JPH11145051A5 - - Google Patents

Info

Publication number
JPH11145051A5
JPH11145051A5 JP1997322231A JP32223197A JPH11145051A5 JP H11145051 A5 JPH11145051 A5 JP H11145051A5 JP 1997322231 A JP1997322231 A JP 1997322231A JP 32223197 A JP32223197 A JP 32223197A JP H11145051 A5 JPH11145051 A5 JP H11145051A5
Authority
JP
Japan
Prior art keywords
pressurized container
evanescent light
denotes
faces
reference numeral
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997322231A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11145051A (ja
JP3950532B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP32223197A priority Critical patent/JP3950532B2/ja
Priority claimed from JP32223197A external-priority patent/JP3950532B2/ja
Priority to US09/184,655 priority patent/US6171730B1/en
Publication of JPH11145051A publication Critical patent/JPH11145051A/ja
Publication of JPH11145051A5 publication Critical patent/JPH11145051A5/ja
Application granted granted Critical
Publication of JP3950532B2 publication Critical patent/JP3950532B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP32223197A 1997-11-07 1997-11-07 露光方法及び露光装置 Expired - Fee Related JP3950532B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP32223197A JP3950532B2 (ja) 1997-11-07 1997-11-07 露光方法及び露光装置
US09/184,655 US6171730B1 (en) 1997-11-07 1998-11-03 Exposure method and exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32223197A JP3950532B2 (ja) 1997-11-07 1997-11-07 露光方法及び露光装置

Publications (3)

Publication Number Publication Date
JPH11145051A JPH11145051A (ja) 1999-05-28
JPH11145051A5 true JPH11145051A5 (2) 2005-04-14
JP3950532B2 JP3950532B2 (ja) 2007-08-01

Family

ID=18141400

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32223197A Expired - Fee Related JP3950532B2 (ja) 1997-11-07 1997-11-07 露光方法及び露光装置

Country Status (1)

Country Link
JP (1) JP3950532B2 (2)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001135566A (ja) * 1999-11-08 2001-05-18 Canon Inc 微細パターン作製方法
JP2001308002A (ja) 2000-02-15 2001-11-02 Canon Inc フォトマスクを用いたパターン作製方法、及びパターン作製装置
JP2002246307A (ja) 2000-12-12 2002-08-30 Canon Inc 露光装置及び露光方法
JP3605041B2 (ja) 2001-01-26 2004-12-22 キヤノン株式会社 露光方法及び装置、デバイス製造方法、並びに、デバイス
JP2003066600A (ja) 2001-06-12 2003-03-05 Canon Inc フォトレジスト、これを用いた基板の加工方法、及びフォトレジストの製造方法
JP3894550B2 (ja) 2002-06-14 2007-03-22 キヤノン株式会社 近接場露光マスクの製造方法
JP4266661B2 (ja) 2003-02-20 2009-05-20 キヤノン株式会社 近接場露光用フォトマスク
JP4572406B2 (ja) * 2004-04-16 2010-11-04 独立行政法人理化学研究所 リソグラフィーマスク
KR101090481B1 (ko) 2005-03-30 2011-12-08 엘지전자 주식회사 평판 디스플레이의 노광장치
WO2006132425A1 (en) 2005-06-08 2006-12-14 Canon Kabushiki Kaisha Near-field exposure mask, method of producing that mask, near-field exposure apparatus having that mask, and resist pattern forming method
JP4834453B2 (ja) * 2006-04-27 2011-12-14 キヤノン株式会社 近接場露光用マスクの圧力制御方法及びその圧力制御装置

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