JPH1111984A - Water-repellent glass and its production - Google Patents
Water-repellent glass and its productionInfo
- Publication number
- JPH1111984A JPH1111984A JP17251297A JP17251297A JPH1111984A JP H1111984 A JPH1111984 A JP H1111984A JP 17251297 A JP17251297 A JP 17251297A JP 17251297 A JP17251297 A JP 17251297A JP H1111984 A JPH1111984 A JP H1111984A
- Authority
- JP
- Japan
- Prior art keywords
- water
- glass
- repellent
- repellent layer
- groups
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000005871 repellent Substances 0.000 title claims abstract description 92
- 239000011521 glass Substances 0.000 title claims abstract description 75
- 238000004519 manufacturing process Methods 0.000 title claims description 14
- 238000000576 coating method Methods 0.000 claims abstract description 37
- 239000011248 coating agent Substances 0.000 claims abstract description 33
- 229910000077 silane Inorganic materials 0.000 claims abstract description 18
- 239000007788 liquid Substances 0.000 claims abstract description 13
- 125000003709 fluoroalkyl group Chemical group 0.000 claims abstract description 12
- 239000000758 substrate Substances 0.000 claims abstract description 11
- 239000010409 thin film Substances 0.000 claims abstract description 11
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 10
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 5
- 239000011737 fluorine Substances 0.000 claims abstract description 5
- 239000010408 film Substances 0.000 claims description 29
- -1 silane compound Chemical class 0.000 claims description 14
- 230000000415 inactivating effect Effects 0.000 claims description 7
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 4
- 229910044991 metal oxide Inorganic materials 0.000 claims description 4
- 150000004706 metal oxides Chemical class 0.000 claims description 4
- 230000003301 hydrolyzing effect Effects 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 42
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 abstract description 30
- 239000002904 solvent Substances 0.000 abstract description 19
- 239000003377 acid catalyst Substances 0.000 abstract description 11
- 238000007865 diluting Methods 0.000 abstract description 8
- 239000005329 float glass Substances 0.000 abstract description 8
- 238000006243 chemical reaction Methods 0.000 abstract description 6
- 229910017604 nitric acid Inorganic materials 0.000 abstract description 5
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 abstract description 3
- 239000005357 flat glass Substances 0.000 abstract description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract 4
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 abstract 1
- 238000009833 condensation Methods 0.000 abstract 1
- 230000005494 condensation Effects 0.000 abstract 1
- XQSFXFQDJCDXDT-UHFFFAOYSA-N hydroxysilicon Chemical group [Si]O XQSFXFQDJCDXDT-UHFFFAOYSA-N 0.000 abstract 1
- 229960004592 isopropanol Drugs 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 32
- 238000000034 method Methods 0.000 description 15
- 230000002940 repellent Effects 0.000 description 11
- 125000005372 silanol group Chemical group 0.000 description 11
- 238000012360 testing method Methods 0.000 description 11
- 238000010306 acid treatment Methods 0.000 description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- 238000005299 abrasion Methods 0.000 description 7
- 230000001476 alcoholic effect Effects 0.000 description 7
- 238000001035 drying Methods 0.000 description 7
- 239000002808 molecular sieve Substances 0.000 description 7
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical group [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 6
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 6
- 238000006460 hydrolysis reaction Methods 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 239000012024 dehydrating agents Substances 0.000 description 5
- 230000018044 dehydration Effects 0.000 description 5
- 238000006297 dehydration reaction Methods 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 239000007858 starting material Substances 0.000 description 5
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000005755 formation reaction Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000005498 polishing Methods 0.000 description 4
- 239000005051 trimethylchlorosilane Substances 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 230000002779 inactivation Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000012643 polycondensation polymerization Methods 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- 235000011054 acetic acid Nutrition 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910001415 sodium ion Inorganic materials 0.000 description 2
- 238000006227 trimethylsilylation reaction Methods 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- 229910008051 Si-OH Inorganic materials 0.000 description 1
- 229910006358 Si—OH Inorganic materials 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 235000011148 calcium chloride Nutrition 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005443 coulometric titration Methods 0.000 description 1
- 230000009849 deactivation Effects 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000007730 finishing process Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000005340 laminated glass Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000006058 strengthened glass Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 239000005341 toughened glass Substances 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
- C03C17/30—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、建築用、自動車用
等の窓材、さらには船舶や航空機の窓材などの種々の分
野の各種ガラス物品において用いられる撥水性ガラス及
びその製造方法を提供するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention provides a water-repellent glass used in various glass articles in various fields such as window materials for buildings and automobiles, and window materials for ships and aircrafts, and a method for producing the same. Is what you do.
【0002】[0002]
【従来の技術】最近、撥水性能をより長く持続する高耐
久性撥水性ガラスが望まれている。この高耐久性を有す
る撥水ガラス及びその製造方法については、例えば本出
願人が出願している、特開平6ー16455号には、ガ
ラス表面に凸凹形状を有するシリカベース膜を設ける方
法が、また特願平8ー1315951号には、ガラス基
板を90〜200℃の高温に保持した状態で撥水層を形
成する方法が、特願平8ー333329号には、ガラス
表面をセリア研磨及び酸処理し、調温調湿した環境下で
撥水層を形成する方法が有効であること等が提案されて
いる。2. Description of the Related Art Recently, a highly durable water-repellent glass having a long water-repellent performance has been desired. Regarding this highly durable water-repellent glass and a method for producing the same, for example, Japanese Patent Application Laid-Open No. Hei 6-16455 filed by the present applicant discloses a method of providing a silica base film having an irregular shape on the glass surface. Japanese Patent Application No. 8-131595 discloses a method of forming a water-repellent layer while keeping a glass substrate at a high temperature of 90 to 200 ° C. Japanese Patent Application No. 8-333329 discloses a method of polishing a glass surface with ceria. It has been proposed that a method of forming a water-repellent layer in an environment treated with an acid and controlling the temperature and humidity is effective.
【0003】また、ガラス表面を不活性化する方法につ
いては、例えば特開平7ー109131号には、加熱軟
化したガラスをプレス成形してガラス製品を製造する場
合に、ガラス表面に存在する一部又は全部のシラノール
基の水素原子を不活性基で置換したガラスを用いること
により、成形型の寿命を延ばす製造方法が知られてい
る。[0003] As for a method of inactivating a glass surface, for example, Japanese Patent Application Laid-Open No. 7-109131 discloses a method of press-molding heat-softened glass to produce a glass product. Alternatively, there is known a production method for extending the life of a mold by using glass in which hydrogen atoms of all silanol groups are substituted with inert groups.
【0004】[0004]
【発明が解決しようとする課題】上記従来の撥水性ガラ
スに関しては、その仕上げ工程において、撥水層が形成
されたガラス表面をアルコール性溶媒(例えば、イソプ
ロピルアルコール等)で仕上げ拭きを行う方法が一般に
採用されているが、その仕上げ拭き後の得られたガラス
は、耐光性及び耐磨耗性等の品質にバラツキが生じ問題
になっている。With respect to the above-mentioned conventional water-repellent glass, a method of finishing and wiping the glass surface on which the water-repellent layer is formed with an alcoholic solvent (for example, isopropyl alcohol) in the finishing step. Although generally used, the glass obtained after the final wiping has a problem in that quality such as light resistance and abrasion resistance varies.
【0005】[0005]
【課題を解決するための手段】本発明は、従来のかかる
課題に鑑みてなしたものであって、上記従来の仕上げ工
程における仕上げ拭き後の品質のバラツキの原因を種々
追求した結果、仕上げ工程前の撥水層は、室温〜約35
0℃のキュアリング処理を施すものの、該撥水層中には
ガラス表面や撥水剤成分との反応等に与からなかった未
反応基であるシラノール基(Si-OH)が多く残存して
おり、この未反応基が仕上げ工程の仕上げ拭きで用いる
アルコール性溶媒(例えば、イソプロピルアルコール
等)と反応し、該残存未反応基の存在の程度により、仕
上げ工程後の撥水性ガラスの品質がばらつくことが判明
した。SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems, and has been made in pursuit of various causes of quality variations after finish wiping in the above-mentioned conventional finishing process. The previous water-repellent layer is between room temperature and about 35
Although a curing treatment at 0 ° C. is performed, a large amount of unreacted silanol groups (Si—OH) which have not been added to the reaction with the glass surface or the water repellent component remain in the water repellent layer. The unreacted groups react with an alcoholic solvent (eg, isopropyl alcohol) used in the finish wiping in the finishing step, and the quality of the water-repellent glass after the finishing step varies depending on the degree of the remaining unreacted groups. It has been found.
【0006】本発明は、ガラス表面に形成した撥水層に
おいて、弗素を含有するシラン化合物を被覆し未反応基
を不活性化させた薄膜よりなる撥水性ガラス及びその製
造方法であって、この不活性化により、仕上げ工程でア
ルコール拭きを行っても、撥水性ガラスの品質がばらつ
くことはなく、安定した優れた品質の撥水性ガラスを容
易に得ることが出来るものである。The present invention relates to a water-repellent glass comprising a thin film in which a fluorine-containing silane compound is coated on a water-repellent layer formed on a glass surface to inactivate unreacted groups, and a method for producing the same. Due to the deactivation, the quality of the water-repellent glass does not vary even if the alcohol is wiped in the finishing step, and a stable and excellent quality water-repellent glass can be easily obtained.
【0007】すなわち、本発明は、ガラス表面に形成し
た撥水層が、弗素を含有するシラン化合物を被覆し未反
応基を不活性化させた薄膜である撥水性ガラスである。
撥水層は、ガラス表面にシロキサン結合によりフルオロ
アルキル基が固定化されてなるものが最適である。That is, the present invention is a water-repellent glass in which the water-repellent layer formed on the glass surface is a thin film in which unreacted groups are inactivated by coating a fluorine-containing silane compound.
The water-repellent layer is most preferably formed by fixing a fluoroalkyl group to the glass surface by a siloxane bond.
【0008】撥水膜は、金属酸化物膜よりなる下地層の
上部に形成されたものが好ましい。金属酸化物よりなる
下地層は、SiO2あるいはTiO2で形成されてなるも
のが好ましい。The water-repellent film is preferably formed on a base layer made of a metal oxide film. The underlayer made of a metal oxide is preferably formed of SiO 2 or TiO 2 .
【0009】また本発明は、フルオロアルキル基を含有
するシラン化合物を加水分解ならびに脱水縮重合させ成
分をガラス表面に塗布して形成した撥水層において、該
撥水層をシリル化剤を溶媒中に含有する処理液にて処理
することにより、撥水層中の未反応基を不活性化させる
ことを特徴とする撥水性ガラスの製造方法に関する。The present invention also provides a water-repellent layer formed by applying a component to a glass surface by subjecting a silane compound containing a fluoroalkyl group to hydrolysis and dehydration-condensation polymerization. The present invention relates to a method for producing a water-repellent glass, characterized by inactivating unreacted groups in a water-repellent layer by treating with a treatment liquid contained in the water-repellent layer.
【0010】該処理液中のシリル化剤の濃度は、1〜2
0wt%が好ましい。シリル化剤の溶媒は、非アルコール
性のものが好ましい。さらに、ガラス表面を改質した後
に撥水層を形成し、該処理液にて処理することが好まし
い。[0010] The concentration of the silylating agent in the treatment solution is from 1 to 2
0 wt% is preferred. The solvent for the silylating agent is preferably non-alcoholic. Furthermore, it is preferable to form a water-repellent layer after modifying the glass surface, and to treat with the treatment liquid.
【0011】表面改質する方法としては、セリア研磨及
び酸処理が適する。As a method of surface modification, ceria polishing and acid treatment are suitable.
【0012】[0012]
【発明の実施の形態】ガラス表面に形成した撥水層が、
弗素を含有するシラン化合物を被覆し未反応基を不活性
化させた薄膜よりなる撥水性ガラスは次のようにして得
る。BEST MODE FOR CARRYING OUT THE INVENTION A water-repellent layer formed on a glass surface
A water-repellent glass composed of a thin film coated with a fluorine-containing silane compound and inactivating unreacted groups can be obtained as follows.
【0013】撥水層用塗布液を調製する際、フルオロア
ルキル基含有シラン化合物を用い、フルオロアルキル基
含有シラン化合物の加水分解反応を終結した後、撥水層
用塗布液中の含有水分量を調製し、縮重合度を制御した
撥水層用塗布液を調製し、該調製済み撥水層用塗布液を
ガラス基板の表面上に調温調湿するなかで塗布し、室温
〜約350℃以下で1分間乃至60分間の乾燥とキュア
リングを行い、撥水層を形成したのち、ガラスをシリル
化剤を溶媒中に含有する処理液にて処理し、撥水層中の
未反応基を不活性化させる。In preparing the coating solution for the water-repellent layer, a hydroalkyl group-containing silane compound is used to terminate the hydrolysis reaction of the silane compound containing the fluoroalkyl group. Preparing, preparing a coating solution for the water-repellent layer having a controlled degree of polycondensation, applying the prepared coating solution for the water-repellent layer on the surface of the glass substrate while controlling the temperature and humidity, and room temperature to about 350 ° C. After drying and curing for 1 minute to 60 minutes below to form a water repellent layer, the glass is treated with a treatment liquid containing a silylating agent in a solvent to remove unreacted groups in the water repellent layer. Inactivate.
【0014】前記ガラス基板としては、建築用窓ガラス
や自動車用窓ガラス等に使用されているフロ−トガラス
等各種無機質の透明性がある板ガラスが好ましく、無色
または着色、あるいは任意ののものでもよい。また、シ
リカなどの薄膜面をもつものや他の機能性膜や別面にも
つものでもよい。形状は特に限定されるものではなく、
曲げ板ガラスはもちろん、各種強化ガラスや強度アップ
ガラスを平板や単板で使用できるとともに、複層ガラス
あるいは合せガラスとしても使用できる。The glass substrate is preferably a glass plate having various inorganic transparency such as float glass used for architectural window glass or automotive window glass, and may be colorless or colored, or an arbitrary one. . Further, a film having a thin film surface such as silica, another functional film, or a film having another surface may be used. The shape is not particularly limited,
Not only bent glass but also various tempered glass and strengthened glass can be used as a flat plate or a single plate, and can also be used as a double glazing or a laminated glass.
【0015】フルオロアルキル基含有シラン化合物とし
ては、フルオロアルキルアルコキシシラン系化合物(以
下、FAS という)等が挙げられる。フルオロアルキルア
ルコキシシラン系化合物としては、例えばCF3CH2CH2Si
(OMe)3 、CF3(CF2)5CH2CH2Si(OMe)3 、CF3(CF2)7CH2CH2
Si(OMe)3 、CF3(CF2)9CH2CH2Si(OMe)3、 CF3(CF2)11CH 2
CH2Si(OMe)3、 CF3(CF2)7CH2CH2SiMe(OMe)2 等が挙げら
れる。As a silane compound containing a fluoroalkyl group,
Are fluoroalkylalkoxysilane-based compounds (hereinafter
Below, referred to as FAS). Fluoroalkylua
Lucoxysilane-based compounds include, for example, CF3CHTwoCHTwoSi
(OMe)Three , CFThree(CFTwo)FiveCHTwoCHTwoSi (OMe)Three , CFThree(CFTwo)7CHTwoCHTwo
Si (OMe)Three , CFThree(CFTwo)9CHTwoCHTwoSi (OMe)3, CFThree(CFTwo)11CH Two
CHTwoSi (OMe)3, CFThree(CFTwo)7CHTwoCHTwoSiMe (OMe)Two Etc.
It is.
【0016】なお、フルオロアルキル基含有シラン化合
物として一般的に分類される、フルオロイソシアネート
シラン系化合物もしくはフルオロアルキルハロゲン化シ
ラン系化合物などの、加水分解を必要とせずにガラス表
面のシラノール基と充分に反応してシロキサン結合を形
成できるものでは、加水分解および縮重合反応の制御を
しなくとも撥水膜用塗布液として充分に使用可能であ
る。The silanol group on the glass surface can be sufficiently converted without requiring hydrolysis, such as a fluoroisocyanate silane compound or a fluoroalkyl halide silane compound, which is generally classified as a fluoroalkyl group-containing silane compound. Those which can form a siloxane bond by reaction can be sufficiently used as a coating solution for a water-repellent film without controlling the hydrolysis and condensation polymerization reactions.
【0017】また、希釈溶媒としては、イソプロピルア
ルコ−ル(以下、i-PAと略す)の他に、メタノ−ル、エ
タノ−ルなど炭素数が5以下の低級アルコ−ル溶媒であ
ってもよく、アルコ−ル以外にエ−テル類やケトン類を
用いることができ、ことにイソプロピルアルコールを主
成分としてなるアルコールがコ−ティング溶液の調製に
おける希釈溶媒として好ましい。As a diluting solvent, in addition to isopropyl alcohol (hereinafter abbreviated as i-PA), a lower alcohol solvent having 5 or less carbon atoms such as methanol and ethanol may be used. In addition, ethers and ketones can be used in addition to alcohol, and alcohol containing isopropyl alcohol as a main component is preferable as a diluting solvent in preparing a coating solution.
【0018】また、該フルオロアルキル基含有シラン化
合物を加水分解するための酸触媒としては、0.01N 以
上、好ましくは0.1N〜13N 程度の濃度の硝酸以外に、酢
酸などの有機酸、塩酸、硫酸等でもよい。肝心なこと
は、酸触媒からの水分量であって、その水分量は酸触媒
中の酸濃度と、酸触媒自体の量によって決まる。Examples of the acid catalyst for hydrolyzing the fluoroalkyl group-containing silane compound include nitric acid having a concentration of 0.01N or more, preferably about 0.1N to 13N, organic acids such as acetic acid, hydrochloric acid, and sulfuric acid. And so on. What is important is the amount of water from the acid catalyst, and the amount of water is determined by the acid concentration in the acid catalyst and the amount of the acid catalyst itself.
【0019】また、撥水膜用塗布液としては、g表示
で、出発原料量:希釈溶媒量:酸触媒からの水分量=
1:5〜50:0.09〜1.0 の割合で成る組成が好まし
い。すなわち、出発原料としてフルオロアルキル基含有
シラン化合物(以下、FASと略す)、希釈溶媒としてi-P
A、酸触媒として0.1N-HNO3 を用い、撥水膜用塗布液がF
AS :i-PA:0.1N-HNO3 からの水分量=1:5〜50:0.3
(g=表示)、脱水剤がモレキュラ−シ−ブ4A(脱
水時間:2〜24h、浸漬量:5g)、塗布環境が室温で
55%RH以下の湿度の条件下で塗布液を調製し被膜を形成
した。The coating liquid for the water-repellent film is expressed in g, starting material amount: diluting solvent amount: water content from acid catalyst =
Compositions having a ratio of 1: 5 to 50: 0.09 to 1.0 are preferred. That is, a fluoroalkyl group-containing silane compound (hereinafter abbreviated as FAS) as a starting material and iP as a diluting solvent
A, 0.1N-HNO 3 is used as the acid catalyst, and the coating solution for the water-repellent film is F
AS: i-PA: moisture content of from 0.1N-HNO 3 = 1: 5~50 : 0.3
(G = indicated), dehydrating agent is molecular sieve 4A (dehydration time: 2 to 24 h, dipping amount: 5 g), and coating environment is room temperature
A coating solution was prepared under conditions of a humidity of 55% RH or less to form a film.
【0020】さらに、撥水膜用塗布液中の含有水分量の
調整については、出発原料としてFAS 、希釈溶媒として
i-PA、酸触媒として0.1N-HNO3 を用い、撥水膜用塗布液
がFAS :i-PA:0.1N-HNO3 からの水分量=1:25:0.3
(g=表示)、脱水剤の種類(モレキュラ−シ−ブ4A
と3A)および量(1g、2.5 g、5g)と脱水時間
(h )後の水分量(ppm )の経時変化を求めた結果、ト
ラバ−ス摺動回数3,500回後の接触角が約95°以上とな
るものは、脱水時間1〜2h以上で水分量が約4000ppm
以下、好ましくは水分量が約3000ppm 以下、より好まし
くは水分量が約2000ppm 以下である。また、脱水剤とし
ては、例えばモレキュラ−シ−ブ、塩化カルシウム、硫
酸マグネシウム、硫酸ナトリウム等である。Further, regarding the adjustment of the water content in the coating solution for the water-repellent film, FAS was used as a starting material, and
i-PA, using 0.1N-HNO 3 as an acid catalyst, and the coating solution for the water-repellent film is FAS: i-PA: water content from 0.1N-HNO 3 = 1: 25: 0.3
(G = display), type of dehydrating agent (Molecular sieve 4A)
And 3A), the amount (1 g, 2.5 g, 5 g) and the amount of water (ppm) after dehydration time (h) were determined over time. As a result, the contact angle was about 95 ° after 3,500 traverse sliding operations. If the above is the dehydration time is 1-2h or more, the water content is about 4000ppm
The water content is preferably about 3000 ppm or less, more preferably about 2000 ppm or less. Examples of the dehydrating agent include molecular sieve, calcium chloride, magnesium sulfate and sodium sulfate.
【0021】なお、撥水膜用塗布液中の含有水分量は、
カ−ルフィッシャ−電量滴定法を用いることによって測
定し求めた。なお、シラノ−ル基の存在は水分量として
測定される。The water content in the coating solution for the water-repellent film is as follows:
It was determined by using a Karl Fisher coulometric titration method. The presence of the silanol group is measured as a water content.
【0022】さらに、調製済撥水膜用塗布液をガラス基
板の表面上に調温調湿するなかで塗布する。出発原料と
してFAS 、希釈溶媒としてi-PA、酸触媒として0.1N-HNO
3 を用い、撥水膜用塗布液がFAS :i-PA:0.1N-HNO3 か
らの水分量=1:25:0.3 (g=表示)、脱水剤がモレ
キュラ−シ−ブ4A(脱水時間:16h、浸漬量:5 g)
の条件下で塗布液を調製した。塗布環境が室温で15%RH
〜>90%RHの湿度の条件下で塗布液の被膜を形成した。
約140 ℃で約5分間の乾燥とキュアリングを行った後、
摺動回数3,500 回での接触角(°)を求め耐トラバ−ス
性能を評価し、撥水膜用塗布液の被覆時における、雰囲
気湿度(%RH)と耐トラバ−ス性能への影響を調べた。
雰囲気湿度が約80%RH程度でも、トラバ−ス摺動回数3,
500 回後の接触角が80°以上で101 °以下程度のものも
あって、雰囲気湿度が70〜80%RHでも場合によってはよ
いものの、確実には約75%RH程度以下とし、好ましくは
雰囲気湿度が約60%RH程度以下、より好ましくは約60%
RH以下15%RH以上程度、最適には約55%RH以下15%RH以
上程度とする。Further, the prepared coating solution for the water-repellent film is applied on the surface of the glass substrate while controlling the temperature and humidity. FAS as starting material, i-PA as diluting solvent, 0.1N-HNO as acid catalyst
3 , the water-repellent coating liquid was FAS: i-PA: 0.1N-HNO3, the amount of water from 1: 3 : 25 (0.3 g), and the dehydrating agent was molecular sieve 4A (dehydration time). : 16h, immersion amount: 5g)
A coating solution was prepared under the following conditions. 15% RH at room temperature
A coating film of the coating solution was formed under the condition of humidity of 90> 90% RH.
After drying and curing at about 140 ° C for about 5 minutes,
Determine the contact angle (°) at 3,500 times of sliding and evaluate the traverse resistance, and evaluate the influence on the ambient humidity (% RH) and traverse resistance when coating with the coating solution for water-repellent film. Examined.
Even when the atmospheric humidity is about 80% RH,
Some contact angles after 500 times are 80 ° or more and 101 ° or less, and even if the atmospheric humidity is 70 to 80% RH, it may be good in some cases, but it is surely about 75% RH or less. Humidity less than about 60% RH, more preferably about 60% RH
It should be about 15% RH or less, preferably about 55% RH or less and about 15% RH or less.
【0023】さらに、ガラス基板の表面状態の適否につ
いて調べた。出発原料としてFAS 、希釈溶媒としてi-P
A、酸触媒として0.1N-HNO3 を用い、撥水膜用塗布液がF
AS :i-PA:0.1N-HNO3 からの水分量=1:25:0.3
(g=表示)、脱水剤がモレキュラ−シ−ブ4A(浸漬
量:5g)、脱水条件が室温で約24時間浸漬後NO.7濾紙
で濾過、塗布環境が室温で45%RHの湿度、合紙による焼
け等のないものとした。撥水膜用塗布液を被覆後、中型
熱風循環炉(板温約140 ℃、昇温5分間、キ−プ5分
間)でキュアリングした条件下で、フロ−トガラスのト
ップ面(水洗浄のみ)とボトム面(セリア研磨と水洗
浄)に成膜処理し、耐光性試験(後述する実施例1を参
照)におけるS-UV照射時間(h)と接触角(°)の関係
を評価し、フロ−トガラスのトップ面とボトム面におけ
るS-UV照射時間への影響を求めた。その結果、S-UV照射
時間約600 時間(h )においてトップ面では約70°であ
るのに対しボトム面では約50°程度であってフロ−トガ
ラスのトップ面とボトム面において明らかに差異があ
り、フロ−トガラスの火造り面であるトップ面に被覆す
ることがよい。Further, the suitability of the surface condition of the glass substrate was examined. FAS as starting material, iP as diluting solvent
A, 0.1N-HNO 3 is used as the acid catalyst, and the coating solution for the water-repellent film is F
AS: i-PA: moisture content of from 0.1N-HNO 3 = 1: 25 : 0.3
(G = display), the dehydrating agent is molecular sieve 4A (immersion amount: 5 g), the dehydrating condition is immersion for about 24 hours at room temperature, and then filtered with NO.7 filter paper. It was assumed that there was no burn due to interleaving paper. After coating with the coating solution for the water-repellent film, the top surface of the float glass (water washing only) was cured under the conditions of curing in a medium-sized hot air circulation furnace (plate temperature: about 140 ° C, temperature rise: 5 minutes, keeping: 5 minutes). ) And film formation on the bottom surface (ceria polishing and water washing), and evaluated the relationship between the S-UV irradiation time (h) and the contact angle (°) in a light resistance test (see Example 1 described later). The influence on the S-UV irradiation time on the top and bottom surfaces of the float glass was determined. As a result, at the S-UV irradiation time of about 600 hours (h), the top face was about 70 °, while the bottom face was about 50 °, and there was a clear difference between the top and bottom faces of the float glass. Yes, it is preferable to cover the top surface of the float glass, which is the fire-making surface.
【0024】さらに一方、摺動回数3,500 回後での接触
角θ(°)を求めた結果、フロ−トガラスのトップ面で
は接触角が>100 °であり、ボトム面では50〜100 °と
なった。よってフロ−トガラスのトップ面に被覆するこ
とがよい。On the other hand, when the contact angle θ (°) after 3,500 sliding times was determined, the contact angle was> 100 ° on the top surface of the float glass, and 50-100 ° on the bottom surface. Was. Therefore, it is preferable to coat the top surface of the float glass.
【0025】なお、トップ面とボトム面についても、合
紙焼けがなく、しかもセリアやアルミナを研磨材とする
ブラシやスポンジによる研磨、さらに水洗浄等を充分行
うことで接触角が>100 °を確保できる。The top surface and the bottom surface are also free from burnt interleaving paper, and are sufficiently polished with a brush or sponge made of ceria or alumina as an abrasive, and then sufficiently washed with water to achieve a contact angle of> 100 °. Can be secured.
【0026】またさらに、ガラス基板への撥水層の膜付
け法としては、手塗り、ノズルフロ−コ−ト法、ディッ
ピング法、スプレー法、リバ−スコ−ト法、フレキソ
法、印刷法、フローコート法あるいはスピンコート法、
ならびにそれらの併用等既知の塗布手段を適宜採用し得
るものである。Further, as a method of forming a water-repellent layer on a glass substrate, there are a hand coating method, a nozzle flow coating method, a dipping method, a spray method, a reverse coating method, a flexo method, a printing method, and a flow method. Coating method or spin coating method,
In addition, known coating means such as a combination thereof can be appropriately employed.
【0027】また、ガラス表面にシロキサン結合により
フルオロアルキル基を固定化するには、前記研磨処理し
たガラス面を、塩酸、硫酸もしくは硝酸等の無機酸ある
いは酢酸、ギ酸もしくは蓚酸等の有機酸をPH4濃度以下
になるよう添加調製した水溶液でなる酸処理液を用い、
該酸処理液の温度が5℃〜70℃以下、処理時間が10
〜600秒の条件下で酸処理することで、研磨処理ガラ
ス表面のナトリウムイオンの抽出やシロキサン結合の切
断により、シラノール基を効率的に生成するようにし、
該シラノール基が後工程の撥水処理において撥水性フル
オロアルキル基の固定化に寄与するものとすることが好
ましい。In order to fix a fluoroalkyl group on the glass surface by a siloxane bond, the polished glass surface is treated with an inorganic acid such as hydrochloric acid, sulfuric acid or nitric acid or an organic acid such as acetic acid, formic acid or oxalic acid with PH4. Using an acid treatment solution consisting of an aqueous solution added and prepared so as to have a concentration of not more than
The temperature of the acid treatment liquid is 5 ° C. to 70 ° C. or less, and the treatment time is 10
By acid treatment under the conditions of ~ 600 seconds, the extraction of sodium ions and the breaking of siloxane bonds on the surface of the polished glass so as to efficiently generate silanol groups,
It is preferable that the silanol group contributes to the fixation of the water-repellent fluoroalkyl group in the water-repellent treatment in the subsequent step.
【0028】酸処理の温度を5〜70℃としたのは、5
℃未満の温度では上記シラノール基の生成反応の速度が
大幅に低下し、70℃を越える温度では上記シラノール
基の生成反応の速度が増大するものの、揮発成分の蒸発
による処理液中の酸濃度の低下や水の蒸発による酸濃度
の変動及び酸成分の蒸発による周辺設備の腐食などの不
都合が生じることとなる。The reason why the temperature of the acid treatment is 5 to 70 ° C. is as follows.
When the temperature is lower than 70 ° C., the speed of the silanol group formation reaction is greatly reduced. When the temperature is higher than 70 ° C., the speed of the silanol group formation reaction is increased. Inconveniences such as a decrease in the acid concentration due to water evaporation and fluctuations in the acid concentration due to evaporation of water and corrosion of peripheral equipment due to evaporation of the acid components will occur.
【0029】酸処理時間を10〜600秒としたのは、
10秒未満の処理時間ではガラス表面のナトリウムイオ
ンの抽出やシロキサン結合の切断によりシラノール基の
生成を効率的に行うことができず、600秒を越える処
理時間では実際上の量産ラインにおける生産効率が悪く
好ましくない。The reason for setting the acid treatment time to 10 to 600 seconds is as follows.
If the treatment time is less than 10 seconds, it is not possible to efficiently generate silanol groups by extracting sodium ions from the glass surface or breaking siloxane bonds, and if the treatment time exceeds 600 seconds, the production efficiency in the actual mass production line will be reduced. Bad and not desirable.
【0030】好ましくは、酸処理液がPH3.5濃度以下
で、該液の温度が10〜60℃、処理時間が15〜42
0秒の条件下で酸処理することよい。また、撥水層の下
地層として、SiO2あるいはTiO2等の金属酸化物層
を形成することは、撥水層の膜強度及び密着性を向上す
るので好ましいが、該金属酸化物としては、SiO2、
TiO2に限定されるものではない。また、各種の添加
物が含有されていても良い。Preferably, the acid treatment solution has a pH of 3.5 or less, the temperature of the solution is 10 to 60 ° C., and the treatment time is 15 to 42 hours.
The acid treatment may be performed under the condition of 0 second. Further, it is preferable to form a metal oxide layer such as SiO 2 or TiO 2 as a base layer of the water repellent layer because the film strength and adhesion of the water repellent layer are improved. SiO 2 ,
It is not limited to TiO 2 . Further, various additives may be contained.
【0031】また、撥水層中の未反応基を不活性化する
のに用いるシリル化剤は、キュアリング後の撥水層中に
残存するシラノール基を不活性化することにより、耐光
性やアルコール性溶媒に対する耐薬品性を向上させるた
めのもので、ヘキサメチルジシラザン(CH3)3SiNHSi(C
H3)3やトリメチルクロロシラン(CH3)3SiClなどが用いら
れる。シリル化剤の濃度は、処理液に対し1〜20wt%
が好ましく、この希釈はピリジン等の非アルコール性溶
媒を用いて行い、撥水処理したガラス温度が室温〜50
℃の状態で塗布し、乾燥するのが好ましいが、これに限
定されるものではない。なお、シリル化剤としてトリメ
チルクロロシランを用いた場合の撥水層中のシラノール
基との反応は下記の式で示される。The silylating agent used to inactivate the unreacted groups in the water-repellent layer can be used to inactivate the silanol groups remaining in the water-repellent layer after curing, so that light resistance and light resistance can be improved. For improving the chemical resistance to alcoholic solvents, hexamethyldisilazane (CH 3 ) 3 SiNHSi (C
H 3 ) 3 and trimethylchlorosilane (CH 3 ) 3 SiCl are used. The concentration of the silylating agent is 1 to 20 wt% based on the processing solution.
This dilution is preferably performed using a non-alcoholic solvent such as pyridine, and the temperature of the water-repellent glass is from room temperature to 50 ° C.
It is preferable to apply and dry at a temperature of ° C, but the present invention is not limited to this. The reaction with silanol groups in the water-repellent layer when trimethylchlorosilane is used as a silylating agent is represented by the following formula.
【0032】[0032]
【化1】 Embedded image
【0033】また、シリル化剤の溶媒としては、アルコ
ール性の溶媒を用いるとシリル化剤と反応するので、非
アルコール性溶媒を用いることが好ましい。また、室温
以上350 ℃以下で1分間乃至60分間の乾燥とキュアリン
グを行い成膜することとしたのは、S-UV照射時間(h)
と接触角(°)の関係を評価した結果、いずれもS-UV照
射時間が約600時間(h )においても接触角が約70°程
度以上、70〜80°程度であり、耐光性が良好なものであ
る。したがって乾燥とキュアリングとしては50℃以上35
0 ℃以下で1分間乃至60分間である。好ましくは約80℃
以上300 ℃以下程度で乾燥とキュアリングをするのが好
ましい。As a solvent for the silylating agent, a non-alcoholic solvent is preferably used since an alcoholic solvent reacts with the silylating agent. The drying and curing for 1 minute to 60 minutes at room temperature or more and 350 ° C. or less are performed to form a film by the S-UV irradiation time (h).
And the contact angle (°) was evaluated. As a result, the contact angle was about 70 ° or more and about 70 to 80 ° even when the S-UV irradiation time was about 600 hours (h). It is something. Therefore, for drying and curing, the temperature is 50 ° C or more and 35
1 minute to 60 minutes at 0 ° C. or less. Preferably about 80 ° C
Drying and curing are preferably performed at a temperature of about 300 ° C. or less.
【0034】撥水層中の未反応基を不活性化させること
により、仕上げ工程でアルコール拭きを行っても、撥水
性ガラスの品質がばらつくことなく、安定した優れた品
質の撥水性ガラスを容易に得ることが出来るものであ
る。得られた撥水層は、格段に優れた耐薬品性及び耐光
性能を有する撥水性薄膜であって、高硬度かつ高密着性
であって耐久性や耐摩耗性とを併せ持つ。また、本発明
の製造方法によれば、制御性よく極めて安定し、しかも
高安全で厄介な工程もなく、簡便に効率よく被膜を形成
することができ、より長期的に優れた撥水性能を維持す
ることができ、かつ撥水性能のバラツキ幅を低減するこ
とができ、より確実でかつ安定した品質のものとなる。By inactivating unreacted groups in the water-repellent layer, even when wiping with alcohol in the finishing step, the quality of the water-repellent glass does not vary and a stable and excellent quality water-repellent glass can be easily obtained. Can be obtained. The obtained water-repellent layer is a water-repellent thin film having extremely excellent chemical resistance and light resistance, has high hardness and high adhesion, and has both durability and abrasion resistance. Further, according to the production method of the present invention, it is possible to form a film easily and efficiently with high controllability, extremely stable, high safety and no troublesome steps, and to obtain excellent water repellency over a long period of time. It can be maintained and the variation width of the water-repellent performance can be reduced, resulting in more reliable and stable quality.
【0035】[0035]
【実施例】以下、実施例により本発明を具体的に説明す
る。ただし本発明はこれらの実施例に限定されるもので
はない。The present invention will be described below in detail with reference to examples. However, the present invention is not limited to these examples.
【0036】実施例1 ガラス:200×300×3.5(厚さ)mmのフロート平板強化
ガ。ラスを用いた。 研磨 :セリア(三井金属工業製’ミレーク(A+
B)’:水=1:100(wt%) なる縣濁液を用い、ブラシポリッシャーでガラス表面を
研磨後、充分に洗浄した。 Example 1 Glass: Float flat plate reinforced glass of 200 × 300 × 3.5 (thickness) mm. A lath was used. Polishing: Ceria (Miritsu Metal Industry's “Mirek (A +
B) ': Water = 1: 100 (wt%) Using a suspension, the glass surface was polished with a brush polisher and then sufficiently washed.
【0037】酸処理 :35℃の硫酸水溶液(0.1N)に1
分間ガラスを浸漬後、水洗した。 撥水処理:撥水膜層を形成するための撥水剤溶液組成の
原料として、フルオロアルキルアルコキシシラン〔FAS
:CF3(CF2)7CH2CH2Si(OCH3)3、東芝シリコ−ン製 〕
と、イソプロピルアルコ−ル〔iPA ;キシダ化学製〕
と、0.1N- 硝酸〔キシダ化学製〕を用い、その配合割合
をFAS:iPA :0.1N-HNO3 =1:25:0.3 (単位:g)と
し、室温で約2時間撹拌し加水分解反応をさせた。Acid treatment: 1 in 35 ° C. sulfuric acid aqueous solution (0.1N)
After immersing the glass for minutes, it was washed with water. Water repellent treatment: Fluoroalkylalkoxysilane [FAS is used as a raw material of a water repellent solution composition for forming a water repellent film layer.
: CF 3 (CF 2 ) 7 CH 2 CH 2 Si (OCH 3 ) 3 , manufactured by Toshiba Silicone]
And isopropyl alcohol (iPA; manufactured by Kishida Chemical)
And 0.1N-nitric acid (manufactured by Kishida Chemical Co., Ltd.), the mixing ratio of which is FAS: iPA: 0.1N-HNO 3 = 1: 25: 0.3 (unit: g), and the mixture is stirred at room temperature for about 2 hours for hydrolysis reaction. Was made.
【0038】次いで、該加水分解反応をさせた溶液にモ
レキュラ−シ−ブ4A〔キシダ化学製〕を約5g 添加浸
漬して約16時間放置し縮重合反応させつつ脱水し完了し
た後、濾紙(NO.7)を用いて濾過しモレキュラ−シ−ブ
4Aを分離除去して塗布溶液とした。次に、予めセリア
研磨、酸処理、上水で水洗、蒸留水でリンス処理した上
記ガラス基板のトップ面側表面に、前記塗布溶液を室温
で湿度約55%RH程度の環境において手塗りで塗布した。
続いて、塗布後風冷乾燥してから、約140 ℃程度で約5
分間程度の乾燥とキュアリングをすることで成膜を行
い、F-SiOx膜付きガラスを得た。Next, about 5 g of molecular sieve 4A (manufactured by Kishida Chemical) was added to the solution subjected to the hydrolysis reaction, immersed and left for about 16 hours to complete the dehydration while performing the condensation polymerization reaction. No. 7) to separate and remove the molecular sieve 4A to obtain a coating solution. Next, the coating solution is applied by hand at room temperature and an environment of about 55% RH on the top surface of the glass substrate which has been subjected to ceria polishing, acid treatment, washing with tap water, and rinsing with distilled water. did.
Then, after application, air-cooled and dried at about 140 ° C for about 5
The film was formed by drying and curing for about a minute to obtain a glass with an F-SiOx film.
【0039】不活性化:キュアリング後、ガラス温度が
室温に戻ってから、トリメチルシリル化液を手塗りにて
ガラス面全体に塗布し、乾燥後余剰な撥水剤成分を拭
き、撥水性ガラスを得た。Inactivation: After the glass temperature has returned to room temperature after curing, a trimethylsilylation solution is applied by hand to the entire glass surface, and after drying, excess water repellent is wiped off to remove the water repellent glass. Obtained.
【0040】トリメチルシリル化液には、溶媒にピリジ
ン(キシダ化学製)を用い、トリメチルクロロシラン(CH
3)3SiCl(キシダ化学製)の含有量を10%に希釈したもの
を用いた。In the trimethylsilylation solution, pyridine (manufactured by Kishida Chemical) is used as a solvent, and trimethylchlorosilane (CH
3) 3SiCl (manufactured by Kishida Chemical) whose content was diluted to 10% was used.
【0041】[0041]
【実施例2】ガラスと撥水層の中間に、下地層としてS
iO2膜をゾルゲル法で形成したこと以外は、実施例1
と同じ条件でサンプルを作成した。[Embodiment 2] An intermediate layer between glass and a water-repellent layer,
Example 1 except that the iO2 film was formed by the sol-gel method.
A sample was prepared under the same conditions as described above.
【0042】下地膜の形成:テトラエトキシシランをイ
ソプロピルアルコールで希釈した溶液に微量の酸触媒
(0.1Nの塩酸)と水を加えて約3時間撹拌し、酸化物換算
の溶質濃度が約0.5wt%になるようにさらにイソプロピ
ルアルコールを加えてコーティング液を得た。この溶液
の粘度は、約2.5mPa・sであった。次に、ガラス基板の
成膜面を水で洗浄、乾燥後、温度25℃、湿度50%に保持
されたクリーンルーム内において前記コーティング液を
スピンコーティング(回転数は200rpm)して乾燥後、約
620℃で5分間加熱して、SiO2薄膜を得た。得られた
薄膜は、屈折率がn=1.45,膜厚d=100nmであった。Formation of base film: A small amount of acid catalyst is added to a solution of tetraethoxysilane diluted with isopropyl alcohol.
(0.1N hydrochloric acid) and water were added, and the mixture was stirred for about 3 hours, and isopropyl alcohol was further added so that the solute concentration in terms of oxide became about 0.5 wt% to obtain a coating liquid. The viscosity of this solution was about 2.5 mPa · s. Next, the film-forming surface of the glass substrate is washed with water, dried, and then spin-coated (at a rotation speed of 200 rpm) with the coating solution in a clean room maintained at a temperature of 25 ° C. and a humidity of 50%.
Heating at 620 ° C. for 5 minutes gave a SiO 2 thin film. The obtained thin film had a refractive index of n = 1.45 and a thickness of d = 100 nm.
【0043】[0043]
【比較例1】不活性化する工程を経ないこと以外は、実
施例1と同条件で行った。Comparative Example 1 The same procedure as in Example 1 was carried out except that the step of inactivating was not performed.
【0044】[0044]
【比較例2】不活性化処理液のトリメチルクロロシラン
の含有量が、0.5wt%のものを用いた以外は、実施例1
と同条件で行った。Comparative Example 2 Example 1 was repeated except that the content of trimethylchlorosilane in the passivation solution was 0.5 wt%.
The same conditions were used.
【0045】[0045]
【比較例3】不活性化処理液の希釈溶媒に、イソプロピ
ルアルコールを用いた以外は、実施例1と同条件で行っ
た。Comparative Example 3 The same operation as in Example 1 was carried out except that isopropyl alcohol was used as a diluting solvent for the inactivation treatment liquid.
【0046】[0046]
測定機器 :協和界面科学製CA-X200型 測定環境 :大気中(約25℃) 水 :純水( 2μl )の水滴 評価 :ガラス面上に上記の水滴を落とし、
該ガラスと水滴のなす角度(°)(すなわち、接触角と呼
ぶ)を測定。 なお、試験前の接触角はθ0 (°)、 各試験後の接触角
はθ(°)で示す。 〔耐磨耗性試験〕 試験機 :トラバ−ス式摺動試験機 試料サイズ :約100mm ×200mm 摩擦布への荷重 :キャンバス布に0.1kg /cm2(JIS L
3102-1206) ストロ−ク :100mm の往復摺動(摺動回数は往復
の回数) 摺動速度 :30往復/分 評価 :摺動回数3500回に対する接触角θ
(°)の測定 なお、過剰の不活性処理液を払拭後のトラバース試験に
ついては、上記と同じトラバース試験機を用いて、払拭
ガラスサンプルにイソプロピルアルコールを含んだ紙タ
オルをセットし20回摺動後、乾燥紙タオルでさらに20回
摺動した後に、上記正規の耐磨耗性試験を実施し、過剰
払拭後の接触角を測定した。 〔耐光性試験〕 測定機器 :スーパーUV(S-UV)耐光促進試験機
〔イワキエレクトリック製、EYE SUPER UV TESTER 、SV
U-W11 型〕。Measurement equipment: CA-X200 type manufactured by Kyowa Interface Science Measurement environment: Atmosphere (about 25 ° C) Water: Drop of pure water (2 μl) Evaluation: Drop the above water drop on the glass surface,
The angle (°) between the glass and the water droplet (ie, the contact angle) was measured. The contact angle before the test is indicated by θ 0 (°), and the contact angle after each test is indicated by θ (°). [Abrasion resistance test] Tester: Traverse type sliding tester Sample size: about 100 mm × 200 mm Load on friction cloth: 0.1 kg / cm 2 on canvas cloth (JIS L
3102-1206) Stroke: 100mm reciprocating sliding (the number of sliding is the number of reciprocating) Sliding speed: 30 reciprocating / min Evaluation: Contact angle θ for 3,500 sliding
(°) Measurement For the traverse test after wiping off the excess inert solution, set the paper towel containing isopropyl alcohol on the wiping glass sample and slide it 20 times using the same traverse tester as above. Thereafter, after sliding 20 more times with a dry paper towel, the above-mentioned regular abrasion resistance test was performed, and the contact angle after excessive wiping was measured. [Light resistance test] Measuring equipment: Super UV (S-UV) light resistance acceleration tester [Iwaki Electric, EYE SUPER UV TESTER, SV
U-W11 type].
【0047】 条件 :約75〜76mW/cm2 、ランプとサンプ
ル間距離約25mm、パネル温度約50℃、SUV 照射時間約 2
00時間、400時間、600時間。 評価 :各SUV 照射時間に対する接触角θ
(°)を測定。Conditions: about 75 to 76 mW / cm 2 , distance between lamp and sample about 25 mm, panel temperature about 50 ° C., SUV irradiation time about 2
00 hours, 400 hours, 600 hours. Evaluation: Contact angle θ for each SUV irradiation time
Measure (°).
【0048】[0048]
【評価結果】実施例及び比較例における性能評価結果を
表1及び図1に示す。[Evaluation Results] The performance evaluation results in Examples and Comparative Examples are shown in Table 1 and FIG.
【0049】[0049]
【表1】 [Table 1]
【0050】払拭後の耐磨耗性試験において、実施例
1、2はいずれも接触角が104〜105°とバラツキがほと
んどなく且つ値も100°以上で良好であるのに対し、比
較例1〜3は、バラツキが7〜10°と大きく好ましい
ものではなかった。In the abrasion resistance test after wiping, in Examples 1 and 2, the contact angle was 104-105 ° and there was almost no variation and the value was 100 ° or more. No. 3 was not preferable because the variation was as large as 7 to 10 °.
【0051】また耐光性試験について、600時間UV照
射後の接触角は、実施例1、2が接触角80°以上と長期
的に撥水性能を維持し耐久性が高いものであった。一
方、比較例は何れも70°前後と低く、初期接触角からの
落ち込みも大きく、長期耐久性に乏しいものであった。Regarding the light resistance test, the contact angle after UV irradiation for 600 hours was such that the contact angles of Examples 1 and 2 were 80 ° or more, and the water repellency was maintained for a long time and the durability was high. On the other hand, all of the comparative examples were as low as about 70 °, had a large drop from the initial contact angle, and were poor in long-term durability.
【0052】以上のように、本発明の実施を施したもの
は、撥水層中の未反応基が不活性化され、耐光性、耐薬
品性及び耐磨耗性等の品質がばらつかず、優れているの
に対して、比較例のものは、比較例1においては未反応
基が不活性化されていないために、また比較例2、3の
ものは不活性化の効果が認められなかった。As described above, in the case of carrying out the present invention, the unreacted groups in the water-repellent layer are inactivated, and the qualities such as light resistance, chemical resistance and abrasion resistance do not vary. In contrast, in Comparative Example 1, the unreacted groups were not inactivated in Comparative Example 1, and in Comparative Examples 2 and 3, the effect of inactivation was observed. Did not.
【0053】なお、市販品の撥水性サンプルの耐光性試
験を行った結果、S-UV照射時間約200時間程度で接触角
θが約65°程度と極めて短寿命であると言えるものであ
った。A light fastness test of a commercially available water-repellent sample showed that the contact angle θ was about 65 ° when the S-UV irradiation time was about 200 hours, which was extremely short life. .
【0054】[0054]
【発明の効果】撥水層中の未反応基を不活性化させるこ
とにより、仕上げ工程でアルコール拭きを行っても、撥
水性ガラスの品質がばらつくことなく、安定した優れた
品質の撥水性ガラスを容易に得ることが出来るものであ
る。得られた撥水層は、格段に優れた耐薬品性及び耐光
性能を有する撥水性薄膜であって、高硬度かつ高密着性
であって耐久性や耐摩耗性とを併せ持つ。また、本発明
の製造方法によれば、制御性よく極めて安定し、しかも
高安全で厄介な工程もなく、簡便に効率よく被膜を形成
することができ、より長期的に優れた撥水性能を維持す
ることができ、かつ撥水性能のバラツキ幅を低減するこ
とができ、より確実でかつ安定した品質のものとなる。According to the present invention, by inactivating the unreacted groups in the water-repellent layer, the quality of the water-repellent glass does not vary even when the alcohol is wiped in the finishing step, and the water-repellent glass is stable and excellent in quality. Can be easily obtained. The obtained water-repellent layer is a water-repellent thin film having extremely excellent chemical resistance and light resistance, has high hardness and high adhesion, and has both durability and abrasion resistance. Further, according to the production method of the present invention, it is possible to form a film easily and efficiently with high controllability, extremely stable, high safety and no troublesome steps, and to obtain excellent water repellency over a long period of time. It can be maintained and the variation width of the water-repellent performance can be reduced, resulting in more reliable and stable quality.
【0055】さらに、建築用はもとより自動車用窓材に
格段に安定した品質で供給でき、船舶や航空機の窓材、
種々のミラ−等各種ガラス物品等、種々の分野に広く採
用できる利用価値の高い、有用な撥水性ガラス及びその
製法を提供することができる。Further, it can be supplied to window materials for automobiles as well as architectural materials with remarkably stable quality.
It is possible to provide a useful water-repellent glass having a high utility value that can be widely used in various fields such as various glass articles such as various mirrors and a method for producing the same.
【図1】S-UV照射時間と接触角との関係FIG. 1 Relationship between S-UV irradiation time and contact angle
Claims (6)
含有するシラン化合物を被覆し未反応基を不活性化させ
た薄膜であることを特徴とする撥水性ガラス。1. A water-repellent glass, wherein the water-repellent layer formed on the surface of the glass is a thin film coated with a fluorine-containing silane compound to inactivate unreacted groups.
によりフルオロアルキル基が固定化されている請求項1
記載の撥水性ガラス。2. The water-repellent layer has a fluoroalkyl group fixed to the glass surface by a siloxane bond.
The water-repellent glass as described.
の上部に形成されたものである請求項1記載の撥水性ガ
ラス。3. The water-repellent glass according to claim 1, wherein the water-repellent layer is formed on an underlayer made of a metal oxide film.
基を含有するシラン化合物を加水分解ならびに脱水縮重
合させた塗布液を被覆し形成した撥水層において、該撥
水層をシリル化剤を溶媒中に含有する処理液にて処理す
ることにより、撥水層中の未反応基を不活性化させるこ
とを特徴とする撥水性ガラスの製造方法。4. A water-repellent layer formed by coating a coating solution obtained by hydrolyzing and dehydrating and condensing a silane compound containing a fluoroalkyl group on the surface of a glass substrate. A method for producing a water-repellent glass, comprising inactivating unreacted groups in a water-repellent layer by treating with a treatment liquid contained therein.
20wt%である請求項4記載の撥水性ガラスの製造方
法。5. The concentration of the silylating agent in the treatment solution is 1 to 5.
The method for producing a water-repellent glass according to claim 4, wherein the content is 20% by weight.
たのちに、該処理液にて処理する請求項4記載の撥水性
ガラスの製造方法。6. The method for producing water-repellent glass according to claim 4, wherein a water-repellent layer is formed on the glass whose surface has been modified, and then treated with the treatment liquid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17251297A JPH1111984A (en) | 1997-06-27 | 1997-06-27 | Water-repellent glass and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17251297A JPH1111984A (en) | 1997-06-27 | 1997-06-27 | Water-repellent glass and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH1111984A true JPH1111984A (en) | 1999-01-19 |
Family
ID=15943340
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17251297A Pending JPH1111984A (en) | 1997-06-27 | 1997-06-27 | Water-repellent glass and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH1111984A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006306631A (en) * | 2005-04-26 | 2006-11-09 | Central Glass Co Ltd | Method for producing functional article and method for reactivating primer layer |
| CN100410687C (en) * | 2006-07-14 | 2008-08-13 | 温州绿宝视光科技有限公司 | Preparation method of spectacle lens superhard waterproof agent |
| JP2019185050A (en) * | 2019-05-23 | 2019-10-24 | キヤノン株式会社 | Optical member and production method of optical member |
| WO2019221128A1 (en) * | 2018-05-18 | 2019-11-21 | Agc株式会社 | Glass substrate and optical component |
-
1997
- 1997-06-27 JP JP17251297A patent/JPH1111984A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006306631A (en) * | 2005-04-26 | 2006-11-09 | Central Glass Co Ltd | Method for producing functional article and method for reactivating primer layer |
| CN100410687C (en) * | 2006-07-14 | 2008-08-13 | 温州绿宝视光科技有限公司 | Preparation method of spectacle lens superhard waterproof agent |
| WO2019221128A1 (en) * | 2018-05-18 | 2019-11-21 | Agc株式会社 | Glass substrate and optical component |
| US10752543B2 (en) | 2018-05-18 | 2020-08-25 | AGC Inc. | Glass substrate and optical component |
| JP2019185050A (en) * | 2019-05-23 | 2019-10-24 | キヤノン株式会社 | Optical member and production method of optical member |
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