JPS51140575A - Photomask - Google Patents
PhotomaskInfo
- Publication number
- JPS51140575A JPS51140575A JP6431975A JP6431975A JPS51140575A JP S51140575 A JPS51140575 A JP S51140575A JP 6431975 A JP6431975 A JP 6431975A JP 6431975 A JP6431975 A JP 6431975A JP S51140575 A JPS51140575 A JP S51140575A
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- patterns
- exactly
- recognize easily
- positional aberration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000004075 alteration Effects 0.000 abstract 1
- 239000008188 pellet Substances 0.000 abstract 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50064319A JPS5858807B2 (ja) | 1975-05-30 | 1975-05-30 | フオトマスク |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50064319A JPS5858807B2 (ja) | 1975-05-30 | 1975-05-30 | フオトマスク |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS51140575A true JPS51140575A (en) | 1976-12-03 |
| JPS5858807B2 JPS5858807B2 (ja) | 1983-12-27 |
Family
ID=13254784
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50064319A Expired JPS5858807B2 (ja) | 1975-05-30 | 1975-05-30 | フオトマスク |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5858807B2 (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5453967A (en) * | 1977-10-07 | 1979-04-27 | Canon Inc | Mask and wafer for semiconductor circuit manufacture and their alignment unit |
-
1975
- 1975-05-30 JP JP50064319A patent/JPS5858807B2/ja not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5453967A (en) * | 1977-10-07 | 1979-04-27 | Canon Inc | Mask and wafer for semiconductor circuit manufacture and their alignment unit |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5858807B2 (ja) | 1983-12-27 |
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