JPH10310653A - Photocatalytic hydrophilic member - Google Patents

Photocatalytic hydrophilic member

Info

Publication number
JPH10310653A
JPH10310653A JP9137687A JP13768797A JPH10310653A JP H10310653 A JPH10310653 A JP H10310653A JP 9137687 A JP9137687 A JP 9137687A JP 13768797 A JP13768797 A JP 13768797A JP H10310653 A JPH10310653 A JP H10310653A
Authority
JP
Japan
Prior art keywords
band
photocatalyst
substrate
photocatalytic
hydrophilic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9137687A
Other languages
Japanese (ja)
Inventor
Atsushi Kitamura
厚 北村
Makoto Hayakawa
信 早川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toto Ltd
Original Assignee
Toto Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toto Ltd filed Critical Toto Ltd
Priority to JP9137687A priority Critical patent/JPH10310653A/en
Publication of JPH10310653A publication Critical patent/JPH10310653A/en
Pending legal-status Critical Current

Links

Landscapes

  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Surface Treatment Of Glass (AREA)
  • Catalysts (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a photocatalytic hydrophilic member the surface of which can be rendered hydrophilic even by irradiation with a visible light. SOLUTION: A layer containing photocatalytic particles in which the forbidden band width between the conduction band and the valance band on the surfaces of particles is 2.3-3.2 eV is formed on the surface of a substrate. Alternatively, a layer containing photocatalytic particles in which a sublevel exists between the conduction band and the valence band, and the energy gap between the conduction band and the sublevel or between the valence band and the sublevel is 2.3-3.1 eV is formed on the surface of the substrate. As a result, the surface of the member exhibits hydrophilicity upon the excitation of the photocatalyst with light.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、可視光の照射によ
り、部材表面を親水性にしうる光触媒性親水性部材に関
する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photocatalytic hydrophilic member capable of rendering a member surface hydrophilic by irradiation with visible light.

【0002】[0002]

【従来の技術】本発明者は、先に、半導体光触媒の光励
起作用により物品の表面を高度に親水化する方法を提案
した(WO96/29375号)。この方法に従えば、
物品の表面はアナタ−ゼ型酸化チタンのような半導体光
触媒のコ−ティングによって被覆される。このアナタ−
ゼ型酸化チタンからなる光触媒性コ−ティングに紫外線
を照射することにより光触媒を充分な照度で充分な時間
にわたり光励起すると、光触媒性コ−ティングの表面は
水との接触角が約0度になる程度に高度に親水化され
る。WO96/29375号に開示されているように、
このように高度に親水化可能な光触媒性コ−ティング
は、防曇、降雨による浄化、水洗による浄化、乾燥促進
その他種々の目的で種々の物品に適用することができ
る。例えば、車両の風防ガラス、ドアミラ−、建物の窓
ガラス、眼鏡のレンズ、或いは鏡のような透明物品を光
触媒性コ−ティングで被覆した場合には、光触媒の光励
起に伴いコ−ティングの表面は高度に親水化され、その
結果、物品が凝縮湿分や湯気で曇ったり、付着水滴で翳
ったりするのが防止される。或いは、屋外に配置された
建物や物品が光触媒性コ−ティングで被覆されている場
合には、親水化された表面に付着した親油性又は疎水性
の煤塵や汚染物は降雨の都度雨水により洗い流され、表
面は浄化される。
2. Description of the Related Art The present inventor has previously proposed a method for highly hydrophilizing the surface of an article by photoexcitation of a semiconductor photocatalyst (WO 96/29375). According to this method,
The surface of the article is coated with a coating of a semiconductor photocatalyst such as an anatase type titanium oxide. This you
When the photocatalytic coating made of titanium oxide is irradiated with ultraviolet light to excite the photocatalyst with sufficient illuminance for a sufficient time, the surface of the photocatalytic coating has a contact angle with water of about 0 degrees. Highly hydrophilized. As disclosed in WO 96/29375,
The photocatalytic coating which can be highly hydrophilized as described above can be applied to various articles for various purposes such as anti-fogging, purification by rainfall, purification by washing, promotion of drying, and the like. For example, when a transparent article such as a windshield of a vehicle, a door mirror, a window glass of a building, a lens of an eyeglass, or a mirror is coated with a photocatalytic coating, the surface of the coating is accompanied by photoexcitation of the photocatalyst. It is highly hydrophilized, so that the article is prevented from fogging with condensed moisture or steam and from being overshadowed by adhering water droplets. Alternatively, if a building or article placed outdoors is covered with a photocatalytic coating, lipophilic or hydrophobic dust and contaminants attached to the hydrophilic surface are washed away by rainwater each time it rains. And the surface is purified.

【0003】[0003]

【発明が解決しようとする課題】上記反応は光触媒の励
起光の照射により親水化速度が異なる。すなわち、太陽
光の利用できる屋外用途では、光触媒性コ−ティング中
に含有される光触媒として、半導体光触媒として最も広
く知られているアナタ−ゼ型酸化チタンが利用できる。
しかしながら、屋内の生活空間で光触媒を光励起しよう
とすると、一般照明を使用することになるが、一般照明
から発光される光は大部分が可視光であり、アナタ−ゼ
型酸化チタンの励起光である紫外線は極めて低照度であ
るために、親水化速度が遅いという問題点があった。そ
こで、本発明では、可視光の照射により、部材表面を親
水性にしうる光触媒性親水性部材を提供することを目的
とする。
In the above reaction, the rate of hydrophilization varies depending on the irradiation of the photocatalyst with excitation light. That is, in outdoor applications where sunlight can be used, an anatase type titanium oxide most widely known as a semiconductor photocatalyst can be used as a photocatalyst contained in the photocatalytic coating.
However, when trying to optically excite a photocatalyst in an indoor living space, general lighting is used, but most of the light emitted from general lighting is visible light, and is excited by anatase type titanium oxide. Certain ultraviolet rays have an extremely low illuminance, and thus have a problem that the rate of hydrophilization is low. Accordingly, an object of the present invention is to provide a photocatalytic hydrophilic member capable of rendering the member surface hydrophilic by irradiation with visible light.

【0004】[0004]

【課題を解決するための手段】本発明は、光触媒を含有
する表面層を形成した部材において、光触媒を光励起す
ると、部材の表面が高度に親水化されるという発見に基
づく。この現象は以下に示す機構により進行すると考え
られる。まず、光触媒の価電子帯上端と伝導帯下端との
禁制帯幅以上のエネルギ−を有する光が光触媒に照射さ
れると、光触媒の価電子帯中の電子が励起されて伝導電
子と正孔が生成する。すると、生成した伝導電子及び/
又は正孔の作用により、雰囲気との平衡以上の水酸基
(化学吸着水)が表面に吸着する(この反応は励起種で
ある伝導電子及び/又は正孔の量子反応により引き起こ
される。伝導電子及び/又は正孔の有するエネルギ−が
約2.2eVより小さいと生じない。また、特定の禁制
帯幅を有する光触媒を用いた場合、励起可能な波長であ
れば照射する光の波長は長い程速く進行すると考えられ
る。照射光と禁制帯幅との差により生じるエネルギ−は
熱エネルギ−へと変化するが、熱が部材表面に加えられ
た場合には、吸着平衡は吸着物質が脱離する方向へと働
くからである。またこの吸着反応は、雰囲気中の水蒸気
分圧が高い程、酸素分圧が低い程迅速に進行する。ま
た、この吸着反応は、1つの水酸基を起点としてクラス
タ−状に成長しながら増加する。励起照度が高い程その
成長は速い)。すると、表面の水素結合に基づく表面自
由エネルギ−が増加するので、その増加に応じた量の物
理吸着性の水分子がさらに基材表面に固定される。基材
表面に物理吸着性の水分子が固定されていれば、一般に
表面エネルギの近い物質は接着しやすいことから、付着
自由水が部材表面へなじみやすくなり、水濡れ性が向上
する。以上の機構により、部材表面は光触媒の光励起に
より親水性を呈するようになると考えられる。このよう
に、光励起が継続する限りは、光触媒を含有する層表面
は恒久的に親水性に維持される。光励起を中断すると、
表面の親水性は次第に低下する。これは、上記量子反応
により一旦雰囲気との平衡以上に吸着した化学吸着水及
び物理吸着水が光励起の中断による量子反応の停止によ
り、平衡状態に戻ろうとすることにより引き起こされる
(そして、この吸着水の離脱反応は、雰囲気中の酸素分
圧が高い程、水蒸気分圧が低い程迅速に進行する)。し
かし、光触媒を光励起すれば、再び上記量子反応に基づ
く水の吸着反応が生じ、表面は再び親水性を呈するよう
になる。
SUMMARY OF THE INVENTION The present invention is based on the discovery that, in a member having a surface layer containing a photocatalyst formed thereon, when the photocatalyst is photoexcited, the surface of the member is highly hydrophilized. This phenomenon is considered to proceed by the following mechanism. First, when light having energy equal to or greater than the forbidden band width between the upper end of the valence band and the lower end of the conduction band of the photocatalyst is irradiated on the photocatalyst, the electrons in the valence band of the photocatalyst are excited, and the conduction electrons and holes are generated. Generate. Then, the generated conduction electrons and / or
Alternatively, due to the action of holes, hydroxyl groups (chemically adsorbed water) that are at or above the equilibrium with the atmosphere are adsorbed on the surface (this reaction is caused by a quantum reaction of conduction electrons and / or holes, which are excited species. Conduction electrons and / or Alternatively, this does not occur if the energy of the holes is less than about 2.2 eV, and in the case of using a photocatalyst having a specific bandgap, the longer the wavelength of the irradiated light, the longer the wavelength of the irradiated light, if it can be excited. The energy generated by the difference between the irradiation light and the forbidden band changes into thermal energy, but when heat is applied to the surface of the member, the adsorption equilibrium shifts in the direction in which the adsorbed material is desorbed. In addition, the adsorption reaction proceeds more rapidly as the water vapor partial pressure in the atmosphere is higher and the oxygen partial pressure is lower.In addition, this adsorption reaction starts from one hydroxyl group in a cluster form. While growing To pressure. Its growth is fast enough excitation intensity is high). Then, the surface free energy based on the hydrogen bond of the surface increases, so that the amount of physically adsorbable water molecules corresponding to the increase is further fixed on the surface of the base material. If the physically adsorbing water molecules are fixed on the surface of the base material, generally, substances having a surface energy close to each other are easily bonded, so that the free water adheres easily to the member surface, and the water wettability is improved. By the above mechanism, it is considered that the member surface becomes hydrophilic by the photoexcitation of the photocatalyst. Thus, as long as the photoexcitation continues, the surface of the layer containing the photocatalyst is kept permanently hydrophilic. When the optical excitation is interrupted,
The hydrophilicity of the surface gradually decreases. This is caused by the fact that the chemically adsorbed water and the physically adsorbed water once adsorbed above the equilibrium with the atmosphere by the above quantum reaction tend to return to the equilibrium state by stopping the quantum reaction due to the interruption of the photoexcitation (and this adsorbed water). The desorption reaction proceeds more rapidly as the oxygen partial pressure in the atmosphere is higher and the water vapor partial pressure is lower.) However, when the photocatalyst is photoexcited, the water adsorption reaction based on the quantum reaction occurs again, and the surface becomes hydrophilic again.

【0005】本発明では、基体表面に、粒子表面におけ
る伝導電子帯と価電子帯との間の禁制帯幅が2.2eV
〜3.1eVである光触媒粒子を含む層が形成されてお
り、前記光触媒の光励起により部材表面が親水性を呈す
るようになることを特徴とする光触媒性親水性部材を提
供する。粒子表面における伝導電子帯と価電子帯との間
の禁制帯幅が2.2eV〜3.1eVである光触媒粒子
を用いても、上記量子反応に基づく水の吸着反応を生じ
させることが可能であり、なおかつ一般照明から多く発
光される可視光が利用できるようになるので、室内等で
上記技術を利用しやすくなる。
In the present invention, the forbidden band width between the conduction electron band and the valence band on the particle surface is 2.2 eV on the substrate surface.
Provided is a photocatalytic hydrophilic member, wherein a layer containing photocatalyst particles of about 3.1 eV is formed, and the member surface becomes hydrophilic by photoexcitation of the photocatalyst. Even if a photocatalytic particle having a forbidden band width between 2.2 eV and 3.1 eV between the conduction electron band and the valence band on the particle surface is used, it is possible to cause the water adsorption reaction based on the quantum reaction. In addition, since visible light emitted from general lighting in a large amount can be used, the above technology can be easily used in a room or the like.

【0006】本発明の他の態様においては、基体表面
に、伝導電子帯と価電子帯との間に副準位を有し、前記
伝導電子帯と前記副準位との間又は前記価電子帯と前記
副準位との間のエネルギ−ギャップが2.2eV〜3.
1eVであする光触媒粒子を含む層が形成されており、
前記光触媒の光励起により部材表面が親水性を呈するよ
うになることを特徴とする光触媒性親水性部材を提供す
る。この場合にも同様に上記量子反応に基づく水の吸着
反応を生じさせることが可能であり、なおかつ一般照明
から多く発光される可視光が利用できるようになるの
で、室内等で上記技術を利用しやすくなる。
In another aspect of the present invention, the substrate has a sub-level between the conduction band and the valence band on the surface of the substrate, and the substrate has a sub-level between the conduction band and the sub-level or the valence band. The energy gap between the band and the sub-level is 2.2 eV to 3.
A layer containing photocatalyst particles of 1 eV is formed,
Provided is a photocatalytic hydrophilic member, wherein the surface of the member becomes hydrophilic by photoexcitation of the photocatalyst. In this case as well, it is possible to cause a water adsorption reaction based on the quantum reaction in the same manner, and furthermore, it becomes possible to use visible light that is largely emitted from general illumination. It will be easier.

【0007】[0007]

【発明の実施の形態】本発明の光触媒性親水性部材で
は、基体表面に、粒子表面における伝導電子帯と価電子
帯との間の禁制帯幅が2.2〜3.1eVである光触媒
粒子を含む層が形成されており、前記光触媒の光励起に
より部材表面が親水性を呈するようになるようにする。
或いは、基体表面に、伝導電子帯と価電子帯との間に副
準位を有し、前記伝導電子帯と副準位との間又は価電子
帯と副準位との間のエネルギ−ギャップが2.2〜3.
1eVである光触媒粒子を含む層が形成されており、前
記光触媒の光励起により部材表面が親水性を呈するよう
になるようにする。ここで光触媒とは、伝導帯と価電子
帯との間のエネルギ−ギャップよりも大きなエネルギ−
(すなわち短い波長)の光(励起光)を照射したとき
に、価電子帯中の電子の励起(光励起)が生じて、伝導
電子と正孔を生成しうる物質(図1)をいい、例えば、
アナタ−ゼ型酸化チタン、ルチル型酸化チタン、酸化亜
鉛、チタン酸ストロンチウム、酸化錫、ジルコニア、三
酸化二ビスマス、三酸化タングステン、酸化第二鉄、五
酸化二ニオブ等をいう。
BEST MODE FOR CARRYING OUT THE INVENTION In the photocatalytic hydrophilic member of the present invention, the photocatalytic particles having a band gap between the conduction electron band and the valence band on the particle surface of 2.2 to 3.1 eV are provided on the substrate surface. Is formed, and the surface of the member becomes hydrophilic by the photoexcitation of the photocatalyst.
Alternatively, the substrate surface has a sub-level between the conduction electron band and the valence band, and the energy gap between the conduction electron band and the sub-level or between the valence band and the sub-level. Is 2.2 to 3.
A layer containing photocatalyst particles of 1 eV is formed, and the surface of the member becomes hydrophilic by photoexcitation of the photocatalyst. Here, the photocatalyst refers to an energy larger than the energy gap between the conduction band and the valence band.
A substance capable of generating conduction electrons and holes by excitation of electrons in the valence band (photoexcitation) when irradiated with light (excitation light) having a short wavelength (excitation light) (FIG. 1). ,
Anatase type titanium oxide, rutile type titanium oxide, zinc oxide, strontium titanate, tin oxide, zirconia, bismuth trioxide, tungsten trioxide, ferric oxide, diniobium pentoxide, etc.

【0008】上記光触媒のうち、粒子表面における伝導
電子帯と価電子帯との間の禁制帯幅が2.2〜3.1e
Vである光触媒としてはルチル型酸化チタン、三酸化タ
ングステン、酸化第二鉄等が好適に利用できる。伝導電
子帯と価電子帯との間に副準位を有し、前記伝導電子帯
と副準位との間又は価電子帯と副準位との間のエネルギ
−ギャップが2.2〜3.1eVである光触媒として
は、ルテニウム、セリウム、コバルト、クロム、バナジ
ウム、ロジウムの少なくとも1種をド−プしたアナタ−
ゼ型酸化チタン、ルチル型酸化チタン、酸化亜鉛、チタ
ン酸ストロンチウム、酸化錫、ジルコニア、三酸化二ビ
スマス、三酸化タングステン、酸化第二鉄、五酸化二ニ
オブのいずれかの光触媒が好適に利用できる。例えば、
これらの金属をチタン酸ストロンチウムにド−プすると
可視光でも光励起が生じ、生成した伝導電子又は正孔に
より光電流が流れるようになることが知られている(図
2、セラミックス、31巻10号、p.815820、
1996年10月)。光触媒の可視光による光励起によ
り、基材表面が高度に親水化されるためには励起光の照
度は、0.1mW/cm2以上だと好ましく、1mW/
cm2以上だとより好ましい。
In the above photocatalyst, the forbidden band width between the conduction electron band and the valence band on the particle surface is 2.2 to 3.1 e.
As the photocatalyst of V, rutile-type titanium oxide, tungsten trioxide, ferric oxide and the like can be suitably used. A sub-level between the conduction band and the valence band, and an energy gap between the conduction band and the sub-level or between the valence band and the sub-level is 2.2 to 3; The photocatalyst of 0.1 eV is an anatase doped with at least one of ruthenium, cerium, cobalt, chromium, vanadium, and rhodium.
Any photocatalyst of zeolite titanium oxide, rutile titanium oxide, zinc oxide, strontium titanate, tin oxide, zirconia, bismuth trioxide, tungsten trioxide, ferric oxide, and diniobium pentoxide can be suitably used. . For example,
It is known that when these metals are doped into strontium titanate, photoexcitation occurs even with visible light, and a photocurrent flows by generated conduction electrons or holes (FIG. 2, ceramics, Vol. 31, No. 10, 10). Pp. 815820,
October 1996). The illuminance of the excitation light is preferably 0.1 mW / cm 2 or more, and preferably 1 mW / cm 2 in order for the surface of the substrate to be highly hydrophilized by light excitation by the visible light of the photocatalyst.
cm 2 or more is more preferable.

【0009】光触媒を含有する層の膜厚は、0.4μm
以下にするのが好ましい。そうすれば、光の乱反射によ
る白濁を防止することができ、表面層は実質的に透明と
なる。さらに光触媒を含有する層の膜厚を0.2μm以
下にすると一層好ましい。そうすれば、光の干渉による
層の発色を防止することができる。また層が薄ければ薄
いほどその透明度は向上する。更に、膜厚を薄くすれ
ば、層の耐摩耗性が向上する。
The thickness of the layer containing the photocatalyst is 0.4 μm
It is preferable to set the following. Then, cloudiness due to irregular reflection of light can be prevented, and the surface layer becomes substantially transparent. More preferably, the thickness of the layer containing the photocatalyst is 0.2 μm or less. Then, color formation of the layer due to light interference can be prevented. Also, the thinner the layer, the better its transparency. Furthermore, the thinner the film, the better the wear resistance of the layer.

【0010】基材がナトリウムのようなアルカリ網目修
飾イオンを含むガラス(ソ−ダライムガラス、並板ガラ
ス等)の場合には、基材と表面層との間にシリカ等の中
間層を形成してもよい。そうすれば、焼成中にアルカリ
網目修飾イオンが基材から表面層へ拡散するのが防止さ
れ、光触媒機能がよりよく発揮される。
When the substrate is a glass containing alkali network modifying ions such as sodium (soda lime glass, side-by-side glass, etc.), an intermediate layer such as silica is formed between the substrate and the surface layer. You may. Then, the diffusion of the alkali network modifying ions from the base material to the surface layer during the firing is prevented, and the photocatalytic function is more effectively exhibited.

【0011】次に、表面層の形成方法について説明す
る。方法は、大別して5つの方法がある。1つの方法は
ゾル塗布焼成法であり、他の方法は有機錫化合物法であ
り、他の方法は電子ビ−ム蒸着法である。 (1)ゾル塗布焼成法 光触媒粒子を分散したゾルを、基材表面に、スプレ−コ
−ティング法、ディップコ−ティング法、フロ−コ−テ
ィング法、スピンコ−ティング法、ロ−ルコ−ティング
法等の方法で塗布し、焼成する。 (2)有機チタネ−ト法 有機金属化合物に加水分解抑制剤(塩酸、エチルアミン
等)を添加し、アルコ−ル(エタノ−ル、プロパノ−
ル、ブタノ−ル等)などの非水溶媒で希釈した後、部分
的に加水分解を進行させながら又は完全に加水分解を進
行させた後、混合物をスプレ−コ−ティング法、ディッ
プコ−ティング法、フロ−コ−ティング法、スピンコ−
ティング法、ロ−ルコ−ティング法等の方法で塗布し、
乾燥させる。乾燥により、有機金属化合物の加水分解が
完遂し、さらに脱水縮重合されて金属酸化物の層が基材
表面に形成される。さらに、必要に応じて焼成して結晶
化させることにより光触媒性を有する結晶性の金属酸化
物を得る。 (3)電子ビ−ム蒸着法 金属酸化物のタ−ゲットに電子ビ−ムを照射することに
より、基材表面に金属酸化物の層を形成する。さらに、
必要に応じて焼成して結晶化させることにより光触媒性
を有する結晶性の金属酸化物を得る。 (4)シリカの前駆体による結着 光触媒粒子を分散したゾルに、テトラアルコキシシラ
ン、シラノ−ル、アルキルシリケ−ト等のシリカの前駆
体を添加した後、基材表面に、スプレ−コ−ティング
法、ディップコ−ティング法、フロ−コ−ティング法、
スピンコ−ティング法、ロ−ルコ−ティング法等の方法
で塗布した後、シリカの前駆体を加水分解及び脱水縮重
合に付すことにより硬化させる。 (5)シリコ−ンの前駆体による結着 光触媒粒子を分散したゾルに、オルガノトリアルコキシ
シラン、ジオルガノジアルコキシシラン、ポリオルガノ
シロキサン液状物等のシリコ−ンの前駆体を添加した
後、基材表面に、スプレ−コ−ティング法、ディップコ
−ティング法、フロ−コ−ティング法、スピンコ−ティ
ング法、ロ−ルコ−ティング法等の方法で塗布した後、
シリコ−ンの前駆体を加水分解及び脱水縮重合に付すこ
とにより硬化させ、さらに光触媒作用等によりシリコ−
ン分子中のシリコン原子に結合するオルガノ基の少なく
とも一部を水酸基に置換する。
Next, a method for forming the surface layer will be described. There are roughly five methods. One method is a sol coating and firing method, the other method is an organotin compound method, and the other method is an electron beam evaporation method. (1) Sol coating and firing method A sol in which photocatalyst particles are dispersed is applied to the surface of a substrate by a spray coating method, a dip coating method, a flow coating method, a spin coating method, and a roll coating method. Apply and bake. (2) Organic titanate method A hydrolysis inhibitor (hydrochloric acid, ethylamine, etc.) is added to an organometallic compound, and alcohol (ethanol, propanol) is added.
, Butanol, etc.), and after partially or completely proceeding the hydrolysis, the mixture is spray-coated, dip-coated. , Flow coating method, Spin coating
Coating method, roll coating method, etc.
dry. By drying, the hydrolysis of the organometallic compound is completed, and further the polymer is subjected to dehydration-condensation polymerization to form a metal oxide layer on the surface of the base material. Further, by firing and crystallizing as needed, a crystalline metal oxide having photocatalytic properties is obtained. (3) Electron beam evaporation method A metal oxide layer is formed on the surface of a substrate by irradiating a target of the metal oxide with an electron beam. further,
By firing and crystallizing as needed, a crystalline metal oxide having photocatalytic properties is obtained. (4) Binding by Silica Precursor After a silica precursor such as tetraalkoxysilane, silanol or alkyl silicate is added to a sol in which photocatalyst particles are dispersed, spray coating is performed on the surface of the substrate. Method, dip coating method, flow coating method,
After coating by a method such as spin coating or roll coating, the silica precursor is cured by subjecting it to hydrolysis and dehydration condensation polymerization. (5) Binding by Silicone Precursor After adding a silicone precursor such as an organotrialkoxysilane, a diorganodialkoxysilane, or a polyorganosiloxane liquid to a sol in which photocatalyst particles are dispersed, After coating on the surface of the material by spray coating, dip coating, flow coating, spin coating, roll coating, etc.,
The silicone precursor is cured by subjecting it to hydrolysis and dehydration polycondensation, and is further cured by photocatalysis.
At least a part of the organo group bonded to the silicon atom in the molecule is replaced with a hydroxyl group.

【0012】部材表面が親水性を維持できれば、防曇効
果、表面清浄化効果の他、帯電防止効果(ほこり付着防
止効果)、断熱効果、水中での気泡付着防止効果、熱交
換器における効率向上効果、生体親和性効果等が発揮さ
れるようになる。
If the surface of the member can maintain hydrophilicity, in addition to the antifogging effect and the surface cleaning effect, the antistatic effect (dust adhesion preventing effect), the heat insulation effect, the bubble adhesion preventing effect in water, and the efficiency improvement in the heat exchanger. Effects, bioaffinity effects, etc. are exhibited.

【0013】本発明が適用可能な基体としては、防曇効
果を期待する場合には透明な部材であり、その材質はガ
ラス、プラスチック等が好適に利用できる。適用可能な
基材を用途でいえば、車両用バックミラ−、浴室用鏡、
洗面所用鏡、歯科用鏡、道路鏡のような鏡;眼鏡レン
ズ、光学レンズ、写真機レンズ、内視鏡レンズ、照明用
レンズ、半導体用レンズ、複写機用レンズのようなレン
ズ;プリズム;建物や監視塔の窓ガラス;自動車、鉄道
車両、航空機、船舶、潜水艇、雪上車、ロ−プウエイの
ゴンドラ、遊園地のゴンドラ、宇宙船のような乗物の窓
ガラス;自動車、鉄道車両、航空機、船舶、潜水艇、雪
上車、スノ−モ−ビル、オ−トバイ、ロ−プウエイのゴ
ンドラ、遊園地のゴンドラ、宇宙船のような乗物の風防
ガラス;防護用ゴ−グル、スポ−ツ用ゴ−グル、防護用
マスクのシ−ルド、スポ−ツ用マスクのシ−ルド、ヘル
メットのシ−ルド、冷凍食品陳列ケ−スのガラス;計測
機器のカバ−ガラス、及び上記物品表面に貼付させるた
めのフィルムを含む。
The substrate to which the present invention can be applied is a transparent member when an anti-fogging effect is expected, and glass, plastic, or the like can be suitably used as the material. Speaking of applicable base materials, back mirrors for vehicles, mirrors for bathrooms,
Mirrors such as toilet mirrors, dental mirrors, road mirrors; lenses such as spectacle lenses, optical lenses, camera lenses, endoscope lenses, illumination lenses, semiconductor lenses, copier lenses; prisms; Windows for vehicles such as cars, railcars, aircraft, ships, submersibles, snowmobiles, gondolas in lowways, gondolas in amusement parks, spaceships; vehicles, railcars, aircraft, Windshields for vehicles such as ships, submersibles, snowmobiles, snowmobiles, motorbikes, lowway gondola, amusement park gondola, spaceships; protective goggles, sporting goggles -Glue, shield of protective mask, shield of sports mask, shield of helmet, glass of frozen food display case; cover glass of measuring instrument, and affixed to the surface of the article Including film for

【0014】本発明が適用可能な基材としては、表面清
浄化効果を期待する場合にはその材質は、例えば、金
属、セラミックス、ガラス、プラスチック、木、石、セ
メント、コンクリ−ト、繊維、布帛、それらの組合せ、
それらの積層体が好適に利用できる。適用可能な基材を
用途でいえば、建材、建物外装、建物内装、窓枠、窓ガ
ラス、構造部材、乗物の外装及び塗装、機械装置や物品
の外装、防塵カバ−及び塗装、交通標識、各種表示装
置、広告塔、道路用防音壁、鉄道用防音壁、橋梁、ガ−
ドレ−ルの外装及び塗装、トンネル内装及び塗装、碍
子、太陽電池カバ−、太陽熱温水器集熱カバ−、ビニ−
ルハウス、車両用照明灯のカバ−、住宅設備、便器、浴
槽、洗面台、照明器具、照明カバ−、台所用品、食器、
食器洗浄器、食器乾燥器、流し、調理レンジ、キッチン
フ−ド、換気扇、及び上記物品表面に貼付させるための
フィルムを含む。
When a surface cleaning effect is expected as a substrate to which the present invention can be applied, the material may be, for example, metal, ceramics, glass, plastic, wood, stone, cement, concrete, fiber, or the like. Fabrics, their combinations,
Those laminates can be suitably used. Speaking of applicable base materials, building materials, building exteriors, building interiors, window frames, windowpanes, structural members, vehicle exteriors and coatings, machinery and articles exteriors, dustproof covers and coatings, traffic signs, Various display devices, advertising towers, road noise barriers, railway noise barriers, bridges, garages
Drill exterior and paint, tunnel interior and paint, insulators, solar cell cover, solar water heater collector cover, vinyl
House, vehicle lighting cover, housing equipment, toilet bowl, bathtub, wash basin, lighting fixture, lighting cover, kitchenware, tableware,
Includes dishwashers, dish dryers, sinks, cooking ranges, kitchen hoods, ventilation fans, and films for affixing to the surface of the article.

【0015】本発明が適用可能な基材としては、帯電防
止効果を期待する場合にはその材質は、例えば、金属、
セラミックス、ガラス、プラスチック、木、石、セメン
ト、コンクリ−ト、繊維、布帛、それらの組合せ、それ
らの積層体が好適に利用できる。適用可能な基材を用途
でいえば、ブラウン管、磁気記録メディア、光記録メデ
ィア、光磁気記録メディア、オ−ディオテ−プ、ビデオ
テ−プ、アナログレコ−ド、家庭用電気製品のハウジン
グや部品や外装及び塗装、OA機器製品のハウジングや
部品や外装及び塗装、建材、建物外装、建物内装、窓
枠、窓ガラス、構造部材、乗物の外装及び塗装、機械装
置や物品の外装、防塵カバ−及び塗装、及び上記物品表
面に貼付させるためのフィルムを含む。
When the antistatic effect is expected as a substrate to which the present invention can be applied, the material is, for example, metal,
Ceramics, glass, plastic, wood, stone, cement, concrete, fiber, fabric, combinations thereof, and laminates thereof can be suitably used. Speaking of applicable substrates, cathode ray tubes, magnetic recording media, optical recording media, magneto-optical recording media, audio tapes, video tapes, analog records, housings and parts for household electrical appliances, Exterior and painting, OA equipment product housing and parts and exterior and painting, building materials, building exterior, building interior, window frames, window glass, structural members, vehicle exterior and painting, mechanical equipment and articles exterior, dustproof cover and Includes a film for painting and affixing to the surface of the article.

【0016】[0016]

【実施例】酸化第二鉄ゾル1重量部、テトラエトキシシ
ランをシリカ換算で1重量部、エタノ−ル98重量部を
混合し、10cm角のソ−ダライムガラス基材表面にフ
ロ−コ−ティング法により塗布し、150℃の温度で1
0分間熱処理することにより、テトラエトキシシランを
加水分解及び脱水縮重合させて塗膜を硬化させ、#1試
料を得た。この試料を1週間暗所に放置した後、蛍光灯
を用いて、試料表面に0.3mW/cm2の照度で3日
間照射し、水との接触角を測定した。ここで水との接触
角は、接触角測定器(協和界面科学、CA−X150)
を用いて、マイクロシリンジから水滴滴下後30秒後の
値で評価した。その結果、#1試料は50゜から20゜
まで親水化された。
EXAMPLE 1 part by weight of a ferric oxide sol, 1 part by weight of tetraethoxysilane in terms of silica, and 98 parts by weight of ethanol were mixed, and a 10 cm square soda lime glass substrate was coated with a flow coat. Coating at 150 ° C.
By heat-treating for 0 minutes, tetraethoxysilane was hydrolyzed and dehydrated and polycondensed to cure the coating film, thereby obtaining a # 1 sample. After leaving the sample in a dark place for one week, the sample surface was irradiated with an illuminance of 0.3 mW / cm 2 for 3 days using a fluorescent lamp, and the contact angle with water was measured. Here, the contact angle with water is measured using a contact angle measuring device (Kyowa Interface Science, CA-X150).
Was evaluated using a value 30 seconds after dropping a water drop from the micro syringe. As a result, the # 1 sample was hydrophilized from 50 ° to 20 °.

【0017】[0017]

【発明の効果】本発明の光触媒性親水性部材によれば、
可視光の照射で、部材表面を親水性にしうる。
According to the photocatalytic hydrophilic member of the present invention,
Irradiation with visible light can make the member surface hydrophilic.

【図面の簡単な説明】[Brief description of the drawings]

【図1】種々の光触媒のバンド構造を示す図。FIG. 1 is a diagram showing band structures of various photocatalysts.

【図2】チタン酸ストロンチウムに微量の金属がド−プ
されたときの光電流の波長依存性が変化する様子を示す
図。
FIG. 2 is a diagram showing how the wavelength dependence of photocurrent changes when a small amount of metal is doped into strontium titanate.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 基体表面に、粒子表面における伝導電子
帯と価電子帯との間の禁制帯幅が2.2eV〜3.1e
Vである光触媒粒子を含む層が形成されており、前記光
触媒の光励起により部材表面が親水性を呈するようにな
ることを特徴とする光触媒性親水性部材。
1. A band gap between a conduction electron band and a valence band on a particle surface is 2.2 eV to 3.1 e on a substrate surface.
A photocatalytic hydrophilic member, wherein a layer containing photocatalyst particles of V is formed, and the surface of the member becomes hydrophilic by photoexcitation of the photocatalyst.
【請求項2】 基体表面に、伝導電子帯と価電子帯との
間に副準位を有し、前記伝導電子帯と前記副準位との間
又は前記価電子帯と前記副準位との間のエネルギ−ギャ
ップが2.2eV〜3.1eVであする光触媒粒子を含
む層が形成されており、前記光触媒の光励起により部材
表面が親水性を呈するようになることを特徴とする光触
媒性親水性部材。
2. A substrate having a sub-level between a conduction electron band and a valence band on a surface of a substrate, wherein the sub-level is located between the conduction electron band and the sub-level or between the conduction band and the sub-level. A layer containing photocatalyst particles having an energy gap between 2.2 eV and 3.1 eV is formed, and the surface of the member becomes hydrophilic by photoexcitation of the photocatalyst. Hydrophilic member.
JP9137687A 1997-05-13 1997-05-13 Photocatalytic hydrophilic member Pending JPH10310653A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9137687A JPH10310653A (en) 1997-05-13 1997-05-13 Photocatalytic hydrophilic member

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9137687A JPH10310653A (en) 1997-05-13 1997-05-13 Photocatalytic hydrophilic member

Publications (1)

Publication Number Publication Date
JPH10310653A true JPH10310653A (en) 1998-11-24

Family

ID=15204468

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9137687A Pending JPH10310653A (en) 1997-05-13 1997-05-13 Photocatalytic hydrophilic member

Country Status (1)

Country Link
JP (1) JPH10310653A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6436542B1 (en) * 1999-07-14 2002-08-20 Nippon Sheet Glass Co., Ltd. Multilayer structure and process for producing the same
US6777091B2 (en) 2000-03-22 2004-08-17 Nippon Sheet Glass Co., Ltd. Substrate with photocatalytic film and method for producing the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6436542B1 (en) * 1999-07-14 2002-08-20 Nippon Sheet Glass Co., Ltd. Multilayer structure and process for producing the same
US6777091B2 (en) 2000-03-22 2004-08-17 Nippon Sheet Glass Co., Ltd. Substrate with photocatalytic film and method for producing the same

Similar Documents

Publication Publication Date Title
JP3003581B2 (en) A member that exhibits hydrophilicity in response to optical excitation of an optical semiconductor
JP3003593B2 (en) Photocatalytic hydrophilic member
JPH11309379A (en) Photocatalytic hydrophilic member and photocatalytic hydrophilic coating composition
JP3087682B2 (en) Photocatalytic hydrophilic member
JPH1191030A (en) Hydrophilic member with photocatalystic property
JP3255346B2 (en) Method for forming photocatalytic hydrophilic member, and photocatalytic hydrophilic member
JP2000191960A (en) Photo-catalytic hydrophilic coating composition, formation of photo-catalytic hydrophilic coating film, and photo-catalytic hydrophilic member
JP3266535B2 (en) Photocatalytic hydrophilic member, method for producing the same, and photocatalytic hydrophilic coating composition
JPH09188850A (en) Photocatalytic hydrophilic coating composition
JP3613085B2 (en) Photocatalytic hydrophilic member
JPH10310653A (en) Photocatalytic hydrophilic member
JPH09225387A (en) Hydrophilic member and method to make surface of member hydrophilic
JP2001079979A (en) Photocatalytic hydrophilic member
JP3303696B2 (en) Photocatalytic hydrophilic coating composition
JP3173391B2 (en) Hydrophilic film, and method for producing and using the same
JPH1085610A (en) Photocatalytic hydrophilic member and its production
JPH11100526A (en) Photocatalytic hydrophilic member and photocatalytic hydrophilic coating composition
JP2001098187A (en) Photocatalytic hydrophilic coating composition and method for preparing photocatalytic hydrophilic member
JP2000086933A (en) Photocatalytic hydrophilic member and photocatalytic hydrophilic coating composition
JPH10180948A (en) Transfer sheet and method for transferring photocatalytic hydrophilic thin film
JP3844182B2 (en) Hydrophilic film and method for producing and using the same
JP3348613B2 (en) Photocatalytic hydrophilic coating composition
JP3298439B2 (en) Photocatalytic hydrophilic coating liquid
JP2000136370A (en) Member exhibiting hydrophilicity in response to photoexcitation of optical semiconductor
JPH10296902A (en) Photo-catalytic hydrophilic member and method for hydrophilization of member surface