JPS52104476A - Ion spattering apparatus - Google Patents

Ion spattering apparatus

Info

Publication number
JPS52104476A
JPS52104476A JP2109576A JP2109576A JPS52104476A JP S52104476 A JPS52104476 A JP S52104476A JP 2109576 A JP2109576 A JP 2109576A JP 2109576 A JP2109576 A JP 2109576A JP S52104476 A JPS52104476 A JP S52104476A
Authority
JP
Japan
Prior art keywords
spattering apparatus
ion spattering
ion
ags
equipping
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2109576A
Other languages
Japanese (ja)
Inventor
Tadamasa Tsuruta
Katsuhisa Yonehara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP2109576A priority Critical patent/JPS52104476A/en
Publication of JPS52104476A publication Critical patent/JPS52104476A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To effectively carry out etching, coating, or the like of a sample while controlling ags well by equipping a gas concentration controller by which one or more kinds of gases can be controlled in a desired concentration or mixing ratio and introduced.
JP2109576A 1976-03-01 1976-03-01 Ion spattering apparatus Pending JPS52104476A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2109576A JPS52104476A (en) 1976-03-01 1976-03-01 Ion spattering apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2109576A JPS52104476A (en) 1976-03-01 1976-03-01 Ion spattering apparatus

Publications (1)

Publication Number Publication Date
JPS52104476A true JPS52104476A (en) 1977-09-01

Family

ID=12045303

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2109576A Pending JPS52104476A (en) 1976-03-01 1976-03-01 Ion spattering apparatus

Country Status (1)

Country Link
JP (1) JPS52104476A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54104450U (en) * 1977-12-23 1979-07-23
JPS5512779A (en) * 1978-07-13 1980-01-29 Matsushita Electric Ind Co Ltd Spattering device
JPS5717134A (en) * 1980-07-04 1982-01-28 Kokusai Electric Co Ltd Device for decompression and reaction
JPS61183965U (en) * 1986-05-01 1986-11-17
JPH0192367A (en) * 1987-10-05 1989-04-11 Nippon Telegr & Teleph Corp <Ntt> Sputtering device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54104450U (en) * 1977-12-23 1979-07-23
JPS5512779A (en) * 1978-07-13 1980-01-29 Matsushita Electric Ind Co Ltd Spattering device
JPS5717134A (en) * 1980-07-04 1982-01-28 Kokusai Electric Co Ltd Device for decompression and reaction
JPS61183965U (en) * 1986-05-01 1986-11-17
JPH0192367A (en) * 1987-10-05 1989-04-11 Nippon Telegr & Teleph Corp <Ntt> Sputtering device

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