JPS52102792A - Depth concentration analyzer - Google Patents

Depth concentration analyzer

Info

Publication number
JPS52102792A
JPS52102792A JP1891376A JP1891376A JPS52102792A JP S52102792 A JPS52102792 A JP S52102792A JP 1891376 A JP1891376 A JP 1891376A JP 1891376 A JP1891376 A JP 1891376A JP S52102792 A JPS52102792 A JP S52102792A
Authority
JP
Japan
Prior art keywords
concentration analyzer
depth concentration
depth
probe
electronic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1891376A
Other languages
Japanese (ja)
Inventor
Tomoji Niina
Tadatetsu Hattori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1891376A priority Critical patent/JPS52102792A/en
Publication of JPS52102792A publication Critical patent/JPS52102792A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

PURPOSE:To measure the etching depth by combining a solid analyzer using an ion probe with an electronic microscope of scanning type using an electronic probe having no etching action.
JP1891376A 1976-02-25 1976-02-25 Depth concentration analyzer Pending JPS52102792A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1891376A JPS52102792A (en) 1976-02-25 1976-02-25 Depth concentration analyzer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1891376A JPS52102792A (en) 1976-02-25 1976-02-25 Depth concentration analyzer

Publications (1)

Publication Number Publication Date
JPS52102792A true JPS52102792A (en) 1977-08-29

Family

ID=11984839

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1891376A Pending JPS52102792A (en) 1976-02-25 1976-02-25 Depth concentration analyzer

Country Status (1)

Country Link
JP (1) JPS52102792A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03272554A (en) * 1989-11-02 1991-12-04 Mitsubishi Electric Corp Scanning electron microscope for section observation and section observing method using it

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03272554A (en) * 1989-11-02 1991-12-04 Mitsubishi Electric Corp Scanning electron microscope for section observation and section observing method using it

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