JPS51117984A - Ionization plating apparatus - Google Patents

Ionization plating apparatus

Info

Publication number
JPS51117984A
JPS51117984A JP50043958A JP4395875A JPS51117984A JP S51117984 A JPS51117984 A JP S51117984A JP 50043958 A JP50043958 A JP 50043958A JP 4395875 A JP4395875 A JP 4395875A JP S51117984 A JPS51117984 A JP S51117984A
Authority
JP
Japan
Prior art keywords
plating apparatus
high frequency
ionization plating
ionization
aim
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50043958A
Other languages
Japanese (ja)
Inventor
Yasuhiro Shimizu
Koichi Shinohara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP50043958A priority Critical patent/JPS51117984A/en
Publication of JPS51117984A publication Critical patent/JPS51117984A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To aim a rational utilization of the high frequency generator by lowering the initiation voltage of the high frequency glow for the high frequency ionization plating.
JP50043958A 1975-04-10 1975-04-10 Ionization plating apparatus Pending JPS51117984A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50043958A JPS51117984A (en) 1975-04-10 1975-04-10 Ionization plating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50043958A JPS51117984A (en) 1975-04-10 1975-04-10 Ionization plating apparatus

Publications (1)

Publication Number Publication Date
JPS51117984A true JPS51117984A (en) 1976-10-16

Family

ID=12678202

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50043958A Pending JPS51117984A (en) 1975-04-10 1975-04-10 Ionization plating apparatus

Country Status (1)

Country Link
JP (1) JPS51117984A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5385173A (en) * 1976-12-31 1978-07-27 Youichi Murayama High vacuum ion implanting method
JPS55110126A (en) * 1979-02-16 1980-08-25 Seiko Epson Corp Preparation of antireflection film
JPS5842771A (en) * 1981-09-07 1983-03-12 Sumitomo Electric Ind Ltd Ion plating device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4954235A (en) * 1972-09-27 1974-05-27
JPS49113733A (en) * 1973-03-05 1974-10-30
JPS50152985A (en) * 1974-05-31 1975-12-09

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4954235A (en) * 1972-09-27 1974-05-27
JPS49113733A (en) * 1973-03-05 1974-10-30
JPS50152985A (en) * 1974-05-31 1975-12-09

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5385173A (en) * 1976-12-31 1978-07-27 Youichi Murayama High vacuum ion implanting method
JPS55110126A (en) * 1979-02-16 1980-08-25 Seiko Epson Corp Preparation of antireflection film
JPS5842771A (en) * 1981-09-07 1983-03-12 Sumitomo Electric Ind Ltd Ion plating device

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