JPH1119943A - Manufacture of structure and the structure - Google Patents
Manufacture of structure and the structureInfo
- Publication number
- JPH1119943A JPH1119943A JP9187804A JP18780497A JPH1119943A JP H1119943 A JPH1119943 A JP H1119943A JP 9187804 A JP9187804 A JP 9187804A JP 18780497 A JP18780497 A JP 18780497A JP H1119943 A JPH1119943 A JP H1119943A
- Authority
- JP
- Japan
- Prior art keywords
- substance
- continuous structure
- continuous
- accumulation
- composite
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Landscapes
- Filtering Materials (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Liquid Crystal (AREA)
- Sliding-Contact Bearings (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、表面もしくは内部
に空間を有する構造体、または異種物質を表面もしくは
内部に有する構造体、その製造方法に関し、特に、連続
構造体を備えた複合構造体から当該連続構造体を除去し
た構造体と、構造体の空間に物質を注入した構造体に関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a structure having a space on the surface or inside, or a structure having a foreign substance on the surface or inside, and a method for producing the same, and particularly to a composite structure having a continuous structure. The present invention relates to a structure from which the continuous structure is removed and a structure in which a substance is injected into a space of the structure.
【0002】[0002]
【従来の技術】表面もしくは内部に空隙あるいは空洞を
有する構造体としては、例えば分散質と分散媒とを濾過
する濾紙やエヤーフィルタ等のフィルタを始め、三次元
構造体を製造する型等がある。また、異種物質を備えた
構造体としては、導電性物質と絶縁性物質とを用いた例
えば配線基板、透明物質と不透明物質とを用いた例えば
光学フィルタまたは造形物等多種多様な構造体がある。2. Description of the Related Art Structures having voids or cavities on the surface or inside include, for example, filters such as filter paper and air filters for filtering dispersoids and dispersion media, as well as molds for producing three-dimensional structures. . In addition, as a structure including a different kind of substance, there are a wide variety of structures such as a wiring board using a conductive substance and an insulating substance, and an optical filter or a molded article using a transparent substance and an opaque substance. .
【0003】[0003]
【発明が解決しようとする課題】上記従来技術の中で、
例えば濾過フィルタでは、有機物質の繊維をガラス等の
セラミック材料で焼結した後焼成し、当該有機物質を除
去しセラミック材料に孔を設け製造されている。このよ
うな製造方法では、孔がセラミック材料中に均一に設け
られ難く、繊維を均一に分散しなければセラミック中に
複数の繊維が重なり、設計値より大きい孔となる等の課
題がある。三次元構造体の型等の場合には、例えばマイ
クロマシーンの部品等のような高精度に複雑な形状を作
成することは極めて困難であり、また形状も限定され、
その上型の作成が高価であるなどの課題がある。また、
異種物質を備えた構造体として例えば配線基板では、表
裏の配線パターンを接続する場合や各種素子を配線基板
に接続する場合等には、配線基板に設けられた孔に導電
性物質を充填する必要があり、導電性物質を良好に充填
しなければ接続不良及び/または接続抵抗が大きくなる
という課題がある。さらに、異種物質を備えた構造体の
他の例として光学フィルタでは、光学特性の微少な調整
が困難であり、造形物では適用できる材料が例えば熱硬
化性樹脂あるいはいわゆるワックスと称される低融点物
質のみであり、適用できる材料範囲が極めて限定される
課題がある。In the above prior art,
For example, a filter is manufactured by sintering a fiber of an organic substance with a ceramic material such as glass and then baking to remove the organic substance and provide holes in the ceramic material. In such a manufacturing method, there is a problem that it is difficult to form holes uniformly in the ceramic material, and if the fibers are not uniformly dispersed, a plurality of fibers overlap in the ceramic, resulting in a hole larger than a design value. In the case of a three-dimensional structure type or the like, it is extremely difficult to create a complicated shape with high accuracy, such as a part of a micromachine, and the shape is also limited.
In addition, there is a problem that the production of the mold is expensive. Also,
For example, in the case of a wiring board as a structure having a different kind of substance, when connecting wiring patterns on the front and back or when connecting various elements to the wiring board, it is necessary to fill a hole provided in the wiring board with a conductive substance. If the conductive material is not filled well, there is a problem that connection failure and / or connection resistance increases. Further, in an optical filter as another example of a structure having a different kind of substance, it is difficult to finely adjust the optical characteristics, and a material applicable to a molded article is, for example, a low-melting point resin called a thermosetting resin or a so-called wax. There is a problem that the range of applicable materials is extremely limited because it is only a substance.
【0004】そこで、本発明は上記課題を解決し、表面
あるいは内部に空隙もしくは空洞を備えた構造体を極め
て簡単に製造でき、当該空隙もしくは空洞の形状の自由
度を増大できる構造体の製造方法及び構造体と、当該空
隙もしくは空洞を別の物質で置換した構造体の製造方法
及び構造体の提供を目的とする。Therefore, the present invention solves the above-mentioned problems, and a method of manufacturing a structure capable of extremely easily manufacturing a structure having a void or a cavity on the surface or inside thereof and increasing the degree of freedom of the shape of the void or the void. And a method of manufacturing a structure in which the void or the cavity is replaced with another substance, and a structure.
【0005】[0005]
【課題を解決するための手段】請求項1に記載の本発明
の構造体の製造方法は、固体状態の融点が異なる第一の
物質と第二の物質とを含む複合構造体を、少なくとも前
記第一の物質を吐出する吐出手段を含む連続構造体を形
成する形成工程と、前記第二の物質を前記連続構造体の
周辺に供給する蓄積工程とを含み製造し、前記複合構造
体の前記連続構造体を除去する除去工程を含むことを特
徴とする。請求項2に記載の本発明の構造体の製造方法
は、固体状態の融点が異なる第一の物質と第二の物質と
を含む複合構造体を、前記第一の物質を粒状態で供給
し、連続構造体を形成する形成工程と、前記第二の物質
を液状態で供給する蓄積工程とを含み製造し、前記複合
構造体の前記連続構造体を除去する除去工程を含むこと
を特徴とする。請求項3に記載の本発明の構造体の製造
方法は、固体状態の融点が異なる複数の物質の内、融点
が低い物質を粒状発生手段で粒状に供給し、連続構造体
を形成する形成工程と、前記複数種類の物質の内前記連
続構造体を構成する物質とは異なる他の物質の蓄積物
を、少なくとも前記連続構造体以外の領域に形成する蓄
積工程とを含み複合構造体を形成し、前記連続構造体の
融点以上で前記蓄積物の融点以下に少なくとも前記連続
構造体を加熱し、前記複合構造体から前記連続構造体を
除去する除去工程を含むことを特徴とする。請求項4に
記載の本発明の構造体の製造方法は、請求項1〜3の何
れかに記載の構造体の製造方法において、前記形成工程
が、前記連続構造体の前記形成工程の形成方向または前
記供給工程の蓄積方向の少なくとも何れか一方の方向に
物質を成長させ、三次元連続構造体を形成する工程を含
むことを特徴とする。請求項5に記載の本発明の構造体
の製造方法は、請求項1〜3の何れかに記載の構造体の
製造方法において、前記蓄積工程が、前記連続構造体の
前記蓄積工程の蓄積方向の厚み以上に供給する工程を含
むことを特徴とする。請求項6に記載の本発明の構造体
の製造方法は、請求項1、3または5の何れかに記載の
構造体の製造方法において、前記蓄積工程が、液状の物
質を流入する工程を含むことを特徴とする。請求項7に
記載の本発明の構造体の製造方法は、請求項1〜3、5
または6の何れかに記載の構造体の製造方法において、
前記蓄積工程に、当該蓄積工程に適用した物質を固化す
る工程を含むことを特徴とする。請求項8に記載の本発
明の構造体の製造方法は、請求項1〜4の何れかに記載
の構造体の製造方法において、前記形成工程で用いる物
質が金属または合金の何れかであることを特徴とする。
請求項9に記載の本発明の構造体の製造方法は、請求項
1〜3または5〜7の何れかに記載の構造体の製造方法
において、前記蓄積工程で用いる物質が誘電体であるこ
とを特徴とする。請求項10に記載の本発明の構造体の
製造方法は、請求項9に記載の構造体の製造方法におい
て、前記誘電体が、エネルギー線照射で三次元硬化する
光硬化性樹脂を含むことを特徴とする。請求項11に記
載の本発明の構造体の製造方法は、請求項1〜3の何れ
かに記載の構造体の製造方法において、前記除去工程の
後に、前記連続構造体以外の物質を注入する注入工程を
付加することを特徴とする。請求項12に記載の本発明
の構造体の製造方法は、請求項11に記載の構造体の製
造方法において、前記注入工程が、前記除去工程を兼ね
ることを特徴とする。請求項13に記載の本発明の構造
体の製造方法は、請求項11または12の何れかに記載
の構造体の製造方法において、前記注入工程で用いる物
質が金属または合金の何れかであることを特徴とする。
請求項14に記載の本発明の連続構造体の除去方法は、
固体状態の融点が異なる第一の物質と第二の物質とを含
み、前記第一の物質が連続構造体を形成し、前記連続構
造体の周囲を前記第二の物質で充填した構成の複合構造
体から、前記連続構造体を少なくとも加熱し、前記連続
構造体を除去することを特徴とする。請求項15に記載
の本発明の連続構造体の注入方法は、固体状態の融点が
異なる第一の物質と第二の物質とを含み、前記第一の物
質が連続構造体を形成し、前記連続構造体の周囲を前記
第二の物質で充填した構成の複合構造体から、前記連続
構造体を少なくとも加熱し、前記連続構造体を除去した
後、前記連続構造体が除去された部分に流体を注入する
ことを特徴とする。請求項16に記載の本発明の連続構
造体の注入方法は、溝状または孔状の連続空間を有する
構造体の前記連続空間に、流体を注入し前記流体の連続
構造体を形成することを特徴とする。請求項17に記載
の本発明の連続構造体の置換方法は、固体状態の融点が
異なる第一の物質と第二の物質とを含み、前記第一の物
質が連続構造体を形成し、前記連続構造体の周囲を前記
第二の物質で充填した構成の複合構造体から、前記連続
構造体を少なくとも加熱すると共に流体を注入し、前記
連続構造体を前記流体で置換することを特徴とする。請
求項18に記載の本発明の構造体は、請求項1〜10の
何れかに記載の構造体の製造方法によって製造された空
隙もしくは空洞を少なくとも表面あるいは内部に有する
ことを特徴とする。請求項19に記載の本発明の構造体
は、請求項1〜13の何れかに記載の構造体に製造方法
によって製造された複合物質で構成されたことを特徴と
する。According to a first aspect of the present invention, there is provided a method of manufacturing a structure, comprising: forming a composite structure including a first substance and a second substance having different melting points in a solid state, at least using the composite structure. Forming a continuous structure including discharge means for discharging a first substance; and accumulating a step of supplying the second substance to the periphery of the continuous structure. The method includes a removing step of removing the continuous structure. The method for manufacturing a structure according to the present invention according to claim 2, comprising: supplying a composite structure including a first substance and a second substance having different melting points in a solid state, wherein the first substance is in a granular state. Forming a continuous structure, forming an accumulation step of supplying the second substance in a liquid state, manufacturing, including a removing step of removing the continuous structure of the composite structure, I do. The method of manufacturing a structure according to the present invention according to claim 3, wherein a material having a low melting point is supplied in a granular form by a granular generating means from among a plurality of materials having different melting points in a solid state, thereby forming a continuous structure. And forming a composite structure including a storage step of forming, in at least a region other than the continuous structure, a storage of another substance different from the substance constituting the continuous structure among the plurality of types of substances. And removing the continuous structure from the composite structure by heating at least the continuous structure to a temperature equal to or higher than the melting point of the continuous structure and equal to or lower than the melting point of the accumulation. According to a fourth aspect of the present invention, in the method of manufacturing a structure according to any one of the first to third aspects, the forming step is performed in a direction in which the continuous structure is formed. Alternatively, the method includes a step of growing a substance in at least one of the accumulation directions in the supply step to form a three-dimensional continuous structure. According to a fifth aspect of the present invention, there is provided a method of manufacturing a structure according to any one of the first to third aspects, wherein the accumulating step is performed in the accumulating direction of the accumulating step of the continuous structure. Characterized in that the method includes a step of supplying a film having a thickness of not less than. According to a sixth aspect of the present invention, in the method of manufacturing a structure according to any one of the first to third aspects, the accumulating step includes a step of flowing a liquid substance. It is characterized by the following. The method for manufacturing a structure according to the present invention according to claim 7 is the method according to claims 1 to 3,
Or in the method for producing a structure according to any one of 6
The accumulation step includes a step of solidifying a substance applied to the accumulation step. According to a method of manufacturing a structure of the present invention described in claim 8, in the method of manufacturing a structure according to any one of claims 1 to 4, the substance used in the forming step is either a metal or an alloy. It is characterized by.
According to a ninth aspect of the present invention, in the method for manufacturing a structure according to any one of the first to third or fifth to seventh aspects, the substance used in the accumulation step is a dielectric. It is characterized by. According to a tenth aspect of the present invention, there is provided a method of manufacturing a structure according to the ninth aspect, wherein the dielectric includes a photocurable resin which is three-dimensionally cured by irradiation with energy rays. Features. According to a method for manufacturing a structure of the present invention described in claim 11, in the method for manufacturing a structure according to any one of claims 1 to 3, a substance other than the continuous structure is injected after the removing step. It is characterized in that an injection step is added. According to a twelfth aspect of the present invention, in the method for manufacturing a structure according to the eleventh aspect, the implanting step also serves as the removing step. According to a thirteenth aspect of the present invention, in the method for manufacturing a structure according to any one of the eleventh and twelfth aspects, the substance used in the implantation step is any one of a metal and an alloy. It is characterized by.
The method for removing a continuous structure according to the present invention according to claim 14,
A composite material comprising a first substance and a second substance having different melting points in a solid state, wherein the first substance forms a continuous structure, and the periphery of the continuous structure is filled with the second substance. At least the continuous structure is heated from the structure, and the continuous structure is removed. The method for injecting a continuous structure according to the present invention according to claim 15, comprising a first substance and a second substance having different melting points in a solid state, wherein the first substance forms a continuous structure, From the composite structure having a configuration in which the periphery of the continuous structure is filled with the second substance, at least the continuous structure is heated and the continuous structure is removed. Is injected. The method for injecting a continuous structure according to the present invention described in claim 16 is characterized in that a fluid is injected into the continuous space of a structure having a groove-shaped or hole-shaped continuous space to form a continuous structure of the fluid. Features. The method for replacing a continuous structure according to the present invention according to claim 17, comprising a first substance and a second substance having different melting points in a solid state, wherein the first substance forms a continuous structure, From a composite structure having a configuration in which the periphery of the continuous structure is filled with the second substance, at least the continuous structure is heated and a fluid is injected, and the continuous structure is replaced with the fluid. . The structure of the present invention described in claim 18 is characterized in that at least the surface or inside of the structure has a void or cavity manufactured by the method for manufacturing a structure according to any one of claims 1 to 10. According to a nineteenth aspect of the present invention, there is provided a structure according to any one of the first to thirteenth aspects, wherein the structure is made of a composite material manufactured by a manufacturing method.
【0006】[0006]
【発明の実施の形態】本発明の構造体の前駆体である複
合構造体は、少なくとも固体状態の融点が異なる複数種
類の物質からなる。当該複数種類の物質の内の少なくと
も1つの物質を吐出手段または粒状発生手段等により作
成した連続構造体と、当該連続構造体に供した物質以外
の物質を構造体の周辺に供給することによって複合構造
体を作成し、当該複合構造体の連続構造体を除去して本
発明の構造体を製造する。BEST MODE FOR CARRYING OUT THE INVENTION A composite structure, which is a precursor of the structure of the present invention, comprises at least a plurality of kinds of substances having different melting points in a solid state. A composite is obtained by supplying at least one of the plurality of types of substances by a discharging unit or a granular generation unit or the like to a continuous structure and supplying a substance other than the substance provided to the continuous structure to the periphery of the structure. A structure is created, and the continuous structure of the composite structure is removed to manufacture the structure of the present invention.
【0007】本発明における連続構造体とは、吐出手段
で断続的または連続的に吐出した物質または粒状発生手
段で粒状に供給された物質の何れかが1つの当該物質が
連続的につながった構造体であり、その形状は一次元の
紐状連続構造体(当該連続構造体の太さによっては糸
状、綱状等とも称されるが、本発明では紐状と総称す
る)、二次元の面状連続構造体(連続構造体の厚みによ
っては板状等とも称されるが、本発明では面状と総称す
る)、三次元連続構造体(上記紐状連続構造体及び/ま
たは上記面状連続構造体が三次元的に集合した連続構造
体)の何れかの連続構造体である。従って、形成工程
を、連続構造体の形成工程の形成方向または供給工程の
蓄積方向の少なくとも何れか一方の方向に物質を成長さ
せると、三次元連続構造体が作成できる。[0007] The continuous structure in the present invention is a structure in which one of a substance discharged intermittently or continuously by a discharge means or a substance supplied in a granular form by a granular generation means is connected to one of the substances continuously. A one-dimensional string-shaped continuous structure (also referred to as a string or a rope depending on the thickness of the continuous structure, but is generally referred to as a string in the present invention), a two-dimensional surface Continuous structure (also referred to as a plate shape or the like depending on the thickness of the continuous structure, but is generally referred to as a planar shape in the present invention), and a three-dimensional continuous structure (the string-like continuous structure and / or the planar continuous structure) (A continuous structure in which the structures are three-dimensionally assembled). Therefore, a three-dimensional continuous structure can be created by growing the substance in at least one of the formation direction of the continuous structure formation step and the accumulation direction of the supply step.
【0008】但し、断続的に吐出するまたは粒状発生手
段を用いていわゆる粒状に供給し連続構造体を作成する
場合、紐状連続構造体の形成に際しては当該紐状連続構
造体の長さ方向の供給間隔を適宜制御すればよく、面状
連続構造体の形成に際しては当該面状連続構造体の二次
元方向の供給間隔を適宜制御すればよく、同様に三次元
連続構造体の形成に際しては三次元全ての方向の供給間
隔を形状に応じて適宜制御すればよく、連続構造体の
径、厚み等は物質の供給量の制御によってそれぞれ自由
に設定できる。However, when a continuous structure is prepared by intermittently discharging or supplying the particles in a so-called granular form using a granular generation means, the string-shaped continuous structure is formed in the longitudinal direction of the string-shaped continuous structure. The supply interval may be appropriately controlled, and when forming the planar continuous structure, the supply interval in the two-dimensional direction of the planar continuous structure may be appropriately controlled. Similarly, when forming the three-dimensional continuous structure, The supply intervals in all directions can be appropriately controlled according to the shape, and the diameter, thickness, and the like of the continuous structure can be freely set by controlling the supply amount of the substance.
【0009】この連続構造体を作成する手法としては、
連続構造体をなす物質を押し出す吐出手段または粒状発
生手段を介して、所定の支持基板、連続構造体あるいは
蓄積物の何れかの上に供給することで達成でき、吐出手
段または粒状発生手段(以下両者を発生手段と総称す
る)から連続構造体までの物質の状態は、粒状あるいは
連続体の如何は問わないが、形成工程と蓄積工程とを繰
り返す場合等には一般的に粒状の方が好ましい。なお、
本発明の連続構造体を構成する物質には、有機物質、無
機物質何れも適用できるが、当該物質の内少なくとも1
つが金属または合金の何れかであると、例えば導電率、
エネルギー変換機能等の機能及び/または融点の制御等
の点で好ましい。As a method of creating this continuous structure,
This can be achieved by supplying a material constituting a continuous structure onto a predetermined supporting substrate, a continuous structure, or a storage through a discharge unit or a granulation unit that extrudes a substance. The state of the substance from the two to the continuous structure) may be granular or continuous, but the granular state is generally preferred when the forming step and the accumulating step are repeated. . In addition,
As the substance constituting the continuous structure of the present invention, any of an organic substance and an inorganic substance can be applied.
If one is a metal or an alloy, for example, conductivity,
It is preferable in terms of functions such as an energy conversion function and / or control of a melting point.
【0010】蓄積工程とは、連続構造体の周辺に物質を
供給するものであり、蓄積工程に供する物質が連続構造
体と接する場合には、当該連続構造体に供した物質と異
なる物質を適用する。蓄積工程における供給量を、連続
構造体の蓄積方向の厚みよりも多くすれば、連続構造体
を蓄積物で隔離することができる。連続構造体を隔離し
た複合構造体から、当該連続構造体を除去すれば、例え
ば多孔質の構造体や三次元的に空洞を有する構造体等を
得ることができ、フィルタ、造形物、または造形物の型
等が作成できる。なお、蓄積工程における供給量を連続
構造体の蓄積方法の厚み以下にすれば、複合構造体の表
面に連続構造体が出現するだけであり、当該表面に存在
する連続構造体を除去すれば、蓄積物の表面に溝ができ
ること勿論であり、本発明の構造体は何れの場合であっ
ても適用できる。また、蓄積工程における蓄積手段は、
前述した形成工程における発生手段の他各種印刷方式ま
たは蒸着、スパッタリング等のいわゆる気相堆積法等が
適用できるが、例えば前述した吐出手段のように蓄積工
程に適用する物質を連続的に供給できる手法が、工程時
間が短縮できる。[0010] The accumulating step is to supply a substance to the periphery of the continuous structure. When the substance to be supplied to the accumulating step comes into contact with the continuous structure, a substance different from the substance supplied to the continuous structure is applied. I do. If the supply amount in the accumulation step is larger than the thickness of the continuous structure in the accumulation direction, the continuous structure can be isolated by the accumulation. If the continuous structure is removed from the composite structure in which the continuous structure is isolated, for example, a porous structure or a structure having a three-dimensional cavity can be obtained, and the filter, the formed object, or the formed object can be obtained. You can create the type of object. Note that if the supply amount in the accumulation step is equal to or less than the thickness of the accumulation method of the continuous structure, only the continuous structure appears on the surface of the composite structure, and if the continuous structure existing on the surface is removed, Of course, grooves can be formed on the surface of the accumulation, and the structure of the present invention can be applied in any case. In addition, the accumulation means in the accumulation step includes:
In addition to the generating means in the forming step described above, various printing methods or so-called vapor deposition methods such as vapor deposition and sputtering can be applied. For example, a method capable of continuously supplying a substance applicable to the accumulation step as in the discharging means described above. However, the process time can be reduced.
【0011】なお、少なくとも蓄積工程の雰囲気で液状
の物質を蓄積工程に適用すると、当該液状物質を流入す
るという簡単な手法で蓄積工程を行えるため好ましい。
液状の物質としては、例えば溶融、溶液、分散体、低分
子量物質(モノマーまたはオリゴマー等)等があり、適
用する液状物質に応じて適宜蒸発、冷却、硬化等の手法
により固化する工程を含めばよい。また、蓄積工程に供
される物質の電気的特性としては導電体、誘電体(絶縁
体も含む)何れでも適用できるが、一般的には連続構造
体を保護する誘電性を有する物質が好ましく、特に紫外
線またはエックス線等のいわゆるエネルギー線照射で三
次元硬化する光硬化性樹脂が、蒸発または冷却等の工程
増が解消できるため作業上で好ましい。以上説明した形
成工程と蓄積工程とで本発明の構造体の前駆体である複
合構造体を作成でき、本発明の構造体は当該複合構造体
に設けた連続構造体を除去する工程により製造できる。It is preferable to apply a liquid substance to the accumulation step at least in the atmosphere of the accumulation step because the accumulation step can be performed by a simple method of flowing the liquid substance.
The liquid substance includes, for example, a melt, a solution, a dispersion, a low molecular weight substance (monomer or oligomer) and the like. If a step of solidifying by a method such as evaporation, cooling, curing or the like as appropriate according to the liquid substance to be applied is included. Good. In addition, as the electrical characteristics of the substance provided for the accumulation step, any of a conductor and a dielectric (including an insulator) can be applied, but in general, a substance having a dielectric property for protecting a continuous structure is preferable. In particular, a photocurable resin that is three-dimensionally cured by irradiation with energy rays such as ultraviolet rays or X-rays is preferable in terms of work because it can eliminate an increase in steps such as evaporation or cooling. A composite structure, which is a precursor of the structure of the present invention, can be formed by the formation step and the accumulation step described above, and the structure of the present invention can be manufactured by a step of removing the continuous structure provided in the composite structure. .
【0012】連続構造体を複合構造体から除去する方法
としては、当該連続構造体の径、厚み、大きさ、材質及
び/または複合構造体に設けられた場所等により、ドラ
イエッチングあるいはウェットエッチング等の除去方
法、または溶解、溶融等の連続構造体の相変化させた
後、落下、傾斜、吸引もしくは押し出し等の外力を単独
または必要に応じて適宜組み合わせる手法により除去す
る方法等を必要に応じて適宜選択して適用できる。但
し、上述の除去方法の内、少なくとも除去すべき連続構
造体を選択的に加熱し、当該連続構造体と連続構造体の
周囲に存在する物質との少なくとも界面を溶融させ、外
力を付与することにより除去する手法が、三次元連続構
造体の除去手段として好ましい。なお、連続構造体を選
択的に加熱する手法としては、当該連続構造体を直接加
熱する手法、または当該連続構造体の周囲の物質を加熱
し当該物質の熱伝導を利用して加熱する手法等があり、
適宜必要に応じて選択できる。The continuous structure may be removed from the composite structure by dry etching, wet etching, or the like, depending on the diameter, thickness, size, material, and / or location of the continuous structure. Or a method of removing the external force such as dropping, inclining, suctioning or pushing out alone or as appropriate as necessary after the phase change of the continuous structure such as melting, melting, etc. It can be selected and applied as appropriate. However, of the above-described removal methods, at least selectively heating the continuous structure to be removed, melting at least an interface between the continuous structure and a substance existing around the continuous structure, and applying an external force. Is preferable as a means for removing the three-dimensional continuous structure. As a method of selectively heating the continuous structure, a method of directly heating the continuous structure, a method of heating a material around the continuous structure, and heating using heat conduction of the material, or the like. There is
It can be selected as needed.
【0013】また、上記外力の内押し出しに適用する圧
力源としては、気体または液体を適宜選択して用いるこ
とができ、押し出し圧力も必要に応じて設定すればよ
く、さらに圧力源を供給する手段としては例えば形成工
程における吐出手段等が適応できる。このようにして複
合構造体に設けた連続構造体を除去すると、空隙、空
間、空洞、溝、穴または孔(以下これらを空間と称す)
を複合構造体に備えた本発明の構造体が製造できる。本
発明における除去工程に、エッチング等の除去工程を付
加することにより、除去工程をより完璧に行えるため好
ましく、除去する連続構造体の材質または空間の壁面の
表面性改質等の要請に応じて適宜選択するとよい。Further, as the pressure source applied to the internal extrusion of the external force, a gas or a liquid can be appropriately selected and used, and the extrusion pressure may be set as required. For example, a discharging means in a forming process can be applied. When the continuous structure provided in the composite structure is removed in this manner, voids, spaces, cavities, grooves, holes or holes (hereinafter, these are referred to as spaces)
Can be produced in a composite structure. The removal step in the present invention is preferably performed by adding a removal step such as etching, so that the removal step can be performed more completely. In response to a request for surface property modification of the material of the continuous structure to be removed or the wall surface of the space. It is good to select appropriately.
【0014】次に、このような構造体の空間に別の物質
を備えた構造体について説明する。当該物質を備える手
段としては、基本的には物質を空間に注入または充填等
(以下これらを注入と称する)すればよいため、例えば
印刷または複合構造体の製造に適用する形成工程と同様
な発生手段が適用でき、空間が構造体の表面に露出して
いる場合には印刷または発生手段以外に蓄積工程と同様
な手法でも可能であること勿論である。空間が構造体の
内部に存在する場合には、一般的には形成工程で適用す
る吐出手段を適用する。特に、上述の注入手法の内発生
手段を適用すれば、物質の供給量を適宜制御できるた
め、例えば孔の容積を考慮した物質の量を供給でき、例
えば絶縁性基板の表裏に設けた配線を電気的に接続する
場合や、配線基板の配線と電気素子とを電気的に接続す
る場合等に孔の容積に応じた導電性物質を注入できる等
で好ましい。さらに、発生手段と空間の注入口とを密着
させれば、注入する物質に所定の圧力を付与しながら注
入できるため望ましい。Next, a structure provided with another substance in the space of such a structure will be described. As a means for providing the substance, it is basically sufficient to inject or fill the substance into the space (hereinafter, these are referred to as “injection”). Means can be applied, and when the space is exposed on the surface of the structure, it is a matter of course that a method similar to the accumulation step can be used other than the printing or generating means. In the case where the space exists inside the structure, a discharging means generally applied in the forming step is applied. In particular, by applying the generation means of the above-described injection method, the supply amount of the substance can be appropriately controlled, so that the amount of the substance can be supplied in consideration of the volume of the hole, for example, wiring provided on the front and back of the insulating substrate can be provided. It is preferable that the conductive substance can be injected in accordance with the volume of the hole when electrically connecting or when electrically connecting the wiring of the wiring board and the electric element. Further, it is desirable that the generating means and the injection port of the space be brought into close contact with each other, because the injection can be performed while applying a predetermined pressure to the substance to be injected.
【0015】なお、上記注入工程は、複合構造体の連続
構造体を除去した後に行っても、連続構造体の除去と同
時(すなわち注入工程が除去工程を兼ねる)に行っても
よい。例えば連続構造体を構成している物質と反応性等
がない物質を注入する際には、注入工程が除去工程を兼
ねるいわゆる物質置換を行うことで工程を簡略化でき
る。 上述したように、注入をする物質も複合構造体の
形成工程に適用した物質と同様に液状であることが好ま
しく、液化手段としては溶融が好ましいことも形成工程
と同様である。また、注入する物質も連続構造体の物質
と同様に金属を適用すると、導電率、エネルギー変換機
能等の機能等で好ましい。The above-described implantation step may be performed after removing the continuous structure of the composite structure, or may be performed simultaneously with the removal of the continuous structure (that is, the implantation step also serves as the removal step). For example, when a substance having no reactivity or the like with the substance constituting the continuous structure is injected, the step can be simplified by performing a so-called substance replacement in which the injection step also serves as a removal step. As described above, the substance to be injected is preferably in a liquid state similarly to the substance applied in the step of forming the composite structure, and the liquefaction means is preferably melted, which is the same as in the formation step. In addition, it is preferable to use a metal as the substance to be implanted in the same manner as the substance of the continuous structure in terms of the conductivity, the energy conversion function, and the like.
【0016】[0016]
【実施例】まず、本発明の製造方法により作製される構
造体の前駆体の複合構造体及び本発明の構造体の基本構
造の概念を、固体状態の融点が異なる2種類の物質を適
用した場合を例にとり図面を用いて説明する。図1〜図
4は、本発明の構造体の前駆体の複合構造体の製造方法
を説明する概念工程図、図5は複合構造体の連続構造体
を除去する除去工程を説明する部分断面斜視図、また図
6はこの方法によって製造された構造体を示す部分断面
斜視図である。First, the concept of the composite structure of the precursor of the structure manufactured by the manufacturing method of the present invention and the concept of the basic structure of the structure of the present invention are applied to two kinds of substances having different melting points in the solid state. The case will be described as an example with reference to the drawings. 1 to 4 are conceptual process diagrams illustrating a method for manufacturing a composite structure of a precursor of a structure of the present invention, and FIG. 5 is a partial cross-sectional perspective view illustrating a removal process for removing a continuous structure of the composite structure. FIG. 6 is a partial sectional perspective view showing a structure manufactured by this method.
【0017】本発明は、発生手段10から一旦液状にし
た物質を粒状体20として支持体30に供給し、連続構
造体の一部(21A〜21D)として支持体30に固着
する第1の形成工程を行う。第1の形成工程が終了した
後、連続構造体の一部(21A〜21D)が被着した領
域以外の領域に、粒状体20の固体状態の融点が異なる
物質40を供給手段50から供給し、連続構造体の一部
(21A〜21D)の周囲を物質40の蓄積物41を設
け第1の蓄積工程を行う。第1の蓄積工程の後、連続構
造体の一部(21A〜21D)の上に第1の形成工程と
同様に発生手段10から粒状体20を供給し、連続構造
体の一部(22A〜22D)を積層する第2の形成工程
を行い、第2の形成工程の後に第1の蓄積工程と同様な
手法を用いて連続構造体の一部(22A〜22D)の周
囲に物質40の蓄積物42を設ける第2の蓄積工程を行
い、この様に形成工程と蓄積工程とをくり返すことで複
合構造体を作製する。According to the present invention, the first formation in which the substance once liquefied from the generating means 10 is supplied to the support 30 as the granular material 20 and fixed to the support 30 as a part (21A to 21D) of the continuous structure. Perform the process. After the first forming step is completed, the material 40 having a different solid-state melting point of the granular material 20 is supplied from the supply means 50 to a region other than a region where a part (21A to 21D) of the continuous structure is applied. The accumulation 41 of the substance 40 is provided around a part (21A to 21D) of the continuous structure, and the first accumulation step is performed. After the first accumulation step, the granular material 20 is supplied from the generating means 10 onto a part (21A to 21D) of the continuous structure in the same manner as in the first formation step, and a part of the continuous structure (22A to 22D) is supplied. 22D) is stacked, and after the second formation step, the substance 40 is accumulated around a part (22A to 22D) of the continuous structure using the same method as in the first accumulation step. A second accumulation step of providing the object 42 is performed, and the composite structure is manufactured by repeating the formation step and the accumulation step in this manner.
【0018】発生手段10から供給する物質を液状にす
る手法は、当該物質を加熱溶融する、当該物質の良溶媒
に溶解する、当該物質を分散媒に分散する等の手法があ
るが、その中でも加熱溶融の手法が粒状体を支持体30
または連続構造体の一部(21や22等)に固着後単に
冷却するだけで済み、溶媒を除去する必要がないため好
ましい。なお、物質の加熱手段としては、ヒ−タ等によ
る直接または間接加熱、放電によるスパーク加熱等が利
用できる。また、物質の液化の状態は、必ずしも完全に
液化させる必要はなく、発生手段10から粒状体20と
して供給できる程度で良く、発生手段10の孔中の物質
の粘度、圧力、孔の径等を一定にすれば、粒状体20の
体積を一定に出来る。As a method for converting the substance supplied from the generating means 10 into a liquid state, there are techniques such as heating and melting the substance, dissolving the substance in a good solvent, and dispersing the substance in a dispersion medium. The method of heating and melting the granular material to support 30
Alternatively, it is preferable to simply cool after fixing to a part (21 or 22 or the like) of the continuous structure, and it is not necessary to remove the solvent, which is preferable. As a means for heating the substance, direct or indirect heating by a heater or the like, spark heating by electric discharge, and the like can be used. The state of liquefaction of the substance does not necessarily need to be completely liquefied, but may be such that it can be supplied as the granular material 20 from the generating means 10. The viscosity, pressure, diameter of the substance, etc. By making the volume constant, the volume of the granular material 20 can be made constant.
【0019】発生手段10の圧力印加手段としては、電
気信号に応じて電歪素子を動作するいわゆる圧電素子、
気体の流力、重力等があり、その組合せ等についても適
宜選択できる。粒状体20の外見形状は、粒状発生手段
10の孔、圧力、物質の粘度等を制御することにより、
球状体から尾引きを有する形状まで自由に設定できる。
特に、物質を溶融により粒状体20を発生させる場合の
当該粒状体20の表面状態は、少なくとも支持体30表
面または連続構造体の一部(21や22等)に固着でき
る程度の粘着力を有していれば連続構造体として単独に
積層でき、積層した連続構造体の外面形状は固着したと
きの粒状体20の温度によって凹凸形状から平面形状ま
で制御できる。The pressure applying means of the generating means 10 includes a so-called piezoelectric element which operates an electrostrictive element according to an electric signal,
There are gas flow force, gravity, and the like, and a combination thereof can be appropriately selected. The appearance shape of the granular body 20 is controlled by controlling the pores, pressure, viscosity of the substance, and the like of the granularity generating means 10.
It can be set freely from a sphere to a shape with a tail.
In particular, when the granular material 20 is generated by melting the substance, the surface state of the granular material 20 has an adhesive force that can be fixed to at least the surface of the support 30 or a part (21, 22, or the like) of the continuous structure. If it does, it can be independently laminated as a continuous structure, and the outer surface shape of the laminated continuous structure can be controlled from the uneven shape to the planar shape by the temperature of the granular material 20 when it is fixed.
【0020】図1は、第1層目の連続構造体の一部21
を形成している状態を示している。すなわち、同図は、
一列目の走査線21Aから三列目の走査線21Cを形成
し終え、四列目の走査線21Dを形成中の状態を示して
いる。従って、発生手段10は、粒状体20を供給しな
がら紙面に垂直な方向に順次移動し、第1の形成工程を
終える。図2は、第1の形成工程を終えた後、粒状体2
0の固体状態の融点が異なる物質40を供給手段50か
ら、連続構造体の一部(21A〜21D)が被着した領
域以外の領域に供給し、連続構造体の一部21(21A
〜21D)の周囲を蓄積物41で囲っている状態を示
し、所定の領域まで蓄積物41を供給し、第1の蓄積工
程を終える。図3は、第1の蓄積工程の後、第1の形成
工程と同様に、発生手段10から粒状体20を供給し、
第1層目の連続構造体の一部21の上に連続構造体の一
部22を積層する工程を示しており、同図は一列目の走
査線22Aから三列目の走査線22Cを形成し終え、四
列目の走査線22Dを形成中の状態を示し、四列目の走
査線22Dを形成し終え第2の形成工程は終了する。図
4は、第2の形成工程を終えた後、第1の蓄積工程と同
様に、物質40を供給手段50から、連続構造体の一部
(22A〜22D)が固着した領域以外の領域に供給
し、連続構造体の一部22(22A〜22D)の周囲を
蓄積物42で囲っている状態を示し、所定の領域まで蓄
積物42を供給し、第2の蓄積工程を終える。FIG. 1 shows a part 21 of the continuous structure of the first layer.
Are formed. That is, FIG.
This shows a state in which the formation of the third scanning line 21C from the first scanning line 21A is completed and the formation of the fourth scanning line 21D. Therefore, the generating means 10 sequentially moves in the direction perpendicular to the paper surface while supplying the granular material 20, and ends the first forming step. FIG. 2 shows that the granular material 2 after the first forming process is finished.
0 is supplied from the supply means 50 to the region other than the region where the part (21A to 21D) of the continuous structure is adhered, and the part 21 (21A) of the continuous structure is supplied.
21D) shows a state in which the periphery of the area is surrounded by the accumulation 41, the accumulation 41 is supplied to a predetermined area, and the first accumulation step is completed. FIG. 3 shows that after the first accumulation step, the granular material 20 is supplied from the generation unit 10 in the same manner as in the first formation step.
This figure shows a step of laminating a part 22 of the continuous structure on a part 21 of the continuous structure of the first layer, and the figure shows the formation of the third line of scan lines 22C from the first line of scan lines 22A. This indicates a state in which the fourth row of scanning lines 22D are being formed, and the second forming step is completed after the formation of the fourth row of scanning lines 22D. FIG. 4 shows that after the second formation step, the substance 40 is supplied from the supply means 50 to the area other than the area where the part (22A to 22D) of the continuous structure is fixed, similarly to the first accumulation step. The state in which the supply 42 is supplied and the periphery of the part 22 (22A to 22D) of the continuous structure is surrounded by the accumulation 42 is shown, the accumulation 42 is supplied to a predetermined area, and the second accumulation step is completed.
【0021】以下、形成工程及び蓄積工程を順次繰り返
して、図5に示したような複合構造体を完成する。な
お、上記説明では、形成工程と蓄積工程とを順番に交互
に繰り返す場合を説明したが、例えば図5に示したよう
に内部に空洞を具備しない連続構造体の場合等で、当該
連続構造体の回りに蓄積する物質が同一である場合に
は、形成工程と蓄積工程とを順番に交互に繰り返す必要
はなく、形成工程のみを行い所定の形状の連続構造体を
作製した後、一挙に蓄積工程を行うことも可能である。
このような方法で製造すると、異なる蓄積工程により蓄
積した蓄積物間の境界がなくなり、蓄積物の特性がより
均一化できる等の好ましい点がある。また、上記説明で
は1つの発生手段を備えた場合であるが、一次元または
二次元に複数の発生手段を備えたマルチタイプにすると
形成工程の時間が短縮され、さらに、発生手段の孔の
径、圧力、加熱温度、物質の種類等に応じて独立した発
生手段を備えた場合でも適用できることも勿論である。Thereafter, the formation step and the accumulation step are sequentially repeated to complete the composite structure as shown in FIG. In the above description, the case where the forming step and the accumulating step are alternately repeated in order has been described. However, for example, in the case of a continuous structure having no cavity therein as shown in FIG. If the materials that accumulate around the same are the same, it is not necessary to repeat the forming process and the accumulating process in turn, and only perform the forming process to produce a continuous structure of a predetermined shape, and then accumulate all at once. Steps can also be performed.
When manufactured by such a method, there is a preferable point that the boundary between the accumulations accumulated in different accumulation steps is eliminated, and the characteristics of the accumulations can be more uniform. Further, in the above description, one generating means is provided. However, if a multi-type having one or two-dimensional plural generating means is used, the time of the forming process is reduced, and the diameter of the hole of the generating means is further reduced. Needless to say, the present invention can be applied to a case where an independent generating means is provided according to the pressure, the heating temperature, the type of the substance, and the like.
【0022】さらに、上記説明では、1つの形成工程に
より形成した連続構造体の厚みにほぼ等しい厚みに各蓄
積物を形成したが、各形成工程で形成した連続構造体の
厚みより厚く蓄積しても良く、その場合には各形成工程
で形成した連続構造体同士が蓄積物により分断されるだ
けであり、用途に応じて適宜選択できる。なお、上記説
明では形成工程と蓄積工程とに用いた物質は各々1種類
であったが、各工程に用いる物質はそれぞれ独立に複数
であっても良いこと勿論である。上述のようにして作成
した複合構造体から、図5に示したように連続構造体
(A、B、C、D)を選択的に加熱する手段60A〜6
0Dを有する加熱手段60により加熱し、連続構造体を
溶融させ、例えば加熱手段60の反対面側から吸引手段
(図示は省略)を用いて吸引することで当該連続構造体
を除去し、図6に示す孔を有する構造体が製造できる。Further, in the above description, each accumulation is formed to have a thickness substantially equal to the thickness of the continuous structure formed in one forming step. However, the accumulation is made thicker than the thickness of the continuous structure formed in each forming step. In such a case, the continuous structures formed in the respective forming steps are merely separated by the accumulation, and can be appropriately selected depending on the application. In the above description, one substance is used for each of the formation step and the accumulation step. However, needless to say, a plurality of substances may be independently used for each step. Means 60A-6 for selectively heating the continuous structures (A, B, C, D) from the composite structure prepared as described above, as shown in FIG.
Heating is performed by the heating means 60 having 0D to melt the continuous structure, and the continuous structure is removed by, for example, suctioning from the opposite surface side of the heating means 60 using suction means (not shown), and FIG. Can be manufactured.
【0023】なお、図5に示した加熱手段60には、連
続構造体(A〜D)の位置に当接し選択的に加熱する手
段60A〜60Dを具備したものであるが、加熱手段は
この形態に限定されるものではなく、複合構造体全体を
加熱してもよい。但し、加熱温度は、蓄積物(41、4
2等)の融点未満で連続構造体(A〜D)の融点以上に
すればよく、また上述のように除去手段に吸引等の外力
を付加する場合には、連続構造体全体を溶融させる必要
はなく、連続構造体と当該連続構造体の周囲に存在する
蓄積物との界面を溶融させることでも対応できること勿
論である。The heating means 60 shown in FIG. 5 is provided with means 60A to 60D for selectively heating by contacting the positions of the continuous structures (A to D). The present invention is not limited to the form, and the entire composite structure may be heated. However, the heating temperature depends on the accumulation (41, 4
2) or lower than the melting point of the continuous structure (A to D). When an external force such as suction is applied to the removing means as described above, it is necessary to melt the entire continuous structure. However, it is needless to say that it is possible to cope by melting the interface between the continuous structure and the accumulation existing around the continuous structure.
【0024】また、上述の説明では除去手段として加熱
手段60に吸引を併用した場合について説明したが、単
に重力を利用した落下または傾斜による除去手段、気体
または流体による押圧力による除去手段、またはそれら
の組合せ等でも適用できる。特に、連続構造体の径が小
さい、あるいは連続構造体の量が多い等の場合には、吸
引と押圧とを併用することが好ましい。さらに、除去工
程で連続構造体を液状にする手段は加熱溶融に限定され
るものでもなく、例えば連続構造体の構成物質の良溶媒
に複合構造体を浸漬する、浸漬と共に加熱する、または
当該良溶媒を圧力を印可しながら吐出する等の手段でも
よい。また、上述では加熱溶融を経て除去する手法であ
るが、ドライエッチングまたはウェットエッチング等の
エッチング手段でも連続構造体を除去することは可能で
ある。なお、上述した例えば良溶媒を用いる手法やエッ
チング手法を除去工程に付加すると、連続構造体の除去
が完全に行われるため好ましい場合がある。 本発明の
構造体の空間の径または大きさは、連続構造体の径また
は大きさとほぼ同一にでき、連続構造体の径または大き
さは形成工程に用いる発生手段によって決定できると共
に、同一仕様の発生手段を用いると同一の連続構造体が
形成できるものであるから、例えば図6の孔の径を自由
に設定することができると同時に、孔の密度も複合構造
体中に形成する連続構造体の密度であるため、発生手段
の制御により自由に設計でき、例えば濾過に適用するフ
ィルタであれば濾別する粒子の大きさを自由に選択で
き、また濾過効率を向上できる。Further, in the above description, the case where suction is used in combination with the heating means 60 as the removing means has been described. However, the removing means merely by dropping or tilting using gravity, the removing means by pressing force by gas or fluid, or the like. And the like. In particular, when the diameter of the continuous structure is small or the amount of the continuous structure is large, it is preferable to use both suction and pressing. Further, the means for converting the continuous structure into a liquid state in the removing step is not limited to heating and melting.For example, the composite structure is immersed in a good solvent of a constituent material of the continuous structure, heated together with the immersion, or heated. Means such as discharging the solvent while applying pressure may be used. In the above description, the removal is performed by heating and melting. However, the continuous structure can be removed by etching means such as dry etching or wet etching. Note that it is sometimes preferable to add the above-described method using a good solvent or the etching method to the removing step, since the continuous structure is completely removed. The diameter or size of the space of the structure of the present invention can be substantially the same as the diameter or size of the continuous structure, and the diameter or size of the continuous structure can be determined by the generating means used in the forming step, and the same specification Since the same continuous structure can be formed by using the generating means, for example, the diameter of the holes shown in FIG. 6 can be freely set, and the density of the holes can be formed in the composite structure at the same time. The density can be freely designed by controlling the generating means. For example, if the filter is applied to filtration, the size of the particles to be filtered can be freely selected, and the filtration efficiency can be improved.
【0025】以下具体的に実施例を挙げて本発明の構造
体を詳細に説明する。図6は本発明の構造体の一実施態
様の濾過フィルタの構成を示す図である。先ず図1に示
したように、融点80℃の低融半田を加熱手段(図示は
省略)によって溶融させ、発生手段10からステンレス
製の支持基板30に直径10μmの溶融半田20を2μ
mの間隔をあけて供給する形成工程を行い、図2に示す
ように融点500℃のB2O3−PbO−ZnO系結晶性
ガラスを主成分とし揮発性ワックスを混合したペースト
40を供給手段50から連続構造体の一部21の厚みだ
け流出させた後350℃程度の温度で焼結し、図3のよ
うに連続構造体の一部21の上に溶融半田20を積層
し、図4のようにペースト40を流出・焼結を行い、こ
の工程を所定回数繰り返し図5に示したように低融半田
の連続構造体を備えた結晶性ガラスの複合構造体を作成
した。この複合構造体を温度500℃程度の炉中で焼成
し結晶性ガラスを結合した後、炉から取り出し連続構造
体の低融半田を流出除去し、図6に示した濾過フィルタ
を得た。なお、上述の例では蓄積物に結晶性ガラスを適
用したが、蓄積物に樹脂を適用すると、多孔質で可撓性
を有する構造体が得られ、当該構造体の孔に圧縮空気を
通す等の手法により潤滑油不要の軸受け等の応用ができ
る。Hereinafter, the structure of the present invention will be described in detail with reference to examples. FIG. 6 is a diagram showing a configuration of a filtration filter according to an embodiment of the structure of the present invention. First, as shown in FIG. 1, a low melting solder having a melting point of 80 ° C. is melted by a heating means (not shown), and a molten solder 20 having a diameter of 10 μm is applied from a generating means 10 to a stainless steel supporting substrate 30 by 2 μm.
A forming step of supplying the paste 40 at intervals of m is performed, and as shown in FIG. 2, a paste 40 containing a B 2 O 3 —PbO—ZnO-based crystalline glass having a melting point of 500 ° C. as a main component and a volatile wax mixed therein is supplied. After flowing out only the thickness of part 21 of the continuous structure from 50, sintering is performed at a temperature of about 350 ° C., and molten solder 20 is laminated on part 21 of the continuous structure as shown in FIG. The paste 40 was flowed out and sintered as described above, and this process was repeated a predetermined number of times to form a composite structure of crystalline glass having a continuous structure of low-melting solder as shown in FIG. The composite structure was fired in a furnace at a temperature of about 500 ° C. to bond the crystalline glass, and then taken out of the furnace to remove and remove the low-melting solder of the continuous structure to obtain the filter shown in FIG. In the above example, crystalline glass is applied to the accumulation, but if a resin is applied to the accumulation, a porous and flexible structure can be obtained, and compressed air can be passed through the holes of the structure. The method described above can be applied to bearings that do not require lubricating oil.
【0026】次に図7及び8を用いて本発明の構造体の
他の実施態様の放電子倍増管について説明する。離型性
を有するフッ素樹脂支持基板(図示は省略)の上に約1
5℃の雰囲気中で、発生手段から粒径1μmのグリセリ
ンを1μm間隔で供給し個体グリセリンを支持基板上に
形成し、別の発生手段から粒径0.3μmのセシウム液
滴をグリセリンの周りに固着形成し、その後室温に戻
し、オリゴアクリレート系の紫外線硬化樹脂を、グリセ
リンの周りに配したセシウムの周囲に、セシウムの形成
高さだけ蓄積させ紫外線を照射し、オリゴアクリレート
を光架橋した。この工程を所定回数繰り返し、図7に示
したグリセリン連続構造体701の外周にセシウム連続
構造体702を有し、セシウム連続構造体702の周囲
にオリゴアクリレートの硬化物703からなる複合構造
体を得た。Next, a discharge multiplier according to another embodiment of the structure of the present invention will be described with reference to FIGS. Approximately 1 on a fluororesin support substrate (not shown)
In an atmosphere of 5 ° C., glycerin having a particle diameter of 1 μm is supplied from the generating means at intervals of 1 μm to form solid glycerin on the support substrate, and cesium droplets having a particle diameter of 0.3 μm are formed around the glycerin from another generating means. After fixation, the temperature was returned to room temperature, and the ultraviolet acrylate resin based on oligoacrylate was accumulated around the cesium disposed around glycerin by the height of cesium, and irradiated with ultraviolet rays to crosslink the oligoacrylate. This step is repeated a predetermined number of times to obtain a composite structure having a cesium continuous structure 702 around the glycerin continuous structure 701 shown in FIG. 7 and a cured product 703 of oligoacrylate around the cesium continuous structure 702. Was.
【0027】次に、この複合構造体をフッ素樹脂支持基
板から剥がし、セシウム連続構造体702の内部のグリ
セリン連続構造体701を吸引することで除去し、図8
に示したような内部に孔を有するセシウム連続構造体7
02とオリゴアクリレートの架橋蓄積物703からなる
放電子倍増管を得た。この構造体におけるセシウム連続
構造体702中の孔の内径及びセシウム連続構造体70
2の蓄積物703中の密度は、グリセリン連続構造体7
01の外径及び形成密度によって決定し、当該外径及び
形成密度はグリセリン連続構造体701を作成する際に
適用した発生手段からの供給量及び位置制御で規定でき
るため、セシウム連続構造体702中の孔の内径及び密
度は要請に応じて適宜設定できると共に、内径及び密度
の均一性も保証できる。なお、上記の除去工程に更に通
常の手法によりドライエッチングを施すと、放電子倍増
効率が若干向上した。また、上述の例では放電子倍増管
を取り上げたが、セシウムに換え例えば銀等の抗菌性を
有する金属を適用することも可能で、その場合例えば抗
菌性を備えたエアーフィルタにも適応できる。Next, the composite structure is peeled off from the fluororesin support substrate, and the glycerin continuous structure 701 inside the cesium continuous structure 702 is removed by suction.
Cesium continuous structure 7 having a hole inside as shown in FIG.
A discharge multiplier consisting of a cross-linking accumulation product 703 of 02 and oligoacrylate was obtained. The inner diameter of the hole in the cesium continuous structure 702 and the cesium continuous structure 70
The density in the accumulation 703 of the glycerin continuous structure 7
01 is determined by the outer diameter and the formation density of the cesium continuous structure 702 since the outer diameter and the formation density can be defined by the supply amount and the position control from the generator applied when the glycerin continuous structure 701 is formed. The inner diameter and density of the holes can be appropriately set as required, and the uniformity of the inner diameter and density can be guaranteed. In addition, when dry etching was further performed by the usual method in the above-described removing step, the discharge element doubling efficiency was slightly improved. In the above-described example, the discharge multiplier is taken up. However, instead of cesium, a metal having antibacterial properties such as silver can be applied. In this case, for example, an air filter having antibacterial properties can be applied.
【0028】図9は本発明の構造体の別の実施態様の三
次元構造体の型の斜視図である。融点80℃の半田を発
生手段を二次元的に捜査しながら二次元連続構造体を形
成する形成工程の後、二次元連続構造体の厚みだけ光硬
化性樹脂を供給し当該光硬化性樹脂の硬化感度の波長の
紫外線を照射し蓄積物とする蓄積工程を行い、二次元連
続構造体の上または蓄積物の上を選択した形成工程と蓄
積工程とを繰り返し、同図(a)に示したような三次元連
続構造体901の周りに蓄積物904を具備した複合構
造体を作成した。この複合構造体を90℃に加熱し三次
元連続構造体901を除去すると共に、三次元連続構造
体901のA部とB部とから交互に温水を流入させ、三
次元連続構造体の半田を全て除去し構造体を得た。その
後、三次元連続中空を有する蓄積物904を902と9
03とに切断し、同図(b)に示した三次元構造物の型を
得た。上記三次元構造物の型は図9(b)に示すような複
雑な形状を有しているにも拘わらず、上述したような極
めて簡単な製法で作成できる効果がある。なお、上述の
例では、予め三次元連続構造体901を除去した後蓄積
物904を902と903とに切断したが、複合構造体
を切断した後切断した各々の複合構造体から連続構造体
を除去してもよいこと勿論である。複合構造体を切断し
た後切断した各々の複合構造体から連続構造体を除去す
る場合には、三次元連続構造体901は、蓄積物904
の外部に図9に示すようなA部やB部を必要としないた
め閉塞空間の型を形成できる。FIG. 9 is a perspective view of a mold of a three-dimensional structure according to another embodiment of the structure of the present invention. After a forming step of forming a two-dimensional continuous structure while two-dimensionally searching for means for generating solder having a melting point of 80 ° C., a photocurable resin is supplied by the thickness of the two-dimensional continuous structure, and the photocurable resin is supplied. The accumulation step of irradiating ultraviolet rays of the wavelength of the curing sensitivity to the accumulation is performed, and the formation step and the accumulation step in which the two-dimensional continuous structure or the accumulation is selected are repeated, and the same is shown in FIG. A composite structure having the accumulation 904 around such a three-dimensional continuous structure 901 was created. The composite structure is heated to 90 ° C. to remove the three-dimensional continuous structure 901, and hot water is alternately supplied from the A and B portions of the three-dimensional continuous structure 901 to remove the solder of the three-dimensional continuous structure. All were removed to obtain a structure. Thereafter, a stock 904 having a three-dimensional continuous hollow is stored in 902 and 9
03, to obtain a three-dimensional structure pattern shown in FIG. Although the three-dimensional structure has a complicated shape as shown in FIG. 9B, the three-dimensional structure can be formed by the above-described extremely simple manufacturing method. In the above-described example, the accumulation 904 is cut into 902 and 903 after removing the three-dimensional continuous structure 901 in advance, but the continuous structure is cut from each of the cut composite structures after cutting the composite structure. Of course, it may be removed. In the case where a continuous structure is removed from each of the cut composite structures after cutting the composite structure, the three-dimensional continuous structure 901 contains the accumulation 904.
Since a portion A and a portion B as shown in FIG. 9 are not required, a mold of a closed space can be formed.
【0029】図10は、本発明の注入方法を適用した構
造体の一実施態様のプリント基板の配線である。同図
(a)は、予め表裏に配線パターン1002、1003、
1004及び1005と、孔径10μmの貫通孔100
6、1mmの貫通孔1007及び1008を形成したポ
リイミド基板1001からなるプリント基板である。こ
のプリント基板の表裏に設けた配線パターン1002と
1003とを貫通孔1006を介して接続する際に、本
発明の発生手段の内例えば吐出手段の吐出口を貫通孔1
006の一方に接触させながら、例えば溶融したアルミ
ニウムを所定量吐出させ、同図(b)に示した通称ビアと
称される相間導通部分1009を注入し導通をとる。ま
たポリイミド基板1001の一方の面に形成された配線
パターン1004と1005との間に例えばコンデンサ
等の電気素子1010を接続する際にも、電気素子の端
子電極を挿入する貫通孔1007及び1008に当該電
気素子1010を挿入した後、電気素子1010の反対
側から前述の吐出手段を接触させ、例えば溶融半田を貫
通孔1007と1008とにそれぞれ注入し、電気的接
続1011を形成した。FIG. 10 shows wiring on a printed circuit board according to an embodiment of the structure to which the injection method of the present invention is applied. Same figure
(a) shows wiring patterns 1002, 1003,
1004 and 1005 and a through hole 100 having a hole diameter of 10 μm
6, a printed board made of a polyimide substrate 1001 in which through holes 1007 and 1008 of 1 mm are formed. When connecting the wiring patterns 1002 and 1003 provided on the front and back of the printed circuit board through the through-hole 1006, for example, the discharge port of the discharge means of the generating means of the present invention is connected to the through-hole 1
While being in contact with one of the electrodes 006, a predetermined amount of, for example, molten aluminum is discharged, and an inter-phase conduction portion 1009 called a via shown in FIG. Also, when an electric element 1010 such as a capacitor is connected between the wiring patterns 1004 and 1005 formed on one surface of the polyimide substrate 1001, the through holes 1007 and 1008 into which terminal electrodes of the electric element are inserted are formed. After the electric element 1010 was inserted, the above-described discharging means was brought into contact from the opposite side of the electric element 1010, and for example, molten solder was injected into the through holes 1007 and 1008, respectively, to form the electric connection 1011.
【0030】以上のように本発明によるプリント基板の
注入方法によれば、従来無電回メッキを用いて形成して
いた相間導通部分を、吐出手段を用いることにより所定
量だけ導電性物質を貫通孔に注入できるため、容易にか
つ確実に相間導通部分1009を形成でき、工程を簡略
化できると共に、信頼性も飛躍的に向上できる。また、
電気素子1010を接続するに際しても、上述した相間
導通部分1009と同様に接続を確実に得ることができ
る。上記例における孔径は10μmと1mmであった
が、要請に応じて孔径は適宜変更できると共に、導電性
物質の選択も自由にできること勿論である。また、上記
の例のプリント基板は予め表裏に配線パターンを形成し
たものを適用したが、当該プリント基板も本発明の構造
体の製造方法で作成でき、上述の例と同様な手法で注入
する一例を次に示す。As described above, according to the method for injecting a printed circuit board according to the present invention, a predetermined amount of a conductive substance is penetrated into a through-hole by using a discharging means to form a conductive part between phases conventionally formed by electroless plating. Therefore, the interphase conduction portion 1009 can be easily and reliably formed, the process can be simplified, and the reliability can be dramatically improved. Also,
When connecting the electric element 1010, the connection can be reliably obtained as in the case of the inter-phase conduction portion 1009 described above. Although the hole diameters in the above example were 10 μm and 1 mm, it goes without saying that the hole diameter can be appropriately changed as required, and the conductive material can be freely selected. In addition, the printed circuit board of the above example has a wiring pattern formed on the front and back sides in advance, but the printed circuit board can also be formed by the method of manufacturing a structure of the present invention, and is an example of injection using the same method as in the above example. Is shown below.
【0031】支持基板の上に例えば溶融した銅を吐出手
段により所定の配線パターン1003を形成し、配線パ
ターン1003以外の領域にポリイミドの前駆体のアミ
ック酸を配線パターン1003の厚みに供給した後加熱
硬化しポリアミドを形成する。次に相間導通部分100
6に相当する部分には溶融銅を、電気素子1010を接
続する貫通孔1007及び1008部分には例えば溶融
ワックスをそれぞれ吐出手段により厚み方向に所定厚さ
に形成し、形成した厚み分だけアミック酸を蓄積し加熱
硬化を行い、その後支持基板から剥がすと共に貫通孔1
007及び1008部分に形成したワックス連続構造体
を除去し、電気素子1010を貫通孔1007及び10
08に挿入しながら例えば溶融銅を注入することでも接
続配線が達成できる。なお、上記の例では相間導通部分
1006を予め形成しているため、電気素子1010の
接続だけに注入方法を用いた。A predetermined wiring pattern 1003 is formed on the supporting substrate by, for example, molten copper by a discharge means, and an amic acid of a polyimide precursor is supplied to a region other than the wiring pattern 1003 to a thickness of the wiring pattern 1003 and then heated. Cures to form polyamide. Next, the interphase conduction portion 100
6, a molten wax is formed in the through-holes 1007 and 1008 for connecting the electric element 1010, for example, a molten wax to a predetermined thickness in a thickness direction by a discharge means. , Heat-cured, and then peeled off from the supporting substrate, and
The wax continuous structure formed in the portions 007 and 1008 is removed, and the electric element 1010 is inserted into the through holes 1007 and
The connection wiring can also be achieved by, for example, injecting molten copper while inserting the wiring into the wiring. In the above example, since the inter-phase conduction portion 1006 is formed in advance, the injection method is used only for the connection of the electric element 1010.
【0032】図11は、本発明の連続構造体の置換方法
を適用した構造体の一実施態様の配線基板の置換工程図
である。すなわち、同図は前述のプリント配線と同様な
手法で製造した融点80℃で直径5μmの半田配線11
01と、半田配線1101の周囲に蓄積した紫外線硬化
性樹脂の硬化物1102とを有する複合構造体の配線基
板1103である。当該配線基板1103の高周波特性
を改善するため、半田配線1101をアルミニウムで置
換する工程を示している。同図(a)に示すように、配線
基板1103を半田の融点以上に加熱すると同時に、配
線基板1103中の半田配線1101の一端(図ではA
部)から溶融アルミニウムを吐出する吐出手段1104
の吐出口を接触しながら溶融アルミニウムを注入置換
し、同図(b)に示すように、半田配線1101をアルミ
ニウム配線1105に置換した。FIG. 11 is a process diagram for replacing a wiring board according to an embodiment of a structure to which the method for replacing a continuous structure according to the present invention is applied. That is, the drawing shows a solder wiring 11 having a melting point of 80 ° C. and a diameter of 5 μm manufactured by the same method as the above-mentioned printed wiring.
01 and a cured product 1102 of an ultraviolet curable resin accumulated around the solder wiring 1101. A step of replacing the solder wiring 1101 with aluminum in order to improve the high-frequency characteristics of the wiring board 1103 is shown. As shown in FIG. 11A, the wiring board 1103 is heated to a temperature equal to or higher than the melting point of the solder, and at the same time, one end of the solder wiring 1101 in the wiring board 1103 (A in FIG.
Part 1104 for discharging molten aluminum from
The molten aluminum was injected and replaced while making contact with the discharge port of No. 1, and the solder wiring 1101 was replaced with an aluminum wiring 1105 as shown in FIG.
【0033】上述の置換により、半田配線1101の電
気抵抗値がアルミニウム配線1105の電気抵抗値まで
低下することができ、高周波特性が向上した。上記連続
構造体は蓄積物の内部に存在する場合を中心に説明した
が、本発明の連続構造体は蓄積物内部に存在するだけで
はなく、蓄積物の表面に存在していてもよい。例えば、
液晶表示パネル等に適用するカラーフィルタの製造に際
し、ポリイミド基板の一方の主面に、画素面積だけ低融
点材料(例えば半田またはワックス等)を発生手段でそ
れぞれ独立した二次元連続構造体を形成し、当該に次元
連続構造体の厚みだけ例えばポリイミドの前駆体を蓄積
し加熱硬化した後、当該に次元連続構造体の低融点材料
を除去すると、表面に画素面積に応じた凹部を備えたポ
リイミド基板が得られ、各画素にフィルタの色材を注入
し当該凹部を平坦化しカラーフィルタを形成することが
できる等がある。なお、このカラーフィルタの色配置構
成は格子配列にもデルタ配列にも対応できると同時に、
例えば相隣接する画素の間をフィルタ部分に適用した低
融点材料よりも融点が高く遮光性の材料で連続構造体を
形成すると、いわゆるブラックストライプと称される縁
取りを備えたカラーフィルタも製造できる。By the above substitution, the electric resistance of the solder wiring 1101 can be reduced to the electric resistance of the aluminum wiring 1105, and the high-frequency characteristics have been improved. Although the above-described continuous structure has been mainly described in the case where the continuous structure exists inside the accumulation, the continuous structure of the present invention may be present not only inside the accumulation but also on the surface of the accumulation. For example,
In manufacturing a color filter applied to a liquid crystal display panel or the like, a two-dimensional continuous structure is formed on one main surface of a polyimide substrate by using a low-melting-point material (for example, solder or wax, etc.) for each pixel area by generating means. After accumulating a polyimide precursor by the thickness of the dimensional continuous structure, for example, heating and curing, and then removing the low melting point material of the dimensional continuous structure, the polyimide substrate having a concave portion corresponding to the pixel area on the surface. Can be obtained, and a color material of a filter can be injected into each pixel to flatten the concave portion to form a color filter. It should be noted that the color arrangement of the color filter can correspond to both a lattice arrangement and a delta arrangement,
For example, when a continuous structure is formed of a light-shielding material having a higher melting point than a low-melting material applied to a filter portion between adjacent pixels, a color filter having a so-called black stripe can be manufactured.
【0034】[0034]
【発明の効果】以上述べたように本発明は、表面あるい
は内部に空隙もしくは空洞を備えた構造体を極めて簡単
に製造でき、当該空隙もしくは空洞の形状の自由度を増
大できる構造体の製造方法及び構造体と、当該空隙もし
くは空洞を別の物質で置換した構造体の製造方法及び構
造体を提供することができる。As described above, according to the present invention, it is possible to extremely easily manufacture a structure having a void or a cavity on the surface or inside thereof, and to increase the degree of freedom of the shape of the void or the void. And a method for manufacturing a structure in which the voids or cavities are replaced with another substance, and a structure.
【図1】本発明の構造体の第1の形成工程を説明する断
面概念図FIG. 1 is a conceptual cross-sectional view illustrating a first formation step of a structure according to the present invention.
【図2】本発明の構造体の第1の蓄積工程を説明する断
面概念図FIG. 2 is a conceptual cross-sectional view illustrating a first accumulation step of a structure according to the present invention.
【図3】本発明の構造体の第2の形成工程を説明する断
面概念図FIG. 3 is a conceptual cross-sectional view illustrating a second forming step of the structure of the present invention.
【図4】本発明の構造体の第2の蓄積工程を説明する断
面概念図FIG. 4 is a conceptual cross-sectional view illustrating a second accumulation step of the structure according to the present invention.
【図5】複合構造体の連続構造体の除去工程を説明する
部分断面斜視図FIG. 5 is a partial cross-sectional perspective view illustrating a step of removing a continuous structure of the composite structure.
【図6】本発明の構造体の一実施態様の構成を説明する
部分断面斜視図FIG. 6 is a partial cross-sectional perspective view illustrating the configuration of an embodiment of the structure of the present invention.
【図7】本発明の構造体の他の実施態様の前駆体の構成
を説明する要部断面図FIG. 7 is a cross-sectional view of a main part illustrating a configuration of a precursor according to another embodiment of the structure of the present invention.
【図8】本発明の構造体の他の実施態様を説明する要部
断面図FIG. 8 is a cross-sectional view of a main part illustrating another embodiment of the structure of the present invention.
【図9】本発明の構造体の別の実施態様を説明する斜視
図で、(a)は、本発明の構造体の前駆体の複合構造体の
斜視図、(b)は、本発明の構造体の部分斜視図9A and 9B are perspective views illustrating another embodiment of the structure of the present invention. FIG. 9A is a perspective view of a composite structure of a precursor of the structure of the present invention, and FIG. Partial perspective view of the structure
【図10】本発明の構造体の一実施態様を説明する部分
断面斜視図で、(a)は、本発明の構造体の前駆体の部分
断面斜視図、(b)は、本発明の構造体の部分断面斜視図FIGS. 10A and 10B are partial cross-sectional perspective views illustrating an embodiment of the structure of the present invention. FIG. 10A is a partial cross-sectional perspective view of a precursor of the structure of the present invention, and FIG. Partial sectional perspective view of body
【図11】本発明の構造体の他の実施態様の製造工程を
説明する要部断面図で、(a)は、本発明の構造体の製造
工程の要部断面図、(b)は、本発明の構造体の要部断面
図FIGS. 11A and 11B are main-part cross-sectional views illustrating a manufacturing process of another embodiment of the structure of the present invention. FIG. 11A is a main-portion cross-sectional view of the manufacturing process of the structure of the present invention. Main part sectional view of the structure of the present invention
10 発生手段 20 粒状体 21、22 連続構造体 30 支持体 41、42 蓄積物 50 供給手段 DESCRIPTION OF SYMBOLS 10 Generating means 20 Granular body 21,22 Continuous structure 30 Support 41,42 Accumulated matter 50 Supply means
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI H05K 3/00 H05K 3/00 B ──────────────────────────────────────────────────続 き Continued on front page (51) Int.Cl. 6 Identification code FI H05K 3/00 H05K 3/00 B
Claims (19)
二の物質とを含む複合構造体を、少なくとも前記第一の
物質を吐出する吐出手段を含む連続構造体を形成する形
成工程と、前記第二の物質を前記連続構造体の周辺に供
給する蓄積工程とを含み製造し、前記複合構造体の前記
連続構造体を除去する除去工程を含むことを特徴とする
構造体の製造方法。A step of forming a composite structure including a first substance and a second substance having different melting points in a solid state into a continuous structure including at least discharge means for discharging the first substance; And a storage step of supplying the second substance to the periphery of the continuous structure, and a removing step of removing the continuous structure of the composite structure. .
二の物質とを含む複合構造体を、前記第一の物質を粒状
態で供給し、連続構造体を形成する形成工程と、前記第
二の物質を液状態で供給する蓄積工程とを含み製造し、
前記複合構造体の前記連続構造体を除去する除去工程を
含むことを特徴とする構造体の製造方法。2. A forming step of supplying a composite structure including a first substance and a second substance having different melting points in a solid state, wherein the first substance is supplied in a granular state to form a continuous structure; An accumulation step of supplying the second substance in a liquid state;
A method for manufacturing a structure, comprising a step of removing the continuous structure of the composite structure.
内、融点が低い物質を粒状発生手段で粒状に供給し、連
続構造体を形成する形成工程と、前記複数種類の物質の
内前記連続構造体を構成する物質とは異なる他の物質の
蓄積物を、少なくとも前記連続構造体以外の領域に形成
する蓄積工程とを含み複合構造体を形成し、前記連続構
造体の融点以上で前記蓄積物の融点以下に少なくとも前
記連続構造体を加熱し、前記複合構造体から前記連続構
造体を除去する除去工程を含むことを特徴とする構造体
の製造方法。3. A forming step of supplying a substance having a low melting point from among a plurality of substances having different melting points in a solid state in a granular form by a granular generating means to form a continuous structure; An accumulation step of forming an accumulation of another substance different from the substance constituting the structure in at least a region other than the continuous structure to form a composite structure, and accumulating the composite structure at a melting point of the continuous structure or higher. A method of manufacturing a structure, comprising a step of heating at least the continuous structure below the melting point of the product and removing the continuous structure from the composite structure.
形成工程の形成方向または前記供給工程の蓄積方向の少
なくとも何れか一方の方向に物質を成長させ、三次元連
続構造体を形成する工程を含むことを特徴とする請求項
1〜3の何れかに記載の構造体の製造方法。4. The step of forming a three-dimensional continuous structure by growing a substance in at least one of a forming direction of the forming step of the continuous structure and an accumulation direction of the supplying step. The method for manufacturing a structure according to any one of claims 1 to 3, further comprising:
蓄積工程の蓄積方向の厚み以上に供給する工程を含むこ
とを特徴とする請求項1〜3の何れかに記載の構造体の
製造方法。5. The manufacturing method according to claim 1, wherein said accumulating step includes a step of supplying said continuous structure to a thickness in a direction of accumulation in said accumulating step. Method.
工程を含むことを特徴とする請求項1、3または5の何
れかに記載の構造体の製造方法。6. The method according to claim 1, wherein the accumulating step includes a step of flowing a liquid substance.
た物質を固化する工程を含むことを特徴とする請求項1
〜3、5または6の何れかに記載の構造体の製造方法。7. The method according to claim 1, wherein the accumulating step includes a step of solidifying a substance applied to the accumulating step.
7. The method for producing a structure according to any one of to 3, 5, and 6.
合金の何れかであることを特徴とする請求項1〜4の何
れかに記載の構造体の製造方法。8. The method according to claim 1, wherein the substance used in the forming step is one of a metal and an alloy.
ることを特徴とする請求項1〜3または5〜7の何れか
に記載の構造体の製造方法。9. The method according to claim 1, wherein a substance used in the accumulation step is a dielectric.
次元硬化する光硬化性樹脂を含むことを特徴とする請求
項9記載の構造体の製造方法。10. The method according to claim 9, wherein the dielectric includes a photocurable resin that is three-dimensionally cured by irradiation with energy rays.
以外の物質を注入する注入工程を付加することを特徴と
する請求項1〜3の何れかに記載の構造体の製造方法。11. The method for manufacturing a structure according to claim 1, wherein an injection step of injecting a substance other than the continuous structure is added after the removing step.
ることを特徴とする請求項11記載の構造体の製造方
法。12. The method for manufacturing a structure according to claim 11, wherein said implantation step also serves as said removal step.
は合金の何れかであることを特徴とする請求項11また
は12の何れかに記載の構造体の製造方法。13. The method for manufacturing a structure according to claim 11, wherein the substance used in the implantation step is one of a metal and an alloy.
第二の物質とを含み、前記第一の物質が連続構造体を形
成し、前記連続構造体の周囲を前記第二の物質で充填し
た構成の複合構造体から、前記連続構造体を少なくとも
加熱し、前記連続構造体を除去することを特徴とする連
続構造体の除去方法。14. A method comprising a first substance and a second substance having different melting points in a solid state, wherein the first substance forms a continuous structure, and the periphery of the continuous structure is formed by the second substance. A method for removing a continuous structure, comprising heating at least the continuous structure from the filled composite structure and removing the continuous structure.
第二の物質とを含み、前記第一の物質が連続構造体を形
成し、前記連続構造体の周囲を前記第二の物質で充填し
た構成の複合構造体から、前記連続構造体を少なくとも
加熱し、前記連続構造体を除去した後、前記連続構造体
が除去された部分に流体を注入することを特徴とする連
続構造体の注入方法。15. A semiconductor device comprising: a first substance and a second substance having different melting points in a solid state, wherein the first substance forms a continuous structure, and the periphery of the continuous structure is formed by the second substance. From the composite structure having the filled structure, at least the continuous structure is heated, and after removing the continuous structure, a fluid is injected into a portion where the continuous structure is removed. Injection method.
造体の前記連続空間に、流体を注入し前記流体の連続構
造体を形成することを特徴とする連続構造体の注入方
法。16. A method for injecting a continuous structure, wherein a fluid is injected into the continuous space of a structure having a groove-shaped or hole-shaped continuous space to form a continuous structure of the fluid.
第二の物質とを含み、前記第一の物質が連続構造体を形
成し、前記連続構造体の周囲を前記第二の物質で充填し
た構成の複合構造体から、前記連続構造体を少なくとも
加熱すると共に流体を注入し、前記連続構造体を前記流
体で置換することを特徴とする連続構造体の置換方法。17. A method comprising a first substance and a second substance having different melting points in a solid state, wherein the first substance forms a continuous structure, and the periphery of the continuous structure is formed by the second substance. A method for replacing a continuous structure, comprising heating at least the continuous structure and injecting a fluid from the filled composite structure, and replacing the continuous structure with the fluid.
体の製造方法によって製造された空隙もしくは空洞を少
なくとも表面あるいは内部に有することを特徴とする構
造体。18. A structure having at least a surface or an inside of a void produced by the method for producing a structure according to claim 1. Description:
体に製造方法によって製造された複合物質で構成された
ことを特徴とする構造体。19. A structure comprising the structure according to claim 1 and a composite material manufactured by the manufacturing method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9187804A JPH1119943A (en) | 1997-06-27 | 1997-06-27 | Manufacture of structure and the structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9187804A JPH1119943A (en) | 1997-06-27 | 1997-06-27 | Manufacture of structure and the structure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH1119943A true JPH1119943A (en) | 1999-01-26 |
Family
ID=16212540
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9187804A Withdrawn JPH1119943A (en) | 1997-06-27 | 1997-06-27 | Manufacture of structure and the structure |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH1119943A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004165631A (en) * | 2002-10-08 | 2004-06-10 | Ngk Spark Plug Co Ltd | Multilayer capacitor and method of manufacturing the same |
| CN114001520A (en) * | 2021-09-29 | 2022-02-01 | 临清宇联轴承科技有限公司 | Bearing rolling element cooling device |
-
1997
- 1997-06-27 JP JP9187804A patent/JPH1119943A/en not_active Withdrawn
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004165631A (en) * | 2002-10-08 | 2004-06-10 | Ngk Spark Plug Co Ltd | Multilayer capacitor and method of manufacturing the same |
| CN114001520A (en) * | 2021-09-29 | 2022-02-01 | 临清宇联轴承科技有限公司 | Bearing rolling element cooling device |
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| Date | Code | Title | Description |
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| A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 20040907 |