JPS5125432A - Mudenkaidometsukihoho - Google Patents
MudenkaidometsukihohoInfo
- Publication number
- JPS5125432A JPS5125432A JP9852174A JP9852174A JPS5125432A JP S5125432 A JPS5125432 A JP S5125432A JP 9852174 A JP9852174 A JP 9852174A JP 9852174 A JP9852174 A JP 9852174A JP S5125432 A JPS5125432 A JP S5125432A
- Authority
- JP
- Japan
- Prior art keywords
- mudenkaidometsukihoho
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Chemically Coating (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9852174A JPS5125432A (ja) | 1974-08-28 | 1974-08-28 | Mudenkaidometsukihoho |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9852174A JPS5125432A (ja) | 1974-08-28 | 1974-08-28 | Mudenkaidometsukihoho |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5125432A true JPS5125432A (ja) | 1976-03-02 |
| JPS532612B2 JPS532612B2 (ja) | 1978-01-30 |
Family
ID=14221948
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9852174A Granted JPS5125432A (ja) | 1974-08-28 | 1974-08-28 | Mudenkaidometsukihoho |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5125432A (ja) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4265943A (en) * | 1978-11-27 | 1981-05-05 | Macdermid Incorporated | Method and composition for continuous electroless copper deposition using a hypophosphite reducing agent in the presence of cobalt or nickel ions |
| JP2011231382A (ja) * | 2010-04-28 | 2011-11-17 | Nagoya Plating Co Ltd | 高分子繊維のめっき液並びにこれを用いた高分子繊維のめっき方法及びその製造方法 |
-
1974
- 1974-08-28 JP JP9852174A patent/JPS5125432A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4265943A (en) * | 1978-11-27 | 1981-05-05 | Macdermid Incorporated | Method and composition for continuous electroless copper deposition using a hypophosphite reducing agent in the presence of cobalt or nickel ions |
| JP2011231382A (ja) * | 2010-04-28 | 2011-11-17 | Nagoya Plating Co Ltd | 高分子繊維のめっき液並びにこれを用いた高分子繊維のめっき方法及びその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS532612B2 (ja) | 1978-01-30 |
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