JPS51117986A - Sputtering apparatus - Google Patents

Sputtering apparatus

Info

Publication number
JPS51117986A
JPS51117986A JP4360375A JP4360375A JPS51117986A JP S51117986 A JPS51117986 A JP S51117986A JP 4360375 A JP4360375 A JP 4360375A JP 4360375 A JP4360375 A JP 4360375A JP S51117986 A JPS51117986 A JP S51117986A
Authority
JP
Japan
Prior art keywords
sputtering apparatus
magnetic field
film formation
discharge current
permitting rapid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4360375A
Other languages
Japanese (ja)
Inventor
Takashi Misumi
Naokichi Hosokawa
Shinya Homan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP4360375A priority Critical patent/JPS51117986A/en
Publication of JPS51117986A publication Critical patent/JPS51117986A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:A sputtering apparatus permitting rapid film formation by increasing discharge current by locally intensifying the magnetic field.
JP4360375A 1975-04-09 1975-04-09 Sputtering apparatus Pending JPS51117986A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4360375A JPS51117986A (en) 1975-04-09 1975-04-09 Sputtering apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4360375A JPS51117986A (en) 1975-04-09 1975-04-09 Sputtering apparatus

Publications (1)

Publication Number Publication Date
JPS51117986A true JPS51117986A (en) 1976-10-16

Family

ID=12668386

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4360375A Pending JPS51117986A (en) 1975-04-09 1975-04-09 Sputtering apparatus

Country Status (1)

Country Link
JP (1) JPS51117986A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09235113A (en) * 1996-03-04 1997-09-09 Tatsuo Shiyouji Evaporator for high-melting substance
US6436252B1 (en) * 2000-04-07 2002-08-20 Surface Engineered Products Corp. Method and apparatus for magnetron sputtering

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09235113A (en) * 1996-03-04 1997-09-09 Tatsuo Shiyouji Evaporator for high-melting substance
US6436252B1 (en) * 2000-04-07 2002-08-20 Surface Engineered Products Corp. Method and apparatus for magnetron sputtering

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