JPH11292568A - Antireflection glass sheet, its production and coating composition for antireflection film - Google Patents

Antireflection glass sheet, its production and coating composition for antireflection film

Info

Publication number
JPH11292568A
JPH11292568A JP10345273A JP34527398A JPH11292568A JP H11292568 A JPH11292568 A JP H11292568A JP 10345273 A JP10345273 A JP 10345273A JP 34527398 A JP34527398 A JP 34527398A JP H11292568 A JPH11292568 A JP H11292568A
Authority
JP
Japan
Prior art keywords
film
weight
glass plate
parts
fine particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10345273A
Other languages
Japanese (ja)
Inventor
Yasushi Takahashi
康史 高橋
Hideki Okamoto
秀樹 岡本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Sheet Glass Co Ltd
Original Assignee
Nippon Sheet Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Sheet Glass Co Ltd filed Critical Nippon Sheet Glass Co Ltd
Priority to JP10345273A priority Critical patent/JPH11292568A/en
Publication of JPH11292568A publication Critical patent/JPH11292568A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/70Properties of coatings
    • C03C2217/73Anti-reflective coatings with specific characteristics
    • C03C2217/732Anti-reflective coatings with specific characteristics made of a single layer
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/70Properties of coatings
    • C03C2217/77Coatings having a rough surface

Landscapes

  • Optical Elements Other Than Lenses (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain small reflectance for visible light of a large incident angle and to improve visibility by coating the surface of a glass substrate with a film which has specified thickness and consists of chain silica fine particles and silica, and forming a rough surface of the film. SOLUTION: At least one surface of a glass substrate is coated with a film of 110 to 250 nm thickness comprising chain silica fine particles and silica by 5 to 30 wt.% of the chain silica, and the surface of the film is roughened. The obtd. film has voids in chain silica particles adjacent to each other in the film, and the film has 1.25 to 1.40 refractive index. The film surface has 5 to 50 nm numerical average roughness (Ra) with 10 to 300 nm average period (Sm) of roughness. A preferable film compsn. is obtd. by compounding 100 pts.wt. of a silicon compd., 100 to 800 pts.wt. of chain silica fine particles, 4 to 150 pts.wt. of water, 0.00001 to 5 pts.wt. of an acid catalyst, 0.001 to 10 pts.wt. of a dispersion assistant and 500 to 10000 pts.wt. of a solvent to prepare the coating liquid.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は反射防止ガラス板、
特に可視光反射率が小さく、自動車窓に適したガラス
板、およびそれを製造する方法ならびに反射防止膜用被
覆組成物に関する。
TECHNICAL FIELD The present invention relates to an antireflection glass plate,
In particular, the present invention relates to a glass plate having low visible light reflectance and suitable for an automobile window, a method for producing the same, and a coating composition for an antireflection film.

【0002】[0002]

【従来の技術】従来、ガラス板その他のガラス物品の表
面で可視光が反射して、透視性および光透過率が低下し
たり、眩しくなることを防止するために、ガラス物品の
表面に反射防止処理を施すことが行われている。
2. Description of the Related Art Conventionally, in order to prevent visible light from being reflected on the surface of a glass plate or other glass article to reduce the transparency and light transmittance and to prevent the glass article from being dazzled, anti-reflection is applied to the surface of the glass article. Processing has been performed.

【0003】例えば5〜30nmの粒子径を有するシリ
カゾルと、アルコキシシランの加水分解物を溶媒に含有
させた塗布液を基材に塗布、硬化した低屈折率反射防止
膜が知られている(特開平8−122501号)。
For example, a low-refractive-index antireflection film is known in which a silica sol having a particle size of 5 to 30 nm and a coating solution containing a hydrolyzate of alkoxysilane in a solvent are applied to a substrate and cured. Kaihei 8-122501).

【0004】自動車のフロントウィンドウガラスにおい
て、車内のインパネ(インストルメントパネル)、ダッ
シュボード等からの光がフロントウィンドウガラスの表
面で反射して、インパネ、ダッシュボードの反射像が運
転者の視界に入るために、運転者の前方の視認性が低下
する問題がある。インパネ、ダッシュボードから発し
て、フロントウィンドウガラスに対してかなり大きな入
射角で入射し反射した光が運転者の目に入るため、この
視認性を向上するためには、高入射角(例えば60度)
でのフロントウィンドウガラスの反射率を低減する必要
がある。そして上記低屈折率反射防止膜では高入射角で
の反射率の低減には十分でなく、視認性が十分に高いと
は言えない。
In a windshield of an automobile, light from an instrument panel (instrument panel), a dashboard, or the like in the vehicle is reflected on a surface of the windshield, and a reflection image of the instrument panel or the dashboard enters a driver's view. Therefore, there is a problem that the visibility in front of the driver is reduced. Light emitted from the instrument panel or dashboard and incident on the windshield at a considerably large incident angle and reflected enters the eyes of the driver. To improve the visibility, a high incident angle (for example, 60 degrees) is used. )
It is necessary to reduce the reflectance of the windshield at the window. The low-refractive-index antireflection film is not sufficient for reducing the reflectance at a high incident angle, and the visibility is not sufficiently high.

【0005】[0005]

【発明が解決しようとする課題】本発明は高入射角での
可視光の反射率が小さく、視認性が向上した、自動車窓
に適したガラス板を提供することを目的とする。
SUMMARY OF THE INVENTION It is an object of the present invention to provide a glass sheet suitable for automobile windows, which has a small visible light reflectance at a high incident angle and has improved visibility.

【0006】[0006]

【課題を解決するための手段】本発明は、鎖状シリカ微
粒子およびその鎖状シリカ微粒子の重量に対して5〜3
0重量%のシリカからなり、110〜250nmの厚み
を有する膜がガラス基板表面の少なくとも一方に被覆さ
れており、その膜表面に凹凸が形成されている、可視光
反射防止ガラス板である。
SUMMARY OF THE INVENTION The present invention relates to a chain silica fine particle and 5 to 3 weight of the chain silica fine particle.
A visible light anti-reflection glass plate in which a film made of 0% by weight of silica and having a thickness of 110 to 250 nm is coated on at least one of the surfaces of the glass substrate, and the film surface has irregularities.

【0007】また本発明は、鎖状シリカ微粒子およびシ
リカからなり、110〜250nmの厚みを有する膜が
ガラス基板表面の少なくとも一方に被覆されており、膜
内で互いに隣接する鎖状シリカ微粒子の間に空隙が生じ
ていてその膜が1.25〜1.40の屈折率を有してお
り、その膜表面に凹凸が形成されている、高入射角での
反射率が小さい可視光反射防止ガラス板である。
Further, according to the present invention, a film composed of chain silica fine particles and silica and having a thickness of 110 to 250 nm is coated on at least one of the surfaces of the glass substrate, and between the chain silica fine particles adjacent to each other in the film. , A film having a refractive index of 1.25 to 1.40, and having irregularities formed on the film surface, and having a small reflectance at a high incident angle. It is a board.

【0008】本発明において、ガラス基板の表面に鎖状
シリカ微粒子およびシリカからなる反射防止用の膜が被
覆されており、その膜の表面には、そこに突出して存在
する鎖状シリカ微粒子の表面形状による凹凸が形成され
ている。
In the present invention, the surface of the glass substrate is coated with an antireflection film made of chain silica fine particles and silica, and the surface of the film is covered with the surface of the chain silica fine particles projecting therefrom. Irregularities due to the shape are formed.

【0009】上記膜は鎖状シリカ微粒子およびそれより
も少量の、好ましくは鎖状シリカ微粒子の重量に対して
5〜30重量%の、微粒子形状をもたないシリカからな
り、シリカはバインダーとして鎖状シリカ微粒子同士の
接着およびシリカ微粒子とガラス基板表面との接着に役
立っている。
The film is composed of chain silica fine particles and a smaller amount, preferably 5 to 30% by weight, based on the weight of chain silica fine particles, of silica having no particle shape. It is useful for the adhesion between the silica fine particles and the adhesion between the silica fine particles and the surface of the glass substrate.

【0010】上記鎖状シリカ微粒子としては、直線状に
まっすぐに伸びた形状のものでもよいが、二次元的に、
より好ましくは三次元的に湾曲した形状のものが最も好
ましく用いられる。鎖状形状のシリカ微粒子を用いるこ
とにより、膜中で、隣接する鎖状微粒子同士の間には、
5〜20nm幅の間隙(間隔)が形成される。この間隙
は、もし鎖状シリカ微粒子の代わりに同重量の球状シリ
カ微粒子を用いたとしたときに形成される間隙に比し
て、はるかに大きな総体積を有する。しかも鎖状微粒子
同士を接着するバインダーとしてのシリカの使用量が少
ないので、上記間隙がシリカバインダーで充填しつくさ
れるされることはなく、間隙の大部分が、空気または気
体が占める空隙(空間)として残存する。その空隙の存
在により、膜全体としての屈折率の値はシリカの屈折率
(約1.45)よりも小さくなって1.25〜1.40
となる。理論的に反射率がゼロとなる反射防止膜の屈折
率の値は、ガラス基板の屈折率(1.50)の平方根
値、すなわち1.225であるが、本発明の反射防止膜
の屈折率をこの値に近づけることができる。
The above-mentioned chain silica fine particles may have a linearly and linearly extending shape.
More preferably, a three-dimensionally curved shape is most preferably used. By using chain-like silica fine particles, in the film, between adjacent chain-like fine particles,
A gap (interval) having a width of 5 to 20 nm is formed. This gap has a much larger total volume than the gap formed if spherical silica fine particles of the same weight were used instead of chain silica fine particles. Moreover, since the amount of silica used as a binder for adhering the chain-like fine particles is small, the gap is not completely filled with the silica binder, and most of the gap is occupied by air or gas. ). Due to the presence of the voids, the value of the refractive index of the entire film becomes smaller than the refractive index of silica (about 1.45), and is 1.25 to 1.40.
Becomes The value of the refractive index of the antireflection film at which the reflectance is theoretically zero is the square root of the refractive index (1.50) of the glass substrate, that is, 1.225. Can approach this value.

【0011】膜中の、バインダーとしてのシリカの量が
あまり少なすぎて、例えば鎖状シリカ微粒子の重量に対
して5重量%未満である場合には、鎖状シリカ微粒子の
接着が不十分となり膜の機械的強度が低下する。また逆
にシリカの量があまり多すぎて、例えば鎖状シリカ微粒
子の重量に対して30重量%を超える場合には、鎖状シ
リカ微粒子同士の間の間隙をシリカが埋めつくしてしま
って空隙が残らないので、膜の屈折率を小さくすること
ができなくなり、反射率を低くすることができなくな
る。上記の空隙の体積は、実測した上記膜の屈折率と、
鎖状シリカ微粒子に対してシリカ量を多くして、鎖状シ
リカ微粒子同士の間隙をシリカで埋め尽くした膜の屈折
率(約1.45)との差から計算して、膜全体の体積の
50〜80%であると推定される。
If the amount of silica as a binder in the film is too small, for example, less than 5% by weight based on the weight of the chain silica fine particles, the adhesion of the chain silica fine particles becomes insufficient and the film becomes insufficient. The mechanical strength of Conversely, if the amount of silica is too large, for example, if it exceeds 30% by weight based on the weight of the chain silica fine particles, the silica fills the gaps between the chain silica fine particles and the voids are formed. Since it does not remain, the refractive index of the film cannot be reduced, and the reflectance cannot be lowered. The volume of the above-mentioned void, the refractive index of the actually measured film,
The amount of silica is increased with respect to the chain silica fine particles, and the volume of the entire film is calculated from the difference between the refractive index (about 1.45) of the film in which the gaps between the chain silica fine particles are filled with silica. It is estimated to be 50-80%.

【0012】また膜表面には主として鎖状シリカ微粒子
の凸表面による微少の凹凸が形成されているので、反射
光を拡散させて反射像の映り込みを防止し、しかも透視
像の解像度が低下することもない。そして膜中のバイン
ダーとしてのシリカの量があまり多すぎると、鎖状シリ
カ微粒子全体がシリカの下に沈み込んでしまう。そのた
めに、後述する膜表面の算術平均粗さ(Ra)が5nm
未満となり、また膜表面の凹凸の平均間隔(Sm)が3
00nmを超えやすくなって、反射像の映り込みを効果
的に防止することができなくなる。従って、膜の機械的
強度を低下させることなく膜の屈折率を低くし、しかも
膜表面に上記凹凸を形成させるためには、膜内のシリカ
の量は、鎖状シリカ微粒子の重量に対して5〜30重量
%とすることが好ましく、より好ましくは10〜20重
量%である。
Further, since fine irregularities mainly formed by the convex surface of the chain silica fine particles are formed on the film surface, the reflected light is diffused to prevent the reflection image from being reflected and the resolution of the perspective image is reduced. Not even. If the amount of silica as a binder in the film is too large, the whole chain silica fine particles sink below the silica. Therefore, the arithmetic average roughness (Ra) of the film surface described later is 5 nm.
And the average interval (Sm) of the irregularities on the film surface is 3
It is more likely to exceed 00 nm, and reflection of a reflected image cannot be effectively prevented. Therefore, in order to lower the refractive index of the film without lowering the mechanical strength of the film, and to form the irregularities on the film surface, the amount of silica in the film is based on the weight of the chain silica fine particles. The content is preferably 5 to 30% by weight, more preferably 10 to 20% by weight.

【0013】上記鎖状シリカ微粒子の大きさは、10〜
20nmの平均直径と60〜200nmの平均長さを有
することが好ましい。ここで平均直径とは、取り出した
100個の試料のそれぞれの直径を電子顕微鏡により測
定し、その測定値にその体積に比例したウェイトをつけ
て平均を求めた値であり、同様に平均長さとは取り出し
た100個の試料のそれぞれの長さ(湾曲している場合
はその曲がりに沿った長さ)を電子顕微鏡により測定
し、その測定値にその体積に比例したウェイトをつけて
平均を求めた値である。
The size of the chain silica fine particles is 10 to
It preferably has an average diameter of 20 nm and an average length of 60 to 200 nm. Here, the average diameter is a value obtained by measuring the diameter of each of the 100 samples taken out using an electron microscope, and averaging the measured values with a weight proportional to the volume. Measures the length of each of the 100 samples taken out (if curved, the length along the bend) using an electron microscope, weights the measured values in proportion to the volume, and calculates the average. Value.

【0014】鎖状シリカ微粒子の平均直径が10nm未
満または平均長さが60nm未満では、(1)隣接する
微粒子同士の間の間隙の総体積が小さくなり、したがっ
て空隙の総体積が小さくなって、膜としての屈折率の値
を小さくすることができなくなり、また、(2)得られ
る膜表面の算術平均粗さ(Ra)が5nm未満となっ
て、反射像の映り込みを防止するに十分な効果的な凹凸
を形成できなくなるので好ましくない。また平均直径が
20nmを超えたり、平均長さが200nmを超える
と、膜表面の算術平均粗さ(Ra)が50nmより大き
くなり、ヘイズが発生し易くなったり透視像の解像度が
低下しやすくなって、視認性が低下するので好ましくな
い。
When the average diameter of the chain silica fine particles is less than 10 nm or the average length is less than 60 nm, (1) the total volume of the gap between the adjacent fine particles becomes small, and therefore the total volume of the void becomes small. The value of the refractive index of the film cannot be reduced, and (2) the arithmetic average roughness (Ra) of the obtained film surface is less than 5 nm, which is sufficient to prevent the reflection image from being reflected. It is not preferable because effective unevenness cannot be formed. When the average diameter exceeds 20 nm or the average length exceeds 200 nm, the arithmetic average roughness (Ra) of the film surface becomes larger than 50 nm, so that haze is easily generated or the resolution of a fluoroscopic image is easily reduced. Therefore, the visibility is not preferred.

【0015】ここで、算術平均粗さ(Ra)および凹凸
の平均間隔(Sm)は、原子間力顕微鏡(AFM)(セ
イコー電子工業(株)製、走査型プローブ顕微鏡「SP
I3700」、カンチレバー;シリコン製「SI−DF
20」)を用いて、二次元で定義されるJIS B 06
01(1994)を三次元に拡張した方法で測定するこ
とができる。この場合、試料の測定面積は1μm×1μ
mの正方形であり、測定点数 512×256点、スキ
ャン速度1.02Hz、DFM(サイクリックコンタク
トモード)にて表面形状を測定し、ローパスフィルター
による補正と、測定データのレベリング補正(最小二乗
近似によって曲面を求めてフィッティングし、データの
傾きを補正し、更にZ軸方向の歪みを除去する)を行
い、表面粗さRaおよびSm値を算出した。原子間力顕
微鏡の他に、電子顕微鏡(例えば、株式会社日立製作所
製H−600)を用いて観察、測定した断面曲線から計
算することができる。
Here, the arithmetic average roughness (Ra) and the average interval of unevenness (Sm) are measured by an atomic force microscope (AFM) (manufactured by Seiko Electronics Co., Ltd., scanning probe microscope “SP”).
I3700 ”, cantilever; Silicon“ SI-DF ”
JIS B 06 defined in two dimensions using “20”).
01 (1994) in a three-dimensionally extended manner. In this case, the measurement area of the sample is 1 μm × 1 μm.
m, measuring points 512 × 256 points, scan speed 1.02 Hz, surface shape measured by DFM (cyclic contact mode), correction by low-pass filter and leveling correction of measured data (by least square approximation A curved surface was determined and fitted, the inclination of the data was corrected, and the distortion in the Z-axis direction was removed.), And the surface roughness Ra and Sm value were calculated. In addition to the atomic force microscope, it can be calculated from the cross-sectional curve observed and measured using an electron microscope (for example, H-600 manufactured by Hitachi, Ltd.).

【0016】ガラス基板の表面に、ガラス基材の屈折率
よりも小さな屈折率(n)と膜厚(d)を有する膜を被
覆したとき、入射角αでの反射率が最小になる条件は、
λを光の波長とし、mをゼロまたは正の整数として、下
記数式1で表される。
When the surface of the glass substrate is coated with a film having a refractive index (n) and a film thickness (d) smaller than the refractive index of the glass substrate, the condition for minimizing the reflectance at the incident angle α is as follows. ,
λ is the wavelength of light, and m is zero or a positive integer, and is represented by the following Equation 1.

【数1】 d(n2−sin2α)1/2=λ(1+2m)/4 (1)D (n 2 −sin 2 α) 1/2 = λ (1 + 2m) / 4 (1)

【0017】高入射角、例えば60度の入射角での可視
光反射率が最小になる膜厚(d)は、上記数式1にα=
60,m=0を代入して得られる下記数式2で表され
る。数式2において、屈折率nの膜は、可視光域の38
0〜780nmのいずれかの波長λにおいて、下記式の
膜厚(d)を満足すれば、その波長の光の反射率を最小
にすることができる。なお、mを1または2以上とする
と、膜厚が非常に大きくなって可視光の吸収が大きくな
るので好ましくない。本発明における鎖状シリカ微粒子
およびシリカからなる膜の屈折率は上述のように1.2
5〜1.40であるので、可視光反射率が最小となる膜
厚は、上記数式2から86〜216nmとなる。しか
し、本発明における膜厚は、ガラス板表面から、表面凹
凸を有する膜の凸部頂上までの高さと定義する。従って
この定義の膜厚は上記数式2の膜厚に比して、膜表面の
算術平均粗さ(Ra)と同程度だけ大きくなるので、実
際には、本発明における膜厚は110〜250nmであ
ることが好ましい。
The film thickness (d) that minimizes the visible light reflectance at a high incident angle, for example, an incident angle of 60 degrees, is given by
60, m = 0, which is obtained by substituting Equation 2 below. In Equation 2, the film having the refractive index n is 38 in the visible light range.
If the thickness (d) of the following formula is satisfied at any wavelength λ of 0 to 780 nm, the reflectance of light of that wavelength can be minimized. If m is 1 or 2 or more, it is not preferable because the film thickness becomes extremely large and the absorption of visible light increases. As described above, the refractive index of the film composed of chain silica fine particles and silica in the present invention is 1.2.
Since it is 5 to 1.40, the film thickness at which the visible light reflectance becomes minimum is 86 to 216 nm from the above equation (2). However, the film thickness in the present invention is defined as the height from the surface of the glass plate to the top of the convex portion of the film having surface irregularities. Accordingly, the film thickness of this definition is larger by about the same as the arithmetic average roughness (Ra) of the film surface as compared with the film thickness of the above-mentioned formula 2, so that the film thickness in the present invention is actually 110 to 250 nm. Preferably, there is.

【数2】 d=(λ/4)×(n2−3/4)-1/2 (2)D = (λ / 4) × (n 2 −3/4) −1/2 (2)

【0018】鎖状シリカ微粒子およびシリカからなる膜
はガラス基板の一方表面または両表面に形成される。ガ
ラス板の両表面が空気、気体のような屈折率が1に近い
媒体に面して使用される場合は、この膜をガラス基板の
両表面に形成させる方が高い反射防止効果が得られる。
しかし、ガラス基板の一方表面がガラス基板の屈折率に
近い媒体に面して使用される場合、例えば2枚のガラス
板がその間にポリビニルブチラールのような透明樹脂層
を介して接合される場合には、ガラス板と透明樹脂層と
の界面での可視光反射は無視することができるので、鎖
状シリカ微粒子およびシリカからなる膜は、透明樹脂層
に面するガラス板表面には形成させずに、各ガラス板の
外側表面のみに形成させるだけで十分である。
The film composed of chain silica fine particles and silica is formed on one or both surfaces of a glass substrate. When both surfaces of the glass plate are used facing a medium having a refractive index close to 1 such as air or gas, forming this film on both surfaces of the glass substrate provides a higher antireflection effect.
However, when one surface of the glass substrate is used to face a medium having a refractive index close to that of the glass substrate, for example, when two glass plates are bonded therebetween via a transparent resin layer such as polyvinyl butyral. Since the visible light reflection at the interface between the glass plate and the transparent resin layer can be neglected, the film composed of chain silica fine particles and silica is not formed on the surface of the glass plate facing the transparent resin layer. It is sufficient to form it only on the outer surface of each glass plate.

【0019】鎖状シリカ微粒子は、溶媒分散ゾルの形で
好ましく用いられる。鎖状シリカ微粒子ゾルの例として
は、例えば日産化学工業株式会社製の「スノーテックス
−OUP」、「スノーテックス−UP」が挙げられる。
これらは10〜20nmの平均直径と60〜200nm
の平均長さを有し、三次元的に湾曲した形状を有する。
The chain silica fine particles are preferably used in the form of a solvent-dispersed sol. Examples of the chain silica fine particle sol include, for example, "Snowtex-OUP" and "Snowtex-UP" manufactured by Nissan Chemical Industries, Ltd.
These have an average diameter of 10-20 nm and 60-200 nm.
And has a three-dimensionally curved shape.

【0020】上記微粒子の溶媒は、実質的に微粒子が安
定に分散していれば、特に限定されないが、水、メタノ
ール、エタノール、プロパノール、エチルセロソルブ、
ブチルセロソルブ、プロピルセロソルブ等の単体または
混合体が好ましく、水、プロピルセロソルブがさらに好
ましい。これら水および低級アルコールは、上記有機金
属化合物を含む溶液と簡単に混じり合い、また成膜後の
熱処理によって簡単に除去できるので良い。このうち水
およびプロピルセロソルブは、製造環境上最も好まし
い。
The solvent for the fine particles is not particularly limited as long as the fine particles are substantially stably dispersed, but water, methanol, ethanol, propanol, ethyl cellosolve,
A simple substance or a mixture such as butyl cellosolve and propyl cellosolve is preferable, and water and propyl cellosolve are more preferable. These water and lower alcohol are good because they are easily mixed with the solution containing the organometallic compound and can be easily removed by heat treatment after film formation. Of these, water and propyl cellosolve are most preferred in the production environment.

【0021】本発明において、ガラス基板への表面凹凸
を有するシリカ膜の被覆は、例えば、鎖状シリカ微粒子
と、加水分解・縮重合可能な有機珪素化合物、クロロシ
リル基含有珪素化合物およびそれらの加水分解物からな
る群より選ばれた、少なくとも1種の珪素化合物とを含
む液をガラス基板上に塗布して形成する。
In the present invention, the coating of the silica film having the surface irregularities on the glass substrate may be performed, for example, by forming chain silica fine particles, a hydrolyzable / polycondensable organosilicon compound, a chlorosilyl group-containing silicon compound and their hydrolysis. A liquid containing at least one kind of silicon compound selected from the group consisting of materials is applied to a glass substrate to form a liquid.

【0022】上記微粒子を上記加水分解・縮重合可能な
有機珪素化合物や、クロロシリル基含有珪素化合物を含
む溶液に添加する際、分散助剤を添加しても良い。分散
助剤は特に限定されず、一般に用いられる添加剤、例え
ば、リン酸ナトリウム、ヘキサメタリン酸ナトリウム、
ピロリン酸カリウム、塩化アルミニウム、塩化鉄等の電
解質、各種界面活性剤、各種有機高分子、シランカップ
リング剤、チタンカップリング剤等が用いられ、その添
加量は上記コロイドや微粒子に対して通常0.01〜5
重量%である。
When the fine particles are added to the solution containing the above-mentioned hydrolyzable / polycondensable organic silicon compound or chlorosilyl group-containing silicon compound, a dispersing aid may be added. The dispersion aid is not particularly limited, and commonly used additives, for example, sodium phosphate, sodium hexametaphosphate,
Electrolytes such as potassium pyrophosphate, aluminum chloride, and iron chloride, various surfactants, various organic polymers, silane coupling agents, titanium coupling agents, and the like are used. .01-5
% By weight.

【0023】上記シリカ微粒子とともに、液中に含ませ
る加水分解・縮重合可能な有機珪素化合物は、加水分
解、脱水縮合を行うものであれば基本的にはどんな化合
物でも良いが、珪素のアルコキシドや珪素のキレートが
好ましい。
The hydrolyzable and polycondensable organic silicon compound contained in the solution together with the silica fine particles may be basically any compound as long as it hydrolyzes and dehydrates and condenses. Silicon chelates are preferred.

【0024】珪素アルコキシドとして具体的には、珪素
のメトキシド、エトキシド、プロポキシド、ブトキシド
などが、単体あるいは混合体として好ましく用いられ、
珪素キレートとしては珪素のアセチルアセトネート錯体
が好ましく用いられる。
Specifically, silicon alkoxides such as methoxide, ethoxide, propoxide and butoxide of silicon are preferably used alone or as a mixture.
As the silicon chelate, an acetylacetonate complex of silicon is preferably used.

【0025】また、上記有機珪素化合物として、高分子
量タイプのアルキルシリケート、例えばコルコート株式
会社製「エチルシリケート40」や、三菱化学株式会社
製「MS56」なども用いることができる。
As the organic silicon compound, a high molecular weight alkyl silicate such as "Ethyl silicate 40" manufactured by Colcoat Co., Ltd. or "MS56" manufactured by Mitsubishi Chemical Corporation can be used.

【0026】上記有機珪素化合物加水分解物として、市
販のアルコキシシラン加水分解液、例えばコルコート株
式会社製「HAS−10」、株式会社日板研究所製「セ
ラミカG−91」、「G−92−6」、日本曹達株式会
社製「アトロンNSI−500」などを用いることがで
きる。
As the organic silicon compound hydrolyzate, commercially available alkoxysilane hydrolyzates such as “HAS-10” manufactured by Colcoat Co., Ltd., and “Ceramica G-91” and “G-92-” manufactured by Nippon Research Institute Co., Ltd. 6 "and" Atron NSI-500 "manufactured by Nippon Soda Co., Ltd. can be used.

【0027】上記鎖状シリカ微粒子とともに、液中に含
ませるクロロシリル基含有化合物とは、クロロシリル基
(−SiCln3-n、ここでnは1,2,または3であ
り、Xは水素、またはそれぞれ炭素数が1〜10のアル
キル基、アルコキシ基、またはアシロキシ基である)を
分子内に少なくとも1個有する化合物であり、その中で
も、少なくとも2個の塩素を有する化合物が好ましく、
シランSin2n+2(ここでnは1〜5の整数)の中の
少なくとも2個の水素を塩素で置換し、他の水素を必要
に応じて上記アルキル基、アルコキシ基、またはアシロ
キシ基で置換したクロロシランおよびその縮重合物が好
ましく、例えば、テトラクロロシラン(四塩化珪素、S
iCl4)、トリクロロシラン(SiHCl3)、トリクロ
ロモノメチルシラン(SiCH3Cl3)、ジクロロシラ
ン(SiH2Cl2)、およびCl−(SiCl2O)n−S
iCl3(nは1〜10の整数)等を挙げることができ
る。上記クロロシリル基含有化合物の加水分解物も使用
することができ、これらの中から、単独でまたは複数を
組み合わせて使用することができるが、最も好ましいク
ロロシリル基含有化合物はテトラクロロシランである。
クロロシリル基は反応性が非常に高く、自己縮合または
基板表面と縮合反応をすることにより強固な接着力を示
す。
The chlorosilyl group-containing compound to be contained in the solution together with the chain silica fine particles is a chlorosilyl group (—SiCl n X 3-n , where n is 1, 2, or 3; X is hydrogen; Or an alkyl group having 1 to 10 carbon atoms, an alkoxy group, or an acyloxy group) in the molecule, and among them, a compound having at least 2 chlorines is preferable,
At least two hydrogens in silane Si n H 2n + 2 (where n is an integer of 1 to 5) are substituted with chlorine, and other hydrogens are optionally substituted with the above-mentioned alkyl, alkoxy or acyloxy group. Chlorosilanes and polycondensates thereof are preferred, for example, tetrachlorosilane (silicon tetrachloride, S
iCl 4 ), trichlorosilane (SiHCl 3 ), trichloromonomethylsilane (SiCH 3 Cl 3 ), dichlorosilane (SiH 2 Cl 2 ), and Cl— (SiCl 2 O) n—S
iCl 3 (n is an integer of 1 to 10) and the like. A hydrolyzate of the above-mentioned chlorosilyl group-containing compound can also be used, and among these, a single compound or a combination of two or more compounds can be used. The most preferred chlorosilyl group-containing compound is tetrachlorosilane.
The chlorosilyl group has a very high reactivity and exhibits strong adhesive force by self-condensing or by performing a condensation reaction with the substrate surface.

【0028】上記鎖状シリカ微粒子を分散させ、そして
上記有機珪素化合物またはクロロシリル基含有化合物、
またはそれらの加水分解物を含む溶液の溶媒は、実質的
に上記有機珪素化合物またはその加水分解物を溶解すれ
ば基本的に何でも良いが、メタノール、エタノール、プ
ロパノール、ブタノール等のアルコール類、エチルセロ
ソルブ、ブチルセロソルブ、プロピルセロソルブが最も
好ましい。上記溶媒に溶解させる上記有機珪素化合物の
濃度があまり高すぎると、分散させる鎖状シリカ微粒子
の量も関係するが、膜中の上記微粒子の間に十分な空隙
を生じさせることができなくなるので、20重量%以下
とすることが好ましく、1〜20重量%の濃度が好まし
い。そして溶液中の鎖状シリカ微粒子の量に対する、上
記有機珪素化合物またはクロロシリル基含有化合物、ま
たはそれらの加水分解物の量(合計)は、シリカ換算
で、鎖状シリカ微粒子100重量%に対して5〜30重
量%が好ましい。
The above-mentioned chain silica fine particles are dispersed, and the above-mentioned organic silicon compound or chlorosilyl group-containing compound is
Alternatively, the solvent of the solution containing the hydrolyzate may be basically any solvent as long as the organic silicon compound or the hydrolyzate thereof is substantially dissolved, but alcohols such as methanol, ethanol, propanol and butanol, and ethyl cellosolve may be used. , Butyl cellosolve and propyl cellosolve are most preferred. If the concentration of the organosilicon compound dissolved in the solvent is too high, the amount of dispersed chain silica fine particles is also involved, but it is not possible to generate sufficient voids between the fine particles in the film, It is preferably at most 20% by weight, and more preferably at a concentration of 1 to 20% by weight. The amount (total) of the organosilicon compound or the chlorosilyl group-containing compound or the hydrolyzate thereof with respect to the amount of the chain silica fine particles in the solution is 5 parts per 100% by weight of the chain silica fine particles in terms of silica. ~ 30% by weight is preferred.

【0029】上記有機珪素化合物の加水分解には水が必
要である。これは、酸性、中性の何れでも良いが、加水
分解を促進するためには、塩酸、硝酸、硫酸、酢酸、ク
エン酸、スルホン酸等で酸性にした水を用いるのが好ま
しい。酸の添加量は特に限定されないが、有機珪素化合
物に対してモル比で0.001〜2が良い。添加酸量
が、モル比で0.001より少ないと、有機珪素化合物
の加水分解の促進が充分でなく、またモル比で2より多
くても、もはや加水分解促進の効果が向上せず、好まし
くない。
Water is required for the hydrolysis of the organosilicon compound. This may be either acidic or neutral, but it is preferable to use water acidified with hydrochloric acid, nitric acid, sulfuric acid, acetic acid, citric acid, sulfonic acid or the like in order to promote hydrolysis. The amount of the acid added is not particularly limited, but is preferably 0.001 to 2 in a molar ratio to the organic silicon compound. When the amount of the added acid is less than 0.001 in molar ratio, the promotion of hydrolysis of the organosilicon compound is not sufficient, and when the amount is more than 2, the effect of promoting hydrolysis is no longer improved, which is preferable. Absent.

【0030】上記有機珪素化合物の加水分解に必要な水
の添加量は、有機珪素化合物に対してモル比で0.1〜
100が良い。水添加量がモル比で0.1より少ない
と、有機珪素化合物の加水分解の促進が充分でなく、ま
たモル比で100より多いと、液の安定性が低下する傾
向になり好ましくない。
The amount of water required for the hydrolysis of the above organosilicon compound is 0.1 to 0.1 mol per mol of the organosilicon compound.
100 is good. If the amount of water added is less than 0.1 in terms of molar ratio, the promotion of hydrolysis of the organosilicon compound is not sufficient, and if the amount is more than 100, the stability of the solution tends to decrease, which is not preferable.

【0031】上記クロロシリル基含有化合物を用いる場
合には、必ずしも水や酸の添加は必要ではない。付加的
に全く水や酸を添加しなくても、溶媒中に含まれていた
水分や雰囲気中の水分などにより加水分解が進行する。
また、この加水分解に伴って液中に塩酸が遊離し、さら
に加水分解が進行する。しかし、付加的に水や酸を加え
ても何ら差し支えない。
When the chlorosilyl group-containing compound is used, it is not always necessary to add water or an acid. Even if no additional water or acid is added, hydrolysis proceeds due to moisture contained in the solvent or moisture in the atmosphere.
In addition, hydrochloric acid is released into the liquid with the hydrolysis, and the hydrolysis further proceeds. However, it does not matter if water or acid is additionally added.

【0032】上記鎖状シリカ微粒子と、上記有機珪素化
合物やクロロシリル基含有化合物、またはそれらの加水
分解物を溶媒とともに混合し、必要に応じて水、酸触
媒、および分散助剤を添加して、基板上に凹凸を形成す
るためのコーティング液を調製する。この時、有機金属
化合物とクロロシリル基含有化合物は、単独で用いても
混合して用いてもどちらでも良い。このコーティング液
の好ましい原料配合比は、次の表1の通りである。ここ
で珪素化合物とは、上記有機珪素化合物やクロロシリル
基含有化合物、またはそれらの加水分解物をその合計で
表している。
The above-mentioned chain silica fine particles and the above-mentioned organosilicon compound, chlorosilyl group-containing compound or a hydrolyzate thereof are mixed together with a solvent, and if necessary, water, an acid catalyst and a dispersing agent are added. A coating solution for forming irregularities on a substrate is prepared. At this time, the organometallic compound and the chlorosilyl group-containing compound may be used alone or in combination. The preferred raw material mixing ratio of this coating liquid is as shown in Table 1 below. Here, the silicon compound represents the above-mentioned organic silicon compound, chlorosilyl group-containing compound, or a hydrolyzate thereof in total.

【0033】[0033]

【表1】 ====================== 珪素化合物 100重量部 鎖状シリカ微粒子 100〜800重量部 水 4〜150重量部 酸触媒 0.00001〜5重量部 分散助剤 0.001〜10重量部 溶媒 500〜10000重量部 ======================Table 1 ====================== 100 parts by weight of silicon compound 100 to 800 parts by weight of fine chain silica particles 4 to 150 parts by weight of water Acid catalyst 0. 00001 to 5 parts by weight Dispersing aid 0.001 to 10 parts by weight Solvent 500 to 10000 parts by weight =======================

【0034】上記有機金属化合物またはクロロシリル基
含有化合物を溶媒に溶かし、触媒と水を加え、10℃と
溶液の沸点の間の所定の温度で、5分間から2日間加水
分解する。そこへ鎖状シリカ微粒子と必要に応じ分散助
剤を加えて、必要に応じさらに10℃と溶液の沸点の間
の所定の温度で5分間から2日間反応させ、コーティン
グ液を得る。なお、クロロシリル基含有化合物を用いる
場合には、触媒および水は特別に添加する必要はない。
また鎖状シリカ微粒子は、上記加水分解工程の前に加え
ても良い。また、有機珪素化合物の加水分解工程を省略
するために、上記市販の有機金属化合物加水分解物溶液
を用いても良い。得られたコーティング液は、その後コ
ーティング方法に応じて適当な溶媒で希釈しても構わな
い。
The above organometallic compound or chlorosilyl group-containing compound is dissolved in a solvent, a catalyst and water are added, and the mixture is hydrolyzed at a predetermined temperature between 10 ° C. and the boiling point of the solution for 5 minutes to 2 days. Chain silica fine particles and a dispersing aid are added to the mixture, if necessary, and the mixture is further reacted, if necessary, at a predetermined temperature between 10 ° C. and the boiling point of the solution for 5 minutes to 2 days to obtain a coating liquid. When a chlorosilyl group-containing compound is used, it is not necessary to add a catalyst and water.
The chain silica fine particles may be added before the hydrolysis step. Further, in order to omit the step of hydrolyzing the organic silicon compound, the above-mentioned commercially available organic metal compound hydrolyzate solution may be used. The obtained coating liquid may be subsequently diluted with an appropriate solvent according to the coating method.

【0035】上記コーティング液をガラス基板上に塗布
し、乾燥して、ガラス基板上にシリカ凹凸膜を形成す
る。
The above coating solution is applied on a glass substrate and dried to form a silica uneven film on the glass substrate.

【0036】上記塗布の方法は、公知の技術を用いれば
よく特に限定されないが、スピンコーター、ロールコー
ター、スプレーコーター、カーテンコーター等の装置を
用いる方法や、浸漬引き上げ法(ディップコーティング
法)、流し塗り法(フローコーティング法)などの方法
や、スクリーン印刷、グラビア印刷、曲面印刷などの各
種印刷法が用いられる。
The above-mentioned coating method is not particularly limited as long as a known technique is used, but a method using an apparatus such as a spin coater, a roll coater, a spray coater, a curtain coater, a dipping and pulling method (dip coating method), and a flow method Various printing methods such as a coating method (flow coating method) and screen printing, gravure printing, and curved surface printing are used.

【0037】ガラス基板によっては、上記コーティング
液をはじくなどして均一に塗布できない場合があるが、
これは基板表面の洗浄や表面改質を行うことで改善でき
る。洗浄や表面改質の方法としては、アルコール、アセ
トン、ヘキサンなどの有機溶媒による脱脂洗浄、アルカ
リや酸による洗浄、研磨剤により表面を研磨する方法、
超音波洗浄、紫外線照射処理、紫外線オゾン処理、プラ
ズマ処理などが挙げられる。
Depending on the glass substrate, it may not be possible to apply the coating solution uniformly by repelling the coating solution.
This can be improved by cleaning or modifying the surface of the substrate. As a method of cleaning or surface modification, alcohol, acetone, degreasing cleaning with an organic solvent such as hexane, cleaning with an alkali or acid, a method of polishing the surface with an abrasive,
Examples include ultrasonic cleaning, ultraviolet irradiation treatment, ultraviolet ozone treatment, and plasma treatment.

【0038】塗布後のガラス基板は、室温から200℃
の間の温度で1分間から2時間乾燥することにより、シ
リカ凹凸膜が形成される。必要に応じてその後に、40
0℃〜750℃の間の温度で5秒から5時間熱処理する
と、これにより、ガラス基板表面のシリカ凹凸膜は強固
になる。この凹凸膜は鎖状シリカ微粒子とシリカ(有機
金属化合物から由来する)のマトリックスからなり、鎖
状シリカ微粒子がシリカマトリックスによりガラス基板
に固着され、鎖状シリカ微粒子の表面形状がこの膜の凹
凸を形成する。
The glass substrate after coating is heated from room temperature to 200 ° C.
By drying at a temperature between 1 minute and 2 hours, a silica uneven film is formed. Then, if necessary, 40
When heat treatment is performed at a temperature between 0 ° C. and 750 ° C. for 5 seconds to 5 hours, the silica unevenness film on the surface of the glass substrate becomes strong. This uneven film is composed of a matrix of chain silica fine particles and silica (derived from an organometallic compound), and the chain silica fine particles are fixed to a glass substrate by the silica matrix, and the surface shape of the chain silica fine particles reduces the unevenness of the film. Form.

【0039】上記塗布される前のガラス基板としては、
曲げ工程および合わせ工程を終えた自動車用のウィンド
シールド、リアウィンドウ、フロントドア、またはリア
ドア等のガラス板でもよく、また合わせ工程の前の、ま
たは曲げ工程の前の、または所定寸法に切断される前の
ガラス板であってもよい。
As the glass substrate before being coated,
It may be a glass plate such as a windshield, a rear window, a front door, or a rear door for an automobile after the bending process and the joining process, and is cut to a predetermined size before the joining process, or before the bending process. The front glass plate may be used.

【0040】シリカ凹凸膜を被覆した自動車用ガラス板
は、更にその表面に撥水性被膜または防曇性被膜を被覆
することができる。撥水性被膜を被覆することにより撥
水性能が得られ、また汚れが付着した場合、汚れ除去性
も改善できる。また防曇水性被膜を被覆することにより
防曇性能が得られ、また汚れが付着した場合、汚れ除去
性も改善できる。ガラス板(合わせガラス板でもよい)
の両表面にシリカ凹凸膜を被覆し、その一方の表面また
は両表面の上に撥水性被膜を被覆してもよく、ガラス板
の片側表面にシリカ凹凸膜を被覆し、シリカ凹凸膜およ
び無処理ガラス表面の両方、またはいずれか一方の上に
撥水性被膜を被覆してもよい。シリカ凹凸膜の上に撥水
性被膜が被覆されていても、可視光反射防止性能および
視認性が低下することはない。
The glass sheet for automobiles coated with the silica unevenness film can be further coated with a water-repellent coating or an anti-fog coating on its surface. By coating with a water-repellent film, water-repellent performance can be obtained, and when dirt adheres, the dirt-removing property can be improved. The antifogging performance can be obtained by coating the antifogging water-based coating, and when dirt adheres, the dirt removability can be improved. Glass plate (Laminated glass plate may be used)
Both surfaces may be coated with a silica uneven film, and one or both surfaces may be coated with a water-repellent film.One surface of a glass plate is coated with a silica uneven film, and the silica uneven film and untreated. A water-repellent coating may be coated on both or either of the glass surfaces. Even when the water-repellent coating is coated on the silica uneven film, the visible light antireflection performance and the visibility are not reduced.

【0041】同様にガラス板(合わせガラス板でもよ
い)の両表面にシリカ凹凸膜を被覆し、その少なくとも
一方の表面上に防曇性被膜を被覆してもよく、ガラス板
(合わせガラス板でもよい)の片側表面にシリカ凹凸膜
を被覆し、シリカ凹凸膜および無処理ガラス表面の両方
またはそのいずれか一方の上に防曇性被膜を被覆しても
よい。
Similarly, both surfaces of a glass plate (which may be a laminated glass plate) may be coated with a silica uneven film, and at least one surface thereof may be coated with an antifogging film. Good) may be coated with a silica uneven film, and an antifogging film may be coated on both the silica uneven film and the untreated glass surface or any one of them.

【0042】また、本発明が自動車用窓に適用される場
合、ガラス板(合わせガラス板でもよい)の両側表面に
シリカ凹凸膜が被覆され、片側の前記膜の表面(車内
側)に防曇性被膜が被覆され、他方側の前記層膜面(車
外側)に撥水性被膜が被覆されていることが好ましい。
When the present invention is applied to an automobile window, both surfaces of a glass plate (which may be a laminated glass plate) are coated with a silica uneven film, and one surface of the film (the inside of the vehicle) is defogged. It is preferable that a water-repellent film be coated on the other side of the layer film surface (outside of the vehicle).

【0043】[0043]

【発明の実施の形態】以下に本発明の実施例を挙げて説
明するが、本発明はこれらによって限定されるものでは
ない。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described with reference to examples, but the present invention is not limited to these examples.

【0044】[実施例1]エチルシリケートの加水分解
縮重合液(商品名:HAS−10、コルコート株式会社
製、SiO2 含量10重量%)3.0重量部と、平均直
径が約15nmで平均長さが約170nmの鎖状シリカ
コロイド(商品名:スノーテックスOUP、日産化学工
業株式会社製、固形分15重量%、分散助剤含有)1
3.3重量部と、2−プロパノール 74.9重量部を
室温で混合し、これを2−プロパノールで3重量倍に希
釈して、室温で2時間攪拌して、低屈折率凹凸層形成用
コーティング液を得た。このコーティング液中には、鎖
状シリカ微粒子およびエチルシリケートが、それぞれシ
リカ換算で100:15の重量比で含有されていた。ま
たこのコーティング液は、珪素化合物100重量部に対
して、鎖状シリカ微粒子を670重量部、水分を45重
量部、酸触媒を4.5重量部、および溶剤をそれぞれ含
有していた。
Example 1 3.0 parts by weight of a hydrolytic condensation polymerization solution of ethyl silicate (trade name: HAS-10, manufactured by Colcoat Co., Ltd., SiO 2 content: 10% by weight) and an average diameter of about 15 nm Chain silica colloid having a length of about 170 nm (trade name: Snowtex OUP, manufactured by Nissan Chemical Industries, Ltd., solid content 15% by weight, containing a dispersing aid) 1
3.3 parts by weight and 74.9 parts by weight of 2-propanol are mixed at room temperature, diluted 3 times by weight with 2-propanol, and stirred at room temperature for 2 hours to form a low refractive index uneven layer. A coating liquid was obtained. The coating liquid contained chain silica fine particles and ethyl silicate in a weight ratio of 100: 15 in terms of silica, respectively. The coating solution contained 670 parts by weight of chain silica fine particles, 45 parts by weight of water, 4.5 parts by weight of an acid catalyst, and a solvent with respect to 100 parts by weight of the silicon compound.

【0045】酸化セリウム系研磨剤で表面研磨・洗浄
し、さらに純水中で超音波洗浄を行い乾燥したソーダラ
イム珪酸塩ガラス板(65mm×150mm×3mm)
を、前記低屈折率凹凸層形成用コーティング液に浸漬
し、20cm/分の速度で引き上げることにより、コー
ティング液をガラス板の両表面上に塗布した。このガラ
ス板を100℃で30分間乾燥させ、さらに250℃で
30分間乾燥させた後、500℃オーブン内で1時間熱
処理し、厚み140nmのシリカ凹凸膜が各表面に形成
されたガラス板を得た。なおこの膜厚140nmは、入
射角(α)が60度のときに反射率が最小となる条件、
すなわち膜の屈折率(n)=1.340として、550
nmの波長(λ)の光に対して膜厚が、上記数式2を計
算した値134nmにほぼ等しい。
A soda lime silicate glass plate (65 mm × 150 mm × 3 mm) which has been subjected to surface polishing and washing with a cerium oxide-based abrasive, and further subjected to ultrasonic washing in pure water and dried.
Was immersed in the coating liquid for forming a low-refractive-index uneven layer, and pulled up at a speed of 20 cm / min to apply the coating liquid on both surfaces of the glass plate. This glass plate was dried at 100 ° C. for 30 minutes, further dried at 250 ° C. for 30 minutes, and then heat-treated in a 500 ° C. oven for 1 hour to obtain a glass plate having a 140 nm thick silica uneven film formed on each surface. Was. The thickness of 140 nm is such that the reflectance is minimum when the incident angle (α) is 60 degrees,
That is, assuming that the refractive index (n) of the film is 1.340, 550
For light having a wavelength (λ) of nm, the film thickness is substantially equal to the value 134 nm calculated by the above equation (2).

【0046】シリカ凹凸膜の厚み、膜の屈折率、膜空隙
率および膜表面粗度、ならびにシリカ凹凸膜付きガラス
板の可視光反射率、および視認性の測定は次のようにし
て行った。 シリカ凹凸膜の厚み;シリカ凹凸膜が被覆されたガラス
板の断面を電子顕微鏡で倍率10万倍にて観察し、ガラ
ス板表面から凹凸膜の凸部頂上までの高さを膜厚とし
た。 膜の屈折率;エリプソメーターにより550nmの波長
の光での値を求める。 膜空隙率;電子顕微鏡写真から空隙の大きさを測定して
計算する。
The thickness of the silica uneven film, the refractive index of the film, the film porosity and the film surface roughness, and the visible light reflectance and visibility of the glass plate with the silica uneven film were measured as follows. Thickness of silica concavo-convex film: The cross section of the glass plate coated with the silica concavo-convex film was observed with an electron microscope at a magnification of 100,000, and the height from the surface of the glass plate to the top of the convex portion of the concavo-convex film was defined as the film thickness. Refractive index of the film; a value at a light having a wavelength of 550 nm is determined by an ellipsometer. Membrane porosity: Calculated by measuring the size of voids from electron micrographs.

【0047】膜表面粗度;原子間力顕微鏡(セイコー電
子株式会社製SPI3700)を用いて膜を観察して、
測定した断面曲線から 算術平均粗さ(Ra値)、凹凸
の平均間隔(Sm値)はJIS B 0601(199
4)記載の方法により定義される値を計算した。
Film surface roughness: The film was observed using an atomic force microscope (SPI3700, manufactured by Seiko Denshi Co., Ltd.).
The arithmetic average roughness (Ra value) and the average interval of unevenness (Sm value) were measured according to JIS B 0601 (199).
4) The value defined by the method described was calculated.

【0048】可視光反射率;入射角12度および60度
での可視光(380〜780nm波長)の反射率を、分
光光度計(MCPD−1000、大塚電子株式会社製)
を用いて、ガラス板の両面からの反射光を測定した。
Visible light reflectance: The reflectance of visible light (380 to 780 nm wavelength) at incident angles of 12 degrees and 60 degrees was measured using a spectrophotometer (MCPD-1000, manufactured by Otsuka Electronics Co., Ltd.).
Was used to measure the reflected light from both sides of the glass plate.

【0049】視認性:自動車のウィンドシールドの片側
(右半分)にシリカ凹凸膜付きガラス板を、他の片側
(左半分)は無処理のカ゛ラス板をそれぞれ組み付け、車内
側から車外を見た場合、前方の風景の見やすさ、すなわ
ちインハ゜ネの写り込みによる視界妨害の程度を左右のガラ
ス板を比較して見ることで、官能評価した。判定基準は
下記表2に示す基準で1〜5段階で行った。それらの測
定結果を表3に示す。
Visibility: When a glass plate with an uneven silica film is attached to one side (right half) of a windshield of an automobile and an untreated glass plate is attached to the other side (left half), and the outside of the vehicle is viewed from the inside of the vehicle. The sensory evaluation was made by comparing the left and right glass plates to see how easily the scenery in front could be seen, that is, the degree of obstruction of the view due to the reflection of the inpane. The evaluation criteria were based on the criteria shown in Table 2 below, in 1 to 5 stages. Table 3 shows the measurement results.

【0050】[0050]

【表2】 =================================== 視認性官能評価基準 点数 基準 −−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−− 1:インハ゜ネ写り込みが気になり、前方風景が見にくい。 2:インハ゜ネ写り込みが少し気になるが注意して見ると前方風景が見える。 3:インハ゜ネ写り込みは少しあるが前方風景が容易に見える。 4:インハ゜ネ写り込みはほとんどなく前方風景がほぼ明瞭に見える。 5:インハ゜ネ写り込みが全くなく前方風景が明瞭に見える。 ===================================[Table 2] ================================== Visibility Sensory Evaluation Criteria Score Criteria ---- −−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−− 1: Inconspicuous in the image, and it is difficult to see the scenery ahead. 2: The image in front is slightly anxious, but if you look carefully, you can see the scenery ahead. 3: There is a little reflection in the image, but the scene in front is easily visible. 4: There is almost no reflection in the image, and the front scene is almost clear. 5: The scenery ahead is clearly visible without any reflection in the image. ===================================

【0051】[比較例1]実施例1で使用したコーティ
ング液の鎖状シリカコロイド13.3重量部の代わり
に、粒子粒径50nmのシリカコロイド(商品名:スノ
ーテックスOL、日産化学工業株式会社製、固形分20
重量%)10.0重量部を使用したコーティング液(シ
リカ微粒子およびエチルシリケートが、それぞれシリカ
換算で100:15の重量比で含有)を用いて、実施例
1と同様にガラス板の両表面に浸漬塗布、乾燥、熱処理
して厚み118nmのシリカ凹凸膜が各表面に形成され
たガラス板を得た。なおこの膜厚118nmは、入射角
(α)が60度のときに反射率が最小となる条件、膜の
屈折率(n)=1.454として、550nmの波長λ
の光に対して光学膜厚が4/λになる条件、すなわち膜
厚は、上記数式2を計算した値118nmに等しい。得
られたシリカ凹凸膜の厚み、膜の屈折率、膜空隙率およ
び膜表面粗度、ならびにシリカ凹凸膜付きガラス板の可
視光反射率、および視認性の測定結果を表3に示す。
Comparative Example 1 A silica colloid having a particle diameter of 50 nm (trade name: Snowtex OL, Nissan Chemical Industries, Ltd.) was used instead of 13.3 parts by weight of the chain silica colloid of the coating solution used in Example 1. Made, solid content 20
In the same manner as in Example 1, both surfaces of the glass plate were coated with 10.0 parts by weight of a coating liquid (containing silica fine particles and ethyl silicate in a weight ratio of 100: 15 in terms of silica) using 10.0 parts by weight. Dip coating, drying, and heat treatment were performed to obtain glass plates having a 118-nm-thick silica uneven film formed on each surface. The film thickness of 118 nm is a condition that the reflectance is minimum when the incident angle (α) is 60 degrees, the refractive index (n) of the film is 1.454, and the wavelength λ of 550 nm is used.
The condition that the optical film thickness becomes 4 / λ with respect to the above light, that is, the film thickness is equal to the value 118 nm calculated by the above equation (2). Table 3 shows the measurement results of the thickness, the refractive index, the film porosity, and the film surface roughness of the obtained silica uneven film, the visible light reflectance of the glass plate with the silica uneven film, and the visibility.

【0052】[比較例2および3]実施例1で使用した
コーティング液のエチルシリケートの加水分解縮重合液
の使用量3.0重量部を20重量部として、コーティン
グ液中の鎖状シリカ微粒子およびエチルシリケートを、
それぞれシリカ換算で50:50の重量比としたほか
は、実施例1と同様にガラス板の両表面に浸漬塗布、乾
燥、熱処理して厚み120nmのシリカ凹凸膜が各表面
に形成されたガラス板を得た(比較例2)。なおこの膜
厚120nmは、入射角(α)が60度のときに反射率
が最小となる条件、膜の屈折率(n)=1.432とし
て、550nmの波長λの光に対して光学膜厚が4/λ
になる条件、すなわち膜厚は、上記数式2を計算した値
121nmにほぼ等しい。
[Comparative Examples 2 and 3] The amount of chain silica fine particles in the coating liquid was changed to 20 parts by weight of 3.0 parts by weight of the hydrolyzed polycondensation solution of ethyl silicate in the coating liquid used in Example 1. Ethyl silicate,
A glass plate having a 120-nm-thick silica concavo-convex film formed on each surface by dip coating, drying and heat treatment on both surfaces of the glass plate in the same manner as in Example 1 except that the weight ratio was 50:50 in terms of silica. Was obtained (Comparative Example 2). Note that this film thickness of 120 nm is a condition that the reflectance becomes minimum when the incident angle (α) is 60 degrees, the refractive index (n) of the film is 1.432, and the optical film has a wavelength λ of 550 nm. 4 / λ thickness
, That is, the film thickness is substantially equal to the value 121 nm calculated by the above equation (2).

【0053】またコーティング液中の鎖状シリカコロイ
ドの使用量をゼロとしたほかは、実施例1と同様に、ガ
ラス板の両表面に浸漬塗布、乾燥、熱処理して厚み11
5nmのシリカ膜が、各表面に形成されたガラス板を得
た(比較例3)。なおこの膜厚115nmは、入射角
(α)が60度のときに反射率が最小となる条件、膜の
屈折率(n)=1.473として、550nmの波長λ
の光に対して膜厚は、上記数式2を計算した値115n
mに等しい。得られたシリカ凹凸膜の厚み、膜の屈折
率、膜空隙率および膜表面粗度、ならびにシリカ凹凸膜
付きガラス板の可視光反射率、および視認性の測定結果
を表3に示す。なお、未処理のガラス板(屈折率1.
5)の12度および60度入射角の可視光線反射率は、
それぞれ約7%および約14%である。
Also, dip coating, drying and heat treatment were applied to both surfaces of the glass plate in the same manner as in Example 1 except that the amount of the chain silica colloid used in the coating solution was set to zero.
A glass plate having a 5-nm silica film formed on each surface was obtained (Comparative Example 3). The film thickness of 115 nm is a condition that the reflectance is minimum when the incident angle (α) is 60 degrees, the refractive index (n) of the film is 1.473, and the wavelength λ of 550 nm.
The film thickness is 115n calculated from the above equation 2
equal to m. Table 3 shows the measurement results of the thickness, the refractive index, the film porosity, and the film surface roughness of the obtained silica uneven film, the visible light reflectance of the glass plate with the silica uneven film, and the visibility. In addition, untreated glass plate (refractive index 1.
5) The visible light reflectance at the incident angles of 12 degrees and 60 degrees is
They are about 7% and about 14%, respectively.

【0054】[0054]

【表3】 =================================== 屈 表面粗度 可視光反射率(%) 視 膜厚 折 空隙率 (nm) −−−−−−−− 認 (nm) 率 (体積%) −−−−− 入射角 入射角 性 Ra Sm 12度 60度 −−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−− 実施例1 140 1.340 60 7 20 0.8 1.9 5 比較例1 118 1.454 15 6 20 1.8 4.3 4 比較例2 120 1.432 2 5 - 4 8 3 比較例3 115 1.473 0 0 - 8 14.5 1 ==================================Table 3 =================================== Surface Roughness Visible Light Reflectance (%) Visual film thickness Folded porosity (nm) −−−−−−−− Recognition (nm) Percentage (vol%) −−−−− Incident angle Incident angle Ra Sm 12 ° 60 ° −−−−−−−− −−−−−−−−−−−−−−−−−−−−−−−−−−−− Example 1 140 1.340 60 7 20 0.8 1.9 5 Comparative Example 1 118 1.454 15 6 20 1.8 4.3 4 Comparative Example 2 120 1.432 2 5-4 8 3 Comparative Example 3 115 1.473 0 0-8 14.5 1 ================================= ====

【0055】[実施例2]上記実施例1で使用したソー
ダライム珪酸塩ガラス板(65mm×150mm×3m
m)の代わりに、同じソーダライム珪酸塩ガラス組成を
有する自動車ウィンドシールド用ガラス板(約150c
m×約60cm×3mm)を用い、実施例1と同様に浸
漬塗布、乾燥した後、公知の曲げ工程(570℃で15
分間加熱)により熱処理して、厚み120nmのシリカ
凹凸膜が各表面に形成された自動車ウィンドシールド用
ガラス板を製造した。
Example 2 The soda lime silicate glass plate (65 mm × 150 mm × 3 m) used in Example 1 was used.
m) instead of an automotive windshield glass sheet (about 150 c) having the same soda-lime silicate glass composition
m × about 60 cm × 3 mm), dip-coated and dried in the same manner as in Example 1, and then subjected to a known bending step (15 ° C. at 570 ° C.).
(Heating for 1 minute) to produce an automotive windshield glass plate having a 120-nm-thick silica uneven film formed on each surface.

【0056】このガラス板について、凹凸膜の厚み、膜
の屈折率、膜空隙率、膜表面粗度、可視光反射率、およ
び視認性を測定したところ、実施例1と同じ結果が得ら
れた。そして、膜の強度については、市販のガラスクリ
ーナーを付けた綿布を用いて500gfの荷重をかけな
がら100往復擦りを行った後、その膜を肉眼で観察し
て異常の有無を調べ、これを1回と数えて繰り返して試
験を行った。実施例1では300回の擦りで異常を示し
たが、実施例2では5000回の擦りまで異常を示さな
かった。
When the thickness of the uneven film, the refractive index of the film, the film porosity, the film surface roughness, the visible light reflectance, and the visibility of this glass plate were measured, the same results as in Example 1 were obtained. . As for the strength of the film, the film was rubbed 100 times using a cotton cloth with a commercially available glass cleaner while applying a load of 500 gf. Then, the film was observed with the naked eye to determine whether there was any abnormality. The test was repeated and counted. Example 1 showed an abnormality after 300 rubs, but Example 2 showed no abnormality until 5000 rubs.

【0057】上記のシリカ凹凸膜付き自動車ウィンドシ
ールド用ガラス板を2枚準備し、公知の合わせ工程を通
過させて、厚みが0.7mmのポリビニルブチラール中
間膜を介して接合された自動車ウィンドシールド用合わ
せガラス板を得た。この合わせガラス板は実施例1とほ
ぼ等しい可視光反射率、および視認性を示した。
Two glass plates for an automobile windshield having the above-mentioned silica uneven film are prepared, and are passed through a known laminating process, and are joined together via a 0.7 mm-thick polyvinyl butyral interlayer. A laminated glass plate was obtained. This laminated glass plate exhibited almost the same visible light reflectance and visibility as those in Example 1.

【0058】[実施例3]温度計、撹拌機および冷却器
を備えた1リットルのガラス製の反応器に、式C817
CH2CH2Si(OCH3)3 で示されるパーフロロ基含
有有機珪素化合物10.0g、下記化学式1で示される
加水分解性基含有メチルポリシロキサン化合物10.0
g、t−ブタノール360.0g、および0.1Nの塩
酸水溶液1.94gを仕込み、80℃で5時間共加水分
解反応させ、さらに、疎水性溶媒であるn−ヘキサン1
60.0gを加えて室温で10時間撹拌した。
Example 3 A 1 liter glass reactor equipped with a thermometer, stirrer and cooler was charged with the formula C 8 F 17
Perfluoro group-containing organic silicon compound 10.0 g represented by CH 2 CH 2 Si (OCH 3 ) 3 , and hydrolyzable group-containing methyl polysiloxane compound 10.0 represented by the following chemical formula 1
g, 360.0 g of t-butanol, and 1.94 g of a 0.1 N aqueous hydrochloric acid solution, and subjected to a cohydrolysis reaction at 80 ° C. for 5 hours.
60.0 g was added and the mixture was stirred at room temperature for 10 hours.

【0059】[0059]

【化1】 Embedded image

【0060】次いで、これに下記化学式2で示される、
オルガノポリシロキサン10.0g、およびメタンスル
ホン酸5.0gを加え、10分間撹拌し、撥水膜形成用
組成物を得た。
Next, this is represented by the following chemical formula 2:
10.0 g of organopolysiloxane and 5.0 g of methanesulfonic acid were added and stirred for 10 minutes to obtain a composition for forming a water-repellent film.

【0061】[0061]

【化2】 Embedded image

【0062】前記実施例1で得られたシリカ凹凸層被覆
ガラス板の一方の凹凸層の表面に、上記撥水膜形成用組
成物0.1mlを綿布で10回塗りのばし、乾布で余剰
の塗布液を拭き取った後、100℃で10分間熱処理し
て、膜厚が40nmの撥水膜を有する低反射撥水性ガラ
ス板を得た。また撥水膜を肉眼で観察して異常の有無を
調べたが外観品質は良好であった。
The above water-repellent film-forming composition (0.1 ml) was applied 10 times with a cotton cloth to the surface of one of the concave-convex layers of the glass plate coated with the silica concave-convex layer obtained in the above Example 1, and then was applied with a dry cloth. After wiping off the liquid, heat treatment was performed at 100 ° C. for 10 minutes to obtain a low-reflection water-repellent glass plate having a water-repellent film having a thickness of 40 nm. The appearance of the water-repellent film was good by visual observation of the presence or absence of abnormality.

【0063】得られた撥水膜の水との接触角は、接触角
計(協和界面科学株式会社製「CA−DT」)を用い
て、直径約2mmの水滴の接触角を測定し、耐摩耗性、
耐薬品性および耐候性試験を実施した。接触角が高いほ
ど撥水性が優れていることを示すが、結果は表4に示す
通り、耐候性試験後の接触角は低いものの、初期接触
角、耐摩耗性試験後の接触角および耐薬品性試験後の接
触角はいずれも95度以上であって非常に優れていた。
そしてこの低反射撥水性ガラス板について、その撥水膜
面とは反対の表面から光を入射させて、可視光反射率を
測定し、また撥水膜面を車外側にして視認性を測定した
ところ、初期値、耐摩耗性試験後の値、および耐薬品性
試験後の値はいずれも実施例1と全く同等の結果が得ら
れた。
The contact angle of the obtained water-repellent film with water was measured using a contact angle meter (“CA-DT” manufactured by Kyowa Interface Science Co., Ltd.). Abrasion,
Chemical resistance and weather resistance tests were performed. The higher the contact angle, the better the water repellency. As shown in Table 4, the contact angle after the weather resistance test was low, but the initial contact angle, the contact angle after the wear resistance test, and the chemical resistance. The contact angles after the property test were all 95 degrees or more, which were very excellent.
Then, for this low-reflection water-repellent glass plate, light was incident from the surface opposite to the surface of the water-repellent film, the visible light reflectance was measured, and the visibility was measured with the water-repellent film surface facing the outside of the vehicle. However, the initial value, the value after the abrasion resistance test, and the value after the chemical resistance test were all equivalent to those of Example 1.

【0064】なお、ここで、耐摩耗性試験は、新東科学
製の往復摩耗試験機に乾布を取り付けて、荷重0.3k
g/cm2 で撥水膜表面を3000往復させた後の接触
角を測定することにより、耐薬品性試験は、飽和した石
灰水溶液に24時間浸漬した後の接触角を測定すること
により、耐候性は、耐候性試験機「アイスーパーUVテ
スターW13」(岩崎電気製)を用いて、照度76±2
mW/m2 、ブラックパネル温度48±2℃、1時間ご
と30秒間ずつのシャワリングという条件で、400時
間紫外線照射後の接触角を測定することにより、それぞ
れ実施した。
The abrasion resistance test was carried out by attaching a dry cloth to a reciprocating abrasion tester manufactured by Shinto Kagaku and applying a load of 0.3 k
The chemical resistance test was performed by measuring the contact angle after 3,000 reciprocations on the surface of the water-repellent film at g / cm 2 , and by measuring the contact angle after immersion in a saturated lime aqueous solution for 24 hours. The irradiance was 76 ± 2 using the weather resistance tester “I-Super UV Tester W13” (Iwasaki Electric).
The measurement was performed by measuring the contact angle after irradiating with ultraviolet light for 400 hours under the conditions of mW / m 2 , black panel temperature of 48 ± 2 ° C., and showering for 30 seconds every hour.

【0065】[0065]

【表4】 =================================== 撥水膜 初期 −−−−−−−−− 接触角 耐摩耗性 耐薬品性 耐候性 膜厚(nm) 外観品質 (度) (度) (度) (度) −−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−− 実施例3 40 良好 107 100 101 85 ===================================[Table 4] ================================== Water-repellent film Initial ------ −− Contact angle Wear resistance Chemical resistance Weather resistance Film thickness (nm) Appearance quality (degree) (degree) (degree) (degree) −−−−−−−−−−−−−−−−−−−−−− Example 3 40 Good 107 100 101 85 ========================= ==========

【0066】[実施例4]1000mlの市販エタノー
ル(99.5%)に、0.1N酢酸を1ml添加し攪拌
した。このエタノールを主体とする液796gに[メト
キシ(ポリエチレンオキシ)プロピル]トリメトキシシ
ラン(チッソ株式会社製「SIM6492.7」、含有
率90%、分子量460〜590、エチレンオキサイド
単位6〜9)を4g添加し30℃で1時間攪拌して、オ
ルガノシラン塗布液を調製した。
Example 4 1 ml of 0.1N acetic acid was added to 1000 ml of commercially available ethanol (99.5%) and stirred. 4 g of [methoxy (polyethyleneoxy) propyl] trimethoxysilane ("SIM6492.7" manufactured by Chisso Corporation, content: 90%, molecular weight: 460 to 590, ethylene oxide unit: 6 to 9) is added to 796 g of the liquid mainly composed of ethanol. The mixture was added and stirred at 30 ° C. for 1 hour to prepare an organosilane coating solution.

【0067】前記実施例1で得られたシリカ凹凸層被覆
ガラス板を、純水中で超音波洗浄し乾燥した後、上記オ
ルガノシラン塗布液に浸漬し、5cm/分の速度で引き
上げることにより、液をシリカ凹凸膜付ガラス板の両表
面上に塗布した。このガラス板を120℃で30分間乾
燥・熱処理し、室温まで冷やした後純水で軽く洗浄し
て、ポリエチレンオキシド基を分子内に含む、厚みが約
8nmのオルガノシラン層が形成された防曇性シリカ凹
凸膜付ガラス板を得た。
The glass plate coated with the silica uneven layer obtained in Example 1 was ultrasonically washed in pure water, dried, immersed in the organosilane coating solution, and pulled up at a speed of 5 cm / min. The liquid was applied on both surfaces of a glass plate provided with a silica uneven film. The glass plate was dried and heat-treated at 120 ° C. for 30 minutes, cooled to room temperature, and then washed lightly with pure water to form an anti-fogging layer having a thickness of about 8 nm containing an organosilane layer containing polyethylene oxide groups in the molecule. A glass plate with a functional silica uneven film was obtained.

【0068】この低反射防曇性ガラス板について、光を
入射させて可視光反射率を測定し、また視認性を測定し
たところ、実施例1と全く同等の結果が得られた。ま
た、この防曇性シリカ凹凸膜付ガラス板について、次に
示す方法で、表面粗度測定、接触角測定、初期および繰
り返し防曇性評価を行った。これらの測定結果は表5に
示すように優れた防曇性能を有し、汚れが吸着し難く、
良好な防曇維持性および防汚性能を有することがわかっ
た。
The low-reflection anti-fog glass plate was irradiated with light, the visible light reflectance was measured, and the visibility was measured. The result was exactly the same as that of Example 1. Further, the glass plate with the antifogging silica uneven film was subjected to surface roughness measurement, contact angle measurement, and initial and repeated antifogging evaluation by the following methods. These measurement results have excellent anti-fog performance as shown in Table 5, and dirt is hardly adsorbed.
It was found to have good antifogging maintenance and antifouling performance.

【0069】[0069]

【表5】 ================================== 表面粗度 初 期 繰り返し防曇性 (nm) −−−−−−−−−− −−−−−−− サンプル −−−−−− 接触角 曇り 歪み 曇り 歪み Ra Sm (度) 評価 評価 評価 評価 −−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−− 実施例4 6 20 3 ◎ ◎ 4 5 ==================================[Table 5] ================================= Surface Roughness Initial Repetition Antifogging (nm) −−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−− −−−−−−−−−−−−−−−−−−−−−−−−−−− Example 4 6 20 3 ◎ ◎ 4 5 ================= =================

【0070】表面粗度、接触角測定 上記オルガノシラン被覆シリカ凹凸膜が形成されたガラ
ス板について、算術平均粗さ(Ra)、および凹凸の平
均間隔(Sm)を、実施例1のシリカ凹凸膜についての
測定と同じ方法で求めた。また、0.4mgの水滴に対
する接触角を、接触角計(協和界面科学株式会社製「C
A−DT」)を用いて測定した。接触角の値が小さいほ
ど防曇性が優れていることを示す。
Measurement of Surface Roughness and Contact Angle Regarding the glass plate on which the above-mentioned organosilane-coated silica concavo-convex film was formed, the arithmetic average roughness (Ra) and the average interval of concavo-convex (Sm) were determined using the silica concavo-convex film of Example 1. Was determined in the same manner as in the measurement. Further, the contact angle with respect to a 0.4 mg water drop was measured using a contact angle meter (“C” manufactured by Kyowa Interface Science Co., Ltd.).
A-DT "). The smaller the value of the contact angle, the better the antifogging property.

【0071】防曇性評価 上記防曇性シリカ凹凸膜が形成されたガラス板を、温度
5℃、相対湿度10%の恒温恒湿槽内に置き10分間静
置した後、温度25℃、相対湿度70%の恒温恒湿槽内
に移し、30秒経過したときから2分経過するまでの間
の曇りの程度と2分経過後の透視像の歪みの程度の両方
で観察して、ガラス板の表面の微小水滴付着状態を調
べ、表6に示す4段階評価を行った。
Evaluation of anti-fogging property The glass plate on which the anti-fogging silica uneven film was formed was placed in a thermo-hygrostat at a temperature of 5 ° C. and a relative humidity of 10%, and allowed to stand for 10 minutes. The glass plate was transferred into a constant temperature / humidity chamber of 70% humidity, and observed with both the degree of cloudiness from the lapse of 30 seconds to the lapse of 2 minutes and the degree of distortion of the perspective image after the lapse of 2 minutes. The state of adhesion of water droplets on the surface of was evaluated, and a four-step evaluation shown in Table 6 was performed.

【0072】[0072]

【表6】 [Table 6]

【0073】繰返し防曇性評価 JIS S 4030−1995「眼鏡用くもり止め剤
試験方法」に記載の冷却装置(透明プラスチック製)に
上記サンプル板を設置し、サンプル裏面を冷却水に接触
させサンプル温度を20℃に保った。サンプルをこの状
態で冷却したまま、温度45℃、相対湿度80%RHの
恒温恒湿槽内に置き、3分間保った。その後、サンプル
を冷却装置に着けたまま、これを温度20℃、相対湿度
10%RHの恒温恒湿槽内に置き、3分間乾燥させた。
この高湿度雰囲気暴露と低湿度雰囲気暴露の操作を1サ
イクルとし、30サイクルの繰返しを行った。
Repeated evaluation of anti-fog property The above-mentioned sample plate was placed in a cooling device (made of transparent plastic) described in JIS S 4030-1995 “Testing method for anti-fog agent for spectacles”. Was kept at 20 ° C. While cooling the sample in this state, it was placed in a thermo-hygrostat at a temperature of 45 ° C. and a relative humidity of 80% RH, and kept for 3 minutes. Thereafter, the sample was placed in a thermo-hygrostat at a temperature of 20 ° C. and a relative humidity of 10% RH while being attached to the cooling device, and dried for 3 minutes.
The operation of exposure to the high humidity atmosphere and the exposure to the low humidity atmosphere were defined as one cycle, and 30 cycles were repeated.

【0074】この繰返し操作の後、プラスチック板上に
印刷した透視歪み判定用テストチャートを上記冷却装置
の裏面に貼り付け、板と冷却装置裏面の隙間に水をしみ
込ませ、サンプル側から透視歪み判定用テストチャート
が観察できるようにした。透視歪み判定用テストチャー
トは、JIS S 4030−1995の付図1記載の
テストチャートを模したものであり、3本の白線の長さ
は10mmとし、その線幅と間隔は、0.15mm、
0.5mm、1.0mm、1.5mm、2.0mmの5
段階とした。サンプルを取り付けている冷却装置の冷却
水温度を5℃に下げ、これを温度25℃、相対湿度80
%RHの恒温恒湿槽内に置き、曇りと透視歪みの発生状
態を、上記透視歪み判定用テストチャートを用いて調
べ、表7に示した基準で6段階評価を行った。
After this repetitive operation, a test chart for judging the perspective distortion printed on the plastic plate was attached to the back surface of the cooling device, water was soaked in a gap between the plate and the back surface of the cooling device, and the perspective distortion judgment was performed from the sample side. Test chart was made available for observation. The test chart for perspective distortion determination is similar to the test chart shown in FIG. 1 of JIS S 4030-1995. The length of three white lines is 10 mm, the line width and the interval are 0.15 mm,
0.5mm, 1.0mm, 1.5mm, 2.0mm 5
It was a stage. The cooling water temperature of the cooling device to which the sample is attached is reduced to 5 ° C., and the temperature is 25 ° C. and the relative humidity is 80 ° C.
% RH was placed in a constant-temperature and constant-humidity bath, and the occurrence of fogging and perspective distortion was examined using the test chart for determining perspective distortion, and a six-step evaluation was performed based on the criteria shown in Table 7.

【0075】[0075]

【表7】 =================================== 曇り評価 曇り状態 −−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−− 5 ほぼ全面が曇らない 4 80%以上の面積が曇らない 3 60%以上の面積が曇らない 2 60%以上の面積が曇る 1 80%以上の面積が曇る 0 ほぼ全面が曇る =================================== 透視歪み評価 透視歪み状態 −−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−− 5 全く歪まない 4 0.15mm間隔の白線を分離して認め難い 3 0.5mm以下の間隔の白線を分離して認め難い 2 1.0mm以下の間隔の白線を分離して認め難い 1 1.5mm以下の間隔の白線を分離して認め難い 0 2.0mm以下の間隔の白線を分離して認め難い ===================================Table 7 ================================== Haze Evaluation Haze State------- -------------------------------------------------5 No fogging 2 60% or more of the area is fogged 1 80% or more of the area is fogged 0 Almost the entire area is fogged =========================== ======== Perspective Distortion Evaluation Perspective Distortion State −−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−− 5 No distortion 4 It is difficult to recognize white lines at intervals of 0.15 mm 3 It is difficult to recognize white lines at intervals of 0.5 mm or less 2 It is difficult to recognize white lines at intervals of 1.0 mm or less 1 1.5 mm White lines at the following intervals Separated and difficult to recognize white lines at intervals of 2.0 mm or less ===================================== ====

【0076】[実施例5]実施例2で得られた厚み12
0nmのシリカ凹凸膜が、各表面に形成された自動車ウ
ィンドシールド用ガラス板2枚を、その間に厚みが約
0.5mmのポリビニルブチラール膜を挟んで、オート
クレーブ中で約140〜150℃で真空圧着して合わせ
ガラス板を得た。この合わせガラス板の車内側表面に、
実施例4で用いたオルガノシラン塗布液に、粘性調整剤
を適量添加した液を用いてグラビアコーティングした
後、120℃で30分間乾燥・熱処理し、室温まで冷や
した後純水で軽く洗浄して、ポリエチレンオキシド基を
分子内に含む、厚みが約8nmのオルガノシラン防曇層
を内側に被覆した。
Example 5 Thickness 12 obtained in Example 2
Two glass plates for automobile windshield, each having a 0 nm silica uneven film formed on each surface, are vacuum-pressed at about 140 to 150 ° C. in an autoclave with a polyvinyl butyral film having a thickness of about 0.5 mm interposed therebetween. To obtain a laminated glass plate. On the inside surface of this laminated glass plate,
The organosilane coating solution used in Example 4 was gravure coated with a solution obtained by adding an appropriate amount of a viscosity modifier, dried and heat-treated at 120 ° C. for 30 minutes, cooled to room temperature, and then lightly washed with pure water. An anti-fog organosilane layer having a thickness of about 8 nm containing polyethylene oxide groups in the molecule was coated on the inside.

【0077】次にこのガラス板の車外側表面に、実施例
3で調製した撥水膜形成用組成物1.0mlを付着させ
た綿布で10回塗りのばし、乾布で余剰の塗布液を拭き
取った後、100℃で10分間熱処理して車外側表面に
低反射撥水性を付与した。
Then, the glass plate was coated 10 times with a cotton cloth to which 1.0 ml of the water-repellent film forming composition prepared in Example 3 was adhered, and the excess coating solution was wiped off with a dry cloth. Thereafter, heat treatment was performed at 100 ° C. for 10 minutes to impart low reflection water repellency to the outer surface of the vehicle.

【0078】これにより、車外側からみて、撥水性被膜
−シリカ凹凸膜−ガラス板−シリカ凹凸膜−ポリビニル
ブチラール膜−シリカ凹凸膜−ガラス板−シリカ凹凸膜
−防曇膜の順に積層された自動車ウィンドシールド用ガ
ラス板が得られた。
As a result, when viewed from the outside of the vehicle, an automobile in which a water-repellent coating, a silica uneven film, a glass plate, a silica uneven film, a polyvinyl butyral film, a silica uneven film, a glass plate, a silica uneven film, and an anti-fog film are laminated in this order. A glass sheet for windshield was obtained.

【0079】このガラス板の車内側表面の防曇性能、お
よび車外側表面の撥水性能を測定したところ、実施例4
の測定結果と同等の良好な防曇性能、および実施例3の
測定結果と同等の良好な撥水性能を有することがわかっ
た。そしてこのガラス板について、その防曇膜面から光
を入射させて可視光反射率を測定し、また撥水膜面を車
外側にして視認性を測定したところ、可視光反射率およ
び視認性のいずれも実施例1と全く同等の結果が得られ
た。
The anti-fogging performance of the inside surface of the glass plate and the water repellency of the outside surface of the vehicle were measured.
It was found to have the same good anti-fog performance as the measurement result of, and the same good water repellency as the measurement result of Example 3. Then, for this glass plate, the visible light reflectance was measured by irradiating light from the anti-fog film surface, and the visibility was measured with the water-repellent film surface outside the vehicle. In each case, the same results as in Example 1 were obtained.

【0080】なお上記ポリビニルブチラール膜の屈折率
はガラス板のそれにほぼ等しいので、ガラス板の内側の
シリカ凹凸膜(ポリビニルブチラール膜に接してしてい
る側の)は、設けても設けていなくても反射防止性能は
殆ど変わらなかった。
Since the refractive index of the polyvinyl butyral film is almost equal to that of the glass plate, the silica uneven film (on the side in contact with the polyvinyl butyral film) inside the glass plate is provided or not provided. However, the antireflection performance was almost unchanged.

【0081】[実施例6,7]実施例1におけるコーテ
ィング液の調製に用いたエチルシリケートの加水分解縮
重合液、鎖状シリカコロイド(商品名:スノーテックス
OUP)、および2−プロパノールの配合比を表8に示
すように変更した以外は実施例1と同様にしてコーティ
ング液を調製した。このコーティング液中には、鎖状シ
リカ微粒子およびエチルシリケートが、それぞれシリカ
換算で、表8に示す重量比で含有されていた。
[Examples 6 and 7] Blending ratio of hydrolyzed polycondensation solution of ethyl silicate, chain silica colloid (trade name: Snowtex OUP) and 2-propanol used in preparation of coating solution in Example 1 Was changed as shown in Table 8, and a coating liquid was prepared in the same manner as in Example 1. The coating liquid contained chain silica fine particles and ethyl silicate in a weight ratio shown in Table 8 in terms of silica.

【0082】次にこのコーティング液を用いて、実施例
1と同じガラス板に、実施例1と同じ条件で塗布、乾
燥、熱処理して、シリカ凹凸膜が両表面に形成されたガ
ラス板を得た。得られたシリカ凹凸膜の厚み、膜の屈折
率、膜空隙率および膜表面粗度、ならびにシリカ凹凸膜
付きガラス板の可視光反射率、および視認性を実施例1
と同様に測定した結果を表9に示す。
Next, using this coating solution, the same glass plate as in Example 1 was applied, dried and heat-treated under the same conditions as in Example 1 to obtain a glass plate having a silica uneven film formed on both surfaces. Was. Example 1 The thickness of the obtained silica concavo-convex film, the refractive index of the film, the film porosity and the film surface roughness, and the visible light reflectance and visibility of the glass plate provided with the silica concavo-convex film were measured in Example 1.
Table 9 shows the results of the measurement in the same manner as described above.

【0083】[0083]

【表8】 ================================== エチルシリケートの 加水分解 鎖状シリカ 2-フ゜ロ 縮重合液 コロイト゛ ハ゜ノール 鎖状微粒子:エチルシリケート (重量部) (重量部) (重量部) (シリカ換算重量比) −−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−− 実施例1 3.0 13.3 74.9 100:15 実施例6 1.4 13.3 74.9 100:7 実施例7 5.0 13.3 74.9 100:25 ==================================[Table 8] ================================= Hydrolysis of Ethyl Silicate Linear Silica 2-Fluorocondensation Polymerization solution Koroit® Phenol Chain-shaped fine particles: ethyl silicate (parts by weight) (parts by weight) (parts by weight) (weight ratio in terms of silica) −−−−−−−−−−−−−−−−−−−−−−− −−−−−−−−−−−−− Example 1 3.0 13.3 74.9 100: 15 Example 6 1.4 13.3 74.9 100: 7 Example 7 5.0 13.3 74.9 100: 25 =========== =======================

【0084】[0084]

【表9】 =================================== 屈 表面粗度 可視光反射率(%) 視 膜厚 折 空隙率 (nm) −−−−−−−− 認 (nm) 率 (体積%) −−−−− 入射角 入射角 性 Ra Sm 12度 60度 −−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−− 実施例6 115 1.28 70 10 22 0.7 1.9 5 実施例7 160 1.38 55 7 20 2.2 3.2 5 ==================================[Table 9] =================================== Surface roughness Visible light reflectance (%) Visual film thickness Folded porosity (nm) −−−−−−−− Recognition (nm) Percentage (vol%) −−−−− Incident angle Incident angle Ra Sm 12 ° 60 ° −−−−−−−− −−−−−−−−−−−−−−−−−−−−−−−−−−− Example 6 115 1.28 70 10 22 0.7 1.95 Example 7 160 1.38 55 7 20 2.2 3.25 == ===============================

【0085】[0085]

【発明の効果】本発明によれば、ガラス板に表面凹凸と
低屈折率を有する層が被覆されているので、ガラス板の
可視光反射率、特に60度の高入射角での可視光反射率
(ガラス板の両面に被覆した場合)は4.0%以下と小
さくなり、しかも表面凹凸により防眩効果が得られるの
で、優れた視認性を有する自動車用窓に適したガラス板
が得られる。
According to the present invention, since the glass plate is coated with a layer having surface irregularities and a low refractive index, the visible light reflectance of the glass plate, particularly, the visible light reflection at a high incident angle of 60 degrees. The ratio (when coated on both surfaces of the glass plate) is as low as 4.0% or less, and the anti-glare effect is obtained by the surface unevenness, so that a glass plate suitable for automotive windows having excellent visibility can be obtained. .

Claims (13)

【特許請求の範囲】[Claims] 【請求項1】 鎖状シリカ微粒子およびその鎖状シリカ
微粒子の重量に対して5〜30重量%のシリカからな
り、110〜250nmの厚みを有する膜がガラス基板
表面の少なくとも一方に被覆されており、その膜表面に
凹凸が形成されている、可視光反射防止ガラス板。
At least one surface of a glass substrate is coated with a chain silica fine particle and a film having a thickness of 110 to 250 nm, which is composed of 5 to 30% by weight of silica based on the weight of the chain silica fine particle. A visible light anti-reflection glass plate having irregularities formed on the surface of the film.
【請求項2】 鎖状シリカ微粒子およびシリカからな
り、110〜250nmの厚みを有する膜がガラス基板
表面の少なくとも一方に被覆されており、膜内で互いに
隣接する鎖状シリカ微粒子の間に空隙が生じていてその
膜が1.25〜1.40の屈折率を有しており、その膜
表面に凹凸が形成されている、反射防止ガラス板。
2. A film made of chain silica fine particles and silica and having a thickness of 110 to 250 nm is coated on at least one of the glass substrate surfaces, and voids are formed between adjacent chain silica fine particles in the film. An anti-reflective glass plate which is formed and has a film having a refractive index of 1.25 to 1.40, and having irregularities formed on the film surface.
【請求項3】 前記鎖状シリカ微粒子は、10〜20n
mの平均直径と60〜200nmの平均長さを有する請
求項1または2記載の反射防止ガラス板。
3. The chain silica fine particles have a particle size of 10 to 20 n.
3. The anti-reflective glass plate according to claim 1, having an average diameter of m and an average length of 60 to 200 nm.
【請求項4】 前記膜表面の凹凸は、5〜50nmの算
術平均粗さ(Ra)および10〜300nmの凹凸の平
均間隔(Sm)を有する請求項1〜3のいずれか1項に
記載の反射防止ガラス板。
4. The film according to claim 1, wherein the unevenness on the film surface has an arithmetic average roughness (Ra) of 5 to 50 nm and an average interval (Sm) of the unevenness of 10 to 300 nm. Anti-reflective glass plate.
【請求項5】 前記膜の表面および/または前記膜が被
覆されていない前記ガラス基板の表面に、更に撥水性被
膜が被覆されている請求項1〜4のいずれか1項に記載
の反射防止ガラス板。
5. The antireflection method according to claim 1, wherein a water-repellent film is further coated on the surface of the film and / or the surface of the glass substrate not coated with the film. Glass plate.
【請求項6】 前記膜の表面および/または前記膜が被
覆されていない前記ガラス基板の表面に、更に防曇性被
膜が被覆されている請求項1〜4のいずれか1項に記載
の反射防止ガラス板。
6. The reflection according to claim 1, wherein a surface of the film and / or a surface of the glass substrate on which the film is not coated are further coated with an antifogging film. Prevention glass plate.
【請求項7】 前記ガラス基板の両方の表面に前記膜が
被覆され、一方の前記膜表面に防曇性被膜が被覆され、
他方の前記膜表面に撥水性被膜が被覆されている請求項
1〜4のいずれか1項に記載の反射防止ガラス板。
7. Both surfaces of the glass substrate are coated with the film, and one surface of the glass substrate is coated with an anti-fog coating,
The anti-reflection glass plate according to any one of claims 1 to 4, wherein a water-repellent film is coated on the other film surface.
【請求項8】 前記ガラス基板の一方表面のみに前記膜
が被覆され、前記膜の表面に防曇性被膜が被覆され、前
記ガラス基板の他方表面に撥水性被膜が被覆されている
請求項1〜4のいずれか1項に記載の反射防止ガラス
板。
8. The glass substrate, wherein only one surface of the glass substrate is coated with the film, the surface of the film is coated with an anti-fogging film, and the other surface of the glass substrate is coated with a water repellent film. 5. The anti-reflection glass plate according to any one of items 4 to 4.
【請求項9】(1)鎖状シリカ微粒子と、(2)加水分
解・縮重合可能な有機珪素化合物、クロロシリル基含有
珪素化合物およびそれらの加水分解物からなる群より選
ばれた少なくとも1種の珪素化合物、を含む液を、ガラ
ス基板表面に塗布・乾燥して、ガラス基板表面にシリカ
凹凸膜を形成することを特徴とする反射防止ガラス板の
製造方法。
9. At least one member selected from the group consisting of (1) chain silica fine particles, and (2) a hydrolyzable / polycondensable organic silicon compound, a chlorosilyl group-containing silicon compound, and a hydrolyzate thereof. A method for producing an antireflection glass plate, comprising applying a liquid containing a silicon compound to a surface of a glass substrate and drying the liquid to form an uneven silica film on the surface of the glass substrate.
【請求項10】 前記液は、前記鎖状シリカ微粒子と前
記珪素化合物とを、それぞれSiO2 換算で、前記鎖状
シリカ微粒子100重量部に対して前記珪素化合物を5
〜30重量部含有する請求項9に記載の反射防止ガラス
板の製造方法。
10. The liquid contains the chain silica fine particles and the silicon compound in an amount of 5 parts by weight based on 100 parts by weight of the chain silica fine particles in terms of SiO 2.
The method for producing an anti-reflection glass plate according to claim 9, wherein the content of the anti-reflection glass plate is from 30 to 30 parts by weight.
【請求項11】 前記液は下記の配合からなる請求項9
または10に記載の反射防止ガラス板の製造方法。 珪素化合物 100重量部 鎖状シリカ微粒子 100〜800重量部 水 4〜150重量部 酸触媒 0.00001〜5重量部 分散助剤 0.001〜10重量部 溶媒 500〜10000重量部
11. The liquid according to claim 9, wherein the liquid has the following composition.
Or the method for producing an antireflection glass plate according to item 10. Silicon compound 100 parts by weight Chain silica fine particles 100-800 parts by weight Water 4-150 parts by weight Acid catalyst 0.00001-5 parts by weight Dispersing aid 0.001-10 parts by weight Solvent 500-10000 parts by weight
【請求項12】 前記塗布・乾燥後に、400〜750
℃で5秒〜5時間加熱する請求項9〜12のいずれか1
項に記載の反射防止ガラス板の製造方法。
12. After the coating and drying, 400 to 750
13. Heating at 5 [deg.] C. for 5 seconds to 5 hours.
13. The method for producing an antireflection glass plate according to the above item.
【請求項13】 下記の配合からなる反射防止膜用被覆
組成物。 珪素化合物 100重量部 鎖状シリカ微粒子 100〜800重量部 水 4〜150重量部 酸触媒 0.00001〜5重量部 分散助剤 0.001〜10重量部 溶媒 500〜10000重量部
13. A coating composition for an antireflection film having the following composition. Silicon compound 100 parts by weight Chain silica fine particles 100-800 parts by weight Water 4-150 parts by weight Acid catalyst 0.00001-5 parts by weight Dispersing aid 0.001-10 parts by weight Solvent 500-10000 parts by weight
JP10345273A 1997-12-09 1998-12-04 Antireflection glass sheet, its production and coating composition for antireflection film Pending JPH11292568A (en)

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JP9-338363 1997-12-09
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