JPS51138433A - Method of coating photoresist - Google Patents

Method of coating photoresist

Info

Publication number
JPS51138433A
JPS51138433A JP6270475A JP6270475A JPS51138433A JP S51138433 A JPS51138433 A JP S51138433A JP 6270475 A JP6270475 A JP 6270475A JP 6270475 A JP6270475 A JP 6270475A JP S51138433 A JPS51138433 A JP S51138433A
Authority
JP
Japan
Prior art keywords
coating photoresist
electrode
formation
liquid crystal
crystal display
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6270475A
Other languages
Japanese (ja)
Inventor
Yasumasa Mori
Kenzo Kojima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP6270475A priority Critical patent/JPS51138433A/en
Publication of JPS51138433A publication Critical patent/JPS51138433A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

PURPOSE:To prevent improper side etching at etching step in a formation of electrode such as in a liquid crystal display.
JP6270475A 1975-05-26 1975-05-26 Method of coating photoresist Pending JPS51138433A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6270475A JPS51138433A (en) 1975-05-26 1975-05-26 Method of coating photoresist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6270475A JPS51138433A (en) 1975-05-26 1975-05-26 Method of coating photoresist

Publications (1)

Publication Number Publication Date
JPS51138433A true JPS51138433A (en) 1976-11-30

Family

ID=13207954

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6270475A Pending JPS51138433A (en) 1975-05-26 1975-05-26 Method of coating photoresist

Country Status (1)

Country Link
JP (1) JPS51138433A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61267521A (en) * 1986-04-18 1986-11-27 Hokko Chem Ind Co Ltd Agent for controlling saprolegniasis and capsulated-pseudomonas disease of carp

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61267521A (en) * 1986-04-18 1986-11-27 Hokko Chem Ind Co Ltd Agent for controlling saprolegniasis and capsulated-pseudomonas disease of carp

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