JPH10302305A - Optical disk substrate and optical disk - Google Patents
Optical disk substrate and optical diskInfo
- Publication number
- JPH10302305A JPH10302305A JP9109109A JP10910997A JPH10302305A JP H10302305 A JPH10302305 A JP H10302305A JP 9109109 A JP9109109 A JP 9109109A JP 10910997 A JP10910997 A JP 10910997A JP H10302305 A JPH10302305 A JP H10302305A
- Authority
- JP
- Japan
- Prior art keywords
- optical disk
- substrate
- hydrocarbon group
- birefringence
- disk substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 38
- 239000000758 substrate Substances 0.000 title claims abstract description 30
- 229920000642 polymer Polymers 0.000 claims abstract description 11
- 239000010409 thin film Substances 0.000 claims abstract description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 4
- 125000002723 alicyclic group Chemical group 0.000 claims abstract description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 11
- 238000010521 absorption reaction Methods 0.000 abstract description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 238000002347 injection Methods 0.000 description 5
- 239000007924 injection Substances 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 229920006395 saturated elastomer Polymers 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 238000001746 injection moulding Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- 230000004075 alteration Effects 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 206010010071 Coma Diseases 0.000 description 1
- 206010073261 Ovarian theca cell tumour Diseases 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 1
- -1 aluminum and gold Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 208000001644 thecoma Diseases 0.000 description 1
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Landscapes
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
(57)【要約】
【課題】 複屈折、耐熱性、吸水性のバランスがとれた
光ディスク基板及び光ディスクを提供する。
【解決手段】 下記の一般式(1)で示される構造単位
を含む重合体で構成された光ディスク基板、及びこの基
板に無機薄膜が積層された光ディスク。
【化1】
但し、式中、R1は水素原子または炭素数1〜25の炭
化水素基または脂環式炭化水素基、置換炭化水素基を示
し、nは正の整数を表す。(57) [Problem] To provide an optical disk substrate and an optical disk having a good balance of birefringence, heat resistance and water absorption. An optical disk substrate made of a polymer containing a structural unit represented by the following general formula (1), and an optical disk having an inorganic thin film laminated on the substrate. Embedded image In the formula, R 1 represents a hydrogen atom, a hydrocarbon group having 1 to 25 carbon atoms, an alicyclic hydrocarbon group, or a substituted hydrocarbon group, and n represents a positive integer.
Description
【0001】[0001]
【発明の属する技術分野】本発明は特定の樹脂から構成
される光ディスク基板及び光ディスクに関する。The present invention relates to an optical disk substrate and an optical disk made of a specific resin.
【0002】[0002]
【従来の技術】1980年代初頭にコンパクトディスク
(CD)とレーザーディスク(LD)が市販されて以
来、光ディスクは急速に普及してきている。現在では更
に、CDサイズの光ディスクにLD並みの動画をデジタ
ルで記録することが望まれており、薄型で高密度化され
たものの開発が種々検討されてきている(1992年
秋の「応用物理学会」における講演17p-T-11、17p-T-1
3、1993年春の「応用物理学会」における講演29-a-
B-8、29a-B-5等)。2. Description of the Related Art Since compact disks (CDs) and laser disks (LDs) were marketed in the early 1980s, optical disks have rapidly become widespread. At present, it is further desired to digitally record a moving image comparable to that of an LD on a CD-size optical disk, and various types of thin and high-density optical disks have been developed (1992).
Lectures at Autumn Society of Applied Physics 17p-T-11, 17p-T-1
3, Lecture at the Japan Society of Applied Physics Spring 1993 29-a-
B-8, 29a-B-5, etc.).
【0003】このような光ディスクの基板は低コストで
量産可能な射出成形法によって成形されており、基板用
の樹脂としてはポリメタクリル酸メチルやポリカーボネ
ートが提案されている。[0003] The substrate of such an optical disk is formed by an injection molding method which can be mass-produced at low cost, and polymethyl methacrylate or polycarbonate has been proposed as a resin for the substrate.
【0004】[0004]
【発明が解決しようとする課題】しかしながら、このポ
リメタクリル酸メチルは複屈折率は低いものの、耐熱性
が低い、吸水性が高い点が問題である。一方、ポリカー
ボネートは耐熱性、吸水率は優れているものの複屈折率
が大きい点が問題である。最近の光情報の高密度化に対
応するためには複屈折率を小さくする必要があり、複屈
折、耐熱性、吸水性のバランスがとれた基板が望まれて
いる。However, although this polymethyl methacrylate has a low birefringence, it is problematic in that it has low heat resistance and high water absorption. On the other hand, polycarbonate has a problem in that although it has excellent heat resistance and water absorption, it has a large birefringence. In order to cope with the recent increase in the density of optical information, it is necessary to reduce the birefringence, and a substrate that balances birefringence, heat resistance and water absorption is desired.
【0005】[0005]
【課題を解決するための手段】本発明の要旨は、下記の
一般式(1)で示される構造単位を含む重合体で構成さ
れた光ディスク基板にあり、この基板に無機薄膜が積層
された光ディスクにある。The gist of the present invention resides in an optical disk substrate made of a polymer containing a structural unit represented by the following general formula (1), and an optical disk in which an inorganic thin film is laminated on this substrate. It is in.
【0006】[0006]
【化2】 Embedded image
【0007】但し、式中、R1は水素原子または炭素数
1〜25の炭化水素基または脂環式炭化水素基、置換炭
化水素基を示し、nは正の整数を表す。In the formula, R 1 represents a hydrogen atom, a hydrocarbon group having 1 to 25 carbon atoms, an alicyclic hydrocarbon group, or a substituted hydrocarbon group, and n represents a positive integer.
【0008】一般式(1)の繰り返し単位からなる重合
体は複屈折が正値を示す。またメタクリル酸メチル重合
体は複屈折が負値を示す。即ち本発明は複屈折率が零ま
たは零に近い光ディスク基板を提供するものである。The polymer comprising the repeating unit represented by the general formula (1) has a positive value of birefringence. The methyl methacrylate polymer has a negative value of birefringence. That is, the present invention provides an optical disk substrate having a birefringence of zero or near zero.
【0009】[0009]
【発明の実施の形態】一般式(1)の繰り返し単位の含
量は特に限定されないが、その光ディスク基板としての
特性から一般式(1)の繰り返し単位の含量が20重量%
以上であることが好ましく40重量%以上であることがよ
り好ましい。含有量が少なすぎると耐熱性が不足する傾
向にある。 またこの重合体の一般式(1)の繰り返し単位成分とし
ては、耐熱性の点からR1はメチル基、あるいは炭素数が
6以上のものであることが好ましく、メチル、シクロヘ
キシル、トリシクロデカニル、アダマンチル基であること
が特に好ましい。 さらにこの重合体の一般式(1)の繰り返し単位以外
の成分としては、メチルメタクリレートやメチルアクリ
レートなどの(メタ)アクリル酸エステル、スチレン、α−
メチルスチレン、アクリロニトリルなどが例示されるが、
透明性、複屈折の点でメチルメタクリレートが最も好ま
しい。 本発明において、得られる光ディスク基板の厚みは1.2
mm以下であることが好ましく、1.0mm以下であるこ
とがより好ましい。「光学技術コンタクト」23,No.
7,1985の451頁の(4)式に記載されているよう
に、傾いた光ディスク成形基板上には板厚と開口数の3
乗に比例した大きさのコマ収差が発生する。従って、厚
みが厚すぎると光ディスクを高密度化するために開口数
の高い対物レンズをしようした場合コマ収差が大きくな
り、その結果ディスク基板が傾いたときにクロストーク
が大きくなると同時にディスクからの戻り光量が減少す
るため、S/N比が劣化すると共にジッターが増大しすぎ
るので好ましくない。BEST MODE FOR CARRYING OUT THE INVENTION The content of the repeating unit of the general formula (1) is not particularly limited.
It is preferably at least 40% by weight or more. If the content is too small, the heat resistance tends to be insufficient. As the repeating unit component of the general formula (1) of the polymer, R 1 is preferably a methyl group or a compound having 6 or more carbon atoms from the viewpoint of heat resistance, and methyl, cyclohexyl and tricyclodecanyl are preferred. And an adamantyl group. Components other than the repeating unit of the general formula (1) of the polymer include (meth) acrylates such as methyl methacrylate and methyl acrylate, styrene, α-
Examples include methylstyrene and acrylonitrile,
Methyl methacrylate is most preferred in terms of transparency and birefringence. In the present invention, the thickness of the obtained optical disc substrate is 1.2
mm or less, more preferably 1.0 mm or less. "Optical Technology Contact" 23, No.
As described in equation (4) on page 451 of 7,1985, the thickness and the numerical aperture of 3 are formed on the inclined optical disk molded substrate.
Coma aberration having a magnitude proportional to the power is generated. Therefore, if the thickness is too large, the use of an objective lens having a high numerical aperture to increase the density of the optical disk will increase the coma aberration, and as a result, the crosstalk will increase when the disk substrate is tilted, and at the same time the return from the disk will occur. Since the amount of light is reduced, the S / N ratio is deteriorated and the jitter is undesirably increased.
【0010】また、本発明において光ディスク基板の複
屈折率がダブルパスで70×10-6以下であることが好
ましく更に好ましくは40×10-6以下である。複屈折
率が大きすぎると、読みとり信号のデータエラー率が高
くなったり、トラッキングが不安定になるため好ましく
ない。尚、複屈折率は波長546nmの光線でのダブルパ
スにおける測定値をディスク基板の厚みで割った値であ
る。In the present invention, the birefringence of the optical disk substrate in a double pass is preferably 70 × 10 −6 or less, more preferably 40 × 10 −6 or less. If the birefringence is too large, it is not preferable because the data error rate of the read signal increases and the tracking becomes unstable. Incidentally, the birefringence is a value obtained by dividing a measured value in a double pass with a light beam having a wavelength of 546 nm by the thickness of the disk substrate.
【0011】本発明の光ディスク基板は射出成形法や射
出圧縮成型法等によって成形することができる。シリン
ダー温度、型温、型締圧、射出速度等の射出条件は樹脂
組成に適した条件が選ばれる。The optical disk substrate of the present invention can be formed by an injection molding method, an injection compression molding method or the like. Injection conditions such as a cylinder temperature, a mold temperature, a mold clamping pressure, and an injection speed are selected as appropriate for the resin composition.
【0012】この光ディスク基板に無機薄膜を積層する
ことによって光ディスクを得ることができる。この無機
薄膜としては、アルミニウム、金などの金属単体もしく
はこれらを主成分とする金属や、酸化ケイ素、窒化ケイ
素、酸化ジルコニウム等の無機誘電体が挙げられる。こ
こで形成する無機薄膜の種類や膜厚、膜組成などは光デ
ィスクの種類により決定される。例えば、通常の再生専
用型光ディスクでは、十分な反射率と耐久性を得るため
には、アルミニウム膜を50nm厚以上成形する。追記型
光ディスクや書き換え型光ディスクでは、誘電体と金属
を積層して形成するのが普通である。An optical disk can be obtained by laminating an inorganic thin film on the optical disk substrate. Examples of the inorganic thin film include simple metals such as aluminum and gold, or metals containing these as main components, and inorganic dielectrics such as silicon oxide, silicon nitride, and zirconium oxide. The type, thickness, film composition, etc. of the inorganic thin film formed here are determined by the type of the optical disk. For example, in a normal read-only optical disk, an aluminum film is formed with a thickness of 50 nm or more in order to obtain sufficient reflectance and durability. In a write-once optical disk and a rewritable optical disk, it is common to form a dielectric and a metal by laminating them.
【0013】[0013]
【実施例】以下、実施例により本発明を具体的に説明す
る。なお、実施例において使用される「%」は全て重量部
及び重量%である。 本発明では、射出成形機(名機製作所(株)ダイナメル
タM-70A-DM)を用い、0.8〜1.0μmのピッチを有するピ
ットおよび溝が形成されたスタンパーを装着した金型を
用い、外径120mm、厚さ0.6mmの光ディスク基板を射
出成形し、その基板について以下の項目を評価した。The present invention will be described below in detail with reference to examples. The “%” used in the examples is all parts by weight and weight%. In the present invention, an injection molding machine (Meiki Seisakusho Co., Ltd. Dynamelter M-70A-DM) is used, and a die equipped with a stamper having pits and grooves having a pitch of 0.8 to 1.0 μm is used. An optical disk substrate having a thickness of 120 mm and a thickness of 0.6 mm was injection molded, and the following items were evaluated for the substrate.
【0014】飽和吸水率 射出成型品を90℃で乾燥させた後、重量を測定し、つい
で25℃の温水中に重量が平衡に達するまで浸漬した。平
衡後の重量を測定し次の式により求めた。 飽和吸水率(%)=[(吸水重量−乾燥重量)/乾燥重
量]×100 複屈折率 偏光顕微鏡を用い波長546nmの光線でのダブルパスに
おける値を測定した。測定値を厚みで割った値が、複屈
折率である。 Tg DSCにより測定した。Saturated water absorption The injection molded product was dried at 90 ° C, weighed, and then immersed in warm water at 25 ° C until the weight reached equilibrium. The weight after the equilibrium was measured and determined by the following equation. Saturated water absorption (%) = [(water absorption−dry weight) / dry weight] × 100 Birefringence The value in a double pass with a light having a wavelength of 546 nm was measured using a polarizing microscope. The value obtained by dividing the measured value by the thickness is the birefringence. It was measured by Tg DSC.
【0015】実施例1 容量2リットルのフラスコ中においてトリシクロデカニ
ルアクリレート824g(4mol)、純度75%のパラホルムアル
デヒド160g(4mol)、1,4-ジアザビシクロ[2,2,2]オク
タン60g(0.53mol)、p-メトキシフェノール616mg、t-ブ
チルアルコール120gを、空気バブリングを行いながら80
℃で5日間反応させた。反応終了後、3Lのメタノール中
にこの反応溶液を注ぎ、30分撹拌した。ついで、この混
合溶液を-20℃で一晩静置し,白色結晶のビス(α-ヒド
ロキシメチルアクリル酸トリシクロデカニル)エーテル
712g(収率79.2%)を得た。Example 1 In a flask having a capacity of 2 liters, 824 g (4 mol) of tricyclodecanyl acrylate, 160 g (4 mol) of paraformaldehyde having a purity of 75%, 60 g of 1,4-diazabicyclo [2,2,2] octane (0.53 g) mol), p-methoxyphenol 616 mg, t-butyl alcohol 120 g while bubbling air with 80
The reaction was carried out at 5 ° C. for 5 days. After the completion of the reaction, the reaction solution was poured into 3 L of methanol and stirred for 30 minutes. Then, the mixed solution was allowed to stand at −20 ° C. overnight, and bis (α-hydroxymethyl acrylate tricyclodecanyl) ether as white crystals was obtained.
712 g (79.2% yield) was obtained.
【0016】溶媒としてトルエン2500mlを含む5Lフラ
スコ中に、ビス(α-ヒドロキシメチルアクリル酸トリ
シクロデカニル)エーテル250g、メチルメタクリレート
(MMA)250gを入れ溶解させた。この溶液に開始剤とし
てパーテトラA(日本油脂(株)製:純度20wt.%)3gを
加え窒素置換しながら40分撹拌した。その後、95℃に加
熱して重合を開始させ7時間重合を行った。In a 5 L flask containing 2500 ml of toluene as a solvent, 250 g of bis (α-hydroxymethyl acrylate tricyclodecanyl) ether and 250 g of methyl methacrylate (MMA) were put and dissolved. To this solution was added 3 g of pertetra A (manufactured by NOF Corporation, purity: 20 wt.%) As an initiator, and the mixture was stirred for 40 minutes while purging with nitrogen. Thereafter, the mixture was heated to 95 ° C. to start the polymerization, and the polymerization was performed for 7 hours.
【0017】この反応液を大量のメタノール中に入れて
ポリマーを析出させ、濾過しメタノールで洗浄した。こ
れを真空乾燥することにより粉末状の重合体455g(収率
91%)を得た。この重合体のTgは150℃であった。This reaction solution was put into a large amount of methanol to precipitate a polymer, which was filtered and washed with methanol. This is vacuum dried to obtain 455 g of a powdery polymer (yield:
91%). The Tg of this polymer was 150 ° C.
【0018】この重合体をシリンダー温度290℃、型
温80℃、型締圧20トンの成形条件にて光ディスク基
板を成形し、基板表面にトラックピッチ0.8〜1.0
μmのピットおよび溝を有する外径120mm、厚さ0.6m
mの基板を得た。この基板の複屈折率は15×10-6であ
り、飽和吸水率は0.9%であった。An optical disk substrate is molded from the polymer under the molding conditions of a cylinder temperature of 290 ° C., a mold temperature of 80 ° C., and a mold clamping pressure of 20 tons.
120mm outer diameter with 0.6m thickness with μm pits and grooves
m substrates were obtained. The birefringence of this substrate was 15 × 10 −6 , and the saturated water absorption was 0.9%.
【0019】次いで真空蒸着法により膜厚70nmのアル
ミニウム膜を成膜し、光ディスクを製造した。具体的に
は以下の条件で膜成形を行った。 ・予備排気:排気時間0.5h、真空到達度1×10-5T
orr ・蒸発方法:抵抗加熱 ・成膜速度:0.8〜1.2nm/sec。Next, an aluminum film having a thickness of 70 nm was formed by a vacuum evaporation method, and an optical disk was manufactured. Specifically, film formation was performed under the following conditions.・ Preliminary evacuation: evacuation time 0.5h, degree of vacuum reaching 1 × 10 -5 T
orr Evaporation method: resistance heating Deposition rate: 0.8 to 1.2 nm / sec.
【0020】比較例1 ポリカーボネート樹脂(帝人化成(株)製AD9000TG)を
用い、成形条件としてシリンダー温度370℃、型温1
20℃、型締圧10トンの成形条件にて光ディスク基板
を成形し、基板表面にトラックピッチ0.8〜1.0μ
mのピットおよび溝を有する外形120mm、厚さ0.6mm
の基板を得た。飽和吸水率は0.4%であったが、基板の
複屈折率は75×10-6と大きかった。Comparative Example 1 A polycarbonate resin (AD9000TG manufactured by Teijin Chemicals Ltd.) was used, and molding conditions were a cylinder temperature of 370 ° C. and a mold temperature of 1
An optical disk substrate is formed under the conditions of 20 ° C. and a mold clamping pressure of 10 tons, and a track pitch of 0.8 to 1.0 μm is formed on the substrate surface.
120mm outer diameter with m pits and grooves, 0.6mm thick
Was obtained. Although the saturated water absorption was 0.4%, the birefringence of the substrate was as large as 75 × 10 −6 .
【0021】[0021]
【発明の効果】本発明の光ディスク基板は、複屈折、耐
熱性、吸水性に優れていることから、光ディスクに画像
データを高密度で入力可能であり、次世代の光ディスク
基板として、その効果は極めて大きいものである。The optical disk substrate of the present invention is excellent in birefringence, heat resistance and water absorption, so that it is possible to input image data to the optical disk at a high density. It is extremely large.
Claims (3)
を含む重合体で構成された光ディスク基板。 【化1】 (式中、R1は水素原子または炭素数1〜25の炭化水
素基、脂環式炭化水素基、置換炭化水素基を示し、nは
正の整数を表す。)1. An optical disk substrate comprising a polymer containing a structural unit represented by the following general formula (1). Embedded image (In the formula, R1 represents a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms, an alicyclic hydrocarbon group, or a substituted hydrocarbon group, and n represents a positive integer.)
下である請求項1に記載の光ディスク基板。2. The optical disk substrate according to claim 1, wherein the birefringence is 70 × 10 −6 or less in a double pass.
薄膜が積層された光ディスク。3. An optical disk comprising the optical disk substrate according to claim 1 and an inorganic thin film laminated thereon.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9109109A JPH10302305A (en) | 1997-04-25 | 1997-04-25 | Optical disk substrate and optical disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9109109A JPH10302305A (en) | 1997-04-25 | 1997-04-25 | Optical disk substrate and optical disk |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH10302305A true JPH10302305A (en) | 1998-11-13 |
Family
ID=14501803
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9109109A Pending JPH10302305A (en) | 1997-04-25 | 1997-04-25 | Optical disk substrate and optical disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH10302305A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7018697B2 (en) | 2003-05-29 | 2006-03-28 | Tdk Corporation | Optical recording medium |
-
1997
- 1997-04-25 JP JP9109109A patent/JPH10302305A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7018697B2 (en) | 2003-05-29 | 2006-03-28 | Tdk Corporation | Optical recording medium |
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