JPH111671A - Method for producing adhesive sheet and cut piece - Google Patents

Method for producing adhesive sheet and cut piece

Info

Publication number
JPH111671A
JPH111671A JP9173224A JP17322497A JPH111671A JP H111671 A JPH111671 A JP H111671A JP 9173224 A JP9173224 A JP 9173224A JP 17322497 A JP17322497 A JP 17322497A JP H111671 A JPH111671 A JP H111671A
Authority
JP
Japan
Prior art keywords
layer
adhesive
heat
adhesive sheet
expandable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9173224A
Other languages
Japanese (ja)
Other versions
JP3847904B2 (en
Inventor
Toshiyuki Oshima
俊幸 大島
Shiyuutou Murata
秋桐 村田
Toshimitsu Okuno
敏光 奥野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Priority to JP17322497A priority Critical patent/JP3847904B2/en
Publication of JPH111671A publication Critical patent/JPH111671A/en
Application granted granted Critical
Publication of JP3847904B2 publication Critical patent/JP3847904B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • H10P72/7402—Wafer tapes, e.g. grinding or dicing support tapes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • H10P72/7402—Wafer tapes, e.g. grinding or dicing support tapes
    • H10P72/7404—Wafer tapes, e.g. grinding or dicing support tapes the wafer tape being a laminate of three or more layers, e.g. including additional layers beyond a base layer and an uppermost adhesive layer
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • H10P72/7416—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support used during dicing or grinding

Landscapes

  • Adhesive Tapes (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Dicing (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

(57)【要約】 【課題】 被着体の切断加工等に耐える強力な接着保持
力と、形成した切断片を回収する際の前記接着保持力の
低減ないし喪失の接着特性を満足させつつ、加熱処理に
耐える耐熱性と形成切断片を回収する際の伸長性の両方
を具備する接着シートの開発。 【解決手段】 伸長性のベース基材(1)の上に接着層
(2)を介して切断可能な保持層(3)を有し、その上
に熱膨張性微小球含有の接着性を有する熱膨張性層
(4)を少なくとも有する接着シート、及びその接着シ
ートにおける熱膨張性層に被切断体(5)を接着保持し
てその被切断体を所定寸法に、接着シートの保持層を含
みベース基材を分離しない深さで切断(6)する工程、
前記切断工程後、接着シートの熱膨張性層を加熱し発泡
又は膨張処理して接着力を低減又は喪失させると共にベ
ース基材を伸長させて、切断により形成した切断片を回
収する工程を少なくとも有する切断片の製造方法。
(57) [Summary] [PROBLEMS] While satisfying a strong adhesive holding force that can withstand cutting processing of an adherend and a bonding characteristic of reducing or losing the adhesive holding force when collecting formed cut pieces, Development of an adhesive sheet that has both heat resistance to withstand heat treatment and extensibility when collecting cut pieces. SOLUTION: A holding layer (3) that can be cut through an adhesive layer (2) is provided on an extensible base material (1), and has an adhesive property containing thermally expandable microspheres thereon. An adhesive sheet having at least a heat-expandable layer (4), and a cut-off body (5) adhered to and held by the heat-expandable layer in the adhesive sheet, and the cut-off body has a predetermined size, and a holding layer for the adhesive sheet Cutting (6) at a depth that does not separate the base material,
After the cutting step, at least a step of heating the heat-expandable layer of the adhesive sheet to expand or expand the base material by expanding or expanding the base material and expanding the base material, and recovering a cut piece formed by cutting. Method of manufacturing cut pieces.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の技術分野】本発明は、接着強度に優れると共
に、任意な時に加熱処理して被着体を簡単に剥離でき、
半導体チップや積層コンデンサチップの形成などに好適
な接着シート及びそれを用いた切断片の製造方法に関す
る。
BACKGROUND OF THE INVENTION The present invention has excellent adhesive strength and can easily remove an adherend by heating at any time.
The present invention relates to an adhesive sheet suitable for forming a semiconductor chip or a multilayer capacitor chip, and a method for manufacturing a cut piece using the same.

【0002】[0002]

【発明の背景】従来、半導体ウエハや積層コンデンサシ
ート等からなる被切断体を接着シートの感圧接着層を介
し接着保持して所定寸法に切断し、形成したチップ等の
切断片を接着シートから剥離回収する方法に用いられる
接着シートとしては、支持基材に発泡剤含有の感圧接着
層を設けたものが知られていた(特公昭50−1387
8号公報、同51−24534号公報、特開昭56−6
1468号公報、同56−61469号公報、同60−
252681号公報等)。これは、感圧接着層の加熱に
よる発泡ないし膨脹処理で接着力を低減させうるように
して、被着体の切断加工に耐える強力な接着保持力と形
成した切断片の容易な剥離回収の両立を目的としたもの
である。
2. Description of the Related Art Conventionally, an object to be cut, such as a semiconductor wafer or a laminated capacitor sheet, is cut and cut to a predetermined size by holding it through a pressure-sensitive adhesive layer of an adhesive sheet, and a cut piece such as a formed chip is cut from the adhesive sheet. As an adhesive sheet used in the method of peeling and recovering, a sheet provided with a pressure-sensitive adhesive layer containing a foaming agent on a supporting substrate has been known (Japanese Patent Publication No. 50-1387).
No. 8, No. 51-24534, JP-A-56-6
No. 1468, No. 56-61469, No. 60-
No. 252681). This is to reduce the adhesive force by foaming or expanding the pressure-sensitive adhesive layer by heating, and to achieve both strong adhesive holding force to withstand the cutting work of the adherend and easy peeling and recovery of the formed cut piece. It is intended for.

【0003】しかしながら前記の従来シートでは、例え
ば表面のIC回路を損傷しないようにチップ側面の掴み
方式などによる半導体チップのピックアップ回収方式
や、セラミック粉末を保形するバインダを介した形成チ
ップの再接着を防止した積層コンデンサチップの回収方
式等の、前記方法の普及に伴うより進展した切断片回収
方式を適用することが困難な問題点があった。
However, in the above-mentioned conventional sheet, for example, a semiconductor chip pickup and recovery method by a method of gripping a chip side surface so as not to damage an IC circuit on the surface, or a re-adhesion of a formed chip through a binder for retaining a ceramic powder. However, there is a problem that it is difficult to apply a more advanced cut piece recovery method accompanying the spread of the method, such as a method of recovering a multilayer capacitor chip in which the above-described problem is prevented.

【0004】[0004]

【発明の技術的課題】本発明者らは、切断片の回収時に
接着シートを伸長させて切断片間の間隙を拡大すること
により前記した新方式を適用しうるとの着想の基に、従
来の接着シートにおける支持基材に伸長性をもたせるこ
とを種々試みたが、その伸長性をもたせた場合には発泡
剤含有の感圧接着層を発泡ないし膨脹処理する際の加熱
処理に耐えず、その加熱処理に耐える支持基材とした場
合には伸長性に乏しくなり、従って従来の接着シートで
は耐熱性と伸長性を両立させることが困難で、新たなタ
イプの接着シートの開発が必要であることを究明した。
SUMMARY OF THE INVENTION Based on the idea that the above-described new method can be applied by extending the adhesive sheet at the time of collecting the cut pieces to expand the gap between the cut pieces, the present inventors have proposed a conventional method. Various attempts have been made to give the support base material of the adhesive sheet extensibility, but when the extensibility is given, the foaming agent-containing pressure-sensitive adhesive layer does not withstand heat treatment during foaming or expansion treatment, When used as a supporting base material that can withstand the heat treatment, the stretchability is poor. Therefore, it is difficult to achieve both heat resistance and stretchability with a conventional adhesive sheet, and it is necessary to develop a new type of adhesive sheet. I determined that.

【0005】よって本発明は、被着体の切断加工等に耐
える強力な接着保持力と、形成した切断片を回収する際
の前記接着保持力の低減ないし喪失の接着特性を満足さ
せつつ、加熱処理に耐える耐熱性と形成切断片を回収す
る際の伸長性の両方を具備する新タイプの接着シートの
開発を課題とする。
Accordingly, the present invention provides a method for heating a steel sheet while satisfying a strong adhesive holding force capable of withstanding a cutting process of an adherend and a bonding property of reducing or losing the adhesive holding force when collecting formed cut pieces. An object of the present invention is to develop a new type of adhesive sheet having both heat resistance to withstand processing and extensibility when collecting formed cut pieces.

【0006】[0006]

【課題の解決手段】本発明は、伸長性のベース基材の上
に接着層を介して切断可能な保持層を有し、その上に熱
膨張性微小球含有の接着性を有する熱膨張性層を少なく
とも有することを特徴とする接着シート、及びその接着
シートにおける熱膨張性層に被切断体を接着保持してそ
の被切断体を所定寸法に、接着シートの保持層を含みベ
ース基材を分離しない深さで切断する工程、前記切断工
程後、接着シートの熱膨張性層を加熱し発泡又は膨張処
理して接着力を低減又は喪失させると共にベース基材を
伸長させて、切断により形成した切断片を回収する工程
を少なくとも有することを特徴とする切断片の製造方法
を提供するものである。
According to the present invention, there is provided a heat-expandable base material having a heat-expandable microsphere-containing adhesive on a stretchable base substrate having a holding layer severable through an adhesive layer. An adhesive sheet characterized by having at least a layer, and a cut base having a predetermined size by bonding and holding the cut body to the heat-expandable layer in the adhesive sheet, including a holding layer of the adhesive sheet and a base substrate. Step of cutting at a depth that does not separate, after the cutting step, heating and expanding or expanding the heat-expandable layer of the adhesive sheet to reduce or lose the adhesive force and extend the base material, formed by cutting. An object of the present invention is to provide a method for producing a cut piece, comprising at least a step of collecting the cut piece.

【0007】[0007]

【発明の効果】本発明の接着シートによれば、熱膨張性
層を介し被着体を切断加工等に耐える状態に強力に接着
保持できると共に、保持層を介して熱膨張性層の加熱処
理に耐え、かつ熱膨張性層を加熱処理してその接着保持
力を低減ないし喪失させることができ、しかもベース基
材を伸長処理できて切断片間の間隙を拡げることができ
る。従って被着体の切断加工等に耐える強力な接着保持
力と、形成した切断片を回収する際の前記接着保持力の
低減ないし喪失の接着特性を具備し、かつ加熱処理に耐
える耐熱性と形成切断片を回収する際の伸長性の両方も
具備して、半導体チップのチップ側面の掴み方式等によ
るピックアップ回収方式や、積層コンデンサチップのバ
インダを介した再接着を防止した回収方式などを適用で
きる接着シートを得ることができる。
According to the adhesive sheet of the present invention, the adherend can be strongly adhered and held through the heat-expandable layer so as to withstand cutting and the like, and the heat treatment of the heat-expandable layer can be performed via the holding layer. And the heat-expandable layer can be heat-treated to reduce or lose its adhesive holding power, and the base material can be stretched to increase the gap between the cut pieces. Therefore, it has a strong adhesive holding force that can withstand the cutting process of the adherend, and an adhesive property of reducing or losing the adhesive holding force when collecting the formed cut pieces, and has heat resistance and forming that can withstand heat treatment. Also equipped with both extensibility when collecting cut pieces, a pickup recovery method such as a method of gripping the chip side surface of a semiconductor chip, and a recovery method of preventing re-adhesion of a multilayer capacitor chip via a binder can be applied. An adhesive sheet can be obtained.

【0008】[0008]

【発明の実施形態】本発明の接着シートは、伸長性のベ
ース基材の上に接着層を介して切断可能な保持層を有
し、その上に熱膨張性微小球含有の接着性を有する熱膨
張性層を少なくとも有してなる。その例を図1、図2に
示した。1がベース基材、2が接着層、3が保持層、4
が熱膨張性層である。また11は感圧接着層、41はゴ
ム状有機弾性層、7はセパレータであり、これらは必要
に応じて設けられる。なお図1は、熱膨張性層4に仮想
線で示した被切断体5を接着保持して所定寸法に切断し
た状態を示しており、仮想線6がその切断線である。
BEST MODE FOR CARRYING OUT THE INVENTION The adhesive sheet of the present invention has a holding layer which can be cut through an adhesive layer on an extensible base material, and has an adhesive property containing heat-expandable microspheres thereon. It has at least a heat-expandable layer. Examples thereof are shown in FIGS. 1 is a base substrate, 2 is an adhesive layer, 3 is a holding layer, 4
Is a heat-expandable layer. 11 is a pressure-sensitive adhesive layer, 41 is a rubber-like organic elastic layer, and 7 is a separator, which are provided as necessary. Note that FIG. 1 shows a state where the object 5 indicated by a virtual line is adhered and held to the thermally expandable layer 4 and cut into a predetermined size, and a virtual line 6 is the cutting line.

【0009】本発明においてベース基材は、接着シート
に伸長性能を付与することなどを目的とし、伸長性、す
なわち引張り力で伸び性を示す適宜な材料で形成するこ
とができる。その例としては、限定するものではないが
ポリエチレンやポリプロピレンの如きポリオレフィンや
その共重合体、(軟質)ポリ塩化ビニルやその共重合
体、天然ゴムやポリブチレン等の合成ゴムの如きゴム系
ポリマー、後記のゴム状有機弾性層で例示するゴム弾性
を有する合成樹脂などなどがあげられ、かかるポリマー
は架橋体であってもよい。
In the present invention, the base substrate can be formed of an appropriate material exhibiting extensibility, that is, extensibility by tensile force, for the purpose of imparting elongation performance to the adhesive sheet. Examples thereof include, but are not limited to, polyolefins such as polyethylene and polypropylene and copolymers thereof, (soft) polyvinyl chloride and copolymers thereof, rubber-based polymers such as synthetic rubbers such as natural rubber and polybutylene, and the like. Synthetic resins having rubber elasticity as exemplified by the rubbery organic elastic layer described above, and the like, and such polymers may be crosslinked.

【0010】切断片間の間隙の拡張性などの点よりは、
引張り破断時の伸び率が10%以上、就中25%以上、
特に50%以上のベース基材が好ましい。ベース基材の
厚さは、適宜に決定しうるが、一般には5〜500μ
m、就中10〜300μm、特に20〜200μmとされ
る。伸長性などの点より好ましく用いうるベース基材
は、(軟質)ポリ塩化ビニルフィルムである。
[0010] Rather than the expansion of the gap between the cut pieces,
Tensile elongation at break is 10% or more, especially 25% or more,
Particularly, a base material of 50% or more is preferable. The thickness of the base substrate can be appropriately determined, but is generally 5 to 500 μm.
m, especially 10 to 300 μm, especially 20 to 200 μm. A base material that can be preferably used from the viewpoint of extensibility and the like is a (soft) polyvinyl chloride film.

【0011】保持層は、熱膨張性層の支持母体となり、
熱膨張性層を発泡及び/又は膨脹処理する際の加熱に耐
える耐熱性の付与を目的とし、切断可能に形成される。
従って保持層の形成には、前記の加熱処理に耐える耐熱
性とカッター等による切断性を示す、例えばポリエステ
ルやポリカーボネート、ポリイミドやポリアミドの如き
プラスチックからなるフィルムが一般に用いられるが、
本発明にては紙や布、不織布や金属箔、あるいはそれら
のプラスチックラミネート体、プラスチック同士の積層
体などの適宜な薄葉体を用いうる。保持層の厚さは、適
宜に決定しうるが、一般には500μm以下、就中5〜
300μm、特に10〜200μmとされる。
[0011] The holding layer serves as a supporting matrix of the heat-expandable layer,
The heat-expandable layer is formed so as to be cuttable for the purpose of imparting heat resistance against heating during foaming and / or expansion processing.
Therefore, for the formation of the holding layer, a film made of a plastic such as polyester, polycarbonate, polyimide or polyamide is generally used, which shows heat resistance and cutability by a cutter or the like that endure the heat treatment,
In the present invention, an appropriate thin leaf such as paper, cloth, nonwoven fabric, metal foil, a plastic laminate thereof, or a laminate of plastics may be used. The thickness of the holding layer can be determined as appropriate, but is generally 500 μm or less, especially 5 to 5 μm.
It is 300 μm, especially 10 to 200 μm.

【0012】ベース層と保持層は、接着層を介して接着
されるがその接着層の形成には、適宜な接着剤を用いる
ことができ、特に限定はない。一般には、低温活性化タ
イプの熱賦活性接着剤や、水又は有機溶剤賦活性接着
剤、あるいは感圧接着剤などが用いられる。
The base layer and the holding layer are adhered through an adhesive layer, and an appropriate adhesive can be used for forming the adhesive layer, and there is no particular limitation. Generally, a low-temperature activation type heat-activated adhesive, water or organic solvent-activated adhesive, or a pressure-sensitive adhesive is used.

【0013】前記の低温活性化タイプの熱賦活性接着剤
や水又は有機溶剤賦活性接着剤の例としては、ホットメ
ルト系接着剤、シリコーン系接着剤、フッ素系接着剤、
紫外線硬化型接着剤、低融点の熱溶融性樹脂を含有して
常温では低接着力で加熱により強い接着力が発現する熱
時感圧接着剤(特開昭56−13040号公報、特公平
2−50146号公報)などがあげられる。
Examples of the low-temperature activation type heat-activatable adhesive and water or organic solvent-activable adhesive include hot melt adhesives, silicone adhesives, fluorine-based adhesives, and the like.
An ultraviolet-curing adhesive, a heat-sensitive pressure-sensitive adhesive containing a low melting point heat-fusible resin and exhibiting a strong adhesive force by heating at room temperature with a low adhesive force (JP-A-56-13040, JP-B-56-13040, -50146).

【0014】また感圧接着剤の例としては、ゴム系感圧
接着剤、アクリル系感圧接着剤、スチレン・共役ジエン
ブロック共重合体系感圧接着剤、シリコーン系感圧接着
剤、紫外線硬化型感圧接着剤、低融点、就中、融点が約
200℃以下の熱溶融性樹脂を配合したクリープ改良型
感圧接着剤などがあげられる(特開昭56−61468
号公報、特開昭61−174857号公報、特開昭63
−17981号公報、特公昭56−13040号公
報)。なお感圧接着剤には、架橋剤や粘着性付与剤、可
塑剤や充填剤、老化防止剤などの適宜な添加剤を配合す
ることができる。
Examples of the pressure-sensitive adhesive include a rubber-based pressure-sensitive adhesive, an acrylic-based pressure-sensitive adhesive, a styrene / conjugated diene block copolymer-based pressure-sensitive adhesive, a silicone-based pressure-sensitive adhesive, and an ultraviolet-curable adhesive. Examples of the pressure-sensitive adhesive include a creep-improved type pressure-sensitive adhesive containing a low-melting point, particularly, a hot-melt resin having a melting point of about 200 ° C. or less (JP-A-56-61468).
JP-A-61-174857 and JP-A-63-174857
-17981, JP-B-56-13040). The pressure-sensitive adhesive may contain appropriate additives such as a crosslinking agent, a tackifier, a plasticizer, a filler, and an antioxidant.

【0015】ちなみに前記ゴム系感圧接着剤の具体例と
しては、天然ゴムや各種の合成ゴムをベースポリマーと
するもの、アクリル系感圧接着剤の具体例としては、メ
チル基やエチル基、プロピル基やブチル基、イソブチル
基やアミル基、イソアミル基やヘキシル基、ヘプチル基
やシクロヘキシル基、2−エチルヘキシル基やイソオク
チル基、イソノニル基やイソデシル基、ドデシル基やラ
ウリル基、トリデシル基やペンタデシル基、ヘキサデシ
ル基やヘプタデシル基、オクタデシル基やノナデシル
基、エイコシル基の如き通例、炭素数が20以下の直鎖
又は分岐のアルキル基を有するアクリル酸やメタクリル
酸のアルキルエステルの1種又は2種以上を用いたアク
リル系重合体をベースポリマーとするものなどがあげら
れる。
Incidentally, specific examples of the rubber-based pressure-sensitive adhesive include those using natural rubber or various synthetic rubbers as base polymers, and specific examples of the acrylic-based pressure-sensitive adhesive include a methyl group, an ethyl group, and a propyl group. Group, butyl group, isobutyl group, amyl group, isoamyl group, hexyl group, heptyl group, cyclohexyl group, 2-ethylhexyl group, isooctyl group, isononyl group, isodecyl group, dodecyl group, lauryl group, tridecyl group, pentadecyl group, hexadecyl One or more alkyl esters of acrylic acid or methacrylic acid having a straight-chain or branched alkyl group having 20 or less carbon atoms, such as a group, a heptadecyl group, an octadecyl group, a nonadecyl group, and an eicosyl group. Examples include those using an acrylic polymer as a base polymer.

【0016】また前記の(メタ)アクリル酸アルキルエ
ステルと、粘着特性の改質等を目的とする他のモノマー
の1種又は2種以上を共重合させてなるポリマーをベー
スポリマーに用いたアクリル系感圧接着剤などもあげら
れる。その共重合モノマーの例としては、アクリル酸や
メタクリル酸、カルボキシエチルアクリレートやカルボ
キシペンチルアクリレート、イタコン酸やマレイン酸、
フマール酸やクロトン酸の如きカルボキシル基含有モノ
マー、無水マレイン酸や無水イタコン酸の如き酸無水物
モノマー、(メタ)アクリル酸2−ヒドロキシエチルや
(メタ)アクリル酸2−ヒドロキシプロピル、(メタ)
アクリル酸4−ヒドロキシブチルの如きヒドロキシル基
含有モノマーがあげられる。
An acrylic base polymer comprising, as a base polymer, a polymer obtained by copolymerizing the above-mentioned alkyl (meth) acrylate and one or more other monomers for the purpose of improving adhesive properties and the like. Pressure-sensitive adhesives and the like are also included. Examples of the copolymerized monomer include acrylic acid and methacrylic acid, carboxyethyl acrylate and carboxypentyl acrylate, itaconic acid and maleic acid,
Carboxyl group-containing monomers such as fumaric acid and crotonic acid; acid anhydride monomers such as maleic anhydride and itaconic anhydride; 2-hydroxyethyl (meth) acrylate and 2-hydroxypropyl (meth) acrylate;
Examples include hydroxyl group-containing monomers such as 4-hydroxybutyl acrylate.

【0017】さらに、スチレンスルホン酸やアリルスル
ホン酸、2−(メタ)アクリルアミド−2−メチルプロ
パンスルホン酸や(メタ)アクリルアミドプロパンスル
ホン酸の如きスルホン酸基含有モノマー、2−ヒドロキ
シエチルアクリロイルホスフェートの如き燐酸基含有モ
ノマー、(メタ)アクリルアミドやN−ブチル(メタ)
アクリルアミド、N−メチロール(メタ)アクリルアミ
ドやN−メチロールプロパン(メタ)アクリルアミドの
如き(N−置換)アミド系モノマー、(メタ)アクリル
酸アミノエチルや(メタ)アクリル酸N,N−ジメチル
アミノエチルの如き(メタ)アクリル酸アルキルアミノ
アルキル系モノマー、(メタ)アクリル酸メトキシエチ
ルや(メタ)アクリル酸エトキシエチルの如き(メタ)
アクリル酸アルコキシアルキル系モノマーなども前記し
た共重合モノマーの例としてあげられる。
Further, sulfonic acid group-containing monomers such as styrenesulfonic acid, allylsulfonic acid, 2- (meth) acrylamido-2-methylpropanesulfonic acid and (meth) acrylamidopropanesulfonic acid, and 2-hydroxyethylacryloyl phosphate. Phosphoric acid group-containing monomer, (meth) acrylamide or N-butyl (meth)
(N-substituted) amide monomers such as acrylamide, N-methylol (meth) acrylamide and N-methylolpropane (meth) acrylamide, aminoethyl (meth) acrylate and N, N-dimethylaminoethyl (meth) acrylate Alkylaminoalkyl (meth) acrylate monomers such as methoxyethyl (meth) acrylate and ethoxyethyl (meth) acrylate
Alkoxyalkyl acrylate monomers and the like are also examples of the above-mentioned copolymerized monomers.

【0018】加えて、N−シクロヘキシルマレイミドや
N−イソプロピルマレイミドの如きマレイミド系モノマ
ー、N−メチルイタコンイミドやN−エチルイタコンイ
ミドの如きイタコンイミド系モノマー、N−(メタ)ア
クリロイルオキシメチレンスクシンイミドやN−(メ
タ)アクリロイル−6−オキシヘキサメチレンスクシン
イミドの如きスクシンイミド系モノマー、酢酸ビニルや
プロピオン酸ビニル、N−ビニルピロリドンやメチルビ
ニルピロリドン、スチレンやα−メチルスチレンの如き
ビニル系モノマー、アクリロニトリルやメタクリロニト
リルの如きシアノアクリレート系モノマー、(メタ)ア
クリル酸グリシジルの如きエポキシ基含有アクリル系モ
ノマー、(メタ)アクリル酸ポリエチレングリコールや
(メタ)アクリル酸ポリプロピレングリコールの如きグ
リコール系アクリルエステルモノマーなども前記した共
重合モノマーの例としてあげられる。
In addition, maleimide monomers such as N-cyclohexylmaleimide and N-isopropylmaleimide, itaconimide monomers such as N-methylitaconimide and N-ethylitaconimide, N- (meth) acryloyloxymethylenesuccinimide and N- Succinimide monomers such as (meth) acryloyl-6-oxyhexamethylene succinimide; vinyl acetate and vinyl propionate; vinyl monomers such as N-vinylpyrrolidone and methylvinylpyrrolidone; styrene and α-methylstyrene; acrylonitrile and methacrylonitrile Cyanoacrylate monomers such as glycidyl (meth) acrylate; epoxy group-containing acrylic monomers such as glycidyl (meth) acrylate; polyethylene glycol (meth) acrylate and (meth) acrylic acid Such as such as glycol acrylic ester monomers polypropylene glycol may be mentioned as examples of the copolymerizable monomer described above.

【0019】またさらに、(メタ)アクリル酸テトラヒ
ドロフルフリルやフッ素(メタ)アクリレート、シリコ
ーン(メタ)アクリレートや2−メトキシエチルアクリ
レートの如きアクリル酸エステル系モノマー、ヘキサン
ジオールジ(メタ)アクリレートや(ポリ)エチレング
リコールジ(メタ)アクリレート、(ポリ)プロピレン
グリコールジ(メタ)アクリレートやネオペンチルグリ
コールジ(メタ)アクリレート、ペンタエリスリトール
ジ(メタ)アクリレートやトリメチロールプロパントリ
(メタ)アクリレート、ペンタエリスリトールトリ(メ
タ)アクリレートやジペンタエリスリトールヘキサ(メ
タ)アクリレート、エポキシアクリレートやポリエステ
ルアクリレート、ウレタンアクリレートの如き多官能モ
ノマー、その他、イソプレンやブタジエン、イソブチレ
ンやビニルエーテルなども前記した共重合モノマーの例
としてあげられる。
Further, acrylate monomers such as tetrahydrofurfuryl (meth) acrylate and fluorine (meth) acrylate, silicone (meth) acrylate and 2-methoxyethyl acrylate, hexanediol di (meth) acrylate and (poly) ) Ethylene glycol di (meth) acrylate, (poly) propylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, pentaerythritol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tri ( Polyfunctional monomers such as (meth) acrylate, dipentaerythritol hexa (meth) acrylate, epoxy acrylate, polyester acrylate, and urethane acrylate; Isoprene and butadiene, isobutylene and vinyl ether may be mentioned as examples of the copolymerizable monomer described above.

【0020】ベース基材と保持層を接着する接着層の形
成は、例えば液状の接着剤をベース基材と保持層の一方
又は両方の接着面に塗布する方式や、セパレータ上に形
成した接着層をベース基材と保持層の一方又は両方の接
着面に移設する方式などの適宜な方式で形成してよい。
接着層の厚さは、接着力などに応じて適宜に決定しうる
が、一般には1〜500μm、就中5〜200μm、特に
10〜100μmとされる。
The formation of the adhesive layer for bonding the base material and the holding layer may be performed, for example, by applying a liquid adhesive to one or both of the bonding surfaces of the base material and the holding layer, or by forming an adhesive layer formed on the separator. May be formed by an appropriate method such as a method of transferring to a bonding surface of one or both of the base material and the holding layer.
The thickness of the adhesive layer can be appropriately determined according to the adhesive strength and the like, but is generally 1 to 500 μm, preferably 5 to 200 μm, particularly 10 to 100 μm.

【0021】なおベース基材や保持層における接着層や
熱膨張性層等の付設面には、密着力の向上等を目的に、
例えばクロム酸処理方式やオゾン暴露方式、火炎暴露方
式や高圧電撃暴露方式、イオン化放射線処理方式などの
適宜な方式による表面処理を施すことができる。
The surface of the base material or the holding layer, such as the adhesive layer or the heat-expandable layer, on which the adhesive layer and the heat-expandable layer are attached, may be used for the purpose of improving the adhesion.
For example, a surface treatment can be performed by an appropriate method such as a chromic acid treatment method, an ozone exposure method, a flame exposure method, a high-voltage piezoelectric exposure method, and an ionizing radiation treatment method.

【0022】保持層の上方に設ける接着性を有する熱膨
張性層は、切断等の加工に耐える被着体の接着保持と、
加熱による発泡及び/又は膨張処理を介し被着体との接
着力を低減ないし喪失させて、切断等の加工を終えた被
着体を任意な時に接着シートより容易に剥離できるよう
にすることを目的とし、接着性物質に熱膨張性微小球を
配合することにより形成される。
The heat-expandable layer having an adhesive property provided above the holding layer is used for bonding and holding an adherend that can withstand processing such as cutting.
To reduce or lose the adhesive force with the adherend through foaming and / or expansion treatment by heating so that the adherend after processing such as cutting can be easily peeled off from the adhesive sheet at any time. For the purpose, it is formed by blending the heat-expandable microspheres with the adhesive substance.

【0023】熱膨張性層の形成に用いる接着性物質とし
ては、熱膨張性微小球の発泡及び/又は膨張を許容する
ものが用いられ、一般には上記の接着層で例示した低温
活性化タイプの熱賦活性接着剤、水又は有機溶剤賦活性
接着剤、あるいは感圧接着剤などが用いられる。就中、
前記熱膨張性微小球の発泡及び/又は膨張を可及的に拘
束しないものが好ましく、その点や被着体の接着処理の
簡便性の点などより感圧接着剤が好ましい。
As the adhesive substance used for forming the heat-expandable layer, a substance which allows the expansion and / or expansion of the heat-expandable microspheres is used. Generally, the low-temperature activation type exemplified in the above-mentioned adhesive layer is used. A heat activated adhesive, a water or organic solvent activated adhesive, a pressure sensitive adhesive, or the like is used. Above all,
It is preferable that the expansion and / or expansion of the heat-expandable microspheres is not restricted as much as possible, and a pressure-sensitive adhesive is preferable in view of this point and the simplicity of the adhesion treatment of the adherend.

【0024】また熱膨張性微小球としては、例えばイソ
ブタンやプロパンやペンタンの如く容易にガス化して熱
膨張性を示す適宜な物質を、コアセルベーション法や界
面重合法等で殻形成物質内に内包させたものなどがあげ
られる。平均粒径が1〜50μmの熱膨張性微小球が混
合性や薄層形成性などの点より好ましい。
As the heat-expandable microspheres, for example, an appropriate substance which easily gasifies and exhibits a heat expansion property, such as isobutane, propane, or pentane, is put into a shell-forming substance by a coacervation method, an interfacial polymerization method, or the like. Included ones. The heat-expandable microspheres having an average particle size of 1 to 50 μm are preferable from the viewpoint of mixing properties and thin-layer forming properties.

【0025】なお熱膨脹性微小球を形成する殻形成物質
としては、例えば塩化ビニリデン・アクリロニトリル共
重合体やポリビニルアルコール、ポリビニルブチラール
やポリメチルメタクリレート、ポリアクリロニトリルや
ポリ塩化ビニリデン、ポリスルホンなどが一般的である
が、本発明においては熱溶融性物質や熱膨張で破壊する
物質などからなっていてればよい。
As the shell-forming substance forming the heat-expandable microspheres, for example, vinylidene chloride-acrylonitrile copolymer, polyvinyl alcohol, polyvinyl butyral, polymethyl methacrylate, polyacrylonitrile, polyvinylidene chloride, polysulfone and the like are generally used. However, in the present invention, any material may be used as long as it is made of a heat-meltable substance or a substance which is destroyed by thermal expansion.

【0026】熱膨張性層の形成は、例えば接着性物質と
熱膨張性微小球を必要に応じ溶媒を用いて混合し、その
混合物を保持層又は後記するゴム状有機弾性層の上に塗
布する方式などにより行うことができる。
The heat-expandable layer is formed, for example, by mixing an adhesive substance and heat-expandable microspheres with a solvent as necessary, and applying the mixture onto a holding layer or a rubber-like organic elastic layer described later. It can be performed by a method or the like.

【0027】熱膨張性微小球の配合量は、熱膨張性層を
膨脹させる程度や接着力の低減化率などにより適宜に決
定しうるが、一般には接着性物質100重量部あたり、
1〜200重量部、就中10〜150重量部、特に25
〜120重量部とされる。熱膨張性層の厚さは、発泡性
ないし膨脹性や膨脹後の凝集破壊による被着体への糊残
り防止などの点より、300μm以下、就中5〜250
μm、特に10〜150μmが好ましい。
The amount of the heat-expandable microspheres can be appropriately determined according to the degree of expansion of the heat-expandable layer and the rate of reduction in adhesive strength.
1 to 200 parts by weight, preferably 10 to 150 parts by weight, especially 25
To 120 parts by weight. The thickness of the heat-expandable layer is 300 μm or less, preferably 5 to 250 μm, from the viewpoint of foaming or swelling and preventing adhesive residue on the adherend due to cohesive failure after expansion.
μm, particularly preferably 10 to 150 μm.

【0028】本発明においては保持層と熱膨張性層との
間にゴム状有機弾性層を介在させることもできる。ゴム
状有機弾性層は、保持層と熱膨張性層の密着力を高める
働き、接着シートを被着体に接着する際にその表面が被
着体の表面形状に良好に追従して大きい接着面積、ひい
ては大きい接着力を発現させる働き、熱膨張性層を加熱
して発泡及び/又は膨張させる際に接着シートの面方向
における発泡及び/又は膨張の拘束を少なくして熱膨張
性層が凹凸状の三次元的構造に変形することを助長する
働きをする。
In the present invention, a rubbery organic elastic layer can be interposed between the holding layer and the heat-expandable layer. The rubber-like organic elastic layer works to increase the adhesion between the holding layer and the heat-expandable layer, and the surface of the adhesive sheet adheres well to the surface shape of the adherend when the adhesive sheet is adhered to the adherend. When the thermally expandable layer is heated and expanded and / or expanded, the expansion and / or expansion in the surface direction of the adhesive sheet is reduced so that the thermally expandable layer becomes uneven. It helps to transform into a three-dimensional structure.

【0029】すなわち前記において熱膨張性層は、それ
を加熱して発泡及び/又は膨張させることで凹凸状の表
面を形成するが、ゴム状有機弾性層を介在させることで
熱膨張性層の発泡及び/又は膨張する力がゴム状有機弾
性層の弾性率による抗力に勝って熱膨張性層の凹凸状の
変形が大きくなり、図3に例示した如くウネリ構造ない
し波形構造の三次元的な大きな変形を安定して形成する
ことができ、加熱処理による接着面積の減少が効率的に
達成されて被着体の剥離を容易とする接着強度の低減な
いし喪失がより確実に実現される。
That is, in the above description, the heat-expandable layer forms an uneven surface by heating and foaming and / or expanding. However, the foaming of the heat-expandable layer is performed by interposing the rubber-like organic elastic layer. And / or the expanding force overcomes the drag due to the elastic modulus of the rubber-like organic elastic layer, so that the unevenness of the thermally expandable layer becomes large, and the three-dimensionally large undulation structure or corrugated structure as illustrated in FIG. The deformation can be formed stably, and the reduction in the bonding area by the heat treatment is efficiently achieved, and the reduction or loss of the bonding strength that facilitates the peeling of the adherend is more reliably realized.

【0030】前記熱膨張性層の凹凸状の三次元的構造変
形性などの点よりゴム状有機弾性層の形成には、AST
M D−2240のD型ショアーによるショアーD型硬
度に基づいて50以下、好ましくは40以下の天然ゴム
や合成ゴム、又はゴム弾性を有する合成樹脂などが好ま
しく用いうる。
In order to form the rubber-like organic elastic layer from the viewpoint of the irregular three-dimensional structural deformability of the heat-expandable layer, AST is used.
Natural rubber or synthetic rubber having a Shore D hardness of 50 or less, preferably 40 or less based on the D-type Shore of MD-2240, or a synthetic resin having rubber elasticity can be preferably used.

【0031】前記の合成ゴム又は合成樹脂としては、例
えばニトリル系、ジエン系、アクリル系などの合成ゴ
ム、ポリオレフィン系やポリエステル系の如き熱可塑性
エラストマー、エチレン−酢酸ビニル共重合体、ポリウ
レタン、ポリブタジエン、軟質ポリ塩化ビニルなどのゴ
ム弾性を有する合成樹脂などがあげられる。なお、ポリ
塩化ビニルの如く本質的には硬質系のポリマーであって
も可塑剤や柔軟剤等の配合剤との組合せでゴム弾性をも
たせたものも本発明においては用いうる。
Examples of the synthetic rubber or synthetic resin include synthetic rubbers such as nitrile, diene, and acrylic resins, thermoplastic elastomers such as polyolefin and polyester, ethylene-vinyl acetate copolymer, polyurethane, polybutadiene, and the like. Synthetic resins having rubber elasticity such as soft polyvinyl chloride and the like can be mentioned. In the present invention, an essentially hard polymer, such as polyvinyl chloride, having rubber elasticity in combination with a compounding agent such as a plasticizer or a softening agent may be used.

【0032】ゴム状有機弾性層の形成は、天然ゴム、合
成ゴム又はゴム弾性を有する合成樹脂の溶液を保持層に
塗布する方式や、前記成分からなるフィルム等を保持層
と接着する方式などの適宜な方式で行ってよい。なお本
発明においてゴム状有機弾性層は、天然ゴムや合成ゴム
又はゴム弾性を有する合成樹脂を主成分とする感圧接着
層で形成されていてもよく、またかかる成分を主体とす
る発泡フィルム等で形成されていてもよい。
The rubbery organic elastic layer may be formed by a method of applying a solution of natural rubber, synthetic rubber or synthetic resin having rubber elasticity to the holding layer, a method of bonding a film or the like comprising the above components to the holding layer, or the like. It may be performed by an appropriate method. In the present invention, the rubbery organic elastic layer may be formed of a pressure-sensitive adhesive layer containing natural rubber, synthetic rubber, or a synthetic resin having rubber elasticity as a main component, or a foamed film mainly containing such a component. May be formed.

【0033】保持層と熱膨張性層の密着力や、被着体と
の接着面積を大きくする変形性などの点よりは、感圧接
着層からなるゴム状有機弾性層が好ましい。またゴム状
有機弾性層の厚さは、熱膨張性層の凹凸状の三次元的構
造変形性などの点より、0.1〜300μm、就中5〜
250μm、特に10〜150μmが好ましい。
A rubbery organic elastic layer composed of a pressure-sensitive adhesive layer is preferred from the viewpoint of the adhesion between the holding layer and the heat-expandable layer and the deformability for increasing the adhesion area with the adherend. The thickness of the rubber-like organic elastic layer is 0.1 to 300 μm, preferably 5 to 5 μm, in view of the three-dimensional structural deformability of the thermal expansion layer.
250 μm, particularly preferably 10 to 150 μm, is preferred.

【0034】本発明の接着シートには、図2に例示した
如く、ベース基材1の保持層を有しない側に、接着シー
トを支持体に固定することなどを目的とする感圧接着層
11を設けるもできる。その感圧接着層の形成には、上
記の接着層で例示した感圧接着剤などを用いうる。
As shown in FIG. 2, the adhesive sheet of the present invention has a pressure-sensitive adhesive layer 11 for fixing the adhesive sheet to a support on the side of the base substrate 1 having no holding layer. Can also be provided. For the formation of the pressure-sensitive adhesive layer, the pressure-sensitive adhesive exemplified for the above-mentioned adhesive layer can be used.

【0035】なお接着シートの表面に熱膨張性層や感圧
接着層が露出する場合には、図2に例示の如く実用に供
するまでの間、セパレータ7を仮着して保護することが
好ましい。セパレータは、例えばシリコーン系樹脂や長
鎖アクリル系樹脂、フッ素系樹脂等で代表される剥離剤
の表面コートを設けた基材、ポリエチレンやポリプロピ
レンの如き無極性ポリマーからなる接着力の弱い基材な
どとして得ることができる。
When the heat-expandable layer or the pressure-sensitive adhesive layer is exposed on the surface of the adhesive sheet, it is preferable to temporarily attach and protect the separator 7 until practical use as shown in FIG. . The separator is, for example, a substrate provided with a surface coat of a release agent represented by a silicone-based resin, a long-chain acrylic resin, a fluorine-based resin, or the like, or a substrate having a weak adhesive force made of a nonpolar polymer such as polyethylene or polypropylene. Can be obtained as

【0036】本発明の接着シートは、適宜な物品等から
なる被着体を永久的に接着しておく用途にも用いうる
が、熱膨張性層を介し被着体を強固に接着でき、かつそ
の接着状態を解きたいときには加熱処理により接着力を
低減ないし喪失させて被着体を容易に剥離できるもので
あることより、被着体を所定期間接着したのち接着目的
達成後、その接着状態を解くことが要求される、あるい
は望まれる用途に好ましく用いうる。
The adhesive sheet of the present invention can be used for the purpose of permanently bonding an adherend made of an appropriate article or the like, but can firmly adhere the adherend via a heat-expandable layer, and When the adhesion state is desired to be released, the adherence is reduced or lost by a heat treatment, and the adherend can be easily peeled off. It can be preferably used for applications where it is required or desired to unravel.

【0037】ちなみに前記用途の例としては、回路パタ
ーンを形成した半導体ウエハの裏面を研磨して薄くする
工程でのウエハ固定材、各種の電気装置又は電子装置や
ディスプレイ装置等の組立工程における部品の搬送用や
仮止め用等のキャリヤテープや仮止め材又は固定材、金
属板やプラスチック板、ガラス板等の汚染損傷防止を目
的とした表面保護材やマスキング材などがあげられる。
Incidentally, examples of the above-mentioned applications include a wafer fixing material in a step of polishing and thinning the back surface of a semiconductor wafer on which a circuit pattern is formed, and a method of assembling parts in an assembling step of various electric or electronic devices and display devices. Carrier tapes for transporting and temporary fixing, temporary fixing materials or fixing materials, surface protective materials and masking materials for the purpose of preventing contamination and damage of metal plates, plastic plates, glass plates and the like.

【0038】特に好ましい用途は、例えば必要に応じ前
記の裏面研磨工程に連続して回路パターンを形成した半
導体ウエハを所定のチップサイズに切断する工程、ある
いは必要に応じ接着シート上にセラミックグリーンシー
トを所定の回路を印刷しつつ積層固定し、その積層コン
デンサシートを所定のチップサイズに切断する工程など
の切断片を製造する場合に、その被切断体の固定に用い
る方法である。
A particularly preferable application is, for example, a step of cutting a semiconductor wafer on which a circuit pattern is formed into a predetermined chip size, if necessary, or a ceramic green sheet on an adhesive sheet, if necessary. This is a method used for fixing a body to be cut when manufacturing a cut piece such as a step of printing and laminating and fixing a predetermined circuit and cutting the multilayer capacitor sheet into a predetermined chip size.

【0039】前記切断片の製造方法の実施は、例えば図
1に例示した如く本発明の接着シートにおける熱膨張性
層4に被切断体5を接着保持してその被切断体を所定寸
法に、接着シートの保持層3を含みベース基材1を分離
しない深さで切断6する工程、前記切断工程後、接着シ
ートの熱膨張性層4を加熱し発泡又は膨張処理して接着
力を低減又は喪失させると共に(図3:4)、ベース基
材を伸長させて、切断により形成した切断片を回収する
工程を少なくとも有する方法として実施することができ
る。
The method of manufacturing the cut piece is carried out, for example, by bonding and holding the object 5 to the thermally expandable layer 4 of the adhesive sheet of the present invention as shown in FIG. A step of cutting 6 at a depth that does not separate the base substrate 1 including the holding layer 3 of the adhesive sheet; The method can be performed as a method having at least a step of recovering the cut pieces formed by cutting by elongating the base substrate while losing (FIG. 3: 4).

【0040】熱膨張性層と被切断体としての被着体との
接着処理は、例えばゴムローラやラミネートロール、あ
るいはプレス装置等の適宜な押圧手段を介して圧着処理
する方式などにより行うことができる。その際、接着性
物質のタイプに応じて必要に応じ熱膨張性微小球が膨脹
しない温度範囲で加熱したり、水や有機溶剤を塗布して
接着性物質を賦活させたりすることもできる。
The adhesive treatment between the heat-expandable layer and the adherend as the object to be cut can be carried out by, for example, a method such as a rubber roller, a laminating roll, or a pressure-bonding treatment through an appropriate pressing means such as a press device. . At this time, depending on the type of the adhesive substance, if necessary, the adhesive may be heated in a temperature range where the thermally expandable microspheres do not expand, or the adhesive substance may be activated by applying water or an organic solvent.

【0041】一方、熱膨張性層の接着力を低減ないし喪
失させて被着体(切断片)の剥離を容易とする発泡又は
/及び膨脹処理の加熱条件は、被着体の表面状態や熱膨
張性微小球の種類等による接着面積の減少性、接着シー
トや被着体の耐熱性等の条件により決められるが、一般
的な条件は350℃以下、就中300℃以下、特に10
0〜250℃、5分間以下、就中3分間以下、特に1〜
90秒間である。その加熱処理は、接着シートの使用目
的に応じて適宜な段階で行うことができる。
On the other hand, the heating conditions of the foaming and / or expansion treatment for facilitating the peeling of the adherend (cut pieces) by reducing or losing the adhesive force of the heat-expandable layer depend on the surface condition of the adherend and the heat treatment. It is determined by conditions such as the decrease in the adhesive area due to the type of the expandable microspheres, the heat resistance of the adhesive sheet and the adherend, etc., but general conditions are 350 ° C. or less, especially 300 ° C. or less, and particularly 10 ° C. or less.
0 to 250 ° C, 5 minutes or less, especially 3 minutes or less, especially 1 to
90 seconds. The heat treatment can be performed at an appropriate stage depending on the purpose of use of the adhesive sheet.

【0042】形成した切断片の回収は、ベース基材を伸
長して切断片間の間隙を拡げた状態で行う。従って、チ
ップ側面の掴み方式などによる半導体チップのピックア
ップ回収方式や、バインダを介した形成チップの再接着
を防止した積層コンデンサチップの回収方式等の適宜な
方式を適用して切断片を回収することができる。なお被
着体の切断には、押切刃や回転刃等による従来の方式を
適用することができる。また前記のベース基材を伸長処
理する段階は、熱膨張性層を発泡又は膨張処理する前後
のいずれであってもよい。
The formed cut pieces are collected in a state where the base material is elongated to widen the gap between the cut pieces. Therefore, it is necessary to collect a cut piece by applying an appropriate method such as a pickup method of a semiconductor chip by a method of gripping a chip side surface or a method of collecting a multilayer capacitor chip that prevents re-adhesion of a formed chip via a binder. Can be. Note that a conventional method using a pressing blade, a rotary blade, or the like can be used for cutting the adherend. The step of extending the base material may be before or after foaming or expanding the thermally expandable layer.

【0043】[0043]

【実施例】【Example】

実施例1 厚さ75μmの軟質ポリ塩化ビニルフィルムの片面にア
クリル系感圧接着剤Aのトルエン溶液を塗布し乾燥させ
て厚さ10μmの感圧接着層を設けた。一方、厚さ50
μmのポリエステルフィルムの片面に前記アクリル系感
圧接着剤Aのトルエン溶液に熱膨張性微小球を配合した
混合液を塗布し乾燥させて厚さ40μmの熱膨張性層を
設けた。ついで前記軟質ポリ塩化ビニルフィルムの感圧
接着層の上に前記ポリエステルフィルムをその露出面を
介し配置し圧着して接着シートを得た。
Example 1 A toluene solution of an acrylic pressure-sensitive adhesive A was applied to one side of a soft polyvinyl chloride film having a thickness of 75 μm and dried to form a pressure-sensitive adhesive layer having a thickness of 10 μm. On the other hand, thickness 50
A mixture of heat-expandable microspheres and a toluene solution of the acrylic pressure-sensitive adhesive A was applied to one side of a μm polyester film and dried to form a heat-expandable layer having a thickness of 40 μm. Then, the polyester film was disposed on the pressure-sensitive adhesive layer of the soft polyvinyl chloride film via the exposed surface thereof and pressed to obtain an adhesive sheet.

【0044】なお前記のアクリル系感圧接着剤Aは、ア
クリル酸ブチル50部(重量部、以下同じ)、アクリル
酸エチル50部及びアクリル酸5部からなる共重合体1
00部にフェノール樹脂系粘着付与剤25部とポリイソ
シアネート系架橋剤3部を配合したものからなり、熱膨
張性層はそれに熱膨張性微小球(松本油脂製薬社製、マ
ツモトマイクロスフェアF−50D)25部を追加配合
したものである。
The acrylic pressure-sensitive adhesive A was a copolymer 1 comprising 50 parts of butyl acrylate (parts by weight, the same applies hereinafter), 50 parts of ethyl acrylate and 5 parts of acrylic acid.
The heat-expandable layer is composed of heat-expandable microspheres (Matsumoto Microsphere F-50D, manufactured by Matsumoto Yushi Seiyaku Co., Ltd.) in which 00 parts are blended with 25 parts of a phenolic resin tackifier and 3 parts of a polyisocyanate crosslinker. ) 25 parts additionally.

【0045】次に前記接着シートの熱膨張性層面に、縦
120mm、横100mm、厚さ0.5mmのセラミックシー
トを圧着して接着保持し、それをダイシングリングに装
着固定して押切刃を介し5mm×5mmのチップサイズに、
ポリエステルフィルムに及びかつ軟質ポリ塩化ビニルフ
ィルムには及ばない深さでフルカットした後、ダイシン
グリングに装着固定した状態で前記セラミックシートと
縦横同寸の治具に押し付けて軟質ポリ塩化ビニルフィル
ムをエキスパンドし、チップ間隔を拡張してそれを13
0℃のホットプレート上で60秒間加熱して熱膨張性層
を膨脹処理し、鉄板上で冷却後、ダイシングリングを介
し反転振動させてチップをクッション上に落下させ回収
した。
Next, a ceramic sheet having a length of 120 mm, a width of 100 mm and a thickness of 0.5 mm is pressure-bonded and held on the surface of the heat-expandable layer of the adhesive sheet, attached and fixed to a dicing ring, and fixed through a pressing blade. 5mm x 5mm chip size,
After the full cut at a depth that does not reach the polyester film and that of the flexible polyvinyl chloride film, the flexible polyvinyl chloride film is expanded by pressing it on a jig of the same length and width as the ceramic sheet while being fixed to the dicing ring. And increase the chip spacing to 13
The heat-expandable layer was expanded by heating on a hot plate at 0 ° C. for 60 seconds, cooled on an iron plate, and then inverted and vibrated through a dicing ring to drop the chip onto a cushion and collect it.

【0046】実施例2 厚さ100μmの軟質ポリ塩化ビニルフィルムの片面に
アクリル系感圧接着剤Bのトルエン溶液を塗布し乾燥さ
せて厚さ10μmの感圧接着層を設けた。一方、厚さ5
0μmのレーヨン不織布の片面に厚さ50μmのゴム状有
機弾性層を設けた。他方、セパレータ上に熱膨張性微小
球を配合した前記アクリル系感圧接着剤Bのトルエン溶
液を塗布し乾燥させて厚さ50μmの熱膨張性層を形成
し、それを前記のゴム状有機弾性層の上に移着した。つ
いで前記軟質ポリ塩化ビニルフィルムの感圧接着層の上
に前記レーヨン不織布をその露出面を介し配置し圧着し
て接着シートを得た。
Example 2 A toluene solution of an acrylic pressure-sensitive adhesive B was applied to one side of a soft polyvinyl chloride film having a thickness of 100 μm and dried to form a pressure-sensitive adhesive layer having a thickness of 10 μm. On the other hand, thickness 5
A 50 μm thick rubbery organic elastic layer was provided on one side of a 0 μm rayon nonwoven fabric. On the other hand, a toluene solution of the acrylic pressure-sensitive adhesive B containing heat-expandable microspheres mixed on a separator is applied and dried to form a heat-expandable layer having a thickness of 50 μm. Transferred over layer. Then, the rayon nonwoven fabric was placed on the pressure-sensitive adhesive layer of the soft polyvinyl chloride film via the exposed surface thereof and pressed to obtain an adhesive sheet.

【0047】なお前記のアクリル系感圧接着剤Bは、ア
クリル酸ブチル100部と酢酸ビニル5部とアクリル酸
3部からなる共重合体100部にポリイソシアネート系
架橋剤5部を配合したものからなり、熱膨張性層はそれ
に熱膨張性微小球(松本油脂製薬社製、マツモトマイク
ロスフェアF−301D)100部を追加配合したもの
である。またゴム状有機弾性層は、前記共重合体100
部にフェノール樹脂系粘着付与剤40部とポリイソシア
ネート系架橋剤2部を配合したトルエン溶液を塗布し乾
燥させて形成した。
The acrylic pressure-sensitive adhesive B is prepared by blending 100 parts of a copolymer consisting of 100 parts of butyl acrylate, 5 parts of vinyl acetate and 3 parts of acrylic acid with 5 parts of a polyisocyanate crosslinking agent. The heat-expandable layer is obtained by additionally blending 100 parts of heat-expandable microspheres (Matsumoto Microsphere F-301D, manufactured by Matsumoto Yushi-Seiyaku Co., Ltd.). The rubber-like organic elastic layer is formed of the copolymer 100
A toluene solution in which 40 parts of a phenolic resin-based tackifier and 2 parts of a polyisocyanate-based cross-linking agent were applied was coated and dried.

【0048】次に前記の接着シートを用いて実施例1に
準じ処理して(レーヨン不織布のフルカット)チップを
回収した。ただし、チップサイズは2mm×2mmとし、熱
膨張性層の膨脹処理は100℃、60秒間の条件で行っ
た。
Next, using the above-mentioned adhesive sheet, treatment was carried out in accordance with Example 1 (full cut of rayon nonwoven fabric) to collect chips. However, the chip size was 2 mm × 2 mm, and the thermal expansion layer was expanded at 100 ° C. for 60 seconds.

【0049】比較例1 実施例1に準じて、軟質ポリ塩化ビニルフィルムとその
上の感圧接着層を有しない形態の接着シートを得、それ
を用いてチップの製造と回収を行った。
Comparative Example 1 An adhesive sheet having no flexible polyvinyl chloride film and no pressure-sensitive adhesive layer thereon was obtained according to Example 1, and chips were produced and recovered using the adhesive sheet.

【0050】比較例2 比較例1に準じ、ポリエステルフィルムを軟質ポリ塩化
ビニルフィルムに置換した接着シートを得、それを用い
てチップの製造と回収を行った。
Comparative Example 2 An adhesive sheet in which a polyester film was replaced with a soft polyvinyl chloride film was obtained according to Comparative Example 1, and chips were produced and recovered using the adhesive sheet.

【0051】評価試験 実施例、比較例で得た幅20mmの接着シートを、厚さ
0.5mmのSUS304BA板に接着し、その180度ピール接
着力(剥離速度300mm/分、23℃)を測定する方式
で、加熱前(初期)接着力及び上記の条件で加熱処理し
たのちの接着力を調べた。
Evaluation Test The adhesive sheet having a width of 20 mm obtained in each of Examples and Comparative Examples was adhered to a SUS304BA plate having a thickness of 0.5 mm, and its 180-degree peel adhesive force (peeling speed: 300 mm / min, 23 ° C.) was measured. The adhesive strength before (initial) heating and the adhesive strength after heat treatment under the above conditions were examined.

【0052】前記の結果をチップ回収率と共に次表に示
した。なおチップ回収率は、バインダによるチップ間の
接着がなくて分離作業の必要がなく、かつ欠損品等の不
良品を省いた規格合格品の歩留まりとして評価した。
The above results are shown in the following table together with the chip recovery rate. Note that the chip recovery rate was evaluated as the yield of standard-accepted products that did not require separation work because there was no bonding between chips by a binder and that omitted defective products such as defective products.

【0053】なお前記において実施例2では、加熱処理
後における断面を含む状態を撮影した拡大写真より、ゴ
ム状有機弾性層と膨張状態の熱膨張性層とが一体的に三
次元的に変形してウネリ構造を形成していることが確認
できた。実施例1では、熱膨張性層の膨張状態の大小に
基づく小さい凹凸は形成されていたが、ウネリ構造とは
認められなかった。
In Example 2 described above, the rubber-like organic elastic layer and the thermally expandable layer in the expanded state are integrally three-dimensionally deformed from the enlarged photograph of the state including the cross section after the heat treatment. Thus, it was confirmed that an undulation structure was formed. In Example 1, although small irregularities were formed based on the size of the expanded state of the thermally expandable layer, it was not recognized as a undulating structure.

【0054】また比較例1では、ポリエステルフィルム
の伸長不足で、チップ間の接着したものが多く、分離処
理が必要であった。一方、軟質ポリ塩化ビニルフィルム
ではエキスパンド後の加熱処理時にフィルムが軟化して
熱膨張性層の膨張エネルギがチップを剥離させるように
働かず、反転振動させてもチップが剥離せずにその一部
が熱膨張性層に接着したまま残存した。
In Comparative Example 1, many of the polyester films were adhered due to insufficient elongation of the polyester film, and a separation treatment was required. On the other hand, in the case of a soft polyvinyl chloride film, the film softens during the heat treatment after the expansion, and the expansion energy of the heat-expandable layer does not work to peel off the chip. Remained adhered to the heat-expandable layer.

【図面の簡単な説明】[Brief description of the drawings]

【図1】接着シート例の断面図FIG. 1 is a cross-sectional view of an example of an adhesive sheet.

【図2】他の接着シート例の断面図FIG. 2 is a cross-sectional view of another example of an adhesive sheet.

【図3】加熱処理後の接着シートの状態説明図FIG. 3 is an explanatory diagram of a state of an adhesive sheet after a heat treatment.

【符号説明】[Description of sign]

1:ベース基材 2:接着層 3:保持層 4:熱膨張性層 41:ゴム状有機弾性層 5:被切断体(被着体) 6:カット線 1: base material 2: adhesive layer 3: holding layer 4: thermally expandable layer 41: rubber-like organic elastic layer 5: cut object (adhered object) 6: cut line

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】 伸長性のベース基材の上に接着層を介し
て切断可能な保持層を有し、その上に熱膨張性微小球含
有の接着性を有する熱膨張性層を少なくとも有すること
を特徴とする接着シート。
1. An extensible base material having a holding layer that can be cut through an adhesive layer, and at least a heat-expandable layer having heat-expandable microsphere-containing adhesive thereon. An adhesive sheet characterized by the above-mentioned.
【請求項2】 請求項1において、保持層と熱膨張性層
の間にゴム状有機弾性層を有する接着シート。
2. The adhesive sheet according to claim 1, wherein a rubbery organic elastic layer is provided between the holding layer and the thermally expandable layer.
【請求項3】 請求項1又は2において、熱膨張性層が
その加熱による発泡又は膨張処理により、凹凸状の三次
元的構造を形成する接着シート。
3. The adhesive sheet according to claim 1, wherein the heat-expandable layer forms an uneven three-dimensional structure by foaming or expanding by heating.
【請求項4】 請求項1〜3において、熱膨張性層が感
圧接着層からなる接着シート。
4. The adhesive sheet according to claim 1, wherein the heat-expandable layer comprises a pressure-sensitive adhesive layer.
【請求項5】 請求項2〜4において、ゴム状有機弾性
層が感圧接着層からなる接着シート。
5. The adhesive sheet according to claim 2, wherein the rubbery organic elastic layer comprises a pressure-sensitive adhesive layer.
【請求項6】 請求項1〜5において、ベース基材の保
持層を有しない側に感圧接着層を有する接着シート。
6. The adhesive sheet according to claim 1, wherein a pressure-sensitive adhesive layer is provided on a side of the base material having no holding layer.
【請求項7】 請求項1〜6において、ベース基材がポ
リ塩化ビニルフィルムからなる接着シート。
7. The adhesive sheet according to claim 1, wherein the base material comprises a polyvinyl chloride film.
【請求項8】 請求項1〜7に記載の接着シートにおけ
る熱膨張性層に被切断体を接着保持してその被切断体を
所定寸法に、接着シートの保持層を含みベース基材を分
離しない深さで切断する工程、前記切断工程後、接着シ
ートの熱膨張性層を加熱し発泡又は膨張処理して接着力
を低減又は喪失させると共にベース基材を伸長させて、
切断により形成した切断片を回収する工程を少なくとも
有することを特徴とする切断片の製造方法。
8. An adhesive sheet according to claim 1, wherein the object to be cut is adhered to and held by the heat-expandable layer, and the object to be cut is separated into a predetermined size. Step of cutting at a depth that does not, after the cutting step, heating the heat-expandable layer of the adhesive sheet to expand or expand the base material while reducing or losing the adhesive force by foaming or expanding treatment,
A method for producing cut pieces, comprising at least a step of collecting cut pieces formed by cutting.
JP17322497A 1997-06-13 1997-06-13 Method for manufacturing adhesive sheet and cut piece Expired - Lifetime JP3847904B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17322497A JP3847904B2 (en) 1997-06-13 1997-06-13 Method for manufacturing adhesive sheet and cut piece

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17322497A JP3847904B2 (en) 1997-06-13 1997-06-13 Method for manufacturing adhesive sheet and cut piece

Publications (2)

Publication Number Publication Date
JPH111671A true JPH111671A (en) 1999-01-06
JP3847904B2 JP3847904B2 (en) 2006-11-22

Family

ID=15956448

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17322497A Expired - Lifetime JP3847904B2 (en) 1997-06-13 1997-06-13 Method for manufacturing adhesive sheet and cut piece

Country Status (1)

Country Link
JP (1) JP3847904B2 (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000169808A (en) * 1998-09-30 2000-06-20 Nitto Denko Corp Thermal peeling type adhesive sheet
JP2001319897A (en) * 2000-05-11 2001-11-16 Disco Abrasive Syst Ltd Method of dividing semiconductor wafer
JP2002121505A (en) * 2000-10-18 2002-04-26 Nitto Denko Corp Energy ray-curable heat-peelable pressure-sensitive adhesive sheet and method for producing cut pieces using the same
JP2002167559A (en) * 2000-11-30 2002-06-11 Nitto Denko Corp Weir material and method of manufacturing sealed electronic component using this weir material
WO2003012858A1 (en) * 2001-07-30 2003-02-13 Nitto Denko Corporation Method of heat-peeling chip cut pieces from heat peel type adhesive sheet, electronic part, and circuit board
JP2003119439A (en) * 2001-10-17 2003-04-23 Kureha Elastomer Co Ltd Thermally releasable self-adhesive sheet
JP2006152308A (en) * 2005-12-28 2006-06-15 Nitto Denko Corp Cutting method of electronic parts
JP2007231187A (en) * 2006-03-02 2007-09-13 Nitto Denko Corp Heat-peelable adhesive sheet
CN103208460A (en) * 2012-01-12 2013-07-17 欣兴电子股份有限公司 Manufacturing method of package substrate
CN107629720A (en) * 2016-07-11 2018-01-26 日东电工株式会社 Bonding sheet
WO2025164356A1 (en) * 2024-01-31 2025-08-07 東京エレクトロン株式会社 Processing system and processing method

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000169808A (en) * 1998-09-30 2000-06-20 Nitto Denko Corp Thermal peeling type adhesive sheet
JP2001319897A (en) * 2000-05-11 2001-11-16 Disco Abrasive Syst Ltd Method of dividing semiconductor wafer
JP2002121505A (en) * 2000-10-18 2002-04-26 Nitto Denko Corp Energy ray-curable heat-peelable pressure-sensitive adhesive sheet and method for producing cut pieces using the same
JP2002167559A (en) * 2000-11-30 2002-06-11 Nitto Denko Corp Weir material and method of manufacturing sealed electronic component using this weir material
WO2003012858A1 (en) * 2001-07-30 2003-02-13 Nitto Denko Corporation Method of heat-peeling chip cut pieces from heat peel type adhesive sheet, electronic part, and circuit board
JP2003045938A (en) * 2001-07-30 2003-02-14 Nitto Denko Corp Method of heat-peeling chip-cut pieces from heat-peelable pressure-sensitive adhesive sheet, electronic component and circuit board
JP2003119439A (en) * 2001-10-17 2003-04-23 Kureha Elastomer Co Ltd Thermally releasable self-adhesive sheet
JP2006152308A (en) * 2005-12-28 2006-06-15 Nitto Denko Corp Cutting method of electronic parts
JP2007231187A (en) * 2006-03-02 2007-09-13 Nitto Denko Corp Heat-peelable adhesive sheet
CN103208460A (en) * 2012-01-12 2013-07-17 欣兴电子股份有限公司 Manufacturing method of package substrate
CN107629720A (en) * 2016-07-11 2018-01-26 日东电工株式会社 Bonding sheet
CN107629720B (en) * 2016-07-11 2021-08-10 日东电工株式会社 Adhesive sheet
WO2025164356A1 (en) * 2024-01-31 2025-08-07 東京エレクトロン株式会社 Processing system and processing method

Also Published As

Publication number Publication date
JP3847904B2 (en) 2006-11-22

Similar Documents

Publication Publication Date Title
JP4651799B2 (en) Energy ray-curable heat-peelable pressure-sensitive adhesive sheet and method for producing a cut piece using the same
KR101345484B1 (en) Heat-peelable pressure-sensitive adhesive sheet and method of recovering adherend
JP3594853B2 (en) Heat release adhesive sheet
US7147743B2 (en) Energy-beam-curable thermal-releasable pressure-sensitive adhesive sheet and method for producing cut pieces using the same
JP4704017B2 (en) Heat-peeling method for adherend and heat-peeling apparatus for adherend
JP4877689B2 (en) Energy ray-curable heat-peelable pressure-sensitive adhesive sheet and method for producing a cut piece using the same
JP6000595B2 (en) Heat-peelable pressure-sensitive adhesive sheet for electronic component cutting and electronic component processing method
JP4716668B2 (en) Heat-peeling method for adherend and heat-peeling apparatus
KR100687981B1 (en) Heat peeling method of adherend and heat peeling apparatus of adherend
JP3810911B2 (en) Heat release type adhesive sheet
JP6000958B2 (en) Heat-peelable pressure-sensitive adhesive sheet for cutting electronic components and electronic component cutting method
TWI597341B (en) Thermal Release Adhesive Sheet
JP2001226650A (en) Radiation-curable heat-peelable pressure-sensitive adhesive sheet and method for producing cut pieces using the same
JP2000169808A (en) Thermal peeling type adhesive sheet
JPH11302614A (en) Heat release adhesive sheet
JP2013155295A (en) Stretchable thermal-release adhesive sheet
JP2009040930A (en) Method for peeling adherend and heat-peelable pressure-sensitive adhesive sheet used for the method for peeling adherend
JP3847904B2 (en) Method for manufacturing adhesive sheet and cut piece
JP2008258639A (en) Pickup collection method for semiconductor wafer cut pieces
JP2006152308A (en) Cutting method of electronic parts
JP2000351947A (en) Heat release adhesive sheet
JP2005322724A (en) Heat-peeling method for adherend and heat-peeling apparatus

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20060501

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20060516

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060712

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20060822

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20060824

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120901

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120901

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150901

Year of fee payment: 9

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term