JPH10316940A - 放射線硬化可能な水性被覆材料、被覆した表面の製造方法および被覆材料の使用 - Google Patents

放射線硬化可能な水性被覆材料、被覆した表面の製造方法および被覆材料の使用

Info

Publication number
JPH10316940A
JPH10316940A JP10122173A JP12217398A JPH10316940A JP H10316940 A JPH10316940 A JP H10316940A JP 10122173 A JP10122173 A JP 10122173A JP 12217398 A JP12217398 A JP 12217398A JP H10316940 A JPH10316940 A JP H10316940A
Authority
JP
Japan
Prior art keywords
coating material
radiation
weight
water
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP10122173A
Other languages
English (en)
Japanese (ja)
Inventor
Wolfgang Dr Reich
ライヒ ヴォルフガング
Peter Enenkel
エネンケル ペーター
Edmund Keil
カイル エドムント
Matthias Lokai
ロカイ マティアス
Erich Dr Beck
ベック エーリヒ
Klaus Menzel
メンツェル クラウス
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF SE filed Critical BASF SE
Publication of JPH10316940A publication Critical patent/JPH10316940A/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D167/00Coating compositions based on polyesters obtained by reactions forming a carboxylic ester link in the main chain; Coating compositions based on derivatives of such polymers
    • C09D167/06Unsaturated polyesters having carbon-to-carbon unsaturation
    • C09D167/07Unsaturated polyesters having carbon-to-carbon unsaturation having terminal carbon-to-carbon unsaturated bonds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Paints Or Removers (AREA)
JP10122173A 1997-05-05 1998-05-01 放射線硬化可能な水性被覆材料、被覆した表面の製造方法および被覆材料の使用 Withdrawn JPH10316940A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19718948A DE19718948A1 (de) 1997-05-05 1997-05-05 Wässrige, strahlungshärtbare Beschichtungsmassen
DE19718948.2 1997-05-05

Publications (1)

Publication Number Publication Date
JPH10316940A true JPH10316940A (ja) 1998-12-02

Family

ID=7828675

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10122173A Withdrawn JPH10316940A (ja) 1997-05-05 1998-05-01 放射線硬化可能な水性被覆材料、被覆した表面の製造方法および被覆材料の使用

Country Status (4)

Country Link
US (1) US6011078A (fr)
EP (1) EP0877067B1 (fr)
JP (1) JPH10316940A (fr)
DE (2) DE19718948A1 (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
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JP2001106941A (ja) * 1999-10-01 2001-04-17 Showa Highpolymer Co Ltd 金属用プライマー組成物及びその硬化方法
JP2006512458A (ja) * 2002-12-27 2006-04-13 サン・ケミカル・コーポレーション 放射線硬化可能な水性組成物
JP2008150610A (ja) * 2001-11-02 2008-07-03 Sun Chemical Corp 放射線硬化性水性組成物
JP2008239984A (ja) * 2007-02-28 2008-10-09 Arakawa Chem Ind Co Ltd 剥離基材用目止め剤、剥離基材および剥離基材の製造方法

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US6803112B1 (en) 2000-03-29 2004-10-12 Sun Chemical Corporation Radiation curable aqueous compositions for low extractable film packaging
DE10022352A1 (de) * 2000-05-08 2001-11-22 Georg Gros Verfahren zur Beschichtung von elektrolytisch- oder feuerverzinkten Blechen
US6893687B2 (en) 2000-09-25 2005-05-17 Chemetall Gmbh Method for coating metallic surfaces
WO2002024344A2 (fr) * 2000-09-25 2002-03-28 Chemetall Gmbh Procede de pretraitement et d'enduction de surfaces metalliques, avant leur façonnage, au moyen d'un revetement ressemblant a de la peinture, et utilisation de substrats ainsi enduits
AU2002228452A1 (en) * 2001-01-11 2002-07-24 Dsm Ip Assets B.V. Radiation curable coating composition
GR1003841B (el) * 2001-03-28 2002-03-19 Ιντερκεμ Ελλας Αβεε Φωτοσκληρυνομενα πλαστικα χρωματα
WO2002081577A1 (fr) * 2001-04-03 2002-10-17 Sun Chemical Corporation Compositions aqueuses durcissables par rayonnement
US20050003102A1 (en) * 2003-06-20 2005-01-06 Lockhart Aaron A. UV-curable waterborne polyurethane dispersions for soft touch coatings
US7396875B2 (en) * 2003-06-20 2008-07-08 Bayer Materialscience Llc UV-curable waterborne polyurethane dispersions for soft touch coatings
TWI290572B (en) * 2003-08-06 2007-12-01 Lg Chemical Ltd Primer composition for coating transparent materials and photochromic transparent materials
DE102004026739A1 (de) * 2004-05-28 2005-12-22 Kronospan Ag Paneel aus Holzwerkstoff mit Oberflächenbeschichtung
US7268172B2 (en) * 2004-10-15 2007-09-11 Bayer Materialscience Llc Radiation curable compositions
CN101304962B (zh) 2005-11-15 2012-09-26 威士伯采购公司 用于纤维水泥基材的抗碎胶乳面层组合物
KR100703854B1 (ko) 2006-01-13 2007-04-09 에스에스씨피 주식회사 무용제 자외선 경화형 수성 도료 조성물
WO2007090131A1 (fr) * 2006-01-31 2007-08-09 Valspar Sourcing, Inc. Systeme de revetement pour articles composites en ciment
US9783622B2 (en) * 2006-01-31 2017-10-10 Axalta Coating Systems Ip Co., Llc Coating system for cement composite articles
DE602007012700D1 (de) * 2006-06-02 2011-04-07 Valspar Sourcing Inc Wässrige hochleistungsbeschichtungszusammensetzungen
CA2656689C (fr) * 2006-07-07 2017-01-03 Valspar Sourcing, Inc. Systemes d'enrobage pour articles composites en ciment
MX2008002220A (es) * 2007-02-16 2009-02-25 Valspar Sourcing Inc Tratamiento para articulos compuestos de cemento.
CN101772472B (zh) * 2007-08-01 2016-04-20 威士伯采购公司 用于水泥复合制品的涂层体系
US20090176907A1 (en) 2008-01-08 2009-07-09 Ramesh Subramanian Direct-to-metal radiation curable compositions
BRPI0917455B1 (pt) * 2008-08-15 2018-11-21 Valspar Sourcing Inc composição de revestimento, método para preparar um artigo revestido, e, artigo revestido
AU2009316285A1 (en) 2008-11-24 2010-05-27 Valspar Sourcing, Inc. Coating system for cement composite articles
US8109211B2 (en) 2009-03-24 2012-02-07 Ideon Llc Method of gravure printing with liquid radiation curable inks
EP2440625A1 (fr) * 2009-06-10 2012-04-18 Basf Se Utilisation de matières de revêtements durcissables par rayonnement pour le revêtement de matériaux en bois
EP2571948A4 (fr) 2010-05-21 2014-09-03 Allnex Ip S R L Compositions durcissables par rayonnement à faible brillance
CN103205183A (zh) * 2012-01-12 2013-07-17 郭文迅 一种无味无毒的水性紫外光固化涂料及其制备方法
US9365685B2 (en) 2012-02-28 2016-06-14 Ut-Battelle, Llc Method of improving adhesion of carbon fibers with a polymeric matrix
EP2749606B1 (fr) * 2012-12-21 2018-11-21 Rohm and Haas Company Dispersions acryliques avec acrylates multifonctionnels pour revêtements durcissant aux UV
US9636293B2 (en) 2014-10-13 2017-05-02 L'oréal Latex nail compositions having low amounts of photo-initiator
US9649272B2 (en) 2014-10-13 2017-05-16 L'oréal Latex nail compositions having low amounts of photo-initiator
US9820931B2 (en) 2014-10-13 2017-11-21 L'oreal Latex nail compositions having low amounts of photo-initiator
WO2016068983A1 (fr) 2014-10-31 2016-05-06 Hewlett-Packard Development Company, L.P. Dispersion de liant durcissable par rayonnement pour encre jet d'encre
US10400066B2 (en) 2015-01-27 2019-09-03 Hewlett-Packard Development Company, L.P. Polymeric photoactive agents
WO2016122454A1 (fr) 2015-01-27 2016-08-04 Hewlett-Packard Development Company, L.P. Agents photoactifs polymères
WO2016122452A1 (fr) 2015-01-27 2016-08-04 Hewlett-Packard Development Company, L.P. Synergistes amines polymères
CN105255329B (zh) * 2015-11-07 2018-04-06 浙江华江科技发展有限公司 一种紫外光固化树脂包覆的改性竹纤维及其制备方法
US11174392B2 (en) 2018-06-06 2021-11-16 Avery Dennison Corporation Water-based coatings for improved print performance with multiple print technology
US11111403B2 (en) 2018-07-13 2021-09-07 Sun Chemical Corporation Aqueous electron beam curable compositions comprising poly(alkoxylaes)
SE548220C2 (en) * 2024-03-15 2026-04-24 Mercene Coatings Ab Method for coating a substrate with an aqueous liquid using actinic radiation

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001106941A (ja) * 1999-10-01 2001-04-17 Showa Highpolymer Co Ltd 金属用プライマー組成物及びその硬化方法
JP2008150610A (ja) * 2001-11-02 2008-07-03 Sun Chemical Corp 放射線硬化性水性組成物
JP2006512458A (ja) * 2002-12-27 2006-04-13 サン・ケミカル・コーポレーション 放射線硬化可能な水性組成物
JP2013082930A (ja) * 2002-12-27 2013-05-09 Sun Chemical Corp 放射線硬化可能な水性組成物
JP2008239984A (ja) * 2007-02-28 2008-10-09 Arakawa Chem Ind Co Ltd 剥離基材用目止め剤、剥離基材および剥離基材の製造方法

Also Published As

Publication number Publication date
DE19718948A1 (de) 1998-11-12
US6011078A (en) 2000-01-04
EP0877067B1 (fr) 2004-03-17
DE59810967D1 (de) 2004-04-22
EP0877067A3 (fr) 1998-12-30
EP0877067A2 (fr) 1998-11-11

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