JPS51147260A - Inspecting method of resist pattern - Google Patents

Inspecting method of resist pattern

Info

Publication number
JPS51147260A
JPS51147260A JP7159075A JP7159075A JPS51147260A JP S51147260 A JPS51147260 A JP S51147260A JP 7159075 A JP7159075 A JP 7159075A JP 7159075 A JP7159075 A JP 7159075A JP S51147260 A JPS51147260 A JP S51147260A
Authority
JP
Japan
Prior art keywords
inspecting method
resist pattern
defects
exposure
data used
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7159075A
Other languages
Japanese (ja)
Inventor
Noriaki Nakayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP7159075A priority Critical patent/JPS51147260A/en
Publication of JPS51147260A publication Critical patent/JPS51147260A/en
Pending legal-status Critical Current

Links

Landscapes

  • Weting (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE: An inspecting method whereby defects in resist patterns can be detected rapidly under an electronic computer control without any human help, using the same pattern data used at the time of exposure.
COPYRIGHT: (C)1976,JPO&Japio
JP7159075A 1975-06-13 1975-06-13 Inspecting method of resist pattern Pending JPS51147260A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7159075A JPS51147260A (en) 1975-06-13 1975-06-13 Inspecting method of resist pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7159075A JPS51147260A (en) 1975-06-13 1975-06-13 Inspecting method of resist pattern

Publications (1)

Publication Number Publication Date
JPS51147260A true JPS51147260A (en) 1976-12-17

Family

ID=13465032

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7159075A Pending JPS51147260A (en) 1975-06-13 1975-06-13 Inspecting method of resist pattern

Country Status (1)

Country Link
JP (1) JPS51147260A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57113227A (en) * 1980-12-19 1982-07-14 Ibm Method and device for inspecting article to be inspected with pattern
JPS57162335A (en) * 1981-03-30 1982-10-06 Nec Corp Vector scan type flaw detector
JPS5946025A (en) * 1982-09-09 1984-03-15 Hitachi Ltd Method and apparatus for detecting pattern edge
JPS59154020A (en) * 1983-02-22 1984-09-03 Victor Co Of Japan Ltd Inspection of mask
JPS622116A (en) * 1985-06-28 1987-01-08 Nec Corp Measurement of shape

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57113227A (en) * 1980-12-19 1982-07-14 Ibm Method and device for inspecting article to be inspected with pattern
JPS57162335A (en) * 1981-03-30 1982-10-06 Nec Corp Vector scan type flaw detector
JPS5946025A (en) * 1982-09-09 1984-03-15 Hitachi Ltd Method and apparatus for detecting pattern edge
JPS59154020A (en) * 1983-02-22 1984-09-03 Victor Co Of Japan Ltd Inspection of mask
JPS622116A (en) * 1985-06-28 1987-01-08 Nec Corp Measurement of shape

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