JPS51149882A - Chemical condensation apparatus - Google Patents

Chemical condensation apparatus

Info

Publication number
JPS51149882A
JPS51149882A JP50074887A JP7488775A JPS51149882A JP S51149882 A JPS51149882 A JP S51149882A JP 50074887 A JP50074887 A JP 50074887A JP 7488775 A JP7488775 A JP 7488775A JP S51149882 A JPS51149882 A JP S51149882A
Authority
JP
Japan
Prior art keywords
condensation apparatus
chemical condensation
heating furnace
chemical
low voltage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50074887A
Other languages
Japanese (ja)
Other versions
JPS5760423B2 (en
Inventor
Ginjiro Kanbara
Morio Inoue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP50074887A priority Critical patent/JPS51149882A/en
Publication of JPS51149882A publication Critical patent/JPS51149882A/en
Publication of JPS5760423B2 publication Critical patent/JPS5760423B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation by radiant heating of the substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:A chemical condensation apparatus used at low voltage which can optionally change the temperature distribution by using a combined infrared heating furnace and resistance heating furnace.
JP50074887A 1975-06-18 1975-06-18 Chemical condensation apparatus Granted JPS51149882A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50074887A JPS51149882A (en) 1975-06-18 1975-06-18 Chemical condensation apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50074887A JPS51149882A (en) 1975-06-18 1975-06-18 Chemical condensation apparatus

Publications (2)

Publication Number Publication Date
JPS51149882A true JPS51149882A (en) 1976-12-23
JPS5760423B2 JPS5760423B2 (en) 1982-12-20

Family

ID=13560316

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50074887A Granted JPS51149882A (en) 1975-06-18 1975-06-18 Chemical condensation apparatus

Country Status (1)

Country Link
JP (1) JPS51149882A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58174570A (en) * 1982-03-29 1983-10-13 エナージー・コンバーション・デバイセス・インコーポレーテッド Glow discharge deposition device containing non-horizontally placed cathode
JPS58176114A (en) * 1982-04-12 1983-10-15 Toshiba Corp Apparatus for manufacturing silicon photosensitive material
JPS5965734U (en) * 1982-10-21 1984-05-02 富士通株式会社 chemical vapor deposition equipment
JPS59163820A (en) * 1983-03-09 1984-09-14 Fujitsu Ltd Chemical vapor phase growth device
JPS6126773A (en) * 1984-07-16 1986-02-06 Canon Inc Formation of accumulated film
JPS62222631A (en) * 1986-03-24 1987-09-30 Nec Corp Vapor growth equipment
JP2022089129A (en) * 2020-12-03 2022-06-15 ウシオライティング株式会社 Heating unit and heating device

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58174570A (en) * 1982-03-29 1983-10-13 エナージー・コンバーション・デバイセス・インコーポレーテッド Glow discharge deposition device containing non-horizontally placed cathode
JPS58176114A (en) * 1982-04-12 1983-10-15 Toshiba Corp Apparatus for manufacturing silicon photosensitive material
JPS5965734U (en) * 1982-10-21 1984-05-02 富士通株式会社 chemical vapor deposition equipment
JPS59163820A (en) * 1983-03-09 1984-09-14 Fujitsu Ltd Chemical vapor phase growth device
JPS6126773A (en) * 1984-07-16 1986-02-06 Canon Inc Formation of accumulated film
JPS62222631A (en) * 1986-03-24 1987-09-30 Nec Corp Vapor growth equipment
JP2022089129A (en) * 2020-12-03 2022-06-15 ウシオライティング株式会社 Heating unit and heating device

Also Published As

Publication number Publication date
JPS5760423B2 (en) 1982-12-20

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