JPS4939736B1 - - Google Patents
Info
- Publication number
- JPS4939736B1 JPS4939736B1 JP2112069A JP2112069A JPS4939736B1 JP S4939736 B1 JPS4939736 B1 JP S4939736B1 JP 2112069 A JP2112069 A JP 2112069A JP 2112069 A JP2112069 A JP 2112069A JP S4939736 B1 JPS4939736 B1 JP S4939736B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2112069A JPS4939736B1 (de) | 1969-03-20 | 1969-03-20 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2112069A JPS4939736B1 (de) | 1969-03-20 | 1969-03-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4939736B1 true JPS4939736B1 (de) | 1974-10-28 |
Family
ID=12046005
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2112069A Pending JPS4939736B1 (de) | 1969-03-20 | 1969-03-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS4939736B1 (de) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6162301A (en) * | 1997-10-21 | 2000-12-19 | Lam Research Corporation | Methods and apparatus for cleaning semiconductor substrates after polishing of copper film |
| US6303551B1 (en) | 1997-10-21 | 2001-10-16 | Lam Research Corporation | Cleaning solution and method for cleaning semiconductor substrates after polishing of cooper film |
| US6479443B1 (en) | 1997-10-21 | 2002-11-12 | Lam Research Corporation | Cleaning solution and method for cleaning semiconductor substrates after polishing of copper film |
| US6593282B1 (en) | 1997-10-21 | 2003-07-15 | Lam Research Corporation | Cleaning solutions for semiconductor substrates after polishing of copper film |
| JP2015196857A (ja) * | 2014-03-31 | 2015-11-09 | 栗田エンジニアリング株式会社 | 化学洗浄方法 |
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1969
- 1969-03-20 JP JP2112069A patent/JPS4939736B1/ja active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6162301A (en) * | 1997-10-21 | 2000-12-19 | Lam Research Corporation | Methods and apparatus for cleaning semiconductor substrates after polishing of copper film |
| US6165956A (en) * | 1997-10-21 | 2000-12-26 | Lam Research Corporation | Methods and apparatus for cleaning semiconductor substrates after polishing of copper film |
| US6303551B1 (en) | 1997-10-21 | 2001-10-16 | Lam Research Corporation | Cleaning solution and method for cleaning semiconductor substrates after polishing of cooper film |
| US6479443B1 (en) | 1997-10-21 | 2002-11-12 | Lam Research Corporation | Cleaning solution and method for cleaning semiconductor substrates after polishing of copper film |
| US6593282B1 (en) | 1997-10-21 | 2003-07-15 | Lam Research Corporation | Cleaning solutions for semiconductor substrates after polishing of copper film |
| JP2015196857A (ja) * | 2014-03-31 | 2015-11-09 | 栗田エンジニアリング株式会社 | 化学洗浄方法 |