JPS51147264A - High-precision positioning system - Google Patents

High-precision positioning system

Info

Publication number
JPS51147264A
JPS51147264A JP50071597A JP7159775A JPS51147264A JP S51147264 A JPS51147264 A JP S51147264A JP 50071597 A JP50071597 A JP 50071597A JP 7159775 A JP7159775 A JP 7159775A JP S51147264 A JPS51147264 A JP S51147264A
Authority
JP
Japan
Prior art keywords
positioning system
precision positioning
prescision
independently
precision
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50071597A
Other languages
Japanese (ja)
Inventor
Hitoshi Honma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP50071597A priority Critical patent/JPS51147264A/en
Publication of JPS51147264A publication Critical patent/JPS51147264A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To allow positioning of high prescision independently of an irradiated beam.
JP50071597A 1975-06-13 1975-06-13 High-precision positioning system Pending JPS51147264A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50071597A JPS51147264A (en) 1975-06-13 1975-06-13 High-precision positioning system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50071597A JPS51147264A (en) 1975-06-13 1975-06-13 High-precision positioning system

Publications (1)

Publication Number Publication Date
JPS51147264A true JPS51147264A (en) 1976-12-17

Family

ID=13465219

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50071597A Pending JPS51147264A (en) 1975-06-13 1975-06-13 High-precision positioning system

Country Status (1)

Country Link
JP (1) JPS51147264A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52112280A (en) * 1976-03-17 1977-09-20 Mitsubishi Electric Corp X-ray exposure mask
JPS56111225A (en) * 1980-02-01 1981-09-02 Chiyou Lsi Gijutsu Kenkyu Kumiai X ray exposuring device
JP2020508578A (en) * 2017-02-15 2020-03-19 サントル ナシオナル ドゥ ラ ルシェルシェ シアンティフィクＣｅｎｔｒｅ Ｎａｔｉｏｎａｌ Ｄｅ Ｌａ Ｒｅｃｈｅｒｃｈｅ Ｓｃｉｅｎｔｉｆｉｑｕｅ Electron beam lithography process suitable for samples containing at least one fragile nanostructure
JP2020509409A (en) * 2017-02-15 2020-03-26 サントル ナシオナル ドゥ ラ ルシェルシェ シアンティフィクＣｅｎｔｒｅ Ｎａｔｉｏｎａｌ Ｄｅ Ｌａ Ｒｅｃｈｅｒｃｈｅ Ｓｃｉｅｎｔｉｆｉｑｕｅ Optical lithography process suitable for a sample containing at least one fragile light emitter

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52112280A (en) * 1976-03-17 1977-09-20 Mitsubishi Electric Corp X-ray exposure mask
JPS56111225A (en) * 1980-02-01 1981-09-02 Chiyou Lsi Gijutsu Kenkyu Kumiai X ray exposuring device
JP2020508578A (en) * 2017-02-15 2020-03-19 サントル ナシオナル ドゥ ラ ルシェルシェ シアンティフィクＣｅｎｔｒｅ Ｎａｔｉｏｎａｌ Ｄｅ Ｌａ Ｒｅｃｈｅｒｃｈｅ Ｓｃｉｅｎｔｉｆｉｑｕｅ Electron beam lithography process suitable for samples containing at least one fragile nanostructure
JP2020509409A (en) * 2017-02-15 2020-03-26 サントル ナシオナル ドゥ ラ ルシェルシェ シアンティフィクＣｅｎｔｒｅ Ｎａｔｉｏｎａｌ Ｄｅ Ｌａ Ｒｅｃｈｅｒｃｈｅ Ｓｃｉｅｎｔｉｆｉｑｕｅ Optical lithography process suitable for a sample containing at least one fragile light emitter

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