JPH1047914A - 移動鏡支持機構 - Google Patents

移動鏡支持機構

Info

Publication number
JPH1047914A
JPH1047914A JP8221753A JP22175396A JPH1047914A JP H1047914 A JPH1047914 A JP H1047914A JP 8221753 A JP8221753 A JP 8221753A JP 22175396 A JP22175396 A JP 22175396A JP H1047914 A JPH1047914 A JP H1047914A
Authority
JP
Japan
Prior art keywords
movable mirror
mirror
bolt
moving
support mechanism
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8221753A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1047914A5 (fr
Inventor
Toshiya Otomo
俊弥 大友
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP8221753A priority Critical patent/JPH1047914A/ja
Priority to US08/826,381 priority patent/US6012697A/en
Priority to KR1019970013309A priority patent/KR100467262B1/ko
Publication of JPH1047914A publication Critical patent/JPH1047914A/ja
Priority to US09/428,540 priority patent/US6264165B1/en
Publication of JPH1047914A5 publication Critical patent/JPH1047914A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP8221753A 1996-04-12 1996-08-05 移動鏡支持機構 Pending JPH1047914A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP8221753A JPH1047914A (ja) 1996-08-05 1996-08-05 移動鏡支持機構
US08/826,381 US6012697A (en) 1996-04-12 1997-04-09 Stage and supporting mechanism for supporting movable mirror on stage
KR1019970013309A KR100467262B1 (ko) 1996-04-12 1997-04-10 스테이지및스테이지로의이동경지지기구
US09/428,540 US6264165B1 (en) 1996-04-12 1999-10-28 Stage and supporting mechanism for supporting movable mirror on stage

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8221753A JPH1047914A (ja) 1996-08-05 1996-08-05 移動鏡支持機構

Publications (2)

Publication Number Publication Date
JPH1047914A true JPH1047914A (ja) 1998-02-20
JPH1047914A5 JPH1047914A5 (fr) 2004-08-19

Family

ID=16771676

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8221753A Pending JPH1047914A (ja) 1996-04-12 1996-08-05 移動鏡支持機構

Country Status (1)

Country Link
JP (1) JPH1047914A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010206066A (ja) * 2009-03-05 2010-09-16 Taiheiyo Cement Corp Xyステージのスライダ

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010206066A (ja) * 2009-03-05 2010-09-16 Taiheiyo Cement Corp Xyステージのスライダ

Similar Documents

Publication Publication Date Title
US7113263B2 (en) Supporting structure of optical element, exposure apparatus having the same, and manufacturing method of semiconductor device
US6043863A (en) Holder for reflecting member and exposure apparatus having the same
US7354168B2 (en) Facet mirror having a number of mirror facets
JP2004031491A (ja) 光学素子保持機構、光学系鏡筒及び露光装置
US20080225255A1 (en) Conforming seats for clamps used in mounting an optical element, and optical systems comprising same
JPH0658410B2 (ja) ステ−ジ装置
KR100467262B1 (ko) 스테이지및스테이지로의이동경지지기구
WO2002019007A1 (fr) Ensemble miroir reflechissant
JP2009181144A (ja) 光学素子保持機構、光学系鏡筒及び露光装置
US7760452B2 (en) Driving apparatus, optical system, exposure apparatus and device fabrication method
JPH10253872A (ja) 反射光学部材の保持装置及び露光装置
US7184227B2 (en) Optical unit, exposure unit and optical devices
US7755742B2 (en) Lithographic apparatus with mounted sensor
JP5414204B2 (ja) 光学素子保持装置、露光装置およびデバイス製造方法
US7581305B2 (en) Method of manufacturing an optical component
TW201221796A (en) Leaf spring, stage system, and lithographic apparatus
JPH1047914A (ja) 移動鏡支持機構
CN104871057B (zh) 低波前畸变光学安装座
US4376580A (en) Projection aligner with bending mirror
CN112147855B (zh) 保持装置、曝光装置、物品制造方法
JP3427428B2 (ja) 光学素子の位置調整装置及び投影露光装置
JP2002184339A (ja) 制動機構および電子顕微鏡用試料ステージ
US8456612B2 (en) Exposure apparatus and method of manufacturing device
US7643125B2 (en) Exposure apparatus and device manufacturing method
JPH10256147A (ja) 露光装置

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20050916

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20060310

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20060628