JPS5019427A - - Google Patents

Info

Publication number
JPS5019427A
JPS5019427A JP5079374A JP5079374A JPS5019427A JP S5019427 A JPS5019427 A JP S5019427A JP 5079374 A JP5079374 A JP 5079374A JP 5079374 A JP5079374 A JP 5079374A JP S5019427 A JPS5019427 A JP S5019427A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5079374A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US00358729A external-priority patent/US3833396A/en
Priority claimed from US00358727A external-priority patent/US3837855A/en
Application filed filed Critical
Publication of JPS5019427A publication Critical patent/JPS5019427A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0548—Masks
    • H05K2203/056—Using an artwork, i.e. a photomask for exposing photosensitive layers

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Laminated Bodies (AREA)
JP5079374A 1973-05-09 1974-05-09 Pending JPS5019427A (cs)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US00358729A US3833396A (en) 1973-05-09 1973-05-09 Pattern delineation method and product so produced
US00358727A US3837855A (en) 1973-05-09 1973-05-09 Pattern delineation method and product so produced

Publications (1)

Publication Number Publication Date
JPS5019427A true JPS5019427A (cs) 1975-02-28

Family

ID=27000166

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5079374A Pending JPS5019427A (cs) 1973-05-09 1974-05-09

Country Status (4)

Country Link
JP (1) JPS5019427A (cs)
DE (1) DE2421834B2 (cs)
FR (1) FR2229142A1 (cs)
NL (1) NL7406178A (cs)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59146954A (ja) * 1982-12-28 1984-08-23 Seiko Epson Corp シ−スル−マスク
JPS6068992A (ja) * 1983-09-27 1985-04-19 Mitsui Toatsu Chem Inc 画像形成方法
JP2016212410A (ja) * 2015-04-30 2016-12-15 三星ディスプレイ株式會社Ｓａｍｓｕｎｇ Ｄｉｓｐｌａｙ Ｃｏ．，Ｌｔｄ． マスクの製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59146954A (ja) * 1982-12-28 1984-08-23 Seiko Epson Corp シ−スル−マスク
JPS6068992A (ja) * 1983-09-27 1985-04-19 Mitsui Toatsu Chem Inc 画像形成方法
JP2016212410A (ja) * 2015-04-30 2016-12-15 三星ディスプレイ株式會社Ｓａｍｓｕｎｇ Ｄｉｓｐｌａｙ Ｃｏ．，Ｌｔｄ． マスクの製造方法

Also Published As

Publication number Publication date
DE2421834A1 (de) 1974-12-05
NL7406178A (cs) 1974-11-12
FR2229142A1 (cs) 1974-12-06
DE2421834B2 (de) 1976-01-22

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