」に曲がっている。走査幅:297mmに
対し、走査線の湾曲量(図2における「w2」)は25
〜27μmと微少であり、隣接する走査線のピッチ偏差
は1.3〜1.6μmと僅少である。また、走査がくり
返されるとき、先の走査:D1の走査線:S3と後の走
査:D2の走査線:S1とのピッチ偏差も2μmのオー
ダーで小さい。
At this time, three scanning lines S1 to S3 which are simultaneously scanned are subjected to two successive scans D1 and D2, as shown in FIG. As shown in the figure, the three scanning lines are bent in the same direction with the same image height. For a scan width of 297 mm, the amount of curvature of the scan line (“w 2 ” in FIG. 2) is 25.
The pitch deviation between adjacent scanning lines is as small as 1.3 to 1.6 μm. Further, when the scanning is repeated, the pitch deviation between the scanning line S3 of the preceding scanning: D1 and the scanning line S1 of the subsequent scanning: D2 is small on the order of 2 μm.

【0040】図6は「実施例2」の特徴部分のみを示し
ている。実施例2は、図4に示した実施例1における光
源側光学系ユニットA1を、光源側光学系ユニットA2
に換えたものであり、シリンダレンズ250から被走査
面に至る光路上の光学系配置は、実施例1と全く同じで
ある。
FIG. 6 shows only the characteristic portions of the "second embodiment". In the second embodiment, the light source side optical system unit A1 in the first embodiment shown in FIG.
The arrangement of the optical system on the optical path from the cylinder lens 250 to the surface to be scanned is exactly the same as that of the first embodiment.

【0041】光源部は光源として、独立した半導体レー
ザLD1’,LD2’を有する。これら半導体レーザL
D1’,LD2’からの光束は、対応するカップリング
レンズ15−1,15−2により「弱い発散性の光束」
にされ、アパーチュア20−1,20−2によりそれぞ
れ光束周辺部の光を遮断される。半導体レーザLD1か
らの光束はP偏光状態にあり、アパーチュア20−1を
通過後、ビーム合成プリズムPLの偏光反射膜62を透
過する。半導体レーザLD2’からの光束は当初P偏光
状態にあるが、アパーチュア20−2を通過後、1/2
波長板60を透過してS偏光状態となり、ビーム合成プ
リズムPLのプリズム面61で内部反射され偏光反射膜
62により反射されてビーム合成プリズムPLから射出
する。
The light source section has independent semiconductor lasers LD1 'and LD2' as light sources. These semiconductor lasers L
The light beams from D1 'and LD2' are "weakly divergent light beams" by the corresponding coupling lenses 15-1 and 15-2.
And the light around the light flux is blocked by the apertures 20-1 and 20-2, respectively. The light beam from the semiconductor laser LD1 is in a P-polarized state, passes through the aperture 20-1, and then passes through the polarization reflection film 62 of the beam combining prism PL. The luminous flux from the semiconductor laser LD2 'is initially in the P-polarized state, but after passing through the aperture 20-2, it is halved.
The light passes through the wave plate 60 to be in the S-polarized state, is internally reflected by the prism surface 61 of the beam combining prism PL, is reflected by the polarization reflection film 62, and emerges from the beam combining prism PL.

【0042】カップリングレンズ15−1,15−2は
光軸が互いに平行であり、これらの光軸はシリンダレン
ズ250以下の光学系の光軸Axに合致する。半導体レ
ーザLD1’は、副走査対応方向(図7の上下方向)に
おいて、カップリングレンズ15−1の光軸上に発光部
を有するが、半導体レーザLD2’の発光部は、副走査
対応方向においてカップリングレンズ15−2の光軸か
ら微少距離:δZだけずれている。このため、半導体レ
ーザLD2’からの光束は、ビーム合成プリズムPLか
ら射出するとき、半導体レーザLD1’からの光束に対
し副走査対応方向に対して微少角傾いており、これによ
り各光束は被走査面上で副走査方向に分離した光スポッ
トとなる。
The optical axes of the coupling lenses 15-1 and 15-2 are parallel to each other, and these optical axes coincide with the optical axis Ax of the optical system below the cylinder lens 250. The semiconductor laser LD1 ′ has a light-emitting portion on the optical axis of the coupling lens 15-1 in the sub-scanning corresponding direction (the vertical direction in FIG. 7), but the light-emitting portion of the semiconductor laser LD2 ′ is in the sub-scanning corresponding direction. It is shifted from the optical axis of the coupling lens 15-2 by a minute distance: δZ. Therefore, when the light beam from the semiconductor laser LD2 'is emitted from the beam combining prism PL, the light beam from the semiconductor laser LD1' is slightly inclined with respect to the sub-scanning corresponding direction with respect to the light beam from the semiconductor laser LD1 '. Light spots are separated on the surface in the sub-scanning direction.

【0043】図6に示す距離:d1,d2(半導体レーザ
LD1’,LD2’からの光束に共通である)、d
3(=d31+d32+d33)およびδZの値はそれぞれ、
1=12.569,d2=6.0,d3=29,δZ=
0.0141である。
The distances shown in FIG. 6 are d 1 , d 2 (common to the light beams from the semiconductor lasers LD 1 ′, LD 2 ′), d.
3 (= d 31 + d 32 + d 33 ) and δZ are respectively
d 1 = 12.569, d 2 = 6.0, d 3 = 29, δZ =
0.0141.

【0044】実施例2において、同時に光走査される2
本の走査線:S1,S2の様子を相続く2回の光走査:
E1,E2に就き図6に示す。図のように、2本の走査
線:S1,S2は「同じ像高で同じ向き」に曲がってい
る。光走査幅:297mmに対し、走査線の湾曲量(図
2の「w2」)は25〜27μmと微少であり、隣接す
る走査線のピッチ偏差は1.2μmと僅少である。ま
た、走査がくり返されるとき、先の走査:E1の走査
線:S2と後の光走査:E2の走査線:S1とのピッチ
偏差も1μmのオーダーと小さい。
In the second embodiment, 2
Two scanning lines: two scanning lines following the states of S1 and S2:
FIG. 6 shows E1 and E2. As shown in the figure, the two scanning lines: S1 and S2 are bent in “the same image height and the same direction”. For an optical scanning width of 297 mm, the amount of curvature of the scanning line (“w 2 ” in FIG. 2) is as small as 25 to 27 μm, and the pitch deviation between adjacent scanning lines is as small as 1.2 μm. Further, when the scanning is repeated, the pitch deviation between the scanning line: S2 of the preceding scanning: E1 and the scanning line: S1 of the subsequent optical scanning: E2 is as small as 1 μm.

【0045】[0045]

【発明の効果】以上に説明したように、この発明によれ
ば新規なマルチビーム走査装置を実現できる。この発明
においては、上記のように、複数の光スポットにより同
時に走査される走査線の曲がりが同じ向きに揃っている
ので、ピッチ偏差を有効に軽減して「見た目に良好」な
記録画像を形成することが可能である。
As described above, according to the present invention, a novel multi-beam scanning device can be realized. In the present invention, as described above, since the curvatures of the scanning lines scanned simultaneously by a plurality of light spots are aligned in the same direction, the pitch deviation is effectively reduced to form a “good-looking” recorded image. It is possible to

【図面の簡単な説明】[Brief description of the drawings]

【図1】この発明の実施の1形態を説明するための図で
ある。
FIG. 1 is a diagram for describing one embodiment of the present invention.

【図2】この発明の解決課題であるマルチビーム走査に
特有のピッチ偏差を説明するための図である。
FIG. 2 is a diagram for explaining pitch deviation peculiar to multi-beam scanning, which is a problem to be solved by the present invention.

【図3】この発明の実施の別の形態を説明するための図
である。
FIG. 3 is a diagram for explaining another embodiment of the present invention.

【図4】この発明の実施例を説明するための図である。FIG. 4 is a diagram for explaining an embodiment of the present invention.

【図5】図4の実施例による走査線の状態を示す図であ
る。
FIG. 5 is a diagram illustrating a state of a scanning line according to the embodiment of FIG. 4;

【図6】この発明の別実施例を特徴部分のみ説明するた
めの図である。
FIG. 6 is a view for explaining only a characteristic portion of another embodiment of the present invention.

【図7】図6の実施例による走査線の状態を示す図であ
る。
FIG. 7 is a diagram showing a state of a scanning line according to the embodiment of FIG. 6;

【符号の説明】[Explanation of symbols]

S1,S2,S3,S4 4つの光スポットにより
同時に走査される走査線 50 被走査面
S1, S2, S3, S4 Scan lines scanned simultaneously by four light spots 50 Scanned surface

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】複数の光源からの複数の光束を共通の光偏
向器で偏向させ、複数の偏向光束を共通の走査結像光学
系により、被走査面上に、副走査方向に互いに分離した
複数の光スポットとして集光させ、複数走査線を同時に
走査するマルチビーム走査装置において、 走査結像光学系が、結像機能を持つ反射型結像素子を有
し、 共通の光偏向器により偏向された複数の偏向光束が、上
記反射型結像素子に入射して反射され、 上記反射型結像素子は、反射光束の光路が入射光束の光
路と重ならず、且つ、複数の光スポットの同時の走査に
よる複数の走査線の曲がりが同じ向きとなるように、配
備態位を定められていることを特徴とするマルチビーム
走査装置。
A plurality of light beams from a plurality of light sources are deflected by a common optical deflector, and the plurality of deflected light beams are separated from each other on a surface to be scanned in a sub-scanning direction by a common scanning image forming optical system. In a multi-beam scanning device that converges as a plurality of light spots and scans a plurality of scanning lines simultaneously, the scanning imaging optical system has a reflective imaging element with an imaging function and is deflected by a common optical deflector. The plurality of deflected luminous fluxes are incident on and reflected by the reflective imaging element, and the reflective imaging element has a configuration in which the optical path of the reflected luminous flux does not overlap with the optical path of the incident luminous flux, and A multi-beam scanning apparatus characterized in that the arrangement is determined so that the bending of a plurality of scanning lines by simultaneous scanning is in the same direction.
【請求項2】請求項1記載のマルチビーム走査装置にお
いて、 反射型結像素子と被走査面との間に、少なくとも副走査
対応方向にパワーを持つ光学素子を有することを特徴と
するマルチビーム走査装置。
2. The multi-beam scanning apparatus according to claim 1, further comprising an optical element having power at least in a sub-scanning corresponding direction between the reflection type imaging element and the surface to be scanned. Scanning device.
JP10045497A 1996-08-26 1997-04-17 Multi-beam scanner Expired - Lifetime JP3527385B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP10045497A JP3527385B2 (en) 1997-04-17 1997-04-17 Multi-beam scanner
US08/916,959 US6069723A (en) 1996-08-26 1997-08-25 Multi-beam scanning apparatus with controlled scan line bow
KR1019970041279A KR100283194B1 (en) 1996-08-26 1997-08-26 Multi-beam scanning apparatus with controlled scan line bow
US09/552,730 US6266174B1 (en) 1996-08-26 2000-04-19 Multi-beam scanning apparatus with controlled scan line bow

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10045497A JP3527385B2 (en) 1997-04-17 1997-04-17 Multi-beam scanner

Publications (2)

Publication Number Publication Date
JPH10293260A true JPH10293260A (en) 1998-11-04
JP3527385B2 JP3527385B2 (en) 2004-05-17

Family

ID=14274370

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10045497A Expired - Lifetime JP3527385B2 (en) 1996-08-26 1997-04-17 Multi-beam scanner

Country Status (1)

Country Link
JP (1) JP3527385B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6833939B1 (en) 2000-02-04 2004-12-21 Fuji Xerox Co., Ltd. Light scanning method and light scanning device
JP2007041513A (en) * 2005-08-02 2007-02-15 Toshiba Corp Optical scanning device
KR100765780B1 (en) 2006-05-03 2007-10-12 삼성전자주식회사 Optical scanning device and color laser printer employing same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6833939B1 (en) 2000-02-04 2004-12-21 Fuji Xerox Co., Ltd. Light scanning method and light scanning device
JP2007041513A (en) * 2005-08-02 2007-02-15 Toshiba Corp Optical scanning device
KR100765780B1 (en) 2006-05-03 2007-10-12 삼성전자주식회사 Optical scanning device and color laser printer employing same

Also Published As

Publication number Publication date
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