JPS52100657A - Mixing method and apparatus therefor - Google Patents
Mixing method and apparatus thereforInfo
- Publication number
- JPS52100657A JPS52100657A JP1698076A JP1698076A JPS52100657A JP S52100657 A JPS52100657 A JP S52100657A JP 1698076 A JP1698076 A JP 1698076A JP 1698076 A JP1698076 A JP 1698076A JP S52100657 A JPS52100657 A JP S52100657A
- Authority
- JP
- Japan
- Prior art keywords
- mixing method
- apparatus therefor
- therefor
- mixing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Mixers With Rotating Receptacles And Mixers With Vibration Mechanisms (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1698076A JPS52100657A (en) | 1976-02-20 | 1976-02-20 | Mixing method and apparatus therefor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1698076A JPS52100657A (en) | 1976-02-20 | 1976-02-20 | Mixing method and apparatus therefor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS52100657A true JPS52100657A (en) | 1977-08-23 |
| JPS558210B2 JPS558210B2 (en) | 1980-03-03 |
Family
ID=11931194
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1698076A Granted JPS52100657A (en) | 1976-02-20 | 1976-02-20 | Mixing method and apparatus therefor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS52100657A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53129372A (en) * | 1977-04-18 | 1978-11-11 | Toshiba Corp | Agitating and mixing device |
| JPS58124230U (en) * | 1982-02-13 | 1983-08-24 | 星野 忠夫 | Electromagnetic coil stirring device |
| WO2009098784A1 (en) * | 2008-02-06 | 2009-08-13 | Youtec Co., Ltd. | Plasma cvd apparatus, plasma cvd method, and agitating device |
| WO2010013335A1 (en) * | 2008-07-31 | 2010-02-04 | 株式会社フォスメガ | Reaction device and method |
| WO2010013312A1 (en) * | 2008-07-29 | 2010-02-04 | 株式会社フォスメガ | Liquid feeding device and method, agitation device and method and microreactor |
| US8377708B2 (en) | 2008-07-31 | 2013-02-19 | Empire Technology Development Llc | Reaction apparatus and process |
| US8623663B2 (en) | 2008-07-31 | 2014-01-07 | Empire Technology Development Llc | Reaction apparatus and process |
-
1976
- 1976-02-20 JP JP1698076A patent/JPS52100657A/en active Granted
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53129372A (en) * | 1977-04-18 | 1978-11-11 | Toshiba Corp | Agitating and mixing device |
| JPS58124230U (en) * | 1982-02-13 | 1983-08-24 | 星野 忠夫 | Electromagnetic coil stirring device |
| WO2009098784A1 (en) * | 2008-02-06 | 2009-08-13 | Youtec Co., Ltd. | Plasma cvd apparatus, plasma cvd method, and agitating device |
| JP5218942B2 (en) * | 2008-02-06 | 2013-06-26 | 株式会社ユーテック | Plasma CVD apparatus, plasma CVD method and stirring apparatus |
| US10125421B2 (en) | 2008-02-06 | 2018-11-13 | Advanced Material Technologies, Inc. | Plasma CVD apparatus, plasma CVD method, and agitating device |
| WO2010013312A1 (en) * | 2008-07-29 | 2010-02-04 | 株式会社フォスメガ | Liquid feeding device and method, agitation device and method and microreactor |
| WO2010013335A1 (en) * | 2008-07-31 | 2010-02-04 | 株式会社フォスメガ | Reaction device and method |
| US8377708B2 (en) | 2008-07-31 | 2013-02-19 | Empire Technology Development Llc | Reaction apparatus and process |
| US8623663B2 (en) | 2008-07-31 | 2014-01-07 | Empire Technology Development Llc | Reaction apparatus and process |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS558210B2 (en) | 1980-03-03 |
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