JPH11248900A - Electron beam irradiation method and its device - Google Patents
Electron beam irradiation method and its deviceInfo
- Publication number
- JPH11248900A JPH11248900A JP10064812A JP6481298A JPH11248900A JP H11248900 A JPH11248900 A JP H11248900A JP 10064812 A JP10064812 A JP 10064812A JP 6481298 A JP6481298 A JP 6481298A JP H11248900 A JPH11248900 A JP H11248900A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- scanning
- magnetic field
- irradiation
- irradiated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000010894 electron beam technology Methods 0.000 title claims abstract description 170
- 238000000034 method Methods 0.000 title claims description 10
- 230000001954 sterilising effect Effects 0.000 claims abstract description 23
- 238000004659 sterilization and disinfection Methods 0.000 claims abstract description 16
- 235000013361 beverage Nutrition 0.000 claims description 12
- 230000001678 irradiating effect Effects 0.000 claims description 11
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 231100000987 absorbed dose Toxicity 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- PQLVXDKIJBQVDF-UHFFFAOYSA-N acetic acid;hydrate Chemical compound O.CC(O)=O PQLVXDKIJBQVDF-UHFFFAOYSA-N 0.000 description 1
- 244000052616 bacterial pathogen Species 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Apparatus For Disinfection Or Sterilisation (AREA)
Abstract
Description
【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION
【0001】[0001]
【発明の属する技術分野】本発明は、食品や飲料容器等
の被照射物、特に立体的で複雑な形状をした飲料容器に
電子線を繰り返しビーム走査しながら照射し殺菌等の所
期の目的を達成する電子線照射方法及びその装置に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an intended object such as sterilization by irradiating an object to be irradiated such as a food or beverage container, in particular, a beverage container having a three-dimensional and complicated shape, while repeatedly beam-scanning an electron beam. The present invention relates to an electron beam irradiation method and an apparatus for achieving the above.
【0002】[0002]
【発明が解決しようとする課題】食品や飲料容器を殺菌
する手段として従来の薬剤(オゾン水や過酢酸)による
殺菌手段や加熱殺菌手段に代り、電子線(電子ビーム)
を容器に所定の振れ角でビーム走査しながら照射して該
容器を殺菌する方法が、近年研究開発されつつある。か
かる電子線殺菌手段はペットボトル等の耐熱性の低い樹
脂容器等の殺菌に有効である。As a means for sterilizing food and beverage containers, an electron beam (electron beam) is used instead of the conventional sterilizing means using chemicals (ozone water or peracetic acid) or heat sterilizing means.
In recent years, a method of irradiating the container with a beam at a predetermined deflection angle while irradiating the container to sterilize the container has been researched and developed. Such electron beam sterilizing means is effective for sterilizing resin containers with low heat resistance such as PET bottles.
【0003】このような容器殺菌の為のビーム走査型電
子線照射装置は未だ公知ではないが、図6に示されるよ
うな装置が検討されている。図6において、1は電子線
(電子ビーム)2を発生する電子ビーム発生/加速装置
で、例えば電子銃を出射する電子銃と、その電子銃から
出射された電子ビームを所定のエネルギーを有するよう
に加速する加速管と、その加速管に前記電子ビームを加
速するためのマイクロ波エネルギーを供給するクライス
トロンとを具えている。そして前記加速された電子ビー
ム2は筒状のビームガイド筒3を介して収束電磁石4
(ビーム絞りレンズ)に導かれ、前記電子ビーム2を直
径方向に収束、言換えればビームの絞りを行ない細径化
させてエネルギーの高密度化を図る。Although a beam scanning type electron beam irradiation apparatus for sterilizing such a container has not been known yet, an apparatus as shown in FIG. 6 has been studied. In FIG. 6, reference numeral 1 denotes an electron beam generator / accelerator for generating an electron beam (electron beam) 2. For example, an electron gun for emitting an electron gun and an electron beam emitted from the electron gun have predetermined energy. And a klystron for supplying microwave energy to the accelerator for accelerating the electron beam. The accelerated electron beam 2 passes through a cylindrical beam guide tube 3 through a converging electromagnet 4
(A beam stop lens) to converge the electron beam 2 in the diameter direction, in other words, to narrow the beam by narrowing the beam to increase the energy density.
【0004】前記収束電磁石4により高密度化された収
束電子ビームは、前面に進むに連れビーム走査方向に拡
開された偏平円錐台状の走査ホーン6内に導入される。
走査ホーン6は入口側に走査電磁石5が、前面にスリッ
ト状の照射窓7を具え(同図(B)参照)、該照射窓7
をチタン膜等の電子線透過膜で封止し、内部を真空空間
下に維持させている。そして前記走査ホーン6内に導入
された収束ビームは走査電磁石5により所定の振れ角と
振れ周波数(往復偏向周波数)で偏向走査される訳であ
るが、この偏向走査を行なう際にビーム走査速度、言換
えれば角速度を制御する為に、前記走査電磁石5への印
加電圧を制御する制御信号を走査電磁石制御装置10か
ら取込むようにし、そして角速度を制御しながら偏向走
査された走査電子線8は偏平円錐台状の走査ホーン6内
及び照射窓7を介して容器20の基線方向に走査しなが
ら容器30全長に亙って照射して所定の殺菌動作を行な
う。The converging electron beam, which has been densified by the converging electromagnet 4, is introduced into a flat-cone-shaped frustum-shaped scanning horn 6 which expands in the beam scanning direction as it advances toward the front surface.
The scanning horn 6 is provided with a scanning electromagnet 5 on the entrance side and a slit-shaped irradiation window 7 on the front surface (see FIG. 1B).
Is sealed with an electron beam transmitting film such as a titanium film, and the inside is maintained in a vacuum space. The convergent beam introduced into the scanning horn 6 is deflected and scanned by the scanning electromagnet 5 at a predetermined deflection angle and a predetermined deflection frequency (reciprocating deflection frequency). In other words, in order to control the angular velocity, a control signal for controlling the voltage applied to the scanning electromagnet 5 is taken in from the scanning electromagnet controller 10, and the scanning electron beam 8 that has been deflected and scanned while controlling the angular velocity. A predetermined sterilization operation is performed by irradiating the entire length of the container 30 while scanning in the base line direction of the container 20 through the scanning horn 6 in the shape of a flat truncated cone and the irradiation window 7.
【0005】かかる装置における前記電子ビームの走査
角速度により形成される走査波形は走査電磁石5の磁界
強度変化、言換えれば該走査電磁石5に印加される電圧
変化に依存し、通常のビーム走査装置においては、その
電圧制御の容易さから被照射物の肉厚とは無関係に前記
走査波形が図6(C)に示すような三角波若しくは正弦
波(交流波形)になるように電圧制御される。[0005] The scanning waveform formed by the scanning angular velocity of the electron beam in such an apparatus depends on a change in the magnetic field strength of the scanning electromagnet 5, in other words, a change in the voltage applied to the scanning electromagnet 5, and in a normal beam scanning apparatus. The voltage is controlled so that the scanning waveform becomes a triangular wave or a sine wave (AC waveform) as shown in FIG. 6C irrespective of the thickness of the irradiation object because of its easy voltage control.
【0006】しかしながら被照射物の肉厚とは無関係に
前記三角波若しくは正弦波で走査を行なった場合、立体
的で複雑な形状をした例えばペットボトル等の飲料容器
20の内側及び外側の全表面を電子線照射により殺菌す
ることは中々困難である。特に飲料容器20等のキャッ
プは小さいためにその内側及び外側の全表面を電子線照
射により殺菌するのは中々困難である。However, when scanning is performed by the triangular wave or the sine wave irrespective of the thickness of the object to be irradiated, the entire inner and outer surfaces of the three-dimensionally complicated beverage container 20 such as a PET bottle, for example, are removed. Sterilization by electron beam irradiation is quite difficult. In particular, since the cap of the beverage container 20 or the like is small, it is very difficult to sterilize the entire inner and outer surfaces by electron beam irradiation.
【0007】キャップは図5(B)、(C)に示すよう
に、キャップは直径がφ30mm程度と小さく、外周側
にはすべり止溝31が、内周には締め付け用のネジ山3
2やシール用突起33があるなど複雑な構造をしてい
る。そこで本出願人は同時提出の特許願において、食品
飲料容器等のキャップ30を電子線照射により殺菌する
装置を提案している。As shown in FIGS. 5 (B) and 5 (C), the cap has a small diameter of about φ30 mm, a non-slip groove 31 on the outer periphery, and a screw thread 3 on the inner periphery.
It has a complicated structure such as 2 and a projection 33 for sealing. In view of the above, the present applicant has proposed a device for sterilizing a cap 30 such as a food / beverage container by electron beam irradiation in a patent application filed at the same time.
【0008】かかる装置は、図5(A)に示すように、
キャップ30開口を上向きにした状態で不図示の網目コ
ンベアにより搬送可能にした照射位置に位置するキャッ
プ30の上部に走査ホーン6を設置し、走査ホーン6に
はキャップ30の内外面を照射するように電子線を曲げ
る偏向磁石板19A、19Bを設け、キャップ30の下
部には反射板11を設置してキャップ30の底面等の外
面を照射させるようにしている。[0008] Such an apparatus, as shown in FIG.
The scanning horn 6 is installed above the cap 30 located at an irradiation position where the cap 30 can be conveyed by a mesh conveyor (not shown) with the opening of the cap 30 facing upward, and the scanning horn 6 irradiates the inner and outer surfaces of the cap 30. Further, deflection magnet plates 19A and 19B for bending an electron beam are provided, and a reflection plate 11 is provided below the cap 30 to irradiate an outer surface such as a bottom surface of the cap 30.
【0009】この場合、偏向磁石板19A、19Bは走
査ホーン6出口側の左右両側に一対配置され、又走査ホ
ーン6内の電子線の振れ角に対応してその偏向角も大き
くするために、走査軸線より遠ざかるにつれその偏向角
が中心側に向け大きくなるようにしている。これによ
り、照射窓7より出射される電子線8がキャップ30側
に集束される。In this case, a pair of deflecting magnet plates 19A and 19B are arranged on the left and right sides on the exit side of the scanning horn 6, and in order to increase the deflection angle corresponding to the deflection angle of the electron beam in the scanning horn 6. As the distance from the scanning axis increases, the deflection angle increases toward the center. Thereby, the electron beam 8 emitted from the irradiation window 7 is focused on the cap 30 side.
【0010】そして前記集束された電子線8がキャップ
30上面開口から外周面に照射される。一方前記キャッ
プ30底面側は反射板11により反射された電子線18
が照射される。Then, the focused electron beam 8 is applied to the outer peripheral surface from the upper opening of the cap 30. On the other hand, the bottom surface side of the cap 30 is the electron beam 18 reflected by the reflection plate 11.
Is irradiated.
【0011】従って本実施形態によれば、電子線は薬剤
と違って、小さな隙間にも侵入することができるが、直
進性があるので、凸部の陰になるところには侵入が困難
な場合があるが、本実施例によればネジ山やシール突起
部に電子線が直進出来るように電子線を曲げて照射する
ことにより、従来の薬剤殺菌では困難であった高レベル
の殺菌が可能となる。更に、キャップ30の下部の反射
板11によりキャップ30底部及び外周部を反射電子線
18で照射することにより、キャップ30の全内外面を
完全に殺菌することが可能となる。Therefore, according to the present embodiment, unlike an agent, an electron beam can penetrate into a small gap, but since it has a straight traveling property, it is difficult to penetrate a place behind a convex portion. However, according to the present embodiment, it is possible to perform high-level sterilization, which was difficult with conventional chemical sterilization, by bending and irradiating the electron beam so that the electron beam can proceed straight to the screw thread and the seal protrusion. Become. Further, by irradiating the bottom and the outer periphery of the cap 30 with the reflected electron beam 18 by the reflection plate 11 under the cap 30, it is possible to completely sterilize the entire inner and outer surfaces of the cap 30.
【0012】尚、前記偏向磁石板19A、19Bによる
偏向手段には、均一磁束密度の磁場内で、その磁場を通
過する距離を異ならせる方式、電子線がその磁場を通過
する距離を一定にした状態で、磁束密度を異ならせる方
式、及び両者を組合せた方式がある。The deflecting means provided by the deflecting magnet plates 19A and 19B have a system in which the distance through which the magnetic field passes is varied within a magnetic field having a uniform magnetic flux density, and the distance through which the electron beam passes through the magnetic field is made constant. There are a system in which the magnetic flux density differs in the state, and a system in which both are combined.
【0013】[0013]
【発明が解決しようとする課題】しかしながら前記装置
にも尚、次のような問題がある。即ち、前記装置は走査
磁石により電子線を扇状に走査し、更に二次元方向に拡
開された走査電子線を偏向磁石板により中心側に偏向し
てキャップ30に照射するが、前記電子線照射面は二次
元であり、一方キャップは3次元方向に肉厚や形状が大
きく異なるために、前記キャップを照射位置上で回転さ
せなければ精度よい電子線照射が困難である。しかしな
がら前記キャップのような小さなものを照射位置で回転
させながら殺菌することは、試験室段階では可能である
が、製造現場では実質的に難しい。特に製造現場ではコ
ンベア等により前記電子線照射面と直交する方向にキャ
ップを搬送しながら殺菌を行なうのが生産的であり、か
かる要請に耐え得る電子線照射装置の提供が待望されて
いた。However, the above apparatus still has the following problems. That is, the apparatus scans an electron beam in a fan shape by a scanning magnet, and further deflects the scanning electron beam expanded in a two-dimensional direction to the center side by a deflecting magnet plate to irradiate the cap 30 with the electron beam. Since the surface is two-dimensional, the thickness of the cap differs greatly in the three-dimensional direction and the shape is so large that accurate electron beam irradiation is difficult unless the cap is rotated on the irradiation position. However, while it is possible to sterilize a small object such as the cap while rotating it at the irradiation position at the laboratory stage, it is substantially difficult at the manufacturing site. In particular, at a manufacturing site, it is productive to carry out sterilization while transporting the cap in a direction orthogonal to the electron beam irradiation surface by a conveyor or the like, and it has been desired to provide an electron beam irradiation apparatus that can withstand such a request.
【0014】本発明はかかる技術課題に鑑み、キャップ
や飲料容器等の立体的に複雑な肉厚若しくは形状のもの
であっても、殺菌等の所期の目的を達成するものにおい
て、前記被照射物の照射方向各部位の電子線吸収量の均
一化を可能とし、これにより例えば前記容器においては
殺菌むらが無くかつ電子線照射による品質の悪化の発生
を防止し得る電子線照射方法及びその装置を提供するこ
とを目的とする。The present invention has been made in view of the above technical problem, and is intended to provide a method for achieving the intended purpose of sterilization or the like even when the cap or beverage container has a three-dimensionally complicated thickness or shape. An electron beam irradiation method and apparatus capable of equalizing the amount of electron beam absorption in each part of the irradiation direction of an object, thereby preventing, for example, sterilization unevenness in the container and preventing deterioration in quality due to electron beam irradiation. The purpose is to provide.
【0015】[0015]
【課題を解決するための手段】本発明はかかる課題を解
決するため、請求項1記載の発明において、負圧(真
空)空間内で電子線を走査する走査体の照射窓部より出
射される走査電子線を、食品や飲料容器等の立体形状の
被照射物に繰り返し照射しながら殺菌等の所期の目的を
達成する電子線照射方法において、前記走査体入口側の
電子線入射位置上に、該電子線入射方向とほぼ直交する
面内に少なくとも2つの側より交番磁界を印加して、電
子線を円周方向に走査するようにしたことを特徴とする
電子線照射方法を提案する。According to the present invention, in order to solve the above-mentioned problem, in the invention according to the first aspect, an electron beam is emitted from an irradiation window portion of a scanning body for scanning an electron beam in a negative pressure (vacuum) space. In an electron beam irradiation method for achieving an intended purpose such as sterilization while repeatedly irradiating a scanning electron beam to a three-dimensional object to be irradiated such as a food or beverage container, the electron beam irradiation position on an entrance side of the scanning body. An electron beam irradiation method is proposed wherein an alternating magnetic field is applied from at least two sides in a plane substantially orthogonal to the electron beam incident direction to scan the electron beam in the circumferential direction.
【0016】かかる発明によれば、立体形状の被照射
物、例えばキャップ形状に合わせて照射される電子線が
3次元状に、具体的には円錐状に周回しながら照射され
るために、キャップや飲料容器等の立体的に複雑な肉厚
若しくは形状のものであっても、特にコンベア等により
前記電子線照射面と直交する方向に搬送されるものであ
っても電子線照射パターンがこれに対応する3次元状形
状であるために、被照射物の上方を円滑に照射すること
が可能となり、殺菌むらが無くかつ電子線照射による品
質の悪化の発生を防止し得る殺菌手段の提供が可能とな
る。According to this invention, since the three-dimensional object to be irradiated, for example, the electron beam irradiated in conformity with the shape of the cap is irradiated while rotating in a three-dimensional shape, specifically, in a conical shape, Even if it has a three-dimensionally complicated thickness or shape, such as a container or a beverage container, even if it is transported in a direction perpendicular to the electron beam irradiation surface by a conveyor or the like, the electron beam irradiation pattern is Since it has a corresponding three-dimensional shape, it is possible to smoothly irradiate the upper side of the object to be irradiated, and it is possible to provide sterilization means capable of preventing uneven sterilization and preventing deterioration in quality due to electron beam irradiation. Becomes
【0017】このような手段でキャップのような小さい
形状のものを電子線照射した場合、電子線を円錐状に走
査する走査角に比較して容器外径が小さいために中心付
近の走査電子線は容器を照射するが、その外側の走査ビ
ームはキャップ外に照射され、そのほとんどが無駄にな
る。When a small object such as a cap is irradiated with an electron beam by such means, the outer diameter of the container is smaller than the scanning angle at which the electron beam is conically scanned. Illuminates the container, but the outer scanning beam is illuminated outside the cap, most of which is wasted.
【0018】請求項2記載の発明は、かかる点に鑑み、
前記円周方向に走査後の走査電子線を(中心側に)偏向
する方向に、該走査電子線に磁力線を加え、前記キャッ
プ(被照射物)外に照射され、そのほとんどが無駄にな
る外側の走査ビームを中心側に偏向させ小さい形状の被
照射物であっても電子線の効率的照射を可能とするもの
である。この場合、前記磁力線による電子線の偏向位置
は、走査ホーンの電子線照射窓7の出口側の大気空間中
でもよいが大気中だと電子線が発散して精度よく偏向で
きない。即ち偏向磁石を走査ホーンの外側(大気側)に
設置した場合、電子線は真空中から大気中に出ると、空
気分子に作用して散乱を受け電子線束の断面形状が拡大
して偏向効率が悪化する不具合を有している。そこで好
ましくは、前記磁力線による電子線の偏向位置が、前記
電子線を走査する為に形成された負圧(真空も含む)空
間であるのがよい。In view of the above, the invention according to claim 2 provides
A magnetic field line is applied to the scanning electron beam in a direction to deflect the scanning electron beam (to the center side) after the scanning in the circumferential direction, and the scanning electron beam is irradiated to the outside of the cap (object to be irradiated). The scanning beam is deflected toward the center so that an electron beam can be efficiently irradiated even if the irradiation object has a small shape. In this case, the deflection position of the electron beam by the magnetic force lines may be in the air space on the exit side of the electron beam irradiation window 7 of the scanning horn. However, in the air, the electron beam diverges and cannot be accurately deflected. In other words, when the deflection magnet is installed outside the scanning horn (atmosphere side), when the electron beam exits from the vacuum to the atmosphere, it acts on air molecules and is scattered to enlarge the cross-sectional shape of the electron beam, thereby increasing the deflection efficiency. It has a problem that worsens. Therefore, it is preferable that the deflection position of the electron beam by the magnetic force line is a negative pressure (including vacuum) space formed for scanning the electron beam.
【0019】請求項3記載の発明は、前記請求項1記載
の発明を効果的に実施するための電子線照射装置に関す
る発明で、前記走査体入口側の電子線入射位置上に、該
電子線入射方向とほぼ直交する面内に少なくとも2つの
側より交番磁界を印加する磁界印加手段を配設し、電子
線を円周方向に走査可能に構成したことを特徴とする。According to a third aspect of the present invention, there is provided an invention relating to an electron beam irradiating apparatus for effectively implementing the first aspect of the present invention. Magnetic field applying means for applying an alternating magnetic field from at least two sides in a plane substantially orthogonal to the incident direction is provided so that the electron beam can be scanned in the circumferential direction.
【0020】請求項4記載の発明は、前記請求項2記載
の発明を効果的に実施するための装置に関する発明で、
前記円周方向の走査位置より走査後の電子線が前記被照
射物に照射されるまでの所定位置の走査電子線を囲繞す
る如くNS複数組の電子線偏向用の磁石体を配置し、該
磁石体により電子線を偏向する方向に、該走査電子線に
磁力線を加え、前記被照射物に照射される電子線の一部
が前記磁力線により偏向された電子線であることを特徴
とする。A fourth aspect of the present invention relates to an apparatus for effectively implementing the second aspect of the present invention.
A plurality of NS sets of electron beam deflecting magnets are arranged so as to surround the scanning electron beam at a predetermined position until the object to be irradiated with the electron beam after scanning from the circumferential scanning position, A magnetic field line is applied to the scanning electron beam in a direction in which the electron beam is deflected by the magnet body, and a part of the electron beam irradiated on the irradiation object is an electron beam deflected by the magnetic field line.
【0021】尚、前記請求項3記載の磁界印加手段は、
走査体入口部を囲繞する如く配設したNS複数組の交流
電磁石体であり、該各組の電磁石体に振幅が同じで位相
の異なる交流電流を印加したことを特徴と、又前記請求
項4記載の電子線偏向用の磁石体の該各組の電磁石体に
振幅が同じで位相の異なる交流電流を印加するのがよ
く、更に前記磁界印加手段はNS複数組の電子線走査用
の磁石体である場合において、電子線偏向用の磁石体と
電子線走査用の磁石体に夫々印加される交流電流が夫々
逆位相であることを特徴とする。The magnetic field applying means according to claim 3 is
5. A plurality of sets of NS electromagnets disposed so as to surround a scanning body entrance, wherein alternating currents having the same amplitude and different phases are applied to the electromagnets of each set. It is preferable that alternating currents having the same amplitude and different phases are applied to the electromagnet bodies of each set of the magnet body for electron beam deflection described above, and the magnetic field applying means further comprises a plurality of NS magnet sets for electron beam scanning. In this case, the alternating current applied to the magnet for electron beam deflection and the alternating current applied to the magnet for electron beam scanning have opposite phases.
【0022】かかる発明によれば、電子線走査用の磁石
体により円錐方向に拡径されながら周回する走査電子線
は、逆位相の電子線偏向用の磁石体により集束方向(中
心側方向)偏向され、この結果小さな直径のキャップで
も円滑に電子線照射が可能となる。According to this invention, the scanning electron beam which circulates while being expanded in the conical direction by the electron beam scanning magnet body is deflected in the focusing direction (center side direction) by the opposite phase electron beam deflection magnet body. As a result, even if the cap has a small diameter, the electron beam can be smoothly irradiated.
【0023】尚、前記の構成を取っても、照射窓の反対
側に位置する容器底面に直接照射させることは不可能で
ある。そこで本発明は、請求項6記載の様に、被照射物
を挟んで前記走査体の反対側に反射板を設置し、該反射
板から反射された反射電子線により、被照射物の底面外
部を付加照射するのがよい。Even if the above configuration is adopted, it is impossible to directly irradiate the bottom of the container located on the opposite side of the irradiation window. Therefore, according to the present invention, a reflecting plate is provided on the opposite side of the scanning body with the object to be illuminated therebetween, and the reflected electron beam reflected from the reflecting plate causes the outer surface of the bottom of the object to be illuminated. Is preferably applied.
【0024】前記電子線反射板は原子番号の大きい金属
若しくは金属膜、例えばタングステン板や金板若しくは
ステンレス板に金メッキを施した部材で形成する事によ
り、加速エネルギが低い(600KeV)電子線では約
50%の電子の反射が期待できる。又、電子線反射板の
反射面形状は、被照射物の所定部位に電子線を集束させ
る集束(集光)面形状、具体的には半球状、若しくは凹
曲面状に形成するのが好ましいが、コンベアで搬送する
必要から平板状若しくはU字状の反射板で形成すること
も可能である。The electron beam reflecting plate is made of a metal or a metal film having a large atomic number, for example, a tungsten plate, a gold plate or a stainless steel plate plated with gold, so that an electron beam having a low acceleration energy (600 KeV) can be used. 50% electron reflection can be expected. The reflecting surface shape of the electron beam reflecting plate is preferably formed in a converging (light collecting) surface shape for converging the electron beam on a predetermined portion of the irradiation object, specifically, in a hemispherical or concave curved surface shape. It is also possible to form a flat or U-shaped reflecting plate because it needs to be conveyed by a conveyor.
【0025】[0025]
【発明の実施の形態】以下、図面を参照して本発明の好
適な実施形態を例示的に詳しく説明する。但しこの実施
形態に記載されている構成部品の寸法、材質、形状、そ
の相対的配置等は特に特定的な記載がないかぎりは、こ
の発明の範囲をそれに限定する趣旨ではなく、単なる説
明例にすぎない。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will now be described in detail with reference to the drawings. However, the dimensions, materials, shapes, relative arrangements, and the like of the components described in this embodiment are not intended to limit the scope of the present invention unless otherwise specified, and are merely illustrative examples. Only.
【0026】図1は本発明の実施形態に係るビーム走査
型電子線照射装置を示し、図2は該装置を上面から見た
平面図である。図1及び図2において、6はビームガイ
ド筒3出口端より円錐状に拡径された走査ホーンで、前
面にリング円状の照射窓70を有する。50はビーム走
査を行なう走査磁石体で、走査ホーン6の入口部(始
端)においてビーム中心線に対し直交する面内に正方形
枠状に囲繞されている。そして該走査磁石体50は、ホ
ーン6内真空空間に図4に示す磁場を形成すべく図3
(A)に示すような交流電流を印加する走査磁場発生用
の電源が接続されている。FIG. 1 shows a beam scanning type electron beam irradiation apparatus according to an embodiment of the present invention, and FIG. 2 is a plan view of the apparatus as viewed from above. 1 and 2, reference numeral 6 denotes a scanning horn whose diameter is expanded conically from the exit end of the beam guide cylinder 3 and has a ring-shaped irradiation window 70 on the front surface. Reference numeral 50 denotes a scanning magnet body for performing beam scanning, which is enclosed in a square frame shape at the entrance (starting end) of the scanning horn 6 in a plane perpendicular to the beam center line. The scanning magnet body 50 forms the magnetic field shown in FIG.
A power supply for generating a scanning magnetic field for applying an alternating current as shown in FIG.
【0027】60は、走査ホーン出口側の照射窓70よ
り僅かに上方の走査ホーン6周囲を囲繞するごとくビー
ム中心線に対し直交する面内に正方形枠状に囲繞されて
いる偏向磁石体で、走査ホーン6内真空空間に図4に示
す磁場を形成すべく図3(B)に示すような交流電流を
印加する不図示の偏向磁場発生用の電源が接続されてい
る。Numeral 60 denotes a deflection magnet body surrounded by a square frame in a plane perpendicular to the beam center line so as to surround the periphery of the scanning horn 6 slightly above the irradiation window 70 on the scanning horn outlet side. A power supply (not shown) for generating a deflection magnetic field, which applies an alternating current as shown in FIG. 3B to form a magnetic field shown in FIG. 4 in a vacuum space in the scanning horn 6, is connected.
【0028】そして前記照射窓70と反対側にキャップ
30下方のキャップ底部と対面する位置に反射板12を
配置している。反射板12には、金(メッキ)、タング
ステン等の原子番号の大きな金属を用いて、加速エネル
ギが低い(600KeV)電子線でも約50%の電子の
反射が期待できるように設定している。又、前記反射板
12の反射面形状は、走査ホーン6より出射される電子
線8が拡開若しくは収束方向に偏向しているためにこれ
に対応して半球状の反射板12を配設しているが、前記
キャップ30をコンベア等で搬送する場合は、そのコン
ベア通過部位を切り欠くか、若しくはU字状に形成して
もよい。尚、コンベアを用いる場合は網目状にし、下側
に配した反射板12よりの反射電子線18の照射を容易
にする必要がある。On the opposite side of the irradiation window 70, the reflector 12 is disposed at a position facing the bottom of the cap below the cap 30. The reflector 12 is made of a metal having a large atomic number such as gold (plating) or tungsten, and is set so that about 50% of electrons can be reflected even with an electron beam having a low acceleration energy (600 KeV). The reflecting surface of the reflecting plate 12 has a hemispherical reflecting plate 12 corresponding to the electron beam 8 emitted from the scanning horn 6 which is deflected in the expanding or converging direction. However, when the cap 30 is conveyed by a conveyor or the like, the conveyor passage portion may be cut out or formed in a U-shape. When a conveyor is used, it is necessary to form a mesh and facilitate irradiation of the reflected electron beam 18 from the reflection plate 12 arranged on the lower side.
【0029】前記方形枠状の走査磁石体50(50A、
50B)は図4に示すように、対面する二辺が夫々N極
とS極となる四極磁石構造に設定する。即ち走査磁石体
50A、50Bを構成する四極磁石はN極とS極が互い
に向き合う2組の交流電磁石により形成される。そし
て、図3(A)に示すように前記N/S各組の4極磁石
50A及び50Bに振幅が同じで位相が90°異なる交
流電流を印加すると、走査磁石体50の中心部を通過す
る電子線が円周状に周回走査されるような磁場を与える
ことが出来る。The scanning magnet body 50 (50A, 50A,
50B) is set to a quadrupole magnet structure in which two facing sides are an N pole and an S pole, respectively, as shown in FIG. That is, the quadrupole magnets constituting the scanning magnet bodies 50A and 50B are formed by two sets of AC electromagnets whose north and south poles face each other. Then, as shown in FIG. 3 (A), when alternating currents having the same amplitude and a different phase by 90 ° are applied to the N / S quadrupole magnets 50A and 50B, they pass through the center of the scanning magnet body 50. It is possible to apply a magnetic field such that the electron beam is scanned circularly.
【0030】前記方形枠状の偏向磁石体60も同様に図
4に示すように、対面する二辺が夫々N極とS極となる
四極磁石構造に設定する。即ち偏向磁石体60を構成す
る四極磁石もN極とS極が互いに向き合う2組の交流電
磁石60A、60Bにより形成される。そして図3
(B)に示すように前記偏向磁石体60も走査磁石体5
0に印加する交流電流と位相が180°異なる交流電流
を印加すると、走査磁石体50により円錐状に拡径され
ながら周回走査されていた走査電子線が、前記走査磁石
体50と逆位相の磁場によりあたかも光が凸レンズを通
過する如く円軌道を描きながら集束する。前記偏向磁石
体60に印加する交流電流の強度(波高)は、走査磁石
体50に印加する交流電流の強度(波高)に比較して大
に設定しているが、これは囲繞する走査ホーン6の径に
対応するものである。As shown in FIG. 4, the rectangular frame-shaped deflection magnet body 60 is also set to a quadrupole magnet structure in which two opposite sides are an N pole and an S pole, respectively. That is, the quadrupole magnet constituting the deflecting magnet body 60 is also formed by two sets of AC electromagnets 60A and 60B whose N pole and S pole face each other. And FIG.
As shown in (B), the deflection magnet body 60 is also the scanning magnet body 5.
When an alternating current having a phase 180 ° different from that of the alternating current applied to 0 is applied, the scanning electron beam that has been concentrically expanded by the scanning magnet body 50 and is orbitally scanned becomes a magnetic field having a phase opposite to that of the scanning magnet body 50. Focuses while drawing a circular orbit as if the light passes through a convex lens. The intensity (wave height) of the alternating current applied to the deflection magnet body 60 is set to be larger than the intensity (wave height) of the alternating current applied to the scanning magnet body 50. Corresponding to the diameter of
【0031】この結果、電子線走査用の磁石体50によ
り円錐方向に拡径されながら周回する走査電子線は、逆
位相の電子線偏向用の磁石体60により集束方向(中心
側方向)に偏向される。As a result, the scanning electron beam that circulates while being expanded in the conical direction by the electron beam scanning magnet body 50 is deflected in the focusing direction (center side direction) by the anti-phase electron beam deflection magnet body 60. Is done.
【0032】次にかかる実施形態の作用を図1に基づい
て説明する。先ず円錐状の走査ホーン6の始端にある4
極構造の走査磁石体50にて電子線が円周状に周回さ
れ、円錐状に走査される走査電子線が形成される。円錐
状に走査された電子線は同様に4極構造の偏向磁石体6
0により集束方向(中心側方向)に偏向され、この結果
小さな直径のキャップ30でも円滑に電子線照射が可能
となる。Next, the operation of this embodiment will be described with reference to FIG. First, 4 at the beginning of the conical scanning horn 6
The scanning magnet body 50 having the polar structure circulates the electron beam in a circular shape, and forms a scanning electron beam that is scanned conically. The electron beam scanned in a conical shape is also a deflection magnet body 6 having a quadrupole structure.
By 0, the beam is deflected in the focusing direction (center-side direction). As a result, even if the cap 30 has a small diameter, the electron beam can be smoothly irradiated.
【0033】更に電子線8の透過しにくいキャップ底部
26については前記電子線8が反射板12で反射した反
射電子線18により照射される。これによりキャップ3
0のどの部位でも吸収線量を概ね均一にすることができ
る。Further, the electron beam 8 is radiated to the cap bottom 26 where the electron beam 8 is hardly transmitted by the reflected electron beam 18 reflected by the reflection plate 12. This makes the cap 3
The absorbed dose can be made substantially uniform at any part of zero.
【0034】尚、前記電子線は走査ホーン6内の真空空
間中を直進している間は、拡散がないために真空空間中
で振れ幅の最も大きい大気照射位置直前に偏向磁石体6
0を配置するのが好ましいが、前記偏向磁石体60は大
気照射位置直後の照射窓70前面に配置してもよい。While the electron beam is traveling straight in the vacuum space inside the scanning horn 6, since there is no diffusion, the deflection magnet body 6 just before the air irradiation position having the largest swing in the vacuum space.
Although it is preferable to arrange 0, the deflection magnet body 60 may be arranged in front of the irradiation window 70 immediately after the atmospheric irradiation position.
【0035】[0035]
【発明の効果】以上記載のごとく請求項1及び3記載の
発明によれば、立体形状の被照射物、例えばキャップ形
状に合わせて照射される電子線が3次元状に、具体的に
は円錐状に周回しながら照射されるために、キャップや
飲料容器等の立体的に複雑な肉厚若しくは形状のもので
あっても、特にコンベア等により前記電子線照射面と直
交する方向に搬送されるものであっても電子線照射パタ
ーンがこれに対応する3次元状形状であるために、被照
射物の上方を円滑に照射することが可能となり、殺菌む
らが無くかつ電子線照射による品質の悪化の発生を防止
し得る殺菌手段の提供が可能となる。As described above, according to the first and third aspects of the present invention, an object to be irradiated having a three-dimensional shape, for example, an electron beam irradiated in accordance with the shape of a cap, is formed into a three-dimensional shape, specifically, a cone. Even in the case of a three-dimensionally complicated thickness or shape such as a cap or a beverage container, it is conveyed in a direction orthogonal to the electron beam irradiation surface by a conveyor or the like, in order to irradiate while circulating in a shape. Even if the electron beam irradiation pattern has a three-dimensional shape corresponding to this, it is possible to irradiate the area above the irradiation object smoothly, and there is no sterilization unevenness and the quality is deteriorated by the electron beam irradiation. It is possible to provide a sterilization means capable of preventing the occurrence of germs.
【0036】請求項2及び4記載の発明によれば、前記
円周方向に走査後の走査電子線を(中心側に)偏向する
方向に、該走査電子線に磁力線を加え、前記キャップ
(被照射物)外に照射され、そのほとんどが無駄になる
外側の走査ビームを中心側に偏向させ小さい形状の被照
射物であっても電子線の効率的照射を可能とする。また
磁石体である場合において、電子線偏向用の磁石体と電
子線走査用の磁石体に夫々印加される交流電流が夫々逆
位相であることを特徴とする。According to the second and fourth aspects of the present invention, magnetic force lines are applied to the scanning electron beam in a direction of deflecting (to the center side) the scanning electron beam after scanning in the circumferential direction, and the cap (covered) is applied. The outer scanning beam, which is radiated to the outside and is mostly wasted, is deflected toward the center, thereby enabling efficient irradiation of the electron beam even for a small-shaped object to be irradiated. Further, in the case of a magnet body, the alternating current applied to the magnet body for electron beam deflection and the alternating current applied to the magnet body for electron beam scanning have opposite phases.
【0037】かかる発明によれば、電子線走査用の磁石
体により円錐方向に拡径されながら周回する走査電子線
は、逆位相の電子線偏向用の磁石体により集束方向(中
心側方向)偏向され、この結果小さな直径のキャップで
も円滑に電子線照射が可能となる。According to this invention, the scanning electron beam which circulates while being expanded in the conical direction by the electron beam scanning magnet body is deflected in the focusing direction (center side direction) by the opposite phase electron beam deflection magnet body. As a result, even if the cap has a small diameter, the electron beam can be smoothly irradiated.
【0038】請求項6の発明によれば、被照射物を挟ん
で前記走査体の反対側に反射板を設置し、該反射板から
反射された反射電子線により、被照射物の底面外部を付
加照射することが出来る。According to the sixth aspect of the present invention, a reflector is provided on the opposite side of the scanning body with respect to the object to be illuminated, and the outside of the bottom surface of the object is illuminated by the reflected electron beam reflected from the reflector. Additional irradiation can be performed.
【図1】 本発明の実施形態に係るビーム走査型電子線
走査装置の全体概略図で、(A)は要部斜視図、(B)
は全体正面図である。FIG. 1 is an overall schematic view of a beam scanning type electron beam scanning apparatus according to an embodiment of the present invention, where (A) is a perspective view of a main part and (B)
Is an overall front view.
【図2】 図1の実施形態に係るビーム走査型電子線走
査装置を上面からみた平面図である。FIG. 2 is a plan view of the beam scanning electron beam scanning device according to the embodiment of FIG. 1 as viewed from above.
【図3】 (A)は走査磁石体に印加する交流電流の位
相波形図、(B)は偏向磁石体に印加する交流電流の位
相波形図である。3A is a phase waveform diagram of an AC current applied to a scanning magnet body, and FIG. 3B is a phase waveform diagram of an AC current applied to a deflection magnet body.
【図4】 走査磁石体と偏向磁石体夫々に使用される4
極磁石構造と、該4極磁石により形成された磁場と電子
線との関係を(A)及び(B)に示した図である。FIG. 4 shows 4 used for the scanning magnet body and the deflection magnet body, respectively.
FIGS. 4A and 4B show a polar magnet structure and the relationship between a magnetic field formed by the quadrupole magnet and an electron beam. FIGS.
【図5】 (A)は本発明の比較技術に係るビーム走査
型電子線走査装置の全体概略図で、走査ホーンをキャッ
プ上方に配置してある。(B)はキャップ形状を示す斜
視図、(C)はその断面図である。FIG. 5A is an overall schematic view of a beam scanning type electron beam scanning apparatus according to a comparative technique of the present invention, in which a scanning horn is arranged above a cap. (B) is a perspective view showing a cap shape, and (C) is a sectional view thereof.
【図6】 本発明の前提となる前記ビーム走査型電子線
走査装置の基本構成を示し、(A)は正面図、(B)は
走査ホーンの窓部の形状を示し、(C)は電子線の走査
状態を示す。6A and 6B show a basic configuration of the beam scanning type electron beam scanning apparatus as a premise of the present invention, wherein FIG. 6A is a front view, FIG. 6B shows a shape of a window of a scanning horn, and FIG. The scanning state of the line is shown.
【符号の説明】 50 4極構造の走査磁石体 6 走査ホーン 60 4極構造の偏向磁石体 70 照射窓 8 走査電子線 12 反射板 30 キャップ[Description of Signs] 50 Scanning Magnet Body with 4-Pole Structure 6 Scanning Horn 60 Deflection Magnet Body with 4-Pole Structure 70 Irradiation Window 8 Scanning Electron Beam 12 Reflector 30 Cap
Claims (8)
走査体の照射窓部より出射される走査電子線を、食品や
飲料容器等の立体形状の被照射物に繰り返し照射しなが
ら殺菌等の所期の目的を達成する電子線照射方法におい
て、 前記走査体入口側の電子線入射位置上に、該電子線入射
方向とほぼ直交する面内に少なくとも2つの側より交番
磁界を印加して、電子線を円周方向に走査するようにし
たことを特徴とする電子線照射方法。A scanning electron beam emitted from an irradiation window of a scanning body for scanning an electron beam in a negative pressure (vacuum) space while repeatedly irradiating a three-dimensional object such as a food or beverage container. In an electron beam irradiation method for achieving an intended purpose such as sterilization, an alternating magnetic field is applied from at least two sides in a plane substantially orthogonal to the electron beam incident direction on the electron beam incident position on the scanning body entrance side. And scanning the electron beam in the circumferential direction.
向する方向に、該走査電子線に磁力線を加え、前記被照
射物に照射される電子線の一部が前記磁力線により偏向
された電子線であることを特徴とする請求項1記載の電
子線照射方法。2. A magnetic field line is applied to the scanning electron beam in a direction of deflecting the scanning electron beam after scanning in the circumferential direction, and a part of the electron beam irradiated on the irradiation object is deflected by the magnetic field line. The electron beam irradiation method according to claim 1, wherein the electron beam is irradiated.
走査体の照射窓部より出射される走査電子線を、食品や
飲料容器等の立体形状の被照射物に繰り返し照射しなが
ら殺菌等の所期の目的を達成する電子線照射装置におい
て、 前記走査体入口側の電子線入射位置上に、該電子線入射
方向とほぼ直交する面内に少なくとも2つの側より交番
磁界を印加する磁界印加手段を配設し、電子線を円周方
向に走査可能に構成したことを特徴とする電子線照射装
置。3. A three-dimensional object such as a food or beverage container is repeatedly irradiated with a scanning electron beam emitted from an irradiation window of a scanning body for scanning an electron beam in a negative pressure (vacuum) space. In an electron beam irradiation apparatus for achieving an intended purpose such as sterilization, an alternating magnetic field is applied from at least two sides in a plane substantially orthogonal to the electron beam incident direction on an electron beam incident position on the scanning body entrance side. An electron beam irradiating apparatus, wherein a magnetic field applying means for irradiating an electron beam is provided so that an electron beam can be scanned in a circumferential direction.
子線が前記被照射物に照射されるまでの所定位置の走査
電子線を囲繞する如くNS複数組の電子線偏向用の磁石
体を配置し、該磁石体により電子線を偏向する方向に、
該走査電子線に磁力線を加え、前記被照射物に照射され
る電子線の一部が前記磁力線により偏向された電子線で
あることを特徴とする請求項3記載の電子線照射装置。4. A plurality of NS magnet sets for deflecting an electron beam so as to surround a scanning electron beam at a predetermined position until the object is irradiated with an electron beam after scanning from the scanning position in the circumferential direction. Is arranged, in the direction of deflecting the electron beam by the magnet body,
4. The electron beam irradiation apparatus according to claim 3, wherein a magnetic field line is applied to the scanning electron beam, and a part of the electron beam irradiated on the irradiation object is an electron beam deflected by the magnetic field line.
査体入口部を囲繞する如く配設したNS複数組の交流電
磁石体であり、該各組の電磁石体に振幅が同じで位相の
異なる交流電流を印加したことを特徴とする請求項3記
載の電子線照射装置。5. The magnetic field applying means according to claim 3, comprising a plurality of sets of NS electromagnets arranged so as to surround the entrance of the scanning body, wherein each set of electromagnets has the same amplitude and phase. 4. The electron beam irradiation apparatus according to claim 3, wherein different AC currents are applied.
体の該各組の電磁石体に振幅が同じで位相の異なる交流
電流を印加したことを特徴とする電子線照射装置。6. An electron beam irradiation apparatus, wherein alternating currents having the same amplitude and different phases are applied to the respective sets of electromagnet bodies of the magnet body for electron beam deflection according to claim 4.
走査用の磁石体である場合において、電子線偏向用の磁
石体と電子線走査用の磁石体に夫々印加される交流電流
が夫々逆位相であることを特徴とする請求項4記載の電
子線照射装置。7. When the magnetic field applying means is a plurality of NS magnet bodies for scanning an electron beam, the alternating current applied to the magnet body for deflecting the electron beam and the alternating current applied to the magnet body for scanning the electron beam, respectively. 5. The electron beam irradiation apparatus according to claim 4, wherein the electron beam irradiation apparatus has an opposite phase.
反射板を設置し、該反射板から反射された反射電子線に
より、被照射物の底面外部を付加照射することを特徴と
する請求項3記載の電子線照射装置。8. A reflector is provided on the opposite side of the scanning body with the object to be illuminated therebetween, and the outside of the bottom of the object to be illuminated is additionally illuminated by a reflected electron beam reflected from the reflector. The electron beam irradiation apparatus according to claim 3.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10064812A JPH11248900A (en) | 1998-02-27 | 1998-02-27 | Electron beam irradiation method and its device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10064812A JPH11248900A (en) | 1998-02-27 | 1998-02-27 | Electron beam irradiation method and its device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH11248900A true JPH11248900A (en) | 1999-09-17 |
Family
ID=13269042
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10064812A Withdrawn JPH11248900A (en) | 1998-02-27 | 1998-02-27 | Electron beam irradiation method and its device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11248900A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002255125A (en) * | 2001-02-28 | 2002-09-11 | Ishikawajima Harima Heavy Ind Co Ltd | Container sterilization method and sterilization device |
| JP2007268035A (en) * | 2006-03-31 | 2007-10-18 | Hitachi Ltd | Scanning irradiation nozzle device, beam transport chamber and particle beam therapy system |
| JP2008195428A (en) * | 2007-02-14 | 2008-08-28 | Mitsubishi Heavy Industries Food & Packaging Machinery Co Ltd | Sterilizer |
| JP2009035330A (en) * | 2007-04-19 | 2009-02-19 | Krones Ag | Device for sterilizing containers |
-
1998
- 1998-02-27 JP JP10064812A patent/JPH11248900A/en not_active Withdrawn
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002255125A (en) * | 2001-02-28 | 2002-09-11 | Ishikawajima Harima Heavy Ind Co Ltd | Container sterilization method and sterilization device |
| JP2007268035A (en) * | 2006-03-31 | 2007-10-18 | Hitachi Ltd | Scanning irradiation nozzle device, beam transport chamber and particle beam therapy system |
| JP2008195428A (en) * | 2007-02-14 | 2008-08-28 | Mitsubishi Heavy Industries Food & Packaging Machinery Co Ltd | Sterilizer |
| JP2009035330A (en) * | 2007-04-19 | 2009-02-19 | Krones Ag | Device for sterilizing containers |
| US8294126B2 (en) | 2007-04-19 | 2012-10-23 | Krones Ag | Apparatus for sterilising containers |
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