JPH11111897A - Multi-chip type semiconductor device - Google Patents
Multi-chip type semiconductor deviceInfo
- Publication number
- JPH11111897A JPH11111897A JP9270842A JP27084297A JPH11111897A JP H11111897 A JPH11111897 A JP H11111897A JP 9270842 A JP9270842 A JP 9270842A JP 27084297 A JP27084297 A JP 27084297A JP H11111897 A JPH11111897 A JP H11111897A
- Authority
- JP
- Japan
- Prior art keywords
- heat transfer
- grease
- frame
- semiconductor element
- contact
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K7/00—Constructional details common to different types of electric apparatus
- H05K7/20—Modifications to facilitate cooling, ventilating, or heating
- H05K7/2039—Modifications to facilitate cooling, ventilating, or heating characterised by the heat transfer by conduction from the heat generating element to a dissipating body
- H05K7/20436—Inner thermal coupling elements in heat dissipating housings, e.g. protrusions or depressions integrally formed in the housing
- H05K7/20445—Inner thermal coupling elements in heat dissipating housings, e.g. protrusions or depressions integrally formed in the housing the coupling element being an additional piece, e.g. thermal standoff
- H05K7/20454—Inner thermal coupling elements in heat dissipating housings, e.g. protrusions or depressions integrally formed in the housing the coupling element being an additional piece, e.g. thermal standoff with a conformable or flexible structure compensating for irregularities, e.g. cushion bags, thermal paste
Landscapes
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Abstract
(57)【要約】
【課題】高さのばらつく複数の半導体素子、もしくはチ
ップキャリアを単一伝熱体で接触冷却させ、オン・オフ
時の熱変形にも対応でき、さらに長期的信頼性を確保す
る。
【解決手段】伝熱体の接触面に枠形状の樹脂を介して平
板を付設し、さらに枠形状の樹脂,平板,伝熱体の接触
面によって形成される領域にグリースを封入し、さらに
平板にオイルを塗布してチップキャリアと密着させる。
(57) [Summary] [PROBLEMS] A plurality of semiconductor elements or chip carriers of varying heights are cooled by contact with a single heat transfer body, capable of coping with thermal deformation during ON / OFF, and further improving long-term reliability. Secure. A flat plate is provided on a contact surface of a heat transfer member via a frame-shaped resin, and grease is sealed in an area formed by the contact surface of the frame-shaped resin, the flat plate, and the heat transfer member. And apply oil to the chip carrier.
Description
【0001】[0001]
【発明の属する技術分野】本発明は複数の半導体素子、
もしくはチップキャリアを高密度に実装したマルチチッ
プ型半導体装置に関するものである。The present invention relates to a plurality of semiconductor devices,
Alternatively, the present invention relates to a multi-chip semiconductor device in which chip carriers are mounted at high density.
【0002】[0002]
【従来の技術】電子機器の高速演算,高性能化に伴い、
電子機器に用いられる半導体素子の高速演算,高密度化
が進んでいる。この結果、半導体素子の外部接続端子が
増加し、さらに半導体実装基板への高密度実装が必要と
されている。2. Description of the Related Art With high-speed operation and high performance of electronic devices,
2. Description of the Related Art High-speed operation and high-density semiconductor devices used in electronic devices are being developed. As a result, the number of external connection terminals of the semiconductor element increases, and high-density mounting on a semiconductor mounting substrate is required.
【0003】この要求に応えるべく、半導体素子、もし
くはチップキャリアの電極端子上に凸型の突起電極を突
設し、この突起電極を介して半導体素子を半導体実装基
板へ接合する方法が採用されている。In order to meet this demand, there has been adopted a method in which a protruding projection electrode is protruded on an electrode terminal of a semiconductor element or a chip carrier, and the semiconductor element is bonded to a semiconductor mounting substrate via the projection electrode. I have.
【0004】しかしながら、この方法では半導体素子と
実装基板との接触面積が小さくなるために、半導体素子
と実装基板との間の熱抵抗が増し、消費電力の大きい半
導体素子の場合、実装基板以外の放熱経路を特設する必
要があった。However, in this method, the contact area between the semiconductor element and the mounting board is reduced, so that the thermal resistance between the semiconductor element and the mounting board is increased. It was necessary to provide a special heat dissipation path.
【0005】そこで、半導体素子の背面に伝熱体、もし
くは冷却体を密着させ新たな放熱経路を作り出す方法が
考案された。しかしながら、1個の伝熱体、もしくは冷
却体を密着させる方式では、次に示す課題が見い出され
た。Therefore, a method has been devised in which a heat transfer member or a cooling member is brought into close contact with the back surface of the semiconductor element to create a new heat radiation path. However, the following problems have been found in a method in which one heat transfer body or a cooling body is brought into close contact.
【0006】先ず、半導体素子、もしくはチップキャリ
アの高さのばらつきである。電子機器では多数の半導体
素子、もしくはチップキャリアが実装されるため、凸型
の突起電極の高さばらつき、半導体素子の厚みばらつき
が原因で実装基板上に接合された半導体素子面の高さ,
傾きがばらつき、単一平面を形成することはない。その
結果、単一の伝熱体,冷却体によって冷却する場合、全
ての素子が伝熱体、もしくは冷却体に密着しない。半導
体素子の高さが低い場合、素子は十分な冷却がなされな
い。逆に半導体素子の高さが高すぎる場合、伝熱体の押
しつけによって過大の力が加わり、前記の凸型の突起電
極が変形,破壊する可能性が生じる。First, there is a variation in height of a semiconductor element or a chip carrier. Since a large number of semiconductor elements or chip carriers are mounted in electronic equipment, the height of the semiconductor element surface bonded to the mounting board due to the unevenness in the height of the projecting projection electrodes and the unevenness in the thickness of the semiconductor element,
The inclination varies and does not form a single plane. As a result, when cooling is performed by a single heat transfer element or cooling element, not all elements are in close contact with the heat transmission element or cooling element. If the height of the semiconductor device is low, the device will not be cooled sufficiently. On the other hand, if the height of the semiconductor element is too high, an excessive force is applied due to the pressing of the heat transfer body, and there is a possibility that the above-mentioned convex projection electrode is deformed or broken.
【0007】他の課題として、稼働時における半導体素
子の熱変形が考えられる。半導体素子は、オン・オフ時
に発熱によって熱変形を生じる。この際、密着する冷却
体、もしくは伝熱体が剛体の場合、半導体素子、もしく
は突起電極に、圧縮,引張りの応力が生じ、長期間の稼
働によって電極が破壊する可能性がある。As another problem, thermal deformation of the semiconductor element during operation may be considered. The semiconductor element is thermally deformed due to heat generation when it is turned on and off. At this time, if the cooling body or the heat transfer body that is in close contact is a rigid body, a compressive or tensile stress is generated in the semiconductor element or the protruding electrode, and the electrode may be broken by long-term operation.
【0008】これらの課題を解決するために各種の冷却
構造が考案された。Various cooling structures have been devised to solve these problems.
【0009】半導体素子に接する伝熱体面に凹部を設
け、その凹部内に熱伝導性と弾性を有する球状物質を充
填し、さらに熱伝導性に優れる熱硬化性樹脂を充填した
冷却構造体が特開平5−235213 号公報に開示されてい
る。この構造は、優れた熱伝導性を維持し、且つ弾性を
有する伝熱体によって、高さのばらつく半導体素子全て
と良好な密着状態を形成するものである。A cooling structure in which a concave portion is provided on the surface of a heat transfer body in contact with a semiconductor element, a spherical material having thermal conductivity and elasticity is filled in the concave portion, and a thermosetting resin excellent in thermal conductivity is further filled. It is disclosed in Kohei 5-235213. This structure maintains excellent thermal conductivity and forms a good adhesion state with all the semiconductor elements having different heights by means of a heat conductor having elasticity.
【0010】高さのばらつく半導体素子を弾性を有する
金属スポンジを介在させて、ロー材によって伝熱体に接
続した冷却構造体が特開平7−245362 号公報に開示され
ている。この構造は、金属スポンジ体がクッションとし
て作用し、半導体素子の高さばらつきをキャンセルする
ものである。Japanese Patent Application Laid-Open No. Hei 7-245362 discloses a cooling structure in which a semiconductor element having a variable height is connected to a heat transfer body by a brazing material via an elastic metal sponge. In this structure, the metal sponge acts as a cushion and cancels the height variation of the semiconductor element.
【0011】さらに、高さのばらつく半導体素子の接触
面に高熱伝導性のグリースを塗布し、グリースを介して
伝熱面に接触させる方法が一部実用化されている。この
構造は、グリースがクッションとして作用し、半導体素
子の高さばらつきをキャンセルするものである。Further, a method has been put into practical use in which grease having high thermal conductivity is applied to a contact surface of a semiconductor element having a variable height, and the grease is brought into contact with a heat transfer surface via the grease. In this structure, the grease acts as a cushion to cancel the height variation of the semiconductor element.
【0012】[0012]
【発明が解決しようとする課題】以上のように、従来構
造は冷却面、もしくは伝熱面に、熱伝導性と弾性を有す
る層を形成し、半導体素子の高さばらつきをキャンセル
し、一定の発熱量,高さばらつきに対応できるものであ
った。As described above, in the conventional structure, a layer having thermal conductivity and elasticity is formed on a cooling surface or a heat transfer surface to cancel a variation in the height of a semiconductor element and to maintain a certain level. It was able to cope with heat generation and height variations.
【0013】しかしながら、特開平5−235213 号公報の
方法では、弾性体は球状弾性体と熱硬化性樹脂から構成
される。したがって、半導体素子との接着は球状弾性体
との点接触、もしくは熱硬化性樹脂との面接触となる。
点接触は接触面積が小さく、接触熱抵抗が大きい。ま
た、熱硬化性樹脂は一般的に表面にうねり,凹凸が形成
され、同様に接触熱抵抗が大きい。その結果、接触熱抵
抗により比較的熱伝導率が低く、より高発熱の半導体素
子には適用困難である。However, in the method disclosed in Japanese Patent Application Laid-Open No. 5-235213, the elastic body is composed of a spherical elastic body and a thermosetting resin. Therefore, the bonding with the semiconductor element is in point contact with the spherical elastic body or in surface contact with the thermosetting resin.
Point contact has a small contact area and a large contact thermal resistance. Also, thermosetting resins generally have undulations and irregularities on the surface, and similarly have high contact thermal resistance. As a result, the thermal conductivity is relatively low due to the contact thermal resistance, and it is difficult to apply the present invention to a semiconductor device having a higher heat generation.
【0014】特開平7−245362 号公報の方法では、半導
体素子はロー材を介して金属スポンジ体に接着される。
したがって、接触熱抵抗はないと考えられ、良好な伝熱
特性が得られる。しかしながら、半導体素子は背面と電
極面との両面で接着されるため、稼働時,停止時の発
熱,冷却時の熱変形が拘束される。したがって、比較的
剛性の低い電極接続面側に過大の力が加わり、長期稼働
によって電極部のクリープ、もしくは破壊・破断が生じ
る可能性がある。金属スポンジは金属体に比較すれば弾
性を有するが、樹脂に比べれば剛体であり、変形吸収能
に劣るため、上記熱変形を吸収することは困難である。In the method disclosed in Japanese Patent Application Laid-Open No. 7-245362, a semiconductor element is bonded to a metal sponge body via a brazing material.
Therefore, it is considered that there is no contact thermal resistance, and good heat transfer characteristics can be obtained. However, since the semiconductor element is bonded on both the back surface and the electrode surface, heat generation during operation and stop, and thermal deformation during cooling are restricted. Therefore, an excessive force is applied to the electrode connection surface having relatively low rigidity, and there is a possibility that the electrode portion may be creeped or broken / ruptured due to long-term operation. A metal sponge has elasticity as compared with a metal body, but is rigid as compared with a resin and is inferior in deformation absorbing ability, so that it is difficult to absorb the thermal deformation.
【0015】グリースは高粘度ながらも液体であるため
接触抵抗は極めて低い。さらに、液体であるため剛性が
低く、装置の稼働時,停止時の発熱,冷却時による熱変
形にも十分対応できる。しかしながら、グリースの場合
でも以下の課題がある。通常の高熱伝導性グリースは、
高熱伝導性の微粒子、例えばAg,Cu,Al等の金属
微粒子、もしくはC,AlN,SiO2 等の非金属気粒
子を高密度にオイル中に分散したものである。オイルと
しては通常シリコン系のオイルが用いられる。Grease is a liquid having high viscosity, but has very low contact resistance. Further, since it is a liquid, it has low rigidity and can sufficiently cope with heat generation during operation and stop of the apparatus and thermal deformation due to cooling. However, grease has the following problems. Normal high thermal conductivity grease is
Fine particles having high thermal conductivity, for example, metal particles such as Ag, Cu, and Al, or non-metal gas particles such as C, AlN, and SiO 2 are dispersed in oil at high density. As the oil, a silicon-based oil is usually used.
【0016】グリースに長期間加圧、もしくは加熱・冷
却を繰り返し与えると、グリース中のオイルが蒸発、も
しくは流れ逃げ出し、グリースが変質し固化に至る場合
がある。この場合、グリースの粘性が失われ、半導体素
子の変形に対応できなくなり、さらに塗布部分に隙間が
生じ、接触抵抗が著しく増す。この状態では、半導体素
子を冷却することは困難となる。If the grease is repeatedly pressurized or heated / cooled for a long period of time, the oil in the grease may evaporate or escape, causing the grease to deteriorate and solidify. In this case, the viscosity of the grease is lost, so that the grease cannot cope with the deformation of the semiconductor element, and further, a gap is formed in an applied portion, and the contact resistance is significantly increased. In this state, it becomes difficult to cool the semiconductor element.
【0017】本発明の目的は、上記に鑑みなされたもの
であり、半導体素子の発熱量が増した場合でも、半導体
から発生する熱を十分に放熱でき、かつ半導体素子の熱
変形を吸収できる、信頼性が高い電子回路装置を有する
マルチチップ型半導体装置を提供することにある。SUMMARY OF THE INVENTION The object of the present invention has been made in view of the above, and even when the amount of heat generated by a semiconductor element is increased, heat generated from a semiconductor can be sufficiently radiated and thermal deformation of the semiconductor element can be absorbed. It is an object of the present invention to provide a multi-chip semiconductor device having a highly reliable electronic circuit device.
【0018】[0018]
【課題を解決するための手段】本発明は上記目的を達成
するために、マルチチップ型半導体装置として、以下の
構成を用いた。In order to achieve the above object, the present invention uses the following configuration as a multi-chip type semiconductor device.
【0019】半導体素子もしくはチップキャリアと接す
る伝熱体の接触面に、枠形状の樹脂を介して平板を付設
し、さらに枠形状の樹脂,平板,伝熱体の接触面によっ
て形成される領域にグリース、もしくはオイルを封入
し、さらに平板にグリース、もしくはオイルを塗布し、
半導体素子、もしくはチップキャリアと密着させる構造
とした。A flat plate is provided on the contact surface of the heat transfer body in contact with the semiconductor element or the chip carrier with a frame-shaped resin interposed therebetween, and is further provided in an area formed by the contact surface of the frame-shaped resin, the flat plate and the heat transfer body. Enclose grease or oil, apply grease or oil to the flat plate,
The structure was such that the semiconductor element or the chip carrier was in close contact with the semiconductor element.
【0020】また、他の手段として以下構成を用いた。
半導体素子もしくはチップキャリアと接する該伝熱体の
接触面に枠形状の樹脂を付設し、さらに枠形状の樹脂,
伝熱体の接触面によって形成される領域にグリース、も
しくはオイルを封入し、枠形状の樹脂およびグリース、
もしくはオイルを介して半導体素子、もしくはチップキ
ャリアと密着させる構造とした。The following configuration is used as another means.
A frame-shaped resin is provided on a contact surface of the heat transfer body in contact with a semiconductor element or a chip carrier.
Grease or oil is sealed in the area formed by the contact surfaces of the heat transfer bodies, and the frame-shaped resin and grease,
Alternatively, the structure is such that the semiconductor element or the chip carrier is brought into close contact with the semiconductor via oil.
【0021】本発明は、上記手段によって以下の作用を
生じさせ、前記課題を解決するものである。伝熱体接触
面に付設した枠形状の樹脂,平板、もしくは半導体素子
によって略密閉領域を形成し、その内部にグリース、も
しくはオイルを封入することによって、グリース中のオ
イルの逃げ出しを防止した。枠形状の樹脂は、それ自体
が剛性の低い弾性体であり、半導体素子の変形を吸収
し、さらに、オイルの逃げ出しを防止する壁となる。平
板は、半導体素子の接触面が平坦でなく、枠形状の樹脂
と良好な密着が困難な場合に用い、半導体素子の代わり
に封じ面として作用する。According to the present invention, the following effects are produced by the above-mentioned means, and the above-mentioned problems are solved. A substantially sealed area is formed by a frame-shaped resin, a flat plate, or a semiconductor element attached to the heat transfer body contact surface, and grease or oil is sealed in the inside, thereby preventing escape of oil in the grease. The frame-shaped resin itself is an elastic body having low rigidity, and serves as a wall that absorbs deformation of the semiconductor element and prevents escape of oil. The flat plate is used when the contact surface of the semiconductor element is not flat and it is difficult to make good contact with the frame-shaped resin, and acts as a sealing surface instead of the semiconductor element.
【0022】[0022]
(実施例1)本発明の一実施例を図1から図4を用いて
説明する。図1は本発明のマルチチップ型半導体装置の
斜視概略図であり、内部を説明するため、一部構成部品
をカットしている。1はチップキャリアであり、配線基
板3上に格子状に複数配置されている。31は配線基板
3の四辺に接合されているフレームである。32は配線
基板3に接続された半導体素子と連結するピンである。
2は内部に冷却材の流路22を有する伝熱体であり、上
面に冷却材の流入出口21が設けられている。伝熱体2
とフレーム31とは四辺に張り出したつば部分でボルト
締結され、モジュールを構成する。なお、ここでは液体
冷却を例に取り図示しているが、空冷の場合は伝熱体2
の代わりに放熱フィンを取り付ければよく、本発明は冷
却方法に制限されるものではない。(Embodiment 1) An embodiment of the present invention will be described with reference to FIGS. FIG. 1 is a schematic perspective view of a multi-chip type semiconductor device according to the present invention, in which some components are cut to explain the inside. Reference numeral 1 denotes a chip carrier, and a plurality of chip carriers are arranged on the wiring board 3 in a grid pattern. Reference numeral 31 denotes a frame joined to four sides of the wiring board 3. Reference numeral 32 denotes a pin connected to the semiconductor element connected to the wiring board 3.
Reference numeral 2 denotes a heat transfer body having a coolant passage 22 therein, and a coolant inflow / outlet 21 is provided on the upper surface. Heat transfer body 2
And the frame 31 are bolted together at the brim portions protruding on the four sides to form a module. Here, the liquid cooling is taken as an example, but in the case of air cooling, the heat transfer body 2 is used.
Instead, a radiation fin may be attached, and the present invention is not limited to the cooling method.
【0023】図2は詳細構造を示す縦断面図である。図
中4はチップキャリア1と配線基板3とを接続するボー
ル状の電極であり、チップキャリア1と配線基板3との
接合面には格子状に多数配列されている。通常電極4
は、はんだで構成されており、チップキャリア1内の半
導体素子と配線基板3との電気的接続を行い、さらに配
線基板3上にチップキャリア1を固定接合する役割を果
たす。FIG. 2 is a longitudinal sectional view showing the detailed structure. In the figure, reference numeral 4 denotes a ball-shaped electrode for connecting the chip carrier 1 and the wiring board 3, and a large number of electrodes are arranged in a grid on the joining surface between the chip carrier 1 and the wiring board 3. Normal electrode 4
Is made of solder, and serves to electrically connect the semiconductor elements in the chip carrier 1 to the wiring board 3 and to fix and bond the chip carrier 1 on the wiring board 3.
【0024】5は平板であり、本発明では熱伝導性に優
れ、かつ熱膨張係数の小さい窒化アルミ(AlN)を用
いた。平板5はチップキャリア1よりも一回り大きい四
角形状であり、厚みは本実施例の場合、0.3mm とし
た。6は枠形状の樹脂であり、本実施例では熱硬化・接
着性のシリコン系樹脂を用いた。本樹脂は加熱によって
硬化するものの、硬化後の剛性は低く、良好な弾性体と
なる。Reference numeral 5 denotes a flat plate. In the present invention, aluminum nitride (AlN) having excellent thermal conductivity and a small coefficient of thermal expansion was used. The flat plate 5 has a square shape slightly larger than the chip carrier 1 and has a thickness of 0.3 mm in this embodiment. Reference numeral 6 denotes a frame-shaped resin. In this embodiment, a thermosetting and adhesive silicone resin is used. Although this resin is cured by heating, the rigidity after curing is low, and it becomes a good elastic body.
【0025】樹脂6の厚みは、封入するグリースの熱伝
導率,半導体素子の発熱量,半導体素子の変形量,樹脂
の弾性率,樹脂の変形能によって決定される。本実施例
の場合、膜厚0.05mm,枠幅(線幅)が0.1mmとし
た。枠状樹脂6によって、平板5は伝熱体2に接着され
ており、枠状樹脂6を枠,平板5,伝熱体2を両面とす
る密閉空間が形成される。この密閉空間には、あらかじ
め流し込まれた高熱伝導性グリース7が封入されてい
る。本実施例の場合、銀(Ag)微粒子を多量に分散含
有するシリコン系グリースを用いた。The thickness of the resin 6 is determined by the thermal conductivity of the grease to be enclosed, the amount of heat generated by the semiconductor element, the amount of deformation of the semiconductor element, the elastic modulus of the resin, and the deformability of the resin. In the case of this embodiment, the film thickness is 0.05 mm, and the frame width (line width) is 0.1 mm. The flat plate 5 is adhered to the heat transfer body 2 by the frame-shaped resin 6, so that a closed space having the frame-shaped resin 6 as a frame and the flat plate 5 and the heat transfer body 2 on both surfaces is formed. Highly heat-conductive grease 7 poured in advance is sealed in this sealed space. In the case of this embodiment, a silicon-based grease containing a large amount of silver (Ag) fine particles dispersed therein was used.
【0026】高熱伝導性グリース7を内蔵する枠状樹脂
6は良好な熱伝導性を有したまま、樹脂の弾性によっ
て、装置起動停止時のチップキャリア1の熱変形にも十
分対応でき、良好な接触状態を形成する。The frame-shaped resin 6 containing the high thermal conductive grease 7 has good thermal conductivity, and can sufficiently cope with the thermal deformation of the chip carrier 1 at the time of starting and stopping the apparatus by the elasticity of the resin. Form a contact state.
【0027】さらに、平板5にはオイル71が塗布して
あり、そのオイル塗布面が、チップキャリア1と接触す
るため、接触熱抵抗が極めて低くできる。また、グリー
スが密閉空間に封入されているため、グリース中のオイ
ルの蒸発、もしくは流れ逃げ出しを防ぎ、グリースの固
化を長期的に防止することができる。その結果、長期的
に高い信頼性が得られる。Further, oil 71 is applied to the flat plate 5 and the oil applied surface thereof comes into contact with the chip carrier 1, so that the contact thermal resistance can be extremely low. Further, since the grease is sealed in the closed space, the oil in the grease is prevented from evaporating or escaping, and solidification of the grease can be prevented for a long time. As a result, high reliability is obtained in the long term.
【0028】次に、図3,図4によって本実施例の製造
手順を説明する。まず平板5に枠状樹脂6を被覆する。
本実施例ではペースト状の樹脂を印刷法によって平板5
に形成した。この枠状樹脂6内に、十分量の高熱伝導性
グリース7を流し込む。次いで図4に示すように伝熱体
2をのせ、適量の荷重をかけた状態で加熱する。本実施
例では、電気炉中で約150℃に1時間保持した。な
お、半導体素子の発熱量が小さい場合、高熱伝導性グリ
ース7に代えてオイルを封入してもよい。オイルとして
シリコン油を用いれば、グリースに比較して粘性が低い
ため、チップキャリア1の熱変形に敏速に対応すること
ができる。本発明では、封入材は高熱伝導性グリースで
もオイルでもよく、制限されることはない。Next, the manufacturing procedure of this embodiment will be described with reference to FIGS. First, a flat plate 5 is coated with a frame-shaped resin 6.
In this embodiment, a paste-like resin is applied to a flat plate 5 by a printing method.
Formed. A sufficient amount of high thermal conductive grease 7 is poured into the frame-shaped resin 6. Next, as shown in FIG. 4, the heat transfer body 2 is placed and heated with an appropriate load applied. In this example, the temperature was maintained at about 150 ° C. for 1 hour in an electric furnace. When the heat value of the semiconductor element is small, oil may be sealed instead of the high thermal conductive grease 7. If silicon oil is used as the oil, the viscosity is lower than that of grease, and therefore, the chip carrier 1 can respond quickly to thermal deformation. In the present invention, the encapsulant may be high thermal conductive grease or oil, and is not limited.
【0029】まず伝熱体2を乗せ荷重を加えた状態で、
熱硬化前の枠状樹脂6は伝熱体2の接触面に接し、厚み
方向に変形する。すなわちこの荷重負荷時に、固化前の
枠状樹脂6は高さのばらつくチップキャリア1の高さに
応じて変形し、その高さばらつきを解消する。この状態
で加熱すると、枠状樹脂6は固化し、同時に伝熱体2と
平板5とに接着し、グリース7を密閉する。なお、本実
施例に用いた高熱伝導性グリース7は耐熱温度が高く、
約150℃の加熱温度では変質しない。First, with the heat transfer body 2 placed thereon and a load applied thereto,
The frame-shaped resin 6 before thermosetting contacts the contact surface of the heat transfer body 2 and is deformed in the thickness direction. That is, at the time of this load application, the frame-shaped resin 6 before solidification is deformed in accordance with the height of the chip carrier 1 whose height varies, thereby eliminating the height variation. When heated in this state, the frame-shaped resin 6 solidifies, and at the same time, adheres to the heat transfer body 2 and the flat plate 5 to seal the grease 7. The high thermal conductive grease 7 used in this example has a high heat resistance temperature,
It does not change at a heating temperature of about 150 ° C.
【0030】冷却後、再び伝熱体2を取り外し、枠状樹
脂6によって付着した平板5にオイル71を塗布する。
次いで、枠状樹脂6,平板5が付着した伝熱体2と配線
基板3とをボルト締結する。なおチップキャリア1内に
付設されている半導体素子の発熱量が大きい場合、でき
るだけ熱抵抗を減らすため、オイル71に代えて高熱伝
導性グリースを塗布してもよい。After cooling, the heat transfer body 2 is removed again, and oil 71 is applied to the flat plate 5 adhered by the frame-shaped resin 6.
Next, the heat transfer body 2 to which the frame-shaped resin 6 and the flat plate 5 are adhered and the wiring board 3 are bolted. When the heat generated by the semiconductor element provided in the chip carrier 1 is large, high thermal conductive grease may be applied instead of the oil 71 in order to reduce the thermal resistance as much as possible.
【0031】(実施例2)本発明の他の実施例を図5か
ら図7を用いて説明する。図5に示すように本実施例で
は平板5がなく、枠状樹脂6,伝熱体2とチップキャリ
ア1の接触面とでグリース7の封入空間を構成する。な
お、本実施例でも用いた樹脂,高熱伝導グリースは実施
例1と同様である。(Embodiment 2) Another embodiment of the present invention will be described with reference to FIGS. As shown in FIG. 5, in the present embodiment, there is no flat plate 5, and the sealing space of the grease 7 is constituted by the frame-shaped resin 6, the heat transfer body 2 and the contact surface of the chip carrier 1. The resin and the high thermal conductive grease used in this embodiment are the same as those in the first embodiment.
【0032】製造方法を以下説明する。図6に示すよう
に、伝熱体2の接触面に枠状樹脂6を塗布する。本実施
例でも印刷法を用いた。本実施例では平板5に相当する
熱抵抗がないため、その分膜厚を増すことができ、寸法
は膜厚0.1mm,枠幅(線幅)が0.1mm とした。本実施
例では印刷後、伝熱体2を電気炉中で約150℃に1時
間保持し、枠状樹脂6を硬化させた。The manufacturing method will be described below. As shown in FIG. 6, a frame-shaped resin 6 is applied to the contact surface of the heat transfer body 2. The printing method was also used in this embodiment. In this embodiment, since there is no thermal resistance equivalent to that of the flat plate 5, the thickness can be increased accordingly, and the dimensions are set to 0.1 mm and the frame width (line width) to 0.1 mm. In this example, after printing, the heat transfer body 2 was held at about 150 ° C. for 1 hour in an electric furnace to cure the frame-shaped resin 6.
【0033】次いで伝熱体2を裏返し、枠状樹脂6内に
十分量の高熱伝導性グリース7を流し込む。次に、チッ
プキャリア1接合済の配線基板3を伝熱体2へ積み重
ね、ボルト締結によって一体化させた。なお前記実施例
1と同様に、半導体素子の発熱量が小さい場合、高熱伝
導性グリース7に代えてオイルを封入してもよい。Next, the heat transfer body 2 is turned over, and a sufficient amount of the high thermal conductive grease 7 is poured into the frame-shaped resin 6. Next, the wiring boards 3 joined to the chip carrier 1 were stacked on the heat transfer body 2 and integrated by bolting. As in the first embodiment, when the heat value of the semiconductor element is small, oil may be sealed instead of the high thermal conductive grease 7.
【0034】組立後は、チップキャリア1に枠状樹脂6
と高熱伝導性グリース7が接触する。その結果、枠状樹
脂6は厚み方向に変形し、高さのばらつくチップキャリ
ア1の高さに応じて変形し、その高さばらつきを解消す
る。また枠状樹脂6の弾性によって、装置起動停止時の
チップキャリア1の熱変形にも十分対応でき、良好な接
触状態を形成する。さらに、高熱伝導性グリース7が直
接接触するため、極めて低い接触抵抗となる。また、グ
リースが密閉空間に封入されているため、グリース中の
オイルの蒸発、もしくは流れ逃げ出しが抑制され、グリ
ースの固化を長期的に防止することができる。その結
果、長期的に高い信頼性が得られる。After the assembly, the frame-shaped resin 6
And the high thermal conductive grease 7 contacts. As a result, the frame-shaped resin 6 is deformed in the thickness direction, and is deformed according to the height of the chip carrier 1 whose height varies, thereby eliminating the height variation. Further, the elasticity of the frame-shaped resin 6 can sufficiently cope with thermal deformation of the chip carrier 1 at the time of starting and stopping the device, and forms a good contact state. Furthermore, since the high thermal conductive grease 7 comes into direct contact, the contact resistance becomes extremely low. In addition, since the grease is sealed in the closed space, evaporation or escape of the oil in the grease is suppressed, and solidification of the grease can be prevented for a long time. As a result, high reliability is obtained in the long term.
【0035】マルチチップ型半導体装置はチップキャリ
アのリペアのため、装置の開閉が不可欠である。したが
って、チップキャリア1を伝熱体2に接着することはで
きず、本実施例では枠状樹脂6とチップキャリア1は接
着されていない。したがって、高熱伝導性グリース7を
保持する空間も完全な密閉空間ではい。Opening and closing of a multi-chip type semiconductor device is indispensable for repairing a chip carrier. Therefore, the chip carrier 1 cannot be bonded to the heat transfer body 2, and the frame resin 6 and the chip carrier 1 are not bonded in this embodiment. Therefore, the space for holding the high thermal conductive grease 7 is not a completely closed space.
【0036】しかしながら、枠状樹脂6の膜厚を各チッ
プキャリアの高さばらつき以上に設定しておけば、配線
基板3と伝熱体2をボルト締結する際に枠状樹脂6は十
分な力で加圧され、枠状樹脂6とチップキャリア1との
シールは十分なものとなる。本実施例構造の場合、平板
5に相当する熱抵抗がないため、その分膜厚を増すこと
ができ、枠状樹脂6の圧縮方向のばね定数は小さくすこ
とができる。However, if the thickness of the frame-shaped resin 6 is set to be equal to or more than the height variation of each chip carrier, the frame-shaped resin 6 has a sufficient force when fastening the wiring board 3 and the heat transfer body 2 by bolts. , And the sealing between the frame-shaped resin 6 and the chip carrier 1 becomes sufficient. In the case of the structure of this embodiment, since there is no thermal resistance equivalent to the flat plate 5, the thickness can be increased by that amount, and the spring constant of the frame-shaped resin 6 in the compression direction can be reduced.
【0037】[0037]
【発明の効果】チップキャリアに高熱伝導性グリースが
直接接触するため、接触抵抗が極めて小さくなり、良好
な伝熱特性が達成できる。さらに枠形状樹脂はチップキ
ャリアと接触する面積は小さく、わずかな荷重でも十分
に変形することができる。また、枠形状樹脂と平板,伝
熱体とが密着するため、良好な密閉空間となり、封入さ
れたグリースのオイルが流れ逃げ出すことがなく、長期
的にグリースの変質,固化が抑制される。According to the present invention, since the high thermal conductive grease comes into direct contact with the chip carrier, the contact resistance becomes extremely small, and good heat transfer characteristics can be achieved. Further, the frame-shaped resin has a small area in contact with the chip carrier, and can be sufficiently deformed even with a small load. In addition, since the frame-shaped resin, the flat plate, and the heat transfer body are in close contact with each other, a good hermetically sealed space is provided, and the oil of the sealed grease does not flow out and escape, and the deterioration and solidification of the grease are suppressed for a long term.
【0038】したがって、本発明によれば高さのばらつ
く半導体素子、もしくはそのチップキャリアを単一の伝
熱体によって冷却することができ、さらにグリースの固
化を防止し、信頼性の高いマルチチップ型半導体装置を
提供することができる。Therefore, according to the present invention, a semiconductor device having a variable height or a chip carrier thereof can be cooled by a single heat conductor, and solidification of grease can be prevented, and a highly reliable multi-chip type. A semiconductor device can be provided.
【図1】本発明の一実施例であるマルチチップ型半導体
装置の一部カットを含む概略斜視図。FIG. 1 is a schematic perspective view including a partial cut of a multi-chip type semiconductor device according to an embodiment of the present invention.
【図2】図1の一部を示す縦断面図。FIG. 2 is a longitudinal sectional view showing a part of FIG. 1;
【図3】図1のマルチチップ型半導体装置の製造組立手
順を示す概略図。FIG. 3 is a schematic diagram showing a manufacturing and assembling procedure of the multi-chip semiconductor device of FIG. 1;
【図4】図1のマルチチップ型半導体装置の縦断面図。FIG. 4 is a longitudinal sectional view of the multi-chip semiconductor device of FIG. 1;
【図5】本発明の他の実施例であるマルチチップ型半導
体装置の一部を示す縦断面図。FIG. 5 is a longitudinal sectional view showing a part of a multi-chip type semiconductor device according to another embodiment of the present invention.
【図6】本発明の他の実施例であるマルチチップ型半導
体装置の製造組立手順を示す伝熱体の概略斜視図。FIG. 6 is a schematic perspective view of a heat transfer body showing a manufacturing and assembling procedure of a multi-chip type semiconductor device according to another embodiment of the present invention.
【図7】本発明の他の実施例であるマルチチップ型半導
体装置の縦断面図。FIG. 7 is a longitudinal sectional view of a multi-chip type semiconductor device according to another embodiment of the present invention.
1…チップキャリア、2…伝熱体、3…配線基板、4…
電極、5…平板、6…枠状樹脂、7…高熱伝導性グリー
ス、31…フレーム、32…ピン、71…オイル。DESCRIPTION OF SYMBOLS 1 ... Chip carrier, 2 ... Heat transfer body, 3 ... Wiring board, 4 ...
Electrodes, 5: flat plate, 6: frame resin, 7: high thermal conductive grease, 31: frame, 32: pin, 71: oil.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 中島 忠克 茨城県土浦市神立町502番地 株式会社日 立製作所機械研究所内 ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Tadakatsu Nakajima 502 Kandachicho, Tsuchiura-shi, Ibaraki Pref.
Claims (1)
を複数個搭載した基板と、該半導体素子、もしくはチッ
プキャリアと接する伝熱体を有するマルチチップ型半導
体装置において、半導体素子もしくはチップキャリアと
接する伝熱体の接触面に、枠形状の樹脂を介して平板が
付設されており、該枠形状の樹脂,平板,伝熱体の接触
面によって形成される領域にグリース、もしくはオイル
が封入されており、さらに該平板がグリース、もしくは
オイルを介して半導体素子、もしくはチップキャリアと
接触することを特徴とするマルチチップ型半導体装置。1. A multi-chip type semiconductor device having a semiconductor element or a substrate on which a plurality of chip carriers are mounted, and a heat conductor in contact with the semiconductor element or the chip carrier. A flat plate is attached to the contact surface of the body via a frame-shaped resin, and grease or oil is sealed in a region formed by the contact surface of the frame-shaped resin, the flat plate, and the heat transfer body. Further, the multi-chip type semiconductor device is characterized in that the flat plate is in contact with a semiconductor element or a chip carrier via grease or oil.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9270842A JPH11111897A (en) | 1997-10-03 | 1997-10-03 | Multi-chip type semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9270842A JPH11111897A (en) | 1997-10-03 | 1997-10-03 | Multi-chip type semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH11111897A true JPH11111897A (en) | 1999-04-23 |
Family
ID=17491766
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9270842A Pending JPH11111897A (en) | 1997-10-03 | 1997-10-03 | Multi-chip type semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11111897A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6614197B2 (en) | 2001-06-30 | 2003-09-02 | Motorola, Inc. | Odd harmonics reduction of phase angle controlled loads |
| JP2008004745A (en) * | 2006-06-22 | 2008-01-10 | Denso Corp | Electronic equipment |
| JP2011071550A (en) * | 2010-12-21 | 2011-04-07 | Denso Corp | Electronic apparatus |
| JP2013046016A (en) * | 2011-08-26 | 2013-03-04 | Mitsubishi Electric Corp | Semiconductor device and manufacturing method of the same |
| JPWO2022113921A1 (en) * | 2020-11-25 | 2022-06-02 | ||
| JPWO2022202487A1 (en) * | 2021-03-25 | 2022-09-29 |
-
1997
- 1997-10-03 JP JP9270842A patent/JPH11111897A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6614197B2 (en) | 2001-06-30 | 2003-09-02 | Motorola, Inc. | Odd harmonics reduction of phase angle controlled loads |
| JP2008004745A (en) * | 2006-06-22 | 2008-01-10 | Denso Corp | Electronic equipment |
| JP2011071550A (en) * | 2010-12-21 | 2011-04-07 | Denso Corp | Electronic apparatus |
| JP2013046016A (en) * | 2011-08-26 | 2013-03-04 | Mitsubishi Electric Corp | Semiconductor device and manufacturing method of the same |
| US11088045B2 (en) | 2011-08-26 | 2021-08-10 | Mitsubishi Electric Corporation | Semiconductor device having a cooling body with a groove |
| JPWO2022113921A1 (en) * | 2020-11-25 | 2022-06-02 | ||
| WO2022113921A1 (en) * | 2020-11-25 | 2022-06-02 | 信越化学工業株式会社 | Semiconductor package and method for manufacturing same |
| JPWO2022202487A1 (en) * | 2021-03-25 | 2022-09-29 | ||
| WO2022202487A1 (en) * | 2021-03-25 | 2022-09-29 | ソニーセミコンダクタソリューションズ株式会社 | Semiconductor device, semiconductor device manufacturing method, and electronic apparatus |
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