JPS5151938A - Fuotorejisutono kaikahoho - Google Patents

Fuotorejisutono kaikahoho

Info

Publication number
JPS5151938A
JPS5151938A JP12595074A JP12595074A JPS5151938A JP S5151938 A JPS5151938 A JP S5151938A JP 12595074 A JP12595074 A JP 12595074A JP 12595074 A JP12595074 A JP 12595074A JP S5151938 A JPS5151938 A JP S5151938A
Authority
JP
Japan
Prior art keywords
kaikahoho
fuotorejisutono
fuotorejisutono kaikahoho
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12595074A
Other languages
Japanese (ja)
Other versions
JPS5340536B2 (en
Inventor
Hisashi Nakane
Akira Uehara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP12595074A priority Critical patent/JPS5151938A/en
Publication of JPS5151938A publication Critical patent/JPS5151938A/en
Publication of JPS5340536B2 publication Critical patent/JPS5340536B2/ja
Granted legal-status Critical Current

Links

Classifications

    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
    • Y02W30/00—Technologies for solid waste management
    • Y02W30/50—Reuse, recycling or recovery technologies
    • Y02W30/62—Plastics recycling; Rubber recycling

Landscapes

  • Separation, Recovery Or Treatment Of Waste Materials Containing Plastics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
JP12595074A 1974-10-31 1974-10-31 Fuotorejisutono kaikahoho Granted JPS5151938A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12595074A JPS5151938A (en) 1974-10-31 1974-10-31 Fuotorejisutono kaikahoho

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12595074A JPS5151938A (en) 1974-10-31 1974-10-31 Fuotorejisutono kaikahoho

Publications (2)

Publication Number Publication Date
JPS5151938A true JPS5151938A (en) 1976-05-07
JPS5340536B2 JPS5340536B2 (en) 1978-10-27

Family

ID=14922972

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12595074A Granted JPS5151938A (en) 1974-10-31 1974-10-31 Fuotorejisutono kaikahoho

Country Status (1)

Country Link
JP (1) JPS5151938A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52155531A (en) * 1976-06-17 1977-12-24 Motorola Inc Dry photo resist developing method
JPS5587438A (en) * 1978-12-25 1980-07-02 Fujitsu Ltd Manufacture of semiconductor device
JPS5685823A (en) * 1979-11-13 1981-07-13 Itt Ion implantation process
JPS6243132A (en) * 1985-08-20 1987-02-25 Sharp Corp Plasma treatment method
JPH01164038A (en) * 1987-12-21 1989-06-28 Matsushita Electric Ind Co Ltd Dry etching
JPH0249425A (en) * 1987-08-28 1990-02-19 Toshiba Corp Method and apparatus for removing organic conpound film
JPH0354571A (en) * 1989-07-21 1991-03-08 Matsushita Electric Ind Co Ltd Method for removing photosensitive resin
JP2007268464A (en) * 2006-03-31 2007-10-18 Sharp Corp Recycling method of waste material processed transparent conductive film, and metal, metal compound, base material, and recycling apparatus obtained thereby

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52155531A (en) * 1976-06-17 1977-12-24 Motorola Inc Dry photo resist developing method
JPS5587438A (en) * 1978-12-25 1980-07-02 Fujitsu Ltd Manufacture of semiconductor device
JPS5685823A (en) * 1979-11-13 1981-07-13 Itt Ion implantation process
JPS6243132A (en) * 1985-08-20 1987-02-25 Sharp Corp Plasma treatment method
JPH0249425A (en) * 1987-08-28 1990-02-19 Toshiba Corp Method and apparatus for removing organic conpound film
JPH01164038A (en) * 1987-12-21 1989-06-28 Matsushita Electric Ind Co Ltd Dry etching
JPH0354571A (en) * 1989-07-21 1991-03-08 Matsushita Electric Ind Co Ltd Method for removing photosensitive resin
JP2007268464A (en) * 2006-03-31 2007-10-18 Sharp Corp Recycling method of waste material processed transparent conductive film, and metal, metal compound, base material, and recycling apparatus obtained thereby

Also Published As

Publication number Publication date
JPS5340536B2 (en) 1978-10-27

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