JPH11230833A - Method and apparatus for measuring phase distribution - Google Patents
Method and apparatus for measuring phase distributionInfo
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- JPH11230833A JPH11230833A JP10050014A JP5001498A JPH11230833A JP H11230833 A JPH11230833 A JP H11230833A JP 10050014 A JP10050014 A JP 10050014A JP 5001498 A JP5001498 A JP 5001498A JP H11230833 A JPH11230833 A JP H11230833A
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- wave
- test
- interference fringe
- test object
- phase distribution
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Abstract
(57)【要約】
【課題】 被検物の位相分布を3次元的に測定する場
合、短時間で測定できる方法と装置を提供する。
【解決手段】 同一光源1からの可干渉光を、参照はa
と、被検物Aを通過する被検波bとの2つの光束に分
け、双方の波面を重ねて干渉縞を形成する位相分布の測
定方法において、反射ミラー7及び/又は9を角度γだ
けチルトさせるとともに、これらの反射ミラーを固定し
た。また、干渉縞の解析にフーリエ変換法を用い、高速
化を図っている。
(57) [Problem] To provide a method and an apparatus capable of measuring a phase distribution of a test object three-dimensionally in a short time. SOLUTION: Coherent light from the same light source 1 is referred to as a
And a test wave b passing through the test object A, in which two wavefronts are overlapped to form an interference fringe by overlapping both wavefronts, the reflection mirror 7 and / or 9 is tilted by an angle γ. At the same time, these reflecting mirrors were fixed. In addition, the Fourier transform method is used to analyze the interference fringes to achieve high speed.
Description
【0001】[0001]
【発明の属する技術分野】本発明は、干渉縞の解析によ
り被検物における位相分布を3次元的に測定する技術に
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a technique for three-dimensionally measuring a phase distribution in a test object by analyzing interference fringes.
【0002】[0002]
【従来の技術】近年、レーザプリンタやカメラなどの光
学機器に使用される光学レンズの材料としてプラスチッ
クを用いることが多くなっている。プラスチック成形レ
ンズはガラス研磨レンズに比較して、コスト低減や非球
面レンズの製作性に優れ、安価であるというメリットが
ある。2. Description of the Related Art In recent years, plastics have been increasingly used as materials for optical lenses used in optical devices such as laser printers and cameras. Compared to a glass polished lens, a plastic molded lens has advantages in that it is superior in cost reduction and manufacturability of an aspherical lens and is inexpensive.
【0003】しかし、その反面、ガラスレンズに比べ製
造上、屈折率分布が不安定でレンズの内部に不均一性を
生じることがある。レンズ内部に不均一性があると、光
学特性に大きな影響を及ぼし、画質の劣化やボケといっ
た原因につながる。従って、レンズ内部の屈折率分布を
高精度に測定し、光学レンズの均質性を評価する必要が
ある。[0003] On the other hand, however, the refractive index distribution is unstable in production as compared with a glass lens, and non-uniformity may occur inside the lens. Non-uniformity inside the lens has a great effect on optical characteristics, leading to deterioration of image quality and blurring. Therefore, it is necessary to measure the refractive index distribution inside the lens with high accuracy and evaluate the homogeneity of the optical lens.
【0004】そこで、本発明の出願人は、特開平8−1
22210号において、被検物を試液中に浸した状態で
光軸と直交する軸を中心に回転させ、同一光源からの可
干渉光を基準となる参照波と、被検物を透過する被検波
とに分割し、複数の回転角位置の各々でこれら2つの光
束を重ね合わせて干渉縞を結像させ、これらの干渉縞か
ら位相シフト法により透過波面量を計測し、CT解析に
よってこれらを再構成し、被検物の屈折率等の位相分布
を求める方法及び装置を提案した。Accordingly, the applicant of the present invention has disclosed in
In No. 22210, a test object immersed in a test solution is rotated about an axis orthogonal to the optical axis, and a reference wave based on coherent light from the same light source and a test wave transmitted through the test object These two light beams are superimposed at each of a plurality of rotation angle positions to form an interference fringe, the amount of transmitted wavefront is measured from these interference fringes by the phase shift method, and these are re-analyzed by CT analysis. A method and an apparatus for determining the phase distribution of the test object, such as the refractive index, have been proposed.
【0005】図4を用いて具体的に説明する。同図の装
置は、マハツェンダ型の干渉計を基本構成としており、
可干渉光としてのレーザ光を射出する光源1と、偏光子
2、ミラー3、ビームエキスパンダ4と、光束分割用の
ビームスプリッタ5と、2つの反射ミラー7、9と、光
束重畳用のビームスプリッタ11と、結像レンズ13
と、CCDなどからなる干渉縞検出器15と、高速画像
処理装置、マイクロコンピュータなどからなる演算処理
装置17とを備えている。以上の構成のうち、光源1か
ら干渉縞検出器15までで、干渉計を構成している。A specific description will be given with reference to FIG. The device shown in the figure has a basic configuration of a Mahachender type interferometer.
A light source 1 for emitting laser light as coherent light, a polarizer 2, a mirror 3, a beam expander 4, a beam splitter 5 for splitting a light beam, two reflecting mirrors 7 and 9, and a beam for superimposing a light beam Splitter 11 and imaging lens 13
And an interference fringe detector 15 composed of a CCD or the like, and an arithmetic processing unit 17 composed of a high-speed image processing device, a microcomputer or the like. Of the above configuration, the interferometer is configured by the light source 1 to the interference fringe detector 15.
【0006】光源1より出射するレーザ光は、偏光子2
で直線偏光にされ、ミラー3で反射されてビームエキス
パンダ4に入射し、これによって光束径を拡大され、ビ
ームスプリッタ5によって直角に曲げられる参照波a
と、直進してミラー9で直角に曲げられ、被検物Aとし
ての位相物体を透過する被検波bとに分割される。参照
波aと被検波bとは、ほぼ1:1となるようになってい
る。A laser beam emitted from a light source 1 is a polarizer 2
, Is reflected by the mirror 3 and is incident on the beam expander 4, whereby the beam diameter is enlarged, and the reference wave a is bent at a right angle by the beam splitter 5.
, And is bent at a right angle by the mirror 9, and is divided into a test wave b that passes through a phase object as the test object A. The reference wave a and the test wave b are set to be approximately 1: 1.
【0007】反射ミラー7は、ピエゾ素子などによる電
気−変位変換素子19により支持され、位相シフト法に
よる干渉縞解析を行うために、参照波aの光路長を波長
以下のオーダで変更できるように配置されている。The reflection mirror 7 is supported by an electric-displacement conversion element 19 such as a piezo element, so that the optical path length of the reference wave a can be changed on the order of a wavelength or less in order to perform interference fringe analysis by a phase shift method. Are located.
【0008】参照波aは反射ミラー7で反射され、ビー
ムスプリッタ11に達し、他方の被検波bは、被検物A
を透過してビームスプリッタ11に達して参照波aと重
なり合うが、電気−変位変換素子19により参照波aと
被検波bとの光路長には、nπ/2の位相の差ができる
ように調整される。The reference wave a is reflected by the reflection mirror 7 and reaches the beam splitter 11, while the other test wave b is the test object A
And reaches the beam splitter 11 and overlaps with the reference wave a, but is adjusted by the electric-displacement conversion element 19 so that the optical path length between the reference wave a and the test wave b has a phase difference of nπ / 2. Is done.
【0009】参照波aと被検波bは重畳され、ビームス
プリッタ11から2つの光束に分割される。一方の光束
は、直進して結像レンズ13に入射し、干渉縞検出器1
5の撮像面に干渉縞を結像する。干渉縞検出器15には
リニアCCDやアレイ状のセンサを用いる。ビームスプ
リッタ11で直角に曲げられた方の光束は、別の結像レ
ンズ23に入射し、モニター25に干渉縞を結像する。The reference wave a and the test wave b are superimposed and split from the beam splitter 11 into two light beams. One light beam travels straight and enters the imaging lens 13, and the interference fringe detector 1
An interference fringe is imaged on the imaging surface of No. 5. As the interference fringe detector 15, a linear CCD or an array sensor is used. The light beam that is bent at right angles by the beam splitter 11 enters another imaging lens 23 and forms an interference fringe on a monitor 25.
【0010】被検物Aの屈折率は空気の屈折率とはかな
り相違しており、被検物の入射面と射出面とが平行でな
い限り、被検物Aを透過した被検波bは、不規則に収束
・発散する。一方、干渉計で干渉縞を結像させるには、
被検波bは、ほぼ平行な光束となっていなければならな
い。そこで、被検物Aがどのような形状であっても、被
検物Aを透過した被検波bがほぼ平行光束になるため
に、次のような構成としている。The refractive index of the test object A is considerably different from the refractive index of air, and the test wave b transmitted through the test object A is as long as the incident surface and the exit surface of the test object are not parallel. Converges and diverges irregularly. On the other hand, to image interference fringes with an interferometer,
The test wave b must be a substantially parallel light beam. Therefore, the following configuration is adopted because the test wave b transmitted through the test object A becomes almost parallel light beam regardless of the shape of the test object A.
【0011】すなわち、被検物Aは、被検波bの光路の
途中に設けられた容器状のセル27内に設置する。セル
27内には、その屈折率が被検物Aの屈折率とほぼ同一
に調合された試液Bを満たしてある。なお、被検物A
は、回転台29上に載置され、回転台29は、図示しな
いサーボモータなどにより、被検波bに対して直交する
回転軸Oを中心に任意の角度だけ回転自在である。セル
27の両端、すなわち、被検波bの入射窓31と射出窓
33は互いに平行で、かつ、それぞれに面精度が高いオ
プチカルフラット35,37を取り付けて液密にシール
ドしている。したがって、被検物Aと試液Bで充填され
たセル27は、全体として均一な屈折率の物体となり、
かつ、入射面と射出面とが平行なので、セル27内を透
過した被検波bは、ほぼ平行な光束となって射出される
ようになる。That is, the test object A is installed in a container-like cell 27 provided in the optical path of the test wave b. The cell 27 is filled with a test solution B whose refractive index is almost the same as the refractive index of the test object A. The specimen A
Is mounted on a turntable 29, and the turntable 29 is rotatable by an arbitrary angle around a rotation axis O orthogonal to the test wave b by a servo motor (not shown) or the like. Both ends of the cell 27, that is, the entrance window 31 and the exit window 33 of the test wave b are parallel to each other, and optical flats 35 and 37 having high surface accuracy are attached to each of them to shield in a liquid-tight manner. Therefore, the cell 27 filled with the test object A and the test solution B becomes an object having a uniform refractive index as a whole,
In addition, since the incident surface and the emission surface are parallel, the test wave b transmitted through the cell 27 is emitted as a substantially parallel light flux.
【0012】干渉縞像は、干渉縞検出器15で検出さ
れ、光電変換されて電気的な画像信号となり、A/D変
換された後、演算装置17に入力される。なお、演算装
置17は、位相シフト法などによる干渉縞像の解析によ
って透過波面の計測演算を行う透過波面計測部18を含
んでいる。The interference fringe image is detected by the interference fringe detector 15, photoelectrically converted into an electric image signal, A / D converted, and input to the arithmetic unit 17. The arithmetic unit 17 includes a transmitted wavefront measuring unit 18 that performs a measurement operation of a transmitted wavefront by analyzing an interference fringe image by a phase shift method or the like.
【0013】次に上述の構成よりなる測定装置を利用し
て被検物Aの屈折率を計測する方法を図5のフローチャ
ートを使用して説明する。まず、被検物Aを回転台29
にセットしない状態で、干渉縞検出器15が出力する干
渉縞像の画像信号を演算処理装置17に取り込んで演算
処理装置内部の透過波面計測部18により干渉縞像の解
析を行い、初期状態の透過波面の計測をする。この計測
結果に基づいて測定装置自身の定常的な誤差成分を排除
する初期処理を行う。Next, a method for measuring the refractive index of the test object A using the measuring apparatus having the above-described configuration will be described with reference to the flowchart of FIG. First, the test object A is moved to the turntable 29.
In the state in which the interference fringe image is not set in the initial state, the image signal of the interference fringe image output from the interference fringe detector 15 is taken into the arithmetic processing unit 17, and the transmitted wavefront measuring unit 18 inside the arithmetic processing unit analyzes the interference fringe image. Measure the transmitted wavefront. Based on the measurement result, an initial process for eliminating a steady error component of the measurement device itself is performed.
【0014】次に、回転台29に被検物Aをセットし
(S11)、回転台29がθ=0の位置(基準となる位
置)で干渉縞検出器15の撮像面に干渉縞を結像し、干
渉縞検出器15が出力する干渉縞像の画像信号を演算処
理装置17に取り込んで干渉縞像の解析を行う(S1
2)。Next, the test object A is set on the turntable 29 (S11), and the turntable 29 forms an interference fringe on the imaging surface of the interference fringe detector 15 at the position of θ = 0 (reference position). An image signal of the interference fringe image output from the interference fringe detector 15 is taken into the arithmetic processing unit 17 to analyze the interference fringe image (S1).
2).
【0015】回転台29が初期回転位置にある透過波面
の計測では、干渉縞像の解析結果は被検物Aの厚み方向
(光軸方向)に積算されており、これだけでは屈折率の
不均一部分の空間的な位置を特定することができない。In the measurement of the transmitted wavefront when the turntable 29 is at the initial rotation position, the analysis results of the interference fringe image are integrated in the thickness direction (the optical axis direction) of the test object A, and this alone results in uneven refractive index. The spatial position of a part cannot be specified.
【0016】そこで、回転台29を初期回転位置より、
矢印に示すように、所定角度回転させ、回転台29上の
被検物Aを被検波bの光軸に対して変化させる(S1
3)。このように被検物Aが回転変位しても干渉縞像は
干渉縞検出器15の撮像面に結像する。この状態下にて
干渉縞検出器15が出力する干渉縞像の画像信号を演算
処理装置17に取り込んで透過波面の計測をする(S1
2)。こうしてたとえば、1゜刻みで180゜(π)あ
るいは360゜(2π)の方向から複数回に渡って干渉
縞を形成し(S14)、この透過波面を計測して、コン
ピュータ、すなわち、演算処理装置17上で再合成す
る。この画像の再構成は、公知のX線CT(Computed T
omography)解析の手法を用いて行うことができる。Then, the turntable 29 is moved from the initial rotation position to
As shown by the arrow, the test object A on the turntable 29 is rotated with respect to the optical axis of the test wave b by rotating it by a predetermined angle (S1).
3). Thus, even if the test object A is rotated and displaced, the interference fringe image is formed on the imaging surface of the interference fringe detector 15. In this state, the image signal of the interference fringe image output from the interference fringe detector 15 is taken into the arithmetic processing unit 17 and the transmitted wavefront is measured (S1).
2). Thus, for example, interference fringes are formed a plurality of times from the direction of 180 ° (π) or 360 ° (2π) in 1 ° increments (S14), and the transmitted wavefront is measured, and the computer, that is, the arithmetic processing unit Re-synthesize on 17. The reconstruction of this image can be performed by using a well-known X-ray CT (Computed T
(omography) analysis method.
【0017】図6はCT法の原理を示すものであり、角
度θから入射した被検波による透過波面のデータp
(x,θ)を変数xについて一次元フーリエ変換すれ
ば、求めるべき屈折率の分布Δn(x,y)の二次元フ
ーリエ変換の極座標表現におけるθ方向成分が得られ
る。FIG. 6 shows the principle of the CT method, in which the transmitted wavefront data p by the test wave incident from an angle θ is shown.
If (x, θ) is one-dimensionally Fourier-transformed with respect to the variable x, the θ-direction component in the polar coordinate expression of the two-dimensional Fourier transform of the refractive index distribution Δn (x, y) to be obtained can be obtained.
【0018】すなわち、0≦θ≦2π又は0≦θ≦πの
角度範囲にわたって透過波面を計測し、その透過波面デ
ータを位相つなぎ処理によって接続し(S15)、一次
元フーリエ変換する(S16)。投影切断面定理によれ
ば、物理分布量をもつ物体のラドン変換、すなわち、角
度θの方向からの投影データを1次元フーリエ変換した
結果は、物体の2次元フーリエ変換の極座標表現におけ
るθ方向成分と一致する。そこで、フーリエ変換された
各断面の極座標データP(x,θ)を直交座標データに
変換し(S17)、その後二次元逆フーリエ変換し(S
18)、さらに屈折率に変換することにより被検物Aの
三次元屈折率分布を再構成することができる。That is, the transmitted wavefront is measured over an angle range of 0 ≦ θ ≦ 2π or 0 ≦ θ ≦ π, and the transmitted wavefront data is connected by phase connection processing (S15), and one-dimensional Fourier transform is performed (S16). According to the projection cut plane theorem, the result of the Radon transform of an object having a physical distribution amount, that is, the result of one-dimensional Fourier transform of projection data from the direction of the angle θ is the θ-direction component in the polar coordinate expression of the two-dimensional Fourier transform of the object Matches. Therefore, the Fourier-transformed polar coordinate data P (x, θ) of each section is converted into orthogonal coordinate data (S17), and then two-dimensional inverse Fourier transform is performed (S17).
18) Further, by converting the refractive index into the refractive index, the three-dimensional refractive index distribution of the test object A can be reconstructed.
【0019】[0019]
【発明が解決しようとする課題】しかしながら、上記の
屈折率分布の測定方法によれば、被検物を回転するごと
に、電気−変位変換素子19を駆動して参照波aと被検
波bとの光路長に、nπ/2の位相の差ができるように
調整する必要があり、測定に長時間を要していた。However, according to the above-described method for measuring the refractive index distribution, each time the test object is rotated, the electric-displacement conversion element 19 is driven to change the reference wave a and the test wave b. It is necessary to adjust the optical path length to have a phase difference of nπ / 2, and it takes a long time for the measurement.
【0020】本発明は、このような事情からなされたも
ので、短時間で被検物の位相分布の測定ができる測定方
法と装置を提供する事を目的としている。The present invention has been made in view of such circumstances, and an object of the present invention is to provide a measuring method and an apparatus capable of measuring a phase distribution of a test object in a short time.
【0021】[0021]
【課題を解決するための手段】上記の目的を達成するた
めに本発明は、同一光源からの可干渉光を基準となる参
照波と、被検物を通過する被検波とに分割し、参照波と
被検波とを重ねて干渉縞を形成し、上記被検物を屈折率
が被検物とほぼ同じ試液内に浸し、被検物を光軸と直交
する軸線回りに回転させて各回転位置にて干渉縞強度を
計測し、干渉縞強度を解析して、透過波面を算出し、該
透過波面から被検物の位相分布を測定する方法におい
て、上記参照波と被検波との光路差を常に一定にして計
測することを特徴としている。In order to achieve the above object, the present invention divides coherent light from the same light source into a reference wave serving as a reference and a test wave passing through an object to be referred to. The wave and the test wave are overlapped to form interference fringes, the test object is immersed in a test solution having a refractive index substantially the same as that of the test object, and the test object is rotated around an axis orthogonal to the optical axis, and each rotation is performed. In the method of measuring the interference fringe intensity at the position, analyzing the interference fringe intensity, calculating the transmitted wavefront, and measuring the phase distribution of the test object from the transmitted wavefront, the optical path difference between the reference wave and the test wave Is characterized in that the measurement is always kept constant.
【0022】上記参照波と被検波とを所定の角度でチル
トさせたり、上記干渉縞強度の解析をフーリエ変換法に
より行ったり、上記被検物を光軸と直交する軸線回りに
回転させながら次々に透過波面を測定し、CT(comput
ed tomography)法を用いて再構成し、被検物の位相分
布を三次元的に計測することができる。The reference wave and the test wave are tilted at a predetermined angle, the analysis of the interference fringe intensity is performed by the Fourier transform method, and the test object is rotated one after another while rotating around an axis orthogonal to the optical axis. The transmitted wavefront is measured and CT (comput
(Ed tomography) method, and the phase distribution of the test object can be measured three-dimensionally.
【0023】本発明の測定装置は、同一光源からの可干
渉光を基準となる参照波と、被検物を通過する被検波と
に分割し、参照波と被検波とを重ねて干渉縞を形成し、
上記被検物を屈折率が被検物とほぼ同じ試液内に浸し、
被検物を光軸と直交する軸線回りに回転させて各回転位
置にて干渉縞強度を計測し、干渉縞強度を解析して、透
過波面を算出し、該透過波面から被検物の位相分布を測
定する装置において、上記参照波及び/又は被検波の光
路中に固定ミラーを設け、該ミラーの少なくとも一方を
チルト可能とし、参照波と被検波とが所定の角度で交叉
するようにしたことを特徴としている。The measuring apparatus of the present invention divides coherent light from the same light source into a reference wave serving as a reference and a test wave passing through a test object, and superimposes the reference wave and the test wave to form an interference fringe. Forming
The specimen is immersed in a test solution having a refractive index substantially the same as that of the specimen,
The test object is rotated around an axis perpendicular to the optical axis to measure the interference fringe intensity at each rotational position, analyze the interference fringe intensity, calculate the transmitted wavefront, and calculate the phase of the test object from the transmitted wavefront. In an apparatus for measuring distribution, a fixed mirror is provided in the optical path of the reference wave and / or the test wave, at least one of the mirrors is tiltable, and the reference wave and the test wave cross at a predetermined angle. It is characterized by:
【0024】[0024]
【発明の実施の形態】以下に、図面を参照して本発明の
実施例を詳細に説明する。本発明の位相分布の測定装置
は、従来の測定装置と同様に、被検物Aを屈折率が被検
物Aとほぼ同じ試液B内に保持して、透過波面を計測
し、被検物の位相分布(屈折率分布や濃度分布等も含
む)を測定するものである。Embodiments of the present invention will be described below in detail with reference to the drawings. The phase distribution measuring apparatus of the present invention, similarly to a conventional measuring apparatus, holds a test object A in a sample solution B having a refractive index substantially the same as the test object A, measures a transmitted wavefront, and (Including a refractive index distribution and a concentration distribution).
【0025】図1は本発明の測定装置であるが、大部分
が従来例と共通しており、電気−変位変換素子19が無
く、反射ミラー7が固定されていることが相違してい
る。この反射ミラー7は、正規の位置、すなわち、入射
光に対して45゜の位置からγだけチルトしている。FIG. 1 shows a measuring apparatus according to the present invention, which is substantially the same as the conventional example, except that there is no electric-displacement conversion element 19 and the reflection mirror 7 is fixed. The reflection mirror 7 is tilted by γ from a normal position, that is, a position at 45 ° with respect to the incident light.
【0026】本発明では、干渉縞の解析方法として従来
の位相シフト法ではなく、フーリエ変換法を用いてい
る。位相シフト法が時間的変調であるのに対し、フーリ
エ変換法は空間的変調であるため、本発明が目的として
いる高速測定に適している。In the present invention, a Fourier transform method is used as a method for analyzing interference fringes, instead of the conventional phase shift method. The phase shift method is a temporal modulation, whereas the Fourier transform method is a spatial modulation, so that it is suitable for the high-speed measurement targeted by the present invention.
【0027】図1の測定装置において、まず、反射ミラ
ー7の傾斜角γを次のようにして決める。反射ミラー7
をγ=0の位置にして、干渉縞をヌルの状態にする。こ
の位置から若干の角度γだけをチルトさせると、縦にス
トライプ状の縞ができる。これが空間的キャリア周波数
f0を有する干渉縞である。In the measuring apparatus of FIG. 1, first, the inclination angle γ of the reflection mirror 7 is determined as follows. Reflection mirror 7
Is set to the position of γ = 0, and the interference fringes are in a null state. When only a slight angle γ is tilted from this position, vertical stripes are formed. This is the interference fringe having the spatial carrier frequency f 0 .
【0028】次に、被検物Aをセットして同様に干渉縞
を形成する。この干渉縞から図2(a)のフローチャー
トに従って、以下のように透過波面の計測がされる。ま
ず、干渉縞の強度分布は、Next, the test object A is set and interference fringes are formed in the same manner. From this interference fringe, the transmitted wavefront is measured as follows in accordance with the flowchart of FIG. First, the intensity distribution of the interference fringes is
【式1】 (Equation 1)
【0029】で与えられる。ψ(x)は被検物の透過波
面収差を表し、a(x),b(x)は光量ムラを表す。
式(1)を変形して、Is given by ψ (x) represents the transmitted wavefront aberration of the test object, and a (x) and b (x) represent the light amount unevenness.
By transforming equation (1),
【式2】 ただし、c*は、複素共役で、(Equation 2) Where c * is a complex conjugate and
【式3】 である。フーリエ変換すると(S1)、(Equation 3) It is. When the Fourier transform is performed (S1),
【式4】 (Equation 4)
【式5】 (Equation 5)
【0030】ただし、A(f),C(f)は、それぞれ
a(x),c(x)のフーリエ変換である。a(x),
c(x)がf0に比べ十分ゆるやかなとき、3つのスペ
クトルは図2(a)に示すように、完全に分離される
(S2)。Here, A (f) and C (f) are Fourier transforms of a (x) and c (x), respectively. a (x),
When c (x) is sufficiently slower than f 0 , the three spectra are completely separated as shown in FIG. 2A (S2).
【0031】そこで、フィルタリングをして第2項のス
ペクトルC(f−f0)のみを取り出し、図2(b)に
示すように、f0だけ原点にシフトし(S3)、逆フー
リエ変換をする(S4)。ここで、複素対数をとると、Therefore, only the spectrum C (f−f 0 ) of the second term is extracted by filtering, and as shown in FIG. 2B, the spectrum is shifted to the origin by f 0 (S3), and the inverse Fourier transform is performed. (S4). Here, taking the complex logarithm,
【式6】 となり、虚数項をとることにより不要信号b(x)と完
全に分離される。よって、c(x)の位相角(Equation 6) By taking the imaginary term, it is completely separated from the unnecessary signal b (x). Therefore, the phase angle of c (x)
【式7】 を求める(S6)ことによりψ(x)、は、a(x),
b(x)に対して独立に得られることになる。Equation 7 (S6), ψ (x) becomes a (x),
b (x) is obtained independently.
【0032】次に図3(b)のフローチャートによりC
T(computed tomography)法による屈折率分布(位相
分布)再構成方法を説明する。CT解析法には、逐次近
似法やフィルタ補正逆投影法などがあるが、最も簡潔に
投影データから画像を再構成する厳密な方法としてはフ
ーリエ変換法が知られている。なお、ここでいうフーリ
エ変換法とは、上記干渉縞の解析に用いたフーリエ変換
法とはアルゴリズムが異なる。誤解を招き易いが、どち
らも公知として使われているため、あえて同じ名称とし
た。Next, according to the flowchart of FIG.
A method of reconstructing a refractive index distribution (phase distribution) by a computed tomography (T) method will be described. The CT analysis method includes a successive approximation method and a filtered back projection method, and the Fourier transform method is known as a simplest and strict method for reconstructing an image from projection data. The algorithm of the Fourier transform used here is different from that of the Fourier transform used for the analysis of the interference fringes. Although easily misleading, both are used as publicly known, so the names are intentionally given the same name.
【0033】被検物Aを0≦θ≦πの範囲にわたって回
転させ、図3のフローチャートに従って上述したように
各透過波面を計測する。この後は、図5のフローチャー
トのS15以降に従って行われ、位相分布を求めること
ができる。The test object A is rotated over the range of 0 ≦ θ ≦ π, and each transmitted wavefront is measured as described above according to the flowchart of FIG. Thereafter, the process is performed in accordance with S15 and subsequent steps in the flowchart of FIG. 5, and the phase distribution can be obtained.
【0034】上記の実施例では、反射ミラー7に角度γ
のチルトを付与したが、反射ミラー9に角度γのチルト
を与え、被検波bの方をチルトさせることとしてもよ
い。また、双方の反射ミラー7,9にチルトを与える構
成とすることも可能である。いずれにしても、上記の実
施例によれば、干渉光学系にピエゾ素子のような可動部
を設ける必要がなくなり、光学系の剛性が良くて信頼性
が高く、シンプルな測定装置を得ることができる。In the above embodiment, the reflection mirror 7 has an angle γ
However, the reflection mirror 9 may be tilted at an angle γ to tilt the test wave b. Further, it is also possible to adopt a configuration in which both the reflection mirrors 7 and 9 are tilted. In any case, according to the above embodiment, it is not necessary to provide a movable part such as a piezo element in the interference optical system, and the rigidity of the optical system is high, the reliability is high, and a simple measuring device can be obtained. it can.
【0035】また、従来の位相シフト法が、1つの透過
波面を計測するのに光路差を変調させて、干渉縞強度信
号を4回乃至5回取り込まなければいけないために、一
度静止させてから回転する操作を繰り返し行う必要があ
ったのに対し、本発明のフーリエ変換法では1回で行う
ことができるので、回転させながら動的に干渉縞計測が
可能となり、非常に短時間に屈折率分布を計測すること
が可能である。この効果は、単に、測定時間の短縮にと
どまらず、被検物が時間的に変化する物体にも有効であ
る。In the conventional phase shift method, the optical path difference must be modulated to measure one transmitted wavefront, and the interference fringe intensity signal must be captured four or five times. In contrast to the necessity of repeatedly performing the rotation operation, the Fourier transform method of the present invention can perform the operation only once, so that the interference fringe measurement can be performed dynamically while rotating, and the refractive index can be measured in a very short time. It is possible to measure the distribution. This effect is effective not only for shortening the measurement time but also for an object whose test object changes with time.
【0036】[0036]
【発明の効果】以上に説明したように本発明によれば、
同一光源からの可干渉光を基準となる参照波と、被検物
を通過する被検波とに分割し、参照波と被検波とを重ね
て干渉縞を形成し、上記被検物を屈折率が被検物とほぼ
同じ試液内に浸し、被検物を光軸と直交する軸線回りに
回転させて各回転位置にて干渉縞強度を計測し、干渉縞
強度を解析して透過波面を算出し、該透過波面から被検
物の位相分布を測定する方法において、上記参照波と被
検波との光路差を常に一定にして計測するので、干渉光
学系にピエゾ素子のような可動部を設ける必要がなくな
り、光学系の剛性が良くて信頼性が高く、シンプルな測
定装置を得ることができる。According to the present invention as described above,
The coherent light from the same light source is divided into a reference wave serving as a reference and a test wave passing through the test object, and the reference wave and the test wave are overlapped to form an interference fringe, and the test object has a refractive index. Is immersed in the same sample solution as the test object, rotates the test object around the axis perpendicular to the optical axis, measures the interference fringe intensity at each rotation position, analyzes the interference fringe intensity, and calculates the transmitted wavefront In the method of measuring the phase distribution of the test object from the transmitted wavefront, since the measurement is performed while keeping the optical path difference between the reference wave and the test wave constant, a movable portion such as a piezo element is provided in the interference optical system. This eliminates the need for a simple measuring device with high rigidity and high reliability of the optical system.
【0037】上記参照波と被検波とを所定の角度でチル
トさせ、上記干渉縞強度の解析をフーリエ変換法により
行うこととすれば、位相シフト法に比べて高速な測定が
可能となる。If the reference wave and the test wave are tilted at a predetermined angle and the interference fringe intensity is analyzed by the Fourier transform method, the measurement can be performed at a higher speed than the phase shift method.
【0038】上記被検物を光軸と直交する軸線回りに回
転させながら次々に透過波面を測定し、CT(computed
tomography)法を用いて再構成し、被検物の位相分布
を三次元的に計測することにより被検物全体の位相分布
を高速に測定することが可能となる。The transmitted wavefront is measured one after another while rotating the test object around an axis orthogonal to the optical axis, and the CT (computed) is measured.
By performing reconstruction using a tomography method and three-dimensionally measuring the phase distribution of the test object, it is possible to measure the phase distribution of the entire test object at high speed.
【図1】本発明の位相分布測定装置の構成を示す平面図
である。FIG. 1 is a plan view showing a configuration of a phase distribution measuring device of the present invention.
【図2】本発の方法により透過波面からスペクトルを抽
出した状態を示す図である。FIG. 2 is a diagram showing a state where a spectrum is extracted from a transmitted wavefront by the method of the present invention.
【図3】本発の方法により透過波面を計測するフローチ
ャートである。FIG. 3 is a flowchart for measuring a transmitted wavefront by the method of the present invention.
【図4】従来の位相分布測定装置の構成を示す平面図で
ある。FIG. 4 is a plan view showing a configuration of a conventional phase distribution measuring device.
【図5】干渉縞の計測から位相分布を求めるための手順
を示すフローチャートである。FIG. 5 is a flowchart showing a procedure for obtaining a phase distribution from measurement of interference fringes.
【図6】CT解析の原理を説明する図である。FIG. 6 is a diagram illustrating the principle of CT analysis.
A 被検物 B 試液 O 回転軸 1 光源 A test object B reagent O rotation axis 1 light source
Claims (5)
照波と、被検物を通過する被検波とに分割し、参照波と
被検波とを重ねて干渉縞を形成し、上記被検物を屈折率
が被検物とほぼ同じ試液内に浸し、被検物を光軸と直交
する軸線回りに回転させて各回転位置にて干渉縞強度を
計測し、干渉縞強度を解析して透過波面を算出し、該透
過波面から被検物の位相分布を測定する方法において、 上記参照波と被検波との光路差を常に一定にして計測す
ることを特徴とする位相分布の測定方法。An interference fringe is formed by dividing coherent light from the same light source into a reference wave serving as a reference and a test wave passing through a test object, and superimposing the reference wave and the test wave to form interference fringes. The specimen is immersed in a sample solution with a refractive index almost the same as the specimen, the specimen is rotated around an axis perpendicular to the optical axis, the interference fringe intensity is measured at each rotation position, and the interference fringe intensity is analyzed. Calculating the transmitted wavefront by using the transmitted wavefront, and measuring the phase distribution of the test object from the transmitted wavefront, wherein the measurement is performed while keeping the optical path difference between the reference wave and the test wave constant. .
ルトさせることを特徴とする請求項1記載の位相分布の
測定方法。2. The phase distribution measuring method according to claim 1, wherein the reference wave and the test wave are tilted at a predetermined angle.
により行うことを特徴とする請求項1又は2記載の位相
分布の測定方法。3. The phase distribution measuring method according to claim 1, wherein the analysis of the interference fringe intensity is performed by a Fourier transform method.
回転させながら次々に透過波面を測定し、CT(comput
ed tomography)法を用いて再構成し、被検物の位相分
布を三次元的に計測することを特徴とする請求項1から
3のいずれかに記載の位相分布の測定方法。4. The transmitted wavefront is measured one after another while rotating the test object around an axis orthogonal to the optical axis, and the CT (compute) is measured.
The phase distribution measuring method according to any one of claims 1 to 3, wherein the phase distribution of the test object is three-dimensionally measured by performing reconstruction using an ed tomography method.
照波と、被検物を通過する被検波とに分割し、参照波と
被検波とを重ねて干渉縞を形成し、上記被検物を屈折率
が被検物とほぼ同じ試液内に浸し、被検物を光軸と直交
する軸線回りに回転させて各回転位置にて干渉縞強度を
計測し、干渉縞強度を解析して、透過波面を算出し、該
透過波面から被検物の位相分布を測定する装置におい
て、上記参照波及び/又は被検波の光路中に固定ミラー
を設け、該ミラーの少なくとも一方をチルト可能とし、
参照波と被検波とが所定の角度で交叉するようにしたこ
とを特徴とする位相分布の測定装置。5. A coherent light beam from the same light source is divided into a reference wave serving as a reference and a test wave passing through a test object, and the reference wave and the test wave are overlapped to form an interference fringe. The specimen is immersed in a sample solution with a refractive index almost the same as the specimen, the specimen is rotated around an axis perpendicular to the optical axis, the interference fringe intensity is measured at each rotation position, and the interference fringe intensity is analyzed. In the apparatus for calculating the transmitted wavefront and measuring the phase distribution of the test object from the transmitted wavefront, a fixed mirror is provided in the optical path of the reference wave and / or the test wave, and at least one of the mirrors can be tilted. ,
An apparatus for measuring a phase distribution, wherein a reference wave and a test wave cross at a predetermined angle.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10050014A JPH11230833A (en) | 1998-02-17 | 1998-02-17 | Method and apparatus for measuring phase distribution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10050014A JPH11230833A (en) | 1998-02-17 | 1998-02-17 | Method and apparatus for measuring phase distribution |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH11230833A true JPH11230833A (en) | 1999-08-27 |
Family
ID=12847153
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10050014A Pending JPH11230833A (en) | 1998-02-17 | 1998-02-17 | Method and apparatus for measuring phase distribution |
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| Country | Link |
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| JP (1) | JPH11230833A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002005828A (en) * | 2000-06-20 | 2002-01-09 | Tochigi Nikon Corp | Semiconductor impurity concentration inspection apparatus and inspection method |
| JP2008534929A (en) * | 2005-03-25 | 2008-08-28 | マサチユセツツ・インスチチユート・オブ・テクノロジイ | System and method for Hilbert phase image processing |
| JP2009210542A (en) * | 2008-03-06 | 2009-09-17 | Hamamatsu Photonics Kk | Observation device |
| WO2016104223A1 (en) * | 2014-12-26 | 2016-06-30 | 国立研究開発法人理化学研究所 | Wavefront distortion amount measurement device, wavefront correction device, and optical measurement device and method |
| CN105910630A (en) * | 2016-04-25 | 2016-08-31 | 中国科学院国家天文台南京天文光学技术研究所 | Light path difference measurement method based on space light path difference modulation and device thereof |
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1998
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002005828A (en) * | 2000-06-20 | 2002-01-09 | Tochigi Nikon Corp | Semiconductor impurity concentration inspection apparatus and inspection method |
| JP2008534929A (en) * | 2005-03-25 | 2008-08-28 | マサチユセツツ・インスチチユート・オブ・テクノロジイ | System and method for Hilbert phase image processing |
| JP2012211902A (en) * | 2005-03-25 | 2012-11-01 | Massachusetts Inst Of Technol <Mit> | System and method for hilbert phase imaging |
| JP2016029388A (en) * | 2005-03-25 | 2016-03-03 | マサチユセツツ・インスチチユート・オブ・テクノロジイMassachusetts Institute Of Technology | System and method for Hilbert phase image processing |
| US10256262B2 (en) | 2005-03-25 | 2019-04-09 | Massachusetts Institute Of Technology | System and method for Hilbert phase imaging |
| JP2009210542A (en) * | 2008-03-06 | 2009-09-17 | Hamamatsu Photonics Kk | Observation device |
| WO2016104223A1 (en) * | 2014-12-26 | 2016-06-30 | 国立研究開発法人理化学研究所 | Wavefront distortion amount measurement device, wavefront correction device, and optical measurement device and method |
| JP2016125895A (en) * | 2014-12-26 | 2016-07-11 | 国立研究開発法人理化学研究所 | Wavefront distortion measuring device, wavefront compensating device, optical measuring device, and method |
| CN105910630A (en) * | 2016-04-25 | 2016-08-31 | 中国科学院国家天文台南京天文光学技术研究所 | Light path difference measurement method based on space light path difference modulation and device thereof |
| JPWO2021117198A1 (en) * | 2019-12-12 | 2021-06-17 | ||
| WO2021117198A1 (en) * | 2019-12-12 | 2021-06-17 | オリンパス株式会社 | Sample structure measuring device and sample structure measuring method |
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