JPH1096812A - Formation of colored pattern having black matrix - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method capable of stably forming fine colored patterns having excellent long-term performance with a smaller number of stages. SOLUTION: This method for formation of the colored patterns comprises (a) a stage for forming a black matrix 2 consisting of vapor deposited films of a metal or metal oxide on a transparent substrate 1, (2) a stage for increasing the film thickness of the black matrix 2 by precipitating a metallic film by electrolytic plating on the vapor deposited film at need, (3) a stage for forming a colored resin film on the transparent substrate 1 by coating the substrate with a colored resin coating material and (4) a stage for irradiating the colored resin film with a laser beam to a pattern form and removing the parts irradiated with the laser beam, then repeating the stage (3) and stage (4) described above a required number of times (inclusive of 0 times) according to the number of colors, forming the final colored resin film by the stage (3) and polishing the surface of the colored resin film, thereby smoothing the colored resin film surface.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a colored pattern by combining the formation of a black matrix, which is a deposited film of a metal or a metal oxide, and the laser ablation method of a colored resin film, and is particularly suitable for the production of a color filter. And a method for forming a colored pattern.

[0002]

2. Description of the Related Art
In the production of a color filter, a method of forming a multicolored pattern is as follows: (1) Repeating coating, exposure and development using a colored resin composition of a plurality of colors in which a pigment or dye is dispersed in a photosensitive resin. A so-called “pigment dispersion method”, (2) forming a colored layer based on a polymer layer by electrodeposition on a specific transparent electrode of a substrate having a metal oxide transparent electrode disposed thereon, A so-called “pattern electrodeposition method” in which another colored layer is formed on an electrode by electrodeposition.
(3) A method called "printing method" in which a plurality of colored pastes are printed in a pattern on a substrate. (4) A photosensitive resist film is formed on the surface of the substrate. A colored layer is formed on the exposed substrate surface by peeling according to a predetermined pattern by a photolithographic method, and then the photosensitive film in an adjacent region is peeled according to a predetermined pattern by a photolithographic method, and the exposed substrate surface A method called a "resist direct method" in which a colored layer of a different color is repeatedly formed on the support. (5) A water-soluble photosensitive resin is coated on a support to form a relief image, and then dyed with a dye. Forming a colored layer by repeating the provision of a colored layer.
A method referred to as a so-called “dyeing method”, and (6) a method of forming a colored pattern by finely applying ink to a substrate surface by using an ink jet method, and the like.

However, in the above method (1), coating, exposure and development are repeatedly performed, so that the number of steps is increased and the defect rate is increased. In addition, the pigment is dispersed in a special photosensitive resin. Dispersibility is poor, and there are drawbacks such as a reduction in curability at the time of exposure and a decrease in transparency of the obtained colored layer. The method (2) requires a complicated and detailed operation of wiring the arranged transparent electrodes, and has a problem that the shape of the obtained colored pattern is limited. In the above method (3), it is difficult to form a fine multicolored colored layer. In the above method (4), since exposure and development of the photosensitive resist film are repeatedly performed, the photosensitive resist film is repeatedly formed. Although performance that can withstand use is required, there is a drawback that the pattern shape is likely to be deteriorated by repeated use. Further, in the method (5), problems such as difficulty in process control due to unstable photosensitivity and coloring by a dye, poor thermal stability, and poor adhesion to a substrate are likely to occur. Further, the above (6)
In the method (1), poor color reproducibility due to ink bleeding and poor pattern accuracy due to crushing of the shape of the applied ink are likely to occur.

In any of the above-mentioned methods (1) to (6), there is the above-mentioned problem, and a color pattern having a fine multi-colored layer having excellent long-term performance on a substrate can be formed by a small number of steps. There is a need to develop a method that can be formed stably.

Therefore, the present inventors have previously proposed a method of forming a color pattern using a laser abrasion method in which a colored coating film on a substrate is irradiated with a laser in a pattern and removed in a pattern (Japanese Patent Application No. 2002-110,058). Hei 8-69616
issue). However, when a color filter is formed by this method, it takes a long time to process a grid-like black matrix, resulting in poor productivity. In addition, when processing by laser scanning to increase the processing speed, a stripe-like process is performed. However, there was a problem that only a black coating film could be formed.

[0006]

The inventors of the present invention have made intensive studies to develop a method capable of stably forming a fine colored pattern having excellent long-term performance with a small number of steps in a short time. As a result, this time, a black matrix consisting of a metal or metal oxide deposited film was formed on a transparent substrate, a colored resin film was formed on it, and then a laser was applied to the colored resin film in a pattern. The present inventors have found that the above object can be achieved by performing a combination of the step of irradiating the laser-irradiated portion and the step of polishing the colored resin film, thereby completing the present invention.

That is, the present invention provides:
A step of forming a black matrix composed of a deposited film of a metal or a metal oxide, (2) a step of depositing a metal film on the deposited film by electrolytic plating, if necessary, to increase the thickness of the black matrix; (3) (4) a step of applying a colored resin coating material in which a color pigment is dispersed on a transparent substrate on which a black matrix is formed to form a colored resin film;
Irradiating the colored resin film with a laser beam in a pattern by a laser abrasion method and removing the laser beam irradiated portion on the transparent substrate on which the patterned colored resin film has been formed; Using a colored resin coating material capable of forming a colored resin film of a different color, the above steps (3) and (4) are repeated the required number of times (including 0) according to the number of colors, and then the step (3) is performed. The present invention provides a method for forming a multicolored pattern having a black matrix, characterized in that the surface of the colored resin film is polished to smooth the surface of the colored resin film after forming the colored resin film of the last different color. It is.

According to the present invention, in the method of the present invention, the color of the colored resin coating material is three colors of red, blue and green;
An object of the present invention is to provide a method of forming a multicolored pattern, which comprises forming three colored patterns of red, blue and green.

The present invention further provides a color filter comprising a black matrix and three colored patterns of red, blue and green formed on a transparent substrate for a liquid crystal display by the method of the present invention. To provide.

[0010]

DESCRIPTION OF THE PREFERRED EMBODIMENTS In the method for forming a multicolored pattern of the present invention, first, a black matrix composed of a metal or metal oxide deposited film is formed on a transparent substrate [Step (1)].

As the transparent substrate, a transparent glass plate,
Examples thereof include a transparent resin substrate and a transparent substrate having a transparent conductive layer. Here, as a transparent substrate having a transparent conductive layer, a thin film of a transparent metal, indium oxide, tin oxide, or the like is formed on a surface of a transparent glass plate or a transparent resin substrate by a sol-gel method, a sputtering method, an evaporation method, a CVD method, or the like. Formed by a method or the like.

As a method of forming a black matrix composed of a metal or metal oxide deposited film on these transparent substrates, the following methods (a) and (b) can be exemplified.

(A) After forming a metal or metal oxide vapor-deposited film on a transparent substrate, a photoresist film is formed on the vapor-deposited film, exposed in a pattern, and developed to form a resist pattern. Then, etching is performed, and the remaining resist film is peeled off and removed to form a patterned black matrix on the transparent substrate.

(B) A photoresist film is formed on a transparent substrate, exposed in a pattern, developed, and a resist pattern is formed. Then, a metal or metal oxide is formed on the transparent substrate on which the resist pattern is formed. A method of forming a black matrix on a transparent substrate by forming a deposited film by depositing an object, removing and removing the remaining resist film, and removing the deposited film on the resist pattern.

The photoresist film in the above methods (a) and (b) is formed from, for example, a conventionally known photopolymerizable composition used as an etching resist or a solder resist when a printed wiring board is formed by lithography. can do. In addition, exposure and development of the photoresist film can also be performed by a method known per se depending on the type of the photopolymerizable composition to be used.

Metals and metal oxides for forming the deposited film include metals such as copper, nickel, silver, gold, chromium, tin, aluminum and alloys of two or more of these metals;
Oxides of the above metals such as tin oxide and the like can be mentioned.

The deposition film can be formed by vacuum deposition, sputtering, ion plating, electron cyclotron resonance or the like.
It can be about 01 to 10 μm, preferably about 0.1 to 3 μm.

The etching in the above method (a) can be performed by a conventional method suitable for the type of metal or metal oxide film of the deposited film.

In the method of the present invention, if necessary, a metal film is deposited by electrolytic plating on the deposited film as the black matrix formed in the above step (1) to increase the thickness of the black matrix. [Step (2)]. The black matrix is usually used in an amount of about 0.1 from the viewpoints of light-shielding properties and resistance to processing of the colored resin film by a laser abrasion method which is a post-process.
A film thickness of about 5 to 5.0 μm is required. In order to secure this film thickness by using the vapor deposition film alone, it may take a long time to form the vapor deposition film. In this case, it is preferable to increase the thickness of the black matrix by electrolytic plating.

In the method of the present invention, a colored resin coating material in which a colored pigment is dispersed is coated on a transparent substrate on which a black matrix has been formed by the above steps (1) and (2) to form a colored resin film. [Step (3)].

The resin used for the colored resin coating material is not particularly limited, but is preferably a resin having good heat resistance, light resistance, adhesion to a substrate, and pigment dispersibility. Specifically, an acrylic resin, an epoxy resin, a polyamide resin, a polyurethane resin, a polyester resin, an alkyd resin, a silicone resin, a melamine resin, and the like can be given. These resins may be used alone or as a mixture of two or more resins.

The coloring pigment dispersed in the resin is preferably a pigment excellent in heat resistance, chemical resistance, solvent resistance, and light resistance. Further, since an appropriate spectrum and transparency are required, an organic pigment is preferred. It is preferred that Color pigment is 1
They can be used alone or as a mixture of two or more. From the viewpoints of transparency, absorption coefficient of visible light, and the like, the particle size of the color pigment in the
It is desirably 0 nm or less, preferably 120 nm or less, and it is effective to disperse the pigment by a known method using a sand mill, a kneader, a two-roll or the like to improve the transparency and the absorption coefficient.

Examples of pigments which can be used as the above-mentioned coloring pigments and which have excellent various resistances are shown by color index (CI) numbers as follows.

Yellow pigment: C.I. I. 24, 83, 93, 9
4, 108, 109, 110, 117, 125, 13
7, 147, 153, 154, 166, 168.

Orange pigment: C.I. I. 36, 43, 5
1, 55, 59, 61.

Red pigment: C.I. I. 97, 122, 12
3, 149, 168, 177, 178, 180, 18
7, 190, 192, 209, 215, 216, 21
7, 220, 223, 224, 226, 227, 22
8,240.

Violet pigment: C.I. I. 19, 23,
29, 30, 37, 40, 50.

Blue pigment: C.I. I. 15, 15: 1, 1
5: 3, 15: 4, 15: 6, 22, 60, 64.

Green pigment: C.I. I. 7, 36.

Brown pigment: C.I. I. 23, 25, 2
6.

Black pigment: C.I. I. 7.

The colored resin coating material may be composed of only the above-mentioned resin and the above-mentioned colored pigment, but may include an organic solvent, water, a neutralizing agent,
A curing catalyst, a pigment dispersant, an antifoaming agent, a coating surface adjusting agent, and the like may be appropriately contained.

The form of the colored resin coating material is not particularly limited, but usually, an organic solvent solution or dispersion, or an aqueous solution or aqueous dispersion is suitably used.

Examples of the method for coating the colored resin coating material on the transparent substrate include a dipping method, a spray method, a spin coating method, an electrodeposition coating method, a silk screen method, a roll coating method, and a curtain flow coating method. In particular, a spin coating method and a roll coating method are preferably used. The coated film of the colored resin coating material is cured by heating or the like as necessary to form a colored resin film. The thickness of the colored resin film is not particularly limited, but is usually 0.5
It is preferable that it is within the range of 5 μm.

In the method of the present invention, the colored resin film formed in the step (3) is further irradiated with a laser beam in a pattern by a laser abrasion method to remove the coating film on the laser-irradiated portion. A film pattern is formed [Step (4)].

In the present specification, the “laser abrasion method” means a method of irradiating a laser beam to an object to decompose or evaporate a laser beam irradiated portion of the object to a desired depth.

As the laser beam used in the step (4), any laser beam capable of performing the above-mentioned laser abrasion method can be used without particular limitation.
For example, an excimer laser, a YAG laser, a carbon dioxide laser, a semiconductor laser, and the like can be given.

As a method of irradiating the colored resin film with a laser beam in a pattern, the laser beam is narrowed down using an optical component such as a lens, and the narrowed laser beam is CAD-processed.
A direct drawing method of irradiating a colored resin film in a pattern based on data or the like, a method of forming a pattern by passing a laser beam through a stencil, and irradiating the colored resin film with the pattern can be exemplified.

The pattern shape of the laser light applied to the colored resin film is such that the position removed at each laser light irradiation step is the same as the position of the colored resin film to be subsequently coated and formed and the position of the finally formed colored pattern. A pattern shape such that it is the same position, and a pattern shape such that the position remaining without being removed in each laser beam irradiation step is the same as the position of the colored resin film and the finally formed colored pattern. And the like, but the above-mentioned pattern shape is preferable because it is simple and a good colored pattern can be obtained.

Irradiation of the colored resin film with a laser beam varies depending on the thickness of the colored resin film and the like, but usually, the energy density of one pulse is 100 mj / cm ^{2 to} 5000 m.
Irradiation with about 1 to 100 pulses of a j / cm ² pulse laser can be suitably performed.

A colored pattern can be formed by removing the film on the laser beam irradiated portion according to the step (4). The removal depth of the colored resin film is appropriately changed depending on the laser beam irradiation intensity and irradiation time. Can be. To clearly distinguish the coloring of the pattern portion from other portions, the removal depth of the colored resin film in the laser beam irradiation portion is a depth until substantially all of the coloring resin film in the irradiation portion is removed. Is preferred.

On the substrate from which the colored resin film has been partially removed in the step (4), a colored resin coating material of the next different color is applied. It is necessary that the colored pattern is not disturbed by the dissolution or swelling of the colored resin film, and the substrate from which the colored resin film has been partially removed by laser light is used before the next colored resin coating material is applied. If necessary, it may be cured by heating or the like. However, in step (3), when the colored resin coating is sufficiently cured by heating after application of the colored resin coating material, further curing by the above heating or the like can be omitted. The curing condition of the colored resin film can be appropriately selected depending on the type of the resin, and the like.
It is suitable to heat at a temperature of about 200 ° C. for about 1 to 60 minutes.

In the method of the present invention, after the above steps (3) and (4) are performed once, the step (3) is performed using colored resin coating materials of different colors, and then the surface of the colored resin film is polished. By performing the steps described above, a two-color pattern can be formed. In order to form a multi-colored pattern of three or more colors, in the formation of the two-colored pattern, the above-mentioned steps (3) and (4) are performed once each, and then a different color is used according to the number of colors. A step of repeatedly performing the above (3) and (4) using the colored resin coating material may be incorporated.

In the method of the present invention, after the colored resin film of the required number of colors is formed on the substrate as described above, the surface of the colored resin film is polished and the surface of the colored resin film is smoothed. The above polishing is usually performed until all of the surfaces of the multicolored patterns are exposed, but after smoothing the surface of the colored resin film by polishing, irradiating the entire surface of the colored resin film with laser light with laser light. The entire surface of each multicolored pattern may be exposed.

The polishing can be performed by, for example, a general-purpose polishing machine.
When used in a TFT liquid crystal display device, a surface roughness of 0.0
When used in an STN liquid crystal display device, it is preferable to polish to a surface roughness of 0.03 μm and a flatness of 0.05 μm or less.
By polishing the surface of the colored resin film, the surface of the colored resin film can be smoothed and the unnecessary colored resin film can be removed at the same time.

The substrate on which the entire surface of each multicolored pattern is exposed is subjected to washing and baking and drying of the surface of the colored pattern as necessary.

The following are common to color filters.
As an example of a method for forming three colored patterns of red, blue and green, a case where the pattern shape of the laser beam is the above-described pattern shape will be described with reference to FIG.

In the above step (1), a black matrix 2 composed of a deposited film is formed on the transparent substrate 1 by depositing a metal or metal oxide film and forming a pattern by a lithographic method or the like (see FIG. 1, (a)).

Then, in step (2), if necessary,
The black matrix 2 which is the above-mentioned deposited film is increased in thickness by electrolytic plating [see FIG. 1, (b)].

After a first colored resin film 3 (for example, red) is formed on the transparent substrate 1 on which the black matrix is formed in the step (3) (see FIG. 1, (c)), the process proceeds to the step (4). The first colored resin film 3 at the position where the pattern of the second colored resin film 4 is finally formed is removed by laser beam irradiation (see FIG. 1, (d)).

Next, a second colored resin coating material is applied on the obtained substrate to form a second colored resin film 4 (for example, blue) (see FIG. 1 and (e)). Second colored resin coating 4
The thickness of the first colored resin film 3 is not particularly limited, but is substantially equal to the film thickness of the first colored resin film 3.
It is preferable to prevent the second colored resin film 4 from being formed on the first colored resin film 3 as much as possible so that the amount of the colored resin film removed by the laser beam is not increased. Usually, a considerable second colored resin coating 4 is formed.

When a third colored resin film 5 (for example, green) is formed in addition to the first and second colored resin films, the third colored resin film 5 is formed on the substrate obtained as described above. The colored resin film at the position where the pattern 5 is finally formed is removed by laser irradiation in the step (4) [see FIG. 1, (f)], and then the third colored resin film 5 is applied to the substrate. By forming the first and second
And a substrate having a third colored resin film can be formed [see FIG. 1, (g)]. When a substrate having a colored resin film of a different color is formed, a similar process may be repeated.

FIG. 1 shows a process of forming a black matrix and a three-color resin coating pattern.
The substrate having the first, second, and third patterned colored resin coatings shown in FIG. 1 (g) is then polished and the colored resin coating surface is smoothed, and all of the multicolored colored pattern surfaces are removed. Are exposed, and a desired multicolored pattern is formed [see FIG. 1, (h)]. After exposing the entire surface of each multicolored pattern, washing and baking and drying of the multicolored pattern may be performed. In this way, a black matrix and three colored resin coating patterns can be formed.

In the case of a color filter, usually three colors of red, blue and green are used as the three colored resin coating patterns, but various colors can be used depending on the application. The order of formation by color is not particularly limited, and can be performed as appropriate.

[0055]

The present invention will be described more specifically with reference to the following examples. Hereinafter, both “parts” and “%” are based on weight.

Preparation of Acrylic Resin Solution Synthesis Example 1 288 parts of acrylic acid 300 parts of styrene 255 parts of n-butyl acrylate 157 parts of 2-hydroxyethyl acrylate 100 parts of t-butyl peroxybenzoate 100 parts A mixture of the above monomer and polymerization initiator was added to a flask. 2-butoxyethanol 1000 heated to 110 ° C in
The resulting mixture was dropped into the mixture for 2 hours with stirring, and then kept at the same temperature for 2 hours to obtain an acrylic resin solution having a solid content of 50%.

Production Example 1 The acrylic resin solution having a solid content of 50% obtained in Synthesis Example 1 and other components were uniformly dispersed according to the formulation shown in Table 1 below, and each of the red, blue and green colored resin coating materials was dispersed. I got The coloring pigment was mixed with a part of an acrylic resin solution, a pigment dispersant, and a part of an organic solvent, dispersed by a sand mill, and blended as a pigment paste. The average particle size of the pigment in each colored resin coating material is as follows: red pigment: 60 nm, blue pigment: 80 nm, green pigment: 9
0 nm, and 95% by weight or more of all pigments have a particle size of 1
It was 20 nm or less.

In Table 1 below, (note) has the following meaning.

(* 1) Cymel 350: manufactured by Mitsui Cytec Co., Ltd., methylated melamine resin, solid content: about 100%.

(* 2) BYK160: a pigment dispersant which is a polymer copolymer solution manufactured by BYK Chemie.

[0061]

[Table 1]

Example 1 A glass plate as a transparent substrate (100 × 100 × 1.1 m
m) On top of this, a chromium film was formed by vapor deposition of metal chromium so that the vapor deposition thickness was about 0.1 μm. “Sonne LDS” (manufactured by Kansai Paint Co., Ltd., visible light direct-writing resist) is spray-coated on the vapor-deposited film of the glass plate to form a transparent substrate glass plate (100 × 100 × 1.1 m).
m) was coated thereon so as to have an average dry film thickness of about 5 μm, and was preheated at 60 ° C. for 10 minutes.

Then, the obtained resist layer on the glass plate was irradiated with an argon ion laser having a wavelength of 488 nm in a pattern of a black matrix to be formed by a direct drawing method, and then a 0.5% aqueous sodium carbonate solution at 25 ° C. was applied. Spray development was performed as a developer to obtain a resist pattern. Further, the obtained glass plate having a resist pattern was etched using a concentration% hydrochloric acid aqueous solution, the remaining resist layer was peeled off, and a black matrix composed of a patterned vapor deposition film was formed on the glass plate.

Then, the obtained glass plate having a patterned vapor-deposited film is immersed in an electrolytic chromium plating bath to perform electrolytic plating, and a chromium plating layer having a thickness of about 2 μm is formed on the vapor-deposited film to increase the thickness of the black matrix. I let it.

The red colored resin coating material was applied on the glass plate having the black matrix having an increased film thickness obtained as described above by a spin coating method so as to have a dry film thickness of about 2 μm. After being dried for 10 minutes, using a krypton-fluorine gas excimer laser to pass through a stencil, and irradiating a laser of a predetermined pattern under the condition that one pulse of energy density 1200 mj / cm ² becomes 4 pulses, Decompose and remove the red resin coating on the irradiated area, and line / space = 260 μm / 1
A red patterned resin film having a thickness of 00 μm was obtained.

Next, the above-mentioned blue colored resin coating material is applied on the glass plate on which the above-mentioned red patterned resin film is formed by spin coating so that the dry film thickness becomes about 2 μm, and dried at 160 ° C. for 10 minutes. After that, a krypton-fluorine gas excimer laser is used to pass through a stencil, and a laser having a predetermined pattern is irradiated under a condition that one pulse having an energy density of 1200 mj is 4 pulses, and the colored resin film at the irradiated portion is irradiated. After being decomposed and removed, a patterned colored resin film having a line / space of 260 μm / 100 μm and a blue surface was obtained.

Further, on the glass plate on which the patterned colored resin film having a blue surface was formed, film formation and laser irradiation were performed in the same manner as described above using the green colored resin coating material, and line / space = 260 μm / 100 μm
A patterned colored resin film having a green surface was obtained.

The black matrix and the three-color patterned colored resin film obtained as described above were formed.
The surface of the colored resin film on the green substrate was polished using a general-purpose polishing machine to smooth the surface of the colored resin film and to expose the black matrix and all three colored pattern surfaces. Next, the surface of the multicolored colored pattern was washed with a neutral detergent and drained and dried at 100 ° C. for 10 minutes.

As a result, a color filter was obtained in which the surface of the glass plate was completely covered with a black matrix and a coloring pattern of red, blue and green having a thickness of about 2 μm.
The line width of the black matrix pattern is 20 μm
The line width of each of the red, blue and green coloring patterns was 100 μm. The obtained multicolored pattern was smooth, fine and excellent in long-term performance.

Example 2 The procedure of Example 1 was repeated, except that the thickness of the deposited film was 1 μm, and the thickness of the black matrix was not increased by electrolytic plating. A color filter was obtained in which the surface of the glass plate was completely covered with a colored pattern having a thickness of about 2 μm.
The obtained multicolored pattern was smooth, fine and excellent in long-term performance.

Example 3 In Example 1, “Sonne LDS” was spray-coated on a glass plate as a transparent substrate to have an average dry film thickness of about 5%.
It was coated to a thickness of μm and preheated at 60 ° C. for 10 minutes. Then, the obtained resist layer on the glass plate was irradiated with an argon ion laser having a wavelength of 488 nm by a direct drawing method in a reverse pattern of the black matrix to be formed, and then a 0.5% aqueous solution of sodium carbonate at 25 ° C. was developed. Was performed to obtain a resist pattern.

Further, a nickel film is formed on the obtained glass plate having a resist pattern by vapor deposition of nickel to have a vapor deposition thickness of about 2 μm.
The resist film and the deposited film on the resist film portion were removed by immersing the resist film in a resist stripper composed of a 5% aqueous sodium hydroxide solution to form a black matrix composed of a patterned vapor deposited film on a glass plate.

A black matrix and a red matrix were prepared in the same manner as in Example 1, except that the glass plate having the patterned vapor deposition film obtained as described above was used as the glass plate having the patterned vapor deposition film. And a color filter in which the surface of the glass plate was completely covered with a colored pattern of blue and green having a thickness of about 2 μm. The obtained multicolored pattern was smooth, fine and excellent in long-term performance.

[0074]

According to the method of the present invention, a black matrix composed of a metal or metal oxide deposited film is formed on a transparent substrate, and the colored resin film formed thereon is coated with a colored resin by a laser ablation method. A method of forming a colored pattern by combining the step of forming a colored pattern by removing the film into a pattern and the step of polishing the colored resin film, in the method of the present invention, the color resin film pattern by the laser abrasion method Easy to form,
Further, the resin of the colored resin coating material used for forming the colored resin coating does not need to be a photosensitive resin, and can be selected from a wide range, and the pigment dispersibility, the long-term performance of the colored pattern, and the like can be improved. Furthermore, since a black matrix, which is generally lattice-shaped, can be formed using a metal or metal oxide by using an evaporation method, compared to a case where a black matrix resin film is formed by an abrasion method,
A black matrix can be formed in a short time.

The method of the present invention is suitable for the production of a color filter, and can stably form a fine multicolored pattern excellent in long-term performance suitable for a color filter in a small number of steps.

[Brief description of the drawings]

FIG. 1 is a model diagram showing an example of steps of a method for forming a colored pattern of the present invention.

[Explanation of symbols]

 Reference Signs List 1 transparent substrate 2 black matrix 3 first colored resin film or first colored pattern 4 second colored resin film or second colored pattern 5 third colored resin film or third colored pattern

──────────────────────────────────────────────────の Continued on front page (51) Int.Cl. ⁶ Identification code FI G03F 7/36 G03F 7/40 521 7/40 521 B41M 5/26 S

Claims (7)

[Claims] 1. A step of (1) forming a black matrix composed of a metal or metal oxide deposited film on a transparent substrate, and (2) depositing a metal film on the deposited film by electrolytic plating as required. (3) coating a colored resin coating material in which a color pigment is dispersed on a transparent substrate on which the black matrix is formed to form a colored resin film; and (4) forming the colored resin film. By the process of irradiating laser light on the coating in a pattern by laser abrasion method and removing the laser light irradiation part,
On the transparent substrate on which the patterned colored resin film is formed,
Using a colored resin coating material capable of forming a colored resin film different in color from the patterned colored resin film, the above steps (3) and (4) are performed the required number of times (including 0 times) according to the number of colors. Repeating, then, forming a colored resin film of the last different color by the step (3), and then polishing the surface of the colored resin film to smooth the surface of the colored resin film; The method of forming the pattern. 2. In the step (1), after forming a metal or metal oxide vapor-deposited film on a transparent substrate, a photoresist film is formed on the vapor-deposited film, exposed in a pattern, and developed. 2. The method according to claim 1, wherein a pattern is formed on the transparent substrate by forming a resist pattern, performing etching, and removing and removing the remaining resist film. 3. A process (1) comprising: forming a photoresist film on a transparent substrate, exposing the photoresist film in a pattern, and developing the photoresist film.
After forming the resist pattern, a metal or metal oxide is deposited on the transparent substrate on which the resist pattern is formed to form a deposited film, and then the remaining resist film is peeled and removed, and the deposited film on the resist pattern is removed. 2. The method according to claim 1, further comprising forming a black matrix on the transparent substrate by removing the film. 4. In the step (4), the position of the colored resin film to be removed by laser beam irradiation is the same as the position of the colored resin film to be subsequently coated and formed and the position of the finally formed colored pattern. A method according to any one of the preceding claims. 5. The color resin coating material has three colors of red, blue and green.
The method according to any one of claims 1 to 4, wherein the method forms three colored patterns of red, blue and green. 6. The method according to claim 1, wherein the surface of the colored resin film is polished until the surface of each multicolored pattern is exposed. 7. The method according to claim 5, wherein the transparent substrate for a liquid crystal display device is provided.
A color filter comprising a black matrix and three colored patterns formed by the method described above.