JPS5099272A - - Google Patents
Info
- Publication number
- JPS5099272A JPS5099272A JP49101792A JP10179274A JPS5099272A JP S5099272 A JPS5099272 A JP S5099272A JP 49101792 A JP49101792 A JP 49101792A JP 10179274 A JP10179274 A JP 10179274A JP S5099272 A JPS5099272 A JP S5099272A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
- H10W10/01—Manufacture or treatment
- H10W10/011—Manufacture or treatment of isolation regions comprising dielectric materials
- H10W10/019—Manufacture or treatment of isolation regions comprising dielectric materials using epitaxial passivated integrated circuit [EPIC] processes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P50/00—Etching of wafers, substrates or parts of devices
- H10P50/60—Wet etching
- H10P50/64—Wet etching of semiconductor materials
- H10P50/642—Chemical etching
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
- H10W10/10—Isolation regions comprising dielectric materials
Landscapes
- Weting (AREA)
- Element Separation (AREA)
- Semiconductor Integrated Circuits (AREA)
- Bipolar Transistors (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US42922873A | 1973-12-28 | 1973-12-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5099272A true JPS5099272A (ja) | 1975-08-06 |
| JPS5828731B2 JPS5828731B2 (ja) | 1983-06-17 |
Family
ID=23702356
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP49101792A Expired JPS5828731B2 (ja) | 1973-12-28 | 1974-09-04 | ゼツエンキバンジヨウヘノ シリコンソウサクセイホウホウ |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS5828731B2 (ja) |
| DE (1) | DE2460653C2 (ja) |
| FR (1) | FR2256537B1 (ja) |
| GB (1) | GB1494328A (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6066825A (ja) * | 1983-09-22 | 1985-04-17 | Toshiba Corp | 半導体装置の製造方法 |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54110783A (en) * | 1978-02-20 | 1979-08-30 | Hitachi Ltd | Semiconductor substrate and its manufacture |
| DE3347997C2 (ja) * | 1982-01-06 | 1991-01-24 | Canon K.K., Tokio/Tokyo, Jp | |
| US5416354A (en) * | 1989-01-06 | 1995-05-16 | Unitrode Corporation | Inverted epitaxial process semiconductor devices |
| DE3922671A1 (de) * | 1989-07-10 | 1991-01-24 | Siemens Ag | Akustoelektronisches bauelement mit einer oberflaechenwellenanordnung und einer elektronischen halbleiterschaltung |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4936792B1 (ja) * | 1970-10-15 | 1974-10-03 |
-
1974
- 1974-09-04 JP JP49101792A patent/JPS5828731B2/ja not_active Expired
- 1974-12-04 GB GB52467/74A patent/GB1494328A/en not_active Expired
- 1974-12-04 FR FR7439711A patent/FR2256537B1/fr not_active Expired
- 1974-12-20 DE DE2460653A patent/DE2460653C2/de not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6066825A (ja) * | 1983-09-22 | 1985-04-17 | Toshiba Corp | 半導体装置の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2460653A1 (de) | 1975-07-10 |
| DE2460653C2 (de) | 1986-02-06 |
| JPS5828731B2 (ja) | 1983-06-17 |
| FR2256537B1 (ja) | 1979-03-16 |
| FR2256537A1 (ja) | 1975-07-25 |
| GB1494328A (en) | 1977-12-07 |