JPS5128001A - Kizaijono kankohifuku oyobi sonoseizoho - Google Patents

Kizaijono kankohifuku oyobi sonoseizoho

Info

Publication number
JPS5128001A
JPS5128001A JP2295075A JP2295075A JPS5128001A JP S5128001 A JPS5128001 A JP S5128001A JP 2295075 A JP2295075 A JP 2295075A JP 2295075 A JP2295075 A JP 2295075A JP S5128001 A JPS5128001 A JP S5128001A
Authority
JP
Japan
Prior art keywords
kizaijono
kankohifuku
sonoseizoho
oyobi
oyobi sonoseizoho
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2295075A
Other languages
Japanese (ja)
Inventor
Chuu Shimon
Goruda Yuujiin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polychrome Corp
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polychrome Corp filed Critical Polychrome Corp
Publication of JPS5128001A publication Critical patent/JPS5128001A/en
Pending legal-status Critical Current

Links

JP2295075A 1974-08-29 1975-02-26 Kizaijono kankohifuku oyobi sonoseizoho Pending JPS5128001A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US50153774A 1974-08-29 1974-08-29

Publications (1)

Publication Number Publication Date
JPS5128001A true JPS5128001A (en) 1976-03-09

Family

ID=23993968

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2295075A Pending JPS5128001A (en) 1974-08-29 1975-02-26 Kizaijono kankohifuku oyobi sonoseizoho

Country Status (1)

Country Link
JP (1) JPS5128001A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55527A (en) * 1978-06-16 1980-01-05 Fuji Photo Film Co Ltd Photosensitive planographic plate
JPS6024545A (en) * 1983-07-21 1985-02-07 Japan Synthetic Rubber Co Ltd Positive photosensitive resin composition
JPS6236657A (en) * 1985-08-10 1987-02-17 Japan Synthetic Rubber Co Ltd Resist composition
JPH01145649A (en) * 1988-10-18 1989-06-07 Japan Synthetic Rubber Co Ltd Negative type radiation-sensitive resin composition
US4965167A (en) * 1988-11-10 1990-10-23 Olin Hunt Specialty Products, Inc. Positive-working photoresist employing a selected mixture of ethyl lactate and ethyl 3-ethoxy propionate as casting solvent
JPH0372361A (en) * 1989-08-14 1991-03-27 Konica Corp Photosensitive lithographic printing plate
US5063138A (en) * 1988-11-10 1991-11-05 Ocg Microelectronic Materials, Inc. Positive-working photoresist process employing a selected mixture of ethyl lactate and ethyl 3-ethoxy propionate as casting solvent during photoresist coating
US5128230A (en) * 1986-12-23 1992-07-07 Shipley Company Inc. Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate
US5405720A (en) * 1985-08-07 1995-04-11 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1312926A (en) * 1969-05-20 1973-04-11 Kalle Ag Production of light-sensitive compounds and reproduction material employing the same

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1312926A (en) * 1969-05-20 1973-04-11 Kalle Ag Production of light-sensitive compounds and reproduction material employing the same

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55527A (en) * 1978-06-16 1980-01-05 Fuji Photo Film Co Ltd Photosensitive planographic plate
JPS6024545A (en) * 1983-07-21 1985-02-07 Japan Synthetic Rubber Co Ltd Positive photosensitive resin composition
US5494784A (en) * 1985-08-07 1996-02-27 Japan Synthetic Rubber Co., Ltd. Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent
US6270939B1 (en) 1985-08-07 2001-08-07 Jsr Corporation Radiation-sensitive resin composition
US6228554B1 (en) 1985-08-07 2001-05-08 Jsr Corporation Radiation-sensitive resin composition
US5925492A (en) * 1985-08-07 1999-07-20 Jsr Corporation Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent
US5405720A (en) * 1985-08-07 1995-04-11 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent
JPS6236657A (en) * 1985-08-10 1987-02-17 Japan Synthetic Rubber Co Ltd Resist composition
US5128230A (en) * 1986-12-23 1992-07-07 Shipley Company Inc. Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate
JPH01145649A (en) * 1988-10-18 1989-06-07 Japan Synthetic Rubber Co Ltd Negative type radiation-sensitive resin composition
US5063138A (en) * 1988-11-10 1991-11-05 Ocg Microelectronic Materials, Inc. Positive-working photoresist process employing a selected mixture of ethyl lactate and ethyl 3-ethoxy propionate as casting solvent during photoresist coating
US4965167A (en) * 1988-11-10 1990-10-23 Olin Hunt Specialty Products, Inc. Positive-working photoresist employing a selected mixture of ethyl lactate and ethyl 3-ethoxy propionate as casting solvent
JPH0372361A (en) * 1989-08-14 1991-03-27 Konica Corp Photosensitive lithographic printing plate

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