JPH105690A - Application method - Google Patents
Application methodInfo
- Publication number
- JPH105690A JPH105690A JP8186576A JP18657696A JPH105690A JP H105690 A JPH105690 A JP H105690A JP 8186576 A JP8186576 A JP 8186576A JP 18657696 A JP18657696 A JP 18657696A JP H105690 A JPH105690 A JP H105690A
- Authority
- JP
- Japan
- Prior art keywords
- coating
- substrate
- coating liquid
- liquid
- bead
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、特に大型ガラス基
板等の枚葉タイプの被塗布基板等に感光性の塗布液を均
一、かつ、効率良く塗布するための塗布方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a coating method for uniformly and efficiently coating a photosensitive coating solution on a single-wafer type substrate such as a large glass substrate.
【０００２】[0002]
【従来の技術】一般に、ＬＣＤ用カラーフィルタ等の大
型ガラス基板に塗布液を塗布する方式としては、スピン
塗布方式が多く用いられている。2. Description of the Related Art In general, a spin coating method is often used as a method of applying a coating liquid to a large glass substrate such as a color filter for an LCD.
【０００３】このスピン塗布方式には大気開放型および
密閉カップ型があるが、何れの方式も、塗布液の使用効
率が１０パーセント程度と低く、しかも基板のコーナ部
分の塗布膜厚が厚くなりすぎるという欠点があり、今後
見込まれる基板サイズの大型化に伴って、塗布液の使用
量、膜厚分布およびスループット等の点において問題が
指摘されている。[0003] The spin coating method includes an open-to-atmosphere type and a closed cup type. In each of these methods, the use efficiency of a coating solution is as low as about 10%, and the coating film thickness at a corner portion of the substrate becomes too thick. As the size of the substrate is expected to increase in the future, problems have been pointed out with respect to the use amount of the coating solution, the film thickness distribution, the throughput, and the like.
【０００４】上述のようなスピン塗布方式の欠点を解決
するための方式としては、ナイフ塗布方式、ロール塗布
方式またはダイ塗布方式がある。[0004] As a method for solving the above-mentioned drawbacks of the spin coating method, there are a knife coating method, a roll coating method and a die coating method.
【０００５】これらの方式は、何れも、基板上に塗布用
クリアランスを設け、その設定値によって塗布膜厚を決
定して塗布面の平滑性を得る方式であるが、この方式で
は、基板表面の平滑度（凹凸度）が塗布精度以上に低い
（凹凸度が大きい）ものに対しては、均一な膜厚を得る
ことが困難である。In each of these systems, a coating clearance is provided on a substrate, and the coating film thickness is determined by the set value to obtain the smoothness of the coating surface. It is difficult to obtain a uniform film thickness when the smoothness (degree of unevenness) is lower than the coating accuracy (the degree of unevenness is large).
【０００６】また、基板表面の凹凸に影響され難い塗布
液の塗布方法としては、一般にディップ塗布方式が知ら
れているが、この方式では、非塗布部を被覆することが
不可欠であり、作業が煩雑なものとなる。A dip coating method is generally known as a method of applying a coating liquid which is hardly affected by irregularities on the surface of the substrate. In this method, however, it is essential to cover a non-coated portion and work is required. It becomes complicated.
【０００７】そこで、上記のような各塗布方式における
欠点を解消して、枚葉基板に塗布液の物性に影響を受け
ることなく安定した状態で均一な塗布膜を形成すること
のできるビード塗布方式の塗布装置が提案されている
（特願平５−１４６７５７号）。[0007] In view of the above, a bead coating method capable of solving the above-mentioned drawbacks of the respective coating methods and forming a uniform coating film on a single-wafer substrate in a stable state without being affected by the physical properties of the coating liquid. Has been proposed (Japanese Patent Application No. 5-146775).
【０００８】この塗布装置では、上向きに開口する直線
状のスリットを有する塗布ヘッドを備え、基板保持部材
に保持された基板が、その先端部が塗布ヘッドのスリッ
トの直上に所定のクリアランスを介して対向するように
位置される。そして、塗布ヘッドに塗布液が供給される
と、塗布液がスリットから吐出されてビードを形成し、
被塗布基板の先端部下面に付着する。この状態から基板
保持部材が一定速度で斜め上方にスライドされ、ビード
から塗布液が基板の下面に順次付着され、塗布液の層が
形成される。このとき、塗布ヘッドには連続して塗布液
の供給が行われ、ビードにおける塗布液の量が一定に保
たれている。そして、基板が斜め上方に上昇してその後
端部が塗布ヘッドのスリット上に到達すると、基板保持
部材のスライドが停止され、ビードを形成する塗布液が
塗布ヘッド内に吸引されてビードが消滅される。これに
よって、塗布ヘッドと基板上の塗布液の層が分離され
る。In this coating apparatus, a coating head having a linear slit that opens upward is provided, and a substrate held by a substrate holding member has a tip portion directly above the slit of the coating head via a predetermined clearance. It is located to face. When the application liquid is supplied to the application head, the application liquid is discharged from the slit to form a bead,
It adheres to the lower surface of the tip of the substrate to be coated. From this state, the substrate holding member is slid obliquely upward at a constant speed, and the coating liquid is sequentially adhered to the lower surface of the substrate from the beads to form a layer of the coating liquid. At this time, the application liquid is continuously supplied to the application head, and the amount of the application liquid in the bead is kept constant. When the substrate rises obliquely upward and its rear end reaches the slit of the coating head, the slide of the substrate holding member is stopped, the coating liquid forming the bead is sucked into the coating head, and the bead disappears. You. This separates the coating head from the coating liquid layer on the substrate.
【０００９】[0009]
【発明が解決しようとする課題】上述のようなビード塗
布方式は、使用される塗布液の粘度が低いため、塗布液
の液切れが良好で塗布液の使用効率が比較的高いもので
ある。In the above-described bead coating method, since the viscosity of the coating liquid used is low, the coating liquid runs out well and the usage efficiency of the coating liquid is relatively high.
【００１０】しかしながら、従来は塗布液の粘度低下を
溶剤添加により行っていたため、低粘度の塗布液を使用
して乾燥後の膜厚が比較的厚い塗布膜を形成する場合、
塗布量を多くする必要がある。このため、塗布後の基板
の反転時や基板の取扱時に塗布液が流れたり垂れること
があり、均一な塗布膜の形成が困難であるとともに、塗
布液の使用効率の低下も生じるという問題があった。However, conventionally, since the viscosity of the coating solution is reduced by adding a solvent, when a coating film having a relatively large thickness after drying is formed using a low-viscosity coating solution,
It is necessary to increase the application amount. For this reason, the coating liquid may flow or drip when the substrate is turned over after the coating or when the substrate is handled, so that it is difficult to form a uniform coating film and the use efficiency of the coating liquid is reduced. Was.
【００１１】本発明は、このような事情に鑑みてなされ
たものであり、大型ガラス基板等の枚葉タイプの被塗布
基板に対して感光性の塗布膜を均一に形成でき、かつ、
塗布液の使用効率の高い塗布方法を提供することを目的
とする。The present invention has been made in view of such circumstances, and enables a photosensitive coating film to be uniformly formed on a single-wafer type coating substrate such as a large glass substrate, and
An object of the present invention is to provide a coating method with high use efficiency of a coating liquid.
【００１２】[0012]
【課題を解決するための手段】上記目的を達成するため
に、本発明の塗布方法は、上方に向って開口するととも
に水平方向に延びる帯状のスリットを有する塗布ヘッド
に加温された感光性の塗布液を供給し、該塗布液を前記
スリットから吐出させて前記塗布ヘッドの上方を通って
斜め上方向に相対的に移動する被塗布基板と前記塗布ヘ
ッドの間にビードを形成し、該ビードから被塗布基板の
塗布面に塗布液を付着させることによって前記被塗布基
板への塗布液の塗布を行うような構成とした。In order to achieve the above object, a coating method according to the present invention is directed to a photosensitive head heated to a coating head having an upwardly opening and horizontally extending strip-shaped slit. Supplying a coating liquid, discharging the coating liquid from the slit, and forming a bead between the substrate to be coated and the coating head, which relatively moves obliquely upward above the coating head; Then, the application liquid is applied to the application substrate by applying the application liquid to the application surface of the application substrate.
【００１３】また、本発明の塗布方法は、回転可能な基
板保持部材に被塗布基板を保持させ、前記基板保持部材
を回転させて前記被塗布基板上に加温された感光性の塗
布液を供給し、該塗布液を遠心力によって分散させるこ
とにより塗布を行なうような構成とした。Further, in the coating method of the present invention, the substrate to be coated is held on a rotatable substrate holding member, and the photosensitive coating solution heated on the substrate to be coated is rotated by rotating the substrate holding member. The coating liquid was supplied, and the coating liquid was dispersed by centrifugal force to perform coating.
【００１４】このような本発明では、加温された状態で
感光性の塗布液がスリットから吐出されるので、この塗
布液の粘度は低い状態にあり、その後、ビードから被塗
布基板に塗布された塗布液は被塗布基板に熱を奪われて
急速に冷却されて粘度が上昇する。また、回転する被塗
布基板上に加温された状態で供給された塗布液は、遠心
力によって分散して均一に塗布された段階で被塗布基板
に熱を奪われて急速に冷却されて粘度が上昇する。In the present invention, since the photosensitive coating solution is discharged from the slit in a heated state, the viscosity of the coating solution is low, and then the coating solution is applied from the bead to the substrate to be coated. The applied coating liquid is deprived of heat by the substrate to be coated and is rapidly cooled to increase the viscosity. In addition, the coating liquid supplied in a heated state on the rotating substrate to be applied is dispersed by centrifugal force and, when uniformly applied, is deprived of heat by the substrate to be applied and rapidly cooled to have a viscosity. Rises.
【００１５】[0015]
【発明の実施の形態】以下、本発明の最も好ましいと思
われる実施の形態について説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The preferred embodiments of the present invention will be described below.
【００１６】本発明の塗布方法は、上方に向って開口す
るとともに水平方向に延びる帯状のスリットを有する塗
布ヘッドに供給する感光性の塗布液を、所望の粘度とな
るように加温した状態とする。そして、この塗布ヘッド
と、塗布ヘッドの上方を通って斜め上方向に相対的に移
動する被塗布基板との間に、塗布液をスリットから吐出
させてビードを形成し、このビードから被塗布基板の塗
布面に塗布液を付着させることによって塗布を行うもの
である。According to the coating method of the present invention, a photosensitive coating liquid to be supplied to a coating head having a strip-shaped slit which opens upward and extends in the horizontal direction is heated to a desired viscosity. I do. Then, a coating liquid is discharged from the slit to form a bead between the coating head and the substrate to be moved relatively obliquely upward above the coating head, and a bead is formed from the bead. The coating is performed by causing a coating liquid to adhere to the coating surface.
【００１７】上記のように、塗布ヘッドに供給される感
光性の塗布液は加温によって所望の粘度となるように調
整されているため、従来のビード方式の塗布方法におけ
るような溶剤添加による塗布液の粘度低下の調整が不要
であり、同一粘度の塗布液を使用する場合、塗布液にお
ける溶剤含有量を低く抑える、すなわち、塗布液の固形
分比を高くすることができる。したがって、乾燥後の膜
厚が比較的厚い塗布膜を形成する場合であっても、従来
のビード方式の塗布方法に比べて塗布量を少なくするこ
とができる。また、被塗布基板の塗布面に塗布された塗
布液は、被塗布基板や周囲の空気中に熱を奪われて急速
に冷却されて粘度が上昇する。このため、塗布後の基板
の反転時や基板の取扱時に塗布液が流れたり垂れること
が防止され、均一な塗布膜を形成することができるとと
もに、塗布液の使用効率が高いものとなる。As described above, since the photosensitive coating solution supplied to the coating head is adjusted to have a desired viscosity by heating, coating by adding a solvent as in the conventional bead-type coating method is performed. It is not necessary to adjust the viscosity of the liquid, and when using coating liquids having the same viscosity, the solvent content in the coating liquid can be kept low, that is, the solid content ratio of the coating liquid can be increased. Therefore, even when a coating film having a relatively large thickness after drying is formed, the coating amount can be reduced as compared with the conventional bead-type coating method. Further, the coating liquid applied to the coating surface of the substrate to be coated is deprived of heat by the substrate to be coated and the surrounding air, is rapidly cooled, and its viscosity increases. For this reason, the coating liquid is prevented from flowing or dripping when the substrate is reversed after application or when the substrate is handled, so that a uniform coating film can be formed and the usage efficiency of the coating liquid is high.
【００１８】本発明の塗布方法において使用する感光性
の塗布液は、特に制限はなく、例えば、粘度が３〜２０
ｃｐｓ程度の溶剤系感光性樹脂、水系感光性樹脂、また
は、これらの感光性樹脂に顔料等の着色材を分散させた
感光性樹脂等を対象とすることができる。The photosensitive coating solution used in the coating method of the present invention is not particularly limited, and for example, has a viscosity of 3 to 20.
A solvent-based photosensitive resin of about cps, a water-based photosensitive resin, or a photosensitive resin in which a coloring material such as a pigment is dispersed in these photosensitive resins can be used.
【００１９】また、本発明の塗布方法を適用する被塗布
基板としては、特に制限はなく、例えば、ＬＣＤカラー
フィルタ用のガラス基板等のように、大面積で表面の平
滑度が低い（通常５０〜７０μｍ，最大では１００μｍ
程度の凹凸がある）基板であっても、厚みが均一な塗布
膜を形成することができる。The substrate to which the coating method of the present invention is applied is not particularly limited. For example, a glass substrate for an LCD color filter has a large area and low surface smoothness (typically 50). ７０70 μm, maximum 100 μm
Even with a substrate having a certain degree of unevenness, a coating film having a uniform thickness can be formed.
【００２０】次に、本発明の塗布方法を塗布装置の一例
を挙げて説明する。図１は、本発明の塗布方法を実施す
るための塗布装置の一例を示す構成図である。図１にお
いて、塗布ヘッド１は隔壁部３と、この隔壁部３を挟む
ように位置する前壁部２と後壁部４と、これらの前壁部
２、隔壁部３および後壁部４の両端部に位置する側壁部
（図示せず）とを備えている。そして、前壁部２の上部
と隔壁部３の上部とが対向する箇所に、軸方向に沿って
延びるとともに上方に向って開口する第１スリットＳ1
が形成されている。また、隔壁部３と後壁部４の上部の
対向する面によって、軸方向に沿って延びるとともに上
方に向って開口する第２スリットＳ2 が形成されてお
り、この第２スリットＳ2 は上記の第１スリットＳ1 と
平行であり、かつ、第２スリットＳ2 の開口面は第１ス
リットＳ1 の開口面よりも若干低い位置（例えば、５〜
１０ｍｍ程度）となっている。そして、この第１スリッ
トＳ1 と第２スリットＳ2 を挟むようにその両側に一対
の斜面２ａおよび４ａが形成されている。Next, the coating method of the present invention will be described with reference to an example of a coating apparatus. FIG. 1 is a configuration diagram showing an example of a coating apparatus for performing the coating method of the present invention. In FIG. 1, a coating head 1 includes a partition wall 3, a front wall 2 and a rear wall 4 positioned so as to sandwich the partition 3, and the front wall 2, the partition 3, and the rear wall 4. Side walls (not shown) located at both ends. A first slit S 1 extending along the axial direction and opening upward at a position where the upper part of the front wall part 2 and the upper part of the partition part 3 face each other.
Are formed. Further, the upper portion of the opposite surfaces of the rear wall 4 and the partition wall 3, upwardly extends along the axial direction and a second slit S 2 is formed to be open, the second slit S 2 is the the first is parallel to the slits S 1, and the opening surface of the second slit S 2 is slightly lower than the first opening surface of the slit S 1 (e.g., 5 of
(About 10 mm). The pair of inclined surfaces 2a and 4a are formed on both sides so as to sandwich the first slit S 1 and the second slit S 2.
【００２１】また、塗布ヘッド１の内部には、第１スリ
ットＳ1 と平行に延びるとともに、その軸方向の全域に
亘って連通される中空状の液溜り１Ａが前壁部２、隔壁
部３および側壁部との間に形成され、また、第２スリッ
トＳ2 と平行に延びるとともに、その軸方向の全域に亘
って連通される中空状の液溜り１Ｂが隔壁部３、後壁部
４および側壁部との間に形成されている。Inside the coating head 1, a hollow liquid reservoir 1 A extending parallel to the first slit S 1 and communicating over the entire area in the axial direction thereof has a front wall portion 2 and a partition wall portion 3. and it is formed between the side wall portions, also extends parallel to the second slit S 2, hollow fluid reservoir 1B partition wall portion 3 that is communicated over the entire area in the axial direction, a rear wall portion 4 and It is formed between the side wall part.
【００２２】この塗布ヘッド１の液溜り１Ａは、その塗
布液供給口に供給パイプＰ１およびＰ２を介して塗布液
供給ポンプＰの吐出側が接続されており、この塗布液供
給ポンプＰから塗布液供給口を介して液溜り１Ａに塗布
液が供給されるようになっている。また、塗布液供給ポ
ンプＰには下端部が塗布液供給タンク１１内に挿入され
た供給パイプＰ３が接続され、さらに、供給パイプＰ１
とＰ２の間にはフィルタＦが接続されている。尚、塗布
液供給口は、塗布ヘッド１の長手方向において前壁部２
の中央部に１個設けられていればよいが、塗布ヘッド１
の長手方向に沿って複数個設けるようにしてもよい。In the liquid reservoir 1A of the coating head 1, the discharge side of a coating liquid supply pump P is connected to the coating liquid supply port via supply pipes P1 and P2. The coating liquid is supplied to the liquid reservoir 1A through the mouth. A supply pipe P3 whose lower end is inserted into the coating liquid supply tank 11 is connected to the coating liquid supply pump P.
A filter F is connected between P2 and P2. The application liquid supply port is located on the front wall 2 in the longitudinal direction of the application head 1.
Suffices to be provided at the center of the coating head.
May be provided along the longitudinal direction.
【００２３】また、塗布ヘッド１の液溜り１Ｂには、そ
の塗布液排出口に塗布液の排出パイプＰ４の一端部が接
続され、この排出パイプＰ４の他端部が、塗布液供給タ
ンク１１内に挿入されている。One end of a coating liquid discharge pipe P4 is connected to the coating liquid discharge port of the liquid reservoir 1B of the coating head 1 and the other end of the discharge pipe P4 is connected to the inside of the coating liquid supply tank 11. Has been inserted.
【００２４】塗布液供給タンク１１は内部に塗布液を保
持するものであり、かつ、この塗布液供給タンク１１は
槽内に水を保持する加温槽１２内に配設されている。加
温槽１２は図示しない加熱装置により、槽内に保持した
水を所望の温度に維持するものであり、塗布液供給タン
ク１１の壁面を介して、塗布液供給タンク１１内に保持
された塗布液も所望の温度に維持される。したがって、
加温槽１２によって塗布ヘッド１によるビード方式の塗
布に最適な粘度となるように塗布液を加温することがで
きる。The coating liquid supply tank 11 holds the coating liquid therein, and the coating liquid supply tank 11 is disposed in a heating tank 12 that holds water in the tank. The heating tank 12 is for maintaining the water held in the tank at a desired temperature by a heating device (not shown), and the coating liquid held in the coating liquid supply tank 11 through the wall surface of the coating liquid supply tank 11. The liquid is also maintained at the desired temperature. Therefore,
The coating solution can be heated by the heating tank 12 so as to have an optimum viscosity for the bead coating by the coating head 1.
【００２５】図１に示した塗布装置では、加温槽１２に
より所定の温度に加温された塗布液供給タンク１１内の
塗布液は、塗布液供給ポンプＰの駆動によって吸引パイ
プＰ３に吸い上げられ、供給パイプＰ１、フィルタＦお
よび供給パイプＰ２を介して塗布液供給口から塗布ヘッ
ド１の液溜り１Ａに導入される。そして、液溜り１Ａに
導入された塗布液は、第１スリットＳ1 から塗布ヘッド
１の上面に加温された状態で吐出してビードＢを形成
し、さらに、このビードＢから過剰な塗布液が第２スリ
ットＳ2 の方向に流れる。このようにビードＢから第２
スリットＳ2 に流れた塗布液は液溜り１Ｂ内に吸い込ま
れる。この液溜り１Ｂ内に吸い込まれた塗布液は、塗布
液排出口から排出パイプＰ４によって塗布液供給タンク
１１内に導入され、塗布液供給タンク１１内で所定の温
度に維持された塗布液に合流して再び塗布に供される。In the coating apparatus shown in FIG. 1, the coating liquid in the coating liquid supply tank 11 heated to a predetermined temperature by the heating tank 12 is sucked into the suction pipe P3 by driving the coating liquid supply pump P. The liquid is introduced into the liquid reservoir 1A of the coating head 1 from the coating liquid supply port via the supply pipe P1, the filter F, and the supply pipe P2. Then, the coating liquid introduced into the liquid reservoir 1A is ejected while being warmed on the upper surface of the coating head 1 from the first slit S 1 to form a bead B, further, excess coating solution from the bead B There flowing in the second direction of the slit S 2. Thus, the second from bead B
The coating liquid that has flowed into the slit S 2 is sucked into the liquid reservoir 1B. The coating liquid sucked into the liquid reservoir 1B is introduced into the coating liquid supply tank 11 from the coating liquid discharge port by the discharge pipe P4, and joins the coating liquid maintained at a predetermined temperature in the coating liquid supply tank 11. Then, it is applied again.
【００２６】本発明の塗布方法では、上述の塗布装置に
おいて塗布液供給タンク１１から加温された塗布液を塗
布ヘッド１の液溜り１Ａに供給し、ビード方式の塗布に
最適な粘度を有する加温された塗布液によりビードＢを
形成して被塗布基板への塗布が行われる。被塗布基板に
塗布された塗布液は、被塗布基板や周囲の空気中に熱を
奪われて急速に冷却されて粘度が上昇し、塗布後の基板
の反転時や基板の取扱時に流れたり垂れることがなく、
均一な塗布膜を維持する。また、被塗布基板に塗布され
なかった過剰の塗布液は、液溜り１Ｂ、排出パイプＰ４
を経由して塗布液供給タンク１１内に返送される。In the coating method of the present invention, the heated coating liquid is supplied from the coating liquid supply tank 11 to the liquid reservoir 1A of the coating head 1 in the above-mentioned coating apparatus, and the coating liquid having the optimum viscosity for the bead type coating is applied. Beads B are formed from the heated coating liquid, and the coating is performed on the substrate to be coated. The coating liquid applied to the substrate to be coated is deprived of heat by the substrate to be coated and the surrounding air, rapidly cooled and increases in viscosity, and flows or drips when reversing the substrate after coating or when handling the substrate. Without
Maintain a uniform coating. Excess coating liquid that has not been applied to the substrate to be coated is accumulated in a liquid reservoir 1B and a discharge pipe P4.
Is returned into the coating liquid supply tank 11 via
【００２７】上記の塗布方法における塗布液の加温は、
使用する塗布液、被塗布基板の表面状態、塗布膜の厚み
等を考慮して設定することができ、例えば、１５〜６０
℃の範囲内で所望の温度に設定することができる。The heating of the coating solution in the above-mentioned coating method is as follows.
It can be set in consideration of the coating liquid to be used, the surface state of the substrate to be coated, the thickness of the coating film, and the like.
The desired temperature can be set within the range of ° C.
【００２８】上述の塗布方法では、加温槽１２によって
塗布液の加温が行われるが、本発明はこれに限定される
ものではなく、塗布液供給タンク１１内の塗布液に加熱
装置を挿入して加熱したり、塗布液供給タンク１１内に
加熱装置を配設することにより塗布液を加熱してもよ
く、また、供給パイプＰ１、Ｐ２、Ｐ３に加熱装置を装
着して塗布液を加熱してもよく、さらに、上述の各加熱
手段の任意の組み合わせとしてもよい。In the above-described coating method, the coating solution is heated by the heating tank 12, but the present invention is not limited to this, and a heating device is inserted into the coating solution in the coating solution supply tank 11. And heating the coating liquid by disposing a heating device in the coating liquid supply tank 11, or heating the coating liquid by attaching a heating device to the supply pipes P1, P2 and P3. Or any combination of the above-mentioned heating means.
【００２９】上述の実施形態はビード塗布における本発
明の塗布方法であるが、基板を回転させた状態で、この
基板上に塗布液を適量供給し遠心力で均一に分散させて
塗布を行う公知のスピン塗布方式においても本発明の塗
布方法は適用可能である。この場合、塗布液の加温は上
述の実施形態と同様にして行なうことができ、基板上に
供給する塗布液の温度は１５〜６０℃の範囲内で基板の
回転速度、塗布膜の厚み等を考慮して設定することがで
きる。The above-described embodiment is a coating method of the present invention in bead coating. In the known method, an appropriate amount of a coating liquid is supplied onto the substrate while the substrate is rotated, and the liquid is uniformly dispersed by centrifugal force to perform coating. The coating method of the present invention can be applied to the spin coating method described above. In this case, the heating of the coating liquid can be performed in the same manner as in the above-described embodiment, and the temperature of the coating liquid supplied onto the substrate is within the range of 15 to 60 ° C. Can be set in consideration of
【００３０】[0030]
【実施例】次に、実施例を示して本発明を更に詳細に説
明する。Next, the present invention will be described in more detail with reference to examples.
【００３１】幅３００ｍｍ、長さ４００ｍｍ、板厚１．
１ｍｍのＬＣＤカラーフィルタ用のガラス基板Ｓを準備
し、塗布液として下記の組成の２種の塗布液Ａ、Ｂを調
製した。尚、塗布液の粘度測定はＢ型粘度計を用いて行
った。A width of 300 mm, a length of 400 mm, and a thickness of 1.
A glass substrate S for a 1 mm LCD color filter was prepared, and two kinds of coating solutions A and B having the following compositions were prepared as coating solutions. The viscosity of the coating solution was measured using a B-type viscometer.
【００３２】 塗布液Ａの組成（固形分濃度２０％、粘度８ｃｐｓ（℃）） ・ベンジルメタクリレート／メタクリル酸共重合体（モル比７３／２７） … ６０重量部 ・ペンタエリスリトールテトラアクリレート … ４３重量部 ・２．４−ビス（トリクロロメチル）−６−Ｐ−メトキシスチリル −Ｓ−トリアジン …２．５重量部 ・イルカジンレッドＢＰＴ … ２０重量部 ・メチルセロソルブアセテート …５６０重量部 ・メチルエチルケトン …２８０重量部 塗布液Ｂの組成（固形分濃度２０％、粘度７ｃｐｓ（℃）） ・ベンジルメタクリレート／メタクリル酸共重合体（モル比７３／２７） … ６０重量部 ・ペンタエリスリトールテトラアクリレート … ４３重量部 ・２．４−ビス（トリクロロメチル）−６−Ｐ−メトキシスチリル −Ｓ−トリアジン …２．５重量部 ・銅フタロシアニン（緑） … ２０重量部 ・メチルセロソルブアセテート …５６０重量部 ・メチルエチルケトン …２８０重量部 （本発明の塗布方法）次に、第１スリットＳ1 幅２ｍ
ｍ、第２スリットＳ2 幅５ｍｍの塗布ヘッドを備えた図
１に示されるような塗布装置を使用し、本発明の塗布方
法にしたがって、加温槽の水温を４０℃に設定して塗布
液Ａを加温した状態で塗布ヘッドに供給（４００ｃｍ3
／分）した。塗布液Ａの循環供給を開始して１０分経過
後の安定状態での塗布液の温度は３６℃、粘度は６ｃｐ
ｓであった。そして、この塗布ヘッドとガラス基板Ｓと
の間の相対角度を２０°、塗布ヘッドとガラス基板Ｓと
の相対速度を３０ｍｍ／秒に設定して、ガラス基板Ｓへ
のビード塗布（塗布量２２．４ｇ／ｍ2 ）を行った。 Composition of coating solution A (solid content concentration: 20%, viscosity: 8 cps (° C.)) Benzyl methacrylate / methacrylic acid copolymer (molar ratio 73/27): 60 parts by weight Pentaerythritol tetraacrylate: 43 parts by weight・ 2.4-bis (trichloromethyl) -6-P-methoxystyryl-S-triazine ... 2.5 parts by weight ・ Ircazine red BPT ... 20 parts by weight ・ Methyl cellosolve acetate ... 560 parts by weight ・ Methyl ethyl ketone ... 280 parts by weight 1. Composition of coating solution B (solid content concentration 20%, viscosity 7 cps (° C.)) ・ Benzyl methacrylate / methacrylic acid copolymer (molar ratio 73/27): 60 parts by weight ・ Pentaerythritol tetraacrylate: 43 parts by weight 4-bis (trichloromethyl) -6-P-methoxystyryl-S-to Azine ... 2.5 parts by weight of copper phthalocyanine (green) ... 20 parts by weight of methyl cellosolve acetate ... 560 parts by weight Methyl ethyl ketone 280 parts by weight (the method of applying the present invention) Next, the first slit S 1 width 2m
m, 2nd slit S 2 Using a coating apparatus having a coating head having a width of 5 mm as shown in FIG. A is supplied to the coating head while being heated (400 cm 3
/ Min). The temperature of the coating solution in a stable state after 10 minutes from the start of the circulating supply of the coating solution A is 36 ° C., and the viscosity is 6 cp.
s. Then, the relative angle between the coating head and the glass substrate S is set to 20 °, and the relative speed between the coating head and the glass substrate S is set to 30 mm / sec. 4 g / m 2 ).
【００３３】塗布完了後、直ちにガラス基板Ｓを反転し
て塗布面を上向き水平とした。その後、９０℃で３分間
加熱して塗布膜１を形成した。この塗布膜１は、厚み約
２μｍの均一なものであった。 （比較塗布方法）一方、上記と同様の塗布装置を使用
し、加温槽による塗布液の加温を行うことなく塗布液Ｂ
を塗布ヘッドに供給（４００ｃｍ3 ／分）した。そし
て、この塗布ヘッドとガラス基板Ｓとの間の相対角度を
２０°、塗布ヘッドとガラス基板Ｓとの相対速度を３０
ｍｍ／秒に設定して、ガラス基板Ｓへのビード塗布（塗
布量２６．６ｇ／ｍ2 ）を行った。Immediately after the coating was completed, the glass substrate S was turned over and the coated surface was turned upward and horizontal. Thereafter, the coating film 1 was formed by heating at 90 ° C. for 3 minutes. This coating film 1 was uniform with a thickness of about 2 μm. (Comparative coating method) On the other hand, using the same coating apparatus as above, the coating liquid B was heated without heating the coating liquid in a heating tank.
Was supplied to the coating head (400 cm 3 / min). The relative angle between the coating head and the glass substrate S is 20 °, and the relative speed between the coating head and the glass substrate S is 30 °.
The beads were applied to the glass substrate S (application amount: 26.6 g / m 2 ) at a setting of mm / sec.
【００３４】塗布完了後、直ちにガラス基板Ｓを反転し
て塗布面を上向き水平とした。その後、９０℃で３分間
加熱して、塗布膜１と同様の厚みをもつ塗布膜２を形成
した。この塗布膜２は、上記のガラス基盤Ｓの反転時、
および、その後の取扱時において塗布液の流れ等が発生
したことに起因する厚みムラ（約０．１μｍ）がみら
れ、均一なものではなかった。Immediately after the coating was completed, the glass substrate S was turned over and the coated surface was turned upward and horizontal. Thereafter, the coating was heated at 90 ° C. for 3 minutes to form a coating 2 having the same thickness as the coating 1. This coating film 2 is used when the above-mentioned glass substrate S is inverted.
In addition, thickness unevenness (approximately 0.1 μm) due to the flow of the coating liquid and the like during the subsequent handling was observed, and was not uniform.
【００３５】[0035]
【発明の効果】以上詳述したように、本発明によればス
リットから吐出されビードを形成する感光性の塗布液は
加温されているため、その粘度は低い状態にあり、した
がって、被塗布基板への塗布において塗布液の液切れが
良好で塗布液の均一な塗布が可能となり、また、被塗布
基板に塗布された塗布液は被塗布基板や周囲の空気中に
熱を奪われて急速に冷却されるので粘度が上昇し、塗布
後の基板の反転時や基板の取扱時に塗布液が流れたり垂
れることが防止され、均一な塗布膜を形成することがで
きる。As described above in detail, according to the present invention, since the photosensitive coating liquid discharged from the slit and forming a bead is heated, its viscosity is in a low state. The coating liquid on the substrate is well drained and the coating liquid can be applied uniformly, and the coating liquid applied to the substrate to be applied is rapidly absorbed by the substrate and the surrounding air. As a result, the coating liquid is prevented from flowing or dripping when the substrate is turned over after application or when the substrate is handled, and a uniform coating film can be formed.
【００３６】また、本発明では加温された感光性の塗布
液を回転している被塗布基板上に供給して遠心力により
分散して塗布するので、分散段階では塗布液の粘度が低
いことにより均一な分散が可能であり、この均一分散さ
れた塗布液は被塗布基板や周囲の空気中に熱を奪われて
急速に冷却されるので粘度が上昇し、塗布後の基板の反
転時や基板の取扱時に塗布液が流れたり垂れることが防
止され、均一な塗布膜を形成することができる。In the present invention, since the heated photosensitive coating solution is supplied onto the rotating substrate to be applied and dispersed and applied by centrifugal force, the viscosity of the coating solution is low in the dispersion stage. The uniform dispersion is possible, and the uniformly dispersed coating liquid is quickly cooled by being deprived of heat by the substrate to be coated and the surrounding air, so that the viscosity increases, and when the substrate is inverted after coating, The coating liquid is prevented from flowing or dripping when handling the substrate, and a uniform coating film can be formed.
【図１】本発明の塗布方法に使用する塗布装置の一例を
示す概略構成図である。FIG. 1 is a schematic configuration diagram showing an example of a coating apparatus used for a coating method of the present invention.
１…塗布ヘッド ２…前壁部 ３…隔壁部 ４…後壁部 １１…塗布液供給タンク １２…加温槽 Ｓ1 …第１スリット Ｓ2 …第２スリット Ｂ…ビード Ｓ…基板1 ... coating head 2 ... front wall 3 ... partition wall portion 4 ... rear wall portion 11 ... coating liquid supply tank 12 ... heating tank pressure S 1 ... first slit S 2 ... second slit B ... bead S ... substrate
フロントページの続き (72)発明者 竹本 潤 東京都新宿区市谷加賀町一丁目１番１号 大日本印刷株式会社内Continuation of the front page (72) Inventor Jun Takemoto 1-1-1, Ichigaya-Kagacho, Shinjuku-ku, Tokyo Dai Nippon Printing Co., Ltd.
Claims (2)
に延びる帯状のスリットを有する塗布ヘッドに加温され
た感光性の塗布液を供給し、該塗布液を前記スリットか
ら吐出させて前記塗布ヘッドの上方を通って斜め上方向
に相対的に移動する被塗布基板と前記塗布ヘッドの間に
ビードを形成し、該ビードから被塗布基板の塗布面に塗
布液を付着させることによって前記被塗布基板への塗布
液の塗布を行うことを特徴とした塗布方法。1. A heated photosensitive coating liquid is supplied to a coating head having a belt-shaped slit which opens upward and extends in the horizontal direction, and the coating liquid is discharged from the slit to form the coating head. Forming a bead between the substrate to be coated and the coating head, which relatively moves in an obliquely upward direction through the upper side of the substrate, and applying a coating liquid from the bead to a coating surface of the substrate to be coated, thereby forming the substrate. A coating method characterized by applying a coating liquid to a coating.
保持させ、前記基板保持部材を回転させて前記被塗布基
板上に加温された感光性の塗布液を供給し、該塗布液を
遠心力によって分散させることにより塗布を行なうこと
を特徴とした塗布方法。2. A substrate to be coated is held on a rotatable substrate holding member, and a heated photosensitive coating solution is supplied onto the substrate by rotating the substrate holding member. A coating method characterized in that coating is performed by dispersing by centrifugal force.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18657696A JP4203130B2 (en) | 1996-06-27 | 1996-06-27 | Application method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18657696A JP4203130B2 (en) | 1996-06-27 | 1996-06-27 | Application method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH105690A true JPH105690A (en) | 1998-01-13 |
| JP4203130B2 JP4203130B2 (en) | 2008-12-24 |
Family
ID=16190965
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18657696A Expired - Fee Related JP4203130B2 (en) | 1996-06-27 | 1996-06-27 | Application method |
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| Country | Link |
|---|---|
| JP (1) | JP4203130B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004212944A (en) * | 2002-12-19 | 2004-07-29 | Jsr Corp | Radiation-sensitive composition for color filter, color filter, color liquid crystal display device, and method for forming colored layer for color filter |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59131258U (en) * | 1983-02-18 | 1984-09-03 | ナショナル住宅産業株式会社 | painting equipment |
| JPH01203073A (en) * | 1988-02-05 | 1989-08-15 | Konica Corp | Applicator of magnetic recording medium |
| JPH0438621A (en) * | 1990-05-31 | 1992-02-07 | Konica Corp | Method and device for coating |
| JPH0574698A (en) * | 1991-09-18 | 1993-03-26 | Hitachi Ltd | Resist coating device |
| WO1994027737A1 (en) * | 1993-05-27 | 1994-12-08 | Dai Nippon Printing Co., Ltd. | Method of and apparatus for application of liquid |
-
1996
- 1996-06-27 JP JP18657696A patent/JP4203130B2/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59131258U (en) * | 1983-02-18 | 1984-09-03 | ナショナル住宅産業株式会社 | painting equipment |
| JPH01203073A (en) * | 1988-02-05 | 1989-08-15 | Konica Corp | Applicator of magnetic recording medium |
| JPH0438621A (en) * | 1990-05-31 | 1992-02-07 | Konica Corp | Method and device for coating |
| JPH0574698A (en) * | 1991-09-18 | 1993-03-26 | Hitachi Ltd | Resist coating device |
| WO1994027737A1 (en) * | 1993-05-27 | 1994-12-08 | Dai Nippon Printing Co., Ltd. | Method of and apparatus for application of liquid |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004212944A (en) * | 2002-12-19 | 2004-07-29 | Jsr Corp | Radiation-sensitive composition for color filter, color filter, color liquid crystal display device, and method for forming colored layer for color filter |
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| Publication number | Publication date |
|---|---|
| JP4203130B2 (en) | 2008-12-24 |
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