JPS51140575A - Photomask - Google Patents

Photomask

Info

Publication number
JPS51140575A
JPS51140575A JP6431975A JP6431975A JPS51140575A JP S51140575 A JPS51140575 A JP S51140575A JP 6431975 A JP6431975 A JP 6431975A JP 6431975 A JP6431975 A JP 6431975A JP S51140575 A JPS51140575 A JP S51140575A
Authority
JP
Japan
Prior art keywords
photomask
patterns
exactly
recognize easily
positional aberration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6431975A
Other languages
English (en)
Other versions
JPS5858807B2 (ja
Inventor
Kazuo Koga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP50064319A priority Critical patent/JPS5858807B2/ja
Publication of JPS51140575A publication Critical patent/JPS51140575A/ja
Publication of JPS5858807B2 publication Critical patent/JPS5858807B2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP50064319A 1975-05-30 1975-05-30 フオトマスク Expired JPS5858807B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50064319A JPS5858807B2 (ja) 1975-05-30 1975-05-30 フオトマスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50064319A JPS5858807B2 (ja) 1975-05-30 1975-05-30 フオトマスク

Publications (2)

Publication Number Publication Date
JPS51140575A true JPS51140575A (en) 1976-12-03
JPS5858807B2 JPS5858807B2 (ja) 1983-12-27

Family

ID=13254784

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50064319A Expired JPS5858807B2 (ja) 1975-05-30 1975-05-30 フオトマスク

Country Status (1)

Country Link
JP (1) JPS5858807B2 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5453967A (en) * 1977-10-07 1979-04-27 Canon Inc Mask and wafer for semiconductor circuit manufacture and their alignment unit

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5453967A (en) * 1977-10-07 1979-04-27 Canon Inc Mask and wafer for semiconductor circuit manufacture and their alignment unit

Also Published As

Publication number Publication date
JPS5858807B2 (ja) 1983-12-27

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