JPS51110276A - - Google Patents

Info

Publication number
JPS51110276A
JPS51110276A JP50034994A JP3499475A JPS51110276A JP S51110276 A JPS51110276 A JP S51110276A JP 50034994 A JP50034994 A JP 50034994A JP 3499475 A JP3499475 A JP 3499475A JP S51110276 A JPS51110276 A JP S51110276A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50034994A
Other languages
Japanese (ja)
Other versions
JPS5341076B2 (cs
Inventor
Yasuhiro Horiike
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP3499475A priority Critical patent/JPS5341076B2/ja
Priority to US05/647,448 priority patent/US4123663A/en
Priority to DE2601288A priority patent/DE2601288B2/de
Publication of JPS51110276A publication Critical patent/JPS51110276A/ja
Priority to US05/933,846 priority patent/US4192706A/en
Publication of JPS5341076B2 publication Critical patent/JPS5341076B2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP3499475A 1975-01-22 1975-03-25 Expired JPS5341076B2 (cs)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP3499475A JPS5341076B2 (cs) 1975-03-25 1975-03-25
US05/647,448 US4123663A (en) 1975-01-22 1976-01-08 Gas-etching device
DE2601288A DE2601288B2 (de) 1975-01-22 1976-01-15 Gas-Ätzvorrichtung
US05/933,846 US4192706A (en) 1975-01-22 1978-08-15 Gas-etching device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3499475A JPS5341076B2 (cs) 1975-03-25 1975-03-25

Publications (2)

Publication Number Publication Date
JPS51110276A true JPS51110276A (cs) 1976-09-29
JPS5341076B2 JPS5341076B2 (cs) 1978-10-31

Family

ID=12429683

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3499475A Expired JPS5341076B2 (cs) 1975-01-22 1975-03-25

Country Status (1)

Country Link
JP (1) JPS5341076B2 (cs)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5370870U (cs) * 1976-11-15 1978-06-14
JPS53112065A (en) * 1977-03-11 1978-09-30 Toshiba Corp Removing method of high molecular compound
JPS5449073A (en) * 1977-09-26 1979-04-18 Mitsubishi Electric Corp Plasma processing unit
JPS5511360A (en) * 1978-07-11 1980-01-26 Tokyo Ohka Kogyo Co Ltd Plasma reaction treating system
JPS5520631U (cs) * 1978-07-26 1980-02-08
JPS5727024A (en) * 1980-07-25 1982-02-13 Mitsubishi Electric Corp Washing of reactor for plasma cvd method
JPS5789226A (en) * 1980-11-19 1982-06-03 Ibm Method of etching silicon nitride layer

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5370870U (cs) * 1976-11-15 1978-06-14
JPS53112065A (en) * 1977-03-11 1978-09-30 Toshiba Corp Removing method of high molecular compound
JPS5449073A (en) * 1977-09-26 1979-04-18 Mitsubishi Electric Corp Plasma processing unit
JPS5511360A (en) * 1978-07-11 1980-01-26 Tokyo Ohka Kogyo Co Ltd Plasma reaction treating system
JPS5520631U (cs) * 1978-07-26 1980-02-08
JPS5727024A (en) * 1980-07-25 1982-02-13 Mitsubishi Electric Corp Washing of reactor for plasma cvd method
JPS5789226A (en) * 1980-11-19 1982-06-03 Ibm Method of etching silicon nitride layer

Also Published As

Publication number Publication date
JPS5341076B2 (cs) 1978-10-31

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