JPH1126691A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH1126691A
JPH1126691A JP9177887A JP17788797A JPH1126691A JP H1126691 A JPH1126691 A JP H1126691A JP 9177887 A JP9177887 A JP 9177887A JP 17788797 A JP17788797 A JP 17788797A JP H1126691 A JPH1126691 A JP H1126691A
Authority
JP
Japan
Prior art keywords
insulating substrate
insulating
base plate
metal foil
metal base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9177887A
Other languages
Japanese (ja)
Inventor
Soichi Okita
沖田  宗一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP9177887A priority Critical patent/JPH1126691A/en
Publication of JPH1126691A publication Critical patent/JPH1126691A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0213Electrical arrangements not otherwise provided for
    • H05K1/0254High voltage adaptations; Electrical insulation details; Overvoltage or electrostatic discharge protection ; Arrangements for regulating voltages or for using plural voltages
    • H05K1/0256Electrical insulation details, e.g. around high voltage areas

Landscapes

  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

(57)【要約】 【課題】半導体チップをマウントした絶縁基板の周縁部
で充填材のボイド発生に起因する絶縁破壊を防止して信
頼性の高い半導体装置を提供する。 【解決手段】半導体チップ5をマウントした絶縁基板4
と、絶縁基板を搭載した金属ベース板1と、絶縁基板を
包囲して金属ベース板に固着した上蓋付きの外囲樹脂ケ
ース2と、外部導出端子との組立体からなり、樹脂ケー
スの内部をシリコーンゲルなどの充填材8で封止した半
導体装置で、前記絶縁基板が絶縁板4aを挟んでその主
面側に半導体チップをマウントする導体パターン4bを
形成し、裏面側に被着した金属箔4cを金属ベース板に
はんだ接合したものにおいて、絶縁基板の金属箔4cの
周縁が絶縁板4aの周縁とが重なり合うようにして基板
の裏面全域に被着し、絶縁板の周縁部における電界集中
の緩和と併せて、充填材のボイド生成要因となるデッド
スペースを無くして絶縁破壊を防止する。
An object of the present invention is to provide a highly reliable semiconductor device that prevents dielectric breakdown due to the generation of voids in a filler at a peripheral portion of an insulating substrate on which a semiconductor chip is mounted. An insulating substrate on which a semiconductor chip is mounted.
And a metal base plate 1 on which an insulating substrate is mounted, an outer resin case 2 with an upper lid surrounding the insulating substrate and fixed to the metal base plate, and an external lead-out terminal. In a semiconductor device sealed with a filler material 8 such as silicone gel, the insulating substrate forms a conductor pattern 4b for mounting a semiconductor chip on a main surface thereof with an insulating plate 4a interposed therebetween, and a metal foil adhered on a back surface side. 4c is solder-bonded to a metal base plate, the peripheral edge of the metal foil 4c of the insulating substrate overlaps the peripheral edge of the insulating plate 4a, and is adhered to the entire back surface of the substrate. In addition to the relaxation, a dead space which is a factor of void generation of the filler is eliminated to prevent dielectric breakdown.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、パワートランジ
スタモジュールなどを対象とした半導体装置に関する。
The present invention relates to a semiconductor device for a power transistor module and the like.

【0002】[0002]

【従来の技術】まず、この発明の実施対象となるパワー
トランジスタモジュールの構成を図4に示す。図におい
て、1は放熱用の金属ベース板、2は金属ベース板1に
被せた外囲樹脂ケース、3は端子ブロックを兼ねた樹脂
ケース2の上蓋、4は金属ベース板1に搭載した絶縁基
板、5は絶縁基板4にマウントした半導体チップ(パワ
ートランジスタ,ダイオードなど)、6は外部導出端
子、7は内部配線用の接続ワイヤ、8は樹脂ケース2内
に注入して半導体チップ5,接続ワイヤ7などを封止す
る充填材(シリコーンゲル)である。
2. Description of the Related Art First, a configuration of a power transistor module according to the present invention is shown in FIG. In the figure, 1 is a metal base plate for heat dissipation, 2 is an outer resin case covering the metal base plate 1, 3 is an upper lid of the resin case 2 also serving as a terminal block, and 4 is an insulating substrate mounted on the metal base plate 1. Reference numeral 5 denotes a semiconductor chip (power transistor, diode, or the like) mounted on the insulating substrate 4, reference numeral 6 denotes an external lead terminal, reference numeral 7 denotes a connection wire for internal wiring, reference numeral 8 denotes a semiconductor chip 5 injected into the resin case 2, and connection wire. 7 is a filler (silicone gel) that seals 7 and the like.

【0003】次に、前記半導体装置に採用した絶縁基板
4の従来構造を図3(a),(b) に示す。図示のように絶縁
基板4は、セラミックス製の絶縁板4aを挟んでその主
面側(上面)には半導体チップ5をマウントする導体パ
ターン4bを形成し、裏面側にははんだ付け用の金属箔
4cを被着した構成になる。そして、絶縁基板4を金属
ベース板1に搭載する際に、前記した金属箔4cを金属
ベース板1の上面に重ね合わせて両者の間をはんだ接合
するようにしている。
Next, FIGS. 3A and 3B show a conventional structure of the insulating substrate 4 employed in the semiconductor device. As shown in the figure, a conductor pattern 4b for mounting a semiconductor chip 5 is formed on the main surface side (upper surface) of the insulating substrate 4 with a ceramic insulating plate 4a interposed therebetween, and a metal foil for soldering is formed on the back surface side. 4c is attached. When the insulating substrate 4 is mounted on the metal base plate 1, the above-mentioned metal foil 4c is overlapped on the upper surface of the metal base plate 1 so that the two are joined by soldering.

【0004】ここで、従来の絶縁基板4では、主面側の
導体パターン4bと裏面側の金属箔4cとの間で絶縁板
4aに余裕のある沿面絶縁距離を確保するために、図3
(b)で示すように金属箔4cの周縁が絶縁板4aの周縁
より距離δ(0.5〜2mm程度)だけ若干内側に引っ込
んだ面域に被着されている。
Here, in the conventional insulating substrate 4, in order to secure a sufficient creepage insulation distance on the insulating plate 4a between the conductor pattern 4b on the main surface side and the metal foil 4c on the back surface, FIG.
As shown in (b), the peripheral edge of the metal foil 4c is attached to a surface area which is slightly inward from the peripheral edge of the insulating plate 4a by a distance δ (about 0.5 to 2 mm).

【0005】[0005]

【発明が解決しようとする課題】ところで、前記した従
来構造の絶縁基板4を採用した半導体装置では、耐電圧
特性面で次記のような不具合が生じる。すなわち、 (1) 図4の製品組立状態で主回路に電圧を印加すると、
絶縁基板4の絶縁板4aの周縁部と金属ベース板(接地
側)1に挟まれた金属箔4cの外周側の狭い部分に電界
が集中する。
However, in the semiconductor device employing the above-described insulating substrate 4 having the conventional structure, the following problems occur in terms of withstand voltage characteristics. That is, (1) When a voltage is applied to the main circuit in the product assembled state shown in FIG.
The electric field concentrates on a peripheral portion of the insulating plate 4 a of the insulating substrate 4 and a narrow portion on the outer peripheral side of the metal foil 4 c sandwiched between the metal base plate (ground side) 1.

【0006】一方、半導体装置の組立工程で外囲樹脂ケ
ース2に充填材(シリコーンゲル)8を注入する際に
は、充填材8の内部にできる限り気泡が生じないように
細心の注意を払っている。しかしながら、充填材8を充
填した後の組立状態では、図5で表すように絶縁板4a
の周縁部と金属ベース板1に挟まれた金属箔4cの外周
側部分がデッドスペース(袋小路)となることから、こ
の部分に生じた気泡が抜け切らずにボイドvを形成す
る。
On the other hand, when injecting the filler (silicone gel) 8 into the surrounding resin case 2 in the process of assembling the semiconductor device, great care is taken so that air bubbles are not generated inside the filler 8 as much as possible. ing. However, in the assembled state after the filling of the filler 8, as shown in FIG.
Since the outer peripheral portion of the metal foil 4c sandwiched between the peripheral portion of the metal foil 4c and the metal base plate 1 forms a dead space (blank alley), a void v is formed without a bubble generated in this portion being completely removed.

【0007】このために、前記のデッドスペースにボイ
ドvが残っている状態で電圧を印加すると、電界の集中
によりボイド発生部分で絶縁破壊を引き起こすおそれが
ある。なお、9は金属ベース板1と絶縁基板4の金属箔
4cとの間を接合したはんだを示す。 (2) また、前記のように絶縁基板4の絶縁板4aの周縁
部と金属ベース板1に挟まれた金属箔4cの外周側部分
で充填材8にボイドが発生するのを防ぐための方策とし
て、図6で示すように金属ベース板1と絶縁基板2の金
属箔4cとの間を接合するはんだ9の供給量を多少増量
し、前記したデッドスペースをはんだ9で埋め尽くすよ
うにすることも試みたが、実際にははんだ供給量の管
理,はんだフィレットの形状を一定に保つことが困難で
あり、図示のようにはんだフィレットが絶縁板4aの外
周端面まで迫り出し、このために導体パターン4aとの
間の沿面絶縁距離Lが小さくなり(特に垂直方向の沿面
距離)、その結果として所要の絶縁耐力を確保すること
ができなくなるといった課題が新たに派生する。
For this reason, if a voltage is applied in a state where the void v remains in the dead space, there is a possibility that the dielectric breakdown may occur at the void generating portion due to the concentration of the electric field. Reference numeral 9 denotes a solder joined between the metal base plate 1 and the metal foil 4c of the insulating substrate 4. (2) Measures for preventing voids from being generated in the filler 8 at the peripheral portion of the insulating plate 4a of the insulating substrate 4 and the outer peripheral portion of the metal foil 4c sandwiched between the metal base plates 1 as described above. As shown in FIG. 6, the supply amount of the solder 9 for joining between the metal base plate 1 and the metal foil 4c of the insulating substrate 2 is slightly increased to fill the dead space with the solder 9. However, in practice, it is difficult to control the amount of supplied solder and to keep the shape of the solder fillet constant, and as shown in the figure, the solder fillet protrudes to the outer peripheral end surface of the insulating plate 4a. A new problem arises in that the creeping insulation distance L with respect to the surface 4a is reduced (particularly, the vertical creepage distance), and as a result, a required dielectric strength cannot be secured.

【0008】この発明は上記の点に鑑みなされたもので
あり、その目的は前記課題を解決し、絶縁基板の周縁部
で充填材のボイド発生に起因する絶縁破壊を防止して信
頼性の高い半導体装置を提供することにある。
SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and an object of the present invention is to solve the above-mentioned problems and to prevent a dielectric breakdown caused by generation of voids in a filler at a peripheral portion of an insulating substrate, thereby achieving high reliability. It is to provide a semiconductor device.

【0009】[0009]

【課題を解決するための手段】上記目的を達成するため
に、この発明によれば、半導体チップをマウントした絶
縁基板と、絶縁基板を搭載した金属ベース板と、絶縁基
板を包囲して金属ベース板に固着した上蓋付きの外囲樹
脂ケースと、該樹脂ケースに組み込んだ外部導出端子と
の組立体からなり、樹脂ケースの内部を充填材で封止し
た半導体装置であり、前記絶縁基板が絶縁板を挟んでそ
の主面側に半導体チップをマウントする導体パターンを
形成し、裏面側に金属箔を被着した構成になり、該金属
箔を金属ベース板に重ね合わせてはんだ接合したものに
おいて、 (1) 前記金属箔を、その周縁と絶縁板の周縁とが重なり
合うようにして絶縁板の裏面全域に被着する(請求項
1)。
According to the present invention, there is provided an insulating substrate having a semiconductor chip mounted thereon, a metal base plate having the insulating substrate mounted thereon, and a metal base surrounding the insulating substrate. A semiconductor device comprising an assembly of an outer resin case with an upper lid fixed to a plate and an external lead terminal incorporated in the resin case, wherein the inside of the resin case is sealed with a filler, and the insulating substrate is insulated. A conductor pattern for mounting a semiconductor chip on the main surface side of the plate is formed, and a metal foil is adhered on the back surface side, and the metal foil is overlapped on a metal base plate and soldered, (1) The metal foil is applied to the entire back surface of the insulating plate such that the peripheral edge of the metal foil and the peripheral edge of the insulating plate overlap (claim 1).

【0010】(2) 前記金属箔を、その周縁が絶縁板の周
縁から外側に張り出すようにして絶縁板の裏面に被着す
る(請求項2)。上記の構成によれば、絶縁基板を金属
ベース板上に搭載してはんだ付けした状態では、絶縁基
板の周縁部にボイド発生の要因となるデッドスペースが
形成されず、外囲樹脂ケース内に充填材を充填した組立
状態でもデッドスペースに充填材のボイドの発生がなく
なる。しかも、金属箔を少なくとも絶縁板の周縁まで広
げたことで、絶縁板周縁部における電界強度の集中も緩
和され、その結果として、絶縁基板周縁部での絶縁破壊
の発生が防げる。
(2) The metal foil is adhered to the back surface of the insulating plate such that its peripheral edge projects outward from the peripheral edge of the insulating plate. According to the above configuration, in a state where the insulating substrate is mounted on the metal base plate and soldered, a dead space which causes a void is not formed in the peripheral portion of the insulating substrate, and the surrounding resin case is filled. Even in the assembled state where the material is filled, voids of the filler are not generated in the dead space. In addition, since the metal foil is spread at least to the periphery of the insulating plate, the concentration of the electric field intensity at the periphery of the insulating plate is reduced, and as a result, the occurrence of dielectric breakdown at the periphery of the insulating substrate can be prevented.

【0011】また、前項(2) のように、金属箔の周縁が
絶縁板の周縁から外側に張り出すようにすることで、前
記と同様にボイド発生の要因となるデッドスペースが無
くなることは勿論のこと、さらに絶縁基板を金属ベース
板にはんだ接合する際のはんだ供給量が多少多めにばら
ついても、はんだフィレットが絶縁板の外周端面を覆う
ように迫り出す可能性が少なくなり、これにより主面側
の導体パターンとの間に十分な沿面絶縁距離を確保する
ことができる。
Further, as described in the above item (2), by forming the periphery of the metal foil to protrude outward from the periphery of the insulating plate, it is possible to eliminate the dead space which causes the generation of voids as described above. In addition, even when the amount of solder supplied when soldering the insulating substrate to the metal base plate varies somewhat, the possibility that the solder fillet will protrude so as to cover the outer peripheral end surface of the insulating plate is reduced. A sufficient creepage insulation distance with the surface side conductive pattern can be ensured.

【0012】[0012]

【発明の実施の形態】以下、この発明の実施の形態を図
1,および図2の実施例に基づいて説明する。なお、各
実施例の図中で図3,図4に対応する同一部材には同じ
符号が付してある。 〔実施例1〕図1は請求項1に対応する実施例を示すも
のである。この実施例においては、基本的に絶縁基板4
は図3に示した従来構造と同じであるが、絶縁板4aの
裏面側に被着した金属箔4cは、その周縁端部が絶縁板
4aの周縁端部と重なり合うように、絶縁板4aの裏面
全面域を覆って被着されている。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to FIGS. In the drawings of the respective embodiments, the same members corresponding to FIGS. 3 and 4 are denoted by the same reference numerals. [Embodiment 1] FIG. 1 shows an embodiment of the present invention. In this embodiment, basically, the insulating substrate 4
Is the same as the conventional structure shown in FIG. 3, but the metal foil 4c applied on the back side of the insulating plate 4a is so formed that its peripheral edge overlaps with the peripheral edge of the insulating plate 4a. It is applied so as to cover the entire rear surface area.

【0013】かかる構成により、図示のように絶縁基板
4を金属ベース板1に搭載してはんだ接合した状態で
は、絶縁基板4の絶縁板4aの周縁部と金属ベース板1
との間に気泡発生の要因となるデッドスペースが形成さ
れない。しかも、はんだ供給量を適正化することで、は
んだフィレットが絶縁板4aの外周端面に迫り出して導
体パターン4bとの間の沿面絶縁距離を小さくすること
もなく、これにより十分な絶縁耐力を確保できる。
With this configuration, when the insulating substrate 4 is mounted on the metal base plate 1 and soldered as shown in the figure, the peripheral portion of the insulating plate 4a of the insulating substrate 4 and the metal base plate 1
No dead space, which is a cause of air bubble generation, is formed between them. In addition, by optimizing the amount of the supplied solder, the solder fillet does not protrude to the outer peripheral end surface of the insulating plate 4a to reduce the creeping insulation distance with the conductor pattern 4b, thereby securing a sufficient dielectric strength. it can.

【0014】〔実施例2〕図2(a),(b) は請求項2に対
応する実施例を示すものであり、この実施例において
は、絶縁基板4の裏面側に被着した金属箔4cの面積を
絶縁板4aより一回り大きく設定し、金属箔4cの周縁
端部が絶縁板4aの周縁から距離δ(例えば0.5〜2
mm程度)外周側に多少張り出すようにして絶縁板4aの
裏面に被着する。
[Embodiment 2] FIGS. 2 (a) and 2 (b) show an embodiment corresponding to claim 2, in which a metal foil adhered to the back side of an insulating substrate 4 is shown. 4c is set to be slightly larger than the insulating plate 4a, and the peripheral edge of the metal foil 4c is separated from the peripheral edge of the insulating plate 4a by a distance δ (for example, 0.5 to 2).
(approximately mm) It is attached to the back surface of the insulating plate 4a so as to slightly protrude toward the outer peripheral side.

【0015】この構成によれば、先記実施例1と同様に
絶縁基板4を金属ベース板1に搭載してはんだ接合した
状態では、絶縁基板4の周縁部で絶縁板4aと金属ベー
ス板1との間に気泡発生の要因となるデッドスペースが
形成されない。しかも、金属ベース板1にはんだ付けす
る際にはんだ供給量が多少多めにばらつき、このために
図5(b) で示すようにはんだ9のフィレットが金属箔4
cの張り出し端面に迫り出しても、この金属箔4cの周
縁端部よりも若干内側に引っ込んでいる絶縁板4aの外
周端面を覆うまでには至らず、これにより主面側の導体
パターン4bとの間に十分な沿面絶縁距離Lを確保する
ことができる。
According to this structure, when the insulating substrate 4 is mounted on the metal base plate 1 and soldered in the same manner as in the first embodiment, the insulating plate 4a and the metal base plate 1 No dead space, which is a cause of air bubble generation, is formed between them. In addition, when the solder is supplied to the metal base plate 1, the amount of the supplied solder varies slightly, and therefore, as shown in FIG.
c does not cover the outer peripheral end surface of the insulating plate 4a, which is recessed slightly inward from the peripheral edge portion of the metal foil 4c. Between them, a sufficient creepage insulation distance L can be secured.

【0016】[0016]

【発明の効果】以上述べたように、この発明の構成によ
れば、パッケージの内部をシリコーンゲルなどの充填材
で封止した半導体装置において、絶縁基板の裏面側に被
着形成して金属ベース板にはんだ付けする金属箔を、そ
の周縁と絶縁板の周縁とが重なり合う,もしくは周縁が
絶縁板の周縁から外側に張り出すようにしたことによ
り、半導体装置の組立状態では半導体チップを搭載した
絶縁基板の周縁部に充填材のボイド発生要因となるデッ
ドスペースが形成されず、これにより、充填材のボイド
に起因する絶縁基板の絶縁破壊を防止して半導体装置の
信頼性向上化が図れる。
As described above, according to the structure of the present invention, in a semiconductor device in which the inside of a package is sealed with a filler such as silicone gel, a metal base is formed by being adhered to the back side of an insulating substrate. The metal foil to be soldered to the board has its periphery overlapped with the periphery of the insulating plate, or the periphery extends outward from the periphery of the insulating plate. No dead space is formed at the periphery of the substrate, which causes voids in the filler, thereby preventing dielectric breakdown of the insulating substrate due to voids in the filler and improving the reliability of the semiconductor device.

【図面の簡単な説明】[Brief description of the drawings]

【図1】この発明の実施例1に対応する半導体装置の構
成断面図
FIG. 1 is a configuration sectional view of a semiconductor device according to a first embodiment of the present invention;

【図2】この発明の実施例2に対応する半導体装置の構
成断面図であり、(a) は絶縁基板全体の構成図、(b) は
はんだ供給量が多少多めにばらついた場合のはんだフィ
レットの形成状態を表す基板周縁部の拡大断面図
FIGS. 2A and 2B are cross-sectional views of a configuration of a semiconductor device according to a second embodiment of the present invention, in which FIG. 2A is a configuration diagram of an entire insulating substrate, and FIG. 2B is a solder fillet in a case where the supplied amount of solder is slightly varied; Enlarged sectional view of the periphery of the substrate showing the state of formation of

【図3】半導体装置に組み込んだ絶縁基板の従来構造図
であり、(a) は平面図、(b) は側面図
3A and 3B are conventional structural views of an insulating substrate incorporated in a semiconductor device, wherein FIG. 3A is a plan view and FIG. 3B is a side view.

【図4】この発明の実施対象となる半導体装置の全体構
成図
FIG. 4 is an overall configuration diagram of a semiconductor device to which the present invention is applied;

【図5】図3の絶縁基板に対する基板周縁部の充填材中
にボイドが発生した状態を表す図
FIG. 5 is a diagram illustrating a state in which voids are generated in a filler at a peripheral portion of the substrate with respect to the insulating substrate of FIG. 3;

【図6】図3の絶縁基板に対するはんだ供給量を増量し
た場合のはんだフィレットの迫り出し状態を表す図
FIG. 6 is a view showing a state in which a solder fillet is protruding when the amount of solder supplied to the insulating substrate of FIG. 3 is increased;

【符号の説明】[Explanation of symbols]

1 金属ベース板 2 外囲樹脂ケース 3 上蓋 4 絶縁基板 4a 絶縁板 4b 導体パターン 4c 金属箔 5 半導体チップ 6 外部導出端子 8 充填材 9 はんだ v 充填材のボイド L 絶縁基板の沿面絶縁距離 DESCRIPTION OF SYMBOLS 1 Metal base plate 2 Surrounding resin case 3 Upper lid 4 Insulating substrate 4a Insulating plate 4b Conductor pattern 4c Metal foil 5 Semiconductor chip 6 External lead-out terminal 8 Filler 9 Solder v Void of filler L Creepage insulation distance of insulating substrate

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】半導体チップをマウントした絶縁基板と、
絶縁基板を搭載した金属ベース板と、絶縁基板を包囲し
て金属ベース板に固着した上蓋付きの外囲樹脂ケース
と、該樹脂ケースに組み込んだ外部導出端子との組立体
からなり、樹脂ケースの内部を充填材で封止した半導体
装置であり、前記絶縁基板が絶縁板を挟んでその主面側
に半導体チップをマウントする導体パターンを形成し、
裏面側に金属箔を被着した構成になり、該金属箔を金属
ベース板に重ね合わせてはんだ接合したものにおいて、
前記金属箔を、その周縁と絶縁板の周縁とが重なり合う
ようにして絶縁板の裏面全域に被着したことを特徴とす
る半導体装置。
An insulating substrate on which a semiconductor chip is mounted;
It consists of an assembly of a metal base plate on which an insulating substrate is mounted, an outer resin case with an upper lid surrounding the insulating substrate and fixed to the metal base plate, and an external lead-out terminal incorporated in the resin case. A semiconductor device in which the inside is sealed with a filler, wherein the insulating substrate forms a conductor pattern for mounting a semiconductor chip on a main surface side of the insulating plate,
In a configuration in which a metal foil is adhered to the back side, and the metal foil is solder-joined to a metal base plate,
A semiconductor device, wherein the metal foil is applied to the entire back surface of the insulating plate such that the peripheral edge of the metal foil overlaps the peripheral edge of the insulating plate.
【請求項2】半導体チップをマウントした絶縁基板と、
絶縁基板を搭載した金属ベース板と、絶縁基板を包囲し
て金属ベース板に固着した上蓋付きの外囲樹脂ケース
と、該樹脂ケースに組み込んだ外部導出端子との組立体
からなり、樹脂ケースの内部を充填材で封止した半導体
装置であり、前記絶縁基板が絶縁板を挟んでその主面側
に半導体チップをマウントする導体パターンを形成し、
裏面側に金属箔を被着した構成になり、該金属箔を金属
ベース板に重ね合わせてはんだ接合したものにおいて、
前記金属箔を、その周縁が絶縁板の周縁から外側に張り
出すようにして絶縁板の裏面に被着したことを特徴とす
る半導体装置。
2. An insulating substrate on which a semiconductor chip is mounted;
It consists of an assembly of a metal base plate on which an insulating substrate is mounted, an outer resin case with an upper lid surrounding the insulating substrate and fixed to the metal base plate, and an external lead-out terminal incorporated in the resin case. A semiconductor device in which the inside is sealed with a filler, wherein the insulating substrate forms a conductor pattern for mounting a semiconductor chip on a main surface side of the insulating plate,
In a configuration in which a metal foil is adhered to the back side, and the metal foil is solder-joined to a metal base plate,
A semiconductor device, wherein the metal foil is attached to the back surface of the insulating plate such that its peripheral edge extends outward from the peripheral edge of the insulating plate.
JP9177887A 1997-07-03 1997-07-03 Semiconductor device Pending JPH1126691A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9177887A JPH1126691A (en) 1997-07-03 1997-07-03 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9177887A JPH1126691A (en) 1997-07-03 1997-07-03 Semiconductor device

Publications (1)

Publication Number Publication Date
JPH1126691A true JPH1126691A (en) 1999-01-29

Family

ID=16038804

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9177887A Pending JPH1126691A (en) 1997-07-03 1997-07-03 Semiconductor device

Country Status (1)

Country Link
JP (1) JPH1126691A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6731001B2 (en) 2000-08-10 2004-05-04 Denso Corporation Semiconductor device including bonded wire based to electronic part and method for manufacturing the same
WO2018056287A1 (en) * 2016-09-21 2018-03-29 三菱電機株式会社 Semiconductor device and electric power converter
US12301127B2 (en) 2021-06-16 2025-05-13 Fuji Electric Co., Ltd. Semiconductor module
US12471297B2 (en) 2021-02-17 2025-11-11 Fuji Electric Co., Ltd. Semiconductor device and manufacturing method thereof

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6731001B2 (en) 2000-08-10 2004-05-04 Denso Corporation Semiconductor device including bonded wire based to electronic part and method for manufacturing the same
WO2018056287A1 (en) * 2016-09-21 2018-03-29 三菱電機株式会社 Semiconductor device and electric power converter
JPWO2018056287A1 (en) * 2016-09-21 2019-03-28 三菱電機株式会社 Semiconductor device and power conversion device
US12471297B2 (en) 2021-02-17 2025-11-11 Fuji Electric Co., Ltd. Semiconductor device and manufacturing method thereof
US12301127B2 (en) 2021-06-16 2025-05-13 Fuji Electric Co., Ltd. Semiconductor module

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