JPS4831108A - - Google Patents
Info
- Publication number
- JPS4831108A JPS4831108A JP6618471A JP6618471A JPS4831108A JP S4831108 A JPS4831108 A JP S4831108A JP 6618471 A JP6618471 A JP 6618471A JP 6618471 A JP6618471 A JP 6618471A JP S4831108 A JPS4831108 A JP S4831108A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Filtering Materials (AREA)
- Powder Metallurgy (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6618471A JPS5032047B2 (de) | 1971-08-27 | 1971-08-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6618471A JPS5032047B2 (de) | 1971-08-27 | 1971-08-27 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4831108A true JPS4831108A (de) | 1973-04-24 |
| JPS5032047B2 JPS5032047B2 (de) | 1975-10-17 |
Family
ID=13308488
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6618471A Expired JPS5032047B2 (de) | 1971-08-27 | 1971-08-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5032047B2 (de) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60113369U (ja) * | 1984-01-09 | 1985-07-31 | 株式会社日立国際電気 | 真空容器へのガス急速供給装置 |
| US6380099B2 (en) | 1998-01-14 | 2002-04-30 | Canon Kabushiki Kaisha | Porous region removing method and semiconductor substrate manufacturing method |
-
1971
- 1971-08-27 JP JP6618471A patent/JPS5032047B2/ja not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60113369U (ja) * | 1984-01-09 | 1985-07-31 | 株式会社日立国際電気 | 真空容器へのガス急速供給装置 |
| US6380099B2 (en) | 1998-01-14 | 2002-04-30 | Canon Kabushiki Kaisha | Porous region removing method and semiconductor substrate manufacturing method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5032047B2 (de) | 1975-10-17 |