JPH1140657A5 - Sample holding device, reticle holding device and scanning exposure apparatus - Google Patents
Sample holding device, reticle holding device and scanning exposure apparatusInfo
- Publication number
- JPH1140657A5 JPH1140657A5 JP1997196698A JP19669897A JPH1140657A5 JP H1140657 A5 JPH1140657 A5 JP H1140657A5 JP 1997196698 A JP1997196698 A JP 1997196698A JP 19669897 A JP19669897 A JP 19669897A JP H1140657 A5 JPH1140657 A5 JP H1140657A5
- Authority
- JP
- Japan
- Prior art keywords
- reticle
- stage
- sample
- holding
- holding device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Description
【０００１】
【発明の属する技術分野】
本発明は、半導体回路パターンや液晶素子パターンなどが形成されたレチクルやマスク、あるいはそのようなパターンが投影露光される感光基板をステージ上で保持することができる試料保持装置やレチクル保持装置に関する。また本発明は、レチクルやマスクと感応基板とを投影光学系を挟んで同期して移動する走査型露光装置に関する。
[0001]
[Technical Field to which the Invention Belongs]
The present invention relates to a sample holder and a reticle holder capable of holding on a stage a reticle or mask on which a semiconductor circuit pattern, a liquid crystal element pattern, or the like is formed, or a photosensitive substrate onto which such a pattern is projected and exposed.The present invention also relates to a scanning exposure apparatus that moves the reticle or mask and the photosensitive substrate in synchronization with each other across a projection optical system.
本発明は、ステージの加速減時の慣性力で試料ずれが起きにくくするとともに、試料の表面が歪まないよう試料を固定保持する試料保持装置、レチクル保持装置およびその試料保持装置やレチクル保持装置を備えた走査型露光装置を提供することを目的としている。 The present invention aims to provide a sample holding device and a reticle holding device that prevent the sample from shifting due to inertial forces when the stage is accelerated or decelerated, and that fix and hold the sample so that the surface of the sample is not distorted , as well as a scanning exposure apparatus equipped with the sample holding device and the reticle holding device .
【０００５】
【課題を解決するための手段】
一実施の形態の図１〜４に対応づけて本発明を説明する。
（１）請求項１の発明は、少なくとも一方向に移動可能なステージ４に載置された平面状の試料３を保持する試料保持装置６０に適用される。そして試料３の複数の箇所を、ばね力によるその押圧力を独立して調節可能に、かつステージ４に対してそれぞれ個別に挟持する複数の押圧装置７０ａ〜７０ｃを備えることにより、上記目的を達成する。
（２）請求項２の発明のように、試料３を真空吸着する真空吸着装置を併せて備えるのが好ましい。
（３）請求項３の発明による試料保持装置６０は、回動可能に軸支されたクランパ６３に押圧装置７０ａ〜７０ｃを設け、クランパ６３を介してステージ４と押圧装置７０ａ〜７０ｃとの間で試料３を挟持するようにしたものであり、この場合、クランパ６３の回動軸心６２を試料３の表面高さにほぼ一致させるものである。
（４）請求項４の発明は、請求項１〜３のいずれか一項に記載の試料保持装置６０において、押圧力は、ステージ４の移動速度又は加速度に応じて調整されることを特徴とする。
（５）請求項５の発明は、パターンが形成されたレチクル３を請求項１〜４のいずれかの試料保持装置６０により固定保持するレチクルステージ４と、パターンを露光する感応基板１０を保持する基板ステージ１３と、レチクル３を透過した照明光を感応基板１０に投影する投影光学系９とを備え、レチクルステージ４と基板ステージ１３を同期して移動しつつパターンを感応基板１０に投影する走査型露光装置である。
（６）請求項６の発明は、少なくとも一方向に移動可能なレチクルステージ４上に載置された平面状のレチクル３を保持するレチクル保持装置６０に適用され、レチクル３の複数の箇所の各々を、ばね力によるレチクル押圧力を用いてレチクルステージ４に対してそれぞれ個別に挟持する複数の押圧装置７０ａ〜７０ｃと、レチクルステージ４上に設けられ、レチクル３をレチクルステージ４上に真空吸着する真空吸着装置と、を有し、複数の押圧装置７０ａ〜７０ｃによるレチクル押圧力と、真空吸着装置による真空吸着力とによるレチクル保持力を用いて、レチクルを保持することを特徴とする。
[0005]
[Means for solving the problem]
The present invention will be described with reference to FIGS. 1 to 4 showing one embodiment.
(1) The invention of claim 1 is applied to a sample holder 60 that holds a planar sample 3 placed on a stage 4 that is movable in at least one direction. The object is achieved by providing a plurality of pressing devices 70a to 70c that individually clamp a plurality of points of the sample 3 against the stage 4, with the pressing force of the springs being independently adjustable.
(2) As in the invention of claim 2, it is preferable to additionally provide a vacuum suction device for vacuum-sucking the sample 3.
(3) The sample holding device 60 according to the invention of claim 3 is provided with pressure devices 70a to 70c on a rotatably supported clamper 63, and the sample 3 is clamped between the stage 4 and the pressure devices 70a to 70c via the clamper 63. In this case, the rotation axis 62 of the clamper 63 is made to approximately coincide with the surface height of the sample 3.
(4) The invention of claim 4 is characterized in that in the sample holder 60 according to any one of claims 1 to 3, the pressing force is adjusted in accordance with the moving speed or acceleration of the stage 4.
(5) The invention of claim 5 is a scanning exposure apparatus comprising a reticle stage 4 that fixes and holds a reticle 3 on which a pattern is formed using a sample holding device 60 of any one of claims 1 to 4, a substrate stage 13 that holds a sensitive substrate 10 on which the pattern is exposed, and a projection optical system 9 that projects illumination light that has passed through the reticle 3 onto the sensitive substrate 10, and projects the pattern onto the sensitive substrate 10 while moving the reticle stage 4 and the substrate stage 13 in synchronization.
(6) The invention of claim 6 is applied to a reticle holding device 60 that holds a planar reticle 3 placed on a reticle stage 4 that is movable in at least one direction, and includes a plurality of pressing devices 70a to 70c that individually clamp each of a plurality of locations of the reticle 3 against the reticle stage 4 using a reticle pressing force generated by a spring force, and a vacuum suction device that is provided on the reticle stage 4 and vacuum-sucks the reticle 3 onto the reticle stage 4, and is characterized in that the reticle is held using a reticle holding force that is the combination of the reticle pressing forces of the plurality of pressing devices 70a to 70c and the vacuum suction force of the vacuum suction device.
Claims (6)
前記試料の複数の箇所を、ばね力によるその押圧力を独立して調節可能に、かつ前記ステージに対してそれぞれ個別に挟持する複数の押圧装置を備えることを特徴とする試料保持装置。 A sample holder for holding a planar sample placed on a stage that is movable in at least one direction,
A sample holder comprising a plurality of pressing devices that can independently adjust the pressing force of springs at a plurality of points on the sample and that individually clamp the sample against the stage.
前記ステージは前記試料を真空吸着する真空吸着装置を併せて備えることを特徴とする試料保持装置。 2. The sample holder of claim 1,
The sample holder is characterized in that the stage also includes a vacuum suction device for vacuum-suctioning the sample.
前記押圧装置のそれぞれは、前記ステージとの間で前記試料を挟持するために回動可能に軸支されたクランパに設けられ、前記クランパの回動軸心を前記試料の表面高さにほぼ一致させたことを特徴とする試料保持装置。 2. The sample holder of claim 1,
a sample holder, characterized in that each of the pressing devices is provided on a clamper that is rotatably supported to clamp the sample between itself and the stage, and the rotation axis of the clamper is approximately aligned with the surface height of the sample.
前記パターンを露光する感応基板を保持する基板ステージと、a substrate stage for holding a sensitive substrate onto which the pattern is to be exposed;
前記レチクルを透過した照明光を前記感応基板に投影する投影光学系とを備え、a projection optical system that projects illumination light that has passed through the reticle onto the photosensitive substrate;
前記レチクルステージと基板ステージとを同期して移動しつつ前記パターンを前記感応基板に投影することを特徴とする走査型露光装置。a scanning exposure apparatus that projects the pattern onto the sensitive substrate while moving the reticle stage and the substrate stage in synchronization with each other;
前記レチクルの複数の箇所の各々を、ばね力によるレチクル押圧力を用いて前記レチクルステージに対してそれぞれ個別に挟持する複数の押圧装置と、a plurality of pressing devices that individually clamp each of a plurality of locations of the reticle against the reticle stage using a reticle pressing force generated by a spring;
前記レチクルステージ上に設けられ、前記レチクルを該ステージ上に真空吸着する真空吸着装置と、を有し、a vacuum suction device provided on the reticle stage for vacuum-suctioning the reticle onto the stage;
前記複数の押圧装置による前記レチクル押圧力と、前記真空吸着装置による真空吸着力とによるレチクル保持力を用いて、前記レチクルを保持することを特徴とするレチクル保持装置。a reticle holding device that holds the reticle using a reticle holding force that is the reticle pressing force of the plurality of pressing devices and a vacuum suction force of the vacuum suction device;
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9196698A JPH1140657A (en) | 1997-07-23 | 1997-07-23 | Sample holding device and scanning exposure device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9196698A JPH1140657A (en) | 1997-07-23 | 1997-07-23 | Sample holding device and scanning exposure device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH1140657A JPH1140657A (en) | 1999-02-12 |
| JPH1140657A5 true JPH1140657A5 (en) | 2005-06-09 |
Family
ID=16362107
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9196698A Withdrawn JPH1140657A (en) | 1997-07-23 | 1997-07-23 | Sample holding device and scanning exposure device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH1140657A (en) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100855527B1 (en) * | 2001-02-13 | 2008-09-01 | 가부시키가이샤 니콘 | Holding device, holding method, exposure device and device manufacturing method |
| KR20170018113A (en) | 2003-04-09 | 2017-02-15 | 가부시키가이샤 니콘 | Exposure method and apparatus, and device manufacturing method |
| JPWO2004109780A1 (en) | 2003-06-04 | 2006-07-20 | 株式会社ニコン | STAGE APPARATUS, FIXING METHOD, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD |
| TW201834020A (en) | 2003-10-28 | 2018-09-16 | 日商尼康股份有限公司 | Illumination optical device, exposure device, exposure method, and component manufacturing method |
| TW201809801A (en) | 2003-11-20 | 2018-03-16 | 日商尼康股份有限公司 | Optical illumination device, exposure device, exposure method, and component manufacturing method |
| TWI389174B (en) | 2004-02-06 | 2013-03-11 | 尼康股份有限公司 | Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method |
| EP1839091A1 (en) | 2004-12-23 | 2007-10-03 | ASML Netherlands B.V. | Support structure and lithographic apparatus |
| JP2006195062A (en) * | 2005-01-12 | 2006-07-27 | Fuji Photo Film Co Ltd | Clamping device and image forming apparatus |
| EP2660854B1 (en) | 2005-05-12 | 2017-06-21 | Nikon Corporation | Projection optical system, exposure apparatus and exposure method |
| US7352438B2 (en) * | 2006-02-14 | 2008-04-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP5267029B2 (en) | 2007-10-12 | 2013-08-21 | 株式会社ニコン | Illumination optical apparatus, exposure apparatus, and device manufacturing method |
| US8379187B2 (en) | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| US9116346B2 (en) | 2007-11-06 | 2015-08-25 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
| JP2011023425A (en) * | 2009-07-13 | 2011-02-03 | Canon Inc | Stage apparatus, exposure apparatus, and method of manufacturing device |
-
1997
- 1997-07-23 JP JP9196698A patent/JPH1140657A/en not_active Withdrawn
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