JPS5143769B1 - - Google Patents

Info

Publication number
JPS5143769B1
JPS5143769B1 JP1545565A JP1545565A JPS5143769B1 JP S5143769 B1 JPS5143769 B1 JP S5143769B1 JP 1545565 A JP1545565 A JP 1545565A JP 1545565 A JP1545565 A JP 1545565A JP S5143769 B1 JPS5143769 B1 JP S5143769B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1545565A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5143769B1 publication Critical patent/JPS5143769B1/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/105—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam
    • H05K3/106—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam by photographic methods
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances
    • G03C1/56—Diazo sulfonates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances
    • G03C1/62—Metal compounds reducible to metal
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/74—Applying photosensitive compositions to the base; Drying processes therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/775—Photosensitive materials characterised by the base or auxiliary layers the base being of paper

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Chemically Coating (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Materials For Photolithography (AREA)
JP1545565A 1964-03-21 1965-03-18 Pending JPS5143769B1 (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL6403056A NL139829B (nl) 1964-03-21 1964-03-21 Werkwijze voor de vervaardiging van lichtgevoelig materiaal, aldus vervaardigd lichtgevoelig materiaal en daarmee vervaardigd voorwerp.

Publications (1)

Publication Number Publication Date
JPS5143769B1 true JPS5143769B1 (da) 1976-11-24

Family

ID=19789624

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1545565A Pending JPS5143769B1 (da) 1964-03-21 1965-03-18

Country Status (10)

Country Link
JP (1) JPS5143769B1 (da)
AT (1) AT275317B (da)
BE (1) BE661411A (da)
CH (1) CH464687A (da)
DE (1) DE1572214B2 (da)
DK (1) DK111794B (da)
ES (1) ES310715A1 (da)
GB (1) GB1092607A (da)
NL (1) NL139829B (da)
SE (1) SE315497B (da)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999059386A1 (en) * 1998-05-14 1999-11-18 Seiko Epson Corporation Substrate for formation of special pattern, and method of manufacture of substrate

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3960564A (en) * 1972-06-21 1976-06-01 U.S. Philips Corporation Physical development process utilizing a physical developer containing a specific reducing agent, a thiol compound
NL7316102A (nl) * 1973-11-26 1975-05-28 Philips Nv Werkwijze voor de vervaardiging van een uit- wendig elektrische geleidend metaalpatroon.
GB0508186D0 (en) 2005-04-22 2005-06-01 Eastman Kodak Co Method of forming flexible electronic circuits

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999059386A1 (en) * 1998-05-14 1999-11-18 Seiko Epson Corporation Substrate for formation of special pattern, and method of manufacture of substrate

Also Published As

Publication number Publication date
SE315497B (da) 1969-09-29
DE1572214B2 (de) 1976-07-29
DE1572214A1 (de) 1970-04-09
GB1092607A (en) 1967-11-29
DK111794B (da) 1968-10-07
ES310715A1 (es) 1965-06-01
CH464687A (de) 1968-10-31
BE661411A (da) 1965-09-20
NL139829B (nl) 1973-09-17
NL6403056A (da) 1965-09-22
AT275317B (de) 1969-10-27

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