JPH11121355A5 - - Google Patents

Info

Publication number
JPH11121355A5
JPH11121355A5 JP1997293404A JP29340497A JPH11121355A5 JP H11121355 A5 JPH11121355 A5 JP H11121355A5 JP 1997293404 A JP1997293404 A JP 1997293404A JP 29340497 A JP29340497 A JP 29340497A JP H11121355 A5 JPH11121355 A5 JP H11121355A5
Authority
JP
Japan
Prior art keywords
illumination
intensity distribution
exposure apparatus
projection exposure
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1997293404A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11121355A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP9293404A priority Critical patent/JPH11121355A/ja
Priority claimed from JP9293404A external-priority patent/JPH11121355A/ja
Publication of JPH11121355A publication Critical patent/JPH11121355A/ja
Publication of JPH11121355A5 publication Critical patent/JPH11121355A5/ja
Pending legal-status Critical Current

Links

JP9293404A 1997-10-09 1997-10-09 投影露光装置および露光方法 Pending JPH11121355A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9293404A JPH11121355A (ja) 1997-10-09 1997-10-09 投影露光装置および露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9293404A JPH11121355A (ja) 1997-10-09 1997-10-09 投影露光装置および露光方法

Publications (2)

Publication Number Publication Date
JPH11121355A JPH11121355A (ja) 1999-04-30
JPH11121355A5 true JPH11121355A5 (2) 2005-06-23

Family

ID=17794340

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9293404A Pending JPH11121355A (ja) 1997-10-09 1997-10-09 投影露光装置および露光方法

Country Status (1)

Country Link
JP (1) JPH11121355A (2)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005294840A (ja) * 2004-03-31 2005-10-20 Asml Holding Nv フィールド高さ及び瞳の変更を許容する照明システム及び方法
DE102006038455A1 (de) * 2006-08-16 2008-02-21 Carl Zeiss Smt Ag Optisches System für die Halbleiterlithographie

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