JPH11344500A - Scanning probe microscope - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide the subject microscope suitable for measuring the sidewall of a sample. SOLUTION: A probe tip holding mechanism 550 has a probe tip holding part receiver 552 fixed to a fine adjustment stage mechanism for the Z-direction, a probe tip holding part 558 equipped with a probe tip applying stand is attached to this stage, and a usual probe chip 580 is provided so that the support part 582 thereof is attached to the bottom surface of the probe tip applying stand. A goose tip 590 is provided so that the support part 592 thereof is attached to the side surface of the probe tip attaching stand, and the probe tip holding part 558 is equipped with the piezoelectric element 560 for exciting the goose tip 590 attached to the probe tip applying part. A mirror holding mechanism 610 is provided with respect to the usual probe tip 580, and the mirror holding mechanism 640 is provided to the terminal member 520 of a piezoelectric actuator 510 with respect to the goose tip 590.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a scanning probe microscope (SPM) suitable for measuring a step of an IC semiconductor, for example, a roughness or an inclination angle of a side wall of an electrode line pattern.

[0002]

2. Description of the Related Art A scanning probe microscope scans in the XY or XYZ directions while detecting the interaction between a probe or a probe when the probe or probe is brought close to the surface of the sample to 1 μm or less. It is a device that performs two-dimensional mapping of action, such as a scanning tunneling microscope (STM), an atomic force microscope (AFM), a magnetic force microscope (MFM), and a scanning near-field light microscope (SNOM).
It is a generic term such as. Among them, the AFM is most widely used among SPMs as a device for obtaining information on unevenness of a sample surface. The AFM detects indirectly the unevenness of the sample surface by detecting the displacement of the cantilever caused by the force acting on the probe when the probe (protrusion) formed at the tip of the cantilever approaches the sample surface, using an optical sensor or the like. Have gained.

[0003] The probe used in the AFM is manufactured using a semiconductor process which is a batch fabrication technique because of its performance and cost advantages. For example, "Europhys. Lett. 2 (1987) p.1281 (T. Albrech
t et al) "reports on a so-called flat lever made by patterning a silicon oxide thin film.
Further, Japanese Patent Application Laid-Open No. 1-262403 proposes a so-called bird's beak type probe which is developed from this.
Further, a silicon nitride probe tip having a pyramid-shaped probe described in U.S. Pat. No. 5,399,232 and a silicon probe tip described in U.S. Pat. No. 5,051,379 have already been commercialized and have been marketed. Available. The probe of such a probe tip uses a point-terminated (one-point termination) projection at the tip of the probe as a substantial probe, but when the entire probe is viewed, the probe apex angle becomes It stays between 15 and 90 degrees.

The design rule of a semiconductor IC is 256 MB.
A prototype device having a storage capacity of 0.25 μm is manufactured with a device having a storage capacity of, and a 0.15 μm rule is being applied to a 1 GB device. Along with this, a device for inspecting the shape of a device is required to accurately measure a line width of a narrow device having a large aspect ratio and further, an entire shape. As a scanning probe microscope can be applied to such shape measurement,
Research is being actively pursued.

[0005] Yves Martin and H. Kumar Wickramasinghe
Is "Apply. Phys. Lett. Vol.64 No.19 (1994) PP.2489
-2500 ”proposes a new scanning probe microscope for imaging vertical walls. A patent related to this is Japanese Patent No. 2501282. In this scanning probe microscope, the vertical wall of the sample can be measured by using a boot-type probe (a cylindrical probe whose body near the tip is narrowed). Such a probe differs from the above-mentioned point-terminated probe in that different points of the flared portion at the tip cause interaction with the side walls on both sides of the concave portion. In other words, the boot-type probe has a substantial probe at at least two or more locations at the distal end thereof, so that the vertical angle of the probe is substantially 0 ° or less.

The boot type probe has a diameter of 2 μm to 2.5 μm.
It consists of a part (thick part) on the cantilever side with a diameter and a thin part connected to the tip, and the thin part is shaped like a boot. The size of the boot-shaped part is the length (height)
2.8 μm, tip of tip is 36 at flare (tip)
The diameter is 0 nm, and the constricted portion closer to the cantilever has a diameter of 210 nm.

When measuring the side wall of a trench or hole of a semiconductor using this probe tip, the flare portion at the tip of the probe is protruding, so that the portion comes closest to the sample surface (side wall). Therefore, by scanning the probe while keeping the distance between such a protruding portion of the probe and the sample surface constant, it is possible to measure the surface roughness and the inclination angle of the side wall.

Japanese Unexamined Patent Publication No. 3-104136 discloses a method for manufacturing such a boot-type probe, and the probe is manufactured by photolithography using a single-crystal silicon wafer as a start wafer. After forming a circular mask having a diameter of about 1 μm or less, the silicon wafer is dry-etched with CF4 gas to dig down the silicon wafer almost vertically, thereby forming a substantially cylindrical silicon probe portion. When the dry etching conditions are changed, the center of the substantially cylindrical probe portion expands or narrows. By selecting these conditions, a substantially cylindrical probe made of single-crystal silicon with a narrow middle portion of the cylindrical portion is obtained. Thereafter, the probe is protected by a resist or the like, and the cantilever is patterned and etched from the back surface of the wafer to obtain a probe tip having a boot-type probe.

On the other hand, the probe of the AFM probe tip is
The tip of the probe may be worn or broken due to contact with the sample surface during measurement (scanning), and the probe material needs to be paid attention to when performing a stable AFM measurement. For example, Matsuyama et al. Reported at the 55th Annual Meeting of the Japan Society of Applied Physics (Preliminary Collection, p.473) on the wear of probe materials. Single crystal silicon and silicon nitride are often used as a probe material, but when compared, silicon nitride films are less likely to wear than single crystal silicon. Report that the silicon nitride film having a stoichiometry of 3 to 4 is more difficult to wear.

[0010]

The root portion of the side wall of a sample having a high aspect ratio is not limited to a scanning probe microscope for imaging a vertical wall by Yves Martin et al. In order to measure as accurately as possible, a probe having a small apex angle and a high aspect ratio is required.

Apply. Phys. Lett. Vol. 64 No. 19 (1994)
The scanning probe microscopy of Yves Martin et al. For imaging vertical walls, described in PP.2498-2500, is an application of non-contact mode AFM, but occasionally uses a probe during measurements in air. May come into contact with the sample surface. In other words, although the non-contact mode AFM measurement method is applied, since the bandwidth of the feedback circuit of the apparatus is finite, the probe is completely in contact with a sample having large irregularities or a sample having a step-shaped step portion. It is difficult to measure without having to do it. In this regard, for example, the author of the paper, Eve Martin et al.
No. 194154 proposes a method of measuring the side wall of a sample having a similar step by applying the contact mode AFM method performed while exciting the probe, and the fact that Virgil B. Elings et al. 7-27
No. 0434 proposes a microscope capable of measuring the side wall by applying the contact mode AFM method also performed while exciting the probe, and therefore, the measurement of the vertical wall by the complete non-contact mode AFM measurement method. The difficulty is presumed.

When the probe comes into contact with the sample, the probe is worn or broken, and the shape of the probe changes during the measurement. Yv
es Martin et al.'s scanning probe microscopy for imaging vertical walls is used, for example, to measure the shape of the electrode pattern of a semiconductor IC according to the submicron pattern rule, as described above. Even a change in the shape worn by several tens of nanometers changes the measurement result by 10% or more. Therefore, a change in the shape of the probe due to wear or the like is a very serious problem. In general, measuring instruments need to have high reproducibility, but Yves Martin
When considering a scanning probe microscope for imaging these vertical walls, it is very problematic that the reproducibility of the measurement data is lost due to wear of the probe.

To obtain the reproducibility of data, it is conceivable to frequently calibrate the probe shape. However, performing the operation for calibration many times before measuring the measurement sample is a problem in terms of the throughput required for the measuring instrument. This is because the number of samples that can be measured per unit time for the calibration work decreases. Also, if a calibration method that measures the sample for calibration using the same method as the measurement is used for the calibration, the probe may be worn out during the calibration work and may change its shape, Performing calibration work is also problematic.

The tip of a boot-type probe used in a scanning probe microscope for imaging a vertical wall by Yves Martin et al. Has a flare portion protruding, and at least two or more substantial probes are provided. Although present, it is difficult to identify which location of the flare portion is interacting with the sample.

Further, the probe used in the scanning probe microscopy for imaging a vertical wall described in the paper by Yves Martin et al. Is made of single-crystal silicon as described in JP-A-3-104136. It is manufactured by etching. As mentioned above, silicon is a material that easily wears,
Wear is also a major problem in terms of probe material.

Apply Phys. Lett. Vol. 64 No. 19 (1994)
Dry etching is used to manufacture a single-crystal silicon boot-shaped probe as described in PP.2498-2500 or JP-A-3-104136. When dry etching is used to perform patterning, there is a problem that the shape of the probe changes due to a slight shift in manufacturing conditions.

In order to measure a measurement sample on the order of submicrons, it is necessary to use a finer probe, but it is extremely difficult to produce such a probe with good uniformity. Not only between wafers, but also within a single wafer, variations in shape occur depending on the location. This is easy considering the fact that we are trying to produce a thinner probe using a device equivalent to a dry etching device for producing semiconductor ICs with a pattern rule on the order of submicrons. Can understand.

This variation in the shape (dimensions) of the probe ultimately leads to an increase in cost in producing the probe, which is a serious problem. In other words, in order to measure a very fine uneven portion of the measurement sample, it is necessary to carefully inspect whether or not the probe is finished at least in a dimension smaller than the design dimension at the time of shipping, which increases the inspection cost. . Needless to say, variations in the shape of the probe lead to a considerable decrease in yield, which further increases the cost.

In view of such circumstances, the present applicant has proposed a probe tip suitable for measuring a vertical wall in Japanese Patent Application No. 9-152242. This probe tip has a flat probe at the tip of a cantilever extending from the support. The surface normal of the probe and the surface normal of the support are almost parallel, Has a structural feature that the surface normal of the support and the surface normal of the support portion are non-parallel.

The probe tip having such a structural feature has a conical probe at the tip of a cantilever extending from the support, and the axis of the probe and the surface normal of the cantilever. It can be said that it has a better shape than a normal probe tip in which the surface normal of the support and the support are almost parallel.

An object of the present invention is, in a broad sense, to provide a scanning probe microscope suitable for measuring a vertical wall,
In a narrow sense, it is an object of the present invention to provide a scanning probe microscope provided with a probe tip holding mechanism for suitably holding a probe tip proposed in Japanese Patent Application No. 9-152242.

Another object of the present invention is to provide a probe tip holding mechanism for suitably holding both a normal probe tip and a probe tip proposed by the present applicant in Japanese Patent Application No. 9-152242. An object of the present invention is to provide a scanning probe microscope.

In other words, the tip of the cantilever extending from the support portion has a cone-shaped probe portion, and the axis of the probe portion, the surface normal of the cantilever, and the surface normal of the support portion are substantially equal. It has a parallel probe tip and a flat probe at the end of a cantilever beam extending from the support, and the surface normal of the probe and the surface normal of the support are almost parallel. Another object of the present invention is to provide a scanning probe microscope provided with a probe tip holding mechanism that suitably holds both a cantilever surface normal and a probe tip whose support normal is non-parallel.

[0024]

A scanning probe microscope according to the present invention has a flat probe portion provided at the tip of a cantilever-shaped elastic member portion supported by a support portion. A probe tip holding mechanism capable of attaching a probe tip, which is a point of action with a measurement sample, at two terminal points at the tip of the needle portion.

Preferably, in this probe tip, the surface normal of the probe portion and the surface normal of the support portion are substantially parallel. Preferably, the probe tip holding mechanism can also attach another probe tip having a different shape from the above-described probe tip.

[0026]

Embodiments of the present invention will be described below with reference to the drawings. Probe tip 1 used for scanning probe microscope according to first embodiment of the present invention
00 will be described.

As shown in FIGS. 1A and 1B, a cantilever (elastic member) 102 made of an elastic body extends from the support 101, and a probe 103 at its free end.
Are formed. As shown in FIG. 1C, the probe 103 has a flat plate triangular shape, and three ridges terminate at two apexes 104 and 105 at the tip. The direction of the surface normal of the probe portion 103 having the shape of a triangular plate is substantially parallel to the ridge line connecting the two points 104 and 105 at the tip. The two terminal points (protrusions) 104 and 105 at the tip of the probe 103 mainly act as a substantial probe capable of specifying the position on the sample, and interact with the surface of the sample, particularly the surface of the side wall thereof. Produces an effect. That is, at the tip of the probe unit 103, there are two action points at which the position on the sample can be specified. Further, depending on the sample, a point on the ridgeline connecting the terminal points 104 and 105 may be an action point. For example, there is a case where the sample surface and a point on the ridge line approach the end points 104 and 105 or more. However, when measuring the side wall portion of the sample, the point on the ridge line does not become an action point, and the two end points 10
Either 4 or 105 acts as an action point. In this regard, the probe tip is compatible with Europhys. Lett. 2 (198
7) The probe tip is different from the probe tip described in p.1281 and JP-A-1-262403.

Further, the surface normal direction of the cantilever-shaped elastic member portion 102 is not parallel to the surface normal direction of the flat plate-shaped probe portion 103, and therefore, the cantilever beam 102 has a bent shape. ing. In this respect, this probe tip differs from the probe tip described in Europhys. Lett. 2 (1987) p.1281.

Typical dimensions of the manufactured embodiment are as follows: the length of the strip-shaped cantilever 102 is 70 μm, the width is 40 μm, the thickness is 0.6 μm, and the height of the probe portion 103 is 15 μm.

FIG. 2 shows another probe tip used in the scanning probe microscope of the present embodiment. FIG.
As shown in FIG. 3, the probe tip 400
1 is the same as the probe tip 100 shown in FIG. 1 except that the probe section 403 is designed to optimize mechanical properties such as a spring constant and a resonance frequency of the elastic section 402. The thickness of the elastic member 402 differs from that of the probe tip 100 of FIG.

In the probe tip 400, the probe 403
The probe part 403 has a thickness of 0.6 μm as in the case of the probe tip 100 of FIG.
The thickness of the elastic member 402 is 2 μm in order to increase the resonance frequency of the elastic member 402.

Each of the probe tips 100 and 400 is used while being held so that the surface normal direction of the measurement sample and the surface normal direction of the probe portion are substantially perpendicular to each other during measurement (for example, as described later). (See FIG. 9D). It can be said that the probe apex angle at this time has a probe portion having a very small aspect ratio of substantially zero degrees and a high aspect ratio.

Further, the material constituting the probe portion is higher in hardness than single crystal silicon, for example, a silicon nitride film, a silicon carbide film or amorphous carbon. Changes are kept low.

The above-described probe tips 100 and 400
Since its overall shape looks like a bird floating on the water surface (see FIG. 3 (e) described later), it is referred to as a goose chip in this specification.

A method of manufacturing the probe chip 100 will be described with reference to FIGS. 3 (a) to 3 (e). First, a single crystal silicon wafer 301 having a plane orientation (100) is prepared as a start wafer (FIG. 3A).

After a silicon oxide film 302 is formed on this surface, the silicon oxide film 30 is formed by photolithography.
2 is partially removed to form a square opening so that the surface of the single crystal silicon wafer 301 is exposed. And
Using the silicon oxide film 302 formed in the portion excluding the square opening as a mask, wet anisotropic etching is performed using a potassium hydroxide aqueous solution, and the silicon wafer 301 is dug down to form a concave portion 303 (FIG. 3B).

Next, the silicon oxide film 302 is removed with hydrofluoric acid, and the silicon nitride films 304 are formed on both sides of the wafer 301 by LP-CVD (low pressure chemical vapor deposition).
And 306 are formed. Thereafter, the silicon nitride film 304 on the front side is changed to the resist film 30 by photolithography.
5 is used as a mask, and is patterned into a shape corresponding to the support portion 101, the elastic member portion 102, and the probe portion 103 (see FIG. 1). Similarly, by photolithography, the silicon nitride film 306 on the back side is also patterned into a shape corresponding to the support 101 (FIG. 3C).

The patterning of the silicon nitride film 304 on the front side may be performed twice in order to make the tip of the probe as sharp as possible. As shown in FIG.
When the silicon wafer 301 is viewed from above, first, after applying a resist, the resist is exposed using M1 as a mask,
The silicon nitride film 304 is patterned by dry etching using the resist film having the opening thus formed as a mask. After removing the resist film, the resist is applied again, the resist is exposed using M2 as a mask, and the silicon nitride film 304 is patterned by dry etching again using the resist film having an opening formed as a mask as a mask. . According to this method, the corner of the portion A can be extremely sharpened as compared with a single patterning using a triangular mask. Note that a projection aligner was used for exposing the resist.

The wafer 301 is subjected to wet anisotropic etching with a potassium hydroxide aqueous solution from the back side to obtain the probe chip 100 (FIG. 3E). Of course, as in the case of a normal AFM probe tip, a metal may be vapor-deposited on the cantilever portion 308 from the front side to apply a light-reflective coating, but in this case, a vapor-deposited member is not attached to the probe portion 309. Is preferable.

In such a probe tip, the probe 3
Since 09 is formed by film deposition, the deposition surfaces 310 and 311 of the probe portion 309 are substantially parallel, and a probe having a high aspect ratio with a probe vertex angle of substantially 0 degree is manufactured. As a result, a probe tip capable of measuring a side wall having a slope angle near 90 degrees can be obtained if the concave portion is slightly wider than the thickness of the probe portion.

Since the probe portion 309 is formed by film deposition, the variation in the film thickness can be kept within 10%, and compared with the conventional method in which silicon is dug down by dry etching to form a cylindrical probe. It is much easier to make a probe of the same shape. In addition, as a result, the inspection cost can be reduced and the yield can be improved, and a low-cost probe chip can be provided.

Further, since the probe portion 309 is made of a silicon nitride film, wear during measurement is small, and reproducibility of measurement data is improved. However, Apply.Phys. By Yves Martin et al.
Lett. Vol.64 No.19 (1994) pp.2498-2500.
When the probe is viewed from a direction parallel to the line connecting the two end points 104 and 105 of the probe portion (the direction of arrow N in FIG. 3E), the probe apex angle is as large as about 20 degrees. However, if the direction of the probe and the direction of the sample are selected as long as the electrode pattern of the semiconductor IC is parallel to the measurement target portion, for example, the direction in which the groove formed between the electrode patterns extends Since there is no contact portion of the probe portion in FIG. 1, there is no problem that the probe portion other than the terminal points 104 and 105 in FIG. 1C contacts the pattern. The pod angle can be measured.

<First Embodiment> Next, a scanning probe microscope according to a first embodiment will be described. FIG.
(A) shows a schematic configuration of an SPM head of a scanning probe microscope. Both a normal probe tip and the above-mentioned goose tip can be attached to this SPM head, but a typical probe tip 58 is typically shown in FIG.
0 is drawn. FIG. 5A shows a state where a normal probe tip 580 is attached to the SPM head, and FIG. 5B shows a goose tip 5 attached to the SPM head.
90 shows a state in which 90 is attached.

In the present specification, a normal probe tip 580 is, as shown in FIG.
The probe tip has an axis 6 and a surface normal of the cantilever 584 and a surface normal of the support portion 582 which are almost parallel to each other. Further, as shown in FIG. 5B, the goose tip 590 is such that the surface normal of the flat probe portion 596 and the surface normal of the support portion 592 are parallel to each other, and both are both cantilever 5.
Refers to a probe tip that is non-parallel to the surface normal of 94.

The measurement sample 508 is mounted on an XY stage 506 provided with an X stage 502 and a Y stage 504 capable of coarse movement adjustment in the X direction and the Y direction orthogonal to each other. Above the sample 508, an SPM mounted on a Z stage (not shown) capable of coarse adjustment in the Z direction is provided.
The head 500 is arranged. XY with coarse adjustment
The stage 506 and the Z stage are fixedly supported on a housing or a base member (not shown) on the side of the respective mounting portions. This SPM device is usually mounted on a vibration isolation mechanism to make it difficult for disturbance vibrations to be transmitted to a measurement site (near a sample).

The SPM head 500 basically has an XYZ
It includes a tripod-type piezoelectric actuator 510 for performing fine movement adjustment and scanning in a direction, a probe tip holding mechanism 550 for holding a probe tip, and a lever displacement detecting mechanism for detecting displacement of a cantilever of the probe tip 580. In addition, if necessary, the apparatus further includes a monitor mechanism for monitoring the operation (displacement amount) of the fine movement stage mechanism.

The lever displacement detecting mechanism is an optical lever type optical displacement sensor. The optical displacement sensor includes a laser 532 for emitting a measuring beam, a lens 534 for collimating the measuring beam from the laser 532, and a measuring beam. Mirror 53 that deflects light toward the cantilever of the probe tip
8, a half mirror 536 for separating the return light from the cantilever of the probe chip, and a photodetector 540 for outputting a signal corresponding to the displacement of the cantilever of the probe chip based on the received light.

Further, a quarter-wave plate is inserted between the half mirror 536 and the cantilever 584 of the probe tip 580, and a light beam is more efficiently emitted from the photodetector 5 using a polarization beam splitter instead of the half mirror 536.
It may be configured to lead to 40.

The position and orientation of the reflection mirror 538 are adjusted according to the type of the probe tip attached to the probe tip holding mechanism 550, that is, whether the probe tip is a normal probe tip or a goose tip. In this embodiment, as described later, A reflection mirror for each chip is separately prepared, and a reflection mirror corresponding to the attached chip is arranged.

Tripod type piezoelectric actuator 5
Reference numeral 10 denotes an X-direction fine movement stage mechanism 514 fixed substantially perpendicularly to the inner surface of the L-shaped fixed frame 512.
A fine movement stage mechanism 516 for the Y direction fixed substantially perpendicularly to another inner surface of the fixed frame 512, a fine movement stage mechanism 514 for the X direction, and a fine movement stage mechanism 516 for the Y direction are commonly fixed. Cube shaped end member 520
And a fine movement stage mechanism 518 for the Z direction fixed to the lower surface of the terminal member 520. The probe tip holding mechanism 550 is fixed to the lower end of the fine movement stage mechanism 518 for the Z direction.

For example, the fine movement stage mechanism 51 for the X direction
4 and the fine movement stage mechanism 516 for the Y direction and the fine movement stage mechanism 518 for the Z direction are both configured by a laminated piezoelectric element. As shown in FIGS. 5A and 5B, the probe tip holding mechanism 550 includes a fine movement stage mechanism 5 for the Z direction.
18 has a probe chip holding portion receiver 552 fixed thereto.
The probe tip holder 558 is attached by 54 and 556. The probe chip holder 558 has a probe chip holder 562 to which the probe chip chip is fixed.

The ordinary probe tip 580 is shown in FIG.
As shown in (a), the support portion 582 is attached to the bottom surface of the probe chip abutment 562. As shown in FIG. 5B, the support portion 592 of the goose chip 590 has the probe chip abutment 56.
2 attached to the side. The attachment of the probe tip 580 and the goose tip 590 to the probe tip abutment table 562 is simply performed by adhesion.

The probe tip attaching base 562 has a corresponding attaching surface (or adhesive surface) for fixing each of the ordinary probe tip 580 and the goose chip 590.

The probe tip holding section 558 includes a piezoelectric element 560 for exciting the goose tip 590 attached to the probe tip abutment 562. As described above, the position and orientation of the reflection mirror 538 are changed according to the type of the probe tip attached to the probe tip holding mechanism 550. For this reason, as shown in FIG.
A mirror holding mechanism 610 for zero and a mirror holding mechanism 640 for goose tip 590 are separately prepared, and these are selectively mounted on the terminal member 520 of the piezoelectric actuator 510 according to the type of probe tip. You.

The mirror holding mechanism 610 is a reflection mirror 612.
And the reflection mirror 612 is attached to the main body 614, and the main body 614 has a through hole 616. A positioning pin 522 is formed on the terminal member 520 of the piezoelectric actuator 510. When the mirror holding mechanism 610 is mounted on the terminal member 520 of the piezoelectric actuator 510, the positioning pin 522 is formed on the main body 614 of the mirror holding mechanism 610. It is passed through the through hole 616. The mirror holding mechanism 610 includes a lower end portion 61 having a through hole 616 formed therein.
8 and two orthogonally extending portions 620 and 622 are positioned by being applied to the three corners of the terminal member 520, thereby positioning the reflecting mirror 612 as shown in FIG. Is determined.

The reflecting mirror 612 whose position and direction are determined as described above is different from the ordinary probe tip 580 in that
It functions as the reflection mirror 538 of the lever displacement detection mechanism described above. That is, the laser 532 of the lever displacement detecting mechanism
Is reflected by the reflection mirror 612, passes through the opening 628 provided in the mirror holding mechanism 610, and irradiates the cantilever 584 of the ordinary probe tip 580. The reflected light from cantilever 584 passes through aperture 628
, The light is reflected by the reflection mirror 612 and travels to the photodetector 540 of the lever displacement detection mechanism.

Similarly, the mirror holding mechanism 640 has a reflection mirror 642, and the reflection mirror 642 is attached to the main body 644. The main body 644 has a through hole 646. When the mirror holding mechanism 640 is mounted on the terminal member 520 of the piezoelectric actuator 510, the positioning pin 522 is inserted into the through hole 64 formed in the main body 644 of the mirror holding mechanism 640.
6 is passed. The mirror holding mechanism 640 has a through hole 646.
The lower end portion 648 formed with is formed and the two extending portions 650 and 652 orthogonal to the lower end portion 648 are respectively positioned by being applied to three corners of the terminal member 520, thereby positioning the end portion 520, as shown in FIG. Then, the position and direction of the reflection mirror 642 are determined.

The reflecting mirror 642 whose position and direction are thus determined functions as the reflecting mirror 538 of the lever displacement detecting mechanism described above with respect to the goose chip 590. That is, the measurement light from the laser 532 of the lever displacement detection mechanism is reflected by the reflection mirror 642, and irradiates the cantilever 594 of the goose probe tip 590 through the opening 658 provided in the mirror holding mechanism 640.
Light reflected from the cantilever 594 passes through the opening 658, is reflected by the reflection mirror 642, and travels toward the photodetector 540 of the lever displacement detection mechanism.

As described above, in the apparatus of the present embodiment, in addition to the ordinary probe tip 580, the goose tip 590, which has not been used before, can be attached.
In the apparatus of the present embodiment, a normal probe tip 580 is used.
Can be used to measure the surface roughness of the sample spread in the XY directions at high resolution, and by using the goose tip 590, the surface roughness of the side wall of the measurement sample extending in the Z direction can be measured at high resolution. Can be measured.

As can be seen by comparing FIGS. 5A and 5B, the ordinary probe tip 580 and the goose tip 5
90, the angle of the cantilever extending from the supporting portion is different, and in the conventional device, it was impossible to attach a plurality of probe tips having such different shapes, but in the device of this embodiment, The measurement can be performed by attaching a plurality of probe tips having different shapes.

For this reason, differently shaped probe tips 58
0 and 590 are applied to different surfaces of the probe tip application table 562, and the attached probe tips 5
Mirror holding members 610 and 640 corresponding to 80 and 590
Is attached to the terminal member 520 of the piezoelectric actuator 510, so that the probe tips 580 and 59 having different shapes can be shared with the light source section and the detection section of the lever displacement detection mechanism.
The displacement of the cantilever of 0 can be detected.

The positioning of the mirror holding mechanisms 610 and 640 is performed by applying to the end member 520, but by inserting the positioning pins 522 into the through holes 616 and 646.
The reliability of the mounting is improved. Positioning pin 522
Makes it difficult for the mirror holding mechanisms 610 and 640 to fall off, and enables the mirror holding mechanism 61 to be used when an unexpected impact is applied to the apparatus.
0 and 640 are prevented from falling off. In addition, the mirror holding mechanisms 610 and 640 are used to simplify attachment and detachment.
It is preferably fixed by magnetic attraction, but may be fixed by screwing.

As described above, in the apparatus of the present embodiment, the SP
Most of the optical components of the lever displacement detection mechanism in the M-head can be shared, and the displacement of the cantilevers of a plurality of probe tips having different shapes can be measured with minimal changes in the optical components. In FIG. 4A, a reflection mirror 5 that reflects the sensor light
38 by simply changing the position and orientation of the other semiconductor laser 5.
32, collimator lens 534, beam splitter 53
6. The position detection photodiode 540 and the like are used as they are.

In this embodiment, the mirror holding mechanism corresponding to the ordinary probe tip and the goose tip has been described. However, even if the angle between the probe and the cantilever is different from that of the probe, the corresponding orientation is required. It is easily understood that such a probe tip can be dealt with by preparing a mirror holding mechanism in which a mirror is attached at the position. That is, in the apparatus of the present embodiment, the probe tip mounting method and the optical path adjustment mechanism of the optical lever type displacement detection sensor for detecting the displacement of the cantilever are combined, and the mounting surface of the probe tip and the optical path adjustment corresponding thereto are combined. By selecting a mechanism, a device that can support a wide range of probe tips can be provided.

In the scanning probe microscope according to the present embodiment, as shown in FIG.
When the probe 90 is attached to the probe tip holding mechanism 550, the surface normal direction of the probe portion 596 is perpendicular to the surface normal direction of the sample, and the ridge connecting the two points at the tip of the probe portion 596 of the probe tip 590 is formed. It is held parallel and opposite in the plane of the sample. As a result, the tip of the probe tip of the probe tip acts to show an interaction with the sample surface even on the uneven portion having a side wall close to the vertical in the measurement sample, and the sample of the sample that stood almost up to the vertical. It is possible to accurately measure and display the side wall.

The measuring operation of the scanning probe microscope according to the present embodiment will be described. Since the AFM measurement with the configuration of FIG. 5A using a normal probe tip can be performed in the same manner as in the related art, hereinafter, only the AFM measurement with the configuration of FIG. 5B using a goose tip will be described. explain.

When measuring the sample surface shape, the lever displacement detection mechanism measures the displacement of the cantilever (cantilever) 594 of the goose tip 590.
The mirror holding mechanism 640 is attached to the terminal member 520 so that the displacement of No. 4 can be detected, and the adjustment of the optical axis and the like is completed in advance.

Next, in order to vibrate the cantilever 594 at the mechanical resonance frequency or a frequency near the mechanical resonance frequency, the piezoelectric element 560 as an excitation mechanism is driven at the frequency. The amplitude is set to 10 nm to 100 nm when the distance between the sample and the probe is sufficiently large. When measuring the surface shape of the sample, the probe 596 at the tip of the cantilever 594 of the probe tip 590 held by the probe tip holding mechanism 550 has a distance of 100 nm or less from the portion to be measured on the sample surface. The Z stage and the fine movement stage mechanism 518 are adjusted so as to be close to or slightly in contact with the place. At this time, as the distance between the sample surface and the measurement portion becomes shorter, the vibration state of the cantilever 594 set as described above decreases in amplitude when the interaction with the sample surface starts to occur.

When the amplitude signal of the vibration of the cantilever has decreased to a preset value, the distance between the sample and the probe is stopped from approaching.
The fine movement stage mechanism is driven to scan in the direction.
The size of the scanning region can be arbitrarily set by a control signal from the controller, but is usually from 1 nm square to 300 nm.
An area of about μm square is scanned. While the sample and the probe are relatively scanned in the X and Y directions in this manner, the cantilever 594 is used.
Fine movement stage mechanism 518 so that the vibration state of
Is moved in the Z direction. That is, feedback control is performed.

During the above feedback control, a set value indicating the vibration state of the cantilever 594 (for example, RMS (root)
The deviation signal between the mean square value) and the actual measured value is taken into a computer and displayed on a monitor as a two-dimensional image or a three-dimensional image. At this time, instead of taking the deviation signal into the computer, a drive control signal applied to move the fine movement stage mechanism in the Z direction is taken into the computer and displayed on a monitor as a two-dimensional image or a three-dimensional image.

Hereinafter, features of the present embodiment will be summarized. First, in the scanning probe microscope of the present embodiment, it is possible to mount a goose tip having a substantial probe apex angle of zero degree at the probe portion.

The goose tip has a probe portion having a small probe apex angle and a high aspect ratio, and makes the most of its features by optimizing how to attach the device to the device. Measurement becomes possible. The scanning probe microscope according to the present embodiment can mount a goose tip in an optimal state, and can accurately measure and display the side wall of a sample having a nearly vertical side wall inclination angle. It is.

The goose tip can be made of silicon nitride or silicon carbide having higher wear resistance than single-crystal silicon as the material of the probe portion. In addition, it is possible to perform measurement with high reproducibility while minimizing a measurement error or a change due to a change in the probe shape during measurement.

Further, the scanning probe microscope of the present embodiment can perform a conventional AFM measurement using the same device using a normal probe tip. Thus, 1
Since it is possible to perform measurement utilizing the characteristics of probe tips having different shapes with two devices, it can be said that the device has high cost performance.

Further, only a part of the mechanism in the SPM head needs to be changed for the probe tip having a different shape, and no major change such as replacing the entire SPM head is required. From this, it can be said that the apparatus has high cost performance.

<Second Embodiment> FIGS. 6 and 7A,
A scanning probe microscope according to the second embodiment will be described with reference to FIG. This embodiment is different from the first embodiment only in the probe tip holding mechanism.

FIG. 6 is a perspective view of the probe tip holding mechanism of the present embodiment viewed from the opposite side of fine movement stage mechanism 518, that is, from the measurement sample side. A probe tip holding structure receiver 702 is fixed to an end of a Z-direction fine movement stage mechanism 518 made of a piezoelectric body, and a probe chip holding structure 703 is detachably attached to the probe chip holding mechanism receiver 702. Can be The probe tip holding structure 703 is moved to the probe tip holding structure receiver 7.
02, the probe tip holding structure receiver 7
02 has four fixing pins 704, 705, 706, 70
7 is embedded. Further, the probe chip holding structure 703 is received from the probe chip holding structure receiver 702.
A wiring 708 and a connector 709 for connecting the power supply and an external electric circuit extend to the outside.

The probe chip holding structure 703 is roughly classified into a base material portion, a probe chip application portion, a probe chip excitation mechanism portion, and a probe fixing portion, according to its functions.

The base member is provided with female pin receivers 710 and 7 corresponding to the fixing pins of the probe tip holding structure receiver 702.
11, 712, and 713 are embedded in the holding structure base member 714, and the holding structure base member 71
In the center of 4 is a probe tip abutment 718 having abutment surfaces 719, 720 for attaching a probe tip, the probe tip abutment 718 being conductive to determine the potential on the back of the probe tip. It is made of a metal having properties.

The probe tip excitation mechanism is formed by laminating a buffer member 715, a piezoelectric body 716 for cantilever excitation, and a probe tip abutment base fixing plate 717 on a holding structure base member 714 in this order. The probe tip abutment 718 is further laminated thereon. Since the piezoelectric body 716 is connected to an external circuit to apply a voltage to the piezoelectric body 716, the electrodes formed on both sides of the piezoelectric body 716 have pin receivers 711, 7 in the holding structure base member 714.
It is connected to 13. Also, pin receivers 711, 713
Are in contact with the fixing pins 705 and 707 also serving as electrodes on the probe chip holding structure receiver 702, and are connected to an external piezoelectric excitation circuit (not shown) via the wiring 708 and the connector 709. In addition, the cushioning member 715
The vibration of the piezoelectric body 716 is attenuated so as not to be transmitted to the holding structure base member 714 side as much as possible, and the insulation between the lower electrode of the piezoelectric body 716 and the holding structure base member 714 is ensured. .

The probe fixing portion includes a probe tip holding plate spring 721 for holding a normal probe tip.
And a probe tip holding plate 728 for holding down the goose tip. That is, the probe tip holding mechanism of the present embodiment can selectively hold both a normal probe tip and a goose tip, and FIG. 7B is shown in FIG.

As shown in FIG. 7A, the probe fixing portion has a probe tip pressing leaf spring 721 for pressing a normal probe tip. A tip holding portion 722 is provided at one end of the probe tip holding plate spring 721, and a finger holding portion 723 is provided at the opposite end, and a screw 727 is inserted into a holding structure base portion 714 through an elongated hole 724 provided therebetween. The probe tip holding plate spring 721 is held movably back and forth. The horizontal guide plate 725 moves the probe tip pressing leaf spring 721 when the probe tip pressing leaf spring 721 moves.
Prevents unnecessary lateral rotation of. The spring 72
6 applies a necessary spring pressure when pressing the probe tip with the tip pressing portion 722 of the tip of the probe tip pressing leaf spring 721, and on the other hand, when the finger press pad 723 is pressed with a finger when removing the probe tip, It is provided to obtain a great repulsion. The probe tip holding plate spring 721 and the probe tip abutment 718 are electrically connected to each other, and are electrically connected to the connector 709 via the pin receiver 710 and the fixing pin 704. Can be maintained at the same potential as

As shown in FIG. 7 (b), the probe fixing section has a probe tip holding plate 728 for pressing the goose tip from the side. The probe tip shear plate 728 includes a spring 731 and long holes 734 and 73.
5. The holding structure base member 714 can be moved back and forth by the screws 732 and 733. When attaching the probe tip, the probe tip holding portion 72
9, 730 are the action points, and the probe tip is
The spring pressure of 31 presses and fixes to the contact surface 720.

The electrode 7 is provided on the probe tip
36 and an electrode 737 are provided. The electrode 736 is connected to the probe tip abutment base 718 and the probe tip pressing leaf spring 721 in the holding structure base member 714, and is maintained at the same potential. Also, the electrode 73
7 is electrically connected to the connector 709 via the pin receiver 712 and the fixing pin 706, and can be connected to an external device via the connector 709. The electrodes 736 and the electrodes 737 are provided to support the attachment of a probe tip having a cantilever to which a displacement detection function utilizing a piezoelectric effect or a strain resistance effect is added.

That is, the probe tip holding mechanism of the present embodiment is provided with a displacement detection function utilizing a piezoelectric effect or a strain resistance effect as shown in FIG. 8 in addition to a normal probe tip and a goose tip. It also supports mounting of a probe tip 1100 having a cantilever.

The probe tip 1100 has been proposed by the present applicant in Japanese Patent Application No. 9-191316, and is particularly suitable for measuring a vertical wall. As shown in FIGS. 9A, 9B, and 9C, the probe tip 1100 is provided at the free end of a cantilever (elastic member) 1102 made of an elastic body extending from the support 1101. Probe part 1
103 is formed. As can be seen from the enlarged view of FIG. 9C, the probe portion 1103 has a flat plate triangular shape,
At the two vertices 1106 and 1107 at the tip, three ridges terminate. Cantilever elastic member 110
2 and the flat plate triangular probe portion 1103 have their surface normal directions parallel to each other, but have different thicknesses and shapes. The thickness of the elastic member portion 1102 is a thickness suitable for obtaining mechanical vibration characteristics such as a desired resonance frequency, and the thickness of the probe portion 1103 is, as shown in FIG. Is sufficiently thin so as to be able to enter the recessed portion.

Near the boundary between the elastic member 1102 and the support 1101, a detection function unit 1104 for detecting the displacement or vibration state of the elastic member 1102 is provided. The displacement detection function unit 1104 includes a sensor using a piezoresistive effect of silicon or polysilicon, or a sensor using a piezoelectric effect such as zinc oxide or PZT (lead zirconate titanate). The signal detected by the displacement detection function unit 1104 is a signal from the two electrode pads 1105a shown in FIG.
And 1105b.

As shown in FIG. 8, the probe tip 1100 is fixed by being pressed from the side by the probe tip holding plate 728 just like the goose tip. The electrode 736 and the electrode 737 are pressed against the electrode pad 1105a and the electrode pad 1105b, respectively. As a result, the displacement detection function unit 1104
09 and a displacement signal detected by the displacement detection function unit 1104 can be extracted through the connector 709.

Note that the above-described optical lever displacement detection mechanism is not required for a probe chip having a built-in cantilever displacement detection function unit, so that the optical components need not be changed.

The probe tip holding mechanism of the device according to the present embodiment has an advantage that the probe tip can be easily attached and detached as compared with the probe tip holding mechanism according to the first embodiment. Further, since no adhesive is used, the probe tip can be used immediately after it is attached to the probe tip holding mechanism. Further, when the probe tip is replaced, the peeled adhesive does not occur as dust.

Although the probe tip holding mechanism of the apparatus of this embodiment is slightly larger than the probe tip holding mechanism of the first embodiment, the size of the probe tip holding structure 703 is about 30 mm × 20 mm. × 8mm,
It is made quite compact and produced.

<Third Embodiment> A scanning probe microscope according to a third embodiment will be described with reference to FIG. This embodiment is an apparatus using a cylindrical fine-movement stage mechanism, that is, a piezoelectric tube scanner 801 as the fine-movement stage mechanism in the XYZ directions. Also in the apparatus of the present embodiment, the probe tip holding mechanism 950 can hold both a normal probe tip and a goose tip, but FIG. 10 shows a state where the normal probe tip 580 is held. I have.

The measurement sample 508 is placed on an XY stage 506 provided with an X stage 502 and a Y stage 504 that can perform coarse movement adjustment in the X and Y directions orthogonal to each other. Above the sample 508, an SPM head 800 attached to a Z stage 802 capable of coarse adjustment in the Z direction is arranged. The XY stage 506 and the Z stage capable of coarse movement adjustment are fixedly supported by a housing or a base member (not shown) on the respective attachment site side. This SPM device is usually mounted on a vibration isolation mechanism to make it difficult for disturbance vibrations to be transmitted to a measurement site (near a sample).

The SPM head 800 has a Z stage 802
, A cylindrical fine movement stage mechanism 804, a lever displacement detection mechanism 820 attached to the lower end thereof, and a probe tip holding mechanism 950 provided below the mechanism.

The cylindrical fine movement stage mechanism 804 is composed of, for example, a piezoelectric tube scanner. The probe tip is attached to the probe tip holding mechanism 950, and is moved in the XYZ directions by the piezoelectric tube scanner 804. That is, the piezoelectric tube scanner 804 is
Fine movement adjustment and scanning operation of the probe tip in the XYZ directions are enabled.

The lever displacement detecting mechanism 820 has an optical lever type displacement detecting mechanism for optically measuring the displacement of the cantilever of the probe tip, and includes a semiconductor laser 832, a collimator lens 834, a mirror 836, a reflecting mirror 838,
It has a position detection photodiode 840. In the figure,
An alternate long and short dash line indicates an optical path of a light beam of the optical lever type displacement detecting mechanism.

Semiconductor laser 832 and collimator lens 8
The mirror 34 is attached to the housing 822 of the lever displacement detection mechanism 820 via attaching means (not shown).
36 is attached to the housing 822 via a mirror fixing member 824.

The mirror 838 is rotatably supported by the housing 822, and its direction can be adjusted by an angle adjustment knob 852. The position detection photo detector 840 is
Attached to the housing 822 via a YZ stage 860 provided with a Y-direction position adjustment stage 856 and a Z-direction position adjustment stage 858, two adjustment knobs 862
And 8864, the position can be adjusted in the Y and Z directions, respectively.

FIGS. 11 (a), 11 (b) and 11
(C) shows the probe tip holding mechanism 95 of the present embodiment.
0 and a part of the lever displacement detection mechanism are shown together with their optical paths. FIG. 11A shows a state in which a normal probe tip 580 is attached to the probe tip holding mechanism 950, and FIGS. 11B and 11C show a state in which the goose tip 590 is attached to the probe tip holding mechanism 950. Is shown.

FIGS. 11 (a), 11 (b) and 11
As shown in (c), the probe tip holding mechanism 950 in the present embodiment includes the lever displacement detecting mechanism 82
Probe tip holding mechanism receiver 952 attached to
The probe chip holder 958 is attached to the probe chip holder receiver 952 by a fixing pin 954. The probe chip holding section 958 has a probe chip fixing section 962 to which the probe chip is fixed.

The ordinary probe tip 580 is the same as that shown in FIG.
As shown in (a), the supporting portion is attached to the bottom surface of the probe chip fixing portion 962 by bonding or the like. The goose chip 590 is similar to that shown in FIGS.
As shown in (c), the support portion is attached to the side surface of the probe chip fixing portion 962 by bonding or the like. Further, a piezoelectric element 960 for exciting the goose tip 590 attached thereto is provided inside the probe tip holding section 958.

For a normal probe tip 580,
As shown in FIG. 11A, the light emitted from the semiconductor laser 832 passes through the collimator lens 834,
The light is reflected by the mirror 836 and enters the cantilever of the probe tip 580. The reflected light from the cantilever is deflected by the reflecting mirror 838, and the position detecting photodiode 8
It is incident on 40.

Positioning such that the reflected light from the cantilever is substantially at the center of the position detection photodetector 840 is performed by adjusting the tilt angle of the mirror 838 using the angle adjustment knob 852 and using the Y-direction position adjustment stage 856. Position detection photodetector 840 in the horizontal direction (Y
Direction).

For the goose chip 590, for example,
As shown in FIG. 11B, the light emitted from the semiconductor laser 832 passes through the collimator lens 834,
The light is reflected by the mirror 836 and enters the cantilever of the probe tip 580. The reflected light from the cantilever directly enters the position detection photodiode 840.

The positioning of the position detection photodetector 840 is performed by adjusting the movement of the position detection photodetector 840 in the vertical and horizontal directions (YZ directions) using the YZ stage 860.

In the configuration of FIG. 11B, the displacement detection sensitivity of the optical lever type displacement sensor is inferior to that of FIG. 11A because the optical path of the reflected light is shorter. When such a decrease in sensitivity cannot be ignored, as shown in FIG. 11C, a configuration is adopted in which the light is incident on the position detection photodetector 840 via another reflection mirror 838 using another reflection mirror 890. It is good to earn the optical path length. In this case, the position of the position detection photodetector 840 is adjusted by adjusting the tilt angle of the reflection mirror 838 or the reflection mirror 890 and the vertical direction (Z direction) of the position detection photodetector 840.
This is performed by adjusting the movement. The present invention is not limited to the above embodiments. All implementations performed without departing from the spirit of the invention are included in the present invention.

[0107]

According to the present invention, a flat probe is provided at the tip of the elastic member supported by the support, and the two terminal points of the tip of the probe are the measurement sample. A scanning probe microscope provided with a probe tip holding mechanism capable of attaching a probe tip, which is a point of action of the scanning probe microscope.

Further, in addition to the probe tip suitable for measuring the side wall of the sample described above, it is also possible to attach a normal probe tip suitable for measuring the surface roughness of the sample,
This allows different types of measurements to be realized without requiring a large capital investment. That is, a cost-effective scanning probe microscope is provided.

The following can be said about the scanning probe microscope in the present embodiment. 1. Support (10
1, 401, 1101) and a flat probe portion (103, 403, 1103) provided at the tip of a cantilevered elastic member portion (102, 402, 1102). The two terminal points (104, 10
A scanning probe microscope having a probe tip holding mechanism (550, 703) to which a probe tip (100, 400, 1100), which is an operation point with a measurement sample, can be attached.

[0110] 2. Probe part (103, 403, 1103)
2. The scanning probe microscope according to claim 1, wherein the surface normal of the support is substantially parallel to the surface normal of the support portion.

3. The probe tip holding mechanism (55)
0, 703) is the probe tip (100, 40).
0, 1100) and another probe tip (5
Item 80. The scanning probe microscope device according to Item 2, wherein the device can be attached.

4. Another probe tip described above has a cone-shaped probe at the tip of a cantilevered elastic member extending from a support portion, and has a shaft of the probe, a surface normal of the elastic member, and a support. Probe tip (58) whose surface normals are almost parallel
Item 4. The scanning probe microscope apparatus according to item 3, wherein

[0113] 5. The probe tip holding mechanism (55)
0, 703) is removable from the microscope body (800).
6. Further, two end points (104, 105, 110)
6. The scanning probe microscope apparatus according to claim 1, wherein a point on a ridge line connecting (6, 1107) is an action point with the measurement sample.

7. Further, the elastic members (102, 40)
(110, 2, 1102).
6, 960) and vibration detecting means (532, 534, 536, 538, 540, 61) for detecting vibration of the elastic member portion.
0,640,703,1104,1105,820 etc.)
2. The scanning probe microscope according to claim 1, comprising:

8. The vibration detecting means is an optical sensor (532, 534, 536, 538, 540, 610,
640, 820 etc.), wherein the light source (532, 832) for irradiating light to the elastic member portion and the light receiving means (540, 840) for detecting light reflected on the elastic member portion are described in Item 7 above. Scanning probe microscope.

9. The vibration detecting means includes means (610, 640) for switching an optical path of light from the light source.
14. A scanning probe microscope according to item 9. 10. 8. The scanning probe according to claim 7, wherein the vibration detection unit includes a reflection surface provided between the elastic member unit and the light receiving unit in order to adjust a position of light reflected by the elastic member unit on a light receiving unit. 9. microscope.

(11) 8. The scanning probe microscope according to claim 7, wherein the vibration detection means includes a part (1104, 1105) of the probe tip and outputs an electric signal according to a vibration state of the elastic member.

12. Vibration means (560, 716, 96
8. The scanning probe microscope according to claim 7, wherein 0) is incorporated in the probe tip holding mechanism (550, 703). 13. 3. The scanning probe microscope according to claim 1, wherein a surface normal of the elastic member portion (102, 402) and a surface normal of the probe portion (103, 403) are non-parallel. 14． 3. The scanning probe microscope according to claim 1, wherein a surface normal of the elastic member portion (1102) is substantially parallel to a surface normal of the probe portion (1103).

[Brief description of the drawings]

1A and 1B show a probe tip used in an apparatus of the present invention, wherein FIG. 1A is a side view, FIG. 1B is a perspective view, and FIG. 1C is an enlarged perspective view of a probe portion.

FIG. 2 is a perspective view of another probe tip used in the apparatus of the present invention.

FIG. 3 shows a series of steps in a method of manufacturing the probe tip shown in FIG.

FIG. 4 shows the S of the scanning probe microscope according to the first embodiment.
3A and 3B show a PM head, in which FIG. 3A is a schematic perspective view of an SPM head, and FIG. 3B is a perspective view showing two types of mirror holding mechanisms mounted on a terminal member of a piezoelectric actuator according to the type of a probe tip. It is.

5A and 5B show an SPM head on which a mirror holding mechanism corresponding to a probe tip to be held is mounted, and FIG. 5A is a side view of the SPM head on which a normal probe tip mirror holding mechanism is mounted, and FIG. FIG. 4 is a side view of the SPM head on which a mirror holding mechanism for goose chips is mounted.

FIG. 6 is a perspective view of a probe tip holding mechanism in the scanning probe microscope according to the second embodiment.

7A and 7B show a state in which a probe tip is mounted on the probe tip holding mechanism shown in FIG. 6; FIG. 7A is a perspective view of a probe tip holding mechanism in which a normal probe tip is mounted; It is a perspective view of the probe tip holding mechanism with which the goose tip was mounted.

FIG. 8 is a perspective view of the probe tip mounted on the probe tip holding mechanism shown in FIG. 6, in which the probe tip having a cantilever having a displacement detection function is mounted.

9A and 9B show a probe tip provided with a cantilever having a displacement detection function shown in FIG. 8, wherein FIG. 9A is a side view, FIG. 9B is a perspective view, and FIG. 9C is an enlarged perspective view of the tip of the cantilever. FIG. 3D is a side view showing the tip of the cantilever together with the sample.

FIG. 10 is a perspective view of an SPM head in a scanning probe microscope according to a third embodiment.

11 shows the probe tip holding mechanism shown in FIG. 10 with the probe tip mounted thereon, together with a part of the lever displacement detection mechanism, and FIG. 11 (a) is a side view of the probe tip holding mechanism with a normal probe tip mounted thereon. FIG. 2B is a side view of the probe tip holding mechanism with the goose chip mounted thereon, and FIG. 2C is a side view of the probe tip holding mechanism with the goose chip mounted thereon, showing an improved lever displacement detection mechanism. It is.

[Explanation of symbols]

 550 Probe tip holding mechanism 580 Normal probe tip 590 Goose tip

Claims (3)

[Claims] 1. A probe having a flat plate-shaped probe provided at a tip of a cantilever-shaped elastic member supported by a support, and two terminal points at the tip of the probe are connected to a measurement sample. A scanning probe microscope having a probe tip holding mechanism to which a probe tip, which is the point of action of the above, can be attached. 2. The scanning probe microscope according to claim 1, wherein a surface normal of the probe portion and a surface normal of the support portion are substantially parallel to each other. 3. The scanning probe microscope apparatus according to claim 2, wherein the probe tip holding mechanism can attach another probe tip having a different shape from the probe tip.