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(en )
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(en )
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(de )
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(2 )
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(en )
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(2 )
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(en )
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(ko )
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(en )
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(en )
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(ja )
1997-11-11
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(en )
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(2 )
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(ko )
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(ja )
1998-04-15
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KR100407292B1
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