JPH1135585A - Fluorine-containing compounds, optical thin films and anti-reflective articles - Google Patents

Fluorine-containing compounds, optical thin films and anti-reflective articles

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Publication number
JPH1135585A
JPH1135585A JP9189552A JP18955297A JPH1135585A JP H1135585 A JPH1135585 A JP H1135585A JP 9189552 A JP9189552 A JP 9189552A JP 18955297 A JP18955297 A JP 18955297A JP H1135585 A JPH1135585 A JP H1135585A
Authority
JP
Japan
Prior art keywords
thin film
optical thin
refractive index
general formula
fluorine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9189552A
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Japanese (ja)
Other versions
JP3944957B2 (en
Inventor
Koichiro Oka
紘一郎 岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
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Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP18955297A priority Critical patent/JP3944957B2/en
Publication of JPH1135585A publication Critical patent/JPH1135585A/en
Application granted granted Critical
Publication of JP3944957B2 publication Critical patent/JP3944957B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

(57)【要約】 【課題】耐擦傷性、耐久性に優れ、形成容易な低屈折率
の光学薄膜。 【解決手段】一般式(1)に示される新規含フッ素化合
物を合成し、かつ、前記化合物が低屈折率であって、硬
化後の硬度が大きく、光学薄膜として極めて有望である
ことを見出だした。特定の含フッ素化合物と含ケイ素イ
ソシアネ−ト化合物とをウレタン化反応させて合成す
る。前記化合物を基材表面に塗布し、重合、硬化して、
屈折率が1.46を超えない光学薄膜を形成できる。単
独、又はハードコート、高屈折率膜、高導電性膜などと
組合わせ、樹脂板、樹脂フィルム、CRT、PDP、液
晶パネル、ガラス、レンズなどにおいて光線の反射防止
に用いることができる。 【化1】
(57) [Abstract] [PROBLEMS] An optical thin film having a low refractive index which is excellent in abrasion resistance and durability and is easy to form. A novel fluorine-containing compound represented by the general formula (1) is synthesized, and the compound has a low refractive index, a high hardness after curing, and is extremely promising as an optical thin film. Was. A specific fluorine-containing compound and a silicon-containing isocyanate compound are synthesized by urethanization reaction. The compound is applied to the substrate surface, polymerized and cured,
An optical thin film having a refractive index not exceeding 1.46 can be formed. It can be used alone or in combination with a hard coat, a high refractive index film, a high conductive film, or the like to prevent light reflection in a resin plate, a resin film, a CRT, a PDP, a liquid crystal panel, a glass, a lens, or the like. Embedded image

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、新規の含フッ素化
合物および前記含フッ素化合物の製造方法に関し、さら
に、前記含フッ素化合物を含有する耐擦傷性に優れた低
屈折率の光学薄膜、前記の光学薄膜を利用した反射防止
性物品および反射防止方法に関する。本発明の光学薄膜
を、ブラウン管や液晶表示装置、CRT用反射防止フィ
ルター、プラズマディスプレイ用反射防止フィルター、
ガラス、レンズなどの物品表面に形成させ、光線の反射
防止に用いることができる。
The present invention relates to a novel fluorine-containing compound and a method for producing the fluorine-containing compound, and further relates to a low-refractive-index optical thin film containing the fluorine-containing compound and having excellent scratch resistance. The present invention relates to an antireflection article and an antireflection method using an optical thin film. The optical thin film of the present invention may be used as a CRT, a liquid crystal display, an antireflection filter for a CRT, an antireflection filter for a plasma display,
It can be formed on the surface of articles such as glass and lenses, and can be used to prevent reflection of light rays.

【0002】なお、本発明で光学薄膜とは、基材表面に
透明な薄膜を形成され、基材を照射する光線が基材に入
射する際、屈折率の異なる境界で干渉をおこさせる薄膜
のことをいう。従って、光学薄膜では反射光は入射光の
干渉光として出現する。光学薄膜の厚さは、通常、1μ
m以下である。また、本発明の説明で屈折率はとくに説
明しない限り、ナトリウム発光スペクトルのD線におけ
る測定値であり、片面反射率(たんに反射率ともいう)
は、波長が540nmの光線における測定値である。
In the present invention, an optical thin film refers to a thin film formed of a transparent thin film on the surface of a substrate and causing interference at a boundary having a different refractive index when a light beam illuminating the substrate is incident on the substrate. That means. Therefore, in the optical thin film, the reflected light appears as interference light of the incident light. The thickness of the optical thin film is usually 1μ
m or less. In the description of the present invention, the refractive index is a measured value at the D line of the sodium emission spectrum, unless otherwise specified, and is a one-sided reflectance (also simply referred to as a reflectance).
Is a measured value in a light beam having a wavelength of 540 nm.

【0003】[0003]

【従来の技術】従来の光反射防止性物品の多くは、表面
に単層の低屈折率光学薄膜、または低屈折率と高屈折率
の光学薄膜を交互に積層して光の反射を防止している。
光学薄膜の反射光は、光学薄膜表面や薄膜境界面におけ
る各反射光の干渉光であって、反射率は光学薄膜の屈折
率と膜厚により低減または増加するが、原則的に屈折率
が低いほど反射率の低減に有利である。光学薄膜は蒸着
やスパッタなどを利用して物品(基材)の表面に無機物
被膜を形成するのが一般的である。得られた反射防止膜
は低反射性で耐擦傷性に優れるが、真空装置などを用い
るので生産性が悪く、製造コストが高い。また、製造工
程で基材が加熱されるので使用できる素材が限られると
いう問題があった。
2. Description of the Related Art Many conventional anti-reflection articles have a single-layered low-refractive-index optical thin film or a low-refractive-index and high-refractive-index optical thin film alternately laminated on the surface to prevent light reflection. ing.
The reflected light of the optical thin film is interference light of each reflected light on the optical thin film surface or the thin film boundary surface, and the reflectance is reduced or increased by the refractive index and the film thickness of the optical thin film, but the refractive index is low in principle The more it is, the more advantageous in reducing the reflectance. In general, an optical thin film forms an inorganic film on the surface of an article (substrate) by using vapor deposition, sputtering, or the like. The obtained anti-reflection film has low reflectivity and excellent scratch resistance, but the productivity is low and the production cost is high because a vacuum device or the like is used. In addition, there is a problem that the material that can be used is limited because the base material is heated in the manufacturing process.

【0004】前記の問題を解決するために、特開平4−
355401号公報や特開平6−18705号公報など
には、低屈折率の有機物質を溶媒に溶解し、基材にコー
ティングして低屈折率反射防止膜を形成する溶液コーテ
ィング法が開示されている。溶液コーティング法を利用
すれば、無機薄膜中で最も屈折率の低いフッ化マグネシ
ウム薄膜よりもさらに低い屈折率を有するフッ素含有樹
脂をコーティングすることができる。しかも、溶液コー
ティングは生産性が高く経済的である。
To solve the above problem, Japanese Patent Laid-Open No.
JP-A-355401 and JP-A-6-18705 disclose a solution coating method in which a low refractive index organic substance is dissolved in a solvent and coated on a substrate to form a low refractive index antireflection film. . By using the solution coating method, it is possible to coat a fluorine-containing resin having a lower refractive index than the magnesium fluoride thin film having the lowest refractive index among the inorganic thin films. Moreover, solution coating is highly productive and economical.

【0005】しかし、特開平4−355401号公報お
よび特開平6−18705号公報に記載の含フッ素樹脂
からなる有機薄膜は、含フッ素樹脂硬化物の架橋密度が
低いので表面硬度が低く、耐擦傷性に問題があった。さ
らに、コーティングした後、加熱硬化を必要とするため
使用できる基材が限定されていた。この他、米国特許第
3,310,606号公報には、架橋密度が高く表面硬
度の高い含フッ素樹脂として、パーフルオロジビニルエ
ーテルの硬化物が記載されているが、溶剤に不溶で高
温、高圧下で成型する必要があるため光学薄膜を得るこ
とができない。
[0005] However, the organic thin film comprising a fluorine-containing resin described in JP-A-4-355401 and JP-A-6-18705 has a low surface hardness due to a low crosslinking density of a cured product of the fluorine-containing resin, and has a low scratch resistance. There was a problem with sex. In addition, the substrate that can be used after coating is required to be cured by heating, so that the usable substrate is limited. In addition, US Pat. No. 3,310,606 discloses a cured product of perfluorodivinyl ether as a fluorine-containing resin having a high crosslinking density and a high surface hardness. An optical thin film cannot be obtained because it needs to be molded below.

【0006】また、特開平8−239430号公報に
は、特定の構造をもつ含フッ素ジ(メタ)アクリレート
100重量部に対して、多官能(メタ)アクリレート1
0〜90重量部含有する、揆水・撥油性及び耐擦傷性を
備えた含フッ素硬化性組成物が開示されている。しか
し、この硬化性組成物は屈折率が1.45を越える傾向
があり、反射防止性を得にくい。
Japanese Patent Application Laid-Open No. Hei 8-239430 discloses that a polyfunctional (meth) acrylate is added to 100 parts by weight of a fluorine-containing di (meth) acrylate having a specific structure.
A fluorine-containing curable composition containing 0 to 90 parts by weight and having water repellency, oil repellency and scratch resistance is disclosed. However, this curable composition tends to have a refractive index of more than 1.45, and it is difficult to obtain antireflection properties.

【0007】[0007]

【発明が解決しようとする課題】本発明は、低反射性で
耐擦傷性に優れ、かつ容易に形成することのできる光学
薄膜、およびこの光学薄膜を用いた反射防止性物品を提
供することを課題に研究の結果、完成されたものであ
る。
SUMMARY OF THE INVENTION It is an object of the present invention to provide an optical thin film having low reflectivity, excellent scratch resistance, and which can be easily formed, and an antireflection article using the optical thin film. It was completed as a result of research on the subject.

【0008】[0008]

【課題を解決するための手段】前記の課題を解決するた
め、本発明者は新規合成物を含む各種の化合物を合成し
て光学的特性、力学的特性などを測定し、前記の光学薄
膜への利用可能性を検討した。その結果、化3に一般式
(1)に示される構造の新規含フッ素化合物の合成に成
功し、かつ、この新規化合物の硬化物が低屈折率であっ
て架橋性が高く、従って硬化後の硬度が大きく、たとえ
ば光学薄膜として極めて有望であることを見出だすこと
ができた。
In order to solve the above-mentioned problems, the present inventor synthesizes various compounds including a novel synthetic compound, measures optical characteristics, mechanical characteristics, and the like, and applies the compounds to the optical thin film. The possibility of using was examined. As a result, a new fluorine-containing compound having a structure represented by the general formula (1) was successfully synthesized in Chemical Formula 3, and a cured product of the novel compound had a low refractive index and a high cross-linking property. It has been found that it has high hardness and is very promising, for example, as an optical thin film.

【0009】ここに本発明は、まず、前記の課題を解決
することのできる次の一般式(1)で示される新規の含
フッ素化合物を提供する。
The present invention first provides a novel fluorine-containing compound represented by the following general formula (1) which can solve the above-mentioned problems.

【0010】[0010]

【化3】 この一般式(1)で示される含フッ素化合物は、次の一
般式(2)で示される構造の化合物と一般式(3)で示
される構造の化合物とをウレタン化反応させて製造する
ことができる。
Embedded image The fluorine-containing compound represented by the general formula (1) can be produced by subjecting a compound having a structure represented by the following general formula (2) and a compound having a structure represented by the general formula (3) to urethanation reaction. it can.

【0011】[0011]

【化4】 一般式(1)で示される新規含フッ素化合物は、この化
合物を含有する組成物を硬化して、容易に屈折率が1.
46を超えない薄膜を形成することが可能であり、光学
薄膜として有用に利用することができる。その際、光学
薄膜の厚さを30ないし700nmに形成することが好
ましい。また、前記の光学薄膜には一般式(1)で示さ
れる含フッ素化合物100重量部に対し、100重量部
を超えない量の多官能シラン化合物を添加して硬化させ
ることができるし、さらに、一般式(1)で示される含
フッ素化合物100重量部に対し、100重量部を超え
ない量の、エポキシ基を有する多官能シラン化合物と、
100重量部を超えない量の多官能エポキシ樹脂とを添
加し、硬化させることもできる。
Embedded image The novel fluorine-containing compound represented by the general formula (1) hardens a composition containing this compound and easily has a refractive index of 1.
A thin film not exceeding 46 can be formed, and can be effectively used as an optical thin film. At that time, it is preferable that the thickness of the optical thin film is formed to 30 to 700 nm. Further, the optical thin film can be cured by adding a polyfunctional silane compound in an amount not exceeding 100 parts by weight with respect to 100 parts by weight of the fluorine-containing compound represented by the general formula (1). A polyfunctional silane compound having an epoxy group in an amount not exceeding 100 parts by weight, based on 100 parts by weight of the fluorine-containing compound represented by the general formula (1),
A polyfunctional epoxy resin in an amount not exceeding 100 parts by weight can be added and cured.

【0012】前記のいずれかの光学薄膜を基材表面に形
成すれば、優れた反射防止性物品として有用である。基
材表面に光学薄膜を形成するに際して、基材表面と光学
薄膜との中間に、有機および/または無機系バインダー
と金属化合物の微粒子とからなり、かつ屈折率が基材の
屈折率の±0.02以内のハードコート層を形成して耐
擦傷性を増大し、干渉縞の発生を防止することができ
る。さらに、基材またはハードコート層と光学薄膜との
中間に、光学薄膜およびハードコート層の屈折率よりも
高い屈折率を有する高屈折率膜を積層して反射防止性を
高めることもできる。
When any of the above optical thin films is formed on the surface of a substrate, it is useful as an excellent antireflection article. When an optical thin film is formed on the surface of a substrate, an organic and / or inorganic binder and fine particles of a metal compound are interposed between the surface of the substrate and the optical thin film, and the refractive index is ± 0 of the refractive index of the substrate. By forming a hard coat layer having a thickness within 0.02, the scratch resistance can be increased and the occurrence of interference fringes can be prevented. Further, a high refractive index film having a higher refractive index than the optical thin film and the hard coat layer may be laminated between the base material or the hard coat layer and the optical thin film to improve the antireflection property.

【0013】前記の光反射防止性物品は、一般式(2)
で示される化合物と一般式(3)で示される化合物と
を、イソシアネートと反応する基をもたない有機溶剤に
溶解して室温ないし80℃で反応させ、得られた反応溶
液を含む塗液を調合し、調合した塗液を基材の表面に塗
布して硬化し、基材の表面に屈折率が1.46を超えな
い光学薄膜を形成することにより、合理的に製造するこ
とができる。
The anti-reflective article has a general formula (2)
And a compound represented by the general formula (3) are dissolved in an organic solvent having no group capable of reacting with isocyanate and reacted at room temperature to 80 ° C., and a coating solution containing the obtained reaction solution is prepared. It can be rationally manufactured by preparing, coating the prepared coating liquid on the surface of the base material and curing, and forming an optical thin film having a refractive index not exceeding 1.46 on the surface of the base material.

【0014】[0014]

【発明の実施の形態】本発明を具体的な実施形態例をあ
げながら順次説明する。まず、本発明が提供する新規化
合物の、一般式(1)で示される含フッ素化合物の製造
方法を説明する。一般式(1)に示される化合物は、一
般式(2)で示される含フッ素化合物と一般式(3)で
示されるイソシアネート化合物とをウレタン化反応させ
ることにより合成することができる。一般式(2)の含
フッ素化合物は、一般式(4)の化合物を加水分解して
合成することができる。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described sequentially with reference to specific embodiments. First, a method for producing a fluorine-containing compound represented by the general formula (1), which is a novel compound provided by the present invention, will be described. The compound represented by the general formula (1) can be synthesized by subjecting the fluorine-containing compound represented by the general formula (2) to an isocyanate compound represented by the general formula (3) to undergo a urethanation reaction. The fluorine-containing compound of the general formula (2) can be synthesized by hydrolyzing the compound of the general formula (4).

【0015】[0015]

【化5】 一般式(2)で示される含フッ素化合物のなかでも、n
が4〜12の化合物を用いることにより一般式(1)の
化合物を容易に製造することができる。かつ、低屈折率
の光学薄膜を得やすい。一方、一般式(3)で示される
化合物の中では化6で示した一般式(5)ないし(8)
の化合物を好ましく用いることができる。反応生成物の
架橋性が大きく、かつ、容易に反応生成物を製造するこ
とができる利点がある。
Embedded image Among the fluorine-containing compounds represented by the general formula (2), n
Can easily produce the compound of the general formula (1) by using the compound of 4 to 12. In addition, it is easy to obtain an optical thin film having a low refractive index. On the other hand, among the compounds represented by the general formula (3), the compounds represented by the general formulas (5) to (8)
Can be preferably used. There is an advantage that the crosslinkability of the reaction product is large and the reaction product can be easily produced.

【0016】[0016]

【化6】 具体的に前記のウレタン化反応を実施し、一般式(1)
で示される化合物を製造するには、一般式(2)および
一般式(3)で示される化合物を、エステル系、ケトン
系、エーテル系、炭化水素系などであってイソシアネー
トと反応する基を持たない有機溶剤に溶解し、室温ない
し80℃程度の温度条件で反応させるとよい。その際、
たとえばジラウリン酸ジ−n−ブチル錫のようなウレタ
ン化触媒を加えて反応速度を促進させることができる。
ウレタン化反応を行った後、適当な手段で溶剤を除去
し、ウレタン化された化合物、すなわち一般式(1)で
示される化合物を取り出すことができる。
Embedded image Specifically, the urethanization reaction was carried out, and the general formula (1)
In order to produce the compound represented by the general formula (2) and the compound represented by the general formula (3), an ester-based, ketone-based, ether-based or hydrocarbon-based compound having a group which reacts with isocyanate It may be dissolved in an organic solvent and reacted at a temperature of about room temperature to about 80 ° C. that time,
For example, a urethanization catalyst such as di-n-butyltin dilaurate can be added to accelerate the reaction rate.
After the urethanization reaction, the solvent is removed by an appropriate means, and the urethanized compound, that is, the compound represented by the general formula (1) can be obtained.

【0017】一般式(1)の化合物を光学薄膜の形成に
用いる場合には、ウレタン化反応の生成物を溶剤から分
離することなく、反応溶液のまま光学薄膜を形成するた
めの塗液に用いること、すなわち、塗液の調製過程でウ
レタン化反応を一体的に行う方法が好適である。この方
法によれば前記の有機溶剤の全部または一部が塗液の溶
剤としても利用されることになる。
When the compound of the general formula (1) is used for forming an optical thin film, the product of the urethanization reaction is used as a coating solution for forming an optical thin film as a reaction solution without being separated from a solvent. That is, a method of integrally performing the urethanization reaction in the process of preparing the coating liquid is preferable. According to this method, all or a part of the organic solvent is also used as a solvent for the coating liquid.

【0018】本発明では、光学薄膜の表面硬度や密着性
などの特性を向上させたり、屈折率を調整するために、
多官能シラン化合物を添加することができる。多官能シ
ラン化合物の添加量は、本発明の一般式(1)で示され
る化合物100重量部に対し多官能シラン化合物を10
0重量部を超えない範囲で、好ましくは90重量部以下
の範囲で添加することができる。多官能シラン化合物が
100重量部を超えると、屈折率が1.46以上になり
やすく、本発明の目的とする反射防止性能を発揮できな
い傾向がある。
In the present invention, in order to improve the properties such as the surface hardness and adhesion of the optical thin film and to adjust the refractive index,
A polyfunctional silane compound can be added. The amount of the polyfunctional silane compound added is 10 parts by weight of the polyfunctional silane compound per 100 parts by weight of the compound represented by the general formula (1) of the present invention.
It can be added in a range not exceeding 0 parts by weight, preferably in a range of 90 parts by weight or less. If the amount of the polyfunctional silane compound exceeds 100 parts by weight, the refractive index tends to be 1.46 or more, and the antireflection performance aimed at by the present invention tends not to be exhibited.

【0019】本発明に用いられる多官能シラン化合物と
しては、ジメチルジメトキシシラン、ジメチルジエトキ
シシラン、メチルトリメトキシシラン、メチルトリエト
キシシラン、γ−グリシドキシプロピルメチルジエトキ
シシラン、γ−グリシドキシプロピルトリメトキシシラ
ン、ビニルトリエトキシシランなどがあげられ、これら
の多官能シラン化合物を単独または2種以上を混合て使
用することができる。
The polyfunctional silane compound used in the present invention includes dimethyldimethoxysilane, dimethyldiethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, γ-glycidoxysilane Examples thereof include propyltrimethoxysilane and vinyltriethoxysilane, and these polyfunctional silane compounds can be used alone or in combination of two or more.

【0020】また、前記多官能シラン化合物のうちエポ
キシ基を有するものは、硬度や上下層との密着性を改善
する効果があり好ましく用いられる。エポキシ基を有す
る多官能シラン化合物を添加する場合には、一般式
(1)の化合物100重量部に対し、さらに100重量
部を超えない範囲の、好ましくは90重量部以下の多官
能エポキシ樹脂を添加することができる。多官能エポキ
シ樹脂の添加量が100重量部を超えるようだと屈折率
が1.46を超え、本発明目的の反射防止性能を得るこ
とができなくなる傾向がある。本発明の光学薄膜では一
般式(1)に示される化合物を30重量%以上含有させ
ることが好ましい。
Among the polyfunctional silane compounds, those having an epoxy group are preferably used because they have the effect of improving the hardness and the adhesion to the upper and lower layers. When adding a polyfunctional silane compound having an epoxy group, a polyfunctional epoxy resin in an amount not exceeding 100 parts by weight, preferably 90 parts by weight or less, is added to 100 parts by weight of the compound of the general formula (1). Can be added. If the addition amount of the polyfunctional epoxy resin exceeds 100 parts by weight, the refractive index exceeds 1.46, and the antireflection performance of the present invention tends to be unable to be obtained. The optical thin film of the present invention preferably contains the compound represented by the general formula (1) in an amount of 30% by weight or more.

【0021】本発明で用いられる多官能エポキシ樹脂と
しては、ビスフェノールA系ジグリシジルエーテル、ノ
ボラック系ポリグリシジルエーテル、エチレングリコー
ル系ジグリシジルエーテル、プロピレングリコール系ジ
グリシジルエーテル、水添ビスフェノールA系ジグリシ
ジルエーテルなどがあげられ、これらの樹脂は単独また
は2種以上を混合して添加することができる。
The polyfunctional epoxy resin used in the present invention includes bisphenol A diglycidyl ether, novolak polyglycidyl ether, ethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, hydrogenated bisphenol A diglycidyl ether. These resins can be added alone or as a mixture of two or more.

【0022】次に本発明の光学薄膜は、一般的にアルコ
ール系、エステル系、ケトン系、エーテル系、炭化水素
系などの有機溶剤に、前記一般式(1)に示される本発
明の含フッ素化合物、またはさらに前記の多官能シラン
化合物などが添加された塗液を調合し、調合した塗液を
基材の表面に薄く塗布して重合、硬化し形成される。通
常、塗布の事前処理として、塗液に含まれているシラン
系加水分解性基を加水分解する。加水分解には、当量の
水を加え攪拌する方法が一般的であるが、触媒として微
量の酸、特に塩酸の併用が効果的である。 前記の塗液
には、硬化剤を加える。硬化剤として、ポットライフの
長いアルミニウム、鉄、銅などの金属キレート化合物、
例えば、アルミニウムアセチルアセトネート、アルミニ
ウムビスエチルアセトアセテートモノアセチルアセトネ
ート、アルミニウム−ジ−n−ブトキシドモノエチルア
セトアセテート、アルミニウム−ジ−iso−プロポキ
シドモノメチルアセトアセテートなどを用いるのが一般
的である。硬化剤は、硬化組成物全体の0.1〜20重
量部、好ましくは0.2〜10重量部を添加するとよ
い。
Next, the optical thin film of the present invention, which is generally represented by the general formula (1), is prepared by adding the optical thin film of the present invention represented by the above general formula (1) to an organic solvent such as an alcohol, ester, ketone, ether or hydrocarbon. A compound or a coating liquid to which the above-mentioned polyfunctional silane compound is further added is prepared, and the prepared coating liquid is thinly applied to the surface of a substrate, and is polymerized and cured to be formed. Usually, as a pretreatment for coating, a silane-based hydrolyzable group contained in the coating liquid is hydrolyzed. For the hydrolysis, a method of adding an equivalent amount of water and stirring is generally used. However, it is effective to use a small amount of an acid, particularly hydrochloric acid, as a catalyst. A curing agent is added to the coating liquid. As a curing agent, metal chelate compounds such as aluminum, iron, and copper with a long pot life,
For example, it is common to use aluminum acetylacetonate, aluminum bisethylacetoacetate monoacetylacetonate, aluminum-di-n-butoxide monoethylacetoacetate, aluminum-di-iso-propoxide monomethylacetoacetate, and the like. The curing agent may be added in an amount of 0.1 to 20 parts by weight, preferably 0.2 to 10 parts by weight, based on the entire cured composition.

【0023】また、均一コーティング性や密着性を改良
するため、塗液にレベリング剤やカップリング剤などの
薬剤を添加することも行われる。これらの薬剤は、硬化
組成物全体の0.05〜5重量部、好ましくは0.1〜
2重量部を添加するとよい。
Further, in order to improve uniform coating properties and adhesion, a chemical such as a leveling agent or a coupling agent is added to the coating solution. These agents are used in an amount of 0.05 to 5 parts by weight, preferably 0.1 to 5 parts by weight of the whole cured composition.
It is advisable to add 2 parts by weight.

【0024】塗液の塗布には、基板に均一に薄く塗布で
きる方法であればとくに制限なく利用できるが、具体的
にスピンコート、ディップコート、ダイコート、スプレ
ーコート、バーコーターコート、ロールコート、カーテ
ンフローコートなどの手段があげられる。
The coating solution can be applied without any particular limitation as long as it can be applied uniformly and thinly to the substrate. Specific examples include spin coating, dip coating, die coating, spray coating, bar coater coating, roll coating, and curtain. Means such as flow coat can be used.

【0025】塗液中、本発明の光学薄膜を形成するため
の硬化組成物は、好ましくは、光学膜厚に均一に塗布し
た後、熱硬化する。本発明の光学薄膜を形成して反射防
止性能を施すことのできる基板にとくに制限はなく、た
とえば、ガラス、ポリカーボネートやアクリル樹脂など
の樹脂成形物、ポリエチレンテレフタレートフィルムな
どのフィルム類などの光反射防止に効果的に利用するこ
とができる。本発明含フッ素化合物で形成した薄膜は前
記特性の他にも撥水性や撥油性などの優れた特性を具備
するので、それらの特性を利用することもできる。基材
の形状に特別な制限はない。
In the coating solution, the curable composition for forming the optical thin film of the present invention is preferably heat-cured after being uniformly applied to an optical film thickness. There is no particular limitation on the substrate on which the optical thin film of the present invention can be formed to provide antireflection performance. For example, glass, resin moldings such as polycarbonate and acrylic resin, films such as polyethylene terephthalate film, etc. Can be used effectively. Since the thin film formed of the fluorine-containing compound of the present invention has excellent properties such as water repellency and oil repellency in addition to the above properties, those properties can also be used. There is no particular limitation on the shape of the substrate.

【0026】本発明の光学薄膜は基材に単層としてのみ
ではなく、他の薄膜と積層して形成することもできる。
たとえば、密着性や塗布性を向上させるために基材を表
面処理したり、基材の硬度を向上させるためにハードコ
ート層を積層して光反射防止性物品にすることができ
る。さらに、基材の反射防止効果を高めるために、高屈
折率の光学薄膜を基材と本発明の光学薄膜との中間に形
成することもできる。本発明の光学薄膜と高屈折率薄膜
とを交互に積層することにより、より優れた反射防止膜
を得ることもできる。この高屈折率膜は、基材と同等も
しくはそれ以上の屈折率が必要であり、具体的には少な
くとも1.58が好ましく、さらに好ましくは、1.6
以上、より好ましくは、1.7以上である。
The optical thin film of the present invention can be formed not only as a single layer on a substrate but also as a laminate with another thin film.
For example, the base material may be subjected to a surface treatment in order to improve the adhesiveness and the coatability, or a hard coat layer may be laminated to improve the hardness of the base material to obtain an antireflection article. Further, in order to enhance the antireflection effect of the substrate, an optical thin film having a high refractive index may be formed between the substrate and the optical thin film of the present invention. By alternately laminating the optical thin film and the high refractive index thin film of the present invention, a more excellent antireflection film can be obtained. The high-refractive-index film needs to have a refractive index equal to or higher than that of the base material, and specifically, is preferably at least 1.58, more preferably 1.6.
Above, more preferably 1.7 or more.

【0027】本発明の光学薄膜を他の薄膜と積層して基
材表面に形成した光反射防止性物品の好ましい実施態様
例を説明する。基材のポリカーボネートやメタクリル樹
脂などの表面に、硬度付与と干渉縞発生を防止するため
に基材との屈折率差が±0.02以内,厚さ2〜5μm
程度のハードコート層を設けることが望まれる。ハード
コート層は、有機系または無機系のバインダーに、必要
によりSi,Sb,Ce,Ti,Snなどの金属酸化物
超微粒子、すなわち一般的には可視光線の波長よりも小
さい粒子径の微粒子を添加した塗膜を用いる。有機バイ
ンダーとしては、エポキシ樹脂硬化物やラジカル架橋重
合した樹脂などが、無機系バインダーとしては、シラン
系化合物の加水分解硬化物などがあるが、特に制限はな
い。硬化には一般的に熱硬化法よりも光硬化法を用いる
方が硬化速度が速く好ましい。
A preferred embodiment of an antireflective article formed by laminating the optical thin film of the present invention with another thin film and forming it on the surface of a substrate will be described. In order to impart hardness and prevent interference fringes on the surface of the base material such as polycarbonate or methacrylic resin, the difference in refractive index from the base material is within ± 0.02, and the thickness is 2-5 μm.
It is desired to provide a hard coat layer of a certain degree. The hard coat layer is made of an organic or inorganic binder and, if necessary, ultrafine metal oxide particles such as Si, Sb, Ce, Ti, and Sn, that is, fine particles having a particle diameter smaller than the wavelength of visible light. Use the added coating. Examples of the organic binder include a cured epoxy resin and a resin obtained by radical cross-linking polymerization, and examples of the inorganic binder include a hydrolyzed cured product of a silane-based compound, but are not particularly limited. In general, it is preferable to use a photo-curing method for curing because of a higher curing speed than a thermal curing method.

【0028】さらに、ハードコート層と本発明光学薄膜
との間に前記の高屈折率膜を積層して高い反射防止性を
得るためには、高屈折率膜の厚さを90〜400nm、
より好ましくは110〜180nmに形成する。高屈折
率膜は一般に、金属酸化物の真空蒸着膜か、あるいはペ
ンタエリスリトールトリアクリレート、2−ヒドロキシ
−3−フェノキシアクリレートなどの(メタ)アクリレ
ート類;シラン類;エポキシ樹脂類などをバインダーと
して、Sb,Ce,Ti,Snなどの金属酸化物超微粒
子を含有させた層である。金属酸化物に導電性がある場
合は滞電防止性を付与できて好ましい。また、バインダ
ーを光硬化法で硬化できれば硬化速度が速く好ましい。
Further, in order to obtain a high antireflection property by laminating the high refractive index film between the hard coat layer and the optical thin film of the present invention, the high refractive index film must have a thickness of 90 to 400 nm.
More preferably, the thickness is set to 110 to 180 nm. The high-refractive-index film is generally formed by vacuum deposition of a metal oxide or (b) Sb using a (meth) acrylate such as pentaerythritol triacrylate or 2-hydroxy-3-phenoxyacrylate; a silane; an epoxy resin as a binder. , Ce, Ti, Sn and the like. It is preferable that the metal oxide has conductivity, because it can impart a charge retention preventing property. It is preferable that the binder can be cured by a photo-curing method because the curing speed is high.

【0029】本発明は、反射率の低減を目的とした低屈
折率の光学薄膜を提供するものであり、屈折率が低いほ
ど反射率の低減に有利である。光学薄膜の膜厚は、λ/
4nの奇数倍が好ましい。ここで、λは薄膜内での光の
波長、nは薄膜の屈折率を示し、光の波長がある程度の
幅で存在している場合は、λは光の中心波長を示す。本
発明で対象となる光の波長は、多くの場合、可視光であ
り、中心波長は通常人間が敏感に感じる500〜550
nmに設定するのが好ましい。
The present invention provides an optical thin film having a low refractive index for the purpose of reducing the reflectance, and the lower the refractive index, the more advantageous the reduction of the reflectance. The thickness of the optical thin film is λ /
An odd multiple of 4n is preferred. Here, λ indicates the wavelength of light in the thin film, n indicates the refractive index of the thin film, and λ indicates the central wavelength of light when the wavelength of light exists in a certain width. The wavelength of the light targeted in the present invention is often visible light, and the center wavelength is usually 500 to 550, which is usually sensitive to humans.
It is preferably set to nm.

【0030】本発明の光学薄膜の膜厚は、薄膜の屈折率
にもよるが、好ましくは、30〜700nm、より好ま
しくは、40〜120nmである。光学薄膜の膜厚が3
0nm未満の場合は、可視光における光干渉による反射
率の低減が不十分となる場合がある。また光学薄膜の膜
厚が700nmを越える場合も、反射率はほぼ空気と薄
膜界面の反射のみに依存するようになるので可視光にお
ける光干渉による反射率の低減が不十分となる傾向があ
る。例えば、屈折率1.6の基材に屈折率1.38の薄
膜を設ける場合、膜厚が最適な光学膜厚のときは反射率
は1%以下となるが、数μ以上の膜厚の場合は反射率は
およそ3%となる。また、その光学薄膜の屈折率が1.
46よりも高い場合は、ポリメチルメタクリレートやガ
ラスなどの比較的屈折率の低い基材に対する反射防止処
理効果は顕著に認められない。
The thickness of the optical thin film of the present invention depends on the refractive index of the thin film, but is preferably 30 to 700 nm, more preferably 40 to 120 nm. Optical film thickness is 3
If it is less than 0 nm, the reduction of the reflectance due to light interference with visible light may be insufficient. Also, when the thickness of the optical thin film exceeds 700 nm, the reflectivity substantially depends only on the reflection at the interface between air and the thin film, so that the reflectivity tends to be insufficiently reduced due to light interference in visible light. For example, when a thin film having a refractive index of 1.38 is provided on a base material having a refractive index of 1.6, the reflectance is 1% or less when the film thickness is an optimum optical film thickness, but the film thickness is several μm or more. In this case, the reflectance is about 3%. The optical thin film has a refractive index of 1.
When it is higher than 46, the effect of the antireflection treatment on a substrate having a relatively low refractive index such as polymethyl methacrylate or glass is not remarkably recognized.

【0031】[0031]

【実施例】本発明を実施例をあげてさらに具体的に説明
する。なお、以下の実施例および参考例において用いた
評価手段および測定手段は次の通りである。 a.膜の厚さ:エリプソメータによる測定値。 b.片面反射率:測定面の裏面をサンドペーパで粗面化
した後、油性インキで黒塗りし、分光光度計を用い、5
40nmにおける測定面の反射率を測定した。
EXAMPLES The present invention will be described more specifically with reference to examples. The evaluation means and measurement means used in the following examples and reference examples are as follows. a. Film thickness: Measured with an ellipsometer. b. Single-sided reflectivity: After roughening the back surface of the measurement surface with sandpaper, it is painted black with oil-based ink, and then measured with a spectrophotometer.
The reflectance of the measurement surface at 40 nm was measured.

【0032】c.干渉縞:蛍光灯スタンドの20cm下
にサンプルを静置し、肉眼観察により評価した。 d.耐擦傷性:消しゴム(No.50(ライオン(株)
製)を接触面積約0.5cm2 、荷重1kgで反射面上
を20回往復させた後、肉眼判定し、擦過痕が認められ
ないものを合格判定した。 さらに、本発明を実施例を用いて具体的に説明する。
C. Interference fringes: The sample was allowed to stand 20 cm below the fluorescent lamp stand, and evaluated by visual observation. d. Scratch resistance: Eraser (No. 50 (Lion Corporation)
Was reciprocated 20 times on the reflecting surface with a contact area of about 0.5 cm 2 and a load of 1 kg, and was visually judged. Those having no scratches were judged to be acceptable. Further, the present invention will be specifically described with reference to examples.

【0033】実施例1 表1に記載の組成の溶液を調合し、40℃で6時間反応
させた結果、次の構造式(9)で示される含フッ素化合
物含む溶液Rを得た。この含フッ素化合物の屈折率は、
nd=1.40であった。
Example 1 A solution having the composition shown in Table 1 was prepared and reacted at 40 ° C. for 6 hours to obtain a solution R containing a fluorine-containing compound represented by the following structural formula (9). The refractive index of this fluorine-containing compound is
nd = 1.40.

【0034】[0034]

【化7】 Embedded image

【0035】[0035]

【表1】 ついで、得られた溶液Rを用い、つぎの組成の加水分解
液である塗料Aを調合した。
[Table 1] Next, using the obtained solution R, a coating material A, which is a hydrolysis liquid having the following composition, was prepared.

【0036】塗料A 溶液R 15 重量部 イソプロパノール 85 重量部10N塩酸 0.5重量部 さらに、調合した塗料Aを厚さ2mmのポリカーボネー
ト板の表面ににスピンコートし、80℃のオープンで2
時間、加熱処理した。続いて130℃のオープンで2時
間、硬化処理し、本発明の光学薄膜である厚さ95nm
の硬化膜を形成した。形成した光学薄膜の屈折率はnd
=1.44、片面反射率は1.5%であった。
The coating solution A R 15 parts by weight Isopropanol 85 parts by weight of 1/10 N hydrochloric acid 0.5 parts by weight Further, spin-coated on the surface of a polycarbonate plate having a thickness of 2mm paint A was formulated, in an open and 80 ° C. 2
Heated for hours. Subsequently, the film is cured at 130 ° C. for 2 hours, and the thickness of the optical thin film of the present invention is 95 nm
A cured film was formed. The refractive index of the formed optical thin film is nd
= 1.44, and the single-sided reflectance was 1.5%.

【0037】参考例1 ブランクサンプルとして、実施例1で用いたのと同じポ
リカーボネート板の片面反射率を測定したところ5.2
%であった。
Reference Example 1 As a blank sample, the same single-sided reflectance of the same polycarbonate plate as used in Example 1 was measured.
%Met.

【0038】実施例2 表2に記載の組成の溶液を調合し、40℃で6時間反応
させた。得られた反応液(以下、溶液Sとする。)中に
は、表3の構造式(a)で示される化合物1モルに、構
造式(b)で示される化合物2モルがウレタン結合した
含フッ素化合物が合成されていた。この含フッ素化合物
の屈折率を測定したところ、1.39であった。
Example 2 A solution having the composition shown in Table 2 was prepared and reacted at 40 ° C. for 6 hours. The obtained reaction solution (hereinafter, referred to as solution S) contains 2 mol of the compound represented by Structural Formula (b) and 1 mol of the compound represented by Structural Formula (a) in Table 3 containing a urethane bond. A fluorine compound had been synthesized. The measured refractive index of the fluorine-containing compound was 1.39.

【0039】[0039]

【表2】 溶液Sを用い、つぎの組成の加水分解液である塗料Bを
調合した。実施例1と同様にして塗料Bをポリカーボネ
ート板の表面に塗布、硬化させ、本発明の光学薄膜を形
成した。この光学薄膜の屈折率はnd=1.44、片面
反射率は1.5%であった。
[Table 2] Using the solution S, a paint B, which is a hydrolysis solution having the following composition, was prepared. Paint B was applied to the surface of a polycarbonate plate and cured in the same manner as in Example 1 to form an optical thin film of the present invention. The refractive index of this optical thin film was nd = 1.44, and the single-sided reflectance was 1.5%.

【0040】塗料B 溶液S 30 重量部 メチルトリエトキシシラン 2 重量部 イソプロパノール 60 重量部10N塩酸 1.2重量部 実施例3 表3に記載の組成の加水分解物である塗料Cを調合し
た。実施例1と同様にして塗料Cをポリカーボネート板
の表面に塗布、硬化させ、本発明の光学薄膜を形成し
た。この光学薄膜の屈折率はnd=1.45、片面反射
率は1.7%であった。
The formulated coating C is hydrolysis product of the composition according to the coating solution B S 30 parts by weight of methyltriethoxysilane and 2 parts by weight of isopropanol 60 parts by weight of 1/10 N hydrochloric acid 1.2 parts by weight Example 3 Table 3 did. Paint C was applied to the surface of a polycarbonate plate and cured in the same manner as in Example 1 to form an optical thin film of the present invention. The refractive index of this optical thin film was nd = 1.45, and the single-sided reflectance was 1.7%.

【0041】[0041]

【表3】 実施例4〜6 屈折率が1.59、厚さが2mmのポリカーボネート板
の表面に、五酸化アンチモン超微粒子、ペンタエリスリ
トールトリアクリレート、2−ヒドロキシ−3−フェノ
キシアクリレートを主成分として光硬化した、屈折率
1.59、厚さ3μmのハードコート層を形成した。さ
らにハードコート層の表面に実施例1と同様にして塗料
A,B,Cを塗布し、硬化させて光学薄膜を積層、形成
した。形成した光学薄膜を評価したところ、いずれも高
い耐擦傷性を示した。その他の評価結果を表4に示す。
[Table 3] Examples 4 to 6 The surface of a polycarbonate plate having a refractive index of 1.59 and a thickness of 2 mm was photocured with ultrafine antimony pentoxide, pentaerythritol triacrylate, and 2-hydroxy-3-phenoxyacrylate as main components. A hard coat layer having a refractive index of 1.59 and a thickness of 3 μm was formed. Further, paints A, B, and C were applied to the surface of the hard coat layer in the same manner as in Example 1, and cured to form an optical thin film. When the formed optical thin films were evaluated, all showed high scratch resistance. Table 4 shows other evaluation results.

【0042】[0042]

【表4】 実施例7〜9 実施例4〜6と同様にしてポリカーボネート板の表面に
ハードコート層を形成した。形成したハードコート層の
表面にアンチモンドープ酸化スズ超微粒子、ペンタエリ
スリトールトリアクリレート、2−ヒドロキシ−3−フ
ェノキシアクリレートを主成分とする組成物膜を光硬化
により積層し、厚さ150nm、屈折率nd=1.7
0、表面抵抗値2×109Ω/□の導電性の高屈折率層
を得た。さらに、この高屈折率層の表面に、実施例1と
同様にして塗料A,B,Cを塗布し、硬化させて光学薄
膜を積層、形成した。形成した光学薄膜を評価したとこ
ろ、いずれも高い耐擦傷性を示した。その他の評価結果
を表5に示す。
[Table 4] Examples 7 to 9 A hard coat layer was formed on the surface of a polycarbonate plate in the same manner as in Examples 4 to 6. A composition film mainly composed of antimony-doped tin oxide ultrafine particles, pentaerythritol triacrylate, and 2-hydroxy-3-phenoxyacrylate is laminated on the surface of the formed hard coat layer by photocuring, and has a thickness of 150 nm and a refractive index of nd. = 1.7
A conductive high refractive index layer having a surface resistance of 2 × 109 Ω / □ was obtained. Further, paints A, B, and C were applied on the surface of the high refractive index layer and cured in the same manner as in Example 1 to form an optical thin film. When the formed optical thin films were evaluated, all showed high scratch resistance. Table 5 shows other evaluation results.

【0043】[0043]

【表5】 [Table 5]

【0044】[0044]

【発明の効果】本発明が提供する新規含フッ素化合物の
硬化物は極めて低屈折率であって、硬化後の硬度が大き
く、とくに低屈折率光学薄膜として有望である。かつ、
表面硬度が大で耐擦傷性、耐久性に優れている。他に
も、はっ水性や耐油性にも高い効果を奏する。しかも、
硬化前は溶剤に可溶なため、簡便かつ連続処理が可能で
経済的な溶液コーティングにより塗布し、硬化すること
ができる。また、ハードコート層や高屈折率膜に重ねて
本発明の低屈折率膜を形成し、耐擦傷性、光反射防止性
能をさらに向上させ、多機能性を付与することができ
る。光学薄膜以外にも光学フィルター、各種の表示部
材、展示部材、透明部材、光学機器の構成素材などへの
利用が期待される。
The cured product of the novel fluorine-containing compound provided by the present invention has an extremely low refractive index, has a high hardness after curing, and is particularly promising as an optical thin film having a low refractive index. And,
It has high surface hardness and excellent scratch resistance and durability. In addition, it has high effects on water repellency and oil resistance. Moreover,
Before curing, since it is soluble in a solvent, it can be applied and cured by economical solution coating, which enables simple and continuous processing and is economical. Further, the low refractive index film of the present invention is formed on the hard coat layer or the high refractive index film to further improve the scratch resistance and the antireflection performance, and to impart multifunctionality. In addition to the optical thin film, it is expected to be used for optical filters, various display members, display members, transparent members, constituent materials of optical devices, and the like.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI C09K 3/00 C09K 3/00 U G02B 1/11 G02B 1/10 A ────────────────────────────────────────────────── ─── Continued on the front page (51) Int.Cl. 6 Identification code FI C09K 3/00 C09K 3/00 U G02B 1/11 G02B 1/10 A

Claims (10)

【特許請求の範囲】[Claims] 【請求項1】次の一般式(1)で示される含フッ素化合
物。 【化1】
1. A fluorine-containing compound represented by the following general formula (1). Embedded image
【請求項2】次の一般式(2)で示される化合物と一般
式(3)で示される化合物とをウレタン化反応させ、前
記の一般式(1)で示される含フッ素化合物を製造する
ことを特徴とする含フッ素化合物の製造方法。 【化2】
2. A compound represented by the following general formula (2) and a compound represented by the following general formula (3) are subjected to a urethanation reaction to produce a fluorine-containing compound represented by the above general formula (1). A method for producing a fluorine-containing compound, characterized in that: Embedded image
【請求項3】一般式(1)で示される含フッ素化合物を
含有する組成物を硬化して形成された、屈折率が1.4
6を超えない薄膜からなることを特徴とする光学薄膜。
3. A composition having a refractive index of 1.4 formed by curing a composition containing the fluorine-containing compound represented by the general formula (1).
An optical thin film comprising a thin film not exceeding 6.
【請求項4】前記の薄膜の厚さが30ないし700nm
であることを特徴とする請求項3記載の光学薄膜。
4. A thin film having a thickness of 30 to 700 nm.
The optical thin film according to claim 3, wherein
【請求項5】一般式(1)で示される含フッ素化合物1
00重量部に対し、100重量部を超えない量の多官能
シラン化合物が添加されて硬化されていることを特徴と
する請求項3または4に記載の光学薄膜。
5. A fluorine-containing compound 1 represented by the general formula (1)
The optical thin film according to claim 3, wherein the polyfunctional silane compound is added and hardened in an amount not exceeding 100 parts by weight with respect to 00 parts by weight.
【請求項6】一般式(1)で示される含フッ素化合物1
00重量部に対し、100重量部を超えない量の、エポ
キシ基を有する多官能シラン化合物と、100重量部を
超えない量の多官能エポキシ樹脂とが添加されて硬化さ
れていることを特徴とする請求項3、4または5に記載
の光学薄膜。
6. A fluorine-containing compound 1 represented by the general formula (1)
It is characterized by being added and cured with a polyfunctional silane compound having an epoxy group in an amount not exceeding 100 parts by weight and a polyfunctional epoxy resin in an amount not exceeding 100 parts by weight with respect to 00 parts by weight. The optical thin film according to claim 3, 4 or 5, wherein:
【請求項7】請求項3〜6のいずれかに記載の光学薄膜
を基材表面に形成してなることを特徴とする反射防止性
物品。
7. An antireflective article comprising the optical thin film according to claim 3 formed on a substrate surface.
【請求項8】基材表面と光学薄膜との中間に、有機およ
び/または無機系バインダーと金属化合物の微粒子とか
らなり、かつ、屈折率が基材の屈折率の±0.02以内
のハードコート層が形成されていることを特徴とする請
求項7記載の反射防止性物品。
8. A hard disk comprising an organic and / or inorganic binder and fine particles of a metal compound at an intermediate position between the substrate surface and the optical thin film and having a refractive index within ± 0.02 of the refractive index of the substrate. The antireflective article according to claim 7, wherein a coat layer is formed.
【請求項9】基材またはハードコート層と光学薄膜との
中間に、光学薄膜およびハードコート層の屈折率よりも
高い屈折率を有する高屈折率膜が積層されていることを
特徴とする請求項8記載の反射防止性物品。
9. A high refractive index film having a higher refractive index than the optical thin film and the hard coat layer is laminated between the substrate or the hard coat layer and the optical thin film. Item 10. An antireflective article according to Item 8.
【請求項10】前記の一般式(2)で示される化合物と
一般式(3)で示される化合物とを、イソシアネートと
反応する基をもたない有機溶剤に溶解して室温ないし8
0℃で反応させ、得られた反応溶液を含む塗液を調合
し、調合した塗液を基材の表面に塗布して硬化し、基材
の表面に屈折率が1.46を超えない光学薄膜を形成す
ることを特徴とする光反射防止性物品の製造方法。
10. A compound represented by the general formula (2) and a compound represented by the general formula (3) are dissolved in an organic solvent having no group capable of reacting with isocyanate at room temperature to 8 ° C.
A reaction is performed at 0 ° C., a coating liquid containing the obtained reaction solution is prepared, and the prepared coating liquid is applied to the surface of the substrate and cured, and the refractive index on the surface of the substrate does not exceed 1.46. A method for producing an antireflective article, comprising forming a thin film.
JP18955297A 1997-07-15 1997-07-15 Fluorine-containing compound, optical thin film and antireflection article Expired - Fee Related JP3944957B2 (en)

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