JPS51112445A - Gas etching means - Google Patents

Gas etching means

Info

Publication number
JPS51112445A
JPS51112445A JP3685175A JP3685175A JPS51112445A JP S51112445 A JPS51112445 A JP S51112445A JP 3685175 A JP3685175 A JP 3685175A JP 3685175 A JP3685175 A JP 3685175A JP S51112445 A JPS51112445 A JP S51112445A
Authority
JP
Japan
Prior art keywords
gas etching
etching means
gas
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3685175A
Other languages
Japanese (ja)
Other versions
JPS5741552B2 (en
Inventor
Yasuhiro Horiike
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP3685175A priority Critical patent/JPS51112445A/en
Priority to US05/647,448 priority patent/US4123663A/en
Priority to DE2601288A priority patent/DE2601288B2/en
Publication of JPS51112445A publication Critical patent/JPS51112445A/en
Priority to US05/933,846 priority patent/US4192706A/en
Publication of JPS5741552B2 publication Critical patent/JPS5741552B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
JP3685175A 1975-01-22 1975-03-28 Gas etching means Granted JPS51112445A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP3685175A JPS51112445A (en) 1975-03-28 1975-03-28 Gas etching means
US05/647,448 US4123663A (en) 1975-01-22 1976-01-08 Gas-etching device
DE2601288A DE2601288B2 (en) 1975-01-22 1976-01-15 Gas etching device
US05/933,846 US4192706A (en) 1975-01-22 1978-08-15 Gas-etching device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3685175A JPS51112445A (en) 1975-03-28 1975-03-28 Gas etching means

Publications (2)

Publication Number Publication Date
JPS51112445A true JPS51112445A (en) 1976-10-04
JPS5741552B2 JPS5741552B2 (en) 1982-09-03

Family

ID=12481262

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3685175A Granted JPS51112445A (en) 1975-01-22 1975-03-28 Gas etching means

Country Status (1)

Country Link
JP (1) JPS51112445A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5599726A (en) * 1979-01-26 1980-07-30 Hitachi Ltd Method and device for plasma treatment
JPS55154583A (en) * 1979-05-21 1980-12-02 Nippon Telegr & Teleph Corp <Ntt> Etching processing apparatus
JPS5614678U (en) * 1979-07-12 1981-02-07
JPS6110238A (en) * 1985-05-13 1986-01-17 Hitachi Ltd Method of plasma treatment

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5599726A (en) * 1979-01-26 1980-07-30 Hitachi Ltd Method and device for plasma treatment
JPS55154583A (en) * 1979-05-21 1980-12-02 Nippon Telegr & Teleph Corp <Ntt> Etching processing apparatus
JPS5614678U (en) * 1979-07-12 1981-02-07
JPS6110238A (en) * 1985-05-13 1986-01-17 Hitachi Ltd Method of plasma treatment

Also Published As

Publication number Publication date
JPS5741552B2 (en) 1982-09-03

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